Synthesis device

Abstract

To provide a synthesizer capable of regulating the temperature of a reaction liquid stored in a reaction vessel in a mode closer to an optimum state.SOLUTION: The synthesizer synthesizes a radioactively labeled compound inside a reaction vessel, and includes a holding part for holding the reaction vessel, a blowout nozzle 30 for blowing out an air flow of hot air or cold air, and a turning part 50 for turning and dispersing the air flow blown out from the blowout nozzle 30 and blowing it to the reaction vessel.SELECTED DRAWING: Figure 10

Description

[Technical Field]

[0001] The present invention relates to a synthesis device. [Background technology]

[0002] Radiolabeled compounds are compounds labeled with radioisotopes and are used for radiopharmaceuticals, etc. Radiolabeled compounds are synthesized by chemically reacting a radioisotope (nuclide) with a specific labeled precursor compound.

[0003] Patent Document 1 describes an apparatus for synthesizing a radiolabeled compound. This apparatus is configured to synthesize a radiolabeled compound by chemically reacting a radioisotope with a labeled precursor compound in a reaction vessel while controlling the temperature by blowing hot air into the reaction vessel from a blow-out nozzle (gas blow nozzle in the same document). [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2015-137248 Summary of the Invention [Problem to be solved by the invention]

[0005] According to the investigations of the present inventors, there is still room for improvement in the synthesis apparatus of Patent Document 1 in terms of optimizing the temperature control of the reaction vessel.

[0006] The present invention has been made in view of the above-mentioned problems, and provides a synthesis apparatus that can regulate the temperature of a reaction solution contained in a reaction vessel in a manner closer to optimal. [Means for solving the problem]

[0007] According to the present invention, there is provided a synthesis apparatus for synthesizing a radiolabeled compound inside a reaction vessel, comprising: a holder for holding the reaction vessel; a blowout nozzle that blows out an airflow that is hot air or cold air; a deflection unit that deflects and disperses the airflow blown out from the blowout nozzle and blows it onto the reaction vessel; A synthesis apparatus is provided comprising: [Effects of the Invention]

[0008] According to the present invention, the temperature of the reaction solution contained in the reaction vessel can be controlled in a manner closer to the optimum. [Brief explanation of the drawings]

[0009] [Figure 1] FIG. 1 is a schematic diagram of a main part of a synthesis device according to a first embodiment. [Figure 2] FIG. 10 is a perspective view showing a reaction module which is a main part of a synthesis apparatus according to a second embodiment. [Figure 3] FIG. 10 is a perspective view showing a container holding unit of a reaction module of a synthesis apparatus according to a second embodiment. [Figure 4] FIG. 10 is a plan view showing a holding section of a reaction module of a synthesis apparatus according to a second embodiment. [Figure 5] FIG. 5 is a side cross-sectional view taken along line AA in FIG. 4. [Figure 6] FIG. 5 is a side view seen in the direction of arrow B in FIG. [Figure 7] FIG. 7 is a cross-sectional plan view taken along line CC in FIG. 6. [Figure 8] 10 is a plan view showing a state in which a cooler with a cover or the like is attached to a cold air nozzle provided in the container holding unit. FIG. [Figure 9] 10 is a side view showing a state in which a cooler with a cover or the like is attached to a cold air nozzle provided in the container holding unit. FIG. [Figure 10] FIG. 8 is a partially enlarged view of FIG. [Figure 11] FIG. 10 is a diagram showing a block configuration relating to a temperature control function of a reaction module of a synthesis apparatus according to a second embodiment. [Figure 12] FIG. 1 is a schematic overall view of a synthesis device according to a second embodiment. [Figure 13] FIG. 10 is a cross-sectional plan view showing a main part of a synthesis device according to a modified example of the second embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0010] Hereinafter, embodiments of the present invention will be described with reference to the drawings. In all the drawings, the same components are denoted by the same reference numerals, and the description thereof will be omitted as appropriate. In addition, in each drawing, some of the components may be omitted to avoid cluttering the drawing.

[0011] [First embodiment] First, the first embodiment will be described with reference to FIG. As shown in FIG. 1, the synthesis apparatus 100 according to this embodiment is a synthesis apparatus 100 that synthesizes a radiolabeled compound inside a reaction vessel 10, and includes a holding section that holds the reaction vessel 10, a blow-out nozzle 30 that blows out an airflow that is hot or cold air, and a turning section 50 that turns and disperses the airflow blown out from the blow-out nozzle 30 and blows it onto the reaction vessel 10. The reaction vessel 10 is, for example, a vial bottle, etc. The holding part is, for example, a holding cap 71 that holds the neck of the upper part of the reaction vessel 10, or a wire mesh 25 that supports the bottom surface of the reaction vessel 10. Flow paths 13 and 14 that penetrate the holding cap 71 are inserted into the reaction vessel 10. Flow path 13 is a flow path for gas, and flow path 14 is a flow path for liquid. The reaction liquid 12 can be transferred through flow path 14, and the pressure and atmosphere inside the reaction vessel 10 can be controlled by flow path 13. The flow paths 13 and 14 can be raised and lowered relative to the reaction vessel 10 and holding cap 71. During the reaction, the flow paths 13 and 14 can be raised until their lower ends are positioned above the liquid level of the reaction liquid 12 inside the reaction vessel 10, and during the transfer of liquid inside the reaction vessel 10, the flow path 14 can be lowered until its lower end reaches the bottom of the reaction vessel 10.

[0012] According to this embodiment, the airflow blown out from the blow-out nozzle 30 is turned and dispersed by the turning unit 50 and then blown onto the reaction vessel 10, so that it is possible to prevent the airflow from being supplied to the reaction vessel 10 locally. In other words, it is possible to prevent the reaction vessel 10 from being heated or cooled locally. This makes it possible to heat or cool the reaction liquid 12 contained in the reaction vessel 10 evenly. Therefore, for example, it becomes possible to suppress the occurrence of runaway reactions (such as antibody aggregation) in the reaction vessel 10 and to perform cooling more efficiently. In addition, since the deflecting portion 50 disperses the airflow, it also slows down the airflow.

[0013] More specifically, in this embodiment, the turning section 50 is positioned below the holding section, and turns and disperses the airflow blown out horizontally from the blowing nozzle 30 and blows it toward the bottom surface of the reaction vessel 10. This allows the reaction solution 12 in the reaction vessel 10 to be heated or cooled evenly.

