In-situ detection equipment for epitaxial growth sensors
CN309566329SActive Publication Date: 2025-10-28SHANGHAI CHEYITIAN TECH CO LTD
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Patent Information
- Application Number
- CN202530142644.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-21
- Publication Date
- 2025-10-28
- Estimated Expiration
- 2040-03-21
Smart Images
Figure 000007_ABST
Abstract
1. Name of the product in this design: Sensor for in-situ detection equipment for epitaxial growth. 2. Purpose of this design: To collect optical signals during the semiconductor epitaxial growth process. 3. The key point of the design of this product lies in its shape. 4. The picture or photo that best illustrates the design points: three-dimensional picture.
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