Intrusion prevention system and intrusion prevention method

Abstract

To provide a precursor source system, a semiconductor processing apparatus having the precursor source system, a method, and an apparatus that prevent precursor liquid from entering from a source container.SOLUTION: A precursor source system 100 comprises a source container 110, a filling line 210 with a filling port 201 that fills the source container during use, a carrier gas line 220 including carrier gas inlet 202 that releases carrier gas into a headspace 120 of the source container, an outlet line 230 with outlet 203, and a level sensor 240. The carrier gas inlet and filling port extend deeper into the source container than the outlet to prevent precursor liquid from entering the outlet line.SELECTED DRAWING: Figure 1c

Description

Technical Field

[0001] The disclosure of the present application (hereinafter referred to as the present disclosure) generally relates to the field of substrate processing. And, without limitation, in particular, to a precursor source system in a processing apparatus. Background

[0002] Note that this section describes useful background information, but it is not to be construed as admitting that the techniques described herein represent the state of the art.

[0003] Impurities in a processing apparatus can cause significant and irreparable damage due to the small size of the structures being manufactured. When unwanted substances enter the reaction chamber or its supply lines, they can harm the process. Such unwanted substances can originate either outside the process or within the process itself. For example, if the reaction chamber is configured to operate with gases, backflow of liquids or solids into the reaction chamber can be harmful. Summary

[0004] The appended claims define the scope of protection. Matters not covered by the claims among the examples and technical descriptions of the devices, products and / or methods in the description and / or drawings of this specification are presented not as embodiments of the present invention, but as background art or examples useful for understanding the present invention.

[0005] An object of certain embodiments of the present disclosure is to prevent unwanted substances from entering the reaction chamber or, at least, to provide a solution alternative to existing technologies. Accordingly, certain disclosed embodiments provide novel devices and methods for preventing the intrusion of precursor fluids from source containers.

[0006] According to a first exemplary aspect of the present invention, a precursor source system is provided as follows. The system includes a source container; a filling line having a filling port configured to fill the source container during use; A carrier gas line including a carrier gas inlet configured to release a carrier gas into a headspace of the source container; An outlet line having an outlet, and is provided. The carrier gas inlet and the filling port extend deeper into the source container than the outlet in order to prevent the precursor liquid from entering the outlet line.

[0007] In some embodiments, the carrier gas inlet and the filling port extend further (vertically downward and deeper) into the source container relative to the position of the outlet. In some embodiments, the carrier gas inlet and the filling port extend deeper (vertically) into the source container relative to the outlet.

[0008] In some embodiments, the filling port is located deeper in the source container relative to the outlet and the carrier gas inlet. In some embodiments, the filling port extends deeper (vertically) into the source container relative to the outlet and the carrier gas inlet. In some embodiments, the outlet is disposed at a higher position (above, at a higher position in the vertical direction) than the carrier gas inlet. This is to prevent the precursor liquid from entering the outlet line.

[0009] In some embodiments, the precursor source system includes a filling line communicating with the filling port. In some embodiments, the precursor source system includes a filling line attached to the filling port. In some embodiments, the precursor source system includes a carrier gas line communicating with the carrier gas inlet. In some embodiments, the precursor source system includes a carrier gas line attached to the carrier gas inlet. In some embodiments, the precursor source system includes an outlet line attached to the outlet. In some embodiments, the filling port, the carrier gas inlet, and the outlet are disposed within the source container.

[0010] Depending on the embodiment, the source container includes a plurality of filling lines. Depending on the embodiment, the source container includes a plurality of carrier gas lines. Depending on the embodiment, the source container includes a plurality of outlet lines. In the embodiments disclosed herein, only one filling line, carrier gas line, and outlet line are depicted, but the disclosed matters are equally applicable even if there are a plurality of these lines. The same applies to the filling port, carrier gas inlet, and outlet.

[0011] Therefore, depending on the embodiment, the outlet is at a (height) level exceeding the (height) level at which the carrier gas is discharged into the (headspace of the) source container. When there are a plurality of outlets, even the lowest-positioned outlet (i.e., the outlet closest to the bottom of the source container) is at a position higher than the carrier gas discharge port.

