Stage apparatus, pattern forming apparatus, and method for manufacturing article

Abstract

To provide a stage apparatus that can reduce reaction force generated when moving a stage while suppressing generation of couple of force.SOLUTION: A stage apparatus comprises: a first stage movable in a first direction; a first drive part which generates thrust so as to move the first stage in the first direction; and a reaction force reducing part which generates thrust so as to reduce reaction force occurred by generation of the thrust of the first drive part, where the reaction force reducing part is constituted to be capable of generating thrust whose magnitude is varied at a plurality of positions in a second direction perpendicular to the first direction.SELECTED DRAWING: Figure 2

Description

[Technical field]

[0001] The present invention relates to a stage apparatus, a pattern forming apparatus, and a method for manufacturing an article. [Background technology]

[0002] Conventionally, it has been known that in a stage device, a reaction force generated by applying a thrust force to a stage to move the stage in a predetermined direction can become a disturbance in the stage device, which can cause the operation of the stage device to become unstable. Patent Document 1 discloses a stage device that includes a thrust generating unit that generates a thrust for canceling a reaction force that is generated when a stage is moved in a predetermined direction. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 11-168064 Summary of the Invention [Problem to be solved by the invention]

[0004] The thrust generating section provided in the stage device disclosed in Patent Document 1 generates a thrust for canceling out a reaction force at a single position. Therefore, if the position where a thrust is applied to the stage to move it in a predetermined direction, i.e., the position where a reaction force is generated, and the position where a thrust to offset the reaction force is generated are misaligned, a couple of forces will occur, and this couple will become a disturbance in the stage device.

[0005] The occurrence of such a couple of forces can be suppressed by aligning the positions of both of the above when assembling the stage device, but such an operation requires a lot of time and may delay the assembly. Furthermore, even after the stage device is assembled in this manner, a couple of forces may occur due to changes in the positions of both of the above components over time due to changes in the weight of the workpiece mounted on the stage device, the implementation on the stage device, and changes in the position and attitude of the structure.

[0006] SUMMARY OF THE PRESENT DISCLOSURE An object of the present invention is to provide a stage device that can reduce the reaction force that occurs when the stage is moved while suppressing the occurrence of couple forces. [Means for solving the problem]

[0007] The stage device of the present invention comprises a first stage movable in a first direction, a first drive unit that generates a thrust so as to move the first stage in the first direction, and a reaction force reduction unit that generates a thrust so as to reduce a reaction force generated by the generation of the thrust by the first drive unit, and is characterized in that the reaction force reduction unit is configured to be capable of generating thrusts of different magnitudes at multiple positions in a second direction perpendicular to the first direction. Effect of the Invention

[0008] According to the present invention, it is possible to provide a stage device that can reduce the reaction force that occurs when the stage is moved while suppressing the occurrence of couple forces. [Brief description of the drawings]

[0009] [Figure 1] 1A and 1B are a schematic cross-sectional view and a schematic top view of a stage device according to the first embodiment. [Diagram 2] 3A and 3B are a schematic cross-sectional view and a schematic top view of a reaction force receiving mechanism provided in the stage device according to the first embodiment. [Diagram 3] 13A and 13B are a schematic cross-sectional view and a schematic top view of a reaction force receiving mechanism provided in a stage device according to a second embodiment. [Figure 4] FIG. 1 is a schematic cross-sectional view of an exposure apparatus that includes a stage apparatus according to the present embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0010] Hereinafter, a stage device according to this embodiment will be described in detail with reference to the accompanying drawings. Note that the drawings shown below may be drawn at a scale different from the actual scale in order to facilitate understanding of this embodiment. In the following, the vertical direction is defined as the Z direction (third direction), and the two directions that are perpendicular to each other in a plane perpendicular to the Z direction are defined as the X direction (first direction) and the Y direction (second direction). The rotation axes around the X-axis, Y-axis, and Z-axis are defined as the ωX-axis, ωY-axis, and ωZ-axis, respectively.

[0011] [First embodiment] 2. Description of the Related Art Conventionally, a stage device is known that includes a first stage that moves in a first direction perpendicular to a vertical direction, and a second stage that moves in a second direction perpendicular to the vertical direction and the first direction. The stage device is configured such that the first stage is connected to the second stage, and the first stage moves in the second direction in conjunction with the movement of the second stage in the second direction, i.e., in conjunction with the second stage.

[0012] In such a stage device, it is required to cancel out the reaction force that occurs when, for example, the first stage moves in a first direction. In view of this, a stage device has been proposed in which a thrust generating unit is provided in the second stage to generate a thrust for canceling out the reaction force generated when the first stage moves in a first direction. With this configuration, the stage device can cancel out the reaction force even when the first stage is disposed at various positions in the second direction.

[0013] In such a stage device, a couple of forces occurs when the position where a reaction force is generated when the first stage moves in a first direction and the position where a thrust to offset the reaction force is generated by the thrust generating unit provided on the second stage are misaligned with each other. In other words, a couple of forces occurs when the position where a driving thrust is applied to the first stage to move the first stage in a first direction and the position where a thrust is generated by the thrust generating unit provided on the second stage to offset the reaction force are misaligned with each other. The couple of forces thus generated is input (applied) to the stage device as a disturbance, hindering the precise operation of the stage device.

