Single crystal furnace thermal field

By setting grooves in the insulation cylinder of the single crystal furnace and placing the heater part therein, transverse heat radiation is achieved, the problems of heat loss and increased oxygen content are solved, and the growth quality of the silicon rod is improved.

WO2025036216A1PCT designated stage expired Publication Date: 2025-02-20LONGI GREEN ENERGY TECH CO LTD

Patent Information

Application Number
PCT/CN2024/110302
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Priority Date
2023-08-15
Filing Date
2024-08-07
Publication Date
2025-02-20

AI Technical Summary

Technical Problem

There are problems of heat loss and oxygen content during heating in existing single crystal furnaces, which affect the quality of silicon crystals.

Method used

A single crystal furnace thermal field is designed, by providing grooves in the insulation cylinder and at least part of the first heater is arranged in the grooves, transverse heat radiation is achieved, longitudinal heat loss is reduced, and heat is reduced by the bottom design. Loss through the electrode hole.

Benefits of technology

It effectively reduces heat loss, reduces the oxygen content in the silicon crystal, and improves the growth quality of the silicon rod.

✦ Generated by Eureka AI based on patent content.

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Abstract

A single crystal furnace thermal field, comprising a thermal insulation cylinder, a first heater, and a crucible for containing silicon materials, wherein the thermal insulation cylinder is arranged around the crucible; a groove is provided in the inner wall of the thermal insulation cylinder opposite the crucible, with an opening of the groove facing the crucible; and at least part of the first heater is arranged in the groove. A groove wall of the groove can block the longitudinal thermal radiation of the first heater, thereby preventing heat transfer from the first heater to the bottom, such that heat loss is reduced.
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Description

A single crystal furnace thermal field

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to the Chinese patent application filed with the China Patent Office on August 15, 2023, with application number 202322196481.5 and application name “A Single Crystal Furnace Thermal Field”, the entire contents of which are incorporated herein by reference. Technical Field

[0003] The present application relates to the field of crystal pulling technology, and in particular to a thermal field of a single crystal furnace. Background Art

[0004] Existing main heaters generate both horizontal and vertical heat. The main heater's heating zone is located between the insulation tube and the crucible side. Some of the heat generated by the main heater's heating zone is transferred horizontally to the crucible side, while some is transferred vertically to the furnace bottom and through the electrode holes at the bottom, resulting in heat loss. Furthermore, the heat transferred vertically from the heater can heat the crucible side and the bottom of the quartz crucible, causing oxygen in the crucible to enter the silicon melt, increasing the oxygen content in the silicon crystal.

[0005] Application Contents

[0006] In view of the above problems, the present application is proposed to provide a single crystal furnace thermal field that overcomes the above problems or at least partially solves the above problems.

[0007] In order to solve the above problems, the present application discloses a single crystal furnace thermal field, comprising: a heat preservation tube, a first heater and a crucible for containing silicon material; wherein,

[0008] The heat preservation cylinder is arranged around the crucible;

[0009] A groove is provided on the inner wall of the heat preservation cylinder opposite to the crucible, and the notch of the groove faces the crucible;

[0010] At least a portion of the first heater is disposed in the groove.

[0011] In the present application, the insulation tube is arranged around the crucible, and a groove is provided on the inner wall of the insulation tube opposite to the crucible, the notch of the groove faces the crucible, and the first heater is arranged in the groove, so that the first heater can radiate heat to the crucible horizontally to melt the silicon material in the crucible for crystal pulling. Since the notch of the groove faces the crucible, and at least part of the first heater is arranged in the groove, the groove wall of the groove can block the longitudinal heat radiation of the first heater, prevent the first heater from transferring heat to the bottom, and reduce heat loss. In addition, the foot plate or electrode of the present application is located inside the lower insulation tube, which can reduce the loss of heat through the electrode hole at the bottom.

[0012] The above description is only an overview of the technical solution of the present application. In order to more clearly understand the technical means of the present application, it can be implemented in accordance with the contents of the specification. In order to make the above and other purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are listed below. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, a brief introduction will be given below to the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0014] FIG1 is a schematic cross-sectional view of a single crystal furnace thermal field according to the present invention;

[0015] FIG2 is a schematic structural diagram of a chassis of the present application.