[0012] Depending on the embodiment, the filling line enters the source container through the lid or upper part of the source container. Depending on the embodiment, the end point of the filling line forms the filling port. Depending on the embodiment, the end point of the filling line further penetrates deeper (vertically) into the (liquid contained in the) source container with respect to the carrier gas inlet and the outlet (inside the source container). Depending on the embodiment, the precursor source system further includes a filling line, and the end point of the filling line forms the filling port.

[0013] Depending on the embodiment, the carrier gas line enters the source container through the lid or upper part of the source container. Depending on the embodiment, the end point of the carrier gas line forms the carrier gas inlet. Depending on the embodiment, the end point of the carrier gas line penetrates deeper (vertically) into the source container with respect to the outlet. Depending on the embodiment, the precursor source system further includes a carrier gas line, and the end point of the carrier gas line forms the carrier gas inlet.

[0014] In some embodiments, the outlet is located at the inlet of the outlet line. In some embodiments, the outlet line enters the source container through the lid or the upper part of the source container. In some embodiments, the end point of the outlet line forms the outlet. In some embodiments, the filling line, the carrier gas line, and the outlet line enter the source container through the lid or the upper part of the source container. In some embodiments, each of the above lines is in the form of a pipe or a tube.

[0015] In some embodiments, the precursor source system comprises a level sensor. In some embodiments, the level sensor is configured to determine the level of the precursor liquid in the source container. In some embodiments, the precursor source system comprises a level sensor configured to determine the need to fill the source container. In some embodiments, the level sensor is an ultrasonic level sensor.

[0016] In some embodiments, the carrier gas line comprises a pressure sensor. In some embodiments, the pressure sensor is configured to measure the pressure of the carrier gas line. In some embodiments, the pressure sensor is configured to indirectly measure the pressure of the source container. In some embodiments, the pressure sensor is configured to indirectly measure the pressure of the precursor source system.

[0017] In some embodiments, the pressure sensor is configured to measure a change in pressure. In some embodiments, the pressure sensor is configured to measure an increase in pressure. In some embodiments, the pressure sensor is configured to measure pressure as a function of time. In some embodiments, the pressure sensor is configured to measure pressure as a function of any process variable such as temperature. In some embodiments, the pressure sensor is configured to measure pressure as a function of the process stage.

[0018] In some embodiments, the carrier gas line comprises a pressure sensor configured to indirectly determine the level of the precursor liquid in the source container when the level of the precursor liquid exceeds a predetermined maximum filling level. In some embodiments, the precursor source system is configured to provide one or more indications regarding the level of the precursor liquid in the source container when the level of the precursor liquid exceeds a predetermined maximum filling level. In some embodiments, the one or more indications are provided by a level sensor. In some embodiments, the one or more indications are provided by measuring the pressure of the carrier gas line through the pressure sensor.

[0019] In some embodiments, when the height of the precursor liquid is at the height of the carrier gas inlet in the source container, the pressure sensor indicates an increase in pressure. In some embodiments, when the height of the precursor liquid is above (vertically) the height of the carrier gas inlet in the source container, the pressure sensor indicates an even greater increase in pressure. In some embodiments, when the height of the precursor liquid is high relative to the (vertical) height of the carrier gas inlet in the source container, the pressure sensor indicates an even higher pressure increase.

[0020] In some embodiments, the pressure indicates the height of the precursor liquid in the source container. In some embodiments, the greater the pressure of the carrier gas line, the higher the level (height) of the precursor liquid in the source container.

[0021] In some embodiments, the source container has a headspace and a liquid. In some embodiments, the surface of the liquid separates the headspace from the portion occupied by the liquid. In some embodiments, the carrier gas inlet is configured to release carrier gas into the headspace of the source container.

