Method for adjusting at least one sensor for a projection exposure apparatus and projection exposure apparatus

Abstract

Shown and described is a method for adjusting at least one sensor (23) for a projection exposure system (1), comprising the following steps: a) providing at least one primary sensor (23) and at least one optical module (21) for a projection exposure system (1), wherein at least one measurement reference (22) is arranged on the optical module (21), wherein the primary sensor (23) is configured to detect a change in the position and / or orientation of the optical module (21) and / or the measurement reference (22) and / or the primary sensor (23) is configured to detect the position and / or orientation of the optical module (21) and / or the measurement reference (22), b) performing a measurement by means of the primary sensor (23), wherein during the measurement the optical module (21) is moved, in particular shifted, tilted and / or rotated, relative to the primary sensor (23) and / or the primary sensor (23) relative to the optical module (21),c) performing a final adjustment of the primary sensor (23) using the measurement performed in step b), wherein the primary sensor (23) is arranged in a final position and / or a final orientation. The described method is proposed to provide the best possible alignment of the primary sensor.

Description

[0001] The present invention relates to a method for adjusting at least one sensor for a projection exposure apparatus, comprising the following steps: a) providing at least one primary sensor and at least one optical module for a projection exposure apparatus, wherein at least one measurement reference is arranged on the optical module, wherein the primary sensor is configured to detect a change in the position and / or orientation of the optical module and / or the measurement reference and / or the primary sensor is configured to detect the position and / or orientation of the optical module and / or the measurement reference, b) performing a measurement by means of the primary sensor, wherein during the measurement the optical module is moved, in particular shifted, tilted and / or rotated, relative to the primary sensor and / or the primary sensor relative to the optical module,c) performing a final adjustment of the primary sensor using the measurement performed in step b), wherein the primary sensor is arranged in a final position and / or a final orientation.

[0002] The present invention further relates to a projection exposure apparatus comprising: at least one primary sensor and at least one optical module.

[0003] Microlithography is used to manufacture microstructured components, such as integrated circuits. The microlithography process is carried out, in particular, using a projection exposure system, which includes, among other things, illumination optics and / or projection optics. The structure of a mask (reticle) illuminated by the illumination optics is projected by the projection optics onto a substrate coated with a light-sensitive layer (photoresist) and arranged in the image plane of the projection optics, for example, a wafer, in particular a silicon wafer, in order to transfer the mask structure to the light-sensitive coating of the substrate.

[0004] One of the goals in the development of projection exposure systems is to lithographically create structures with increasingly smaller dimensions on the substrate, for example, to achieve higher integration densities in semiconductor components. One approach is to work with shorter wavelengths of electromagnetic radiation. For example, optical systems have been developed that use electromagnetic radiation from the so-called "deep ultraviolet" (DUV) range, preferably with operating wavelengths in the range between 150 nm and 400 nm, in particular 365 nm, 248 nm, or 193 nm, or from the extreme ultraviolet (EUV) range, preferably with operating wavelengths in the range between 5 nm and 30 nm, in particular 13.5 nm.

[0005] In order to create the structures on the substrate with the highest possible accuracy and thus maximize the yield in the microlithography process, the various components of the projection exposure system must be aligned as precisely as possible, as well as the position and / or orientation of certain components of the projection exposure system, particularly the optical modules of the projection exposure system, must be determined as precisely as possible. Without precise knowledge of the position and / or orientation of certain components, particularly the optical modules and optical elements, precise correction of imaging errors is hardly possible or even impossible.

[0006] In order to determine the position and / or orientation of the optical modules of the projection exposure system, a projection exposure system comprises a plurality of primary sensors, which are used in particular to determine the position and / or orientation of the optical modules or to determine the change in the position and / or orientation of the optical modules. Often, several such primary sensors are assigned to a single optical module. During the manufacture of a projection exposure system and the initial installation of an optical module or during the replacement of an optical module, in particular after a certain operating time of the projection exposure system, it is generally necessary to align the primary sensors assigned to the respective optical module to the optical module.A precise adjustment simplifies it, and in many cases even makes it possible to carry out a precise measurement using the respective primary sensor.

[0007] The adjustment of the respective primary sensor can be based on a target position and orientation of the respective primary sensor, whereby this target position and orientation were determined in advance during the development and design of the projection exposure system. However, when adjusting to such a target position and orientation, manufacturing tolerances, deformations, and external influences that can affect both the primary sensor itself and other components of the projection exposure system are often not taken into account. Achieving the best possible adjustment of the primary sensor in this way is often difficult or even impossible. It is also possible that the sensor has not been satisfactorily pre-adjusted, for example, by the sensor manufacturer.

[0008] Against this background, the object of the present invention is to provide a method for adjusting at least one sensor for a projection exposure apparatus and a projection exposure apparatus, each of which provides the best possible alignment of the primary sensor.

[0009] The aforementioned object is achieved by the method for adjusting at least one sensor for a projection exposure apparatus. The method comprises the following step: a) Providing at least one primary sensor and at least one optical module for a projection exposure apparatus. The optical module advantageously comprises at least one optical element, in particular at least one lens and / or at least one mirror. The optical module is provided for influencing and / or guiding exposure radiation of the projection exposure apparatus. The exposure radiation is the radiation generated by the radiation source of the projection exposure apparatus and / or provided for exposing a substrate to be arranged in the projection exposure apparatus. The primary sensor is preferably a component separate from the optical module.In the mounted state, in particular mounted on at least one frame of a projection exposure system, the primary sensor is spaced from the optical module.

[0010] It is also provided that at least one measuring reference is arranged on the optical module. The measuring reference interacts with the primary sensor during a measurement and simplifies the measurement; in some cases, it even makes the measurement possible in the first place, since the measuring reference provides a, in particular unambiguous, reference for the measurement. The measuring reference can be designed, for example, as a measuring surface and / or a measuring grid. The measuring reference can be a component of the optical module or a separate component. The measuring reference is preferably firmly and / or rigidly connected to the optical module, in particular glued.

[0011] It is also provided that the primary sensor is configured to detect a change in the position and / or orientation of the optical module and / or the measurement reference and / or that the primary sensor is configured to detect the position and / or orientation of the optical module and / or the measurement reference. In this way, in particular during operation of a projection exposure system, the exact position and / or orientation of the optical module can be determined and, based on this, precise changes to the position and / or orientation of the optical module can be carried out in order to correct imaging errors. In addition, a measurement by means of the primary sensor can be used to adjust the primary sensor itself. The primary sensor can detect the change in the position and / or orientation of the optical module and / or the measurement reference absolutely and / or relative to the primary sensor.Alternatively or additionally, the primary sensor can detect the position and / or orientation of the optical module and / or the measurement reference absolutely and / or relative to the primary sensor. Detection involves, in particular, measuring changes in the position and / or orientation of the optical module and / or the measurement reference and / or measuring the position and / or orientation of the optical module and / or the measurement reference.