[0014] Second Embodiment Next, a second embodiment will be described with reference to FIGS. As shown in FIG. 2, in this embodiment, the synthesis apparatus 100 is a synthesis apparatus 100 that synthesizes a radiolabeled compound inside a reaction vessel 10, and includes a holding section that holds the reaction vessel 10, a blow-out nozzle 30 that blows out an airflow that is hot air or cold air, and a turning section 50 that turns and disperses the airflow blown out from the blow-out nozzle 30 and blows it onto the reaction vessel 10. The reaction vessel 10 is, for example, a vial bottle, etc. The holding part is, for example, a holding cap 71 that holds the neck of the upper part of the reaction vessel 10, or a wire mesh 25 that supports the bottom surface of the reaction vessel 10.

[0015] As shown in FIG. 2, the synthesis apparatus 100 includes a reaction module 80 for synthesizing a radiolabeled compound in a reaction vessel 10 . The reaction module 80 includes a container holding unit 20 that not only supports the reaction containers 10 etc. but also blows hot air for heating and cold air for cooling onto the reaction containers 10 . The shape of the container holding unit 20 is not particularly limited, but as an example, it is formed in a rectangular parallelepiped shape as shown in FIG. The container holding unit 20 includes, for example, a lower unit 21 and an upper unit 22 provided on the lower unit 21. For example, the lower unit 21 is formed in a rectangular parallelepiped shape. For example, the upper unit 22 is formed in a low rectangular parallelepiped shape and is disposed on top of the lower unit 21. The container holding unit 20 includes an annular (e.g., circular) metal plate 24 arranged along the edge of an opening 23b (FIG. 5: described below) formed on the upper surface (the upper surface of the upper unit 22) of the container holding unit 20, and a wire mesh 25 whose peripheral edge is supported by the metal plate 24. The reaction container 10 is designed to be placed on the wire mesh 25. More specifically, for example, a cylindrical windshield member 72 is placed on the wire mesh 25 with the axial direction of the windshield member 72 facing up and down, and a holding cap 71 is placed inside the windshield member 72. The upper unit 22 is provided with a pair of clamping portions 26 on the upper surface side of the upper unit 22, which resiliently clamp the windshield member 72 by spring force.

[0016] 3 is a diagram in which the holding cap 71, the windshield member 72, the reaction vessel 10, and the wire mesh 25 are omitted from the diagram in comparison with Fig. 2. For example, a circular opening 24a is formed in the center of the metal plate 24, and the inside of the upper unit 22 (the inside of a recess 23a (Fig. 5) of the frame 23 described later) can be seen through the opening 24a. Inside the upper unit 22, a deflecting section 50 (described in detail later) is formed to deflect and disperse the airflow and blow it onto the reaction vessel 10. When the wire mesh 25 is placed on the metal plate 24 (Figure 2), the airflow diverted and dispersed by the diverting section 50 inside the upper unit 22 is supplied to the bottom surface of the reaction vessel 10 via the wire mesh 25.

[0017] As shown in FIGS. 4 to 7, the upper unit 22 is provided with, as the blowout nozzles 30, a hot air nozzle 31 that blows out hot air and a cold air nozzle 32 that blows out cold air. That is, the synthesizing device 100 according to this embodiment is provided with, as the blowout nozzle 30, a hot air nozzle 31 that blows out hot air and a cold air nozzle 32 that blows out cold air, separately. The hot air nozzle 31 and the cold air nozzle 32 are each formed in a straight pipe shape, and their axial directions extend horizontally. A portion of the hot air nozzle 31 in the axial direction is inserted inside the frame body 23 described later (see Figure 7), and the remaining portion of the hot air nozzle 31 protrudes outside the frame body 23 (outside the upper unit 22). Similarly, a portion of the cold air nozzle 32 in the axial direction is inserted inside the frame body 23 described later (see Figure 7), and the remaining portion of the cold air nozzle 32 protrudes outside the frame body 23 (outside the upper unit 22). In order to avoid interference between the hot air nozzle 31 and the cold air nozzle 32, the hot air nozzle 31 and the cold air nozzle 32 are introduced into the interior of the upper unit 22, for example, from different (adjacent) side surfaces of the upper unit 22. The tip of the hot air nozzle 31 that protrudes outside the upper unit 22 is an external connection part 31b to which a heater 33 (FIG. 11) such as an air heater is connected. The heater 33 is connected to the external connection part 31b, and hot air supplied from the heater 33 is introduced into the upper unit 22 through the hot air nozzle 31. Similarly, the tip of the part of the cold air nozzle 32 that protrudes outside the upper unit 22 serves as an external connection part 32b to which a cooler 34 (FIGS. 8, 9, and 11) such as a vortex cooler (vortex tube) is connected. The cooler 34 is connected to the external connection part 32b. The cooler 34 includes a compressed air inlet part 36 into which compressed air supplied from a compressed air supply device (not shown) is introduced, and an exhaust part 37 for exhausting heat (blowing out hot air). Compressed air is introduced through the compressed air introduction section 36, whereby cool air is generated in the cooler 34, and this cool air is introduced into the upper unit 22 through the cool air nozzle 32. At this time, heat is exhausted from the exhaust section 37. Furthermore, a temperature detection unit 27 such as a thermocouple is provided in the upper unit 22. A portion of the temperature detection unit 27 in the longitudinal direction is inserted inside the frame 23, and the remaining portion of the temperature detection unit 27 in the longitudinal direction protrudes outside the frame 23.

[0018] As shown in FIGS. 8 and 9, the cooler 34 is provided with, for example, a cover 35, and the cooler 34 is connected to the external connection portion 32b of the cold air nozzle 32 (see FIGS. 2 to 7). 8 and 9, the hot air nozzle 31, the temperature detection unit 27, and the like are omitted from the illustration.

[0019] As shown in FIG. 5, the lower unit 21 includes a rectangular parallelepiped lower housing 41 that forms the outer shell of the lower unit 21, and a rotary motor 42 and a magnet 43 that are arranged inside the lower housing 41. A magnet 43 is connected to the output shaft of the rotary motor 42, and by rotating the magnet 43, a stirring rotor (not shown) placed in the reaction vessel 10 is rotated, and the reaction solution 12 in the reaction vessel 10 is stirred, thereby enabling a synthesis reaction of the radiolabeled compound to be carried out in the reaction vessel 10. In other words, the rotary motor 42, magnet 43, and rotor form a stirrer. Furthermore, for example, an RI sensor 44 for detecting radioactivity is provided at the bottom of the lower housing 41.