[0014] In the above stage device, the thrust generating unit provided on the second stage generates a thrust for canceling out a reaction force at a single position, that is, a single-axis thrust. Therefore, when assembling the stage device, a couple of forces will occur unless the position where a reaction force is generated when the first stage moves in a first direction and the position where a thrust to offset the reaction force is generated by the thrust generating unit provided on the second stage are aligned.

[0015] Furthermore, the task of aligning both of the above positions during assembly of the stage device requires a significant amount of time, which may cause delays in the assembly. Furthermore, even after the stage device is assembled in this manner, a couple of forces may occur due to changes in the positions of both of the above components over time due to changes in the weight of the workpiece mounted on the stage device, the implementation on the stage device, and changes in the position and attitude of the structure.

[0016] Therefore, an object of this embodiment is to provide a stage device that can cancel out the reaction force that occurs when the stage is moved while suppressing the occurrence of couple forces.

[0017] 1(a) and (b) show a schematic cross-sectional view and a schematic top view of a stage device 100 according to a first embodiment.

[0018] The stage device 100 according to this embodiment includes a Y stage 1 (second stage), an X stage 2 (first stage), a base plate 5, a base frame 6, and a vibration isolation table 8. Moreover, the stage device 100 according to this embodiment includes a Y linear motor 10 (second driving section), an X linear motor 20 (first driving section), a reaction force receiving mechanism 30 (reaction force reducing section), a control section 50, and a measurement section 60.

[0019] As shown in FIGS. 1(a) and 1(b), in a stage device 100 according to this embodiment, a Y stage 1 and a Y linear motor 10 are provided on either side of an X stage 2 in the X direction. The two Y stages 1 are connected (fixed) to each other by an X linear motor stator 20b of an X linear motor 20, and can be moved in the Y direction by the Y linear motor . Here, the two Y stages 1 and the X linear motor stator 20b can be collectively referred to as a Y stage.

[0020] The X stage 2 can be moved in the X direction by an X linear motor 20 . The X-stage 2 also has a fine movement top plate 25, which holds the substrate W and is capable of finely driving the holding surface that holds the substrate W.

[0021] Specifically, by providing three Z linear motors and one ωZ linear motor (not shown) on the fine adjustment top plate 25, the holding surface that holds the substrate W can be driven not only in the Z axis and ωZ axis, but also in the ωX axis and ωY axis. As a result, in stage device 100 according to this embodiment, the holding surface that holds the substrate W can be driven about all six axes: the X-axis, Y-axis, Z-axis, ωX-axis, ωY-axis, and ωZ-axis.

[0022] The vibration isolation table 8 is a vibration isolation mechanism formed of an air spring or a coil spring, and is supported by the base frame 6 . The vibration isolation table 8 is configured to suppress the propagation of vibrations from the outside to the stage device 100 according to this embodiment, and to control the position and attitude of the base 5 .

[0023] The Y linear motor 10 is composed of a Y linear motor mover 10a (second mover) which is a movable part, and a Y linear motor stator 10b (second stator) which is a fixed part that passes through an opening of the Y linear motor mover 10a and extends in the Y direction. The Y linear motor 10 functions as a driving means that generates a thrust force to move the Y stage 1 in the Y direction.

[0024] Specifically, Y linear motor mover 10a is a U-shaped frame body made of an aluminum plate holding mutually opposing multi-pole magnets (permanent magnets) not shown, and is configured to be movable in the Y direction relative to Y linear motor stator 10b. On the other hand, Y linear motor stator 10b has a coil array arranged in the Y direction, and is fixed to a floor (not shown). That is, the Y linear motor 10 has a moving magnet configuration.

[0025] Then, by sequentially switching the direction of the current supplied to each coil of the coil array of Y linear motor stator 10b, a thrust in the Y direction is generated in Y linear motor mover 10a. The thrust thus generated moves the Y stage 1, as well as the X linear motor 20 connected to the Y stage 1 and the X stage 2 in the Y direction.

[0026] X linear motor 20 is composed of X linear motor stator 20b (first stator) which is a fixed part extending in the X direction, and X linear motor mover 20a (first mover) which is a movable part movable in the X direction relative to X linear motor stator 20b. The X linear motor 20 functions as a driving means that generates a thrust force to move the X stage 2 in the X direction.

[0027] Specifically, the X linear motor mover 20a is a hollow frame body, and holds mutually opposing multi-pole magnets (permanent magnets) (not shown) on the upper and lower vertical surfaces of its inner surface, and is configured to be movable in the X direction relative to the X linear motor stator 20b. On the other hand, X linear motor stator 20b has a coil array arranged in the X direction, and is fixed to Y stage 1 and Y linear motor mover 10a. That is, the X linear motor 20 has a moving magnet configuration.