[0012] The method further comprises the step: b) performing a measurement using the primary sensor, wherein during the measurement, the optical module is moved relative to the primary sensor and / or the primary sensor is moved relative to the optical module, in particular shifted, tilted, and / or rotated. Performing the measurement in step b) preferably comprises capturing and / or storing at least part of the measurement signal, in particular the complete measurement signal, of the primary sensor. The measurement signal can include the signal curve of the amplitude, the phase, and / or the offset.The final position and / or final orientation of the primary sensor, and thus in particular an optimal position and / or orientation of the primary sensor, can be determined precisely and easily by means of the measurement carried out during movement, in particular by means of the measurement signal of the primary sensor acquired during movement, and for example the information about the position and / or orientation of the optical module and / or the primary sensor during movement. The primary sensor should in particular be arranged in the position and / or orientation in which the measurement signal, in particular the amplitude of the measurement signal, of the primary sensor is as high as possible, in particular essentially at its maximum, when the optical module is in its basic position and / or basic orientation. In some cases, optimal adjustment may also require that the phase and / or offset of the measurement signal lie within a tolerance range.The home position and / or home orientation is preferably the position and / or orientation of the optical module in which the optical module is in its zero position, in particular when mounted in a projection exposure system. Even if only the optical module is moved in step b), the final position and / or final orientation of the primary sensor can be precisely determined, since the best possible position and / or orientation of the primary sensor can be deduced using the information about the position and / or orientation of the optical module acquired in step b) during the movement of the optical module. If the optical module is moved relative to the primary sensor, the measurement reference, in particular corresponding to the optical module, is advantageously also moved relative to the primary sensor.The position and / or orientation of the optical module can be controlled, regulated and / or detected in step b). The detection can take place by means of at least one secondary sensor. The at least one secondary sensor is in particular the at least one secondary sensor which will be discussed below. It can be provided that the primary sensor detects the change in the position and / or orientation of the measurement reference in step b) and / or that the primary sensor detects the position and / or orientation of the measurement reference in step b). While the optical module is moved relative to the primary sensor, it can be provided that the primary sensor is not moved and / or is stationary. Alternatively or additionally, it can be provided that the optical module is not moved and / or is stationary while the primary sensor is moved relative to the optical module.It can be provided that in step b), preferably during the measurement and / or mounted in a projection exposure system, the optical module and / or the primary sensor is moved, in particular substantially completely, along at least one, preferably at least two, in particular at least three, translational degrees of freedom and / or at least one, preferably at least two, in particular at least three, rotational degrees of freedom of the optical module and / or the primary sensor. This simplifies the determination of the final position and / or final orientation of the primary sensor, since during step b), the measurement signal is recorded for substantially the entire adjustment range of the optical module and / or the primary sensor.It can be provided that the optical module and / or the primary sensor is moved at least temporarily, in particular substantially completely, successively and / or simultaneously along at least two translational and / or rotational degrees of freedom. A movement along at least one translational degree of freedom is preferably a movement along the X-axis, Y-axis and / or Z-axis. A movement along at least one rotational degree of freedom is preferably a movement, in particular rotation, about the X-axis, Y-axis and / or Z-axis. The X-axis, Y-axis and Z-axis form a Cartesian coordinate system. The Z-axis can extend at least partially through the primary sensor, the measurement reference and / or the optical module. Preferably, the X-axis and / or the Y-axis lie in a plane with the measurement reference. The X-axis and / or the Z-axis advantageously correspond to the measurement direction of the primary sensor.During step b), in particular during the measurement using the primary sensor, the optical module and / or the primary sensor can be moved along the Z-axis, rotated around the X-axis and / or rotated around the Y-axis. Other or further movements along and / or around the respective axes are also possible, but depend at least in part on the type of primary sensor to be adjusted. The method also comprises the step: c) carrying out a final adjustment of the primary sensor using the measurement carried out in step b), wherein the primary sensor is arranged in a final position and / or a final orientation. As a result, the sensor is arranged in the most optimal position and / or orientation possible.In step c), the primary sensor can be adjusted in particular relative to a frame of the projection exposure system, in particular the sensor frame and / or the force frame, the optical module and / or the measurement reference. In particular, adjustment relative to the sensor frame is preferred. The arrangement in the final position and / or final orientation can be carried out in different ways, for example by arranging or replacing a final alignment element. The primary sensor is preferably arranged in step c) on at least one frame of a projection exposure system, in particular the sensor frame and / or force frame of a projection exposure system. Step c) takes place in particular after step a) and / or after step b).

[0013] The sensor frame within the meaning of the present disclosure is a structure that essentially does not participate in the static or dynamic loads acting on the components of the projection exposure system. The sensor frame therefore essentially only supports itself and the components required for the sensor system, in particular the at least one primary sensor and / or the at least one secondary sensor. The sensor frame is typically largely mechanically decoupled from the remaining structure of the projection exposure system and thus represents a reliable reference for determining the position and / or orientation of the components involved. The force frame is understood to be the mechanical support structure of the optical module, in particular of all optical modules.On the one hand, the force frame absorbs the static loads, which result in particular from the gravitational force acting on the optical modules involved, and on the other hand, the force frame also absorbs dynamic loads, for example from positioning and / or orientation movements of the optical modules.

[0014] In the context of the present application, the “orientation” of an object, such as a component or assembly, is understood to mean the angular position of the component or assembly with respect to one or more independent axes of rotation, while the “position” is understood to mean the arrangement of the component or assembly along independent spatial directions of a coordinate system.

[0015] In one embodiment of the method, it is provided that in step b) the optical module and / or the primary sensor is moved by means of at least one manipulator, in particular a projection exposure system. This allows the optical module and / or the primary sensor to be moved precisely. Furthermore, this may make it possible to dispense with additional equipment for the movement in step b) or at least to reduce the equipment required, since in particular the optical module is already connected to manipulators in the mounted state in a projection exposure system. The at least one manipulator can be at least one manipulator arranged in a projection exposure system and / or a manipulator provided for manipulating the optical module and / or the primary sensor, in particular during operation of the projection exposure system.

[0016] The term "manipulator" herein preferably refers to optomechanical, electromechanical and / or electrical devices that are particularly intended to actively influence individual optical elements, groups of optical elements, optical modules and / or groups of optical modules on the basis of at least one control signal in order to change the optical effect of these elements, groups of elements, modules and / or groups of modules in the projection beam path of a projection exposure system. Manipulators are also frequently provided, for example to displace, tilt and / or deform the mask and / or the substrate. The manipulators are generally adjusted so that imaging errors detected by measurement can be specifically corrected.

[0017] In one embodiment of the method, it is provided that in step b), in particular during the measurement by means of the primary sensor, the optical module and / or the primary sensor is moved along at least one translational and / or rotational degree of freedom of the optical module and / or the primary sensor and that, preferably, the primary sensor has its highest measurement sensitivity along the at least one translational and / or rotational degree of freedom of the optical module and / or the primary sensor. This simplifies the determination of the optimal position and / or orientation of the primary sensor relative to the optical module, since during step b) the measurement signal is recorded for at least part of the adjustment range of the optical module and / or the primary sensor. Based on this measurement signal, the final position and / or final orientation for the primary sensor can then be determined very precisely.By performing a movement along the at least one degree of freedom at which the primary sensor has its highest measurement sensitivity, a movement occurs along the degree(s) of freedom along which the primary sensor is intended to detect a position and / or orientation or a change in the position and / or orientation during operation of a projection exposure system. This simplifies precise adjustment for the most relevant degrees of freedom. In step b), the optical module can preferably be moved from the basic position and / or basic orientation of the optical module along at least one translational degree of freedom and / or at least one rotational degree of freedom of the optical module.

