A rotary support device and a semiconductor substrate processing apparatus

Abstract

The application discloses a rotating supporting device and a semiconductor substrate processing device. The rotating supporting device comprises a base, a driving disc rotatably supported on the base, a driving assembly for driving the driving disc to rotate around a central axis thereof, a first limiting assembly installed on the base and comprising a plurality of first limiting members arranged at intervals in a circumferential direction, the first limiting members being in rolling contact with the driving disc to limit the driving disc in a radial direction of the driving disc, and a supporting member for supporting the base, the supporting member being connected with the driving disc and rotating synchronously with the driving disc. The design can ensure the stability of the rotating supporting device.

Description

Technical Field

[0001] This application relates to the field of semiconductor equipment technology, and in particular to a rotating support device and a semiconductor substrate processing device. Background Technology

[0002] In some semiconductor processing equipment (such as semiconductor coating equipment), the base rotates during the process to ensure more uniform processing of the materials on the base.

[0003] However, the base of existing semiconductor processing equipment typically rotates by driving a central shaft. Since the central shaft serves both rotational and support functions, it is prone to wobbling during rotation if it does not possess sufficiently high manufacturing and assembly precision. This phenomenon becomes more pronounced at higher rotational speeds. Therefore, it is necessary to provide a rotational support system that can ensure rotational stability. Utility Model Content

[0004] This application provides a rotating support device and a semiconductor substrate processing apparatus, which can ensure the stability of the rotation of the rotating support device.

[0005] The first aspect of this application provides a rotary support device for supporting a base, the rotary support device comprising: a base; a drive disk rotatably supported on the base; a drive assembly for driving the drive disk to rotate about its own central axis; a first limiting assembly mounted on the base, including a plurality of first limiting members spaced apart along the circumferential direction, the first limiting members rollingly contacting the drive disk to limit the drive disk in the radial direction; and a support member supporting the base, the support member being on the drive disk and rotating synchronously with the drive disk.

[0006] In one embodiment, the rotating support device further includes a support assembly disposed between the base and the drive disk, comprising a plurality of support bearings, the plurality of support bearings being spaced apart around the central axis of the drive disk, the inner ring of the support bearing being fixedly connected to one of the base and the drive disk, and the outer ring of the support bearing contacting the other of the base and the drive disk to rotatably support the drive disk.

[0007] In one embodiment, the rotating support device further includes: a second limiting component, mounted on the base, comprising a plurality of second limiting members, the plurality of second limiting members abutting against the side of the drive disk away from the base and spaced apart around the central axis of the drive disk, to limit the drive disk from moving in the direction away from the base.

[0008] In one embodiment, both the first and second limiting members are in elastic contact with the drive disk. The first limiting member includes a first body and a first rolling member elastically connected to the first body, the first rolling member being in rolling contact with the drive disk; the second limiting member includes a second body and a second rolling member elastically connected to the second body, the second rolling member abutting against the side of the drive disk opposite to the base; the first rolling member and / or the second rolling member are configured as rollers or rolling bearings.

[0009] In one embodiment, a plurality of second rolling elements correspond one-to-one with a plurality of support bearings, and the corresponding support bearings, the second rolling elements, and the abutment positions of the drive disk are vertically aligned.

[0010] In one embodiment, the drive disk is provided with a first meshing tooth; the drive assembly includes: a drive member; a drive gear connected to the output shaft of the drive member, the drive gear being provided with a second meshing tooth that meshes with the first meshing tooth.

[0011] In one embodiment, the drive disk has an annular structure, the inner circumferential surface of the drive disk is provided with the first meshing teeth, and a plurality of first limiting members abut against the outer circumference of the drive disk; or, the drive disk has an annular structure, the outer circumferential surface of the drive disk is provided with the first meshing teeth, and a plurality of first limiting members abut against the inner circumference of the drive disk; or, the drive disk has an annular structure, the end face of the drive disk facing the base is provided with the first meshing teeth, and a plurality of first limiting members abut against the outer or inner circumference of the drive disk.

[0012] In one embodiment, the support includes a cylindrical support body and a plurality of connecting rods. The support body supports the base, and the connecting rods are evenly spaced along the circumferential direction and are fixedly connected to the drive disk and the support body.

[0013] A second aspect of this application also provides a semiconductor substrate processing apparatus, the apparatus including a rotating support device as described in any of the above embodiments.