[0028] By sequentially switching the direction of the current supplied to each coil in the coil array of the X linear motor stator 20b, a thrust in the X direction is generated in the X linear motor mover 20a, and the generated thrust moves the X stage 2 in the X direction. As described above, the X linear motor 20 and the X stage 2 are configured to move in the Y direction in conjunction with the movement of the Y stage 1 in the Y direction, that is, to move in conjunction with the Y stage 1.

[0029] The reaction force receiving mechanism 30 is configured to generate a thrust force in order to cancel (reduce) the reaction force generated by driving the X stage 2. The control unit 50 controls the generation of thrust in the reaction force receiving mechanism 30 . The specific configuration of the reaction force receiving mechanism 30 and the specific control of the control unit 50 will be described later.

[0030] As shown in Figure 1(a), in the stage device 100 of this embodiment, vibration isolation tables 8 are arranged at three locations on a base frame 6, which can serve as an installation reference, and a base plate 5, which serves as the running surface of the Y stage 1, is arranged on the vibration isolation tables 8. The Y stage 1 is disposed so as to be movable back and forth in the Y direction on a base 5, and the X stage 2 is disposed so as to be movable back and forth in the X direction on the Y stage.

[0031] Specifically, Y linear motors 10 are provided on both sides in the X direction across the center of base plate 5, and Y stage 1 is disposed on Y linear motor movers 10a of each Y linear motor 10. In addition, the X stage 2 is disposed on an X linear motor mover 20 a of the X linear motor 20 .

[0032] The reaction force receiving mechanism 30 is composed of a reaction force receiving mechanism mover 30a (third mover) and a reaction force receiving mechanism stator 30b (third stator), and the reaction force receiving mechanism mover 30a is fixed to a Y linear motor mover 10a connected to one of the Y stages 1. That is, the reaction force receiving mechanism mover 30a moves in the Y direction in conjunction with the movement of the Y linear motor mover 10a in the Y direction.

[0033] On the other hand, the reaction force receiving mechanism stator 30b is an elongated frame extending in the Y direction and having a length approximately equal to that of the Y linear motor stator 10b. This enables the reaction force receiving mechanism stator 30b to generate a predetermined thrust in the X direction in the reaction force receiving mechanism mover 30a, regardless of where in the Y direction the reaction force receiving mechanism mover 30a is located.

[0034] As described above, by linking the reaction force receiving mechanism mover 30a with the Y linear motor mover 10a, it is possible to cancel out the reaction force generated by driving the X stage 2 regardless of where the X stage 2 is positioned in the Y direction. This makes it possible to maintain the accuracy in canceling out the reaction force regardless of the position of the X stage 2 in the Y direction.

[0035] Furthermore, since the reaction force receiving mechanism 30 is configured so as not to apply unnecessary force to the surface plate 5, transient deformation of the surface plate 5 due to the operation of the reaction force receiving mechanism 30 can be suppressed. As a result, in the stage device 100 according to this embodiment, the Y stage 1 and the X stage 2 can operate precisely and accurately using the base 5 as a positional reference.

[0036] 2(a) and (b) respectively show a schematic cross-sectional view and a schematic top view of the reaction force receiving mechanism 30 provided in the stage device 100 according to this embodiment.

[0037] As shown in FIG. 2(a), four permanent magnets MG are provided on the inner surface of the reaction force receiving mechanism mover 30a facing the reaction force receiving mechanism stator 30b, spaced apart from each other in both the X direction and the Z direction. That is, on the inner surface of the reaction force receiving mechanism mover 30a facing the reaction force receiving mechanism stator 30b, two permanent magnet pairs each consisting of two permanent magnets MG arranged apart from each other in the X direction are arranged apart from each other in the Z direction.

[0038] Meanwhile, inside the reaction force receiving mechanism stator 30b, two layers of coil groups, that is, a first coil group 31 and a second coil group 32, are provided which are spaced apart from each other in the Z direction. However, the present invention is not limited to this, and the reaction force receiving mechanism stator 30b may have three or more layers of coils arranged in the Z direction inside.

[0039] Also, for example, as shown in FIG. 2(b), each coil group includes a plurality of coils, such that the first coil group 31 includes a plurality of coils 311, 312, . . . , 31n arranged spaced apart from each other in the Y direction. That is, inside the reaction force receiving mechanism stator 30b, coils (electromagnets) are provided at a plurality of positions in each of the Y direction and the Z direction. In this manner, the reaction force receiving mechanism 30 has a configuration similar to that of a voice coil motor.

[0040] By adjusting the direction and magnitude of the current supplied by the control unit 50 to each coil of the reaction force receiving mechanism 30, the thrust generated by each coil can be made to differ from one another. In the stage device 100 of this embodiment, each coil in the reaction force receiving mechanism 30 generates a different thrust force in this manner, making it possible to generate thrust forces in multiple axes of action when canceling out the reaction force generated by driving the X stage 2. In other words, in the reaction force receiving mechanism 30 provided in the stage device 100 according to this embodiment, multiple thrust generating units capable of generating thrusts of different magnitudes are provided at multiple positions in each of the Y direction and the Z direction.