[0020] The upper unit 22 includes a frame 23 which is the main body of the upper unit 22 . The frame 23 is formed in a low rectangular parallelepiped shape and is disposed on top of the lower unit 21. The frame 23 has a recess 23a formed on the upper surface thereof. As shown in FIGS. 7 and 10, the planar shape of the recess 23a is, for example, circular. As shown in FIG. 5, the bottom surface of the recess 23a is, for example, approximately horizontal. The material of the frame 23 is, for example, ceramic. As described above, annular metal plate 24 is disposed along the edge of opening 23b at the upper end of recess 23a. As described above, wire mesh 25 is provided on metal plate 24, and opening 24a in the center of metal plate 24 is closed by wire mesh 25. However, the area below wire mesh 25 (the internal area of ​​recess 23a) and the area above wire mesh 25 (the area where reaction vessel 10 is placed) are mutually connected via the mesh of wire mesh 25.

[0021] 5 and 10, a cylindrical surrounding wall 60, for example, is provided in the recess 23a. The surrounding wall 60 is disposed with its axial direction aligned in the up-down direction. The vertical dimension of the surrounding wall 60 (the dimension in the axial direction of the surrounding wall 60) is set to be equal to the vertical dimension of the recess 23a (the height difference from the bottom surface of the recess 23a to the opening 23b). The lower end of the surrounding wall 60 is in contact with or close to the bottom surface of the recess 23a. The outer diameter of the surrounding wall 60 is smaller than the inner diameter of the recess 23a, and for example, the central axis of the surrounding wall 60 coincides with the center of the recess 23a in a plan view. Therefore, a gap exists between the inner peripheral wall surface of the recess 23a and the outer peripheral surface of the surrounding wall 60. The air layer existing in this gap serves as a heat insulating layer 63. The surrounding wall 60 is made of a metal such as copper.

[0022] For example, the center of the metal plate 24 (the center of the opening 24a) also coincides with the central axis of the surrounding wall 60 in a plan view. The inner diameter of the opening 24 a of the metal plate 24 is set to be equal to the inner diameter of the surrounding wall 60 . Therefore, the internal space of the surrounding wall 60 in the internal space of the recess 23a is substantially entirely in communication with the space above the wire mesh 25 via the mesh of the wire mesh 25. For example, the inner peripheral edge of the metal plate 24 rests on the upper edge of the surrounding wall 60 .

[0023] 10, the surrounding wall 60 has a through hole 61 formed therein, which connects the inside of the hot air nozzle 31 inserted into the frame 23 with the inside of the surrounding wall 60. The hot air supplied through the hot air nozzle 31 is introduced into the inside of the surrounding wall 60 through the through hole 61. In addition, the portion of the through-hole 61 that opens into the inside of the surrounding wall 60 serves as an outlet for hot air to be blown into the inside of the surrounding wall 60, and therefore, for convenience, this portion is designated by the symbol "air outlet 31a." In this specification, the entire combination of the hot air nozzle 31, which is a straight tube-shaped member, and the through-hole 61 (including the air outlet 31a) may also be referred to as the hot air nozzle 31 for convenience. Similarly, the surrounding wall 60 has a through hole 62 formed therein, which connects the inside of the cold air nozzle 32 inserted into the frame 23 with the inside of the surrounding wall 60. The cold air supplied through the cold air nozzle 32 is introduced into the inside of the surrounding wall 60 through the through hole 62. In addition, the portion of the through-hole 62 that opens into the interior of the surrounding wall 60 serves as an outlet for cold air to flow into the interior of the surrounding wall 60, and therefore, for convenience, this portion is designated by the symbol "air outlet 32a." In this specification, the cold air nozzle 32, which is a straight-tube member, and the through-hole 62 (including the air outlet 32a) as a whole may also be referred to as the cold air nozzle 32 for convenience.

[0024] As shown in FIGS. 5 and 10, the upper unit 22 includes a first spiral wall 53 and a second spiral wall 54 provided in the internal space of the surrounding wall 60. The first spiral wall 53 and the second spiral wall 54 are spiral walls with vertically rising wall surfaces in a plan view, and are formed by bending a metal plate such as copper. The vertical dimensions of the first spiral wall 53 and the second spiral wall 54 are set to be the same as the vertical dimension of the surrounding wall 60. As shown in FIG. 10, the first spiral wall 53 is formed, for example, in a planar shape in which the radius of curvature decreases from one end 53a to the other end 53b (toward the center of the spiral), and the direction toward the center of the spiral (the direction in which the radius of curvature decreases) is, for example, counterclockwise. Similarly, the second spiral wall 54 is formed, for example, in a planar shape in which the radius of curvature decreases from its one end 54a to the other end 54b (toward the center of the spiral), and the direction toward the center of the spiral (the direction in which the radius of curvature decreases) is, for example, counterclockwise. That is, the turning directions (spiral directions) of the first taxiway 51 and the second taxiway 52 are the same.

[0025] One end 53a of the first spiral wall 53 and one end 54a of the second spiral wall 54 are in contact with (the inner peripheral wall surface of) the surrounding wall 60, respectively. The other end 53b of the first spiral wall 53 and the other end 54b of the second spiral wall 54 are each located at a directly below position 50a. The directly below position 50a is a position below the reaction vessel 10 and offset from the center of the reaction vessel 10 in a plan view. The outline OL shown in FIG. 10 is a virtual representation of the planar position of the outline of the reaction vessel 10 when the reaction vessel 10 is placed on the wire mesh 25. In a plan view, the other end 53b of the first spiral wall 53 and the other end 54b of the second spiral wall 54 are located inside the outline OL. On the other hand, in a plan view, one end 53a of the first spiral wall 53 and one end 54a of the second spiral wall 54 are disposed at positions offset from (the position 50a directly below) the center of the reaction vessel 10. More specifically, they are disposed outside the outline OL. In the circumferential direction of the inner peripheral wall surface of the surrounding wall 60, the air outlet 31a is disposed at a position sandwiched between one end 54a and one end 53a. In the circumferential direction of the inner peripheral wall surface of the surrounding wall 60, one end 54a is disposed at a position sandwiched between the air outlet 31a and the air outlet 32a. The first spiral wall 53 and the second spiral wall 54 are spaced apart from each other over the entire area from one end 53a, 54a to the other end 53b, 54b.

[0026] The first spiral wall 53 and the second spiral wall 54 divide the internal space of the surrounding wall 60 (excluding the position 50a directly below) into two regions. Of these two spaces, the space that communicates with the air outlet 31a (communicates with the hot air nozzle 31) forms the first guide path 51. The airflow (hot air) blown out from the air outlet 31a passes through the first guide path 51 and is guided to the position 50a directly below. Of the two spaces, the space that communicates with the air outlet 32a (communicates with the cold air nozzle 32) constitutes the second guide path 52. The first taxiway 51 and the second taxiway 52 are defined by the inner peripheral wall surface of the surrounding wall 60, a first spiral wall 53, and a second spiral wall 54, respectively.

