Substrate processing apparatus, reactor moving device for moving the reactor of the apparatus, and method for maintaining the reactor of the apparatus

Abstract

To provide a substrate processing apparatus for processing a plurality of substrates.SOLUTION: The apparatus comprises a reactor installed in the apparatus and configured for processing substrates, and a reactor mover for moving the reactor for maintenance. The reactor mover is constructed and arranged with a lift to move the reactor to a lower height to allow a maintenance worker to access the reactor.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present disclosure generally relates to a substrate processing apparatus for processing a plurality of substrates. More specifically, the present disclosure relates to a substrate processing apparatus for processing a plurality of substrates, the substrate processing apparatus comprising a reactor attached to the apparatus and configured to process the substrates, and a reactor moving device for moving the reactor for maintenance.

Background Art

[0002] To supply a cassette containing a plurality of substrates to a substrate processing apparatus, a cassette handler can move the substrate cassette between a cassette inlet / outlet port, a substrate transfer position, and / or a storage device. The storage device may comprise a cassette storage carousel for storing a plurality of cassettes. A substrate handling robot may be configured and arranged to move substrates between a cassette at the substrate transfer position and a substrate rack in a lower region of the apparatus.

[0003] Optionally, the lower region may be provided with a rack conveyor that may include a carousel or a rotatable arm on which a rack may be positioned upward. By rotating the carousel or the rotatable arm, the rack may be brought from a detachment and / or loading position to a treatment position under the first reactor or the second reactor.

[0004] An elevator may be provided in the lower region to lift a rack having substrates into the reactor or to lower a rack having processed substrates from the reactor. During treatment in the reactor, the rack and the substrates contained therein may be heated. The substrate rack may be removed from the reactor using a lift, a carousel, or a rotatable arm and cooled after treatment.

[0005] The substrate processing apparatus may have many reactors that may require maintenance. For example, the reactor may include components such as insulating materials, heating elements, temperature sensors, tubes, liners, injectors, exhaust ports, flanges, racks, and / or pedestals that can be contaminated or broken, or pedestals that simply need to be changed during maintenance. These components are very heavy and may be attached to the apparatus at a fairly high height within the apparatus, so there may be cases where maintenance workers cannot easily access them for maintenance.

Summary of the Invention

Means for Solving the Problems

[0006] This "Summary of the Invention" is provided to introduce a selected plurality of concepts in a simplified form. These concepts will be described in more detail in the "Mode for Carrying Out the Invention" of the exemplary embodiments of the present disclosure below. This Summary of the Invention is not intended to identify the main features or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter.

[0007] Depending on the purpose, it may be desirable to provide an apparatus that is easy for maintenance workers to maintain.

[0008] Therefore, a reactor mounted within the apparatus and configured to process a substrate, and a reactor moving device for moving the reactor for maintenance, a substrate processing apparatus for processing a plurality of substrates can be provided. The reactor moving device can be configured and arranged to move the reactor to a lower height using a lift so that maintenance workers can access the reactor.

[0009] According to another embodiment, a reactor moving device for moving the reactor of the substrate processing apparatus for maintenance may be provided, and this reactor moving device Using a displacer, move the reactor to a maintenance area outside the apparatus, and A lift and a displacer are provided that are configured and arranged to lower the reactor into a maintenance area outside the housing using the lift.

[0010] According to another embodiment, Using a displacer, moving the reactor to a maintenance area outside the apparatus, Using a lift, lowering the reactor in a maintenance area outside the housing, and A method of maintaining a reactor of a substrate processing apparatus can be provided by performing maintenance on the reactor.

[0011] For the purpose of summarizing the advantages achieved over the prior art and the present invention, specific objects and advantages of the present invention are described above herein. It should of course be understood that not necessarily all of these objects or advantages are achieved by any particular embodiment of the present invention. Therefore, for example, as taught or suggested herein, one advantage or group of advantages may be achieved or optimized without necessarily achieving other objects or advantages as taught or suggested herein, and the present invention may be embodied or practiced. Those skilled in the art will recognize this.

[0012] All of these embodiments are intended to be within the scope of the present invention disclosed herein. These and other embodiments will become readily apparent to those skilled in the art from the following "Mode for Carrying Out the Invention" of specific embodiments with reference to the accompanying drawings, and the present invention is not limited to any particular embodiment disclosed.

