Method for manufacturing anti-glare glass and anti-glare glass

Abstract

This invention discloses a method for manufacturing anti-glare glass and anti-glare glass, the method for manufacturing anti-glare glass comprising: a mask layer attachment step of attaching a mask layer having a plurality of regularly arranged holes to at least one surface of a glass substrate; a chemical etching step of etching the surface of the glass substrate to which the mask layer is attached; a mask layer removal step of removing the mask layer after the completion of the chemical etching step to obtain a glass substrate on which independent concave particles are uniformly distributed on the surface; and a chemical polishing step of chemically polishing the surface of the glass substrate from which the mask layer has been removed, wherein in the chemical polishing step, the polishing is carried out until adjacent concave particles overlap and share the same edge. The design of the mask layer, chemical etching and chemical polishing solves the technical challenge of not being able to achieve both high anti-glare performance and low sparkle.

Description

Technical Field

[0005] , ,

[0001] The present invention relates to the technical field of anti-glare glass, and particularly to a manufacturing method of anti-glare glass and anti-glare glass.

Background Art

[0002] Anti-glare glass is a functional glass widely used in household electrical appliances. Due to its anti-glare characteristics, the display can reduce the reflection and scattering of environmental light, and make the display effect clearer. Therefore, AG anti-glare glass is widely applied to the displays of electronic devices such as in-vehicle displays, notebook computers, tablet computers, smart phones, and televisions.

[0003] With the continuous development and popularization of the electronic product market, the demand for anti-glare glass is gradually increasing. The conventional anti-glare glass manufacturing technology is usually formed by performing chemical etching or physical sandblasting on the surface of a glass substrate and then performing chemical polishing. There are many defects in the conventional anti-glare glass manufacturing technology. For example, the manufacturing cost is high, the consideration for the environment is low, and it is difficult to achieve both anti-glare effect and sparkle. Especially when the anti-glare performance of the glass is very high, the sparkle value on the glass surface becomes very large, which is likely to cause eye fatigue of users. All these limit its wide application. [[ID=1十七]]

[0004] The method for solving the above technical problems has already become a technical problem that needs to be urgently solved in the industry.

Summary of the Invention

Problems to be Solved by the Invention

[0005] [[ID=三十]]In order to solve at least the above technical problems, an object of the present invention is to provide a manufacturing method of anti-glare glass, and through the design of a mask layer and chemical etching and chemical polishing, the technical problem that high anti-glare performance and low sparkle cannot be achieved simultaneously is solved. [Means for solving the problem]

[0006] To achieve the above objective, the method for manufacturing anti-glare glass provided in this application is: The process includes: a mask layer attachment step of attaching a mask layer having a plurality of regularly arranged holes to at least one surface of a glass substrate; a chemical etching step of etching the surface of the glass substrate to which the mask layer is attached; a mask layer removal step of removing the mask layer after the completion of the chemical etching step to obtain a glass substrate on which independent concave particles are uniformly distributed on the surface; and a chemical polishing step of chemically polishing the surface of the glass substrate from which the mask layer has been removed, wherein in the chemical polishing step the polishing is carried out until adjacent concave particles overlap and share the same edge.

[0007] Furthermore, the process includes a step of continuing to polish the glass substrate after it has been polished by a chemical polishing process until adjacent concave particles overlap and share the same side, until the Ra of the polished glass substrate decreases to 0.03 μm and / or the Rz decreases to 0.1 μm.

[0008] Furthermore, the mask layer is an acid corrosion-resistant mask layer.

[0009] Furthermore, the multiple regularly arranged pores on the mask layer are The distance between the centers of adjacent holes is the same. This includes having a pore diameter of 1 μm to 100 μm.

[0010] Furthermore, an equilateral triangle can be formed by connecting the centers of any three adjacent holes.

[0011] Furthermore, the distance between the centers of any two adjacent pores is between 1.5 μm and 100 μm.

[0012] Furthermore, the chemical etching process includes etching the glass substrate within the pores on the surface to which the mask layer is attached, with an etching depth of 0.1 μm to 50 μm.

[0013] Furthermore, the chemical etching process includes etching the glass substrate with an etching solution, the etching solution being a hydrofluoric acid solution, or a mixed solution of hydrofluoric acid, nitric acid, sulfuric acid, and hydrochloric acid.

[0014] Furthermore, if the etching solution is a mixed solution of hydrofluoric acid, nitric acid, sulfuric acid, and hydrochloric acid, the concentration of the hydrofluoric acid is 1% to 12% wt, the concentration of the sulfuric acid is 0% to 12% wt, the concentration of the hydrochloric acid is 0% to 12% wt, and the concentration of the nitric acid is 0% to 12% wt.

