Container for supplying precursors

Abstract

A container 1 for vaporizing a precursor and transporting the vaporized precursor includes: a storage portion 12 that bounds an internal volume; a number of subcarrier trays 4 arranged on top of each other within the internal volume; and each subcarrier tray 4 forming a gas flow path, at least one of the subcarrier trays 4 having a subcarrier holder 41 configured to store the precursor, and a holder lid 42 configured near the subcarrier holder 41, the holder lid including one or more fins 44 protruding downward toward the subcarrier holder 41 to form a gas flow path (C) that covers substantially the entire area of ​​the precursor.

Description

[Technical Field]

[0001] The present invention relates to a precursor vapor delivery device for coating devices such as (plasma-enhanced) chemical vapor deposition devices, (plasma-enhanced) atomic layer deposition devices, epitaxial layer growth devices, etc. The present invention also relates to the configuration of said container to generate a well-defined gas flow with a specific concentration relative to the vaporized precursor. [Background technology]

[0002] Coating processes for depositing coating materials onto surfaces are well known in the art. In so-called chemical vapor deposition, atomic layer deposition, or epitaxial growth, a substrate is exposed to one or more volatile precursors that chemically react with co-reactants present in a deposition chamber to produce the desired thin film deposit on the substrate.

[0003] Chemical vapor deposition and atomic layer deposition processes use precursors, such as MoO2Cl2. The precursors may be solid powders and / or granular materials provided in suitable containers. These containers include inlets and outlets for connection to a processing system. A carrier gas may be provided through the container, optionally at elevated temperatures to vaporize the solid precursor by sublimation. The carrier gas is enriched with the vaporized precursor to provide a continuous gas stream with a predefined concentration of the precursor.

[0004]

[0003] U.S. Pat. No. 6,270,839 B1 discloses a source supply device for supplying gas sublimated from a solid source to a film-forming device using chemical vapor deposition. The device includes auxiliary containers, each of which includes an inlet opening for introducing gas into the auxiliary container, an outlet opening for discharging the gas, a lower portion in which the solid source extends between the inlet and outlet openings, and a wall for defining a gap in cooperation with the lower portion, through which the introduced gas moves on the surface of the solid source extending in the lower portion while contacting the solid source. The device also includes a source container for accommodating and storing the auxiliary container, a heating device for heating the source container, and a device for introducing a carrier gas into the source container.

[0005] US 10,465,286 B2 discloses a vapor transfer container for vaporizing and transferring a vaporized material, the container including a peripheral container wall defining an internal volume, a gas inlet configured to supply gas to the internal volume, and a gas outlet arranged in at least intermittent fluid communication with the internal volume. The container also includes a porous steel material provided on a plurality of support surfaces defined by a plurality of holders and a flow path extending between the gas inlet and the gas outlet, the porous steel material being positioned on an upper holder of the plurality of holders. The porous steel material is pressurized onto the upper holder using a lid.

[0006] However, the proposed solutions do not allow the precursor to be uniformly discharged from the material supply device, and the conventional containers do not allow the container to be emptied at a reasonable rate under stable gas discharge conditions.

[0007] It is therefore an object of the present invention to provide a precursor container that provides high discharge performance under stable substance concentration of the discharged vaporized precursor. Summary of the Invention [Problem to be solved by the invention]

[0008] These problems are solved by a container for vaporizing a precursor and for delivering the vaporized precursor according to claim 1 and by a method for operating said container according to the further independent claims. [Means for solving the problem]

[0009] 1. In a container 1 for vaporizing a precursor and delivering said vaporized precursor, a container 12 bounding the internal volume; a number of subcarrier trays 4 arranged on top of each other within said internal volume; Including, Each subcarrier tray 4 forms a gas flow path, and at least one of the subcarrier trays 4 is a subcarrier holder 41 configured to store the precursor; and A holder lid 42 configured to close the subcarrier holder 41 includes one or more fins 44 protruding downward toward the subcarrier holder 41 to form a gas flow path (C) that covers substantially the entire area of ​​the precursor.