[0027] As shown by arrow D in Figure 10, the first guide path 51 guides the hot air blown out from the outlet 31a of the hot air nozzle 31 to a position directly below the center of the reaction vessel 10 (directly below position 50a) in a spiral shape in a plan view. As shown by arrow E in Figure 10, the second guide path 52 guides the cold air blown out from the outlet 32a of the cold air nozzle 32 to a position directly below the center of the reaction vessel 10 (directly below position 50a) in a spiral shape in a plan view. Here, since the internal space of the surrounding wall 60 is connected to the space above the wire mesh 25 through the mesh of the wire mesh 25, the two spaces separated by the first spiral wall 53 and the second spiral wall 54 are also connected to the space above the wire mesh 25 through the mesh of the wire mesh 25. Therefore, part of the hot air is blown upward during the process of being guided to the directly below position 50a by the first taxiway 51. Similarly, part of the cold air is blown upward during the process of being guided to the directly below position 50a by the second taxiway 52. That is, the first guide path 51 guides the hot air blown out from the hot air nozzle 31 in a spiral manner in a plan view to a position directly below the center of the reaction vessel 10, and blows it upward. The second guide path 52 guides the cold air blown out from the cold air nozzle 32 in a spiral shape in a plan view to a position directly below the center of the reaction vessel, and blows the air upward.

[0028] Furthermore, since the underside of the internal space of the surrounding wall 60 is blocked by the bottom surface of the recess 23a of the frame body 23, the warm or cold air introduced into the surrounding wall 60 (introduced into the first taxiway 51 or the second taxiway 52) cannot escape downward, and is ultimately all blown out (blow up) from the internal space of the surrounding wall 60 upward. 5, the centers of the air outlets 31a and 32a are disposed below the vertical center positions of the surrounding wall 60, the first taxiway 51, and the second taxiway 52. ​​More specifically, the air outlets 31a and 32a are formed near the lower end of the surrounding wall 60 (near the bottom surface of the recess 23a). This makes it possible to prevent the airflow blown out from the air outlets 31a and 32a from once heading downward and then going upward, which is an unnecessary behavior.

[0029] In this embodiment, the surrounding wall 60, the bottom surface of the recess 23a, the first taxiway 51, and the second taxiway 52 form the turning section 50.

[0030] Thus, in this embodiment, the turning section 50 is positioned below the holding section (holding cap 71 and wire mesh 25), and turns and disperses the airflow blown out horizontally from the blowing nozzle 30 (hot air nozzle 31, cold air nozzle 32) and blows it toward the bottom surface of the reaction vessel 10. This allows the entire reaction vessel 10, including the bottom portion thereof, to be heated or cooled evenly, thereby making it possible to heat or cool the entire reaction liquid 12 contained in the reaction vessel 10 evenly.

[0031] More specifically, in this embodiment, the blowout nozzles 30 (hot air nozzles 31, cold air nozzles 32) blow out the airflow horizontally from a position below the reaction vessel 10 and offset from the center of the reaction vessel 10 in a plan view (from the directly below position 50a). The turning unit 50 has guide paths (first guide path 51, second guide path 52) that guide the airflow blown out from the blowout nozzles 30 upwards while spirally guiding the airflow to the position directly below the center of the reaction vessel 10 (directly below position 50a) in a plan view. Therefore, in the process of guiding the airflow blown out from the blow-out nozzle 30 to the position 50a directly below, a moderate portion of the airflow can be blown upward. In other words, the airflow is guided spirally to the center (position 50a directly below) and mainly blown upward from the center, but as a result of blowing upward even in the guiding process, it is possible to prevent the airflow from being supplied to the reaction vessel 10 locally.

[0032] More specifically, the turning section 50 has, as guide paths, a first guide path 51 that guides the hot air blown out from the hot air nozzle 31 in a spiral shape in a plan view to a position directly below the center of the reaction vessel 10 (directly below position 50a) while blowing it upward, and a second guide path 52 that guides the cold air blown out from the cold air nozzle 32 in a spiral shape in a plan view to a position directly below the center of the reaction vessel 10 (directly below position 50a) while blowing it upward. This results in a configuration in which the first taxiway 51 and the second taxiway 52 are provided separately, so that the first taxiway 51 can be set to a shape and route that is optimal for heating, and the second taxiway 52 can be set to a shape and route that is optimal for cooling.

[0033] Here, the hot air outlet 31a from the hot air nozzle 31 is arranged at the end 51a of the first guide path 51 on the opposite side to the position directly below the center of the reaction vessel 10 (directly below position 50a). In other words, when the internal space of the surrounding wall 60 shown in Figure 10 is likened to the face of a clock, the air outlet 31a is located around the 5 o'clock position, and the opposite end 51a of the first guideway 51 is also located around the 5 o'clock position. Therefore, the hot air is guided by the first guide path 51 without taking in any surrounding air, and is supplied to the reaction vessel 10. Therefore, the hot air can be supplied to the reaction vessel 10 without being cooled unnecessarily, and a decrease in the heating efficiency of the reaction liquid 12 in the reaction vessel 10 can be suppressed.

[0034] In contrast, the cold air outlet 32a from the cold air nozzle 32 is positioned in the second guide path 52 closer to the position directly below the center of the reaction vessel 10 (directly below position 50a) than the end 52a on the opposite side from the position directly below the center of the reaction vessel 10 (directly below position 50a). When the internal space of the surrounding wall 60 shown in Figure 10 is likened to the face of a clock, the air outlet 32a is located around the 7 o'clock position, while the opposite end 52a of the second guideway 52 is located around the 3 o'clock position. For this reason, cold air is supplied to the reaction vessel 10 while taking in air from a fairly wide range from the 3 o'clock direction (counterclockwise past the 12 o'clock direction) to about the 7 o'clock direction. Therefore, during cooling, the reaction liquid 12 in the reaction vessel 10 can be cooled more efficiently by also using the surrounding air.

[0035] As described above, the turning portion 50 has spiral walls (first spiral wall 53, second spiral wall 54) that are spiral in plan view, and when viewed in plan, one end of the spiral wall (one end 53a, one end 54a) is positioned at a position offset from the center of the reaction vessel 10 (directly below position 50a). On the other hand, the other ends of the spiral wall (other ends 53b and 54b) are disposed at positions directly below the center of the reaction vessel 10 (directly below position 50a). The spiral walls form taxiways (first taxiway 51, second taxiway 52).