[0022] In some embodiments, the source container contains a precursor liquid. In some embodiments, the precursor liquid forms the liquid. In some embodiments, the precursor liquid evaporates from the surface of the precursor liquid. In some embodiments, the evaporation occurs in the headspace of the source container. In some embodiments, the carrier gas mixes with the evaporated precursor gas. In some embodiments, the carrier gas is configured to carry the evaporated precursor gas. In some embodiments, the outlet line is configured to send the evaporated precursor gas carried by the carrier gas to the reaction chamber.

[0023] In some embodiments, the precursor liquid vaporizes from the surface of the precursor liquid. In some embodiments, the vaporization occurs in the headspace of the source container. In some embodiments, the carrier gas is configured to mix with the vaporized precursor gas. In some embodiments, the carrier gas is configured to transport the vaporized precursor gas. In some embodiments, the outlet line is configured to send the vaporized precursor gas carried by the carrier gas to the reaction chamber.

[0024] According to a second exemplary aspect of the present invention, in a precursor source system according to the first aspect, a method is provided for preventing the precursor liquid from entering the outlet line (overfilling of the precursor liquid) by monitoring the pressure of the carrier gas line leading to the carrier gas inlet.

[0025] In some embodiments, the monitoring includes measuring the pressure of the carrier gas line. In some embodiments, the monitoring includes measuring the pressure of the carrier gas line by a pressure sensor.

[0026] According to some embodiments, the method includes detecting, based on the monitoring, a risk that the precursor fluid enters the outlet line (the precursor fluid is overfilled). According to some embodiments, the detection of the risk includes measuring an increase in pressure by a pressure sensor. According to some embodiments, the risk that the precursor fluid enters the outlet line includes the level (height) of the precursor fluid rising in the source container beyond a predetermined maximum filling level (height).

[0027] According to some embodiments, in response to detecting a risk that the precursor fluid enters the outlet line based on the monitoring, an alarm is provided (to the operator).

[0028] According to a third exemplary aspect of the present invention, a semiconductor processing apparatus is provided that includes a precursor source system according to the first aspect.

[0029] According to some embodiments, the semiconductor processing apparatus is a thin film forming apparatus. According to some embodiments, the semiconductor processing apparatus is a chemical vapor deposition (CVD) apparatus. According to some embodiments, the semiconductor processing apparatus is an atomic layer deposition (ALD) apparatus. According to some embodiments, the semiconductor processing apparatus is an etching apparatus.

[0030] According to a fourth exemplary aspect of the present invention, an apparatus is provided that includes at least one processor and at least one memory storing computer program instructions (or a computer program), wherein the computer program instructions (or the computer program) are configured, with the at least one processor, to cause the apparatus to perform the method according to the second exemplary aspect.

[0031] According to a fifth exemplary aspect of the present invention, a computer program is provided that includes computer-executable program code that, when executed by a processor, causes an apparatus to perform the method according to the second exemplary aspect.

[0032] Depending on the embodiment, the filling line or filling port is arranged differently from or independently of the carrier gas line and carrier gas inlet, and the outlet line and outlet. Thus, according to a further exemplary aspect of the present invention, a precursor source system is provided, comprising: a source container; a filling line having a filling port configured to fill the source container during use; a carrier gas line including a carrier gas inlet configured to release carrier gas into the headspace of the source container; and an outlet line having an outlet, wherein the carrier gas inlet extends deeper into the source container than the outlet to prevent precursor liquid from entering the outlet line. Depending on the embodiment, the carrier gas inlet extends relatively deeper into the source container than the outlet.

[0033] According to further embodiments, embodiments according to further exemplary aspects are provided, which include the subject matter of any single embodiment presented in relation to the first aspect or embodiments that combine the subject matter of any plurality of embodiments presented in relation to the first aspect with the subject matter of any other embodiment or embodiments.

[0034] Although various aspects and embodiments have been presented, these are not presented to limit the scope of the invention. These embodiments have only been used to illustrate specific aspects and steps that can be used in various implementations. Depending on the embodiment, it may only be presented with reference to specific exemplary aspects. It should be understood that the corresponding embodiments are also applicable to other aspects. In particular, the embodiments described in relation to the first aspect are also applicable to other aspects. These embodiments can be combined as appropriate.

