Treatment system with cleaning function and cleaning method

Abstract

To provide a treatment system with a cleaning function which can increase a cleanable range while suppressing increase in a nozzle.SOLUTION: A treatment system 1A with a cleaning function includes: a container 2 for treating an object to be treated; an agitation device 3 for agitating the object to be treated in the container 2; a cleaning device 4 for jetting a liquid from a nozzle 41 arranged in the container 2; and a control device 5 for jetting the liquid from the nozzle 4 while driving the agitation device 3, in a state in which the liquid is stored in the container 2 after the object to be treated has been discharged.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a processing system with a cleaning function and a cleaning method. [Background technology]

[0002] Patent Document 1 discloses a technique for cleaning the inner surface of a tank using a nozzle for cleaning the tank. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Patent No. 6926137 Summary of the Invention [Problem to be solved by the invention]

[0004] However, in nozzle cleaning, there is a limit to the area that can be cleaned with a single or small number of nozzles, so a large number of nozzles are provided for large containers, etc. However, this requires providing the container with a large number of openings for inserting and fixing the nozzles.

[0005] The present invention has been made in consideration of the above-mentioned problems, and its main object is to provide a processing system with a cleaning function and a cleaning method that can increase the area that can be cleaned while suppressing an increase in the number of nozzles. [Means for solving the problem]

[0006] In order to solve the above problems, a processing system with a cleaning function according to one aspect of the present invention includes a container for processing a workpiece, an agitator for agitating the workpiece in the container, a cleaning device for spraying liquid from a nozzle disposed in the container, and a control device for spraying liquid from the nozzle while driving the agitator in a state in which liquid is stored in the container after the workpiece is discharged. This makes it possible to increase the area that can be cleaned while suppressing an increase in the number of nozzles.

[0007] In the above aspect, the stirring device may include a stirring shaft disposed in the container, and the jet of liquid from the nozzle may include a jet directed toward the stirring shaft. This makes it possible to directly clean the stirring shaft.

[0008] In the above aspect, the jet flow toward the stirring shaft may spread in a fan shape in the axial direction of the stirring shaft, which makes it possible to suppress an increase in the number of nozzles and to suppress the occurrence of areas on the stirring shaft that are not directly cleaned, compared to a rod-shaped jet flow.

[0009] In the above aspect, the jet of liquid from the nozzle may include a jet directed toward an inner wall of the container, which makes it possible to directly clean the inner wall of the container.

[0010] In the above aspect, the jet of liquid from the nozzle may include a jet directed from the nozzle in a horizontal direction and / or in a direction above the horizontal direction, which makes it possible to mainly clean the portions of the container that are not immersed in the liquid with the jet of liquid from the nozzle.

[0011] In the above aspect, the lower end of the jet of liquid directed toward the inner wall of the container may be located above the bottom surface of the container. This makes it possible to mainly clean the parts of the container that are not immersed in the liquid with the jet of liquid from the nozzle. Also, the amount of liquid sprayed from the nozzle can be reduced compared to when the lower end of the jet of liquid directed toward the inner wall of the container is located at the bottom surface of the container.

[0012] In the above aspect, the control device may control the amount of liquid in the container so that an edge of the liquid surface in the container being stirred by the stirring device is positioned above a lower edge of the inner wall of the container of the jet of liquid directed toward the inner wall of the container. This makes it possible to clean the inner wall of the container without any gaps.

[0013] In the above aspect, the control device may control the amount of liquid in the container so that the liquid level in the container is located below the nozzle while the stirring device is stirring or stirring is stopped. This makes it possible to prevent the nozzle from being immersed in the liquid accumulated in the container.

[0014] In the above aspect, the control device may control the amount of liquid in the container so that the liquid level in the container during stirring by the stirrer is located above the lower end of the stirrer shaft of the jet flow toward the stirrer shaft at the position of the stirrer shaft. This makes it possible to clean the stirrer shaft without any gaps.

[0015] In the above aspect, the control device may control the amount of liquid in the container so that the liquid level in the container periodically rises and falls. This makes it possible to suppress redeposition of components in the residue that have a lower specific gravity than the liquid and that tend to accumulate near the liquid level.

[0016] In the above aspect, the nozzle may be fixed in the container and remain in the container even when the workpiece is being treated. This makes it possible to simplify the mechanism of the cleaning device compared to a cleaning device in which the nozzle is removed from the container when the workpiece is being treated.

