Focused ion beam device

Abstract

To provide a focused ion beam device where a specimen chamber can be effectively utilized.SOLUTION: A focused ion beam device 100 includes: a lens barrel including an optical system for irradiating a specimen with ion beams; a specimen chamber 8 in which the specimen is disposed and which can be maintained in a vacuum state; a specimen holder 5 including a shaft 56 and a specimen holding part 50 which is provided in a tip of the shaft 56 for holding the specimen; and a specimen stage 6 which holds the specimen holder 5 in an attachable and detachable manner. The specimen stage 6 includes a first movement mechanism 66 which moves the specimen holder 5, and a second movement mechanism 68 which integrally moves the specimen holder 5 and the first movement mechanism 66 along an axis of the shaft 56.SELECTED DRAWING: Figure 6

Description

[Technical Field]

[0001] The present invention relates to a focused ion beam device. [Background technology]

[0002] In a focused ion beam device, a sample can be processed by scanning the surface of the sample with a focused ion beam. In a focused ion beam device, a sample can be processed with a focused ion beam to prepare a sample for a transmission electron microscope.

[0003] For example, Patent Document 1 discloses a sample preparation device in which a sample holder for a transmission electron microscope is inserted into a sample chamber and the sample held in the sample holder for the transmission electron microscope is processed with a focused ion beam. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2000-146781 Summary of the Invention [Problem to be solved by the invention]

[0005] In the focused ion beam instrument described above, when a sample holder for a transmission electron microscope is inserted into the sample chamber, the sample holder is positioned near the optical axis of the ion beam optical system. However, various devices are also located near the optical axis of the ion beam optical system in the sample chamber, such as a FIB column, an SEM column for observing SEM images (scanning electron microscope images), and a probe for picking up the cut sample. Therefore, a focused ion beam instrument that can efficiently utilize the sample chamber is desired. [Means for solving the problem]

[0006] One aspect of the focused ion beam apparatus according to the present invention is a lens barrel having an optical system for irradiating the sample with the ion beam; a sample chamber in which the sample is placed and which can be maintained in a vacuum state; a sample holder having a shaft and a sample holder provided at the tip of the shaft for holding the sample; a sample stage that detachably holds the sample holder; Including, The sample stage is a first moving mechanism that moves the sample holder; a second moving mechanism that moves the sample holder and the first moving mechanism together along the axis of the shaft; It has the following characteristics.

[0007] In such a focused ion beam device, the second moving mechanism can move the first moving mechanism and the sample holder as a unit, so that the sample chamber can be used effectively. [Brief explanation of the drawings]

[0008] [Figure 1] FIG. 1 is a diagram showing an example of the configuration of a focused ion beam apparatus according to a first embodiment. [Figure 2] FIG. 2 is a perspective view schematically showing a sample holder. [Figure 3] FIG. 2 is a cross-sectional view schematically showing a sample holder. [Figure 4] FIG. 2 is a perspective view schematically showing a sample holding portion of the sample holder. [Figure 5] FIG. 2 is a perspective view schematically showing a sample holding portion of the sample holder. [Figure 6] FIG. 3 is a cross-sectional view schematically showing a sample stage. [Figure 7] FIG. 3 is a cross-sectional view schematically showing a sample stage. [Figure 8] FIG. 4 is a diagram for explaining the operation of a Y-drive unit. [Figure 9] 1 is a flowchart showing an example of a sample preparation method. [Figure 10] FIG. 10 is a cross-sectional view schematically showing a sample stage of a focused ion beam apparatus according to a second embodiment. [Figure 11]FIG. 10 is a cross-sectional view schematically showing a sample stage of a focused ion beam apparatus according to a second embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0009] Preferred embodiments of the present invention will be described in detail below with reference to the drawings. Note that the embodiments described below do not unduly limit the content of the present invention as defined in the claims. Furthermore, not all of the configurations described below are necessarily essential components of the present invention.

[0010] 1. First embodiment 1.1. Focused ion beam device First, a focused ion beam apparatus according to a first embodiment will be described with reference to the drawings. Fig. 1 is a diagram showing an example of the configuration of a focused ion beam apparatus 100 according to the first embodiment. Fig. 1 illustrates an X-axis, a Y-axis, and a Z-axis as three axes that are orthogonal to each other.

[0011] The focused ion beam device 100 functions as a focused ion beam system (FIB) and as a scanning electron microscope (SEM). As shown in FIG. 1 , the focused ion beam device 100 includes an FIB column 2, an SEM column 3, a probe 4, a sample holder 5, a sample stage 6, and a sample chamber 8.