[0016] Description of reference numerals:

[0017] 1-insulation tube, 11-upper insulation tube, 12-middle insulation tube, 121-accommodating groove, 13-lower insulation tube, 131-through hole, 14-groove, 2-first heater, 21-first heating body, 22-first foot plate, 23-first heating electrode, 3-crucible, 4-crucible side, 5-chassis, 51-connecting part, 511-first electrode hole, 52-sealing part, 521-second electrode hole, 522-exhaust hole, 523-first avoidance hole, 6-second heater, 61-second avoidance hole, 7-accommodating cavity. Specific embodiments

[0018] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the present application is further described in detail below with reference to the accompanying drawings and specific implementation methods.

[0019] The terms "first" and "second" in the specification and claims of this application may explicitly or implicitly refer to one or more of the features. Throughout the description of this application, unless otherwise specified, "plurality" means two or more. Furthermore, "and / or" in the specification and claims refers to at least one of the connected entities, and the character " / " generally indicates an "or" relationship between the connected entities.

[0020] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "top", "bottom", "inside", "outside", "axial", "radial", "circumferential", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on this application.

[0021] In the description of this application, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; mechanical connections or electrical connections; direct connections or indirect connections through an intermediate medium; and internal connections between two components. Those skilled in the art will understand the specific meanings of the above terms in this application based on the specific circumstances.

[0022] One of the core concepts of the embodiments of the present application is to disclose a single crystal furnace thermal field, as shown in Figure 1, the single crystal furnace thermal field may specifically include: an insulation tube 1, a first heater 2 and a crucible 3 for accommodating silicon material; wherein, the insulation tube 1 is arranged around the crucible 3; a groove 14 is provided on the inner wall of the insulation tube 1 opposite to the crucible 3, and the notch of the groove 14 faces the crucible 3; at least a portion of the first heater 2 is arranged in the groove 14.

[0023] In the embodiment of the present application, the insulating cylinder 1 is disposed around the crucible 3, and a groove 14 is provided on the inner wall of the insulating cylinder 1 opposite the crucible 3. The opening of the groove 14 faces the crucible 3. The first heater 2 is disposed within the groove 14, so that the first heater 2 can radiate heat laterally to the crucible 3 to melt the silicon material in the crucible 3 for crystal pulling. Because the opening of the groove 14 faces the crucible 3, and because at least a portion of the first heater 2 is disposed within the groove 14, the groove wall of the groove 14 can block the longitudinal heat radiation of the first heater 2, preventing the first heater 2 from transferring heat to the bottom and reducing heat loss.

[0024] The single crystal furnace heat field in the embodiment of the present application can be placed within the single crystal furnace to provide a thermal environment for the crystal pulling process, thereby ensuring the optimal growth of silicon ingots. The single crystal furnace heat field specifically includes a heat preservation tube 1, a first heater 2, and a crucible 3. Crucible 3 can be used to hold silicon material for crystal pulling. First heater 2 heats crucible 3 to melt the silicon material in crucible 3 and thereby pull the ingot.

[0025] Specifically, the single crystal furnace thermal field may further include a crucible side 4 and a drag rod. The crucible side 4 may be wrapped around the outer wall of the crucible 3 to protect the crucible 3 ; the drag rod may be provided at the bottom of the crucible side 4 to support the crucible side 4 and the crucible 3 .

[0026] Specifically, the crucible 3 and the first heater 2 can both be disposed in the heat-insulating tube 1 . The heat-insulating tube 1 can function as a heat insulator, thereby reducing heat loss and improving the heating efficiency of the first heater 2 .

[0027] Specifically, a groove 14 may be provided on the inner wall of the heat-insulating tube 1 facing the crucible 3, with the opening of the groove 14 facing the crucible 3. Thus, the first heater 2 is placed in the groove 14, and the sidewalls of the groove 14 can block the longitudinal heat radiation of the first heater 2, allowing the first heater 2 to radiate heat laterally to the crucible 3. The longitudinal direction is the axial direction of the heat-insulating tube 1, and the transverse direction is the radial direction of the heat-insulating tube 1.