[0018] Alternatively or additionally, it can be provided that in step b), in particular during the measurement by means of the primary sensor, the optical module and / or the primary sensor is moved in the direction of at least one position and / or orientation that can be maximally achieved along at least one translational degree of freedom and / or at least one rotational degree of freedom of the optical module and / or the primary sensor and / or that in step b), in particular during the measurement by means of the primary sensor, the optical module and / or the primary sensor is in at least one position and / or orientation that can be maximally achieved along at least one translational degree of freedom and / or at least one rotational degree of freedom of the optical module and / or the primary sensor.

[0019] In the present disclosure, the maximum achievable position and / or orientation is in particular the position and / or orientation that the optical module and / or the primary sensor can achieve in the mounted state in a projection exposure apparatus, in particular by moving by means of at least one manipulator of the projection exposure apparatus.

[0020] In one embodiment of the method, it is provided that the method comprises the following step: d) determining the final position and / or the final orientation of the primary sensor and / or determining at least one final alignment element for the primary sensor. Step d) can take place after step a), after step b) and / or before step c). The determination of the final position and / or the final orientation of the primary sensor and / or the determination of at least one final alignment element for the primary sensor can take place at least partially, preferably substantially completely, automatically, in particular by means of a computer program, and / or comprise a graphical evaluation, preferably of the measurement signal of the primary sensor acquired in step b). Corresponding alignment elements are also referred to as "spacers".The final alignment element is preferably arranged on the primary sensor and / or on at least one frame of a projection exposure system, in particular the sensor frame, and in particular has a geometry adapted to the final position and / or final orientation of the primary sensor.

[0021] In one embodiment of the method, it is provided that in step d), the final position and / or the final orientation of the primary sensor is determined using the measurement performed in step b), preferably using the measurement signal of the primary sensor during the measurement performed in step b), and / or that in step d), the final alignment element is determined using the measurement performed in step b), preferably using the measurement signal of the primary sensor during the measurement performed in step b). This allows the final position and / or final orientation of the primary sensor to be precisely determined.Alternatively or additionally, it can be provided that the final position and / or the final orientation of the primary sensor is determined based on the position and / or orientation of the primary sensor and / or the optical module in step b) and / or is determined based on the difference between the position and / or orientation of the primary sensor and / or the optical module and the zero position of the optical module in step b), wherein, preferably, the position and / or orientation of the primary sensor and / or the optical module in step b) and / or the difference between the position and / or orientation of the primary sensor and / or the optical module and the zero position of the optical module in step b) is determined using the measurement carried out in step b), preferably using the measurement signal of the primary sensor during the measurement in step b).The determination of the final position and / or the final orientation of the primary sensor and / or the determination of the final alignment element can be carried out using the amplitude, in particular the maximum of the amplitude, of the measurement signal acquired in step b). As already explained, the primary sensor should in particular be arranged in the position and / or orientation in which the measurement signal, in particular the amplitude of the measurement signal, of the primary sensor is as high as possible, in particular essentially at its maximum, when the optical module is in its basic position and / or basic orientation. In some cases, optimal adjustment may require that the phase and / or the offset of the measurement signal lie within a tolerance range. Alternatively or additionally, it can be provided that in step d) the final position and / or the final orientation of the primary sensor is determined using a virtual model.The virtual model can take into account, in particular include, at least part of the measurement signal, preferably the entire measurement signal, of the primary sensor during the measurement carried out in step b). The virtual model can take into account, in particular include, the position and / or orientation of the primary sensor and / or the optical module in step b) and / or the difference between the position and / or orientation of the primary sensor and / or the optical module and the zero position of the optical module in step b). The virtual model can include at least one piece of geometric information about an initial alignment element, which is preferably arranged on the primary sensor. The virtual model can also contain at least one piece of information, in particular geometric information, about potential alignment elements, wherein the final alignment element is preferably selected from the potential alignment elements.

[0022] In one embodiment of the method, it is provided that the method comprises the following step: e) determining an initial position and / or an initial orientation of the primary sensor and / or determining at least one initial alignment element for the primary sensor, wherein the primary sensor in the initial position and / or the initial orientation can detect a change in the position and / or orientation of the optical module and / or the measurement reference and / or the primary sensor in the initial position and / or the initial orientation can detect the position and / or orientation of the optical module and / or the measurement reference. In order to be able to carry out a measurement in step b), among other things, it is often necessary to first position and orient the primary sensor in such a way that a meaningful measurement or even any measurement can be carried out using the sensor.Therefore, the initial position and / or initial orientation or an initial alignment element must first be determined. Step e) preferably takes place before step b), before step c), and / or before step d). The initial alignment element is preferably arranged on the primary sensor and / or on at least one frame of a projection exposure system, in particular the sensor frame, and in particular has a geometry adapted to the initial position and / or initial orientation of the primary sensor.

[0023] The term "final" and the term "initial" in the present disclosure serve only to distinguish between different features, for example the final alignment element and the initial alignment element, and are generally not to be interpreted in a restrictive manner, in particular with regard to the number and / or order of the features described thereby, unless otherwise described in the present disclosure.

[0024] In one embodiment of the method, it is provided that in step e) the initial position and / or the initial orientation of the primary sensor is determined using at least one piece of geometric information of the optical module, the primary sensor, the measurement reference, at least one frame of a projection exposure system and / or at least one connection element of a projection exposure system and / or in step e) the initial alignment element is determined using at least one piece of geometric information of the optical module, the primary sensor, the measurement reference, at least one frame of a projection exposure system and / or at least one connection element of a projection exposure system and that, preferably, the at least one piece of geometric information is determined by means of a measurement, in particular using a coordinate measuring machine.This makes it easier to determine an initial position, an initial orientation and / or an initial alignment element that are already relatively close to the final position, the final orientation and / or the initial alignment element. On the one hand, this makes it easier to capture a good or even a usable measurement signal from the primary sensor in step b), since this means that the primary sensor is arranged at least in the area in which the position and / or orientation or a change in the position and / or orientation of the optical module and / or the measurement reference can be captured by the primary sensor. In step c), moreover, often only a slight change in the position and / or orientation of the primary sensor is then necessary. The at least one frame of a projection exposure system can be the force frame and / or the sensor frame of a projection exposure system.The geometric information can be determined in particular by means of a measurement, preferably a survey, in particular using a coordinate measuring machine, the optical module, the primary sensor, the measurement reference, the at least one frame of a projection exposure system and / or the at least one connection element of a projection exposure system.

[0025] A "connection element" within the meaning of the present disclosure is preferably provided for the connection, in particular operative connection, and / or coupling of components of a projection exposure system. The connection element can be a separate component and / or a component of a component of the projection exposure system. A corresponding connection element is also referred to as an "interface."

[0026] Geometry information within the meaning of the present disclosure preferably comprises at least one piece of information about the geometry, the position and / or the orientation of the respective component.

[0027] In one embodiment of the method, it is provided that in step e) the initial position and / or the initial orientation of the primary sensor is determined by means of a virtual model, preferably comprising at least one piece of geometric information of the optical module, the primary sensor, the measurement reference, at least one frame of a projection exposure system and / or at least one connection element of a projection exposure system, and / or that in step e) the initial alignment element is determined by means of a virtual model, preferably comprising at least one piece of geometric information of the optical module, the primary sensor, the measurement reference, at least one frame of a projection exposure system and / or at least one connection element of a projection exposure system.This also makes it easier to capture a good or even usable measurement signal from the primary sensor in step b), since the virtual model can process a large amount of information, in particular geometric information, from various components, thus facilitating precise determination of the initial position, the initial orientation, and / or the initial alignment element. The at least one frame of a projection exposure system can be the force frame and / or the sensor frame of a projection exposure system. The at least one piece of geometric information of the optical module, the primary sensor, the measurement reference, at least one frame of a projection exposure system, and / or at least one connection element of a projection exposure system is, in particular, the at least one piece of geometric information determined by means of a measurement, in particular using a coordinate measuring machine.The virtual model can also include at least one piece of information, in particular at least one piece of geometric information, of further optical modules, sensors, frames of a projection exposure system, and / or connecting elements of a projection exposure system. Alternatively or additionally, the virtual model can contain at least one piece of information, in particular geometric information, about potential alignment elements, wherein the initial alignment element is preferably selected from the potential alignment elements.