[0012] The FIB column 2 has an ion beam optical system for forming a focused ion beam and scanning the focused ion beam. The FIB column 2 includes an ion source (ion gun) that emits an ion beam, a lens system for focusing the ion beam, and a deflector for scanning the focused ion beam. These lens system and deflector constitute the ion beam optical system. A sample can be processed by scanning the focused ion beam formed by the FIB column 2. Hereinafter, processing using a focused ion beam will also be referred to as FIB processing.

[0013] The SEM column 3 includes an electron beam optical system for forming an electron beam and scanning the electron beam. The SEM column 3 includes an electron source (electron gun) that emits the electron beam, a lens system that focuses the electron beam, and a scanning coil that scans the electron beam. These lens system and scanning coil make up the electron beam optical system.

[0014] Although not shown, the focused ion beam device 100 has a detector that detects electrons emitted from a sample by irradiating the sample with an electron beam. Therefore, the focused ion beam device 100 can observe an SEM image.

[0015] The optical axis of the ion beam optical system of the FIB column 2 intersects with the optical axis of the electron beam optical system of the SEM column 3. By placing a sample at the point where the optical axis of the FIB column 2 intersects with the optical axis of the SEM column 3, FIB processing and SEM observation can be performed on the sample.

[0016] The probe 4 is a probe for picking up a sample processed by a focused ion beam. For example, the probe 4 can be used to pick up a thin piece of a few micrometers square that has been cut out from a bulk sample by a focused ion beam.

[0017] The sample holder 5 holds a sample. The sample is held by the sample holder 5 and placed in the sample chamber 8. The sample stage 6 detachably holds the sample holder 5. The sample stage 6 can move the sample held by the sample holder 5 horizontally along the X-axis and Y-axis, and vertically along the Z-axis. Furthermore, the sample stage 6 can rotate (tilt) the sample around the X-axis. In this way, the sample stage 6 is a goniometer stage that can move and tilt the sample. The sample is accommodated in the sample chamber 8. The sample chamber 8 can be maintained in a vacuum state by a vacuum exhaust system (not shown).

[0018] 1.2. Sample holder FIG. 2 is a perspective view schematically showing the sample holder 5. As shown in FIG.

[0019] The sample holder 5 is a sample holder that is shared by a transmission electron microscope (TEM) and a focused ion beam device 100. As shown in FIG. 2 , the sample holder 5 includes a sample holding portion 50, a bulk sample stage 52, a coolant tank 54, and a shaft 56.

[0020] The sample holder 50 is provided at the tip of the shaft 56. The sample holder 50 can hold a grid for fixing a sample for TEM. The bulk sample stage 52 holds a bulk sample. As shown in FIG. 2, if the direction from the rear end of the shaft 56 to the tip is defined as the +X direction along the axis of the shaft 56, the sample holder 50 and bulk sample stage 52 are arranged in this order in the +X direction. In other words, the bulk sample stage 52 is located further in the +X direction than the sample holder 50. The bulk sample stage 52 is detachable from the tip of the shaft 56.

[0021] The coolant tank 54 is provided at the rear end of the shaft 56. The coolant tank 54 is filled with a coolant such as liquid nitrogen.

[0022] FIG. 3 is a cross-sectional view showing a schematic view of the sample holder 5. As shown in FIG.

[0023] A heat transfer member 58 is housed within the shaft 56. The heat transfer member 58 thermally connects the coolant tank 54 with the sample holder 50 and the bulk sample stage 52. Therefore, by filling the coolant tank 54 with a coolant such as liquid nitrogen, the sample holder 50 and the bulk sample stage 52 can be cooled.

[0024] The bulk sample stage 52 is detachably attached to the shaft 56 by means of an attachment part 53. For example, the tip of the attachment part 53 is inserted into the shaft 56 and fixed with a screw or the like. An opening 53a is formed in the attachment part 53 to reduce the gradient of heat capacity. This makes it possible to reduce the time difference and temperature difference until the sample holder 50 and the bulk sample stage 52 are cooled.

[0025] Although not shown, the sample holder 5 may have a heater for heating the sample.

[0026] The shaft 56 is thermally insulated from the refrigerant tank 54, the heat transfer member 58, the sample holder 50, and the bulk sample stage 52. This reduces the effect of cooling of vacuum seal members such as O-rings (not shown) attached to the shaft 56.

[0027] 4 and 5 are perspective views schematically showing the sample holding portion 50 of the sample holder 5. The sample holding portion 50 includes a grid holder 500, a frame 502, and a grid holder shaft 504.

[0028] The grid holder 500 holds a TEM grid G. A thin section cut from a bulk sample is fixed to the grid G, and the thin section is thinned to a thickness that allows observation with a TEM, thereby preparing a TEM sample.