[0028] Specifically, the groove 14 can be dug along the circumference of the insulation tube 1 to accommodate the first heater 2, and the shape of the groove 14 can be adaptively adjusted according to the first heater 2. In addition, the groove 14 can also be a space formed by splicing the insulation tubes 1.

[0029] Specifically, the first heater 2 can be at least partially embedded in the groove 14, so that the depth of the groove 14 along the radial direction of the insulation tube 1 can be less than the thickness of the first heater 2 along the radial direction of the insulation tube 1; or, the first heater 2 can be completely embedded in the groove 14, so that the depth of the groove 14 along the radial direction of the insulation tube 1 can be greater than or equal to the thickness of the first heater 2 along the radial direction of the insulation tube 1.

[0030] In some optional embodiments of the present application, a through hole 131 is provided on the body of the heat preservation cylinder 1, which is conductive along its axis; the first heater 2 includes a first heating body 21, a first heating electrode 23 and a first foot plate 22, and at least a portion of the first heater is disposed in the through hole. Specifically, one or more of a portion of the first heating body 21, a portion of the first heating electrode 23 or a portion of the first foot plate 22 may be placed in the through hole; or one or more of the entire first heating electrode 23 or the entire first foot plate 22 may be placed in the through hole. By disposing at least a portion of the first heater in the through hole, since the through hole 131 is provided on the body of the heat preservation cylinder 1, the heat radiation transferred from the first foot plate 22 and / or the first heating electrode 23 to the bottom of the crucible 3 can be reduced, the longitudinal temperature gradient of the molten silicon can be increased, the oxygen content can be reduced and transported to the crystal rod, and a low-oxygen single crystal can be obtained.

[0031] In some optional embodiments of the present application, the first heater 2 includes a first heating body 21, a first heating electrode 23 and a first foot plate 22; a through hole 131 is provided on the body of the insulation cylinder 1 and is conductive along its axis; the first heating body 21 is arranged around the crucible 3 for heating the crucible 3; the first heating body 21 is arranged in the groove 14, and the first foot plate 22 and / or the first heating electrode 23 are arranged in the through hole 131; one end of the first foot plate 22 is connected to the first heating body 21, and the other end is connected to the first heating electrode 23.

[0032] In an embodiment of the present application, the first foot plate 22 and / or the first heating electrode 23 are arranged in the through hole 131. Since the through hole 131 is arranged on the cylinder body of the insulation cylinder 1, the first foot plate 22 and / or the first heating electrode 23 can reduce the heat radiation transferred to the bottom of the crucible 3, increase the longitudinal temperature gradient of the molten silicon, reduce the oxygen content transported to the crystal rod, and obtain a low-oxygen single crystal.

[0033] Specifically, the cross-sectional shape of the through hole 131 along the radial direction of the heat-insulating cylinder 1 may include at least one of a polygon, a circle, and an ellipse.

[0034] Specifically, the first heating electrode 23 may be a graphite electrode.

[0035] Specifically, the first heating body 21 can be an annular structure and can be disposed around the crucible 3 to radiate heat to the circumference of the crucible 3, thereby improving the heating uniformity of the crucible 3. In this embodiment, the first heating body can be an integrally formed structure or a spliced ​​split structure; the first heating body can be provided with grooves along the axial direction to form a serpentine structure.

[0036] Optionally, part of the first foot plate 22 and part of the first heating electrode 23 are located in the through hole 131 ; or, the first foot plate 22 passes through the through hole 131 , and the first heating electrode 23 is located at the bottom of the thermal insulation cylinder 1 .

[0037] In the embodiment of the present application, both the first foot plate 22 and the first heating electrode 23 can be located in the through hole 131, or only the first foot plate 22 can be located in the through hole 131, and the first heating electrode 23 can be located at the bottom of the thermal insulation cylinder 1. This can effectively ensure the connection between the first foot plate 22 and the first heating electrode 23 and increase the structural diversity of the first foot plate 22 and the first heating electrode 23.