[0028] In one embodiment of the method, it is provided that the method comprises the following step: f) performing an initial adjustment of the primary sensor, wherein, preferably, the primary sensor is arranged in the initial position and / or the initial orientation and / or wherein, preferably, the initial alignment element is arranged on the primary sensor. In order to be able to perform a measurement in step b), among other things, it is often necessary to first position and orient the primary sensor in such a way that a meaningful measurement or any measurement at all can be performed using the primary sensor. Therefore, an initial adjustment of the primary sensor is advantageous. In step f), the primary sensor can be adjusted in particular relative to a frame of the projection exposure system, in particular the sensor frame and / or the force frame, the optical module and / or the measurement reference.The primary sensor is preferably arranged in step f) on at least one frame of a projection exposure system, in particular the sensor frame and / or force frame of a projection exposure system. In step f), the primary sensor can be arranged in the initial position and / or initial orientation using at least one reference element, in particular at least one stop element, and / or in step f), the initial alignment element can be arranged on at least one reference element, in particular at least one stop element. This simplifies the initial adjustment. Step f) takes place in particular before step b), before step c), before step d) and / or after step e).

[0029] In one embodiment of the method, it is provided that in step c), the position and / or orientation of the primary sensor is changed, preferably relative to the initial position and / or the initial orientation of the primary sensor, that in step c), the final alignment element is arranged on the primary sensor, and / or that in step c), the initial alignment element is exchanged with the final alignment element. This allows the primary sensor to be easily adjusted.

[0030] In one embodiment of the method, it is provided that the method comprises the following step: g) checking the final adjustment carried out in step c), wherein a measurement is carried out by means of the primary sensor, and wherein the optical module is moved, in particular relative to the primary sensor. This ensures that the final adjustment carried out in step c) has arranged the primary sensor in the best possible position and / or orientation. Step g) takes place in particular after step a), step b), step c), step d), step e) and / or step f). In step g), the optical module can be moved by means of at least one manipulator, in particular a projection exposure system.The at least one manipulator can be at least one manipulator arranged in a projection exposure system and / or a manipulator provided for manipulating the optical module, in particular during operation of the projection exposure system. Additional equipment can thus be dispensed with, or at least the equipment required to move the optical module can be reduced. Preferably, in step g), the change in the position and / or orientation of the optical module is detected by means of the primary sensor, and / or in step g), the position and / or orientation of the optical module is detected by means of the primary sensor.It can be provided that in step g), preferably during the measurement of the primary sensor and / or mounted in a projection exposure system, the optical module is moved, in particular substantially completely, along at least one, preferably at least two, in particular at least three, translational degrees of freedom and / or at least one, preferably at least two, in particular at least three, rotational degrees of freedom of the optical module and / or the primary sensor. This simplifies checking the final position and / or final orientation of the primary sensor, since during step g), the measurement signal is recorded for substantially the entire adjustment range of the optical module.It can be provided that the optical module is moved at least temporarily, in particular substantially completely, successively and / or simultaneously along at least two translational and / or rotational degrees of freedom. Performing the measurement in step g) preferably comprises capturing and / or storing at least part of the measurement signal, in particular the complete measurement signal, of the primary sensor.

[0031] In one embodiment of the method, it is provided that in step g), in particular during the measurement by means of the primary sensor, the optical module is moved in the direction of at least one position and / or orientation that can be maximally achieved along at least one translational and / or rotational degree of freedom of the optical module and / or that in step g), in particular during the measurement by means of the primary sensor, the optical module is in at least one position and / or orientation that can be maximally achieved along at least one translational and / or rotational degree of freedom of the optical module. This makes it easier to check the final adjustment, since during step g), the measurement signal of the primary sensor is recorded for essentially the entire adjustment range of the optical module, in particular also the maximum achievable positions and / or orientations.In step g), the optical module can preferably be moved from the basic position and / or basic orientation of the optical module toward at least one position and / or orientation that can be maximally achieved along at least one translational degree of freedom and / or at least one rotational degree of freedom of the optical module. Performing the measurement in step g) preferably comprises capturing and / or storing at least part of the measurement signal, in particular the complete measurement signal, of the primary sensor.Advantageously, in step g), in particular during the measurement by means of the primary sensor, the optical module is moved along at least one, preferably at least two, in particular at least three, translational and / or at least one, preferably at least two, in particular at least three, rotational degrees of freedom of the optical module into the maximum achievable position and / or orientation along the respective degree of freedom. It can be provided that the optical module is moved at least temporarily, in particular substantially completely, successively and / or simultaneously along at least two translational and / or rotational degrees of freedom.

[0032] In one embodiment of the method, it is provided that in step b) and / or step g) a measurement is carried out by means of at least one secondary sensor, that the secondary sensor is set up to detect a change in the position and / or orientation of at least one part of the manipulator, the position and / or orientation of at least one part of the manipulator, a change in the position and / or orientation of the optical module and / or the position and / or orientation of the optical module, and that, preferably, in step b) and / or step g) the position and / or orientation of the optical module is controlled and / or regulated based on the measurement of the secondary sensor. By using a sensor other than the primary sensor to control or regulate the position and / or orientation of the optical module, precise, and often functional, control and / or regulation is achieved.Control of the position and / or orientation of the optical module is not achieved because the primary sensor is not yet sufficiently adjusted and does not provide a measurement signal or its measurement signal cannot be used for precise control or regulation of the position and / or orientation of the optical module. In particular, the primary sensor and the secondary sensor are different sensors, the primary sensor and the secondary sensor function independently of one another and / or the primary sensor has a higher measurement resolution than the secondary sensor. The secondary sensor thus enables measurement that is detached from the primary sensor. The secondary sensor can be arranged on the at least one manipulator.Preferably, in step b) and / or step g), the change in the position and / or orientation of at least one part of the manipulator, the position and / or orientation of at least one part of the manipulator, the change in the position and / or orientation of the optical module and / or the position and / or orientation of the optical module are detected by means of the secondary sensor. Based on the detected change in the position and / or orientation of at least one part of the manipulator and / or the detected position and / or orientation of at least one part of the manipulator, the change in the position and / or orientation of the optical module and / or the position and / or orientation of the optical module can in turn be determined. Carrying out the measurement in step b) and / or step g) preferably comprises detecting and / or storing at least one part of the measurement signal of the secondary sensor.