[0010] 2. In the container 1 of the first item, the fins 44 are arranged to form a spiral gas flow path (C) between a first tray port 46 in the side wall 45 of the subcarrier holder 41 and the holder lid 42, particularly a second tray port 47 in the center of the holder lid 42.

[0011] 3. In the first item of container 1, the fins 44 are arranged to form a meandering gas flow path (C) between a first tray port 46 in the side wall 45 of the subcarrier holder 41 and a second tray port 47 in the holder lid 42 or another part of the side wall 45 of the subcarrier holder 41.

[0012] 4. In the container 1 of the second or third item, the fins 44 are configured to form a gas flow path (C) between the first tray port 46 and the second tray port 47, and the gas flow path (C) covers at least 90% of the surface of the subcarrier tray 4.

[0013] 5. In the container 1 according to any one of the first to fourth items, the one or more fins 44 protrude substantially toward the lower part of the subcarrier holder 41.

[0014] 6. In the container 1 of any one of items 1 to 5, the subcarrier holder 41 is filled with a precursor, and the holder lid 42, the surface of the precursor, and the one or more fins form the gas flow path (C) through the subcarrier tray 4.

[0015] 7. In the container 1 of any one of items 1 to 6, the subcarrier trays 4 are configured to force the flow of carrier gas through the container 1 to pass through a gas flow path in each of the subcarrier trays 4.

[0016] 8. In the container 1 of the seventh item, the shape of the holder lid 42 substantially matches the shape of the internal cross section of the storage portion of the container 1.

[0017] 9. In the container 1 of item 7, the holder lid 42 includes a sidewall 45 that surrounds the subcarrier holder and extends along part of its circumference, the subcarrier holder 41 is configured to have a sidewall that is partially in contact with the wall of the internal volume, and the shape and extension of the sidewall 45 of the holder lid 42 and the sidewall 45 of the subcarrier holder 41 are configured to form a further gas flow path together with part of the wall of the internal volume.

[0018] 10. In the container 1 of any one of items 1 to 9, a separation structure is provided at the bottom of the subcarrier tray 4, allowing carrier gas to flow from / to a portion of the inner wall of the container 1 storage section along the bottom of each subcarrier tray 4.

[0019] 11. In the container 1 of any one of items 1 to 10, the gas flow path (C) formed in the at least one subcarrier tray 4 is configured to have a Reynolds value of less than 2000, preferably less than 5000.

[0020] 12. In the container 1 of any one of items 1 to 11, the subcarrier holder 41 is filled with bulk precursor material such as powder, sintered powder or granular material.

[0021] 13. In the container 1 of any one of items 1 to 12, a heating element 5 is attached to the container 1 to heat the container 1 to at least the evaporation temperature of the precursor.

[0022] 14. A method for delivering a vaporized precursor, comprising: providing a precursor material in a container 1 according to any one of items 1 to 13; supplying a carrier gas to the container; receiving the carrier gas enriched with the vaporized precursor.

[0023] 15. A product produced by a vaporized precursor delivered by the method described in item 14.

[0024] 16. A method for delivering a vaporized precursor, comprising: providing a precursor material in a container 1 according to any one of items 1 to 13; and receiving the vaporized precursor by vapor extraction.

[0025] 17. A product produced by a vaporized precursor delivered by the method described in item 16.

[0026] Further embodiments are presented in the dependent claims.

[0027] a container for vaporizing a precursor along a first side and for delivering the vaporized precursor, the container comprising: a containment that bounds the internal volume; a number of subcarrier trays arranged on top of one another within said interior volume; Includes Each subcarrier tray forming a gas flow path, at least one of the subcarrier trays: a subcarrier holder configured to store the precursor; and A holder lid configured to close / cover and / or seal the subcarrier holder, the holder lid including one or more fins protruding downwardly toward the subcarrier holder to form a gas flow path that covers substantially the entire area of ​​the precursor.