[0029] Although the case where a TEM sample is fixed to the grid G ​​has been described here, the member for fixing the TEM sample is not limited to a grid. The configuration of the sample holder 50 is not particularly limited as long as it can hold a member for fixing the TEM sample.

[0030] The grid holder 500 is fixed to the frame 502 by a grid holder shaft 504. The grid holder 500 can rotate around the grid holder shaft 504 as a rotation axis. Therefore, the orientation of the grid G ​​can be changed in the sample holder 5, as shown in FIGS. 4 and 5 . For example, when observing a sample with a TEM, the grid holder 500 is aligned parallel to the frame 502, and the grid G ​​is laid down, as shown in FIG. 4 . Alternatively, when a sample fixed to the grid G ​​is sliced ​​using an ion beam, the grid holder 500 is aligned perpendicular to the frame 502, and the grid G ​​is set upright, as shown in FIG. 5 . For example, when a picked-up slice is fixed to the grid G, the grid G ​​is set upright to allow the probe 4 to easily access the grid G.

[0031] A flat spring ring 506 is sandwiched between the frame 502 and the grid holder 500. The spring force generated by the flat spring ring 506 ensures that the grid holder 500 is securely connected to the frame 502. This allows for easier heat transfer between the frame 502 and the grid holder 500.

[0032] 1.3. Sample stage 6 and 7 are cross-sectional views schematically showing the sample stage 6. FIG.

[0033] As shown in FIGS. 6 and 7, the sample stage 6 has a base holder 60, a spherical pipe 62 (an example of a cylindrical member), a base plate 64, a first moving mechanism 66, and a second moving mechanism 68.

[0034] The specimen holder 5 is inserted into a spherical pipe 62. The spherical pipe 62 is housed in a base holder 60. The base holder 60 is supported by a stage base 680 of a second movement mechanism 68. That is, the spherical pipe 62 into which the specimen holder 5 is inserted is supported by the stage base 680 via the base holder 60. A first movement mechanism 66 is provided on the base holder 60.

[0035] The base plate 64 is fixed to a sample chamber wall 80 that defines the sample chamber 8. The base holder 60 is inserted into a through-hole provided in the base plate 64. The gap between the base holder 60 and the base plate 64 is airtightly sealed by an O-ring 63. The O-ring 63 also allows the base holder 60 to slide in the through-hole of the base holder 60.

[0036] The first movement mechanism 66 has an X drive unit 600, a Y drive unit 610, and a rotation drive unit 620. Furthermore, although not shown, the first movement mechanism 66 has a Z drive unit.

[0037] The X driving unit 600 moves the sample holder 5 along the X axis. The X driving unit 600 has an X actuator 602 and a holding plate 604. The X actuator 602 is, for example, a single-axis actuator that moves the holding plate 604 along the X axis using the power of a motor. The holding plate 604 supports the sample holder 5. Therefore, when the X actuator 602 moves the holding plate 604 along the X axis, the sample holder 5 can be moved along the X axis.

[0038] The Y drive unit 610 moves the sample holder 50 and the bulk sample stage 52 along the Y axis. The Y drive unit 610 includes a spherical bearing 612, a Y actuator 614, and a holding shaft 616.

[0039] The spherical bearing 612 is made up of a base holder 60 and a spherical pipe 62. A spherical sliding surface 60a (outer ring) is provided at the tip of the base holder 60. A spherical inner ring 62a is provided at the tip of the spherical pipe 62. The spherical bearing 612 is made up by fitting the spherical inner ring 62a into the spherical sliding surface 60a.

[0040] The Y actuator 614 and the holding shaft 616 sandwich the spherical pipe 62 along the Y axis. The Y actuator 614 is in contact with the outer circumferential surface of the spherical pipe 62 on the -Y side, and the holding shaft 616 is in contact with the outer circumferential surface on the +Y side. The Y actuator 614 moves linearly along the Y axis, for example. The Y actuator 614 is, for example, a single-axis actuator driven by a motor. The holding shaft 616 urges the spherical pipe 62 in the -Y direction by the force of a spring.

[0041] In the Y drive unit 610, the Y actuator 614 moves linearly along the Y axis, rotating the shaft 56 by lever action with the spherical bearing 612 as the fulcrum. This allows the sample holder 50 and bulk sample stage 52 at the tip of the shaft 56 to move along the Y axis. At this time, the sample holder 50 and bulk sample stage 52 can be positioned along the Y axis depending on the balanced position of the Y actuator 614 and the holding shaft 616.

[0042] Although not shown, the positional relationship between the Y actuator 614 and the holding shaft 616 may be reversed.