[0033] In one embodiment of the method, it is provided that the method comprises the following step: h) checking the final adjustment carried out in step c), wherein a measurement is carried out using the primary sensor, and wherein the optical module is moved, in particular relative to the primary sensor. This ensures that the final adjustment carried out in step c) has arranged the primary sensor in the best possible position and / or orientation. In step h), the final adjustment of the majority of the, in particular each, optical module of a projection exposure system is preferably checked. This allows acceptance of the respective primary sensors for all optical modules of a projection exposure system. Step h) preferably takes place after step a), step b), step c), step d), step e), step f) and / or step g).In step h), the optical module can be moved by means of at least one manipulator, in particular a projection exposure system. The at least one manipulator can be at least one manipulator arranged in a projection exposure system and / or a manipulator provided for manipulating the optical module and / or the primary sensor, in particular during operation of the projection exposure system. Additional equipment can thus be dispensed with or at least the equipment required to move the optical module can be reduced. It can be provided that in step h), the primary sensor detects the change in the position and / or orientation of the optical module and / or the measurement reference and / or that in step h), the primary sensor detects the position and / or orientation of the optical module and / or the measurement reference.The optical module is advantageously moved while the measurement is carried out by means of the primary sensor in step h). It can be provided that in step h), preferably during the measurement and / or mounted in a projection exposure system, the optical module is moved, in particular substantially completely, along at least one, preferably at least two, in particular at least three, translational degrees of freedom and / or at least one, preferably at least two, in particular at least three, rotational degrees of freedom of the optical module and / or the primary sensor. This makes it easier to check the final position and / or final orientation of the primary sensor, since during step h) the measurement signal is recorded for substantially the entire adjustment range of the optical module.It can be provided that the optical module is moved at least temporarily, in particular substantially completely, successively and / or simultaneously along at least two translational and / or rotational degrees of freedom.

[0034] In one embodiment of the method, it is provided that in step h), in particular during the measurement by means of the primary sensor, the optical module is moved in the direction of at least one position and / or orientation that can be maximally achieved along at least one translational and / or rotational degree of freedom of the optical module and / or that in step h), in particular during the measurement by means of the primary sensor, the optical module is in at least one position and / or orientation that can be maximally achieved along at least one translational and / or rotational degree of freedom of the optical module. This makes it easier to check the final adjustment, since during step h), the measurement signal of the primary sensor is recorded for essentially the entire adjustment range of the optical module, in particular also the maximum achievable positions and / or orientations.In step h), the optical module can preferably be moved from the basic position and / or basic orientation of the optical module toward at least one position and / or orientation that can be maximally achieved along at least one translational degree of freedom and / or at least one rotational degree of freedom of the optical module. Performing the measurement in step h) preferably comprises capturing and / or storing at least part of the measurement signal, in particular the complete measurement signal, of the primary sensor.Advantageously, in step h), in particular during the measurement by means of the primary sensor, the optical module is moved along at least one, preferably at least two, in particular at least three, translational and / or at least one, preferably at least two, in particular at least three, rotational degrees of freedom of the optical module into the maximum achievable position and / or orientation along the respective degree of freedom. It can be provided that the optical module is moved at least temporarily, in particular substantially completely, successively and / or simultaneously along at least two translational and / or rotational degrees of freedom.

[0035] In one embodiment of the method, it is provided that in step h), the position and / or orientation of the optical module is controlled and / or regulated based on the measurement of the primary sensor. This makes it possible to check whether the adjustment of the primary sensor has achieved the desired result. Furthermore, it is possible to check whether the primary sensor is malfunctioning or has been incorrectly connected. In contrast to step g), in step h), the position and / or orientation of the optical module is preferably not controlled and / or regulated based on the measurement of the secondary sensor.

[0036] In one embodiment of the method, it is provided that in step b), step c), step d), step e), step f), step g) and / or step h), the optical module and / or the primary sensor is arranged at least temporarily on at least one frame, in particular of a projection exposure system. The frame can, on the one hand, form a reliable reference for determining the position and / or orientation of the components of the projection exposure system and, on the other hand, absorb the static loads, which arise, for example, from the force of gravity, as well as the dynamic loads, for example from positioning and / or orientation movements of the components of the projection exposure system. The at least one frame of a projection exposure system can be the force frame and / or the sensor frame of a projection exposure system.The optical module and / or the primary sensor can preferably be arranged substantially permanently on at least one frame, in particular a projection exposure system, in step b), step c), step d), step e), step f), step g) and / or step h).

[0037] Alternatively or additionally, in step b), step c), step d), step e), step f), step g) and / or step h) the optical module and / or the sensor can be mounted in a projection exposure system.

[0038] Alternatively or in addition to the method described above, the method described below can be carried out to facilitate precise and simple adjustment of a primary sensor, in particular relative to a measurement reference: Method for assigning a primary sensor for a projection exposure system to a measurement reference, comprising the following steps: aa) Providing a primary sensor and a measurement reference, bb) arranging the primary sensor and / or the measuring reference in a respective target position and / or target orientation, cc) performing a measurement using the primary sensor against the measurement reference and / or performing a measurement of the primary sensor and / or the measurement reference, and dd) Assigning the primary sensor to the measurement reference.

[0039] The primary sensor and / or the measurement reference provided in step aa) may in particular be the at least one sensor and / or the at least one measurement reference provided in step a).

[0040] In step bb), the primary sensor and / or the measurement reference can be arranged in a measuring stand. In this measuring stand, the primary sensor and the measurement reference are arranged, preferably relative to each other, in the respective target position and / or target orientation. The measuring stand simplifies the arrangement in the respective target position and / or target orientation.

[0041] In step cc), at least one piece of information about the primary sensor and / or the measurement reference is determined during the measurement and / or the survey carried out. In particular, the offset between the primary sensor and the measurement reference is determined, the offset of the primary sensor and / or the measurement reference to the respective target position and / or target orientation is determined, and / or at least one piece of geometric information about the primary sensor and / or the measurement reference is determined. In step cc), the primary sensor and / or the measurement reference is arranged, preferably in the measuring stand, in the respective target position and / or target orientation.

[0042] The assignment in step dd) achieves a consistent logical assignment of primary sensor to measurement reference for subsequent adjustment or arrangement of the primary sensor and / or the measurement reference, which assignment is also retained for further subsequent steps if necessary. Each primary sensor therefore has its assigned measurement reference. The at least one piece of information obtained in step cc) can be used for further steps, for example the adjustment of the primary sensor and / or the measurement reference. An initial adjustment of the primary sensor can be dispensed with if necessary using this at least one piece of information, since based on the at least one piece of information obtained in step cc), the primary sensor and / or the measurement reference can be arranged directly in the best possible position and / or orientation.

[0043] The method for assigning a primary sensor for a projection exposure apparatus to a measurement reference may additionally comprise further steps, for example the following step: ee) determining a final position and / or final orientation of the primary sensor and / or the measurement reference using the measurement and / or survey performed in step cc) and / or determining a final alignment element using the measurement and / or survey performed in step cc). The final alignment element determined in step ee) is preferably arranged on the primary sensor and / or on at least one frame of a projection exposure apparatus, in particular the sensor frame, and in particular has a geometry adapted to the final position and / or final orientation of the primary sensor.The determination in step ee) can be carried out using a virtual model, preferably comprising at least one piece of geometric information about the optical module, the primary sensor, the measurement reference, at least one frame of a projection exposure system, and / or at least one connection element of a projection exposure system. Alternatively or additionally, the virtual model can comprise the at least one piece of information determined in step cc).Preferably, the virtual model alternatively or additionally comprises the position and / or orientation of the measurement reference relative to an optical module, the position and / or orientation of the optical module relative to at least one frame of a projection exposure system, preferably a first frame of a projection exposure system, in particular the force frame of a projection exposure system, the position and / or orientation of a sensor receptacle relative to at least one frame of a projection exposure system, preferably a second frame of a projection exposure system, in particular the sensor frame of a projection exposure system, and / or the position and / or orientation of the primary sensor relative to the measurement reference. The sensor receptacle is in particular arranged on the sensor frame and / or the measurement reference is arranged on the optical module.The optical module, the at least one frame of a projection exposure system, in particular the sensor frame and / or the force frame, the at least one connection element of a projection exposure system and / or the sensor holder is preferably provided to be connected to the primary sensor and / or the measurement reference.