[0014] In one embodiment, the support member has an open end facing away from the base; the device further includes: a reaction chamber, the reaction chamber having a reaction cavity and an air inlet and an air outlet communicating with the reaction cavity; a base, disposed in the reaction chamber, including a bearing surface for supporting the substrate, the bearing surface being disposed towards the reaction cavity; an annular transition member, located at the open end of the support member and supported on the support member, the base being indirectly supported at the open end of the support member through the annular transition member; the annular transition member is made of graphite or graphite with a silicon carbide coating.

[0015] The advantages of this application, which differ from the prior art, are as follows: The rotating support device of this application includes a base, a drive disk, a drive assembly, a first limiting assembly, and a support member. The base supports the drive disk, and the drive disk is rotatable relative to the base. The drive assembly drives the drive disk to rotate around its own central axis, and the support member also rotates accordingly, and is used to drive the base to rotate for coating. During the rotation of the support member, the side wall of the drive disk is clamped by multiple first limiting members and is limited radially at multiple positions, which avoids excessive offset of the drive disk in any direction of its own rotation surface, ensures the stability of the rotating support device, and ultimately ensures the uniformity of the coating. Attached Figure Description

[0016] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort, wherein:

[0017] Figure 1 This is a schematic diagram of one embodiment of the rotary support device of this application;

[0018] Figure 2 yes Figure 1 A top view of one embodiment of the rotating support device;

[0019] Figure 3 yes Figure 1 A cross-sectional view along the centerline of one embodiment of the rotating support device;

[0020] Figure 4 This is a cross-sectional view along the centerline of another embodiment of the rotary support device of this application.

[0021] Figure 5 This is a partial cross-sectional view of one embodiment of the semiconductor substrate processing apparatus of this application.

[0022] Label Explanation:

[0023] 10-Rotating support device; 20-Semiconductor substrate processing equipment; 100-Base; 200-Drive disk; 201-First meshing tooth; 300-Drive assembly; 310-Drive gear; 311-Second meshing tooth; 320-Drive component; 400-First limiting assembly; 410-First limiting component; 411-First main body; 412-First rolling component; 500-Support component; 600-Second limiting assembly; 610-Second limiting component; 611-Second main body; 612-Second rolling component; 700-Support assembly; 710-Support bearing; 720-Support part; 800-Annular support component; 900-Base; 1000-Conduit; 1100-Temperature measuring component. Detailed Implementation

[0024] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0025] In response to the aforementioned background issues, the applicant discovered through research that the main reason for the instability of the base is that the design of the rotating support device used to support the base is not yet perfect and needs further optimization. The following solution was designed after research.

[0026] See Figure 1 , Figure 2 and Figure 3 , Figure 1 This is a schematic diagram of one embodiment of the rotary support device of this application. Figure 2 yes Figure 1 A top view of one embodiment of the rotating support device. Figure 3 yes Figure 1 A cross-sectional view along the centerline of one embodiment of a rotating support device. In the first aspect of this application, a rotating support device 10 is provided. The rotating support device 10 is used to support a base. The rotating support device 10 includes a base 100, a drive disk 200, a drive assembly 300, a first limiting assembly 400, and a support member 500.

[0027] The drive disk 200 rotates and is supported on the base 100.

[0028] Specifically, the base 100 is a load-bearing structure near the bottom of the rotating support device 10, mainly used to support other component structures above it. The base 100 is fixed relative to the ground. The base 100 can be fixed to the equipment, or it can be part of the equipment, or it can be directly fixed to the ground. In this application, the base 100 is used to support the drive disk 200, and the base 100 does not statically support the drive disk 200, but rather dynamically supports it. The drive disk 200 can rotate relative to the base 100; therefore, the drive disk 200 can rotate relative to the ground. It is understood that, due to the rotational support of the base 100 on the drive disk 200, the supporting surface of the base 100 on the drive disk 200 must be parallel or coincident with the plane in which the drive disk 200 rotates.

[0029] The drive assembly 300 is used to drive the drive disk 200 to rotate around its own central axis.

[0030] Specifically, the central axis is perpendicular to the support surface of the base 100 on the drive disk 200. The drive component 300 can drive the drive disk 200 to rotate directly or indirectly. The specific position of the drive component 300 can be on either side of the drive disk 200, as long as it can drive the drive disk 200 to rotate.