[0017] In the above aspect, the stirring device may include a stirring shaft capable of rotating and revolving within the container, and the jet of liquid from the nozzle may include a fan-shaped jet that spreads in the axial direction of the stirring shaft and is directed toward the stirring shaft rotating at a predetermined position. This makes it possible to directly clean the stirring shaft that is configured to be capable of rotating and revolving by rotating it at a predetermined position.

[0018] In the above aspect, the stirring device may stir the material in the container by rotating the container around a rotation axis, and the nozzle may be a rotatably supported hollow shaft, the axis of which is aligned with the axis of the hollow shaft, and the nozzle may be disposed so as to protrude into the container. This makes it possible to directly clean the inner wall of the rotatable container.

[0019] In addition, a cleaning device according to another aspect of the present invention includes a nozzle disposed in a container provided with an agitator for agitating the workpiece, and a control unit that drives the agitator to spray cleaning liquid from the nozzle while liquid is stored in the container after the workpiece is discharged. This makes it possible to increase the area that can be cleaned while suppressing an increase in the number of nozzles.

[0020] In addition, a cleaning method according to one aspect of the present invention is a method for cleaning a container provided with an agitator for agitating a workpiece, which comprises discharging the workpiece from the container, storing liquid in the container, and spraying the liquid from a nozzle disposed in the container while driving the agitator. This makes it possible to increase the area that can be cleaned while suppressing an increase in the number of nozzles. Effect of the Invention

[0021] According to the present invention, it is possible to increase the washable area while suppressing an increase in the number of nozzles. [Brief description of the drawings]

[0022] [Figure 1] 1 is a diagram showing an example of the configuration of a processing system with a cleaning function according to a first embodiment; [Diagram 2] 10A and 10B are diagrams for explaining an example of the relationship between the liquid level in a container and a jet from a nozzle. [Diagram 3] FIG. 4 is a diagram for explaining an example of the operation of the control device. [Figure 4] FIG. 13 is a diagram showing an example of the configuration of a processing system with a cleaning function according to a second embodiment. [Diagram 5] FIG. 13 is a diagram showing an example of the configuration of a processing system with a cleaning function according to a third embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0023] Hereinafter, an embodiment of the present invention will be described with reference to the drawings. In this specification and each drawing, elements similar to those described above with reference to the previous drawings are given the same reference numerals, and detailed description thereof may be omitted as appropriate.

[0024] Fig. 1 is a diagram showing a configuration example of a processing system with a cleaning function according to a first embodiment. Fig. 2 is a diagram for explaining a relationship example between a liquid level in a container and a jet of a nozzle. Fig. 3 is a diagram for explaining an operation example of a control device.

[0025] As shown in FIG. 1, a processing system with a cleaning function 1A includes a container 2, a stirring device 3, a cleaning device 4, and a control device 5.

[0026] The vessel 2 is a vessel used for treating an object to be treated, for example a reaction vessel for producing chemical products. The object to be treated is, for example, a liquid, a powder, or a mixture thereof. The object to be treated also includes an object to be treated that has been treated in the vessel 2. The stirring device 3 is used for stirring the object to be treated in the vessel 2 during the treatment of the object to be treated.

[0027] The agitator 3 includes an agitator shaft 31 disposed in the center of the container 2. The agitator shaft 31 is provided with an agitator blade 32. The shape of the agitator blade 32 is not particularly limited. The agitator 3 includes a motor 33 for rotating the agitator shaft 31.

[0028] The container 2 is provided with a discharge part for discharging the contents inside the container 2. In this embodiment, a discharge pipe 8 is provided at the bottom of the container 2 as the discharge part. The discharge pipe 8 is provided with a discharge valve 9 for controlling the discharge. The discharge valve 9 is an electric valve that opens and closes in response to a control signal from the control device 5.

[0029] When the material to be treated is discharged from the vessel 2, the material to be treated may remain on the inner wall of the vessel 2, the stirring shaft 31, and the stirring blades 32. In this embodiment, a washing device 4 and a control device 5 are provided to wash away the remaining material adhering to the inner wall of the vessel 2, the stirring shaft 31, and the stirring blades 32.