[0028] Bubbler-type containers for solid precursors have the problem that vaporization of the solid precursor can be unstable and / or the vaporization rate is relatively low. In the case of powder / granular precursors, only the upper surface of the material and the preferential gas passages formed in the material exhibit good surface regeneration. Therefore, only the main gas path generated during operation contributes to precursor vaporization, while other areas of the material are substantially uncovered by the carrier gas stream, resulting in less material being vaporized. As a result, only a portion of the precursor surface effectively contributes to condensing the carrier gas with vaporized precursor, making the surface of the material increasingly uneven, which further negatively impacts the evacuation process. Furthermore, the precursor is unused until the container is evacuated, and does not obstruct the main flow path of the carrier gas.

[0029] Additionally, the precursor must be heated to increase the vaporization rate, but it is more difficult to heat the material uniformly than it is to heat a liquid material, especially for powder / granular precursors.

[0030] The container includes an arrangement of one or more subcarrier trays, each containing a material holder for storing a solid precursor material, the precursor holder being covered by a lid having a fin structure projecting from an underside of the lid (toward the interior of the material holder) into the precursor material stored in or on the material holder. Between the lower surface of the lid and the surface of the material, the fins define a gas flow path that substantially covers the surface of the material. The gas flow path is unbranched, and the dimensions of the flow path are such that a branched gas flow path cannot be formed within the subcarrier tray.

[0031] To achieve high evacuation rates, fins protrude below the material holder to form an almost closed passage for the gas stream, allowing the precursor to be completely evacuated from the container.

[0032] The fins may also be arranged to form a spiral gas flow path between a first tray port in the side wall of the subcarrier holder and a second tray port in the holder lid, particularly in the center of the holder lid.

[0033] Alternatively, the fins may be positioned to form a serpentine gas flow path between a first tray port in the sidewall of the subcarrier holder and a second tray port in the holder lid or another portion of the sidewall of the subcarrier holder.

[0034] The fins are configured to form a gas flow path between the first tray port and the second tray port, and the gas flow path can cover at least 90% of a surface of the subcarrier tray.

[0035] The one or more fins may project substantially toward a bottom of the subcarrier holder.

[0036] Thus, the subcarrier holder can be filled with precursor, and the holder lid, the precursor surface, and the one or more fins can form the gas flow path through the subcarrier tray.

[0037] The subcarrier trays may be configured to force a flow of carrier gas through the container and through the gas flow path of the respective subcarrier tray.

[0038] The shape of the holder lid may substantially match the shape of the internal cross section of the receiving portion of the container.

[0039] The holder lid may include a sidewall surrounding the subcarrier holder and extending along a portion of its circumference, the subcarrier holder configured to have a sidewall that is partially in contact with a wall of the interior volume, the shape and extension of the holder lid sidewall and the subcarrier holder sidewall being configured to form an additional gas flow path with a portion of the wall of the interior volume. Thus, a spring element may be inserted between the holder lid sidewall and the subcarrier holder sidewall to contact the wall of the interior volume with a force that improves heat transfer between the subcarrier holder and the holder lid.

[0040] Standoff structures may be provided at the bottom of the subcarrier trays to allow flow of carrier gas along the bottom of each subcarrier tray and to / from a portion of the inner wall of the container receptacle.

[0041] The gas flow passages formed in the at least one subcarrier tray may be configured to have a Reynolds value of less than 2000, preferably less than 5000.

[0042] Each subcarrier holder may be filled with a bulk precursor material, such as a powder or particulate material.

[0043] Additionally, a heating element may be attached to the container to heat the container to at least the vaporization temperature of the precursor.

[0044] According to another aspect, a method of delivering a vaporized precursor comprises: providing said container containing a precursor; supplying a carrier gas to the container; receiving the carrier gas enriched with the vaporized precursor.

[0045] According to another aspect, there is provided a product produced by the vaporized precursor delivered by the method.

[0046] According to yet another aspect, a method of delivering a vaporized precursor comprises: providing said container containing a precursor; and receiving the vaporized precursor.

[0047] In this method, the step is carried out simply by vapor extraction without a carrier gas.

[0048] According to yet another aspect, there is provided a product produced by the vaporized precursor delivered by the method. [Brief explanation of the drawings]

[0049] The embodiments will be explained in more detail with reference to the accompanying drawings.