[0031] The first limiting assembly 400 is mounted on the base 100 and includes a plurality of first limiting members 410 spaced apart along the circumferential direction. The first limiting members 410 roll contact with the drive disk 200 to limit the drive disk 200 in the radial direction.

[0032] Specifically, since the drive disk 200 and the base 100 are rotatable relative to each other, the first limiting component 400 contacts the drive disk 200 in a rolling manner through its first limiting member 410, the axis of rotation of the first limiting member 410 being parallel to the central axis of the drive disk 200. Specifically, the sidewall of the first limiting member 410 rolls into contact with the sidewall of the drive disk 200, thereby preventing excessive offset of the drive disk 200 on its rotational surface during rotation. This rolling contact also helps avoid excessive friction between the two components, extending their service life. Multiple first limiting members 410 at different positions in the circumferential direction limit the sidewall of the drive disk 200 radially, thus forming a clamping structure for the drive disk 200 and preventing excessive offset of the drive disk 200 in any direction on its rotational surface.

[0033] The support member 500 supports the base and is connected to the drive disk 200 and rotates synchronously with the drive disk 200.

[0034] Specifically, the support member 500 is fixedly connected to the drive disk 200, and the support member 500 is located on the side of the drive disk 200 away from the base 100. Therefore, the base 100 supports the drive disk 200 and the support member 500, and the drive assembly 300 drives the drive disk 200 to rotate, thereby causing the support member 500 to rotate as well. When the support member 500 rotates, it drives the base located on the support member 500 to rotate, thereby realizing rotational coating.

[0035] Unlike existing technologies, the rotary support device of this application includes a base 100, a drive disk 200, a drive assembly 300, a first limiting assembly 400, and a support member 500. The base 100 supports the drive disk 200, and the drive disk 200 is rotatable relative to the base 100. The drive assembly 300 drives the drive disk 200 to rotate around its own central axis, and the support member 500 also rotates accordingly, which is used to drive the base to rotate for coating. During the rotation of the support member 500, the sidewall of the drive disk 200 is clamped by multiple first limiting members 410 and is limited radially at multiple positions, which avoids excessive offset of the drive disk 200 in any direction of its own rotation surface, ensures the stability of the rotary support device, and ultimately ensures the uniformity of the coating.

[0036] In one embodiment, the rotating support device 10 further includes a support assembly 700 disposed between the base 100 and the drive disk 200. The support assembly 700 includes a plurality of support bearings 710, which are spaced apart around the central axis of the drive disk 200. The inner ring of the support bearing 710 is fixedly connected to one of the base 100 and the drive disk 200, and the outer ring of the support bearing 710 contacts the other of the base 100 and the drive disk 200 to rotate and support the drive disk 200.

[0037] Specifically, the drive disk 200 and the base 100 are rotatable relative to each other. Optionally, the support assembly 700 makes rolling contact with the side of the drive disk 200 near the base 100 via its support bearing 710. Specifically, the sidewall of the support bearing 710 makes rolling contact with the lower end face of the drive disk 200, thereby preventing the drive disk 200 from swinging downwards. This rolling contact also helps avoid excessive friction between the two, extending the service life of the assembly. The axis of rotation of any support bearing 710 is perpendicular to the central axis of the drive disk 200. Multiple support bearings 710 constrain the drive disk 200 at different positions, thereby preventing the drive disk 200 from swinging downwards at multiple locations and ensuring the stability of the drive disk 200 in the height direction. The number of support bearings 710 should be greater than or equal to three to form surface support for the drive disk 200. Optionally, the support bearings 710 are evenly spaced in the circumferential direction.

[0038] Optionally, the support assembly 700 also includes a plurality of support portions 720, one end of each support portion 720 being fixedly connected to the base 100 and the other end being connected to the inner ring of the support bearing 710.

[0039] In one embodiment, the rotating support device 10 further includes a second limiting component 600, which is mounted on the base 100. The second limiting component 600 includes a plurality of second limiting members 610, which abut against the side of the drive disk 200 away from the base 100 and are spaced apart around the central axis of the drive disk 200 to restrict the drive disk 200 from moving in the direction away from the base 100.