Brief Description of the Drawings

[0035] Some embodiments will be described with reference to the following accompanying drawings.

Fig. 1a

Fig. 1b

Fig. 1c

Fig. 1d

Fig. 2

Fig. 3

[0036] In the following description, like reference numerals denote like elements or steps.

[0037] Figures 1a, 1b, 1c, and 1d show four exemplary situations of a precursor source system 100 according to an exemplary embodiment. The precursor source system 100 has a source container 110. The source container 110 is any suitable container for holding one or more precursor chemicals, such as a bottle, an ampoule, a reservoir, a chamber, a tank, etc. In some embodiments, the source container 110 is an unpartitioned space (enclosure). In some embodiments, the source container 110 has no partition walls (for dividing the source container 110 into smaller sections) within itself. The source container 110 has a headspace (upper space) 120 and a liquid 130. The surface of the liquid separates the headspace 120 and the portion occupied by the liquid 130. The volumes of the headspace 120 and the liquid 130 vary depending on the volume of the other. The liquid 130 is a precursor liquid, a precursor chemical, or other liquid suitable for use in a process.

[0038] The precursor liquid is present in the source container 110. The precursor liquid vaporizes and / or evaporates from the surface of the precursor liquid. In some embodiments, the precursor liquid vaporizes and / or evaporates within the source container 110. When vaporization and / or evaporation occur, a precursor gas is formed within the headspace 120 of the source container 110. In some embodiments, the source container is heated.

[0039] The precursor source system 100 includes a filling port 201. In some embodiments, the precursor source system 100 further includes a filling line 210 that communicates with the filling port 201. In some embodiments, the filling line 210 enters the source container 110 through a lid or upper portion of the source container 110. The filling line 210 is configured to supply the precursor liquid to the source container 110. The filling port 201 is configured to fill the source container 110 during use. In some embodiments, the term "during use" means "without removing and / or replacing the source container 110". In some embodiments, the phrase "filling the source container 110 during use" is understood to mean that the source container 110 remains usable throughout the process. There is no need to remove the source container 110 for refilling.

[0040] The precursor source system 100 includes a carrier gas inlet 202. In some embodiments, the precursor source system 100 further includes a carrier gas line 220 that communicates with the carrier gas inlet 202. In some embodiments, the carrier gas line 220 enters the source container 110 through a lid or upper portion of the source container 110. The carrier gas line 220 is configured to supply carrier gas to the source container 110. The carrier gas inlet 202 is configured to discharge carrier gas into the headspace 120 of the source container 110.

[0041] Preferably, the carrier gas inlet 202 is disposed above (relatively high position) the surface of the liquid in the source container 110. Preferably, the carrier gas inlet 202 is disposed at a position relatively high and perpendicular to the surface of the liquid in the source container 110.

[0042] In some embodiments, the carrier gas line 220 includes a pressure sensor 225. In some embodiments, the pressure sensor 225 is configured to (indirectly) measure the pressure in the source container 110. In some embodiments, the pressure sensor 225 is configured to measure a change in pressure, such as an increase in pressure. In some embodiments, the pressure sensor 225 is configured to measure the pressure as a function of time or as a function of any process variable, such as temperature. In some embodiments, the pressure sensor 225 is configured to measure all of the above values simultaneously. The pressure sensor 225 is configured to (indirectly) determine the level of the precursor liquid in the source container 110.

[0043] The precursor source system 100 includes an outlet 203. The outlet 203 is attached to an outlet line 230. In some embodiments, the outlet line 230 enters the source container 110 through the lid or top of the source container 110.