[0050] [Figure 1] FIG. 1 is a cross-sectional view of a container for vaporizing a solid precursor. [Figure 2A] FIG. 10 is a plan view of the underside of a lid that defines gas flow paths within the subcarrier tray. [Figure 2B]FIG. 10 is a plan view of the underside of a lid that defines gas flow paths within the subcarrier tray. [Figure 2C] FIG. 10 is a plan view of the underside of a lid that defines gas flow paths within the subcarrier tray. [Figure 2D] FIG. 10 is a plan view of the underside of a lid that defines gas flow paths within the subcarrier tray. [Figure 3] 10 is a cross-sectional view of another embodiment of a container for vaporizing a solid precursor. [Figure 4A] FIG. 4 is a perspective view of one subcarrier tray used in the container of FIG. 3. [Figure 4B] FIG. 4 is a side view of one subcarrier tray used in the container of FIG. 3. [Figure 5] FIG. 1 is a bottom plan view of a container having an elevated structure. [Figure 6] FIG. 10 is a more detailed cross-sectional view of one subcarrier tray having a spring element between the subcarrier and the holder lid. DETAILED DESCRIPTION OF THE INVENTION

[0051] 1 is a cross-sectional view of a substantially cylindrical container 1 for storing solid precursors used in chemical vapor deposition (CVD), atomic layer deposition (ALD), or epitaxial growth. The solid powders may be any type of precursor that reacts and / or decomposes during a chemical vapor deposition process to deposit a thin film on a substrate surface. For example, the precursors may include MoO2Cl2, WCl5, TMI, etc.

[0052] The precursor may be a powder, sintered powder or granules, or may have other types of form factors, such as small balls, for bulk and industrial processing of the precursor (free flowing properties, reduced dust generation, etc.).

[0053] In this embodiment, the container 1 has a cylindrical volume 11 with a circular cross section that includes a cup-shaped receptacle 12 closed by a container lid 13. A gasket 14 may be provided to ensure a secure sealing of the cylindrical volume 11. In a lower portion 15 of the receptacle 12, substantially in the center of the lower portion 15, there is a first gas port 2 that serves as an inlet for carrier gas, and preferably in the center of the container lid 13, there is a second gas port 3 that serves as an outlet for gas.

[0054] Within the receptacle 12, a number of substantially similar subcarrier trays 4 are arranged on top of one another. Each of the subcarrier trays 4 has a subcarrier holder 41 having a substantially cylindrical volume with a circular cross-section and a planar lower portion 43. In particular, the dimensions of the subcarrier holder 41, defined by the sidewalls 45 of the subcarrier tray 4, are tailored to match the cross-sectional size of the cylindrical volume 11 inside the container 1, allowing gas to flow between the inner and outer walls of the container 1.

[0055] A flat holder lid 42 is attached to the subcarrier holder 41 to seal the interior volume of each subcarrier tray 4. Inside the subcarrier holder 41, the lower portion 43 is covered with vaporized precursor (M). The vaporized precursor (M) condenses the carrier gas, and the condensed carrier gas is transported out of the container 1.

[0056] One or more passage-forming fins 44 are provided from the holder lid 42 to the interior of the subcarrier tray 4, and these fins form a gas flow path along the surface of the precursor (M) stored in the subcarrier tray 4 and pass through the interior volume of the subcarrier tray 4. The fins 44 protrude substantially perpendicularly from the lower surface (L) of the holder lid 42 toward the lower portion 43 of the subcarrier holder 41. After the precursor is filled, the subcarrier holder 41 is closed by the holder lid 42, so the fins 44 protrude a certain length from the holder lid 42, and the distal end of the fin 44 is a short distance of approximately 0.5 to 2 mm from the lower portion 43 of the subcarrier holder 41. Because material between the lower portion 43 and the distal end of the fin 44 does not prevent the subcarrier tray 4 from closing, the holder lid 42 can be easily placed on the subcarrier holder 41 once the subcarrier holder 41 is filled with the solid precursor (M).