[0015] Furthermore, the etching solution temperature range is 16°C to 22°C.

[0016] Furthermore, the chemical etching process takes 5 to 1800 seconds.

[0017] Furthermore, the chemical polishing process includes polishing the glass substrate with a polishing solution, which is a mixed solution of hydrofluoric acid and sulfuric acid.

[0018] Furthermore, the concentration of hydrofluoric acid in the polishing solution is 3% to 12% wt, and the concentration of sulfuric acid is 3% to 12% wt.

[0019] Furthermore, the temperature range for the polishing solution is 29°C to 35°C.

[0020] Furthermore, before the chemical etching process, If the mask layer is attached to only one side of the glass substrate, the process further includes a protective film layer attachment step of attaching an acid-resistant protective film to the opposite side of the glass substrate.

[0021] Furthermore, the process includes a step to remove the acid-resistant protective film after the chemical polishing process is completed.

[0022] To achieve the above objective, the embodiments of the present invention further provide anti-glare glass manufactured by the above-described method for manufacturing anti-glare glass. [Effects of the Invention]

[0023] The manufacturing method of the antiglare glass according to an embodiment of the present invention includes a mask layer attaching step of attaching a mask layer having a plurality of regularly arranged holes to at least one surface of a glass substrate, a chemical etching step of etching the surface of the glass substrate to which the mask layer is attached, a mask layer removing step of removing the mask layer after the completion of the chemical etching step to obtain a glass substrate with independent concave particles uniformly distributed on the surface, and a chemical polishing step of performing chemical polishing on the surface of the glass substrate from which the mask layer has been removed. In the chemical polishing step, polishing is performed until adjacent concave particles overlap and share the same side. In the manufacturing method of the antiglare glass according to an embodiment of the present invention, due to the design of the mask layer, chemical etching, and chemical polishing, concave particles with the same dimensions, shapes, and depths are formed on the surface of the glass substrate and are uniformly distributed, significantly reducing the sparkle of the antiglare glass when the antiglare performance is the same, and solving the technical problem of the conflict between high antiglare performance and low sparkle. For the manufacturing of glass substrates of different materials or glasses with different antiglare specifications, only by adjusting the dimensions of the holes of the mask layer, the distance between the centers, and the depth of the concave particles during etching, an antiglare glass with predetermined specifications can be obtained, solving the problem that the composition components of the etching solution for chemically etching conventional antiglare glass are complex. In addition, the surface of the antiglare surface becomes more regular, having a lower sparkle while realizing excellent antiglare performance, enhancing the competitiveness in the terminal market.

Brief Description of the Drawings

[0024] The drawings are provided for further understanding of the present application and constitute a part of the specification, and are used to interpret the present application together with the embodiments of the present application, without intending to limit the present application. Each drawing is as follows.

[0025] [Figure 1] FIG. 1 is a flowchart of a manufacturing method of an antiglare glass according to an embodiment of the present application. [Figure 2] FIG. 2 is a diagram showing the flow of a manufacturing method of an antiglare glass according to another embodiment of the present application. <​​ [Modes for carrying out the invention]

[0026] The embodiments of this application will be described in more detail below with reference to the drawings. Although some embodiments of this application are shown in the drawings, this application can be realized in various forms and should not be construed as being limited to the embodiments described herein. On the contrary, these embodiments should be understood as being provided for a more thorough and complete understanding of this application. The drawings and embodiments of this application are illustrative only and should not be understood as being intended to limit the scope of protection of this application.

[0027] It should be understood that the steps described in the embodiments of the method of this application may be performed in a different order and / or in parallel. Furthermore, embodiments of the method may include additional steps and / or omit the execution of the indicated steps. The scope of this application is not limited in this respect.

[0028] As used herein, the term "includes" and its variations mean open inclusion, i.e., "includes but not limited to." The term "based on" means "based at least partially." The term "one embodiment" means "at least one embodiment," the term "another embodiment" means "at least one other embodiment," and the term "several embodiments" means "at least several embodiments." Relevant definitions of other terms are provided below.

[0029] It should be noted that the modifiers “one” and “multiple” as used in this application are illustrative, not restrictive, and should be understood by those skilled in the art as “one or more” unless otherwise explicitly indicated in the context. “Multiple” should be understood as two or more.

[0030] The embodiments of this application will be described in detail below with reference to the drawings.