[0013] This specification specifically points out and clearly claims in the claims the things regarded as embodiments of the present invention, while the advantages of the embodiments of the present disclosure can be more easily elucidated from the description of certain specific examples of the embodiments of the present disclosure when read in conjunction with the accompanying drawings.

Brief Description of the Drawings

[0014]

Figure 1

Figure 2A

Figure 2B

Figure 2C

Figure 2D

Figure 2E

Figure 3

Figure 4

Figure 5

Figure 6

DETAILED DESCRIPTION OF THE INVENTION

[0015] Specific embodiments and examples are disclosed below, but it will be understood by those skilled in the art that the invention extends beyond the specifically disclosed embodiments and / or uses of the invention, as well as their obvious modifications and equivalents. Accordingly, it is intended that the scope of the disclosed invention should not be limited by the specific disclosed embodiments described below. The examples presented herein are not meant to be the actual aspect of any particular material, structure, or device, but are merely idealized representations used to illustrate embodiments of the present disclosure.

[0016] As used herein, the terms "substrate" or "wafer" may refer to any underlying material that may be used, or upon which devices, circuits, or films may be formed. The term "semiconductor device structure" may refer to any portion of a processed semiconductor structure or a partially processed semiconductor structure that is, includes, or defines at least a portion of the active or passive components of a semiconductor device formed on or within a semiconductor substrate. For example, semiconductor device structures may include active and passive components of an integrated circuit, such as transistors, memory elements, transducers, capacitors, resistors, conductive lines, conductive vias, conductive contact pads, and the like.

[0017] FIG. 1 shows a schematic top view of an example of a substrate processing apparatus 1 according to an embodiment. The substrate processing apparatus 1 includes a housing 2 having a front wall 4 and a rear wall 6.

[0018] The substrate processing apparatus 1 may include a storage device, such as a cassette storage carousel 3, for storing a plurality of wafer cassettes C, each of which houses a plurality of substrates. The cassette storage carousel 3 may include a number of platform stages for supporting the cassettes. The platform stages may be connected to a central support rotatably mounted about a vertical axis 5. Each platform stage may be configured to accommodate several cassettes C. A drive assembly may be operably connected to the central support to rotate the central support together with several platform stages about the vertical axis 5.

[0019] The substrate processing apparatus 1 may have a cassette handler 7 having a cassette handler arm 9 configured to transport the cassette C between the cassette storage carousel 3, a cassette input / output port 11 adjacent to a front wall 4 of the housing 2 of the substrate processing apparatus 1, and / or a substrate transfer position 15. The cassette handler 7 may include a lifting mechanism for reaching cassettes at different heights. Each platform stage for storing a cassette may have a notched cutout sized and shaped such that the cassette handler arm 9 can pass vertically through it and such that the platform stage can support the cassette C thereon.

[0020] An inner wall 19 may be provided to separate the cassette handler 7 from the substrate handling robot 35. The wall may have a closable substrate access opening 33 adjacent to the substrate transfer position 15, which may also be configured and arranged to open the cassette. More detailed information regarding the closable substrate access opening 33 for opening the cassette can be obtained from U.S. Patent No. 6,481,945, which is incorporated herein by reference. A cassette turntable may be provided at the substrate transfer position 15 to rotate the cassette C and / or to push the cassette C against the closable substrate access opening 33.

[0021] The substrate processing apparatus may include a substrate handling robot 35 having a substrate handling arm 36 for transporting a substrate from a cassette C disposed at a substrate transport position 15 to a substrate rack through a closable substrate access opening 33 and vice versa. The substrate processing apparatus may include a substrate handling chamber 37 in which the substrate handling robot 35 is accommodated.

[0022] The housing 2 may have a first side wall and a second side wall 47 extending over the entire length of the substrate processing apparatus 1. The distance between the side walls 47 of the substrate processing apparatus that can define the width of the apparatus can be 190 - 250 cm, preferably 210 - 230 cm, and most preferably about 220 cm. Maintenance of the substrate processing apparatus 1 may be performed from the rear side 6 or the front side 4 of the substrate processing apparatus so that there is no need for a door on the side wall 47.

[0023] Due to the structure of the side wall 47 without a door, a plurality of substrate processing apparatuses 1 may be arranged side by side in a semiconductor manufacturing factory. The side walls of adjacent substrate processing apparatuses may thereby be arranged very close to each other or facing each other. Advantageously, a plurality of substrate processing apparatuses can form a wall at the front side 4 of the substrate processing apparatus 1 that is connected to a cassette transport device in a very clean environment of a so-called "clean room" having very strict requirements for particles. The rear side 6 of the substrate processing apparatus 1 may be connected to a maintenance passage that may have less strict particle requirements than the front side 4.