[0030] In this specification, cleaning is not limited to the act of completely removing any remaining material adhering to the inner walls of the container 2, the agitator shaft 31, or the agitator blades 32, but also refers to contacting liquid with the points in the container where the material to be treated has come into contact and with the material to be treated in the container, including wet-down, a process of wetting the material to be treated in order to prevent the material from scattering inside the container when the material to be treated is a powder, for example.

[0031] The cleaning device 4 includes a nozzle 41 disposed in the container 2, and sprays a cleaning liquid L from the nozzle 41. The nozzle 41 is inserted into the container 2 through an opening 21 provided in the upper part of the container 2 and fixed therein. The nozzle 41 is permanently fixed in the container 2, and remains within the container 2 without being removed or moved outside the container 2 even when the object to be treated is being treated.

[0032] The cleaning device 4 also includes a transport pipe 42, a pump 43, and a tank 44 for supplying the cleaning liquid L to the nozzle 41. The cleaning liquid L stored in the tank 44 is sent to the transport pipe 42 by the pump 43 and sprayed from the nozzle 41. The cleaning liquid L sprayed from the nozzle 41 is stored in the container 2.

[0033] The cleaning liquid L discharged from the discharge pipe 8 of the container 2 is collected in the tank 44, filtered, and then supplied again to the nozzle 41 for recycling. However, the present invention is not limited to this, and the cleaning liquid L discharged from the discharge pipe 8 of the container 2 does not necessarily have to be collected in the tank 44.

[0034] For example, two nozzles 41 are arranged in the container 2. This makes it possible to use the cleaning liquid L sprayed from one nozzle 41 to clean the other nozzle 41 itself and its blind spot (a portion that exists in a direction where the cleaning liquid L cannot be sprayed from the other nozzle 41, such as the inner wall of the tank 44 directly above the other nozzle 41). However, arranging a large number of nozzles 41 requires providing a large number of openings 21, which increases costs, so it is preferable that the number of nozzles 41 is about two or three.

[0035] The control device 5 includes a computer including a CPU, a RAM, a ROM, a non-volatile memory, and an input / output interface. The CPU executes information processing according to a program loaded from the ROM or the non-volatile memory to the RAM. The control device 5 may be a PLC (Programmable Logic Controller).

[0036] The control device 5 controls the agitator 3 and the cleaning device 4. Specifically, the control device 5 drives the motor 33 of the agitator 3 to rotate the agitator shaft 31 disposed in the container 2. In addition, the control device 5 drives the pump 43 of the cleaning device 4 to spray the cleaning liquid L from the nozzle 41 disposed in the container 2.

[0037] Furthermore, the control device 5 detects and controls the amount of the cleaning liquid L in the container 2. Specifically, the control device 5 calculates the amount of the cleaning liquid L accumulated in the container 2 based on the time when the cleaning liquid L flows in from the nozzle 41 and the time when the cleaning liquid L is discharged by the discharge valve 9. Furthermore, the height of the liquid surface may be calculated.

[0038] Without being limited to this, a liquid level sensor may be provided in the container 2 to directly detect the liquid level of the cleaning liquid L, or a flow meter may be provided in the transport pipe 42 to detect the amount of cleaning liquid L flowing into the container 2 from the nozzle 41.

[0039] Furthermore, the control device 5 controls the amount of the cleaning liquid L in the container 2 by driving the discharge valve 9 to discharge the cleaning liquid L from the container 2. Without being limited to this, the control device 5 may control the amount of the cleaning liquid L in the container 2 by adjusting the amount of the cleaning liquid L flowing from the nozzle 41 into the container 2.

[0040] In addition, in the control device 5, the functional unit that controls the agitator 3, the functional unit that controls the cleaning device 4, and the functional unit that controls the discharge valve 9 may be realized as individual devices independent of each other.

[0041] The control device 5, in a state in which the cleaning liquid L is stored in the container 2 after the workpiece is discharged, drives the agitator 3 and sprays the cleaning liquid L from the nozzle 41, thereby cleaning the inside of the container 2. A specific embodiment of the cleaning will be described below.

[0042] 2, the liquid level of the cleaning liquid L stored in the container 2 becomes substantially cone-shaped by being stirred by the stirring shaft 31 of the stirring device 3. Specifically, the central part of the liquid level of the cleaning liquid L becomes a descending liquid level part Ld where the liquid level has descended, and the peripheral part becomes an ascending liquid level part Lu where the liquid level has risen.