[0031] Embodiments of the present invention include a mask layer attachment step of attaching a mask layer having a plurality of regularly arranged holes to at least one surface of a glass substrate; a chemical etching step of etching the surface of the glass substrate to which the mask layer is attached; a mask layer removal step of removing the mask layer after the completion of chemical etching to obtain a glass substrate on which independent concave particles are uniformly distributed on the surface; and a chemical polishing step of chemically polishing the surface of the glass substrate from which the mask layer has been removed. In the chemical polishing process, the invention provides a method for manufacturing anti-glare glass in which adjacent concave particles are polished until they overlap and share the same side.

[0032] First Example Figure 1 is a flowchart of a method for manufacturing anti-glare glass according to one embodiment of this application. Figure 2 is a flowchart of a method for manufacturing anti-glare glass according to another embodiment of this application. The method for manufacturing anti-glare glass according to an embodiment of the present invention will be described in detail below with reference to Figures 1 and 2.

[0033] The method for manufacturing anti-glare glass according to an embodiment of the present invention can be used, for example, to provide anti-glare functionality and surface treatment to glass such as anti-glare glass for vehicles and anti-glare glass for the surface of mobile terminals.

[0034] In Figure 2, a to a6 are schematic diagrams of the surface structure of the anti-glare glass when it is manufactured using the anti-glare glass manufacturing method according to an embodiment of the present invention, and bl to b6 are schematic diagrams of the side structure of the anti-glare glass.

[0035] First, in step 101, a mask layer having a plurality of regularly arranged holes is attached to at least one surface of the glass substrate.

[0036] In one exemplary embodiment, a mask layer is first attached to at least one surface of the glass substrate. For example, as shown in a2 and b2 in Figure 2, the mask layer is attached to one surface of the glass substrate.

[0037] In one exemplary embodiment, a mask layer is attached to at least one surface of a glass substrate. For example, the mask layer is attached to the front surface of the glass substrate, or to the back surface of the glass substrate. Naturally, if necessary, the mask layer may be attached to both the front and back surfaces of the glass substrate simultaneously.

[0038] In one exemplary embodiment, anti-glare glass typically has technical requirements only for the front and / or back surfaces, and the sides of the glass substrate do not affect the optical parameters and performance; therefore, in the manufacturing method of anti-glare glass in the embodiments of this application, the surface of the glass substrate refers to the front and back surfaces.

[0039] In one exemplary embodiment, the mask layer has a plurality of regularly arranged holes.

[0040] In one exemplary embodiment, the hole is a through hole.

[0041] In one exemplary embodiment, the fact that the mask layer has a plurality of regularly arranged holes indicates that the arrangement of holes on the mask layer follows a certain rule, and does not mean that each hole is of the same size. Naturally, the holes on the mask layer may be of the same size, or the arrangement of holes of the same size with appropriate spacing follows a certain rule, as needed.

[0042] In one exemplary embodiment, a plurality of regularly arranged holes on a mask layer include having the same distance between the centers of adjacent holes, i.e., the distance between the centers of adjacent holes is equal.

[0043] In one exemplary embodiment, there may be a certain gap between adjacent holes on the mask layer, meaning that adjacent holes are not connected, or there are no overlapping regions or contact points between adjacent holes.

[0044] In one exemplary embodiment, an equilateral triangle is formed by connecting the centers of any three adjacent holes, i.e., the distribution of holes is equilateral.

[0045] In one exemplary embodiment, a square, rectangle, rhombus, etc., may be formed by connecting lines between the center points of four adjacent holes, as needed.

[0046] In one exemplary embodiment, the distance between the centers of any two adjacent holes is 1.5 μm to 100 μm.

[0047] In one exemplary embodiment, the hole shape is circular. Naturally, the hole shape can be adjusted as needed, depending on the actual requirements. In this application, the purpose of designing the hole to be circular is to create the hole in the mask layer more quickly and efficiently. For example, when the mask layer is an acid-resistant photosensitive ink or an acid-resistant photoresist, it is exposed by an exposure apparatus and then developed. When the hole diameter is very small, the requirement for accuracy of the light spot is very high, so in such cases, a circular hole is easier to manufacture.

[0048] In one exemplary embodiment, the pore diameter range is 1 μm to 100 μm.

[0049] In one exemplary embodiment, the pore diameter range is 1 μm to 25 μm.

[0050] In one exemplary embodiment, the shape of the hole may be elliptical, rectangular, hexagonal, and in particular circular, square, regular hexagonal, etc.

[0051] In one exemplary embodiment, the mask layer is an acid corrosion-resistant mask layer.

[0052] In one exemplary embodiment, the mask layer may be a metal film layer having a plurality of regularly arranged holes. Alternatively, regularly arranged holes may be formed by applying an acid-resistant photosensitive ink or an acid-resistant photoresist to the surface of a glass substrate and then exposing and developing the ink or photoresist. Naturally, the specific configuration of the mask layer can be selected according to actual needs and is not limited to the range mentioned above.