[0043] Although not shown, the Z driver moves the sample holder 50 and the bulk sample stage 52 along the Z axis. The Z driver has a configuration similar to that of the Y driver 610, but is positioned at a position rotated 90°. Specifically, in the Y driver 610, the Y actuator 614 and the holding shaft 616 sandwich the spherical pipe 62 along the Y axis, but in the Z driver, the Z actuator and the holding shaft sandwich the spherical pipe 62 along the Z axis. This allows the sample holder 50 and the bulk sample stage 52 to be moved along the Z axis.

[0044] The rotation (tilt) drive unit 620 has a rotation actuator 622. The rotation actuator 622 rotates the base holder 60. When the base holder 60 rotates, the spherical pipe 62 rotates around the axis of the shaft 56. This allows the sample holder 50 and bulk sample stage 52 to rotate (tilt) around the X-axis. For example, the rotation drive unit 620 can rotate the sample holder 50 and bulk sample stage 52 by approximately 180°. This allows the front and back surfaces of the sample to be observed with the SEM.

[0045] The second moving mechanism 68 moves the sample holder 5 and the first moving mechanism 66 together along the axis of the shaft 56, i.e., along the X-axis. The second moving mechanism 68 moves the sample holder 5 and the first moving mechanism 66 between a first position P1 shown in FIG. 6 and a second position P2 shown in FIG. 7. At the first position P1, the bulk sample stage 52 is located at point O where the optical axes of the FIB column 2 and the SEM column 3 intersect. At the second position P2, the sample holder 50 is located at point O.

[0046] For example, when the bulk sample stage 52 is located at point O, FIB processing and SEM observation can be performed on the bulk sample fixed to the bulk sample stage 52. Furthermore, when the sample holder 50 is located at point O, FIB processing and SEM observation can be performed on the sample held by the sample holder 50, for example, a sample fixed to grid G.

[0047] The second moving mechanism 68 has a stage base 680, a first drive shaft 682a, a second drive shaft 682b, a first drive actuator 684a, and a second drive actuator 684b.

[0048] The base holder 60 is connected to the stage base 680 via bearings 65. Therefore, when the rotation drive unit 620 rotates the base holder 60, the base holder 60 can rotate independently of the stage base 680. An X drive unit 600, a Y drive unit 610, a rotation drive unit 620, and a Z drive unit are attached to the base holder 60. That is, the base holder 60 is provided with a first movement mechanism 66. The base holder 60 also supports a spherical pipe 62 into which the sample holder 5 is inserted. Therefore, when the second movement mechanism 68 moves the base holder 60, the sample holder 5 and the first movement mechanism 66 can be moved as a unit.

[0049] The first drive shaft 682a and the second drive shaft 682b are fixed to the stage base 680. The central axes of the first drive shaft 682a and the second drive shaft 682b are parallel to the X-axis.

[0050] The first drive actuator 684a and the second drive actuator 684b are provided on both ends of the stage base 680. The first drive actuator 684a moves the stage base 680 along the first drive shaft 682a. The second drive actuator 684b moves the stage base 680 along the second drive shaft 682b. Therefore, the first drive actuator 684a and the second drive actuator 684b can move the stage base 680 along the X-axis. This allows the second movement mechanism 68 to move the sample holder 5 and the first movement mechanism 66 as a single unit. The stroke of the first drive actuator 684a and the stroke of the second drive actuator 684b are, for example, the same as the distance between the sample holder 50 and the bulk sample stage 52.

[0051] The first drive actuator 684a and the second drive actuator 684b are, for example, air cylinders. Note that the first drive actuator 684a and the second drive actuator 684b are not particularly limited as long as they are actuators that can move the stage base 680 along the X axis, and may be, for example, a motor-driven uniaxial actuator.

[0052] When the sample holder 5 and the first moving mechanism 66 are located at the second position P2, as shown in FIG. 7, the force of the sample holder 5 being drawn into the vacuum-state sample chamber 8 presses the stage base 680 against the base plate 64. This allows the sample holder 5 and the first moving mechanism 66 to be more securely fixed. This reduces the effects of vibrations and the like when FIB processing a thin section fixed to the grid G, enabling fine processing.

[0053] In the above description, the first drive shaft 682a, the second drive shaft 682b, the first drive actuator 684a, and the second drive actuator 684b function as a drive unit that moves the stage base 680 along the axis of the shaft 56, but the configuration of the drive unit that moves the stage base 680 is not limited to this. For example, the drive unit may move the stage base 680 using a motor or the like as power. Also, in the above description, two drive shafts are provided, but the drive shaft may be one, or There may be three or more.

[0054] 1.4. Y-direction movement of the sample stage Fig. 8 is a diagram for explaining the operation of the Y-drive unit 610. Fig. 8 illustrates a state in which the sample holder 5 and the first moving mechanism 66 shown in Fig. 6 are located at the first position P1, i.e., the bulk sample stage 52 is located at the intersection O, and a state in which the sample holder 5 and the first moving mechanism 66 shown in Fig. 7 are located at the second position P2, i.e., the sample holder 50 is located at the intersection O.