[0041] For example, consider a case where the position where a reaction force is generated on the reaction force receiving mechanism 30 by driving the X stage 2 and the position where a thrust force for canceling the reaction force is generated by the reaction force receiving mechanism 30 are different from each other in the Z direction. In other words, consider a case where the position where the thrust for moving the X stage 2 is generated by the X linear motor 20 and the position where the thrust for canceling the reaction force is generated by the reaction force receiving mechanism 30 are different from each other in the Z direction. In other words, a case will be considered in which the axis of action of the reaction force due to the movement of the X stage 2 and the axis of action of the thrust force due to the reaction force receiving mechanism 30 are misaligned in the Z direction.

[0042] At this time, a pitching (ωY) couple occurs which corresponds to the rotation around the Y direction. In this case, in the stage device 100 according to this embodiment, the couple of forces of such pitching (ωY) can be offset by setting a difference between the thrusts generated by the first coil group 31 and the second coil group 32.

[0043] Also, a case will be considered in which the position where a reaction force is generated on the reaction force receiving mechanism 30 by driving the X stage 2 and the position where a thrust force for canceling the reaction force is generated by the reaction force receiving mechanism 30 are different from each other in the Y direction. In other words, consider a case where the position where the thrust for moving the X stage 2 is generated by the X linear motor 20 and the position where the thrust for canceling the reaction force is generated by the reaction force receiving mechanism 30 are different from each other in the Y direction. In other words, a case will be considered in which the axis of action of the reaction force due to the movement of the X stage 2 and the axis of action of the thrust force due to the reaction force receiving mechanism 30 are misaligned in the Y direction.

[0044] At this time, a yawing (ωZ) couple occurs, which corresponds to the rotation around the Z direction. In this case, in the stage device 100 of this embodiment, multiple coils are selected (determined) in each of the first coil group 31 and the second coil group 32 based on the position in the Y direction of the Y stage 1, i.e., the X stage 2, measured by the measurement unit 60. Then, by setting a difference between the thrusts generated by each of the selected coils, the couple of such yawing (ωZ) can be cancelled out.

[0045] As described above, in the stage device 100 according to this embodiment, a plurality of thrust action axes that are not on the same line of action are provided by a plurality of coils, and thrusts are set independently on the plurality of thrust action axes. It is possible to control the thrust acting axis for canceling the reaction force by the resultant force of the plurality of thrust forces set in this way.

[0046] Regarding the thrust generated by each coil included in the first coil group 31 and the second coil group 32 of the stage device 100 in this embodiment, i.e., the magnitude of the current supplied to each coil, two-stage gain parameters (gain blocks) are implemented. Specifically, the first-stage gain parameter is a gain parameter (second gain parameter) common to all coils. The gain parameters are adjusted so that the amount of disturbance fluctuation in the X direction in a predetermined target that occurs when the X stage 2 is driven, that is, when the reaction force due to the generation of the thrust of the X linear motor 20 is reduced, is minimized. The disturbance fluctuation in the predetermined object referred to here is, for example, the vibration of the surface plate 5.

[0047] The second-stage gain parameter is a gain parameter (first gain parameter) regarding the thrust difference between the coils. The gain parameter for the thrust difference is adjusted so that the amount of disturbance fluctuation in the Y and Z directions other than the X direction, which occurs in a predetermined target when the X stage 2 is driven, i.e., when the reaction force due to the generation of the thrust of the X linear motor 20 is reduced, is minimized. The above-mentioned predetermined target includes at least one of the Y stage 1, the X stage 2, the fine adjustment top plate 25, and the surface plate 5, and is set based on the amount of disturbance fluctuation in each of them.

[0048] In addition, the gain parameter for the thrust difference as the second-stage gain parameter may be calculated from the disturbance fluctuation amount acquired at a single position included in the operating range of each stage, or may be calculated from the disturbance fluctuation amount acquired at multiple positions. In addition, the gain parameter for the thrust difference may be a constant, or may be a function according to the position of each stage, or may be a table that can be switched sequentially between multiple ranges set according to the position of each stage.

[0049] In addition, the gain parameter for the thrust difference may be configured in a feedforward block in the control system of the reaction force receiving mechanism 30, and may also be configured in a feedback block of any of the Y stage 1, X stage 2, fine adjustment top plate 25 and base plate 5. In other words, the reaction force receiving mechanism 30 may be feedforward controlled and feedback controlled in accordance with changes in the Y stage 1, the X stage 2, the fine adjustment top plate 25 and the base 5. In this case, after the gain parameter is adjusted, it is possible to suppress the effect on the gain parameter caused by a change in the direction in which the thrust force for canceling the reaction force acts.

[0050] In the above, two stages of gain parameters that are adjusted when assembling the stage device 100 according to this embodiment have been shown. In addition, it is preferable to configure a third stage gain parameter (third gain parameter) for switching parameters depending on the usage state and operation sequence of a pattern forming apparatus, such as an exposure apparatus, on which the stage device 100 of this embodiment is mounted.

[0051] When a pattern forming apparatus equipped with the stage device 100 according to this embodiment is operated, the center of gravity and driving force of each stage change depending on the operation sequence (operation profile) of each stage and the type of substrate W mounted on the X-stage 2. Therefore, the third-stage gain parameters are optimal parameters that are calculated in advance in accordance with various states that are different from the state when stage device 100 according to this embodiment is adjusted.