[0044] Figures 1a, 1b, 1c, and 1d show the vertical positions of the outlet 203 and the carrier gas inlet 202. In some embodiments, the outlet 203 is disposed at a vertically higher position (above) than the carrier gas inlet 202. That is, the outlet 203 has a shorter length penetrating through the source compared to the carrier gas inlet 202 and the filling port 201. Such a relative height arrangement has the effect of preventing the precursor liquid from entering the outlet line 230. In some embodiments, the carrier gas inlet 202 and the filling port 201 penetrate further into the source container 110 relative to the outlet 203. In some embodiments, the filling port 201 has a greater penetration amount into the source container 110 compared to both the outlet 203 and the carrier gas inlet 202. The outlet line 230 is configured to send the precursor gas carried by the carrier gas to the reaction chamber.

[0045] In some embodiments, the precursor source system 100 includes a level sensor (height sensor 9240). In some embodiments, the level sensor 240 is an ultrasonic level sensor. The level sensor 240 is configured to provide primary information regarding the level of the precursor liquid in the source container 110. The level sensor 240 is configured to determine the need for filling the source container 110.

[0046] In some embodiments, the precursor source system 100 is configured to provide secondary information regarding the level of the precursor liquid in the source container 110 using the pressure provided by the pressure sensor 225.

[0047] A first situation example of the precursor source system in a certain embodiment is shown in Figure 1a. The source container 110 is filled with the precursor liquid up to a predetermined maximum filling level (MAX LEVEL). This is shown as the L1 level of the precursor liquid.

[0048] In the ideal (normal, optimal) operation of the precursor source system 100, the level (height) of the precursor liquid does not exceed a predefined maximum filling level (MAX LEVEL). In some embodiments, the level sensor 240 is configured to determine the need to fill the source container 110 when the level of the precursor liquid during processing falls below the predefined maximum filling level (MAX LEVEL).

[0049] However, there may be situations where the precursor source system 100 does not operate ideally. This can occur, for example, due to a failure of the level sensor 240. According to the second example situation shown in FIG. 1b, the level of the precursor liquid has risen above the predefined maximum filling level (MAX LEVEL) in the source container 110. This is shown as the L2 level of the precursor liquid.

[0050] A third example situation is shown in FIG. 1c. In this third situation, it is possible that the level detection through the level sensor 240 and the determination of the need to fill the source container 110 have failed. The level of the precursor liquid L3 has risen up to the carrier gas inlet 202.

[0051] FIG. 1c shows that preventing the precursor liquid from entering the outlet line 230 is indicated through the vertical height difference L4. The vertical height difference L4 indicates that the outlet 203 is placed higher (above) relative to the carrier gas inlet 202 to prevent the precursor liquid from entering the outlet line 230.

[0052] A fourth example situation is shown in FIG. 1d. The level (height) of the precursor liquid L5 is higher than the carrier gas inlet 202 (higher than the level (height) of the carrier gas inlet 202).

[0053] FIG. 1d shows that preventing the precursor liquid from entering the outlet line 230 is indicated through the vertical height difference L6. The vertical height difference L6 indicates that the outlet 203 is placed higher (above) relative to the carrier gas inlet 202 to prevent the precursor liquid from entering the outlet line 230.

[0054] In some embodiments, the pressure sensor 225 measures an increase in pressure when the level of the precursor fluid is at the level of the carrier gas inlet 202 in the source container 110 (FIG. 1c). In some embodiments, the pressure sensor 225 measures an even greater pressure increase when the level of the precursor fluid is higher (above the level) than the level of the carrier gas inlet 202 in the source container 110 (FIG. 1d). In some embodiments, the pressure sensor 225 measures a pressure increase when the level of the precursor fluid rises at the level of the carrier gas inlet 202 or when it is higher (above the level) than the level of the carrier gas inlet 202.

[0055] In some embodiments, a method is provided for preventing the precursor fluid from entering the outlet line 230 by monitoring the pressure of the carrier gas line 220 leading to the carrier gas inlet 202 of the precursor source system 100.

[0056] In some embodiments, said monitoring includes measuring the pressure of the carrier gas line 220 by the pressure sensor 225. In some embodiments, said monitoring includes measuring the pressure of the carrier gas line 220 continuously or at predetermined time intervals. In some embodiments, the method includes detecting a risk that the precursor fluid will enter the outlet line 230 based on said monitoring.