[0055] As described above, the movement of the sample holder 50 and the bulk sample stage 52 in the Y direction by the Y drive unit 610 utilizes the principle of leverage. In FIG. 8, the distance between the fulcrum A formed by the spherical bearing 612 and the point of application B where the bulk sample stage 52 is located is defined as D. AB The distance between the fulcrum A and the point of application C where the sample holder 50 is located is D AC and the distance between the fulcrum A and the force point D where the Y actuator 614 is located is D AD The distance between the first position P1 and the second position P2 is defined as S. That is, the distance S is the stroke of the second moving mechanism 68. The driving stroke of the Y driving unit 610 is defined as Y effort Let's say.

[0056] The second moving mechanism 68 moves the sample holder 5 and the first moving mechanism 66 as a unit. Therefore, when the second moving mechanism 68 moves the sample holder 5 from the first position P1 to the second position P2 by a distance S, the fulcrum A, the action point B, the action point C, and the force point D also move by the distance S. However, even if the fulcrum A, the action point B, the action point C, and the force point D move by the distance S, the distance D AC , distance D AB , and distance D AD is constant.

[0057] Here, the Y drive unit 610 has a drive stroke Y effort If the force point D is moved along the Y axis by a distance D AC >Distance D AB Therefore, the movement distance Y1 along the Y axis of the application point B where the bulk sample stage 52 is located is greater than the movement distance Y2 along the Y axis of the application point C where the sample holder 50 is located (Y1>Y2). Therefore, the range in which the bulk sample stage 52 can move can be made greater than the range in which the sample holder 50 can move.

[0058] Therefore, in the focused ion beam device 100, the bulk sample stage 52 has a wide range of movement, so it can accommodate large samples. Also, the sample holder 50 can improve its movement accuracy, so it can accommodate minute samples. In the focused ion beam device 100, a sample stage that can accommodate large bulk samples and minute samples can be realized with a simple configuration.

[0059] 1.5. Sample preparation method FIG. 9 is a flowchart showing an example of a sample preparation method using the focused ion beam device 100.

[0060] First, as shown in Fig. 5, the grid G ​​is fixed to the grid holder 500 of the sample holder 5 (step S100). At this time, as shown in Fig. 5, the grid holder 500 is rotated to make the grid G ​​stand upright.

[0061] Next, the bulk sample is fixed to the bulk sample stage 52 (step S102), and the bulk sample stage 52 is attached to the sample holder 5 as shown in FIGS. 2 and 3 (step S104).

[0062] 1, the sample holder 5 is attached to the sample stage 6 (step S106). The sample holder 5 can be attached to the sample stage 6 by inserting the sample holder 5 into the spherical pipe 62.

[0063] Next, the coolant tank 54 is filled with liquid nitrogen (step S108). The holder 50 and the bulk sample stage 52 can be cooled, and as a result, the bulk sample can be cooled.

[0064] 6, the sample holder 5 and the first moving mechanism 66 are moved together to the first position P1 by the second moving mechanism 68 (step S110). As a result, the bulk sample stage 52 is positioned at the point O where the optical axis of the FIB column 2 and the optical axis of the SEM column 3 intersect, enabling FIB processing and SEM observation of the bulk sample.

[0065] Next, the bulk sample is subjected to FIB processing to cut out a thin section from the bulk sample (step S112), and the cut out thin section is then picked up by the probe 4 (step S114).

[0066] 7, the sample holder 5 and the first moving mechanism 66 are moved together from the first position P1 to the second position P2 by the second moving mechanism 68 (step S116). As a result, the sample holding part 50 is positioned at point O.

[0067] Next, the thin section picked up by the probe 4 is fixed to the grid G ​​(step S118). Then, the thin section fixed to the grid G ​​is thinned to a thickness that allows TEM observation using a focused ion beam (step S120). As described above, since the coolant tank 54 is filled with liquid nitrogen, the FIB processing of the bulk sample in step S110 and the FIB processing of the thin section in step S118 can be performed in a cooled state. Therefore, damage to the sample due to FIB processing can be reduced.

[0068] Next, the sample holder 5 is returned to room temperature and removed from the sample stage 6 (step S122). Next, the bulk sample stage 52 is removed from the sample holder 5 (step S124). Then, as shown in FIG. 4, the grid holder 500 is rotated to lay the grid G ​​down, and the sample holder 5 is inserted into the transmission electron microscope. This allows the sample cut out from the bulk sample to be observed using a TEM.