[0044] The method for assigning a primary sensor for a projection exposure system to a measurement reference can further comprise the following step: ff) performing a final adjustment of the primary sensor, wherein, preferably, the primary sensor and / or the measurement reference is arranged in the respective final position and / or the final orientation and / or wherein, preferably, the final alignment element is arranged on the primary sensor. Step ff) preferably takes place after step ee).

[0045] The aforementioned object is further achieved by a projection exposure system comprising: at least one primary sensor and at least one optical module, characterized in that the primary sensor is adjusted relative to the optical module according to the method according to one of claims 1 to 17. This provides a projection exposure system which comprises a primary sensor aligned as best as possible.

[0046] Further features and advantages of the method and the projection exposure system will become apparent from the following description of embodiments, with reference to the attached drawing.

[0047] The drawing shows: Fig. 1 the basic structure of a projection exposure system, Fig. 2 an optical module, wherein several measuring references are arranged on the optical module, and several primary sensors in a perspective view, Fig. 3 a section of the optical module from Fig. 2 and one of the primary sensors from Fig. 2 in a perspective view, Fig. 4 the optical module Fig. 2 mounted in a projection exposure system in a side view, and Fig. 5 a flowchart of a method for adjusting at least one primary sensor.

[0048] Fig. 1 shows, by way of example, the basic structure of an EUV projection exposure system 1 for microlithography, for which the disclosed method is used. An illumination system of the projection exposure system 1 comprises, in addition to a radiation source 3, illumination optics 4 for illuminating an object field 5 in an object plane 6. EUV radiation 14 generated by the radiation source 3 as exposure radiation is aligned by means of a collector integrated in the radiation source 3 such that it passes through an intermediate focus in the region of an intermediate focal plane 15 before impinging on an optical module in the form of a field facet mirror 2. After the field facet mirror 2, the EUV radiation 14 is reflected by an optical module in the form of a pupil facet mirror 16.With the aid of the pupil facet mirror 16 and an optical assembly 17 with a plurality of optical modules, wherein the optical modules each comprise at least one mirror 18, 19, 20, field facets of the field facet mirror 2 are imaged into the object field 5. A reticle 7 arranged in the object field 5 and held by a schematically illustrated reticle holder 8 is illuminated. A projection optics 9, illustrated only schematically, serves to image the object field 5 into an image field 10 in an image plane 11. A structure on the reticle 7 is imaged onto a light-sensitive layer of a wafer 12 arranged in the region of the image field 10 in the image plane 11, which is held by a wafer holder 13, also illustrated in detail. The radiation source 3 can emit exposure radiation preferably in a wavelength range between 5 nm and 30 nm, particularly preferably 13.5 nm.

[0049] The disclosed method can also be used for a DUV system, which is not shown. A DUV system can, in principle, be constructed like the EUV projection exposure system 1 described above, wherein mirrors and lenses can be used as optical elements in a DUV projection exposure system, and the radiation source of a DUV projection exposure system emits exposure radiation in a wavelength range from 150 nm to 400 nm.

[0050] Fig. 2 shows an optical module 21, wherein a plurality of measurement references 22 are arranged on the optical module 21, and a plurality of primary sensors 23 in a perspective view. The optical module 21 can be one of the previously described optical modules, wherein the optical module 21 can be mounted in particular in the previously described projection exposure system 1. The Fig. The optical module 21 shown in Figure 2 has a mirror 24 as an optical element, wherein the mirror 24 is provided for guiding exposure radiation, preferably EUV radiation 14 in the case of use of the optical module 21 in an EUV projection exposure system 1.

[0051] Several measurement references 22 are arranged, in particular glued, on the sides of the optical module 21. In this case, the measurement references 22 are designed as a measurement grid. The measurement references 22 each interact with a primary sensor 23, with a primary sensor 23 being arranged opposite a measurement reference 22. The following can be seen in Fig. 2 only two measuring references 22 and two primary sensors 23, however, more or fewer measuring references 22 and primary sensors 23 can also be provided, for example six measuring references 22 and six primary sensors 23 per optical module 21. The primary sensors 23 are configured to detect a change in the position and / or orientation of the measuring reference 22 and thus of the optical module 21 and / or are configured to detect the position and / or orientation of the measuring reference 22 and thus of the optical module 21. By means of the measuring signals detected by the primary sensors 23, a precise correction of imaging errors can be achieved during operation of the projection exposure system 1 by changing the position and / or orientation of the optical module 21.

[0052] In order to change the position and / or orientation of the optical module 21, i.e. to move the optical module 21, the projection exposure system 1 comprises a plurality of manipulators 25. In the Fig. In the optical module 21 shown in Figure 2, several connecting elements 26 are provided for interaction with the manipulators 25 and are shown schematically.

[0053] At the Fig. 2, initial alignment elements 27a are arranged in order to arrange the primary sensors 23 in an initial position and an initial orientation. The respective initial alignment element 27a is arranged on a frame of the projection exposure system 1. The frame is in Fig. 2, however, not shown. In the initial position and initial orientation, the respective primary sensor 23 is arranged relative to the associated measurement reference 22 such that a measurement of the position and / or orientation or the change in the position and / or orientation of the measurement reference 22 or of the optical module 21 can be detected by means of the primary sensor 23. The initial position and the initial orientation are determined, for example, using a virtual model, wherein this virtual model comprises the geometric information of several components of the projection exposure system 1, for example at least one piece of geometric information of the optical module 21, the primary sensor 23, the measurement reference 22, at least one frame of the projection exposure system 1 and / or at least one connection element 26 of the projection exposure system 1.This geometric information can be determined in advance by measuring, in particular by surveying, the corresponding components of the projection exposure system 1 using a coordinate measuring machine. Based on the determined initial position and initial orientation, the respective initial alignment element 27a is then determined. However, the primary sensor 23 is generally not yet optimally aligned in the initial position and initial orientation. Therefore, a further adjustment step is performed, as explained in connection with the following figures.

[0054] Fig. 3 shows a section of the optical module 21 from Fig. 2 and one of the primary sensors 23 from Fig. 2 in a perspective view. Also shown are the translational degrees of freedom X, Y, Z and the rotational degrees of freedom R X , R Y , R Zof the optical module 21 along which the optical module 21 can be moved, in particular by means of the manipulators 25. Alternatively or additionally, the primary sensor 23 could also be moved; however, the following will focus on a movement of the optical module 21.