[0052] Specifically, the control unit 50 receives information regarding the state of the stage device 100 according to this embodiment from a higher-level system that manages the state of the pattern forming device on which the stage device 100 according to this embodiment is mounted, the usage environment, and the operating sequence. Then, based on the received information, the control unit 50 performs an operation of switching the gain parameters in the third stage as necessary. This makes it possible to accurately cancel out the reaction force even when the stage device 100 of this embodiment is in various states depending on the state and operational sequence of the pattern forming device on which the stage device 100 of this embodiment is mounted.

[0053] The third stage gain parameter may be a gain parameter common to all coils included in the first coil group 31 and the second coil group 32, or it may be a gain parameter for the thrust difference between each coil, or it may be both. Furthermore, the gain parameters for the first, second and third stages described above may be updated in response to changes over time in the stage device 100 of this embodiment, such as an increase in friction in each driving unit, or may be updated periodically.

[0054] As described above, in the stage device 100 according to this embodiment, in order to cancel out the reaction force caused by driving the X stage 2 in the X direction, a reaction force receiving mechanism 30 is provided that is configured to be able to generate thrusts of different magnitudes at multiple positions in each of the Y direction and the Z direction. This makes it possible to suppress the occurrence of a couple of forces without adjusting the positions of the axis of action of the reaction force and the axis of action of the thrust force.

[0055] In the stage device 100 according to this embodiment, a so-called moving magnet configuration is adopted in which a permanent magnet is provided in the Y linear motor mover 10a of the Y linear motor 10 while a coil array is provided in the Y linear motor stator 10b, but this is not limited to this. That is, in Y linear motor 10, a coil array may be provided on Y linear motor mover 10a, while a permanent magnet may be provided on Y linear motor stator 10b, so-called a moving coil configuration may be adopted. Similarly, the X linear motor 20 may also have a moving coil configuration.

[0056] In addition, in the stage device 100 according to this embodiment, as shown in FIGS. 1(a) and (b), the reaction force receiving mechanism 30 is provided on one side in the X direction across the X stage 2, but this is not limiting, and the reaction force receiving mechanisms 30 may be provided on both sides in the X direction across the X stage 2. In this case, the magnitude of the thrust generated by each reaction force receiving mechanism 30 to cancel the reaction force generated by driving the X stage 2 can be reduced. This makes it possible to suppress, for example, heat generation and mechanical deformation caused by thrust generation in each reaction force receiving mechanism 30, and disturbances in the Y and Z directions.

[0057] [Second embodiment] 3(a) and (b) respectively show a schematic cross-sectional view and a schematic top view of a reaction force receiving mechanism 40 provided in a stage device according to the second embodiment. The stage device of this embodiment has the same configuration as the stage device 100 of the first embodiment, except that a reaction force receiving mechanism 40 is provided instead of the reaction force receiving mechanism 30. Therefore, the same components are given the same reference numbers and their explanations are omitted.

[0058] As shown in FIGS. 3(a) and 3(b), the reaction force receiving mechanism 40 is composed of a reaction force receiving mechanism mover 40a and a reaction force receiving mechanism stator 40b. Four coils 411, 412, 421 and 422 are arranged on the inner surface of the reaction force receiving mechanism mover 40a facing the reaction force receiving mechanism stator 40b, spaced apart from each other in the Y direction and the Z direction, respectively. However, the present invention is not limited to this, and coils may be provided at three or more positions in the Y direction on the inner surface of the reaction force receiving mechanism mover 40a facing the reaction force receiving mechanism stator 40b.

[0059] On the other hand, inside the reaction force receiving mechanism stator 40b, a plurality of groups of four permanent magnets MG arranged at intervals in each of the X and Z directions are arranged at intervals in the Y direction. That is, inside the reaction force receiving mechanism stator 40b, two permanent magnet pairs each consisting of two permanent magnets MG arranged at a distance from each other in the X direction are provided at a distance from each other in the Z direction, and multiple pairs are arranged at a distance from each other in the Y direction.

[0060] As a result, the positions in the Z direction of the thrusts generated by the coils 411 and 412 are the same as each other, and the positions in the Z direction of the thrusts generated by the coils 421 and 422 are the same as each other. Furthermore, the positions in the Y direction of the thrusts generated by the coils 411 and 421 are the same, and the positions in the Y direction of the thrusts generated by the coils 412 and 422 are the same.

[0061] By adjusting the direction and magnitude of the current supplied by the control unit 50 to each of the coils 411, 412, 421, and 422, the thrust generated by each coil can be made to differ from one another. In the stage device of this embodiment, each coil in the reaction force receiving mechanism 40 generates a different thrust force in this manner, making it possible to generate thrust forces on multiple axes of action when canceling out the reaction force generated by driving the X stage 2.