[0053] In one exemplary embodiment, when the mask layer is formed from ink or photoresist, the thickness of the mask layer is 1 μm to 50 μm.

[0054] In one exemplary embodiment, when the mask layer is formed of ink or photoresist, the method for applying the mask layer includes roll coating, silkscreen printing, and spin coating by a spin coater.

[0055] In one exemplary embodiment, if the mask layer is formed of ink or photoresist, the regularly arranged holes in the mask layer may be formed by exposure and development.

[0056] In step 102, a chemical etching process is performed on the surface of the glass substrate to which the mask layer is attached.

[0057] In one exemplary embodiment, chemical etching is performed on a glass substrate, and the chemical etching is performed on the surface to which the mask layer is attached.

[0058] In one exemplary embodiment, only the regions containing holes in the mask layer are exposed on the surface to which the mask layer is attached. Therefore, in chemical etching, the glass substrate within the holes is etched. Chemical etching is performed on the areas within the holes, as shown in a2 and b2 in Figure 2.

[0059] In one exemplary embodiment, an etching solution enters a porous region in the mask layer on a glass substrate, etching it to form concave particles of a certain depth.

[0060] In one exemplary embodiment, the etching depth is between 0.1 μm and 50 μm. Naturally, the etching depth should not exceed the thickness of the glass substrate, and typically, the etching depth does not exceed half the thickness of the glass substrate.

[0061] In one exemplary embodiment, the etching time is 5 to 1800 seconds.

[0062] In one exemplary embodiment, the etching depth can be adjusted by adjusting the concentration of the etching solution and / or the etching time.

[0063] In one exemplary embodiment, the etching solution temperature is 16°C to 22°C.

[0064] In step 103, after chemical etching is complete, a mask layer removal process is performed to remove the mask layer and obtain a glass substrate on which independent concave particles are uniformly distributed on the surface.

[0065] In one exemplary embodiment, as shown in a3 and b3 in Figure 2, the glass substrate in the hole is etched, and when the etching depth meets the requirement, the chemical etching is stopped and the mask layer on the etched surface is removed.

[0066] In one exemplary embodiment, removal of the mask layer includes peeling, washing, chemical removal, and the like.

[0067] In one exemplary embodiment, when the mask layer of the glass substrate is removed, depressions appear within the pore regions, and these depressions are concave particles, with the position, shape, and dimensions of the concave particles corresponding to the holes in the mask layer. The non-pore regions are areas that have not been etched, and at this time, a plurality of independent concave particles are uniformly distributed on the surface of the glass substrate.

[0068] In one exemplary embodiment, a plurality of independent concave particles are uniformly distributed on the surface of a glass substrate. When the concave particles are arranged in a certain order, one regular period can be considered as one whole, and the plurality of wholes of concave particles on the glass substrate are uniformly distributed.

[0069] In one exemplary embodiment, the unetched region is a platform region that protrudes relative to the concave particle.

[0070] In step 104, a chemical polishing process is performed on the surface of the glass substrate from which the mask layer has been removed. In the chemical polishing process, the surface is polished until adjacent concave particles overlap and share the same edge.

[0071] In one exemplary embodiment, after the mask layer is removed, the surface of the glass substrate from which the mask layer has been removed is chemically polished, that is, the entire surface is chemically polished, and due to the isotropy of hydrofluoric acid corrosion of glass, the depth of the concave particles is maintained, but the diameter of the concave particles gradually increases.

[0072] In one exemplary embodiment, during chemical etching, only the glass cover inside the hole is etched. When chemical polishing is performed, continuous bumps and depressions with different etching depths, i.e., concave particles, appear on the surface of the glass substrate.

[0073] In one exemplary embodiment, during chemical polishing, the concave particles produced by chemical etching are gradually polished and their area expands. We will explain this by assuming that the concave particles are circular. As shown in a4-a6 and b4-b6 in Figure 2, the radius range of each concave particle area is gradually expanded until adjacent circular particles touch and then gradually overlap.

[0074] In one exemplary embodiment, since chemical polishing polishes the entire surface of the glass substrate, areas that were originally non-concave particle regions are also within the polishing range during chemical polishing, and the entire surface of the glass substrate is polished and etched. If etching is stopped when adjacent circular particles overlap each other and the planar protrusions disappear, that is, when adjacent circular particles have expanded to share the same edge with each other, then a uniform anti-glare glass with uniform surface particles can be obtained, as shown in a4-a6 and b4-b6 in Figure 2. Of course, considering the anti-glare effect of the entire surface, etching must be continued until all of the above adjacent concave particles share the same edge with each other.