[0069] Although the above description has been given of the case where a sample for a TEM is prepared, the focused ion beam device 100 can also be used to prepare, for example, a sample for an SEM or a sample for an electron probe microanalyzer (EPMA).

[0070] Effects The focused ion beam device 100 includes an FIB column 2 having an ion beam optical system for irradiating an ion beam onto a sample, a sample chamber 8 in which a sample is placed and which can be maintained in a vacuum state, a sample holder 5 having a shaft 56 and a sample holder 50 provided at the tip of the shaft 56 for holding the sample, and a sample stage 6 for detachably holding the sample holder 5. The sample stage 6 also has a first movement mechanism 66 for moving the sample holder 5, and a second movement mechanism 68 for moving the sample holder 5 and the first movement mechanism 66 together along the axis of the shaft 56.

[0071] Therefore, in the focused ion beam instrument 100, the sample holder 5 and the first moving mechanism 66 can be moved as a unit. Therefore, in the focused ion beam instrument 100, the second moving mechanism 68 can be used to position the sample holding part 50 or the bulk sample stage 52 at the point O where the optical axis of the FIB lens barrel 2 and the optical axis of the SEM lens barrel 3 intersect, allowing the sample chamber 8 to be used effectively.

[0072] For example, in the focused ion beam device 100, the second moving mechanism 68 can position the sample holder 50 at a position away from point O when processing a bulk sample, and can position the sample holder 50 at point O when processing a sample held by the sample holder 50. In the on-beam device 100, the space in the vicinity of the point O in the sample chamber 8 can be used effectively.

[0073] In the focused ion beam instrument 100, the second movement mechanism 68 includes a stage base 680 that supports a spherical pipe 62 serving as a cylindrical member into which the sample holder 5 is inserted, and a drive unit (a first drive shaft 682a, a second drive shaft 682b, a first drive actuator 684a, and a second drive actuator 684b) that moves the stage base 680 along the axis of the shaft 56. The sample stage 6 also includes a base plate 64 that is fixed to a sample chamber wall 80 that defines the sample chamber 8. When the sample holder 5 and the first movement mechanism 66 are positioned at the second position P2, the force that draws the sample holder 5 into the vacuum-sealed sample chamber 8 presses the stage base 680 against the base plate 64. Therefore, in the focused ion beam instrument 100, the sample holder 5 and the first movement mechanism 66 can be more reliably fixed. This reduces the effects of vibrations and the like when FIB processing a thin section fixed to the grid G, enabling fine processing.

[0074] In the focused ion beam device 100, the first movement mechanism 66 includes a rotation drive unit 620 that rotates the shaft 56 about the axis of the shaft 56 as the rotation axis, thereby rotating the sample holder 50. Therefore, in the focused ion beam device 100, for example, both sides of the thin section can be observed by SEM during FIB processing.

[0075] In the focused ion beam instrument 100, the sample holder 5 has a bulk sample stage 52 for holding a bulk sample, and the sample holder 50 and the bulk sample stage 52 are arranged in this order along the axis of the shaft 56 in the +X direction from the rear end of the shaft 56 to the front end of the shaft 56. Therefore, in the focused ion beam instrument 100, the sample holder 50 can be positioned at point O or the bulk sample stage 52 can be positioned at point O by moving the sample holder 5 and the first moving mechanism 66 as a unit using the second moving mechanism 68. Therefore, in the focused ion beam instrument 100, a slice cut by FIB processing of a bulk sample fixed to the bulk sample stage 52 can be fixed to a grid G ​​held by the sample holder 50 and then FIB processed. Therefore, in the focused ion beam instrument 100, a sample for TEM can be easily prepared from a bulk sample.

[0076] In the focused ion beam instrument 100, the second movement mechanism 68 moves the sample holder 5 and the first movement mechanism 66 between a first position P1, where the bulk sample stage 52 is located at point O, and a second position P2, where the sample holder 50 is located at point O. Therefore, in the focused ion beam instrument 100, a slice cut out by FIB processing of a bulk sample fixed to the bulk sample stage 52 can be fixed to a grid G ​​held by the sample holder 50 and then FIB processed. Therefore, in the focused ion beam instrument 100, a sample for TEM observation can be easily prepared from a bulk sample.

[0077] In the focused ion beam device 100, the first moving mechanism 66 includes a spherical bearing 612 into which the sample holder 5 is inserted and which rotatably supports the sample holder 5, and a Y drive unit 610 which rotates the sample holder 5 around the spherical bearing 612 as a fulcrum A. Also, the distance D between the fulcrum A and the bulk sample stage 52 is AB is the distance D between the fulcrum A and the sample holder 50 AC Therefore, in the focused ion beam device 100, the range of movement of the bulk sample stage 52 can be increased.