[0062] For example, consider a case where the position where the reaction force generated by driving the X stage 2 acts on the reaction force receiving mechanism 40 and the position where the thrust for canceling the reaction force is generated by the reaction force receiving mechanism 40 are different from each other in the Z direction. At this time, a pitching (ωY) couple occurs which corresponds to the rotation around the Y direction. In this case, in the stage device of this embodiment, a thrust difference is set between coils 411 and 421, and a thrust difference is set between coils 412 and 422, so that the couple of forces of such pitching (ωY) can be offset.

[0063] Also, consider a case where the position where the reaction force generated by driving the X stage 2 acts on the reaction force receiving mechanism 40 and the position where the thrust for canceling the reaction force is generated by the reaction force receiving mechanism 40 are different from each other in the Y direction. At this time, a yawing (ωZ) couple occurs, which corresponds to the rotation around the Z direction. In this case, in the stage device according to this embodiment, a thrust difference is set between coils 411 and 412, and a thrust difference is set between coils 421 and 422, so that the couple of forces of such yawing (ωZ) can be offset.

[0064] Furthermore, the thrust generated by each of the coils 411, 412, 421, and 422 of the stage device according to this embodiment, that is, the gain parameters regarding the magnitude of the current supplied to each coil, can be set in the same way as in the stage device 100 according to the first embodiment.

[0065] As described above, in the stage device according to this embodiment, in order to cancel out the reaction force caused by driving the X stage 2 in the X direction, a reaction force receiving mechanism 40 is provided which is configured to be able to generate thrusts of different magnitudes at multiple positions in each of the Y direction and the Z direction. This makes it possible to suppress the occurrence of a couple without adjusting the positions of the axis of action of the reaction force and the axis of action of the thrust force.

[0066] Although the preferred embodiments have been described above, the present invention is not limited to these embodiments, and various modifications and changes are possible within the scope of the gist thereof.

[0067] [Exposure equipment] FIG. 4 shows a schematic cross-sectional view of an exposure apparatus 900 that is equipped with a stage apparatus according to the first or second embodiment.

[0068] The exposure apparatus 900 includes a lamp lighting device 401 (light source), an illumination optical system 402 , a slit 403 , an imaging optical system 404 , an original stage 405 , a projection optical system 406 , and a substrate stage 407 . The stage device according to this embodiment is used to control the driving of the substrate stage 407, for example.

[0069] The lamp lighting device 401 is a light source that emits ultraviolet light, such as a high-pressure mercury lamp. The illumination optical system 402 includes a first folding mirror 501 , a first condenser lens 502 , a fly's-eye lens 503 , a second condenser lens 504 , and a second folding mirror 505 . The original stage 405 is a mask stage that holds the original O, and can be driven in the Y direction shown in FIG.

[0070] The projection optical system 406 is a projection optical system for projecting and transferring a pattern drawn on the original O onto a substrate W coated with a photosensitive agent. The exposure apparatus 900 uses a projection optical system 406 that is an Offner type optical system. In the case of an Offner type optical system, the original O is illuminated with an arc-shaped light to ensure a good image area. The illumination shape of the exposure light that reaches the substrate W is also arc-shaped. The light that passes through the original O is reflected in this order by the trapezoidal mirror 601, the concave mirror 602, the convex mirror 603, the concave mirror 602, and the trapezoidal mirror 601, before reaching the substrate W, and the pattern on the original O is transferred onto the substrate W.

[0071] The substrate stage 407 is a wafer stage that holds the substrate W, and is driven in the Y direction in synchronization with the original stage 405 to expose the substrate W. The substrate stage 407 can be driven in the X direction as well as the Y direction, and when multiple panels on the substrate W are to be exposed, the substrate stage 407 is driven in both the X and Y directions to perform exposure.

[0072] Exposure light emitted from a lamp lighting device 401 passes through an illumination optical system 402 , a slit 403 and an imaging optical system 404 , and then irradiates an original O placed on an original stage 405 . The exposure light transmitted through the original O passes through a projection optical system 406 and irradiates a substrate W placed on a substrate stage 407, so that an exposure area on the substrate W is exposed.

[0073] In the above, an embodiment has been shown in which the stage apparatus according to this embodiment is provided in exposure apparatus 900, but the stage apparatus according to this embodiment is not limited to this and can also be applied to pattern forming apparatuses such as imprint apparatuses and drawing apparatuses. Furthermore, the stage apparatus according to this embodiment can also be applied to substrate processing apparatuses such as a coating and developing apparatus that coats and develops a photosensitive agent on a substrate W.

[0074] The imprinting device referred to here is a device that brings an imprinting material and a mold material supplied onto a substrate into contact with each other, and then applies energy for hardening to the imprinting material to form a pattern of the hardened material to which the pattern of the mold material is transferred. Moreover, a drawing apparatus is an apparatus that forms a pattern (latent image pattern) on a substrate by drawing on the substrate with a charged particle beam (electron beam) or a laser beam.