[0024] The substrate processing apparatus 1 may include a first reactor and a second reactor 45 for processing a plurality of substrates. By using two reactors, the productivity of the substrate processing apparatus 1 can be improved. For example, the reactor 45 may include components such as an insulating material, a heating element, a temperature sensor, a tube, a liner, an injector, an exhaust port, a flange, a rack, and / or a pedestal.

[0025] The substrate processing apparatus in the above figure may be substantially U-shaped. The first reactor and the second reactor 45 may be configured and arranged within the legs. The first reactor and the second reactor 45 may be provided at the lower part of the U-shaped legs.

[0026] The maintenance area 43 may be configured and arranged between the U-shaped legs. The distance between the two U-shaped legs can be between 60 - 120 cm, more preferably between 80 - 100 cm, and most preferably about 90 cm to ensure sufficient space for maintenance workers. The rear door 42 is provided between the U-shaped legs and can block the maintenance area 43 when not in use. The substantial U-shape may also include a V-shape.

[0027] FIG. 2A shows a schematic top view of the rear part of the substrate processing apparatus of FIG. 1 during maintenance with the rear door 42 open. The apparatus may be configured and arranged to enable maintenance of the reactors 45 from the maintenance area 43 by the maintenance worker M to both the first reactor and the second reactor. For example, for the maintenance of the heating element, heating sensor, and / or the interface 65 (outlet and / or inlet) of the process gas by the maintenance worker M. The two reactors 45 may be configured and arranged adjacent to the same maintenance area 43 to enable maintenance of both reactors 45 from the same maintenance area 43. The reactor door 41 may be opened to enable maintenance of the reactor 45.

[0028] Therefore, the maintenance worker M may not need to enter the housing 2 of the substrate processing apparatus 1 for the maintenance work of the reactor 45. Therefore, the risk of injury to the maintenance worker M and / or contamination of the lower region and / or the reactor 45 may be minimized. Maintenance from the outside of the housing may also improve the speed and / or accuracy of maintenance. By using the same maintenance area for both reactors 45, the total installation area of the apparatus may be reduced.

[0029] The reactor 45 may be provided within the treatment module 49, and the treatment module 49 may also comprise a lower region of the substrate processing apparatus 1 configured to convey a rack or boat having a substrate between the lower region and the reactor 45. The elevator may also be configured and arranged within the U-shaped legs. The gate valve 63 may be provided between the substrate handler 35 and the lower region of the treatment module 49 and may create a mini-environment in the lower region.

[0030] A rack conveyor 55 for conveying the rack may be provided in the lower region of the substrate processing apparatus. The rack conveyor 55 may comprise two receiving portions 57 for the rack. Alternatively, the rack conveyor may comprise three or four receiving portions for the rack. The rack conveyor 55 may be configured and arranged on the U-shaped legs and the bottom. The rack conveyor 55 may be configured and arranged to horizontally convey the rack between a plurality of rack positions within the lower region.

[0031] The receiving portion 57 may be a cooling receiving portion for cooling a rack having a freshly processed hot substrate. The cooling receiving portion may comprise a gas inlet and a gas outlet. The gas inlet and the gas outlet may be fluidly connected to a pump to create a gas flow through the mini-environment within the lower region.

[0032] Module 49 can be provided with an elevator configured to transport a rack having a substrate between a lower region of the substrate processing apparatus and the reactor 45. The elevator may include a rack support arm having a bearing surface configured to support the substrate rack. The rack conveyor 55 may have a support platform having a notch therein. The notch may be sized and shaped such that the bearing surface of the rack support arm can move vertically therethrough in a parallel manner and such that the platform can support the substrate rack. The rack conveyor 55 may be rotatable to move the rack horizontally from a position close to the substrate handling robot 35 to a position under the reactor 45.

[0033] The treatment module 49 may be provided with a reactor door 41 that can be opened in the direction of the maintenance area 43. Both treatment modules 49 can be provided with separate reactor doors 41 to enable maintenance of each reactor 55 from the same maintenance area 43 by the maintenance operator M. The reactor door 41 of the treatment module 49 can also enable maintenance of the lower region of the substrate processing apparatus from the same maintenance area 43 for the rack conveyor 55, the gas inlet, the gas outlet, the elevator of the gate valve 63, and / or the maintenance of the rack.