[0043] The amount of descent of the liquid level descending part Ld and the amount of rise of the liquid level ascending part Lu relative to the liquid level of the cleaning liquid L when not being stirred are determined according to the rotation speed of the stirring shaft 31, and become larger as the rotation speed of the stirring shaft 31 increases, unless the properties of the cleaning liquid L are changed. The relationship between the amount of descent or rise and the rotation speed is obtained in advance and is used for control.

[0044] Nozzle 41 includes a shaft portion 47 extending downward from opening 21 of container 2, and a ball portion 48 provided at the lower end of shaft portion 47. Ball portion 48 is formed with one or more injection holes 4a for injecting cleaning liquid L. Not limited to injection holes 4a, slits may be formed. In this specification, the shape of ball portion 48 is not limited to a sphere, and may be, for example, an ellipsoid or a shape combining a top and bottom cone of a cylinder. In addition, injection holes and slits may be formed in shaft portion 47.

[0045] The injection hole 4a formed in the ball portion 48 may be an injection hole that injects the cleaning liquid L in a straight line, or may be an injection hole that injects the cleaning liquid L in a diffusive manner. The diffusive injection is an injection in which the cleaning liquid L spreads out as it moves away from the injection hole, for example in a fan shape, a full cone shape, or a hollow cone shape.

[0046] The jets of cleaning liquid L sprayed from nozzle 41 include jets S1 and S2 directed toward agitator shaft 31. Of these, jet S1 is sprayed upward from the horizontal direction, and jet S2 is sprayed downward from the horizontal direction. The jets S1 and S2 directed toward agitator shaft 31 reach agitator shaft 31 and wash away residual matter adhering to agitator shaft 31. S1 and S2 may be jets from the same injection hole.

[0047] The control device 5 controls the amount of cleaning liquid L in the container 2 so that the liquid level of the cleaning liquid L in the container 2 during stirring by the stirring device 3 is located at the center where the stirring shaft 31 is located, above the lower end Sa of the stirring shaft 31 of the jets S1, S2 heading toward the stirring shaft 31.

[0048] That is, the control device 5 controls the amount of cleaning liquid L in the container 2 so that the liquid level descending portion Ld, where the agitation shaft 31 is located, of the liquid level of the cleaning liquid L in the container 2 during stirring is located above the lower end Sa of the agitation shaft 31 of the jets S1, S2 heading toward the agitation shaft 31.

[0049] In other words, the height of the liquid level of the cleaning liquid L (specifically, the height of the liquid level descending portion Ld) is adjusted so that the area of ​​the agitation shaft 31 that is immersed in the cleaning liquid L in the container 2 during agitation partially overlaps with the area that is hit by the jets S1, S2 heading toward the agitation shaft 31.

[0050] In detail, the control device 5 calculates the height of the liquid level of the cleaning liquid L when not being stirred from the liquid volume of the cleaning liquid L in the container 2, and further calculates the height of the liquid level descending portion Ld taking into account the amount of descent of the liquid level descending portion Ld according to the rotation speed of the stirring shaft 31.

[0051] In reality, the jets S1, S2 heading toward the agitator shaft 31 reach the liquid level of the cleaning liquid L (the liquid level descending section Ld where the agitator shaft 31 is located) before reaching the agitator shaft 31. However, in this specification, the lower end Sa on the agitator shaft 31 of the jets S1, S2 heading toward the agitator shaft 31 refers to the lower end of the position on the agitator shaft 31 when the jets S1, S2 heading toward the agitator shaft 31 reach the agitator shaft 31, assuming that no cleaning liquid L has accumulated.

[0052] In addition, the control device 5 may position the liquid level descending portion Ld above the lower end Sa of the jets S1, S2 heading toward the agitation shaft 31 by lowering the rotation speed of the agitation shaft 31 to reduce the amount of descent of the liquid level descending portion Ld.

[0053] The jets of cleaning liquid L sprayed from nozzle 41 include jets S3 and S4 directed toward inner wall 23 of container 2. Of these, jet S3 is sprayed upward from the horizontal direction, and jet S4 is sprayed downward from the horizontal direction. The jets S3 and S4 directed toward inner wall 23 of container 2 reach inner wall 23 and clean away residual matter adhering to inner wall 23. S3 and S4 may be jets from the same injection hole.