[0075] [Production method] The method for manufacturing an article according to this embodiment is suitable for manufacturing articles such as microdevices, such as semiconductor devices, and elements having a microstructure. The method for manufacturing an article according to this embodiment includes a step of forming a latent image pattern in a photosensitive agent applied to a substrate using the exposure apparatus 900 described above (an exposure step of exposing the substrate). The method for producing an article according to this embodiment also includes a developing step (processing step) of developing the substrate on which the latent image pattern has been formed in the exposing step. Furthermore, the method for manufacturing an article according to this embodiment includes other well-known manufacturing steps (oxidation, film formation, deposition, doping, planarization, etching, photosensitive agent stripping, dicing, bonding, packaging, etc.) that are performed on the substrate developed in the development step.

[0076] The method for manufacturing an article according to this embodiment is advantageous in at least one of the performance, quality, productivity, and production costs of the article, as compared to conventional methods. Furthermore, the method for manufacturing an article according to this embodiment is not limited to the above-described exposure apparatus 900, and may be performed using a pattern forming apparatus such as an imprint apparatus or a drawing apparatus that includes the stage apparatus according to this embodiment.

[0077] The disclosure of this embodiment includes the following configurations and methods. (Configuration 1) A stage device comprising: a first stage movable in a first direction; a first drive unit that generates a thrust so as to move the first stage in the first direction; and a reaction force reduction unit that generates a thrust so as to reduce a reaction force generated by the generation of the thrust by the first drive unit, wherein the reaction force reduction unit is configured to be capable of generating thrusts of different magnitudes at multiple positions in a second direction perpendicular to the first direction. (Configuration 2) The stage device described in Configuration 1, wherein the reaction force reduction unit is configured to be capable of generating thrusts of different magnitudes at multiple positions in a third direction perpendicular to the first direction and the second direction. (Configuration 3) A stage apparatus as described in configuration 1 or 2, comprising a measurement unit that measures the position of the first stage and a control unit that controls the reaction force reduction unit, the reaction force reduction unit having a plurality of thrust generation units that are respectively arranged at a plurality of positions, and the control unit determining at least one thrust generation unit that generates a thrust so as to reduce the reaction force based on the position of the first stage in the second direction measured by the measurement unit. (Configuration 4) The stage device according to configuration 3, wherein the control unit has a first gain parameter for determining the magnitude of thrust to be generated in each of the determined at least one thrust generating unit. (Configuration 5) A stage device according to Configuration 4, characterized in that the control unit generates a thrust force at each of at least one position in the second direction to move the first stage in the first direction by the first driving unit, and calculates a first gain parameter by determining the magnitude of each thrust force generated by the multiple thrust generating units so as to minimize an amount of disturbance fluctuation in the second direction that occurs when reducing a reaction force due to the generation of the thrust force by the first driving unit. (Configuration 6) A stage apparatus according to configuration 5, wherein the first gain parameter is expressed as a function of a position in the second direction. (Configuration 7) A stage apparatus according to configuration 5, wherein the first gain parameter is expressed as a table for a position in the second direction. (Configuration 8) The stage device according to any one of Configurations 5 to 7, wherein the control unit updates the first gain parameter by periodically recalculating it. (Configuration 9) A stage device described in any one of configurations 3 to 8, characterized in that the control unit has a second gain parameter common to each of the multiple thrust generating units, and a third gain parameter that changes depending on the usage state and operation sequence of the stage device. (Configuration 10) The stage device according to any one of configurations 3 to 9, wherein the control unit generates a thrust by performing feedforward control on at least one determined thrust generating unit. (Configuration 11) A stage device described in any one of configurations 1 to 10, comprising a second stage movable in a second direction and a second drive unit that generates a thrust to move the second stage in the second direction, wherein the first drive unit is composed of a first stator extending in the first direction and a first movable element fixed to the first stage and movable in the first direction, the second drive unit is composed of a second stator extending in the second direction and a second movable element fixed to the second stage and movable in the second direction, and the first stator and second movable element are connected to each other. (Configuration 12) The stage device described in Configuration 11, wherein the reaction force reduction section is composed of a third stator extending in the second direction and a third movable element fixed to the second movable element and movable in the second direction. (Configuration 13) The stage device described in Configuration 12, wherein the reaction force reduction unit is a voice coil motor including a plurality of electromagnets arranged at a plurality of positions in the second direction of the third stator, and at least one pair of permanent magnets fixed to the third movable element. (Configuration 14) The stage device described in Configuration 12, wherein the reaction force reduction unit is a voice coil motor including a plurality of permanent magnet pairs arranged at each of a plurality of positions in the second direction of the third stator, and a plurality of electromagnets arranged at each of a plurality of positions in the second direction of the third movable element. (Configuration 15) A stage device according to any one of configurations 1 to 14, wherein the reaction force reducers are provided on both sides of the first stage in the first direction. (Configuration 16) A pattern forming apparatus for forming a pattern on a substrate, comprising a stage device according to any one of configurations 1 to 15 that controls driving of a first stage on which the substrate is placed. (Method 1) A method for manufacturing an article, comprising the steps of forming a pattern on a substrate using the pattern forming apparatus according to Configuration 16, and processing the substrate on which the pattern has been formed to obtain an article. (Method 2) A method for controlling a reaction force reduction unit in a stage device including a first stage movable in a first direction, a first driving unit that generates a thrust to move the first stage in the first direction, and a reaction force reduction unit that generates a thrust to reduce a reaction force generated by the generation of the thrust of the first driving unit, wherein the reaction force reduction unit is configured to be able to generate thrusts of different magnitudes at multiple positions in a second direction perpendicular to the first direction, the method comprising the steps of measuring a position of the first stage, and determining a magnitude of thrust to be generated at each of the multiple positions of the reaction force reduction unit based on the position in the second direction of the first stage measured by the measuring step and a gain parameter. [Explanation of symbols]