[0075] In one exemplary embodiment, the circular particles are enlarged until they share the same side with adjacent ones, and each of the original circular particles now becomes a regular hexagon, i.e., the glass substrate on that surface becomes the surface of anti-glare glass having a honeycomb appearance.

[0076] In one exemplary embodiment, chemical polishing is performed until every two adjacent particles on the glass surface overlap and share the same edge, and further chemical polishing can be continued as needed. At this point, the diameter dimension of the particles on the glass surface does not increase further, but the particle depth gradually decreases, i.e., the surface roughness Ra and Rz of the glass gradually decrease, which in turn increases the glossiness of the glass and decreases the haze value.

[0077] In one exemplary embodiment, chemical polishing is performed until every two adjacent particles on the glass surface overlap and share the same edge, and further chemical polishing may be continued as needed until the Ra of the polished glass substrate is reduced to 0.03 μm and / or the Rz is reduced to 0.1 μm.

[0078] In one exemplary embodiment, Ra represents the contour arithmetic mean deviation, which is the arithmetic mean of the absolute values ​​of the contour deviation values ​​over the sampling length.

[0079] In one exemplary embodiment, Rz represents the ten-point average roughness, which is the sum of the average values ​​of the five highest contour peaks and the average values ​​of the five deepest contour valleys over the sampling length.

[0080] In one exemplary embodiment, the purpose of chemical polishing is to gradually enlarge the dimensions of independently distributed concave particles formed by etching until adjacent concave particles overlap and share the same side, and planar protrusions disappear, thereby forming a fine morphology on the surface of the glass substrate that matches in dimensions, depth, and shape.

[0081] In one exemplary embodiment, the elimination of planar protrusions by chemical polishing can be understood as follows: As shown in a3 and b3 in Figure 2, concave particles appear during chemical etching, but the region between the concave particles is still a flat, planar region, and this planar region is a planar protrusion relative to the concave particles. As shown in a4-a6 and b4-b6 in Figure 2, when the diameter dimension of the concave particles is increased by chemical polishing, it is gradually reduced until the planar region disappears. After the planar region is removed, chemical polishing is continued, and at this time, the diameter dimension of the concave particles does not change, while the depth dimension gradually decreases. This reduces the surface roughness Ra and Rz, increases the glossiness of the glass, and reduces the haze value.

[0082] In one exemplary embodiment, during chemical etching, the glass substrate is etched with an etching solution.

[0083] In one exemplary embodiment, during chemical polishing, the glass substrate is polished with a polishing solution.

[0084] In one exemplary embodiment, the etching solution is a hydrofluoric acid solution, or a mixed solution of hydrofluoric acid, sulfuric acid, hydrochloric acid, and nitric acid.

[0085] In one exemplary embodiment, when the etching solution is a mixed solution of hydrofluoric acid, nitric acid, sulfuric acid, and hydrochloric acid, the concentration of hydrofluoric acid is 1% to 12% wt, the concentration of sulfuric acid is 0% to 12% wt, the concentration of hydrochloric acid is 0% to 12% wt, and the concentration of nitric acid is 0% to 12% wt. That is, the etching solution may be a mixture of hydrofluoric acid with any one of the three types of nitric acid, sulfuric acid, and hydrochloric acid, or it may be any combination of the above-mentioned hydrofluoric acid with nitric acid, sulfuric acid, and hydrochloric acid, or the etching solution may be pure hydrofluoric acid with a concentration of 1% to 12% wt.

[0086] In one exemplary embodiment, the temperature range of the etching solution during chemical etching is 16°C to 22°C.

[0087] In one exemplary embodiment, the polishing solution is a mixed solution of hydrofluoric acid and sulfuric acid.

[0088] In one exemplary embodiment, the concentration of hydrofluoric acid in the polishing solution is 3% to 12% wt, and the concentration of sulfuric acid is 3% to 12% wt.

[0089] In one exemplary embodiment, the temperature range of the polishing solution during polishing is 29°C to 35°C.

[0090] In an exemplary embodiment, as shown by a and bl in Figure 2, the method for manufacturing anti-glare glass according to the embodiment of this application further includes surface cleaning of the glass substrate before attaching the mask layer to the glass substrate, the purpose of which is to remove impurities from the surface of the glass substrate and to avoid situations in which the attachment of the mask layer is not robust and the etching depth is uneven.

[0091] In one exemplary embodiment, the method further includes applying a protective film layer before chemical etching.