[0040] Specifically, since the drive disk 200 and the base 100 are rotatable relative to each other, the second limiting component 600 limits the drive disk 200 by abutting against the side of the drive disk 200 away from the base 100 through its second limiting member 610. Specifically, the sidewall of the second limiting member 610 abuts against the upper end face of the drive disk 200, thereby preventing the drive disk 200 from swinging upwards. Multiple second limiting members 610 restrict the drive disk 200 at different positions, thereby preventing the drive disk 200 from swinging upwards at multiple positions and ensuring the stability of the drive disk 200 in the height direction. Optionally, the second limiting members 610 are evenly spaced in the circumferential direction. In one embodiment, both the first limiting member 410 and the second limiting member 610 are in elastic contact with the drive disk 200. The first limiting member 410 includes a first body 411 and a first rolling member 412 elastically connected to the first body 411, the first rolling member 412 making rolling contact with the drive disk 200; the second limiting member 610 includes a second body 611 and a second rolling member 612 elastically connected to the second body 611, the second rolling member 612 abutting against the side of the drive disk 200 away from the base 100; the first rolling member 412 and / or the second rolling member 612 are configured as rollers or rolling bearings.

[0041] Specifically, elastic contact means that within a certain force range, the drive disk 200 can still have a certain displacement, which must be less than the displacement standard acceptable to the coating process. The advantage of elastic contact is that it avoids the absolute restriction of the drive disk 200's position by the limiting components. When there is a large force between the drive disk 200 and the first limiting member 410 and the second limiting member 610, the large force can be released through a certain displacement, which helps protect the drive disk 200, the first limiting member 410, and the second limiting member 610. Specifically, one end of the first main body 411 of the first limiting member 410 is fixedly connected to the base 100, and the other end is elastically connected to the first rolling member 412, with the elastic extension / retraction direction being radial to the drive disk 200. One end of the second main body 611 of the second limiting member 610 is fixedly connected to the base 100, and the other end is elastically connected to the second rolling member 612, with the elastic extension / retraction direction being the direction of the central axis of rotation of the drive disk 200. The first rolling element 412 and / or the second rolling element 612 are rolling structures that make rolling contact with the drive disk 200, which can reduce friction with the drive disk 200 and extend service life.

[0042] In one embodiment, a plurality of second rolling elements 612 correspond one-to-one with a plurality of support bearings 710, and the corresponding support bearings 710, second rolling elements 612 and drive disk 200 abut against each other in the vertical direction.

[0043] Specifically, in this embodiment, the number of support bearings 710 and second rolling elements 612 are exactly equal, and they form pairs of clamps at multiple positions on the upper and lower end faces of the drive disk 200, thereby better preventing the drive disk 200 from swinging up and down.

[0044] Of course, in some other embodiments, the number of support bearings 710 and second rolling elements 612 may not be exactly the same. For example, the number of support bearings 710 may be three, and the number of second rolling elements 612 may be two.

[0045] In one embodiment, the drive disk 200 is provided with a first meshing tooth 201; the drive assembly 300 includes a drive member 320 and a drive gear 310, the drive gear 310 is connected to the output shaft of the drive member 320, and the drive gear 310 is provided with a second meshing tooth 311 that meshes with the first meshing tooth 201.

[0046] Specifically, the drive component 320 includes a motor, etc., and is further connected to the drive gear 310 via an output shaft, thereby driving the drive gear 310 to rotate. The second meshing tooth 311 meshes with the first meshing tooth 201, thereby further driving the drive disk 200 to rotate. Optionally, the number of teeth of the second meshing tooth 311 is less than the number of teeth of the first meshing tooth 201, so that the drive gear 310 has a smaller size than the drive disk 200, thereby reducing the space occupied by the drive gear 310.

[0047] In one embodiment, combined with Figures 1 to 3 The drive disk 200 has a ring-shaped structure. The inner circumferential surface of the drive disk 200 is provided with a first meshing tooth 201, and a plurality of first limiting members 410 abut against the outer circumference of the drive disk 200.

[0048] Specifically, in this embodiment, the inner side of the drive disk 200 is engaged with the drive assembly 300, and the outer side of the ring abuts against a plurality of first limiting members 410. In this way, the plurality of first limiting members 410 limit the radial inward movement, which can ensure a tight connection between the drive disk 200 and the drive assembly 300. The number of first limiting members 410 is greater than or equal to 3. Preferably, when the number of first limiting members 410 is 3, the 3 first limiting members 410 are evenly distributed on the outer side of the ring of the drive disk 200 with equal arc.