[0038] Optionally, the first heating electrode 23 is an electrode column; the electrode column passes through the through hole 131 .

[0039] In the embodiment of the present application, the first heating electrode 23 is designed as an electrode column, and the first heating electrode 23 passes through the through hole 131. In this way, it is convenient to extend one end of the first heating electrode 23 through the through hole 131 to be electrically connected to the first foot plate 22, and the other end extends through the through hole 131 to be electrically connected to the copper electrode at the bottom of the insulation tube 1.

[0040] Optionally, the first heating body 21 and the first foot plate 22 may be a spliced ​​split structure; or, the first heating body 21 and the first foot plate 22 may be an integrated structure, which may increase the structural diversity of the first heater 2 .

[0041] Optionally, the heat preservation cylinder 1 is an integrally formed cylindrical structure made of solid felt, which can eliminate the carbon-carbon cylinder or soft felt and reduce costs; moreover, the cylindrical structure is convenient for being arranged around the crucible 3.

[0042] Optionally, the insulation tube 1 includes an upper insulation tube 11, a middle insulation tube 12 and a lower insulation tube 13 arranged in sequence along its axial direction; the inner diameter of the middle insulation tube 12 is larger than the inner diameter of the upper insulation tube 11 and the inner diameter of the lower insulation tube 13, and the middle insulation tube 12, the upper insulation tube 11 and the lower insulation tube 13 are combined to form a groove 14; the through hole 131 can be arranged on the cylinder body of the lower insulation tube 13 and pass through the lower insulation tube 13.

[0043] In the embodiment of the present application, the inner diameter of the middle insulation tube 12 is larger than the inner diameter of the upper insulation tube 11 and the inner diameter of the lower insulation tube 13, so that the middle insulation tube 12 can be retracted into the upper insulation tube 11 and the lower insulation tube 13, respectively, to facilitate the formation of a groove 14 on the inner wall of the insulation tube 1 for placing the first heater 2.

[0044] Specifically, in the embodiment of the present application, the groove 14 may include a first notch, and the first notch may face the interior of the heat preservation cylinder 1 .

[0045] Specifically, the inner diameter of the lower heat-insulating tube 13 is smaller than the inner diameter of the middle heat-insulating tube 12 , so that the end of the lower heat-insulating tube 13 can block the longitudinal heat radiation of the first heater 2 .

[0046] Specifically, one end of the middle insulation tube 12 can be fixedly connected to the upper insulation tube 11, and the other end can be fixedly connected to the lower insulation tube 13, or a connecting tube can be provided between the middle insulation tube 12 and the upper insulation tube 11, and a connecting tube can be provided between the middle insulation tube 12 and the lower insulation tube 13. The specific setting is based on actual needs, and the embodiment of the present application does not make specific limitations on this.

[0047] Optionally, the upper insulation tube 11, the middle insulation tube 12 and the lower insulation tube 13 can be independently arranged and fixed into a split structure by splicing. The upper insulation tube 11, the middle insulation tube 12 and the lower insulation tube 13 can be prepared separately and then assembled to obtain the insulation tube 1, wherein the upper insulation tube 11, the middle insulation tube 12 and the lower insulation tube 13 can be an integrally formed structure, or can be a spliced ​​split structure; or, the upper insulation tube 11, the middle insulation tube 12 and the lower insulation tube 13 are integrally formed into the insulation tube 1 to further improve the structural stability of the insulation tube 1. The specific setting can be made according to actual needs, and the embodiment of the present application does not make specific limitations on this.

[0048] Optionally, the insulation tube 1 includes a middle insulation tube 12 and a lower insulation tube 13 arranged in sequence along its axial direction; the inner diameter of the middle insulation tube 12 is larger than the inner diameter of the lower insulation tube 13, and the middle insulation tube 12 and the lower insulation tube 13 are enclosed to form a step, which is a groove 14; the through hole 131 can be arranged on the cylinder body of the lower insulation tube 13 and pass through the lower insulation tube 13.