[0057] Each subcarrier tray 4 includes a first tray port 46 in a sidewall 45 of the subcarrier tray 4 near the open end of the subcarrier holder 41 covered by the holder lid 42. The first tray port 46 allows carrier gas to enter the interior of each subcarrier tray 4 within a gas flow path defined by fins 44. The first tray port 46 is located near the holder lid 42 so that the flow of gas into the interior of the subcarrier tray 4 is not blocked by the stored precursor (M).

[0058] The carrier gas is supplied from the first tray port 46 located on the side wall 45 of the subcarrier tray 4 to the second tray port 47 located on the holder cover 42 through a gas flow path formed by fins 44 in the subcarrier tray 4. The concentrated carrier gas is placed at the top through the second tray port 47 and then provided to the subcarrier tray 4.

[0059] In order to guide the flow of carrier gas, the holder lid 42 of each subcarrier tray 4 has a shape that matches the shape of the internal cross section of the container 12, thereby preventing the carrier gas from bypassing each subcarrier tray 4 and sealing the subcarrier trays 4 from each other. In this way, the flow of carrier gas is forcibly transmitted through the second tray port 47 to the next subcarrier tray 4 that is located as high as possible.

[0060] The subcarrier tray 4 has a separation structure 48 that allows a flow path to be formed between the outer surface of the lower portion 43 of the subcarrier holder 41 and the area where the subcarrier tray 4 is placed, such as the lower portion 15 of the container or the upper surface of the holder lid 42 of the subcarrier tray 4 placed directly below.

[0061] The isolation structure 48 or a sidewall of the isolation structure 48 is provided with an opening 49 to allow the carrier gas to flow from the area below the subcarrier tray 4 to the sidewall inside the container 1. The isolation structure 48 may not only be an integral part of the subcarrier holder 41, but may also be formed on the outer surface of the holder lid 42 or as a separate part.

[0062] The walls of the container 1 may be heated to assist in heating the carrier gas and improve precursor (M) vaporization. For heating, a heating element 5 may be located in the housing 12 of the container 1. Gas flow to each subcarrier tray 4 is provided by a standoff structure 48 that directs the carrier gas to the inner wall of the housing 12 of the container 1 through a first tray port 46 of the subcarrier holder 41 and into the interior of the subcarrier tray 4.

[0063] In practice, the opening in the isolation structure 48 and the opening in the sidewall of the subcarrier holder 41 may be located on opposite sides of each other based on the cross-sectional shape of the subcarrier tray 4. Thus, the flow of the carrier gas is forced to bypass the subcarrier tray 4 along the inner wall of the container 1, and in response to the heat applied to the container 1, the precursor (M) in the subcarrier tray 4 is heated by convection as well as conduction and radiation.

[0064] The fins 44 are used to form a gas flow path through each subcarrier tray 4, for example, a spiral gas passage as shown in the plan view on the underside of the holder lid 42 in FIG. 2A. Since the second tray port 47 does not need to be located at the center of the holder lid 42, a meandering structure may be provided through the interior of the subcarrier tray 4 by the fins 44, as shown in FIG. 2B. Here, the fins 44 have vertical shapes arranged in a comb-like pattern, forming a gas flow path that covers the entire area of ​​the subcarrier holder 41. The fins 44 may be arranged in a manner that forms a gas flow path (C), as shown in FIGS. 2C and 2D. Essentially, a fin arrangement that creates a gas flow path (C) that covers the entire surface of the precursor on the subcarrier tray, particularly 90% or more of the surface, is preferred.

[0065] The channel size is selected to provide a gas flow that is at least close to laminar, thereby avoiding the occurrence of surface areas on the precursor material M that are not covered by the carrier gas flow or that are only affected by a reduced carrier gas flow. In particular, the gas passages may be formed to a Reynolds value of less than 2000, particularly less than 5000. The fins are designed to have a thickness of approximately 2 mm, or in the range of 0.5 mm to 5 mm, or in the range of 5 mm to 20 mm. The height of the fins is related to the depth of the tray. To avoid blocking the assembly, the height of the fins may be smaller than the depth of the tray in which the precursor material is stored, for example, by about 0.5 mm to 2 mm.