[0092] In one exemplary embodiment, when chemical etching is performed on only one surface of the glass substrate, or when etching is performed on one surface in a reverse order, that is, when a mask layer is attached to only one surface of the glass substrate, an acid-resistant protective film is attached to the opposite surface of the glass substrate.

[0093] In one exemplary embodiment, for example, when it is necessary to etch only the front surface of a glass substrate, that is, when the anti-glare effect is required only on the front surface of the glass substrate, a protective film layer is needed to be attached to the back surface of the glass substrate so that the back surface of the glass substrate is not corroded by the etching solution.

[0094] In one exemplary embodiment, the protective film layer includes an acid corrosion-resistant protective film.

[0095] In one exemplary embodiment, in the method for manufacturing anti-glare glass according to the embodiment of this application, when etching only one surface of the glass substrate, it is not particularly required whether the mask layer or the protective film layer is attached first, and the two may be performed synchronously without regard to order.

[0096] In one exemplary embodiment, the process further selectively includes cleaning the glass substrate after the completion of chemical etching and chemical polishing, thereby avoiding corrosion of the glass substrate by residual etching and polishing solutions and preventing the destruction of the regular anti-glare pattern on the surface of the glass substrate.

[0097] In one exemplary embodiment, if a protective film layer is present, the protective film layer is further removed after the completion of chemical polishing.

[0098] In one exemplary embodiment, when both surfaces of a glass substrate need to be etched, this may be achieved by processing one surface first and then the other, or by performing the anti-glare process on both surfaces synchronously.

[0099] In one exemplary embodiment, the anti-glare glass obtained by the method for manufacturing anti-glare glass according to the embodiment of this application has a regular surface fine particle structure, which significantly reduces the sparkle value of the anti-glare glass, enabling high anti-glare performance, while also possessing the excellent characteristic of having small sparkles.

[0100] Second Example A second embodiment of the present invention is an anti-glare glass, which is manufactured by the method for manufacturing the anti-glare glass according to the above embodiment.

[0101] In one exemplary embodiment, to further demonstrate the superior performance of the anti-glare glass according to the embodiment of this application, Table 1 is a comparison table of the performance of the anti-glare glass according to the embodiment of this application and conventional anti-glare glass formed on the surface of a glass substrate by conventional chemical etching.

[0102] [Table 1]

[0103] In an exemplary embodiment, as shown in Table 1, Comparative Examples 1 and 2 are both anti-glare glass formed on the surface of a glass substrate by conventional chemical etching. The process for forming conventional anti-glare glass by chemical etching is typically as follows: First, a chemical etching solution is uniformly sprayed directly onto the glass surface, maintained for a certain period of time, then thoroughly cleaned, and finally chemically polished. Chemical polishing similarly involves uniformly spraying a polishing solution directly onto the glass surface after chemical etching and maintaining it for a certain period of time. Different compositions of the chemical etching solution and polishing solution, and different reaction times, are used to achieve the desired anti-glare effect. For example, in the anti-glare glass of Comparative Example 1 in Table 1, the process employed is as follows: First, a chemical etching solution is uniformly sprayed directly onto the glass surface, maintained for 3 minutes, then removed and thoroughly cleaned. The chemical etching solution contained ammonium fluoride, oxalic acid, ammonium sulfate, sodium sulfate, glycerol, and water. The concentrations were 16.8 wt% ammonium fluoride, 8 wt% oxalic acid, 9 wt% ammonium sulfate, 15.7 wt% sodium sulfate, 39.3 wt% glycerol, and 11.2 wt% water. Subsequently, the product was obtained by uniformly spraying the chemical polishing solution directly onto the surface of the glass after chemical etching. The anti-glare glass produced using Comparative Example 1 had low sparkle but low anti-glare ability.

[0104] The process used for the anti-glare glass in Comparative Example 2 in Table 1 is as follows: First, a chemical etching solution was uniformly sprayed directly onto the glass surface, maintained for 20 minutes, and then removed and thoroughly cleaned. The chemical etching solution contained ammonium fluoride, oxalic acid, ammonium sulfate, sodium sulfate, glycerol, and water, with concentrations of 9.8 wt% ammonium fluoride, 4.5 wt% oxalic acid, 6.5 wt% ammonium sulfate, 11 wt% sodium sulfate, 25.2 wt% glycerol, and 43 wt% water. Subsequently, a chemical polishing solution was uniformly sprayed directly onto the glass surface after chemical etching. The anti-glare glass produced using Comparative Example 2 showed improved anti-glare effect, and the sparkle was also very high.