[0054] The control device 5 controls the amount of cleaning liquid L in the container 2 so that the edge of the liquid surface of the cleaning liquid L in the container 2 being stirred by the stirring device 3 is positioned above the lower end Sw of the inner wall 23 of the jets S3, S4 heading toward the inner wall 23 of the container 2.

[0055] That is, the control device 5 controls the amount of cleaning liquid L in the container 2 so that the liquid level rising portion Lu of the cleaning liquid L in the container 2 during stirring, which is in contact with the inner wall 23, is positioned above the lower end Sw of the inner wall 23 of the jets S3, S4 heading toward the inner wall 23.

[0056] In other words, the height of the cleaning liquid L (specifically, the height of the liquid level rising portion Lu) is adjusted so that the area of ​​the inner wall 23 of the container 2 that is immersed in the cleaning liquid L in the container 2 during stirring partially overlaps with the area that is hit by the jets S3, S4 heading toward the inner wall 23.

[0057] In detail, the control device 5 calculates the liquid level of the cleaning liquid L when not being stirred from the amount of the cleaning liquid L in the container 2, and further calculates the height of the liquid level rising portion Lu taking into account the amount of rise of the liquid level rising portion Lu according to the rotation speed of the stirring shaft 31.

[0058] In reality, the jets S3, S4 heading toward the inner wall 23 of the container 2 reach the liquid level of the cleaning liquid L (liquid level rising portion Lu in contact with the inner wall 23) before reaching the inner wall 23. However, in this specification, the lower end Sw of the jets S3, S4 heading toward the inner wall 23 of the container 2 refers to the lower end of the position on the inner wall 23 when the jets S3, S4 heading toward the inner wall 23 of the container 2 reach the inner wall 23, assuming that no cleaning liquid L has accumulated.

[0059] In addition, the control device 5 may position the liquid level rising portion Lu above the lower end Sw of the jets S3, S4 heading toward the inner wall 23 by increasing the rotation speed of the stirring shaft 31 to increase the amount of rise of the liquid level rising portion Lu.

[0060] Depending on the type of agitator, the edge of the liquid level in the container may drop during agitation compared to when the container is left stationary, but taking this into account, the cleaning area (area where the jet reaches) can be minimized as much as possible. Also, depending on the type of agitator, the liquid level at the agitator shaft may rise during agitation compared to when the container is left stationary, but as mentioned above, taking this into account, the cleaning area (area where the jet reaches) can be minimized as much as possible. For example, if the agitator is a screw-shaped device equipped with a spiral agitator blade around the agitator shaft, the above-mentioned phenomenon may occur depending on the direction of rotation.

[0061] The control device 5 controls the amount of the cleaning liquid L in the container 2 so that the liquid level of the cleaning liquid L in the container 2 during stirring or when stirring is stopped by the stirring device 3 is located below the nozzle 41. In other words, the nozzle 41 is prevented from being immersed in the liquid level of the cleaning liquid L whether stirring is being started or when stirring is stopped.

[0062] Specifically, the control device 5 calculates the height of the surface of the cleaning liquid L when not being stirred from the amount of the cleaning liquid L in the container 2, and controls the amount of the cleaning liquid L in the container 2 so that the calculated height of the surface is located below the lower end of the nozzle 41. Also, taking into consideration the rise or fall of the surface of the cleaning liquid L at the position of the nozzle 41, the nozzle 41 may be prevented from being immersed in the surface of the cleaning liquid L even during stirring.

[0063] The jet of cleaning liquid L including S1-S4 sprayed from nozzle 41 is mainly sprayed sideways. That is, the lower ends Sa and Sw of the jet from nozzle 41 are located above the bottom of container 2. This is because the jet from nozzle 41 is used to clean the parts of container 2 that are not immersed in cleaning liquid L.

[0064] 3 is a diagram for explaining an example of the operation of the control device 5. The horizontal axis represents the passage of time t. The vertical axis represents the on / off of the agitator 3, the on / off of the cleaning device 4, the amount of cleaning liquid L in the container 2, and the open / close of the drain valve 9.

[0065] Time t0 is a time point after the object to be treated has been discharged from the container 2. At this time, the container 2 is in a state in which the object to be treated remains attached to the inner wall 23 and the stirring shaft 31, for example.