[0066] It is preferable to form only a single carrier gas channel to prevent uneven vaporization of the precursor (M) from splitting the gas flow into two uneven gas streams that become even more uneven over time. The width and cross-sectional area of ​​the gas channel (C) are kept small to avoid uneven flow distribution. Substantially, the cross-sectional area of ​​the gas channel (C) formed by the fins 44 is similar to or larger than the cross-section of the first gas port 2 and the second gas port 3 of the container 1.

[0067] The fins 44 allow the refreshment of the upper surface of the precursor to be maintained as it is while the solid precursor is consumed, and the height of the precursor can be reduced in the same manner along the carrier gas flow stream. Attaching the fins 44 to the holder lid 42 has the advantage that a seal, which may be required if the fins protrude upward from the bottom of the subcarrier holder, does not need to be formed on the holder lid 42. In the present invention, the bottom seal between the remote end of the fins 44 and the subcarrier holder 41 is achieved by the precursor (M). By attaching the fins 44 to the holder lid 42, spillover does not occur on the fins 44, preventing the precursor (M) from escaping during transport.

[0068] Figure 3 shows another embodiment of the container 1. The same reference numerals denote components of the same or similar function.

[0069] In contrast to the embodiment of FIG. 1, a first gas port 2' is located on the container lid 13, which serves as a carrier gas inlet. The gas inlet 2' passes through each through-hole in the subcarrier trays 4 like a tube and is connected to an inlet gas guide 16 at the bottom of the container 1, i.e., the region below the lowest subcarrier tray 4. In particular, the subcarrier holder 41 has a central through-hole to accommodate the inlet gas guide 16, while keeping the space between the outer wall of the inlet gas guide 16 and the inner wall of the through-hole as small as possible to prevent / minimize gas flow through the space between the through-hole and the inlet gas guide 16. The through-hole through the subcarrier holder is formed by a tubular inner wall.

[0070] Furthermore, the holder lid 42' is configured to at least partially form a lid sidewall 50 of the subcarrier tray 4 in contact with the inner wall of the cylindrical volume of the container 1 and surrounds a portion of the sidewall of the subcarrier holder 41. The lid sidewall 50 protrudes substantially perpendicularly from the main lid surface (S) towards the subcarrier holder 41.

[0071] 6, a radial force is applied between the subcarrier holder 41 and the holder lid 42'. Therefore, a spring element 57 is inserted between the inner wall of the holder lid 42' and the side wall of the subcarrier holder 41, so that the outer wall of the holder lid 42' is pressed against or contacts the wall of the internal volume with a force that improves heat transfer between the subcarrier holder 41 and the holder lid 42'. The spring element 57 may be formed of a leg spring.

[0072] As shown in the perspective and side views of Figures 4A and 4B, respectively, a gas flow guidance (G) is formed between the lid sidewall 50 of the holder lid 42 and the subcarrier tray sidewall 45, forming a flow path along the inner wall of the cylindrical volume 11 from a position at the lower edge of each subcarrier tray 4 to, preferably, an upper position of the subcarrier holder at another peripheral position on the opposite side of the subcarrier tray 4. The sidewall 45 of the subcarrier tray 4, together with the sidewall 50 of the holder lid 42, has a circumferentially inclined structure that defines a gas flow path (C). The extension of the gas flow path (C) is configured to receive gas from the lower edge of each subcarrier tray 4 and guide the gas to another peripheral position at the upper part of each subcarrier tray 4 so that the gas flows along the inner wall of the container 1 and is heated.

[0073] The underside of the subcarrier holder 41 has a support structure 52 for being supported by the surface 53 of the holder lid 42 of the subcarrier tray 4 disposed below. The support structure 52 is disposed so that gas flows from the second tray port 47 anywhere above the holder lid 42 toward the edge of the sidewall of the container 1 where the inlet opening of the gas flow path (C) is provided. FIG. 5 shows the bottom plan view of the container 1, including a recessed structure 55 and an elevated structure 56 that form a gas flow path P from the center (M) of the sidewall of the lowest subcarrier tray 4 to the edge corresponding to the lower opening of the gas flow path (C). The lower elevated structure 56 supports the lowest subcarrier tray 4 to ensure stable orientation parallel to the radial direction of the cylindrical volume 11 of the container 1.