[0034] Alternatively, two reactor doors may be provided for each treatment module. The first reactor door can be provided to access the reactor 45, and the second reactor door can be provided to access the lower region of the substrate processing apparatus. For example, access to the lower region of the substrate processing apparatus may be required for the rack conveyor 55, the gas inlet, the gas outlet, the elevator of the gate valve 63, and / or the maintenance of the rack.

[0035] Therefore, the maintenance operator M does not need to enter the housing 2 of the substrate processing apparatus 1 for maintenance work inside the treatment module 49. This can minimize the risk of injury to the maintenance worker M and / or contamination inside the treatment module.

[0036] The gate valve 63 may be provided between the substrate handling chamber 37 and the treatment module 49. The gate valve 63 may be closed during maintenance of the substrate handling robot 35 so that the treatment module can continue to function while the substrate handling robot 35 is being maintained.

[0037] Since one of the reactors 45 is constructed as a separate unit, maintenance of one of the reactors 45 may not interfere with the other reactor 45. The gate valve 63 may be closed during maintenance of one of the reactors so that the other reactor and the substrate handling robot 35 can continue to function.

[0038] The reactor 45 may have a process gas interface 65 (outlet and / or inlet) that may be connected to a gas exhaust pipe or a process gas delivery system. The process gas interface 65 may be provided adjacent to the maintenance area 43 to provide easy access to them during maintenance.

[0039] The process gas delivery system may be (partially) provided within a gas cabinet 67 that is constructed and arranged to provide process gas to the first and / or second reactor 45. The gas cabinet may be provided near the upper part of the U-shaped legs. Providing the gas cabinet near the upper part of the U-shaped provides easy access for maintenance. Further, when there is a substrate handler or a cassette handler, this location provides flexibility if the gas cabinet needs to be adjusted or expanded because there is space behind the apparatus where there are no important components.

[0040] The gas exhaust pipe may be configured and arranged to remove process gas from at least one of the first reactor and the second reactor, and may also be provided near the upper part of the U-shaped leg portion. Providing the gas exhaust pipe on the U-shaped leg portion provides easy access for maintenance. The gas exhaust pipe may be provided with pumps and scrubbers that may require periodic maintenance. Further, since there is a space at the back of the apparatus without important components such as a substrate handling robot and / or a cassette handler, this location provides flexibility when it is necessary to adjust or extend the gas exhaust pipe.

[0041] FIG. 2B shows a schematic top view of the rear part of the substrate processing apparatus of FIG. 1 during maintenance with the rear door 42 open. Maintenance of the reactor may include replacement of large components, such as reactors, reactor tubes, substrate racks, heating elements, doors, pumps and / or valves.

[0042] A maintenance worker M standing on the maintenance area 43 outside the housing 2 may, for example, remove the reactor 45 from the apparatus. Such large components, including tools for safely moving them, may require a large maintenance area 43. Since the same maintenance area 43 may be used for both reactors 45, the installation area of the maintenance area 43 may be reduced. The opening at the rear side 6 of the apparatus facilitates the movement of larger components, such as the reactor 45, outside the apparatus.

[0043] FIG. 2C shows a schematic top view of a reactor moving device 69 for moving the reactor 45 (FIGS. 1 and 2A, 2B) for maintenance. The reactor moving device 69 may be attached at a first end 71 to the frame of the substrate processing apparatus 1 (FIG. 1) and at the other end to a suspension frame for the reactor 45, such as a C-shaped frame 92. The C-shaped frame 92 can be configured and arranged to at least partially surround the reactor 45.

[0044] The reactor moving device 69 can be configured and arranged to move the reactor 45 substantially horizontally to the maintenance area 43 (FIG. 2A) using the displacer 73. The maintenance area 43 may be outside the housing of the device, and the displacer 73 may move the reactor 45 thereto. The displacer 73 may include a swivel mechanism 94.

[0045] The swivel mechanism 94 can be configured and arranged to swivel the reactor about a substantially vertical axis. The swivel mechanism 94 may include a first hinge 76 and a swivel arm 77 that is swivellable about a first substantially vertical axis. The swivel mechanism 94 may include a second hinge 78, and the reactor may be supported by the swivel arm 77 by the second hinge 78 that is swivellable about a second substantially vertical axis. The swivel mechanism 94 may include a third hinge 79, and the reactor 45 may be supported by the swivel arm 77 by a third hinge that is swivellable about a third substantially vertical axis.