[0066] At time t0, the control device 5 starts driving the agitator 3 and the cleaning device 4. When the cleaning device 4 is driven to spray the cleaning liquid L from the nozzle 41 with the discharge valve 9 closed, the amount of the cleaning liquid L in the container 2 gradually increases over time. The drive of the agitator 3 may be started after a predetermined amount of cleaning liquid L has accumulated in the container 2, or may be started while the cleaning liquid is being accumulated.

[0067] Time t1 is the point in time when the amount of cleaning liquid L in container 2, which continues to increase, reaches first threshold value TH1. When the amount of cleaning liquid L in container 2 reaches first threshold value TH1, control device 5 opens drain valve 9 to drain cleaning liquid L from container 2. When drain valve 9 is opened, the amount of cleaning liquid L in container 2 gradually decreases over time.

[0068] The first threshold value TH1 is set so that the liquid surface of the cleaning liquid L in the container 2 being stirred by the stirring device 3 does not come closer to the nozzle 41 than a predetermined distance.

[0069] At time t2, the amount of cleaning liquid L in container 2, which continues to decrease, reaches a second threshold value TH2 that is lower than first threshold value TH1. When the amount of cleaning liquid L in container 2 reaches second threshold value TH2, control device 5 closes drain valve 9 again. When drain valve 9 is closed, the amount of cleaning liquid L in container 2 gradually increases over time.

[0070] The second threshold value TH2 is set so that the central liquid level descending portion Ld of the liquid level of the cleaning liquid L in the container 2 being stirred by the stirring device 3 is located above the lower end Sa of the jets S1 and S2, and the peripheral liquid level ascending portion Lu is located above the lower end Sw of the jets S3 and S4.

[0071] Specifically, the second threshold value TH2 is set so that the liquid level of the cleaning liquid L in the container 2 during stirring by the stirrer 3 does not approach closer than a predetermined distance to any of the lower ends Sa, Sw. Without being limited to this, the second threshold value TH2 may be set so that the liquid level of the cleaning liquid L in the container 2 during stirring by the stirrer 3 falls below all of the lower ends Sa, Sw.

[0072] At times t3 and t4, the same operations as those at times t1 and t2 are performed. These operations are repeated until a predetermined time has elapsed. During that time, the amount of cleaning liquid L in container 2 periodically fluctuates between first threshold value TH1 and second threshold value TH2. As a result, the liquid level of cleaning liquid L in container 2 periodically rises and falls.

[0073] According to the present embodiment described above, the cleaning liquid L is stored in the container 2, and the cleaning liquid L is sprayed from the nozzle 41 while the stirring device 3 is driven, so that it is possible to increase the cleanable area while suppressing an increase in the number of nozzles 41.

[0074] 2, the jet including S1-S4 from the nozzle 41 does not need to reach the portion of the container 2 that is immersed in the cleaning liquid L, and can be used exclusively to clean the portion of the container 2 that is not immersed in the cleaning liquid L. This eliminates the need to provide a large number of nozzles 41. Also, the amount of cleaning liquid L sprayed from the nozzle 41 can be reduced.

[0075] Furthermore, the part of the container 2 that is immersed in the cleaning liquid L is cleaned by rotating the stirring shaft 31 to make the cleaning liquid L flow, and the part of the container 2 that is not immersed in the cleaning liquid L is cleaned by having the jet from the nozzle 41 reach it, so that the overall cleanable range can be increased. Also, by driving the stirring device 3, it is possible to make the jet from the nozzle 41 reach a part that could not be reached or was difficult to reach at a certain point in time at another point in time. For example, when the stirring device 3 is equipped with the stirring shaft 31, the jets S1 and S2 directed from the nozzle 41 toward the stirring shaft 31 cannot reach the surface of the stirring shaft 31 that is not facing the nozzle 41 at that point in time (the surface of the stirring shaft 31 that is blocked by the stirring shaft 31 itself and cannot be seen when the stirring shaft 31 is viewed from the nozzle 41), but by driving the stirring device 3 to rotate the stirring shaft 31, the surface of the stirring shaft 31 that was not facing the nozzle 41 at that point in time faces the nozzle 41 at another point in time, so that the jets S1 and S2 directed from the nozzle 41 toward the stirring shaft 31 can reach it.