[0036] More specifically, the turning section 50 has a first spiral wall 53 and a second spiral wall 54, each of which has a spiral shape in a planar view, and the rotation directions of the first spiral wall 53 and the second spiral wall 54 are the same as each other, and in a planar view, one end 53a of the first spiral wall 53 and one end 54a of the second spiral wall 54 are positioned at a position offset from the center of the reaction vessel 10 (directly below position 50a), and the other end 53b of the first spiral wall 53 and the other end 54b of the second spiral wall 54 are each positioned directly below the center of the reaction vessel 10 (directly below position 50a), and the first spiral wall 53 and the second spiral wall 54 are separated from each other entirely from the one end 53a, 54a to the other end 53b, 53b, and the first spiral wall 53 and the second spiral wall 54 form a first guideway 51 and a second guideway 52.

[0037] Here, the presence of the second spiral wall 54 in addition to the first spiral wall 53 allows the cold air blown out from the air outlet 32a (guided by the second guide path 52) to head towards the position directly below 50a without passing through the first guide path 51 through which the warm air blown out from the air outlet 31a passes. Therefore, when the reaction liquid 12 in the reaction vessel 10 is cooled immediately after the completion of the synthesis reaction, the cold air can cool the reaction liquid 12 in the reaction vessel 10 without receiving heat from the part of the wall surface of the surrounding wall 60 that defines the first guide path 51, thereby improving the cooling efficiency.

[0038] More specifically, the turning section has an enclosing wall 60 that surrounds the taxiways (first taxiway 51, second taxiway 52) in a plan view, and one end 53a of the first spiral wall 53 and one end 54a of the second spiral wall 54 are each in contact with the enclosing wall 60.

[0039] Furthermore, the upper unit 22 has a heat insulating layer 63 that surrounds the periphery of the surrounding wall 60 in a plan view. This makes it possible to prevent the warm air introduced into the internal space of the surrounding wall 60 from being cooled by the frame body 23, and to prevent the cold air introduced into the internal space of the surrounding wall 60 from being heated by the frame body 23.

[0040] The lower ends of the first taxiway 51 and the second taxiway 52 are formed by the bottom surface of the recess 23a or are adjacent to the recess 23a via a plate member placed on the recess 23a. Therefore, for example, the frame 23 can also be suitably cooled by the cool air introduced into the second taxiway 52.

[0041] The synthesis apparatus 100 is configured to be able to selectively perform the operation of introducing hot air from the heater 33 into the first guide path 51 via the hot air nozzle 31 and the outlet 31a, i.e., heating the reaction liquid 12 in the reaction vessel 10 with the hot air, and the operation of introducing cold air from the cooler 34 into the second guide path 52 via the cold air nozzle 32 and the outlet 32a, i.e., cooling the reaction liquid 12 in the reaction vessel 10 with the cold air. In other words, the synthesis apparatus 100 includes a heating section that heats the reaction liquid 12 in the reaction vessel 10 held in the holding section (holding cap 71 or wire mesh 25) with hot air, and a cooling section that cools the reaction liquid 12 in the reaction vessel 10 held in the holding section with cold air.

[0042] FIG. 11 is a block diagram showing the configuration of the temperature control function of the reaction module (temperature control function of the reaction vessel 10). As shown in FIG. 11, the synthesizing device 100 includes a control unit 90 that controls the operation of the heater 33 and the cooler . The control unit 90 receives the detection results from the temperature detection unit 27, and controls the output of the heater 33 in accordance with the detection results from the temperature detection unit 27. In other words, while monitoring the temperature of the reaction solution 12 in the reaction vessel 10 in real time, the control unit 90 controls the reaction solution 12 in the reaction vessel 10 to an optimal temperature in accordance with the detection results. This allows the synthesis reaction of the radiolabeled compound to be carried out while maintaining the reaction solution 12 in the reaction vessel 10 at the desired temperature. Here, the temperature detection unit 27 is configured to detect temperature at the detection unit 27a at one end thereof. As shown in Fig. 10, the detection unit 27a is disposed at a position 50a directly below the temperature detection unit 27. Therefore, the detection result of the temperature of the reaction liquid 12 in the reaction vessel 10 by the temperature detection unit 27 is actually the detection result of the temperature at the position 50a directly below the reaction liquid 12. When the cooler 34 cools the reaction liquid 12 in the reaction vessel 10, the reaction liquid 12 in the reaction vessel 10 can be cooled, for example, at the upper limit of the output of the cooler 34, and it is not necessary to control the output of the cooler 34 according to the detection result by the temperature detection unit 27.

[0043] In addition, in the synthesis apparatus 100 according to this embodiment, the reaction solution 12 in the reaction vessel 10 can be actively cooled using the cooler 34, and therefore, the volume of the reaction vessel 10 used for the synthesis reaction of the radioactively labeled compound can be made larger than that of existing synthesis apparatuses. More specifically, for example, a reaction vessel 10 having a volume of 20 ml or more can be used for a synthesis reaction of a radiolabeled compound, and for example, a reaction vessel 10 having a volume of 50 ml can also be used for a synthesis reaction. The "volume of the reaction vessel 10" referred to here does not mean the total volume of the reaction vessel 10, but the volume (effective volume) in which a synthesis reaction can be suitably carried out, which is the volume sometimes called the "reaction scale." In addition, the volume of the reaction vessel in existing synthesis equipment was limited to 15 ml.

[0044] Next, an example of the overall configuration of the synthesis device 100 will be described with reference to FIG. This overall configuration is similar to that described in Patent Document 1, for example, except for the configuration of the reaction module (the above-mentioned reaction module 80) and the above-mentioned heating and cooling units, but an outline will be given below.

[0045] The synthesizer 100 is an apparatus that performs some or all of the steps of a synthesis process for synthesizing a radiolabeled compound from a raw material or an intermediate. The steps performed by the synthesizer 100 may include steps of subjecting a labeled precursor compound or a labeled intermediate compound to a chemical reaction, such as a labeling reaction or a hydrolysis reaction, as well as steps of subjecting a labeled precursor compound or a labeled intermediate compound to a physical reaction, such as dissolution, heating, heat removal, concentration, or purification.