[0055] In order to determine the best possible position and orientation of the primary sensor 23, the optical module 21 is, in particular substantially completely, moved along at least one translational degree of freedom X, Y, Z and / or at least one rotational degree of freedom R X , R Y , R Zof the optical module 21, and during this time, a measurement is performed using the primary sensor 23. The measurement signal of the primary sensor 23 is recorded during the measurement. For example, the optical module 21 can first be moved along the Z-axis (movement along the translational degree of freedom Z), then rotated around the X-axis (movement along the rotational degree of freedom Rx), and subsequently rotated around the Y-axis (movement along the rotational degree of freedom R Y ). Which movements are carried out depends, among other things, on the type of primary sensor 23 used. In particular, the extent to which a movement of the primary sensor 23 in the direction of one of the degrees of freedom X, Y, Z, R X , R Y , R Zthe measurement signal of the primary sensor 23 changes, in other words, it depends on the measurement sensitivity of the primary sensor 23. A particularly strong change in the measurement signal of the primary sensor 23 can occur when the optical module 21 moves in the direction of a certain degree of freedom X, Y, Z, Rx, R Y , Rz, it is advisable to position the optical module 21 in the direction of this degree of freedom X, Y, Z, Rx, R Y, Rz during the measurement. The primary sensor 23 should in particular be arranged in the position and / or orientation in which the measurement signal, in particular the amplitude of the measurement signal, of the primary sensor 23 is as high as possible, in particular essentially at its maximum, when the optical module 21 is in its basic position and / or basic orientation. In some cases, for optimal adjustment, it may also be necessary for the phase and / or offset of the measurement signal to lie within a tolerance range. Based on this measurement, the final position and final orientation of the primary sensor 23 can then be determined, on which basis, in turn, a final alignment element 27b for the primary sensor 23 can be determined.The determination of the final position and final orientation can be carried out, for example, by a graphical evaluation of the acquired measurement signal of the primary sensor 23, in particular the amplitude, the phase and / or the offset of the measurement signal.

[0056] Fig. 4 shows the optical module 21 of Fig. 2 mounted in the projection exposure system 1 in a side view. The optical module 21 is arranged on a frame of the projection exposure system 1, the so-called force frame 28. As already explained, the optical module 21 can be moved by means of the manipulators 25. The primary sensor 23 is arranged on another frame of the projection exposure system 1, the so-called sensor frame 29. The sensor frame 29 is largely mechanically decoupled from the environment, in particular the force frame 28, which is indicated by the decoupling elements 30 shown. The illustrated arrangement of the optical module 21 on the force frame 28 as well as the design of the force frame 28 and the sensor frame 29 are shown purely schematically.

[0057] In the Fig. 4, the primary sensors 23 are already arranged on the sensor frame 29 using a respective final alignment element 27b. For this purpose, the initial alignment element 27a was replaced with the final alignment element 27b. To ensure that the adjustment of the primary sensor 23 has delivered the desired result, the adjustment of the primary sensor 23 can also be checked.

[0058] Firstly, to check the alignment, the optical module 21 can be moved along at least one degree of freedom X, Y, Z, Rx, R Y , Rz, in particular along all six degrees of freedom X, Y, Z, R X , R Y , R Z, are moved to the maximum achievable position and / or orientation and at the same time a measurement is carried out by means of the primary sensor 23. By means of the measurement of the primary sensor 23, it can then be checked whether the adjustment of the primary sensor 23 has achieved the desired result. During the check of the adjustment, preferably also during the connection with Fig. 3 described measurement by means of the primary sensor 23 during the movement of the optical module 21, a measurement is carried out by means of at least one secondary sensor 31. Shown in Fig. 2 two secondary sensors 31, however, more or fewer secondary sensors 31 may also be provided. The secondary sensors 31 are arranged on the manipulators 25. Where the maximum achievable position and / or orientation along the respective degree of freedom is located depends, for example, on the maximum possible adjustment path of the manipulators 25 and / or the free space between the optical module 21 and another component of the projection exposure system 1 in the direction of the respective degree of freedom X, Y, Z, R. X , R Y , R ZDuring the movement of the optical module 21, a change in the position and / or orientation of at least a part of the manipulator 25 is then detected by means of the secondary sensors 31 and / or the position and / or orientation of at least a part of the manipulator 25 is detected. Based on this, the position and / or orientation of the optical module 21 is then regulated during the movement of the optical module 21. By using the secondary sensors 31, a precise, often functional, control and / or regulation of the position and / or orientation of the optical module 21 is achieved, since the primary sensor 23 is not yet sufficiently adjusted and does not provide a measurement signal or its measurement signal cannot be used for a precise control and / or regulation of the position and / or orientation of the optical module 23.If a measurement is carried out with both the primary sensor 23 and the secondary sensor 31, it can also be checked by comparing the measurement signals of the two sensors that, for example, there is no malfunction of the primary sensors 23 or that the primary sensors 23 have not been incorrectly connected, which could otherwise lead to a collision of the optical module 21 with other components of the projection exposure system 1 and thus damage the optical module 21 or the other components.

[0059] Alternatively or additionally, to check the alignment, the optical module 21 can be moved along at least one degree of freedom X, Y, Z, R X , R Y , R Z , especially along all six degrees of freedom X, Y, Z, R X , R Y , R Z, are moved to the respective maximum achievable position and at the same time a measurement is carried out using the primary sensors 23. In this case, however, the position and / or orientation of the optical module 21 is controlled during the movement based on the measurement using the primary sensor 23. This is particularly useful if a check has first taken place in which the control of the position and / or orientation of the optical module 21 was carried out based on the measurement of the secondary sensor 31. Preferably, a corresponding check is carried out for all optical modules 21 of the projection exposure system 1, so that all optical modules 21 of the projection exposure system 1 are moved accordingly and a measurement is carried out using the respective primary sensors 23.

[0060] Fig. 5 shows a flowchart of a method for adjusting at least one primary sensor 23, as described in connection with the Fig. 1 to 4. The procedure can be summarized as follows: - Providing at least one primary sensor 23 and at least one optical module 21 for a projection exposure apparatus 1 (step 510), - Determining an initial position and / or an initial orientation of the primary sensor 23 and / or determining at least one initial alignment element 27a for the primary sensor 23 (step 520), - Performing an initial adjustment of the primary sensor 23 (step 530), - Performing a measurement using the primary sensor 23 (step 540), - Determining the final position and / or the final orientation of the primary sensor 23 and / or determining at least one final alignment element 27b for the primary sensor 23 (step 550), - Performing a final adjustment of the primary sensor 23 (step 560), - Checking the final adjustment, wherein a measurement is carried out by means of the primary sensor 23 and during this time the position and / or orientation of the optical module 21 is controlled based on the measurement of at least one secondary sensor 31 (step 570), and - Checking the final adjustment, whereby a measurement is carried out using the primary sensor 23 and during this time the position and / or

[0061] Orientation of the optical module 21 is controlled based on the measurement of the primary sensor 23 (step 580). List of reference symbols 1 projection exposure system 2 field facet mirrors 3 Radiation source 4 Lighting optics 5 Object field 6 Object level 7 reticles 8 reticle holders 9 Projection optics 10 image field 11 Image plane 12 wafers 13 wafer holders 14 Radiation 15 Intermediate focal plane 16 Pupillary facet mirrors 17 optical assembly 18 mirrors 19 mirrors 20 mirrors 21 optical module 22 measurement reference, 23 primary sensor 24 mirrors 25 Manipulator 26 Connecting element 27a initial alignment element 27b final alignment element 28 Force Frame 29 Sensor Frame 30 Decoupling element 31 secondary sensor R X , R Y , R Z rotational degree of freedom X, Y, Z translational degree of freedom