[0057] Even if the level of the precursor fluid rises above (exceeds) a predetermined maximum filling level (MAX LEVEL) in the source container 110, for example due to a malfunction of the level sensor 240, by the inventive method of placing the carrier gas inlet 202 deeper in the source container 110 relative to the outlet 203 and monitoring the pressure of the carrier gas line 220 leading to the carrier gas inlet 202 in the precursor source system 100, the precursor fluid is prevented from entering the outlet line until the situation is corrected or until the actions necessary to return the precursor source system 100 to normal operation are performed, and the precursor fluid can be maintained within the source container 110.

[0058] Figure 2 schematically shows an apparatus 300, such as a semiconductor processing apparatus like a thin film forming apparatus, including a disclosed precursor source system according to an embodiment. Depending on the embodiment, this apparatus is an ALD reactor, a CVD reactor, or another type of deposition or etching apparatus.

[0059] The apparatus 300 includes a reaction chamber 301 that surrounds a reaction space 310. Depending on the embodiment, the reaction space 310 is heated. The reaction chamber 301 houses a substrate 350 or a plurality of substrates. The precursor is supplied to the reaction chamber 301 through a reaction chamber inlet 302. The precursor gas is supplied from the precursor source system 100 to the reaction chamber inlet 302 through a precursor source system outlet line 230 (the outlet line 230 in FIGS. 1a, 1b, 1c, and 1d). The precursor source system outlet line 230 extends to (is attached to) the reaction chamber inlet 302.

[0060] Depending on the embodiment, the apparatus 300 includes a plurality of precursor source systems 100. Preferably, a plurality of precursor gases are supplied to the reaction chamber inlet 302 through their respective precursor source systems 100 or their respective precursor system outlet lines 230. In the case of ALD processing, a plurality of precursor gases are supplied alternately. Depending on the embodiment, excess precursor gas exits the reaction chamber 301 through an exhaust line 307. Depending on the embodiment, the intake of the precursor gas is from the upper part of the reaction chamber 301, and the discharge of the precursor gas is from the lower part of the reaction chamber 301. Depending on the embodiment, the reaction chamber 301 is a vertical flow chamber.

[0061] FIG. 3 is a block diagram of a computer control system of a source container or a thin film forming apparatus according to an exemplary embodiment. The control system 750 includes at least one processor 751 for controlling the operation of the apparatus and at least one memory 752 for storing a computer program or software 753. The software 753 includes program instructions to be executed by at least one processor 751 to control the apparatus. Typically, the software 753 includes an operating system and other applications. Depending on the embodiment, the control system 750 is configured as a computerized system using one or more computers.

[0062] At least one memory 752 may form part of the apparatus. It may also include attachable modules. The control system 750 further includes at least one communication unit 754. The communication unit 754 provides an interface for internal communication of the film forming apparatus. Depending on the embodiment, the control unit 750 uses the communication unit 754 to send instructions or commands to one or more pressure sensors, one or more source containers, valves, and other regulating devices (not shown). Depending on the embodiment, the control unit 750 uses the communication unit 754 to receive data from various parts of the apparatus. In a preferred embodiment, the control unit 750 uses the communication unit 754 to receive pressure measurement data from the pressure sensor 225 in the carrier gas line 220.

[0063] The control system 750 may further include a user interface 756 for cooperating with the operator. Thereby, for example, an input such as a processing parameter may be received from the user. Depending on the embodiment, the user interface 756 is connected to at least one processor 751.

[0064] Regarding the operation of the device, the control system 750 controls, for example, the filling of the source container 110 through the filling port 201 in use, the release of the carrier gas into the headspace 120 of the source container 110 through the carrier gas inlet 202, and the delivery of the vaporized and / or evaporated precursor gas carried by the carrier gas to the reaction chamber through the outlet line 230. In some embodiments, the filling of the source container 110 through the filling port 201 in use is controlled by controlling a valve (not shown) in the filling line 210. In some embodiments, releasing the carrier gas into the headspace 120 of the source container 110 through the carrier gas inlet 202 is controlled by controlling a valve (not shown) in the carrier gas line 220. In some embodiments, software 753 (computer program) having at least one processor 751 is configured to determine the level of the precursor liquid in the source container 110 based on the received pressure measurement data. In some embodiments, the pressure measurement data is received from a pressure sensor 225 in the carrier gas line 220.