[0046] Here, heat removal refers to lowering the temperature of an object, and the temperature of the object before and after heat removal is not particularly limited. The temperature of the object after heat removal may be room temperature, or may be higher or lower than room temperature. Specifically, this includes cases where the temperature of an object higher than room temperature is lowered to room temperature or a temperature higher than room temperature, as well as cases where the temperature of an object higher than room temperature is lowered to a temperature lower than room temperature, and cases where the temperature of an object lower than room temperature is lowered to an even lower temperature. In this specification, there is no distinction between heat removal and cooling. Furthermore, heating refers to increasing the temperature of an object, and the temperature of the object after heating may be higher than room temperature, or may be room temperature or lower than room temperature. Furthermore, the labeled precursor compound and the labeled intermediate compound of a radiolabeled compound may be collectively referred to as the raw material, and the finished radiolabeled compound and the labeled intermediate compound may be collectively referred to as the radiolabeled compound.

[0047] The radiolabeled compound synthesized using the synthesizer 100 is not particularly limited, and examples of the nuclide include 11 C. 18 F, 64 Cu, 89 Zr, 111 In, 125 I, 211 At, 225 Examples include Ac. 18 Radiopharmaceuticals containing radioactively labeled compounds labeled with F include those used in positron emission tomography (PET) examinations, in which glucose is substituted with a fluorine isotope. 18 In addition to [F]FDG (fluorodeoxyglucose), [ 18 F]fluoromisonidazole, 3'-deoxy-3'-[ 18 F]fluorothymidine, an amyloid imaging agent [ 18 F]Flutemetamol, N-succinimidyl 4-[ 18 F]fluorobenzoate ([ 18 F]SFB) and the like.

[0048] The reaction module 80 is used, for example, by being detachably attached to the synthesizer 100. The reaction module 80 can be attached to a rack 152, which is the housing of the synthesizer 100. The reaction module 80 is a device that holds the reaction vessel 10, supplies raw materials for the radiolabeled compound into the reaction vessel 10, and performs various synthesis processes to synthesize the radiolabeled compound. The reaction module 80 includes a holding cap 71 that holds the reaction vessel 10 .

[0049] One or more tubes 110 are inserted into the reaction vessel 10. Raw materials for the radiolabeled compound are supplied to the reaction vessel 10 through the tubes 110, and the radiolabeled compound is taken out of the reaction vessel 10 through the tubes 110.

[0050] A windshield member 72 is provided around the reaction vessel 10 fixed by the holder without contacting the reaction vessel 10. The airflow blown out from the blowout nozzle 30 and turned by the turning portion 50 passes through the area surrounded by the windshield member 72 above the wire mesh 25 and heads above the windshield member 72 .

[0051] The synthesis apparatus 100 is configured by mounting a large number of process modules 150 on a rack 152. A reaction module 80 can be attached to the bottom of the rack 152. An inert gas supply port 136 is provided on the top of the rack 152 to supply an inert gas into the system of the synthesis apparatus 100. A gas cylinder (not shown) containing an inert gas is connected to the inert gas supply port 136. The inert gas supplied to the inert gas supply port 136 can be supplied to the reaction vessel 10 via a driving gas supply tube (not shown), which is one of the multiple tubes that make up the tube 110. By introducing an inert gas into the reaction vessel 10, a driving force is obtained for removing liquids such as raw materials and radiolabeled compounds from the reaction vessel 10. In addition, a raw material gas supply port 134 and a syringe 140 are provided on the top of the rack 152 as means for supplying the compound bulk, which is the raw material of the radiolabeled compound, into the reaction vessel 10.

[0052] A three-way stopcock holder 120, a syringe holding part 122, and a syringe drive mechanism 124 are provided on the front surface of the process module 150. A three-way stopcock 121 is attached to the three-way stopcock holder 120. A syringe 140 is attached to the syringe holding part 122, and the tip of the syringe 140 is connected to the three-way stopcock 121 via a tube. The syringe drive mechanism 124 is a mechanism that moves the piston of the syringe 140 attached to the syringe holding part 122 forward and backward. A drive motor (not shown) that freely moves the piston of the syringe 140 in the pushing or pulling direction is provided inside the process module 150. The process module 150 is equipped with a control part (not shown; it may be separate from or common to the control part 90), and the control part controls the timing of driving the piston by the drive motor and the pushing length. As a result, the raw material is delivered from the syringe 140 attached to the process module 150 to the three-way stopcock 121 at a predetermined timing and in a predetermined amount.

[0053] The process module 150 further includes a switching motor (not shown) that switches an operating lever (not shown) of the three-way stopcock 121 attached to the three-way stopcock holder 120. A control unit of the process module 150 controls the switching of the switching motor at appropriate times. The three-way stopcocks 121 in adjacent process modules 150 vertically or horizontally, or the three-way stopcocks 121 in distant process modules 150, are connected by connector tubes 128. As a result, a raw material supply line 129 is formed by each of the multiple syringes 140, three-way stopcocks 121, and connector tubes 128.

[0054] Extending from the reaction vessel 10 as tubes 110 are a product collection tube 112, a raw material supply tube 114, a waste gas tube 116, and a drive gas supply tube (not shown).

[0055] The raw material supply tube 114 is connected to one of the three-way stopcocks 121 and communicates with the raw material supply line 129. This allows the raw material of the radioactively labeled compound to be supplied into the reaction vessel 10 according to the synthesis process.

[0056] A vial (not shown) for storing waste liquid generated in the synthesis process of radiolabeled compounds is connected to the raw material supply line 129. By blowing a driving gas into the inside of the reaction vessel 10 at a predetermined timing to pressurize it, waste liquid is extracted from the reaction vessel 10 into a vial for storing waste liquid through the raw material supply tube 114 or another tube (not shown). The waste gas tube 116 is connected to a waste gas treatment unit 160. The waste gas generated in the synthesis process of radiolabeled compounds is detoxified in the waste gas treatment unit 160. The product recovery tube 112 is connected to a product vial PV, and the radiolabeled compound synthesized in the reaction vessel 10 is extracted into the product vial PV. The flow paths of the product recovery tube 112 and the waste gas tube 116 can be opened and closed individually. By supplying driving gas to the reaction vessel 10 from the driving gas supply tube, almost all of the synthesized radiolabeled compound is extracted into the product vial PV through the product recovery tube 112.

[0057] Next, Table 1 will be used to explain the results of tests conducted to heat or cool the reaction vessel 10 held in the holding section using the synthesis apparatus 100 of this embodiment and a synthesis apparatus of a modified example (Figure 13) described below.