[0078] In the focused ion beam device 100, the second moving mechanism 68 moves the sample holder 5 and the first moving mechanism 66 together, thereby reducing the distance D between the fulcrum A and the sample holder 50. AC , and the distance D between the support point A and the bulk sample stage 52 AB Therefore, in the focused ion beam device 100, even if the second moving mechanism 68 moves the sample holder 5 and the first moving mechanism 66 as a unit, the moving range of the bulk sample stage 52 can be widened.

[0079] In the focused ion beam device 100, the sample holder 5 includes a coolant tank 54 attached to the rear end of the shaft 56, and a heat transfer member 58 that thermally connects the coolant tank 54 and the sample holder 50. Therefore, in the focused ion beam device 100, the sample can be FIB processed while being cooled. Therefore, in the focused ion beam device 100, damage to the sample due to FIB processing can be reduced.

[0080] 2. Second embodiment Next, a focused ion beam system according to a second embodiment will be described with reference to the drawings. Figures 10 and 11 are cross-sectional views schematically showing the sample stage 6 of a focused ion beam system 200 according to the second embodiment. Note that Figure 10 illustrates a state in which the sample holder 5 and the first moving mechanism 66 are located at a first position P1. Figure 11 illustrates a state in which the sample holder 5 and the first moving mechanism 66 are located at a second position P2.

[0081] Hereinafter, in the focused ion beam system 200 according to the second embodiment, components having the same functions as the components of the focused ion beam system 100 according to the first embodiment will be given the same reference numerals, and detailed description thereof will be omitted.

[0082] In the focused ion beam device 100, as shown in FIGS. 6 and 7, the bulk sample was FIB processed on the bulk sample stage 52 of the sample holder 5.

[0083] In contrast, the focused ion beam device 200 includes a bulk specimen stage 202 and a bulk specimen holder 204, as shown in Figures 10 and 11, and performs FIB processing on a bulk specimen in the bulk specimen holder 204 attached to the bulk specimen stage 202.

[0084] The bulk sample stage 202 is disposed within the sample chamber 8. The bulk sample holder 204 can hold a bulk sample. By mounting the bulk sample holder 204 on the bulk sample stage 202, the bulk sample can be processed by FIB. The bulk sample stage 202 positions the bulk sample holder 204 at point O where the optical axis of the FIB column 2 and the optical axis of the SEM column 3 intersect.

[0085] 10, when the bulk specimen holder 204 is located at point O, the specimen holder 5 and the first moving mechanism 66 are located at the first position P1. This allows the specimen holder 5 and the first moving mechanism 66 to be retracted to a position away from point O when processing a bulk specimen in the bulk specimen holder 204.

[0086] For example, as shown in Figure 10, by placing the sample holder 5 and the first moving mechanism 66 at the first position P1, the spherical bearing 612 can be retracted to a retracted position away from point O, for example, outside the sample chamber 8. The spherical bearing 612 requires an inner ring and an outer ring, making it difficult to reduce its size. Therefore, as shown in Figure 11, if the spherical bearing 612 is located near point O, there is a possibility that the bulk sample will hit the sample holder 5 or the first moving mechanism 66 (the base holder 60, the spherical pipe 62, etc.) when moving or tilting the bulk sample.

[0087] In the focused ion beam device 200, the sample holder 5 and the first moving mechanism 66 can be retracted, thereby reducing the possibility of the bulk sample hitting the sample holder 5 or the first moving mechanism 66 when FIB processing the bulk sample using the bulk sample holder 204 on the bulk sample stage 202.

[0088] In this way, in the focused ion beam device 200, when FIB processing is not performed in the sample holding unit 50, the sample holder 5 and the first moving mechanism 66 can be retracted, so that the sample chamber 8 can be easily moved. O can be used effectively. Furthermore, in the focused ion beam instrument 200, the sample holder 5 and the first moving mechanism 66 can be moved, so there is no need to adjust the length of the sample holder 5 to the size of the sample chamber 8. Therefore, in the focused ion beam instrument 200, FIB processing can be performed using a sample holder optimized for TEM.

[0089] The sample preparation method in the focused ion beam device 200 is the same as the sample preparation method in the focused ion beam device 100 shown in Figure 9 above, except that the bulk sample is FIB processed in a bulk sample holder 204 attached to a bulk sample stage 202, and therefore a description thereof will be omitted.

[0090] In the focused ion beam instrument 200, the second moving mechanism 68 moves the sample holder 5 and the first moving mechanism 66 between a first position P1, where the sample holding unit 50 is located away from the optical axis of the ion beam optical system, and a second position P2, where the sample holding unit 50 is located on the optical axis of the ion beam optical system. Therefore, in the focused ion beam instrument 200, the sample holder 5 and the first moving mechanism 66 can be moved together to the second position P2, making it possible to effectively use the space near point O in the sample chamber 8.