Claims

[1] Method for adjusting at least one sensor (23) for a projection exposure system (1), comprising the following steps: a) providing at least one primary sensor (23) and at least one optical module (21) for a projection exposure system (1), - wherein at least one measuring reference (22) is arranged on the optical module (21), - wherein the primary sensor (23) is configured to detect a change in the position and / or orientation of the optical module (21) and / or the measurement reference (22) and / or the primary sensor (23) is configured to detect the position and / or orientation of the optical module (21) and / or the measurement reference (22), b) carrying out a measurement using the primary sensor (23), - wherein during the measurement the optical module (21) is moved, in particular shifted, tilted and / or rotated, relative to the primary sensor (23) and / or the primary sensor (23) relative to the optical module (21), c) performing a final adjustment of the primary sensor (23) using the measurement performed in step b), - wherein the primary sensor (23) is arranged in a final position and / or a final orientation. [2] Method according to claim 1, characterized by that in step b) the optical module (21) and / or the primary sensor (23) is moved by means of at least one manipulator (25), in particular a projection exposure system (1). [3] Method according to claim 1 or claim 2, characterized bythat in step b), in particular during the measurement by means of the primary sensor (23), the optical module (21) and / or the primary sensor (23) along at least one translational and / or rotational degree of freedom (X, Y, Z, R X , R Y , R Z ,) of the optical module (21) and / or the primary sensor (23) and that, preferably, along the at least one translational and / or rotational degree of freedom (X, Y, Z, R X , R Y , R Z ,) of the optical module (21) and / or the primary sensor (23), the primary sensor (23) has its highest measurement sensitivity. [4] Method according to one of claims 1 to 3, characterized by that the procedure includes the following step: d) determining the final position and / or the final orientation of the primary sensor (23) and / or determining at least one final alignment element (27b) for the primary sensor (23). [5] Method according to claim 4, characterized by that in step d) the final position and / or the final orientation of the primary sensor (23) is determined using the measurement carried out in step b), preferably using the measurement signal of the primary sensor (23) during the measurement carried out in step b), and / or that in step d) the final alignment element (27b) is determined using the measurement carried out in step b), preferably using the measurement signal of the primary sensor (23) during the measurement carried out in step b). [6] Method according to one of claims 1 to 5, characterized by that the procedure includes the following step: e) determining an initial position and / or an initial orientation of the primary sensor (23) and / or determining at least one initial alignment element (27a) for the primary sensor (23), - wherein the primary sensor (23) in the initial position and / or the initial orientation can detect a change in the position and / or orientation of the optical module (21) and / or the measurement reference (22) and / or the primary sensor in the initial position and / or the initial orientation can detect the position and / or orientation of the optical module (21) and / or the measurement reference (22). [7] Method according to claim 6, characterized byin step e), the initial position and / or the initial orientation of the primary sensor (23) is determined using at least one piece of geometric information of the optical module (21), the primary sensor (23), the measurement reference (22), at least one frame (28, 29) of a projection exposure system (1) and / or at least one connection element (26) of a projection exposure system (1) and / or in step e), the initial alignment element (27a) is determined using at least one piece of geometric information of the optical module (21), the primary sensor (23), the measurement reference (22), at least one frame (28, 29) of a projection exposure system (1) and / or at least one connection element (26) of a projection exposure system (1) and in that, preferably, the at least one piece of geometric information is determined by means of a measurement, in particular using a coordinate measuring machine. [8] Method according to claim 6 or claim 7, characterized by in step e), the initial position and / or the initial orientation of the primary sensor (23) is determined by means of a virtual model, preferably comprising at least one piece of geometric information of the optical module (21), the primary sensor (23), the measurement reference (22), at least one frame (28, 29) of a projection exposure system (1) and / or at least one connection element (26) of a projection exposure system (1), and / or in step e), the initial alignment element (27a) is determined by means of a virtual model, preferably comprising at least one piece of geometric information of the optical module (21), the primary sensor (23), the measurement reference (22), at least one frame (28, 29) of a projection exposure system (1) and / or at least one connection element (26) of a projection exposure system (1). [9] Method according to one of claims 1 to 8, characterized by that the procedure includes the following step: f) performing an initial adjustment of the primary sensor (23), - wherein, preferably, the primary sensor (23) is arranged in the initial position and / or the initial orientation and / or - wherein, preferably, the initial alignment element (27a) is arranged on the primary sensor (23). [10] Method according to one of claims 1 to 9, characterized by that in step c) the position and / or the orientation of the primary sensor (23), preferably relative to the initial position and / or the initial orientation of the primary sensor (23), is changed, that in step c) the final alignment element (27b) is arranged on the primary sensor (23) and / or that in step c) the initial alignment element (27a) is exchanged with the final alignment element (27b). [11] Method according to one of claims 1 to 10, characterized by that the procedure includes the following step: g) Checking the final adjustment carried out in step c), - wherein a measurement is carried out by means of the primary sensor (23), and - wherein the optical module (21) is moved, in particular relative to the primary sensor (23). [12] Method according to claim 11, characterized by that in step g), in particular during the measurement by means of the primary sensor (31), the optical module (21) is moved in the direction of at least one along at least one translational and / or rotational degree of freedom (X, Y, Z, R X , R Y , R Z ,) of the optical module (21) is moved to the maximum achievable position and / or orientation and / or that in step g), in particular during the measurement by means of the primary sensor (31), the optical module (21) is moved in at least one along at least one translational and / or rotational degree of freedom (X, Y, Z, R X , R Y , R Z,) of the optical module (21) is in the maximum achievable position and / or orientation. [13] Method according to one of claims 1 to 12, characterized by that in step b) and / or step g) a measurement is carried out by means of at least one secondary sensor (31), that the secondary sensor (31) is set up to detect a change in the position and / or orientation of at least one part of the manipulator (25), the position and / or orientation of at least one part of the manipulator (25), a change in the position and / or orientation of the optical module (21) and / or the position and / or orientation of the optical module (21), and that, preferably, in step b) and / or step g) the position and / or orientation of the optical module (21) is controlled and / or regulated based on the measurement of the secondary sensor (31). [14] Method according to one of claims 1 to 13, characterized bythat the procedure includes the following step: h) Checking the final adjustment carried out in step c), - wherein a measurement is carried out by means of the primary sensor (23), and - wherein the optical module (21) is moved, in particular relative to the primary sensor (23). [15] Method according to claim 14, characterized by that in step h), in particular during the measurement by means of the primary sensor (23), the optical module (21) is moved in the direction of at least one along at least one translational and / or rotational degree of freedom (X, Y, Z, R X , R Y , R Z ,) of the optical module (21) is moved to the maximum achievable position and / or orientation and / or that in step h), in particular during the measurement by means of the primary sensor (23), the optical module (21) is moved in at least one along at least one translational and / or rotational degree of freedom (X, Y, Z, RX , R Y , R Z ,) of the optical module (21) is in the maximum achievable position and / or orientation. [16] A method according to claim 14 or claim 15, characterized by that in step h) the position and / or orientation of the optical module (21) is controlled and / or regulated based on the measurement of the primary sensor (23). [17] Method according to one of claims 1 to 16, characterized by in that in step b), step c), step d), step e), step f), step g) and / or step h) the optical module (21) and / or the primary sensor (23) is arranged at least temporarily on at least one frame (28, 29), in particular a projection exposure system (1). [18] Projection exposure system (1) comprising: - at least one primary sensor (23) and at least one optical module (21), characterized bythat the primary sensor (23) is adjusted relative to the optical module (21) according to the method according to one of claims 1 to 17.

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