[0058] [Table 1]

[0059] The following first, second, third and fourth tests were conducted. In the first test, a vial bottle with a volume of 15 ml (containing 3 ml of water for injection) was used as the reaction vessel 10, and the reaction vessel 10 was heated from room temperature to 70°C. In the second test, a vial bottle with a volume of 15 ml (containing 3 ml of water for injection) was used as the reaction vessel 10, and the temperature of the reaction vessel 10 was lowered from 70°C to 37°C. In the third test, a vial bottle with a volume of 50 ml (containing 10 ml of water for injection) was used as the reaction vessel 10, and the reaction vessel 10 was heated from room temperature to 70°C. In the fourth test, a vial bottle with a volume of 50 ml (containing 10 ml of water for injection) was used as the reaction vessel 10, and the temperature of the reaction vessel 10 was lowered from 70°C to 37°C. In Table 1, "1" in the "Number of walls" column indicates a case where the turning portion 50 has only the first spiral wall 53 out of the first spiral wall 53 and the second spiral wall 54 (corresponding to the modified example described below), and "2" in the "Number of walls" column indicates a case where the turning portion 50 has both the first spiral wall 53 and the second spiral wall 54 (corresponding to this embodiment). In Table 1, "Yes" in the "Cooler Present / Absent" column indicates that the cooler 34 was operated to cool the reaction vessel 10, and "No" in the "Cooler Present / Absent" column indicates that the cooler 34 was not operated and the reaction vessel 10 was allowed to cool naturally.

[0060] As shown in Table 1, when the "number of walls" was "1" and "present," the first test took 5 minutes and 6 seconds, the second test took 2 minutes and 42 seconds, the third test took 9 minutes and 32 seconds, and the fourth test took 4 minutes and 22 seconds. On the other hand, when the "number of walls" was "2" and "present," the time required for the first test was 4 minutes 58 seconds, the time required for the second test was 1 minute 38 seconds, the time required for the third test was 9 minutes 52 seconds, and the time required for the fourth test was 4 minutes 6 seconds. These results indicate that the cooling time can be shortened when the "number of walls" is set to "2." This allows for a reduction in the cycle time when repeatedly synthesizing a radiolabeled compound using the synthesis apparatus 100.

[0061] Only when the number of walls was 2, only the second test was conducted for none. This test took 5 minutes and 58 seconds. That is, by operating the cooler 34 to cool the reaction vessel 10, the time required for cooling can be significantly reduced compared to when the cooler 34 is not operated. This is also true when the "number of walls" is "1", etc.

[0062] <Modification of the second embodiment> Next, a modified example of the second embodiment will be described with reference to FIG. The synthesis device of this modified example differs from the synthesis device 100 of the second embodiment described above in that the turning section 50 selectively has the first spiral wall 53 out of the first spiral wall 53 and the second spiral wall 54, but in other respects it is configured in the same way as the synthesis device 100 of the second embodiment described above. In other words, it does not have the second spiral wall 54 . In this modified example, a first taxiway 51 and a second taxiway 52 are formed in the internal space of the surrounding wall 60 by the first spiral wall 53 . As shown by arrow F in FIG. 13, the first guide path 51 guides the hot air blown out from the outlet 31a of the hot air nozzle 31 to a position directly below the center of the reaction vessel 10 (directly below position 50a) in a spiral manner in a plan view. As shown by arrow G in FIG. 13, the second guide path 52 guides the cold air blown out from the outlet 32a of the cold air nozzle 32 to a position directly below the center of the reaction vessel 10 (directly below position 50a) in a spiral manner in a plan view.

[0063] Although the embodiments and modifications have been described above with reference to the drawings, these are merely examples of the present invention, and various configurations other than those described above can also be adopted.

[0064] For example, in the above description, an example has been described in which the combining device 100 is provided with separate hot air nozzle 31 and cold air nozzle 32, but the combining device may be configured to be able to switch (in a time-division manner) between a state in which hot air is blown out and a state in which cold air is blown out from the common blowout nozzle 30. In other words, the flow paths of the air currents (hot air and cold air) blown out from the blowout nozzle 30 may be separate up to some point, and the flow paths from some point onwards (blowout nozzle 30) may be common.

[0065] Furthermore, in the above second embodiment, a configuration was described in which the first taxiway 51 and the second taxiway 52 merge at the directly below position 50a, and in the modified example, a configuration was described in which the second taxiway 52 merges with the first taxiway 51 midway (before the directly below position 50a), but the first taxiway 51 and the second taxiway 52 may also be completely separate taxiways (taxiways completely separated from each other).

[0066] Furthermore, in addition to vials, other containers such as ampoules and flasks may also be used as the reaction vessel 10. In the above embodiment, the holding part for holding the reaction vessel 10 is exemplified by the holding cap 71 that closes the neck of the reaction vessel 10 and holds the reaction vessel 10, and the wire mesh 25 that supports the bottom surface of the reaction vessel 10, but is not limited to this. A clamp that holds the main body of the reaction vessel 10 may also be used as the holding part.

[0067] In the reaction module 80, the reaction vessel 10 is surrounded by a windshield member 72, but this is not limiting. The airflow may be blown from the blow-out nozzle 30 onto the reaction vessel 10 in an open space without using the windshield member 72. The shape of the windshield member 72 may also be any shape, such as a rectangular tube.

