Radiation-sensitive composition, cured material and producing method thereof, display device as well as imaging device
JP2024175683APending Publication Date: 2024-12-18JSR CORPORATION
Patent Information
- Application Number
- JP2024091394
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-06-06
- Filing Date
- 2024-06-05
- Publication Date
- 2024-12-18
Smart Images

Figure 00000032_0000 
Figure 00000032_0001
Abstract
To provide a radiation-sensitive composition capable of obtaining a cured material having excellent patterning characteristics and having high refractive index.SOLUTION: A radiation-sensitive composition containing A) components and (B) components. (A) Component: at least one selected from the group consisting of a compound represented by formula (1) and a compound formed by two or more compounds represented by formula (1) bonded via a single bond or a linking group, (B) component: photopolymerization initiator. In formula (1), R1 is a group having one or more heteroatoms selected from the group consisting of a sulfur atom, a nitrogen atom, and a phosphorus atom, a group having an aromatic hydrocarbon ring, or an aliphatic hydrocarbon ring. R2 represents a group having an alkaline soluble group. R3 represents a hydrogen atom or an alkyl group having 1-10 carbon atoms.SELECTED DRAWING: None
Need to check novelty before this filing date? Find Prior Art
Citation Information
Cited By
(Meth)acrylate compounds, photocurable resin compositions, and their cured products
JP2026165911A