[0046] The structure having the three hinges 76, 78, 79 and their respective vertical axes can move the reactor relatively freely in the horizontal plane so that the reactor is positioned correctly on the flange 25. This movement may be performed manually or by motor drive.

[0047] FIG. 2D shows a side perspective view of the reactor moving device 69 for moving the reactor 45 (FIGS. 1 and 2A, 2B) for maintenance. The reactor moving device 69 can be configured and arranged to move the reactor up and down using a lift 80. The lift 80 can be used to lower the reactor to a lower height to enable access to the reactor by maintenance personnel.

[0048] The lift 80 may be provided as a linear guide mechanism having a linear guide 81 on the second hinge 78. The linear guide mechanism can guide the reactor in a substantially vertical direction on the substantially vertical linear guide 81. The C-shaped frame 92 may form part of a carriage movable along the linear guide 81 by a third hinge 79.

[0049] The carriage and thus the C-shaped frame 92 can be moved up and down by a threaded pin 82 of a rotatable nut 83. A motor or a crank handle 84 can rotate the rotatable nut 83 by a speed changer and move the C-shaped frame up and down on the linear guide 81. Thus, the lift 80 may be formed in a compact design within the swivel mechanism 94 for moving the reactor in a substantially vertical direction.

[0050] A part of the swivel arm 77 connects the first hinge 76 and the second hinge 78. The lift 80 may be configured and arranged to move the second hinge 78 relative to the first hinge 76.

[0051] The reactor moving device 69 may use the lift 80 to move the reactor upward within the housing of the device 1, or use the displacer 73 to move the reactor to the maintenance area 43 outside the housing of the device 1, or use the lift 80 to lower the reactor 45 within the maintenance area 43 outside the housing.

[0052] Alternatively, a linear guide mechanism forming part of the displacer may move the reactor in a substantially horizontal direction to the maintenance area on a substantially horizontal linear guide.

[0053] The substrate processing apparatus 1 may include two reactors 45, and a single reactor moving device 69 may be configured and arranged to move each reactor 45 to the maintenance area 43. The maintenance area 43 may be the same maintenance area 43 for both reactors 45. The maintenance area may be provided between the first reactor and the second reactor. The apparatus may include two reactor moving devices 69, each of which can be configured and arranged to move one of the first and second reactors 45 to the maintenance area 43.

[0054] FIG. 2E shows a side perspective view of the reactor moving device 69 for moving the reactor 45 (FIGS. 1 and 2A, 2B, and 2C) for maintenance. The reactor bottom support 87 may be part of the reactor 45 (not shown). The reactor bottom support 87 may support the remaining portion of the reactor 45 placed on top of it. The reactor bottom support 87 may include an air circulation duct 86.

[0055] The reactor moving device may include a suspension frame, and the reactor 45 may be suspended from the suspension frame by an elongated suspension 85. The reactor bottom support 87 may be suspended from the reactor moving device 69 by the elongated suspension 85 during lifting and moving of the reactor 45. More specifically, the bottom support 87 may be suspended from the reactor moving device 69 by a suspension frame, such as a C-shaped frame 92, and three elongated suspensions 85 which may be cables or rods. The elongated suspension 85 may include a cable tensioner 89, such as a turnbuckle, for adjusting the position of the reactor 45 within the reactor moving device during lifting.

[0056] The C-shaped frame 92 and the three elongated suspensions 85 create a space in which a substantial portion of the reactor 45 is suspended therebetween. The center of gravity of the reactor 45 may be between the suspensions 85. Thus, to achieve this, the C-shaped frame can surround the reactor 45 over a perimeter exceeding 180 degrees, for example, a perimeter of 200 degrees. The C-shaped frame 92 may further have an opening in the open side of the C-shaped frame 92 that allows a part of the reactor 45 to move into and be mounted on the bottom support 87. The elongated suspensions may coincide with the vertical direction. Only tensile stress may be applied to the suspensions 85.

[0057] When the lift 80 in FIG. 2D lowers the reactor onto the flange, the three suspensions 85 allow the reactor 45 to position itself on the flange 25. And the tension in the suspensions 85 can be released by lowering the lift a little further to lower the C-shaped frame 92. The suspensions 85 may be connected to the C-shaped frame 92 and the reactor bottom support 87 with flexibility.