[0068] The present embodiment encompasses the following technical ideas. (1) A synthesis apparatus for synthesizing a radiolabeled compound inside a reaction vessel, comprising: a holder for holding the reaction vessel; a blowout nozzle that blows out an airflow that is hot air or cold air; a deflection unit that deflects and disperses the airflow blown out from the blowout nozzle and blows it onto the reaction vessel; A synthesis apparatus comprising: (2) The synthesis apparatus according to (1), wherein the deflection unit is positioned below the holding unit and deflects and disperses the airflow blown out horizontally from the blow-out nozzle and blows it toward the bottom surface of the reaction vessel. (3) the blow-out nozzle blows out the airflow horizontally from a position below the reaction vessel and offset from the center of the reaction vessel in a plan view; The synthesis apparatus according to (2), wherein the deflection section has a guide path that guides the airflow blown out from the blow-out nozzle in a spiral shape in a plan view to a position directly below the center of the reaction vessel while blowing it upward. (4) The synthesizing device according to any one of (1) to (3), wherein the blowout nozzles are a hot air nozzle that blows out the hot air and a cold air nozzle that blows out the cold air, separately. (5) The turning section is the taxiway, A first guide path that guides the hot air blown out from the hot air nozzle upward in a spiral shape in a plan view to a position directly below the center of the reaction vessel; A second guide path that guides the cold air blown out from the cold air nozzle upward in a spiral shape in a plan view to a position directly below the center of the reaction vessel; The synthesis apparatus according to (4), (6) The hot air outlet from the hot air nozzle is arranged at an end of the first guide path opposite to a position directly below the center of the reaction vessel, The synthesis apparatus described in (5) above, wherein the cold air outlet from the cold air nozzle is arranged on the second guide path closer to the position directly below the center of the reaction vessel than the end opposite to the position directly below the center of the reaction vessel. (7) The turning portion has a spiral wall having a spiral shape in a plan view, In a plan view, one end of the spiral wall is disposed at a position offset from the central portion of the reaction vessel, the other end of the spiral wall is disposed directly below the center of the reaction vessel; The synthesis device according to any one of (3) to (6), wherein the guide path is formed by the spiral wall. (8) The turning portion has a first spiral wall and a second spiral wall each having a spiral shape in a plan view, The first spiral wall and the second spiral wall are wound in the same direction, one end of the first spiral wall and one end of the second spiral wall are disposed at positions offset from the center of the reaction vessel in a plan view; the other end of the first spiral wall and the other end of the second spiral wall are each located directly below the center of the reaction vessel, the first spiral wall and the second spiral wall are spaced apart from each other over the entire length from the one end to the other end, The synthesis device according to (5) or (6), wherein the first guideway and the second guideway are formed by the first spiral wall and the second spiral wall. (9) The turning portion has a surrounding wall that surrounds the periphery of the guideway in a plan view, The synthesis device according to (8), wherein the one end of the first spiral wall and the one end of the second spiral wall are in contact with the surrounding wall. (10) The synthesis apparatus according to (9), further comprising a heat insulating layer surrounding the surrounding wall in plan view. (11) The synthesis apparatus according to any one of (1) to (10), wherein the volume of the reaction vessel is 20 ml or more. [Explanation of symbols]

[0069] 10 Reaction vessel 12 Reaction solution 13 Flow path 14 Flow path 20 Container holding unit 21 Lower unit 22 Upper unit 23 Frame 23a Recess 23b opening 24 Metal plate 24a aperture 25 Wire Mesh 26 Clamping part 27 Temperature detection unit 27a Detector 30 blowout nozzle 31 Hot air nozzle 31a Air outlet 31b External connection part 32 Cold air nozzle 32a Air outlet 32b External connection part 33 Heater 34 Cooler 35 Cover 36 Compressed air inlet 37 Exhaust section 41 Lower housing 42 Rotary motor 43 Magnet 44 RI sensor 50 Turning Section Directly below 50a (directly below the center of the reaction vessel) 51 1st Taxiway (Taxiway) 51a Opposite end 52 Second taxiway (taxiway) 52a Opposite end 53 1st spiral wall 53a one end 53b other end 54 Second spiral wall 54a one end 54b other end 60 Siege Wall 61 Through hole 62 Through hole 63 Insulation layer 71 Retaining cap 72 Windshield material 80 Reaction Modules 90 Control Unit 100 Synthesizer 110 tubes 112 Product collection tube 114 Raw material supply tube 116 Waste gas tube 120 Three-way stopcock holder 121 Three-way stopcock 122 syringe holder 124 Syringe drive mechanism 128 Connector Tube 129 Raw Material Supply Line 134 Raw material gas supply port 136 Inert gas supply port 140 syringes 150 Process Modules 152 racks 160 Waste gas treatment unit PV Product Vial

Claims

1. A synthesis apparatus for synthesizing a radiolabeled compound inside a reaction vessel, comprising: a holder for holding the reaction vessel; a blowout nozzle that blows out an airflow that is hot air or cold air; a deflection unit that deflects and disperses the airflow blown out from the blowout nozzle and blows it onto the reaction vessel; A synthesis apparatus comprising:

2. The synthesis apparatus according to claim 1, wherein the deflection unit is positioned below the holding unit and deflects and disperses the airflow blown out horizontally from the blow-out nozzle and blows it toward the bottom surface of the reaction vessel.

3. the blowout nozzle blows the airflow horizontally from a position below the reaction vessel and offset from a center of the reaction vessel in a plan view, The synthesis apparatus according to claim 2 , wherein the deflection section has a guide path that guides the airflow blown out from the blowout nozzle in a spiral shape in a plan view and blows it upward to a position directly below the center of the reaction vessel.

4. The synthesizing device according to claim 3 , wherein the blowout nozzles include a hot air nozzle that blows out the hot air and a cold air nozzle that blows out the cold air, separately.

5. The turning section serves as the guideway, A first guide path that guides the hot air blown out from the hot air nozzle upward in a spiral shape in a plan view to a position directly below the center of the reaction vessel; A second guide path that guides the cold air blown out from the cold air nozzle in a spiral shape in a plan view to a position directly below the center of the reaction vessel and blows it upward; The synthesis apparatus according to claim 4 , comprising:

6. The hot air outlet from the hot air nozzle is disposed at an end of the first guide path opposite to a position directly below the center of the reaction vessel, The synthesis apparatus described in claim 5, wherein the cold air outlet from the cold air nozzle is arranged on the second guide path closer to the position directly below the center of the reaction vessel than the end opposite to the position directly below the center of the reaction vessel.

7. The turning portion has a spiral wall having a spiral shape in a plan view, In a plan view, one end of the spiral wall is disposed at a position offset from the central portion of the reaction vessel, the other end of the spiral wall is disposed directly below the center of the reaction vessel; The synthesis device according to claim 3 , wherein the guide path is formed by the spiral wall.

8. The turning portion has a first helical wall and a second helical wall each having a helical shape in a plan view, The first spiral wall and the second spiral wall are spiraled in the same direction, one end of the first spiral wall and one end of the second spiral wall are disposed at positions offset from the center of the reaction vessel in a plan view, the other end of the first spiral wall and the other end of the second spiral wall are each located directly below the center of the reaction vessel, the first spiral wall and the second spiral wall are spaced apart from each other over the entire length from the one end to the other end, The synthesis device according to claim 5 or 6, wherein the first guideway and the second guideway are formed by the first spiral wall and the second spiral wall.

9. The turning portion has a surrounding wall that surrounds the periphery of the guideway in a plan view, The synthesis device according to claim 8 , wherein the one end of the first spiral wall and the one end of the second spiral wall are in contact with the surrounding wall.

10. The synthesis apparatus according to claim 9 , further comprising a heat insulating layer surrounding the periphery of the surrounding wall in a plan view.

11. The synthesis apparatus according to any one of claims 1 to 7, wherein the volume of the reaction vessel is 20 ml or more.

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