[0105] As can be seen from Table 1, Comparative Example 1 had the problem of weak anti-glare performance when the sparkle was very small, and Comparative Example 2 had the problem of large sparkle even though the anti-glare performance was improved. It was not possible to satisfy the technical requirement of achieving both low sparkle and high anti-glare performance, as in the anti-glare glass according to the embodiment of this application.

[0106] In an exemplary embodiment, as shown in Table 1, the data in the first group are obtained by the method for manufacturing anti-glare glass according to the embodiment of this application in the following cases: The diameter of the holes on the mask layer was 3 μm, the center distance was 25 μm, and the arrangement of the holes was an equilateral triangle. After chemical etching, the center distance of adjacent concave particles was 25 μm, the average depth was 1.57 μm, and the maximum depth was 3 μm. After chemical polishing, the diameter of the concave particles was 25.06 μm, the average depth was 1.57 μm, and the maximum depth was 3 μm, and the roughness Ra reached 0.316 μm.

[0107] In an exemplary embodiment, as shown in Table 1, the data in the second group are obtained by the method for manufacturing anti-glare glass according to the embodiment of this application in the following cases: The diameter of the holes on the mask layer was 3 μm, the center distance was 25 μm, and the arrangement of the holes was square. After chemical etching, the center distance between two adjacent concave particles was 25 μm, the average depth was 1.52 μm, and the maximum depth was 3 μm. After chemical polishing, the diameter of the concave particles was 25.04 μm, the average depth was 1.52 μm, and the maximum depth was 3 μm, and the roughness Ra reached 0.311 μm.

[0108] In one exemplary embodiment, as shown in Table 1, the data in the third group are obtained by the method for manufacturing anti-glare glass according to the embodiment of this application in the following cases: The diameter of the holes on the mask layer was 3 μm, the center distance was 20 μm, and the arrangement of the holes was an equilateral triangle. After chemical etching, the center distance between two adjacent concave particles was 20 μm, the average depth was 1.211 μm, and the maximum depth was 2.32 μm. After chemical polishing, the diameter of the concave particles was 20.03 μm, the average depth was 1.211 μm, and the maximum depth was 2.32 μm, with a roughness Ra of 0.311 μm.

[0109] In one exemplary embodiment, as can be seen from Table 1, the data for groups 1 to 3 were all compared using 60-degree specular gloss, similar to Comparative Example 2. Comparative Example 2 had a mirroring efficiency of 39.50%, and in group 3, when the mirroring efficiency was close to that of Comparative Example 2 at 40.50%, the sparkle value for Comparative Example 2 was 4.09, while the sparkle value for group 3 was only 1.1. For groups 1 and 2, when the mirroring efficiency was 2.20% and 3.60%, their sparkle values ​​were still only 1.85 and 1.87. As can be seen from the above comparative data, the sparkle values ​​of the anti-glare glass processed by the process of the embodiment of this application were all significantly lower than those of anti-glare glass processed by conventional chemical processes, under the same detection conditions, whether the anti-glare effect was similar or higher.

[0110] In an exemplary embodiment, as shown in Table 1, the data in the fourth group are those obtained by the method for manufacturing anti-glare glass according to the embodiment of this application in the following cases: The diameter of the holes on the mask layer was 3 μm, the center distance was 25 μm, and the arrangement of the holes was an equilateral triangle. After chemical etching, the center distance between two adjacent concave particles was 25 μm, the average depth was 1.57 μm, and the maximum depth was 3 μm. After chemical polishing, the diameter of the concave particles was 25.06 μm, the average depth was 0.54 μm, and the maximum depth was 0.964 μm, with a roughness Ra of 0.143 μm.

[0111] In one exemplary embodiment, as can be seen from Table 1, the data for Group 4 still showed a sparkle value of 2.213, even though the mapping quality was 22.3%, which is far lower than the 39.50% mapping quality of Comparative Example 2, and far lower than the sparkle value of 4.09 for Comparative Example 2.

[0112] In one exemplary embodiment, as shown in Table 1, the data in Group 5 are data obtained by the method for manufacturing anti-glare glass according to the embodiment of this application in the following cases: The diameter of the holes on the mask layer was 1 μm, the center distance was 1.8 μm, and the arrangement was an equilateral triangle. After chemical etching, the center distance between two adjacent concave particles was 1.5 μm, the average depth was 0.158 μm, and the maximum depth was 0.337 μm. After chemical polishing, the particle diameter was 1.8 μm, the average particle depth was 0.158 μm, and the roughness Ra reached 0.143 μm.