[0076] Furthermore, according to this embodiment, jets S1, S2 are formed from nozzle 41 toward agitator shaft 31, making it possible to clean portions of agitator shaft 31 that are not immersed in cleaning liquid L. The jets S1, S2 from nozzle 41 toward agitator shaft 31 spread out in a fan shape in the axial direction of agitator shaft 31, making them suitable for cleaning agitator shaft 31.

[0077] Furthermore, according to this embodiment, the amount of cleaning liquid L in the container 2 is controlled so that the liquid level descending portion Ld, where the agitation shaft 31 is located, of the liquid level of the cleaning liquid L in the container 2 during stirring is located above the lower end Sa of the agitation shaft 31 of the jets S1, S2 heading toward the agitation shaft 31, thereby making it possible to clean the agitation shaft 31 without any gaps.

[0078] In this way, even if the center of the liquid level of the cleaning liquid L in the container 2 during stirring drops and a liquid level descending portion Ld is formed, the jets S1 and S2 heading toward the stirring shaft 31 can be directed toward the portion of the stirring shaft 31 exposed by the liquid level descending portion Ld, thereby cleaning it.

[0079] Furthermore, according to this embodiment, the amount of cleaning liquid L in the container 2 is controlled so that the liquid level rising portion Lu of the liquid surface of the cleaning liquid L in the container 2 during stirring, which is in contact with the inner wall 23, is positioned above the lower end Sw of the inner wall 23 of the jets S3, S4 heading toward the inner wall 23, thereby making it possible to clean the inner wall 23 of the container 2 without any gaps.

[0080] Furthermore, since the edge of the liquid surface of the cleaning liquid L in the container 2 rises during stirring to form a liquid level rise portion Lu, the jets S3, S4 heading toward the inner wall 23 do not need to spread downward, and the amount and pressure of the cleaning liquid L sprayed from the nozzle 41 can be reduced.

[0081] Furthermore, according to this embodiment, the amount of cleaning liquid L in container 2 is controlled so that the liquid level of cleaning liquid L in container 2 periodically moves up and down, thereby making it possible to prevent components in the residue that have a smaller specific gravity than the cleaning liquid L and that tend to accumulate near the liquid level from re-attaching to the inner wall 23 of container 2 or the stirring shaft 31.

[0082] Furthermore, according to this embodiment, the nozzle 41 is permanently fixed within the container 2 and remains within the container 2 even when the workpiece is being processed, so the mechanism of the cleaning device 4 can be simplified compared to the case where a cleaning device that can be removed from the container when the workpiece is being processed is provided.

[0083] Fig. 4 is a diagram showing a configuration example of a processing system with a cleaning function according to the second embodiment. As shown in Fig. 4, the agitation device 3 of the processing system with a cleaning function 1B includes an agitation shaft 31 capable of rotating and revolving within the container 2.

[0084] Specifically, the stirring device 3 includes an orbital shaft 36 disposed in the center of the container 2, an arm 37 extending radially from the orbital shaft 36, and a stirring shaft 31 connected to the arm 37. The container 2 has an inverted cone shape that tapers downward.

[0085] The nozzle 41 is disposed at a height that does not interfere with the arm 37 that rotates around the revolution axis 36. In the example shown in the figure, only one nozzle 41 is shown, but two or three nozzles 41 may be disposed.

[0086] When the cleaning liquid L is stored in the container 2 after the object to be treated has been discharged, the control device 5 stops the revolution of the agitation shaft 31 and causes the agitation shaft 31 to rotate at a predetermined position while spraying the cleaning liquid L from the nozzle 41.

[0087] The jet of cleaning liquid L sprayed from nozzle 41 includes a jet S5 directed toward agitation shaft 31 rotating at a predetermined position. Jet S5 directed toward agitation shaft 31 spreads in a fan shape in the axial direction of agitation shaft 31.

[0088] The control device 5 controls the amount of the cleaning liquid L in the container 2, similarly to the first embodiment. For example, the control device 5 controls the amount of the cleaning liquid L in the container 2 so that the liquid level of the cleaning liquid L in the container 2 being stirred by the stirrer 3 is located above the lower end of the stirring shaft 31 of the jet S5 heading toward the stirring shaft 31, at the position of the stirring shaft 31.

[0089] According to this embodiment, even in the SV mixer type, it is possible to increase the washable range while suppressing an increase in the number of nozzles 41.

