focusing ring

CN310005996SActive Publication Date: 2026-05-29TOKYO ELECTRON LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
TOKYO ELECTRON LTD
Filing Date
2025-10-13
Publication Date
2026-05-29

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Abstract

1. The name of the design product: focusing ring. 2. The use of the design product: the product is a focusing ring used in semiconductor manufacturing equipment, which is used to spread the distribution of plasma generated in the chamber to the surface of the product from the surface of the semiconductor wafer. 3. The design points of the design product: in shape. 4. The picture or photo that best shows the design points: design 1 perspective view. 5. Design 1 is designated as the basic design.
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