[0113] In one exemplary embodiment, as can be seen from Table 1, Group 5 and Comparative Example 1 were similarly compared in terms of 60-degree specular gloss. When the reproducibility of the two was similar, the sparkle of Comparative Example 1 was 0.5, while the sparkle of Group 5 was only 0.114. Consequently, for equivalent 60-degree specular gloss and equivalent anti-glare performance, the sparkle of anti-glare glass processed by the process of the embodiment of this application was far lower than the sparkle value of anti-glare glass processed by conventional chemical processes.

[0114] The embodiments disclosed in this invention are as described above, but they are merely embodiments used to facilitate understanding of the invention and are not intended to limit it. Those skilled in the art can make any modifications and changes to the implementable forms and details without departing from the spirit and scope disclosed in this invention, but the scope of patent protection of this invention remains limited to the scope set forth in the appended claims.

Claims

1. A mask layer deposition step involves depositing a mask layer having a plurality of regularly arranged holes onto at least one surface of a glass substrate, A chemical etching step is performed to etch the surface of the glass substrate to which the mask layer is attached. After the completion of the chemical etching process, a mask layer removal step is performed to remove the mask layer and obtain a glass substrate on which independent concave particles are uniformly distributed on the surface. The process includes a chemical polishing step of performing chemical polishing on the surface of the glass substrate from which the mask layer has been removed, In the chemical polishing step, adjacent concave particles are polished until they overlap and share the same side. A method for manufacturing anti-glare glass, characterized by the following features.

2. The method for manufacturing anti-glare glass according to claim 1, further comprising the following steps: polishing the glass substrate until adjacent concave particles overlap and share the same side, and then continuing to polish the glass substrate until the Ra of the polished glass substrate decreases to 0.03 μm and / or the Rz decreases to 0.1 μm.

3. The method for manufacturing anti-glare glass according to claim 1, characterized in that the mask layer is an acid corrosion-resistant mask layer.

4. The multiple regularly arranged holes on the mask layer are The distance between the centers of adjacent holes is the same. The diameter of the hole is 1 μm to 100 μm. A method for manufacturing anti-glare glass according to claim 1, characterized by including the following: ｏ

5. A method for manufacturing anti-glare glass according to claim 4, characterized in that an equilateral triangle is formed by connecting the centers of any three adjacent holes.

6. A method for manufacturing anti-glare glass according to claim 1, characterized in that the distance between the centers of any two adjacent holes is 1.5 μm to 100 μm.

7. The method for manufacturing anti-glare glass according to claim 1, characterized in that the chemical etching step includes etching the glass substrate in the holes on the surface to which the mask layer is attached, and the depth of the etching is 0.1 μm to 50 μm.

8. The method for producing anti-glare glass according to claim 1, wherein the chemical etching step includes etching the glass substrate with an etching solution, and the etching solution is a hydrofluoric acid solution or a mixed solution of hydrofluoric acid, nitric acid, sulfuric acid, and hydrochloric acid.

9. The method for producing anti-glare glass according to claim 8, characterized in that, when the etching solution is a mixed solution of hydrofluoric acid, nitric acid, sulfuric acid, and hydrochloric acid, the concentration of the hydrofluoric acid is 1% to 12% wt, the concentration of the sulfuric acid is 0% to 12% wt, the concentration of the hydrochloric acid is 0% to 12% wt, and the concentration of the nitric acid is 0% to 12% wt.

10. The method for manufacturing anti-glare glass according to claim 8, characterized in that the temperature range of the etching solution is 16°C to 22°C.

11. The method for manufacturing anti-glare glass according to claim 1, characterized in that the time of the chemical etching step is 5 to 1800 seconds.

12. The method for producing anti-glare glass according to claim 1, wherein the chemical polishing step includes polishing the glass substrate with a polishing solution, and the polishing solution is a mixed solution of hydrofluoric acid and sulfuric acid.

13. A method for producing anti-glare glass according to claim 12, characterized in that the concentration of hydrofluoric acid in the polishing solution is 3% to 12% wt, and the concentration of sulfuric acid is 3% to 12% wt.

14. The method for manufacturing anti-glare glass according to claim 13, characterized in that the temperature range of the polishing liquid is 29°C to 35°C.

15. Before the aforementioned chemical etching process, The method for manufacturing anti-glare glass according to claim 1, further comprising a protective film layer attachment step of attaching an acid-resistant protective film to the opposite side of the glass substrate when the mask layer is attached to only one side of the glass substrate.

16. The method for manufacturing anti-glare glass according to claim 15, further comprising a step of removing the acid-resistant protective film after the completion of the chemical polishing step.

17. Anti-glare glass, characterized by being manufactured by the method for manufacturing anti-glare glass described in any one of claims 1 to 16.

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