[0049] In another embodiment, the drive disk 200 has a ring-shaped structure, and the outer peripheral surface of the drive disk 200 is provided with first meshing teeth 201, and a plurality of first limiting members 410 abut against the inner ring circumferentially of the drive disk 200.

[0050] Specifically, in this embodiment, the outer side of the drive disk 200 is engaged with the drive assembly 300, and the inner side of the ring abuts against a plurality of first limiting members 410. In this way, the radial outward limiting of the plurality of first limiting members 410 can ensure a tight connection between the drive disk 200 and the drive assembly 300. The number of first limiting members 410 is greater than or equal to two. Preferably, when the number of first limiting members 410 is two, the line connecting the two first limiting members 410 coincides with the diameter of the drive disk 200.

[0051] In yet another embodiment, see [reference] Figure 4 , Figure 4 This is a cross-sectional view along the center line of another embodiment of the rotary support device of this application. The drive disk 200 has a ring structure. The end face of the drive disk 200 facing the base 100 is provided with a first meshing tooth 201. A plurality of first limiting members 410 abut against the outer or inner circumference of the drive disk 200.

[0052] Specifically, in this embodiment, unlike the two embodiments described above, the first meshing tooth 201 is not directly disposed on the inner or outer side of the drive disk 200, but is disposed on the end face of the drive disk 200 facing the base 100, so that the first limiting member 410 can be selectively abutted against the outer or inner side of the drive disk 200.

[0053] Of course, in some other embodiments, the drive assembly 300 and the drive disk 200 may be spaced apart and driven by a transmission belt or a transmission chain.

[0054] In one embodiment, the support member 500 includes a cylindrical support body 510 and a plurality of connecting rods 520. The support body 510 supports the base, and the connecting rods 520 are evenly spaced along the circumferential direction and are fixedly connected to the drive disk 200 and the support body 510.

[0055] Specifically, the support body 510 has a cylindrical structure, meaning it is hollow in the middle. This helps reduce the overall weight of the support body 510 and lowers the load on the support body 510 caused by the rotation of the drive assembly 300. The cylindrical structure also better ensures overall rotational balance during rotation. The support body 510 and the drive disk 200 are fixedly connected by multiple connecting rods 520 evenly spaced along the circumference. This avoids direct contact between the support body 510 and the drive disk 200, preventing excessive heat transfer from the support body 510 to the drive disk 200 and thus preventing deformation of the drive disk 200 due to temperature. It also frees up space for the second limiting assembly 600.

[0056] See Figure 5 , Figure 5 This is a partial cross-sectional view of one embodiment of the semiconductor substrate processing apparatus of this application. This application also provides a semiconductor substrate processing apparatus 20, which includes a rotating support device 10 as described in any of the above embodiments. The semiconductor substrate processing apparatus 20 includes semiconductor coating equipment, etc., and the semiconductor substrate processing apparatus 20 can achieve the same technical effects as the rotating support device 10 in any of the above embodiments. For details, please refer to the above text, and this application will not repeat them.

[0057] In one embodiment, see Figure 5 , Figure 5This is a partial cross-sectional view of one embodiment of the semiconductor substrate processing apparatus of this application. The support member 500 has an open end facing away from the base 100; the semiconductor substrate processing apparatus 20 also includes an annular transition member 800, a base 900, and a reaction chamber 1000. The reaction chamber 1000 has a reaction cavity and an air inlet and an air outlet communicating with the reaction cavity. The base 900 is disposed within the reaction chamber 1000 and includes a bearing surface for supporting the substrate, the bearing surface facing the reaction cavity. The annular transition member 800 is located at the open end of the support member 500 and is supported on the support member 500; the base 900 is indirectly supported at the open end of the support member 500 through the annular transition member 800; the annular transition member 800 is made of graphite or a graphite temperature sensor 1100 with a silicon carbide coating is disposed in the support member 500, and the temperature measuring end of the temperature sensor 1100 is adjacent to the base 900.