[0065] Without limiting the technical scope and interpretation of the invention according to the claims, one or more technical effects of the exemplary embodiments disclosed herein are listed below. The technical effect of the present invention is to prevent the precursor fluid from entering the outlet line, and thus to prevent the precursor fluid from entering the reaction chamber of the processing apparatus. A further technical effect is to keep the reaction chamber cleaner throughout the process. A further technical effect is to provide a reduction in defects in the final product due to a fouled reaction chamber. A further technical effect is to provide a final product of better quality due to fewer defects in the final product caused by a fouled reaction chamber. A further technical effect is to provide secondary detection means for determining the level of the precursor fluid in the source container by pressure measurement carried out in the carrier gas line when the level of the precursor fluid is above a predetermined maximum filling level. Note that the primary detection is a level sensor. A further technical effect is that even if the level sensor fails, it is possible to prevent the precursor fluid from entering the outlet line, and thus to prevent the precursor fluid from entering the reaction chamber of the processing apparatus. A further technical effect is to prevent the precursor fluid from entering the outlet line by monitoring the pressure in the carrier gas line.

[0066] Various embodiments have been introduced. Phrases such as "having", "comprising", and "including" should be construed as open-ended and do not exclude the existence of other elements. From the above description, a complete and beneficial description of the best mode contemplated by the inventors for practicing the present invention has been provided using specific implementations and non-limiting examples of embodiments. However, as will be apparent to those skilled in the art, the details of the above-described embodiments do not limit the present invention, and other embodiments can be implemented using equivalent means or combinations of various embodiments without departing from the features of the present invention.

[0067] Furthermore, the features of the exemplary embodiments disclosed above may be used without using the corresponding other features. However, the above description should be regarded as merely an example for explaining the principle of the present invention and not as limiting it. The scope of the present invention is limited only by the appended claims.

Claims

1. 1. A precursor source system comprising: A source container; a filling line having a filling port configured in use to fill the sauce container; a carrier gas line including a carrier gas inlet configured to release a carrier gas into a headspace of the source container; an outlet line having an outlet; wherein the carrier gas inlet and the fill port extend further into the source container than the outlet to prevent precursor liquid from entering the outlet line.

2. 10. The precursor source system of claim 1, wherein the fill line, the carrier gas line, and the exit line enter the source container through a lid or top of the source container.

3. 10. The precursor source system of claim 1, configured to provide one or more indications of the level of precursor liquid in the source container if the level of precursor liquid exceeds a predetermined maximum fill level.

4. 10. The precursor source system of claim 1, wherein the carrier gas line comprises a pressure sensor configured to measure a pressure in the carrier gas line.

5. 10. The precursor source system of claim 1, further comprising a level sensor configured to determine a need to fill the source container.

6. The precursor source system of claim 5 , wherein the level sensor is an ultrasonic level sensor.

7. 10. The precursor source system of claim 1, wherein the fill port is deep within the source container relative to the outlet and the carrier gas inlet.

8. 10. A method of preventing precursor liquid from entering an outlet line in a precursor source system according to claim 1 by monitoring a pressure in a carrier gas line leading to the carrier gas inlet.

9. The method of claim 8 , further comprising detecting a risk of precursor liquid entering the outlet line based on the monitoring.

10. 10. A semiconductor processing apparatus comprising the precursor source system of claim 1.

11. 10. An apparatus comprising at least one processor and at least one memory containing computer program code, the at least one memory and the computer program code configured, together with the at least one processor, to cause the apparatus to perform the method of claim 8.

12. A computer program comprising computer executable program code which, when executed by a processor, causes an apparatus to carry out the method of claim 8.

Images