[0078] 2 X Stage (First Stage) 20 x Linear Motor (First Drive Unit) 30 Reaction force receiving mechanism (reaction force reduction part) 100 Stage Equipment

Claims

1. A first stage movable in a first direction, a first driving unit that generates a thrust to move the first stage in the first direction, a reaction force reduction unit that generates a thrust to reduce the reaction force generated by the generation of the thrust of the first driving unit, comprising: the reaction force reduction unit is configured to be able to generate thrusts having different magnitudes from each other at a plurality of positions in a second direction perpendicular to the first direction, and to be able to generate thrusts having different magnitudes from each other at a plurality of positions in a third direction perpendicular to the first direction and the second direction. A stage device characterized by this.

2. a measurement unit that measures the position of the first stage, a control unit that controls the reaction force reduction unit, comprising: the reaction force reduction unit has a plurality of thrust generation units arranged at each of the plurality of positions in the second direction, the control unit determines at least one of the thrust generation units that generates a thrust to reduce the reaction force based on the position of the first stage in the second direction measured by the measurement unit. The stage device according to claim 1, characterized in that

3. The stage device according to claim 2, characterized in that the control unit has a first gain parameter for determining the magnitude of the thrust to be generated in each of the determined at least one thrust generation unit.

4. The control unit, at each of at least one position in the second direction, generates a thrust to move the first stage in the first direction by the first driving unit, The stage device according to claim 3, characterized in that the first gain parameter is calculated by determining the magnitude of each thrust generated by the plurality of thrust generation units so that the amount of disturbance fluctuation in the second direction generated when reducing the reaction force due to the generation of the thrust of the first driving unit is minimized.

5. The stage device according to claim 4, characterized in that the first gain parameter is represented as a function of the position in the second direction.

6. The stage device according to claim 4, characterized in that the first gain parameter is represented by a table for the position in the second direction.

7. The stage device according to claim 4, characterized in that the control unit updates by periodically recalculating the first gain parameter.

8. The stage device according to claim 2, wherein the control unit has a common second gain parameter for each of the plurality of thrust generation units and a third gain parameter that changes according to the usage state and operation sequence of the stage device.

9. The stage device according to claim 2, wherein the control unit generates thrust by performing feedforward control on at least one of the determined thrust generation units.

10. A second stage movable in the second direction, A second driving unit that generates thrust to move the second stage in the second direction, Comprising The first driving unit includes a first stator extending in the first direction and a first mover fixed to the first stage and movable in the first direction. The second driving unit includes a second stator extending in the second direction and a second mover fixed to the second stage and movable in the second direction. The stage device according to claim 1, wherein the first stator and the second mover are connected to each other.

11. The stage device according to claim 10, wherein the reaction force reduction unit includes a third stator extending in the second direction and a third mover fixed to the second mover and movable in the second direction.

12. The stage device according to claim 11, wherein the reaction force reduction unit is a voice coil motor including a plurality of electromagnets arranged at respective positions of the third stator in the second direction and at least one pair of permanent magnets fixed to the third mover.

13. The stage device according to claim 11, wherein the reaction force reduction unit is a voice coil motor including a plurality of pairs of permanent magnets arranged at respective positions of the third stator in the second direction and a plurality of electromagnets arranged at respective positions of the third mover in the second direction.

14. The stage device according to claim 1, wherein the reaction force reduction unit is provided on both sides of the first stage in the first direction with the first stage interposed therebetween.

15. A pattern forming apparatus for forming a pattern on a substrate, A pattern forming apparatus comprising the stage device according to any one of claims 1 to 14 for controlling the driving of the first stage on which the substrate is placed.

16. Forming a pattern on the substrate using the pattern forming apparatus according to claim 15; Processing the substrate on which the pattern is formed to obtain an article; A method for manufacturing an article, comprising the steps of:

17. A stage device comprising: a first stage movable in a first direction; a first driving unit that generates a thrust force to move the first stage in the first direction; and a reaction force reducing unit that generates a thrust force to reduce a reaction force generated by the generation of the thrust force of the first driving unit, the reaction force reducing unit being configured to be able to generate thrust forces having different magnitudes from each other at a plurality of positions in a second direction perpendicular to the first direction, and to be able to generate thrust forces having different magnitudes from each other at a plurality of positions in a third direction perpendicular to the first direction and the second direction. A method for controlling the reaction force reducing unit in the stage device, the method comprising: Measuring the position of the first stage; Based on the position of the first stage in the second direction measured by the measuring step and a gain parameter, determining the magnitude of the thrust force generated at each of the plurality of positions in the second direction of the reaction force reducing unit; A method characterized by including the steps of:

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