[0058] FIGS. 3A and 3B show side views of the movement of the reactor 45 from the substrate processing apparatus during maintenance. In FIG. 3A, the reactor 45 can be moved a short distance 93 into the maintenance area 43 away from a position above the mini-environment 70 in the lower region so that it can be maintained. This may be done, for example, using a reactor moving device comprising a lift and a displacer. As shown, for example, utility cables 29 for electricity or cooling water may connect the reactor 45 to the rest of the apparatus and may have sufficient slack to allow this movement.

[0059] Using a lift, as shown in Figure 3B, the reactor 45 can be moved to a lower height to enable access to the reactor by maintenance worker M. Also, in order to disconnect the reactor from the support, the lift can be used to move the reactor to a higher position before moving the reactor from the device. The displacer may be provided with a linear guide mechanism or a swivel mechanism (not shown) for moving the reactor 45 horizontally to the maintenance area 43. The maintenance area 43 may be outside the housing of the processing device. The door in the housing may be opened so as to move the reactor 45 outside the housing.

[0060] As shown in Figure 3B, maintenance worker M can perform maintenance operations, for example, removing the insulation material, heating element 23, temperature sensor, tube 24, and flange 26 from the reactor 45. In order to assist the maintenance worker in maintaining the device, the lift can be used to lower the reactor 45 to a height convenient for maintenance.

[0061] Maintenance worker M can remove the rack 96 from the mini-environment 70 inside. For the removal of the rack 96, the reactor 45 does not need to be in a distant position, but it will be clear that it can still be in its processing position above the mini-environment 70. Another tool may be used for the removal of the tube 24. It will be clear that not only can the tube 24 be removed, but also the flange 25 and, if necessary, the heating element 23 can be removed.

[0062] Figures A - C show side views of the movement of the reactor from the substrate processing device during maintenance according to one embodiment. Figure 4 can show in more detail the maintenance operations that can be performed in relation to the system as described in Figures 1 - 2.

[0063] In Figure 4A, the reactor 45 is in the process position and is shown without the heating element 23 for simplicity. In this embodiment, the reactor 45 may include a tube 24a and a liner 24b. The tube 24a and the liner 24b may be supported on one or more flanges 25.

[0064] This configuration may be used for low-pressure applications, and the process gas flows upward and then downward within the inner tube 24a and toward the exhaust port in the space between the inner process tube 24b and the outer process tube 24a. The exhaust port 68 may be configured to communicate with a vacuum pump to exhaust the process gas.

[0065] The rack 26 supported on the pedestal 27, the door plate 28, and the lower plate 72 may be disposed within the mini-environment 70 surrounded by the housing 70a. An elevator (not shown) can lift the lower plate 72 including the door plate 28, the pedestal 27, and the rack 26 to the uppermost position, and as shown in FIG. 4B, the lower plate 72 seals against the top surface 74 of the mini-environment 70, and at the same time the door plate 28 seals against the flange 25. Further, the door plate 28 can be fixed to the flange 25 using locking means (not shown).

[0066] And, as shown in FIG. 4C, the reactor 45 can be lifted 97a in its entirety by a lift (not shown) as necessary after disconnecting the gas, vacuum, and other tubing and connections, if necessary. Finally, the reactor 45 can be horizontally moved 97b away from the position above the mini-environment 70 together with one or more of the flange 25, the tube 24a, and the liner 24b, the exhaust port 68, the rack 26, the pedestal 27, and the door plate 28 by a displacer (not shown), enabling maintenance work. The lift and the displacer may be part of a reactor moving device. During removal of the reactor, the mini-environment 70 can be sealed by the lower plate 72, while the tube 24 can be sealed by the door plate 28, thereby avoiding contamination during maintenance work.

[0067] By moving the reactor 45 together with the rack 26, the pedestal 27, and the door plate 28, it becomes possible to replace the rack 26 and the pedestal 27 at a location outside the apparatus. The latter can be advantageous when access to the mini-environment 70 may be restricted or when it is preferable for the mini-environment not to be opened to keep it clean.

[0068] Figures 5A and B are side views of the movement of the reactor from a substrate processing apparatus during maintenance, according to one embodiment. In Figure 5A, the reactor 45 is in the process position and is shown without the heating element 23 for simplicity. In this embodiment, the reactor 45 includes a tube 24a and a liner 24b. The tube 24a and the liner 24b may be supported on one or more flanges 25a, 25b.