[0049] In the embodiment of the present application, the middle insulation tube 12 and the lower insulation tube 13 enclose a step, which in turn forms a groove 14, facilitating the formation of the groove 14 on the inner wall of the insulation tube 1. The inner diameter of the middle insulation tube 12 is larger than the inner diameter of the lower insulation tube 13, so that the end of the lower insulation tube 13 can block the longitudinal heat radiation of the first heater 2.

[0050] Specifically, in the embodiment of the present application, the groove 14 may include a second notch and a third notch, the second notch may face the top of the thermal insulation tube 1 , and the third notch may face the interior of the thermal insulation tube 1 .

[0051] Specifically, the middle insulation tube 12 can be fixedly connected to the lower insulation tube 13, or a connecting tube body can be provided between the middle insulation tube 12 and the lower insulation tube 13. The specific setting is based on actual needs, and the embodiment of the present application does not make specific limitations on this.

[0052] Optionally, the middle insulation tube 12 and the lower insulation tube 13 can be independently arranged and fixed by splicing to form a split structure. The middle insulation tube 12 and the lower insulation tube 13 can be prepared separately, and then the insulation tube 1 is obtained by assembly, wherein the middle insulation tube 12 and the lower insulation tube 13 can be an integrally formed structure, or a spliced ​​split structure; or, the middle insulation tube 12 and the lower insulation tube 13 can also be an integrally formed structure to further improve the structural stability of the insulation tube 1. The specific setting can be made according to actual needs, and the embodiment of the present application does not make specific limitations on this.

[0053] Optionally, the inner diameter of the first heating body 21 is larger than the inner diameter of the lower heat-insulating cylinder 13 .

[0054] In the embodiment of the present application, the inner diameter of the first heating body 21 is larger than the inner diameter of the lower insulation tube 13, so that the first heater 2 can be completely embedded in the groove 14, so that the lower insulation tube 13 can block more heat radiation to further reduce heat loss.

[0055] Optionally, the first foot plate 22 may be located at the joint of the middle heat-insulating tube 12 and the lower heat-insulating tube 13 ; the first heating electrode 23 may pass through the through hole 131 and be connected to the first foot plate 22 .

[0056] In the embodiment of the present application, since the through hole 131 is provided in the lower insulation tube 13 , the first foot plate 22 is located at the joint of the middle insulation tube 12 and the lower insulation tube 13 , so that the first heating electrode 23 can pass through the through hole 131 and be electrically connected to the first foot plate 22 .

[0057] Optionally, the first foot plate 22 extends in a direction away from the outer wall of the first heating body 21; a receiving groove 121 is also provided on the barrel body of the insulation barrel 1, the notch of the receiving groove 121 is opposite to the through hole 131, and the receiving groove 121 is connected to the groove 14; the first foot plate 22 is arranged in the receiving groove 121.

[0058] In the embodiment of the present application, the notch of the receiving groove 121 is opposite to the through hole 131, and the receiving groove 121 is connected to the groove 14, which facilitates the placement of the first heater 2 and ensures that one end of the first foot plate 22 is connected to the first heating body 21 and the other end is connected to the first heating electrode 23. Moreover, the first foot plate 22 is arranged in the receiving groove 121, which can reduce the heat transferred from the first foot plate 22 to the crucible 3, increase the longitudinal temperature gradient of the molten silicon, reduce the oxygen content and transport it to the crystal ingot, and obtain a low-oxygen single crystal.

[0059] Specifically, the receiving groove 121 can be connected to the through hole 131 and the groove 14 respectively, so that the first foot plate 22 can be hidden on the cylinder body of the insulation cylinder 1, and the cylinder body of the insulation cylinder 1 can isolate the heat radiated from the first foot plate 22 to the crucible 3.

[0060] In some other optional embodiments of the present application, the single crystal furnace thermal field further includes a second heater 6 ; the second heater 6 is arranged in the insulation tube 1 , the second heater 6 is arranged below the crucible 3 , and the second heater 6 is opposite to the bottom of the crucible 3 .

[0061] In the embodiment of the present application, the second heater 6 is disposed below the crucible 3 and opposite to the bottom of the crucible 3, so that the second heater 6 can heat the bottom of the crucible 3 to melt the silicon material in the crucible 3. Since the second heater 6 is disposed below the crucible 3, the radial space occupied by the second heater 6 in the insulation cylinder 1 can be reduced, thereby rationally utilizing the space in the insulation cylinder 1.