[0090] 5 is a diagram showing an example of the configuration of a processing system with a cleaning function according to the third embodiment. The processing system with a cleaning function 1C includes a so-called conical dryer type container 2 and an agitator 3.

[0091] The container 2 has a substantially spherical shape, and is rotatably supported by supports 76, 77 arranged on both sides. The agitator 3 agitates the material to be processed in the container 2 by rotating the container 2 around a rotation axis.

[0092] A hollow shaft 79 is provided on one of the support parts 76. The axis of the hollow shaft 79 is on the same line as the axis of the rotation shaft of the container 2. The nozzle 41 is disposed so as to protrude from the hollow shaft 79 into the container 2.

[0093] The control device 5 causes the cleaning liquid L to be sprayed from the nozzle 41 while rotating the container 2 by the agitator 3 in a state in which the cleaning liquid L is stored in the container 2 after the object to be treated has been discharged.

[0094] The jets of cleaning liquid L sprayed from nozzle 41 include jets S6, S7 directed toward side walls 26, 27 of container 2. Side walls 26, 27 are close to the rotation axis of container 2 and are not in contact with cleaning liquid L accumulated in container 2.

[0095] That is, the parts of the container 2 other than the side walls 26, 27 are cleaned by rotating the container 2 and flowing the cleaning liquid L, and the side walls 26, 27 of the container 2 are cleaned by having the jets S6, S7 from the nozzle 41 reach them, thereby increasing the overall area that can be cleaned.

[0096] According to this embodiment, even in the conical dryer, it is possible to increase the washable range while suppressing an increase in the number of nozzles 41.

[0097] Although the embodiment of the present invention has been described above, the present invention is not limited to the above-described embodiment, and it is needless to say that various modifications can be made by those skilled in the art. [Explanation of symbols]

[0098] 1A, 1B, 1C: treatment system with cleaning function; 2: container; 3: agitator; 4: cleaning device; 5: control device; 8: discharge pipe; 9: discharge valve; 21: opening; 23: inner wall; 26, 27: side wall; 31: agitator shaft; 32: agitator blade; 33: motor; 36: revolution shaft; 37: arm; 41: nozzle; 42: transport pipe; 43: pump; 44: tank; 47: shaft portion; 48: ball portion; 4a: injection hole; 76, 77: support portion; 79: hollow shaft; L: cleaning liquid; Lu: liquid level rise portion; Ld: liquid level fall portion; S1-S7: jet

Claims

1. A container for treating the object to be treated; A stirring device for stirring the object to be treated in the container; a cleaning device that sprays liquid from a nozzle disposed in the container; a control device that drives the stirring device and sprays the liquid from the nozzle in a state where the liquid is stored in the container after the object to be treated has been discharged; A processing system with a cleaning function.

2. The stirring device includes a stirring shaft disposed within the container, The liquid jet from the nozzle includes a jet toward the stirring shaft. The processing system with cleaning function according to claim 1 .

3. The jet of liquid from the nozzle includes a jet directed toward an inner wall of the container. The processing system with cleaning function according to claim 1 .

4. The jet of liquid from the nozzle includes a jet of liquid directed from the nozzle in a horizontal direction and / or in an upward direction from the horizontal direction. The processing system with cleaning function according to claim 1 .

5. the control device controls the amount of liquid in the container so that an edge of the liquid surface in the container being stirred by the stirring device is positioned above a lower edge of the inner wall of the container of a jet of liquid directed toward the inner wall of the container. The processing system with a cleaning function according to claim 3 .

6. The control device controls the amount of liquid in the container so that the liquid level in the container during stirring or when stirring is stopped by the stirring device is located below the nozzle. The processing system with cleaning function according to claim 1 .

7. The control device controls the amount of liquid in the container so that the liquid level in the container being stirred by the stirring device is located above a lower end of the stirring shaft of a jet flow toward the stirring shaft at the position of the stirring shaft. The processing system with a cleaning function according to claim 2 .

8. The nozzle is fixed in the container and is present in the container even when the object to be treated is treated. The processing system with cleaning function according to claim 1 .

9. A method for cleaning a container provided with an agitation device for agitating a workpiece, comprising: Discharging the material to be treated from the container; With the liquid stored in the container, the liquid is sprayed from a nozzle disposed in the container while the stirring device is driven. Cleaning method:

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