Radiation-sensitive composition, cured material and producing method thereof, display device as well as imaging device

JP2024175683APending Publication Date: 2024-12-18JSR CORPORATION
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Patent Information

Application Number
JP2024091394
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2023-06-06
Filing Date
2024-06-05
Publication Date
2024-12-18

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Abstract

To provide a radiation-sensitive composition capable of obtaining a cured material having excellent patterning characteristics and having high refractive index.SOLUTION: A radiation-sensitive composition containing A) components and (B) components. (A) Component: at least one selected from the group consisting of a compound represented by formula (1) and a compound formed by two or more compounds represented by formula (1) bonded via a single bond or a linking group, (B) component: photopolymerization initiator. In formula (1), R1 is a group having one or more heteroatoms selected from the group consisting of a sulfur atom, a nitrogen atom, and a phosphorus atom, a group having an aromatic hydrocarbon ring, or an aliphatic hydrocarbon ring. R2 represents a group having an alkaline soluble group. R3 represents a hydrogen atom or an alkyl group having 1-10 carbon atoms.SELECTED DRAWING: None
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Citation Information

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