[0058] Specifically, the annular transition member 800 is mounted on the support member 500. The annular transition member 800 includes a stepped portion extending towards the center of the support member 500. The sidewall of the base 900 has a protrusion mounted on the stepped portion, thus forming a structure where the support member 500 supports the annular transition member 800, and the annular transition member 800 supports the base 900. The reaction chamber 1000 is further mounted above the annular transition member 800 and the base 900. The opening of the reaction chamber 1000 is located precisely on the exposed bearing surface of the base 900, so that the bearing surface of the base 900 is located in the path of the air inlet and outlet. The annular transition member 800 is made of graphite or graphite with a silicon carbide coating, which has the characteristics of wear resistance and high temperature resistance. The temperature measuring element 1100 is located below the base 900 and is used to detect the real-time temperature of the base 900.

[0059] The above description is merely an embodiment of this application and does not limit the patent scope of this application. Any equivalent structural or procedural transformations made using the content of this application's specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this application.

Claims

1. A rotary support device for supporting a base, characterized in that, The rotary support device includes: Base; The drive disc is rotatably supported on the base; A drive assembly is used to drive the drive disk to rotate about its own central axis; A first limiting assembly is mounted on the base and includes a plurality of first limiting members spaced apart along the circumferential direction. The first limiting members are in rolling contact with the drive disk to limit the drive disk in the radial direction. A support member supports the base and is connected to the drive disk, rotating synchronously with the drive disk.

2. The apparatus according to claim 1, characterized in that, Also includes: A support assembly, disposed between the base and the drive disk, includes multiple support bearings, which are spaced apart around the central axis of the drive disk. The inner ring of each support bearing is fixedly connected to one of the base and the drive disk, and the outer ring of each support bearing contacts the other of the base and the drive disk to rotatably support the drive disk.

3. The apparatus according to claim 2, characterized in that, The rotary support device further includes: The second limiting component is installed on the base and includes multiple second limiting members. The multiple second limiting members abut against the side of the drive disk away from the base and are spaced apart around the central axis of the drive disk to restrict the drive disk from moving in the direction away from the base.

4. The apparatus according to claim 3, characterized in that, Both the first limiting member and the second limiting member are in elastic contact with the drive disk; the first limiting member includes a first body and a first rolling member elastically connected to the first body, and the first rolling member is in rolling contact with the drive disk; the second limiting member includes a second body and a second rolling member elastically connected to the second body, and the second rolling member abuts against the side of the drive disk away from the base; the first rolling member and / or the second rolling member are configured as rollers or rolling bearings.

5. The apparatus according to claim 4, characterized in that, Each of the second rolling elements corresponds to one of the multiple supporting bearings, and the contact positions of the corresponding supporting bearings, the second rolling elements, and the drive disk are vertically aligned.

6. The apparatus according to claim 1, characterized in that, The drive disk is provided with a first meshing tooth; The driving component includes: Drive components; A drive gear is connected to the output shaft of the drive component, and the drive gear is provided with a second meshing tooth that meshes with the first meshing tooth.

7. The apparatus according to claim 6, characterized in that, The drive disk has a ring-shaped structure, and the inner circumferential surface of the drive disk is provided with the first meshing teeth. A plurality of the first limiting members abut against the outer circumference of the drive disk; or... The drive disk has a ring-shaped structure, and the outer peripheral surface of the drive disk is provided with the first meshing teeth. A plurality of the first limiting members abut against the inner circumference of the drive disk. or, The drive disk has a ring-shaped structure, and the end face of the drive disk facing the base is provided with the first meshing teeth. A plurality of the first limiting members abut against the outer or inner circumference of the drive disk.

8. The apparatus according to claim 1, characterized in that, The support includes a cylindrical support body and multiple connecting rods. The support body supports the base, and the connecting rods are evenly spaced along the circumferential direction and are fixedly connected to the drive disk and the support body.

9. A semiconductor substrate processing apparatus, characterized in that, The device includes a rotary support device as described in any one of claims 1 to 8.

10. The device according to claim 9, characterized in that, The support member has an open end facing away from the base; the device further includes: The reaction chamber is provided with a reaction cavity and an air inlet and an air outlet communicating with the reaction cavity; A base, disposed within the reaction chamber, includes a support surface for supporting the substrate, the support surface being disposed towards the reaction chamber; An annular transition member is located at the open end of the support member and is supported on the support member. The base is indirectly supported at the open end of the support member through the annular transition member. The annular transition piece is made of graphite or graphite with a silicon carbide coating.

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