[0069] As shown in Figure 5B, the reactor 45 can be lifted by a lift (not shown) together with a first flange 25a that can be attached to the tube 24a by an attachment mechanism (not shown). This attachment mechanism may be provided by a maintenance operator or there may be a permanent attachment for connecting the first flange to the tube. The second flange 25b can remain on the mini-environment 70.

[0070] By moving the reactor 45 with the first flange 25a, it becomes possible to replace the first flange 25a at a location outside the apparatus. Also, it may become possible to provide maintenance to components supported by the first flange 25a, such as the liner 24b and / or an injector (not shown). Since the second flange 25b can remain within the apparatus on the mini-environment, the exhaust port connected to the second flange 25b does not need to be disconnected for removal of the reactor 45.

[0071] Figures 6A, 6B, and 6C show side views of the movement of the reactor from a substrate processing apparatus during maintenance, according to one embodiment. In Figure 6A, the reactor 45 is in the process position and is shown again without the heating element 23 for simplicity. In this embodiment, the reactor 45 comprising the tube 24a and the liner 24b may also be supported on one or more flanges 25a, 25b.

[0072] As shown in Figure 6B, the reactor 45 can be lifted by a lift together with both flanges 25a and 25b. A clamping mechanism may be used to clamp one or more flanges to the reactor 45. More specifically, the second flange 25b may be clamped to the first flange 25a by a clamp 30 that functions as a clamping mechanism. The clamp 30 may be provided by a maintenance worker for the purpose of moving it from the second flange 25b. The clamp 30 may also be permanently installed in the apparatus so that it can be removed by a maintenance worker when the first flange 25a is moved separately from the second flange 25b as shown in Figure 5.

[0073] As shown in Figure 6C, by moving the reactor 45 with flanges 25a, 25b provided with a displacer (not shown), it becomes possible to perform maintenance on the second flange 25b outside the apparatus. For example, the second flange 25b and the exhaust port connected thereto may be cleaned or completely replaced. When the second flange 25b is moved outside, the exhaust port may need to be disconnected from the rest of the apparatus. The lift and the displacer may be part of a reactor moving device.

[0074] Although exemplary embodiments of the present invention have been described above with partial reference to the accompanying drawings, it should be understood that the present invention is not limited to these embodiments. Variations to the embodiments of the present disclosure can be understood and achieved by those skilled in the art of practicing the claimed invention from a consideration of the drawings, the disclosure, and the appended claims.

[0075] Throughout this specification, references to "one embodiment" or "an embodiment" mean that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment of the invention. Thus, the appearances of the phrases "in one embodiment" or "in an embodiment" in various places throughout this specification are not necessarily all referring to the same embodiment. Further, it is noted that the particular features, structures, or characteristics of one or more embodiments may be combined in any suitable manner to form new embodiments that are not explicitly described.

Explanation of Reference Numerals

[0076] 1 Substrate processing apparatus 2 Housing 3 Cassette storage carousel 4 Front wall 5 Vertical axis 6 Rear wall 7 Cassette handler 9 Cassette handler arm 11 Cassette loading / unloading port 15 Substrate transfer position 19 Inner wall 23 Heating element 24 Pipe 25 Flange 26 Rack 27 Pedestal 28 Door plate 29 Utility cable 30 Clamp 33 Substrate access opening 35 Substrate handling robot 36 Substrate handling arm 37 Substrate handling chamber 41 Reactor door 42 Rear door 43 Maintenance area 45 Reactor 47 Side wall 49 Treatment module 55 Rack conveyor 57 Storage part 63 Gate valve 65 Process gas interface 67 Gas cabinet 69 Reactor moving device 70 Mini environment 70a Housing 71 First end 72 Lower plate 73 Displacer 76 First hinge 77 Swivel arm 78 Second hinge 79 Third hinge 80 Lift 81 Linear guide 82 Threaded pin 83 Nut 85 Suspension 86 Air circulation duct 87 Reactor bottom support 89 Cable tensioner 92 C-shaped frame 93 Distance 94 Swivel mechanism 96 Rack C Wafer cassette M Maintenance worker

Claims

1. A substrate processing apparatus for processing a plurality of substrates, comprising: a reactor mounted within the apparatus and configured to process substrates; and a reactor moving device for moving the reactor for maintenance, the reactor moving device being configured and arranged to use a lift to move the reactor to a lower height so that maintenance personnel can access the reactor. The reactor moving device is configured and arranged to use a displacer to move the reactor substantially horizontally to a maintenance area. The displacer includes a swivel mechanism configured and arranged to swivel the reactor about a substantially vertical axis. The swivel mechanism includes a first hinge and a swivel arm that can be swiveled by the first hinge about the substantially vertical axis while supporting the reactor. The substrate processing apparatus.