[0074] In addition, a pressure structure 51 is disposed between the container lid 13 and the holder lid 42 of the uppermost subcarrier tray 4 so that when the container is closed, a force is permanently applied to the stack of subcarrier trays 4, ensuring that the subcarrier trays are stably positioned within the container 1. [Explanation of symbols]

[0075] 1 container 11 Cylindrical Volume 12 Storage section 13 Container lid 15 Lower part of the storage area 2. No. 1 Gas Port 3 Second gas port 4 Subcarrier Tray 41 Subcarrier Holder 42 Holder lid 42' Holder Lid 43 Lower 44 Finn 45 Subcarrier tray side wall 46 No. 1 Tray Port 47 No. 2 Tray Port 48 Separated structure 49 Aperture 50 Lid side wall 51 Pressurized structure 52 Support structure 53 Surface 55 Structural structure 56 Elevated structure 57 Spring element 5 heating elements M precursor C aisle

Claims

1. In a container 1 for vaporizing a precursor and transporting the vaporized precursor, Containing section 12 that forms the boundary of the internal volume; A number of subcarrier trays 4 arranged above each other within the aforementioned internal volume; Includes, Each subcarrier tray 4 that forms a gas flow path, wherein at least one of the subcarrier trays 4 is A subcarrier holder 41 configured to store the aforementioned precursor; and A holder cover 42 configured to close the subcarrier holder 41, the holder cover including one or more fins 44 projecting downward toward the subcarrier holder 41 to form a gas channel (C) that substantially covers the entire area of ​​the precursor, The holder cover 42 includes a side wall 45 that surrounds the subcarrier holder and extends along a part of its circumference, and the subcarrier holder 41 is configured to have a side wall that partially contacts the wall of the internal volume, and the shape and extension of the side wall 45 of the holder cover 42 and the side wall 45 of the subcarrier holder 41 are configured to form a further gas flow path together with a part of the wall of the internal volume. container.

2. The fins 44 are arranged to form a spiral gas flow path (C) between the first tray port 46 on the side wall 45 of the subcarrier holder 41 and the holder lid 42, particularly the second tray port 47 in the center of the holder lid 42. The container according to claim 1.

3. The fins 44 are arranged to form a winding gas flow path (C) between the first tray port 46 of the side wall 45 of the subcarrier holder 41 and the second tray port 47 of the holder lid 42 or another part of the side wall 45 of the subcarrier holder 41. The container according to claim 1.

4. The fin 44 is configured to form a gas flow path (C) between the first tray port 46 and the second tray port 47, and the gas flow path (C) covers at least 90% of the surface of the subcarrier tray 4. The container according to claim 2 or claim 3.

5. The one or more fins 44 are characterized in that they substantially protrude toward the lower part of the subcarrier holder 41. The container according to claim 1.

6. The holder lid 42, the surface of the precursor, and the one or more fins are characterized in that they form a gas channel (C) via the subcarrier tray 4. The container according to claim 1.

7. The separation structure is provided at the lower part of the subcarrier tray 4 and is characterized by enabling the flow of carrier gas from / to a part of the inner wall of the container 1's housing along the lower part of each subcarrier tray 4. The container according to claim 1.

8. The gas flow path (C) formed in the at least one subcarrier tray 4 is characterized by having a Reynolds value of less than 2000, preferably less than 5000. The container according to claim 1.

9. The heating element 5 is characterized by adhering to the container 1 and heating the container 1 to at least the evaporation temperature of the precursor material. The container according to claim 1.

10. In a method of transferring vaporized precursors, The steps of providing a precursor to the container 1 according to claim 1, The steps include supplying carrier gas to the aforementioned container, The step of receiving the carrier gas concentrated with the vaporized precursor, Features including, method.

11. In a method of transferring vaporized precursors, The steps of providing a precursor to the container 1 according to claim 1, A step of receiving the vaporized precursor by steam extraction, Features including, method.

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