[0091] 3. Variations The present invention is not limited to the above-described embodiment, and various modifications can be made within the scope of the present invention.

[0092] In the first embodiment described above, the focused ion beam device 100 includes the FIB column 2 and the SEM column 3, but it may include only the FIB column 2. In this case, the point O where the optical axis of the FIB column 2 and the optical axis of the SEM column 3 intersect is the position of the optical axis of the ion beam optical system of the FIB column 2.

[0093] The present invention is not limited to the above-described embodiments, and various modifications are possible. For example, the present invention includes configurations that are substantially identical to the configurations described in the embodiments. A substantially identical configuration means, for example, a configuration with the same function, method, and result, or a configuration with the same purpose and effect. The present invention also includes configurations in which non-essential parts of the configurations described in the embodiments are replaced. The present invention also includes configurations that achieve the same effects or purposes as the configurations described in the embodiments. The present invention also includes configurations in which publicly known technology is added to the configurations described in the embodiments. [Explanation of symbols]

[0094] 2...FIB column, 3...SEM column, 4...probe, 5...sample holder, 6...sample stage, 8...sample chamber, 50...sample holder, 52...bulk sample stage, 53...mounting portion, 53a...opening, 54...refrigerant tank, 56...shaft, 58...heat transfer member, 60...base holder, 60a...surface, 62...spherical pipe, 62a...inner ring, 63...O-ring, 64...base plate, 65...bearing, 66...first moving mechanism, 68...second moving mechanism, 80...sample chamber wall, 100...focused ion beam device, 200...focused ion beam device, 202...bulk sample stage , 204...bulk sample holder, 500...grid holder, 502...frame, 504...grid holder shaft, 506...leaf spring ring, 600...X drive unit, 602...X actuator, 604...holding plate, 610...Y drive unit, 612...spherical bearing, 614...Y actuator, 616...holding shaft, 620...rotation drive unit, 622...rotation actuator, 680...stage base, 682a...first drive shaft, 682b...second drive shaft, 684a...first drive actuator, 684b...second drive actuator

Claims

1. a lens barrel having an optical system for irradiating the sample with the ion beam; a sample chamber in which the sample is placed and which can be maintained in a vacuum state; a sample holder having a shaft and a sample holder provided at the tip of the shaft for holding the sample; a sample stage that detachably holds the sample holder; Including, The sample stage is a first moving mechanism that moves the sample holder; a second moving mechanism that moves the sample holder and the first moving mechanism together along the axis of the shaft; A focused ion beam device comprising:

2. In claim 1, a second moving mechanism for moving the sample holder and the first moving mechanism between a first position where the sample holder is located away from the optical axis of the optical system and a second position where the sample holder is located on the optical axis of the optical system.

3. In claim 2, The second movement mechanism is a stage base that supports a cylindrical member into which the sample holder is inserted; a drive unit that moves the stage base along the axis of the shaft; and the sample stage has a base plate fixed to a sample chamber wall that defines the sample chamber; A focused ion beam device, wherein when the sample holder and the first moving mechanism are positioned at the second position, the stage base is pressed against the base plate by the force of the sample holder being drawn into the sample chamber, which is in a vacuum state.

4. In claim 1, The first moving mechanism includes a rotation drive unit that rotates the shaft about an axis of the shaft as a rotation axis, thereby rotating the sample holder.

5. In claim 1, the sample holder has a bulk sample stage for holding a bulk sample; a focused ion beam device, wherein the sample holder and the bulk sample stage are arranged in this order along the axis of the shaft in a direction from the rear end of the shaft to the front end of the shaft.

6. In claim 5, The second moving mechanism moves the sample holder and the first moving mechanism between a first position where the bulk sample stage is positioned on the optical axis of the optical system and a second position where the sample holding unit is positioned on the optical axis of the optical system.

7. In claim 6, The first moving mechanism is a spherical bearing into which the sample holder is inserted and which rotatably supports the sample holder; a drive unit that rotates the sample holder with the spherical bearing as a fulcrum; Including, The distance between the support point and the bulk sample stage is the distance between the support point and the sample holder. A focused ion beam device that is larger than the

8. In claim 7, A focused ion beam device in which the second moving mechanism moves the sample holder and the first moving mechanism as a unit, so that the distance between the fulcrum and the sample holding portion and the distance between the fulcrum and the bulk sample stage do not change.

9. In any one of claims 1 to 8, The sample holder comprises: a refrigerant tank attached to the rear end of the shaft; a heat transfer member that thermally connects the refrigerant tank and the sample holder; A focused ion beam device comprising:

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