2. The substrate processing apparatus according to claim 1, wherein the displacer is configured and arranged to move the reactor to a maintenance area outside the housing of the apparatus.

3. The reactor is mounted within the apparatus at a first height, and the lift is configured and arranged to move the reactor to a height lower than the first height to enable access to the reactor by the maintenance personnel. The substrate processing apparatus according to claim 1.

4. The swivel mechanism includes a second hinge, and the reactor is supported by the swivel arm by the second hinge that can be swiveled about a second substantially vertical axis. The substrate processing apparatus according to claim 1.

5. The swivel mechanism includes a third hinge, and the reactor is supported by the swivel arm by the third hinge that can be swiveled about a third substantially vertical axis. The substrate processing apparatus according to claim 4.

6. The reactor moving device includes a linear guide mechanism including a linear guide, a carriage, a motor, and / or a crank handle, and supports and moves the reactor on the linear guide. The substrate processing apparatus according to claim 1.

7. The linear guide mechanism forms part of the displacer and moves the reactor substantially horizontally on a substantially horizontal linear guide to a maintenance area. The substrate processing apparatus according to claim 6.

8. The linear guide mechanism forms part of a lift and moves the reactor substantially vertically on a substantially vertical linear guide, the substrate processing apparatus according to claim 6.

9. The reactor moving device is configured and arranged to include a displacer having a turning mechanism constructed and arranged to turn the reactor about a substantially vertical axis, and the lift is formed in the turning mechanism to move the reactor substantially vertically, the substrate processing apparatus according to claim 8.

10. The turning mechanism includes first and second hinges, a part of the turning arm connects the first and second hinges, and the lift is configured and arranged to move at least one of the first and second hinges relative to one of the first and second hinges, the substrate processing apparatus according to claim 9.

11. The apparatus uses a reactor moving device to lift the reactor within the housing of the apparatus using the lift, move the reactor to a maintenance area outside the housing of the apparatus using the displacer, and lower the reactor into the maintenance area outside the housing using the lift, the substrate processing apparatus according to claim 2.

12. The reactor is attached to a flange within the apparatus, the apparatus is configured and arranged to fix the flange to the reactor, and the reactor moving device is configured and arranged to move the reactor together with the flange for maintenance, the substrate processing apparatus according to claim 1.

13. The apparatus includes first and second reactors, and the reactor moving device is configured and arranged to move the reactor to a maintenance area provided between the first reactor and the second reactor, the substrate processing apparatus according to claim 1.

14. The apparatus includes a first reactor moving device configured and arranged to move the first reactor to a maintenance area and a second reactor moving device configured and arranged to move the second reactor to the same maintenance area, the substrate processing apparatus according to claim 13.

15. The reactor moving device includes a suspension frame, and the reactor is suspended from the suspension frame by an elongated suspension, the substrate processing apparatus according to claim 1.

16. The substrate processing apparatus according to claim 15, wherein at least one of the elongated suspensions is aligned with the vertical direction.

17. A reactor moving device for moving a reactor of a substrate processing apparatus for maintenance, wherein the reactor moving device uses a displacer to move the reactor to a maintenance area outside the apparatus, and is provided with the lift and the displacer configured and arranged to lower the reactor into the maintenance area outside the housing using a lift, the displacer being provided with a turning mechanism configured and arranged to turn the reactor around a substantially vertical axis, the turning mechanism comprising a first hinge and a turning arm that can be turned by the first hinge around the substantially vertical axis while supporting the reactor, the reactor moving device.

18. Moving a reactor to a maintenance area outside a substrate processing apparatus using a displacer, lowering the reactor into the maintenance area outside the housing using a lift, and performing maintenance on the reactor, a method for maintaining a reactor of a substrate processing apparatus, the displacer being provided with a turning mechanism configured and arranged to turn the reactor around a substantially vertical axis, the turning mechanism comprising a first hinge and a turning arm that can be turned by the first hinge around the substantially vertical axis while supporting the reactor, the method.

Images