[0062] Specifically, the first heater 2 may be a main heater and may surround the upper end of the crucible 3 , and the second heater 6 may be a secondary heater and may be disposed below the crucible 3 .

[0063] Specifically, the second heater 6 may include a second heating body, a second foot plate and a second heating electrode; the second heating electrode may be a graphite electrode, and both ends of the second foot plate are respectively connected to the second heating body and the second heating electrode.

[0064] Optionally, the second heater 6 may be a flat plate heater, which can improve the convenience of the second heater 6 heating the bottom of the crucible 3 and reduce the space occupied by the second heater 6 .

[0065] Specifically, a second avoidance hole 61 can be provided in the middle of the second heater 6 to avoid the tow bar. The second heater 6 is a flat plate heater, which can be a hollow structure with a groove or not. The specific structure is not limited in this embodiment.

[0066] Optionally, the single crystal furnace thermal field also includes a chassis 5; the chassis 5 is arranged at the bottom of the insulation tube 1, and is enclosed with the insulation tube 1 to form a accommodating cavity 7 for accommodating the crucible 3; a first electrode hole 511 for passing the first heating electrode 23 is provided at a position opposite to the through hole 131 on the chassis 5.

[0067] In the embodiment of the present application, the chassis 5 is connected to the bottom of the insulation cylinder 1, so that it and the insulation cylinder 1 can enclose a receiving cavity 7 for accommodating the crucible 3. Moreover, the heat radiation from the first heater 2 can be concentrated within the receiving cavity 7, thereby improving the heating efficiency of the crucible 3. A first electrode hole 511 is provided in the chassis 5 to facilitate the electrical connection of the first heating electrode 23 through the first electrode hole 511 to the copper electrode at the bottom of the single crystal furnace.

[0068] Specifically, the first electrode hole 511 is opposite to the through hole 131. Since the through hole 131 is arranged in the barrel of the thermal insulation barrel 1, the first electrode hole 511 can be prevented from being connected to the accommodating cavity 7, and heat can be prevented from being dissipated from the first electrode hole 511, further reducing heat loss.

[0069] Specifically, as shown in Figure 2, the chassis 5 may include a connecting portion 51 and a sealing portion 52; the sealing portion 52 may be arranged around the connecting portion 51; the connecting portion 51 is abutted and fixed to the cylinder body of the thermal insulation cylinder 1, and the sealing portion 52 is used to enclose and form the accommodating cavity 7; the first electrode hole 511 may be arranged in the connecting portion 51.

[0070] Specifically, the connecting portion 51 and the blocking portion 52 can be integrally formed or spliced ​​together, etc., and can be specifically configured according to actual needs, and the embodiments of the present application do not specifically limit this.

[0071] Specifically, the numbers of the first electrode holes 511 , the through holes 131 and the first heating electrodes 23 are arranged in a one-to-one correspondence.

[0072] Specifically, the chassis 5 can be a solid felt plate to play a role in heat insulation. The chassis 5 can also be provided with a first avoidance hole 523 for avoiding the tow bar.

[0073] Specifically, the shape of the first electrode hole 511 may include: at least one of a polygonal hole, a circular hole and an elliptical hole. The shape of the first electrode hole 511 can be set with reference to the shape of the through hole 131, and can be set according to actual needs. The embodiment of the present application does not make any specific restrictions on this.

[0074] Optionally, an exhaust hole 522 is provided on the chassis 5 ; the exhaust hole 522 is communicated with the accommodating cavity 7 .

[0075] In the embodiment of the present application, exhaust holes 522 are provided on the chassis 5 to timely discharge volatile substances generated during the crystal ingot pulling process, thereby improving the quality of the crystal ingot.

[0076] Specifically, the exhaust holes 522 can be spaced apart from the first electrode holes 511 , and the number of the exhaust holes 522 can be set according to actual needs, which is not specifically limited in the embodiment of the present application.

[0077] Specifically, the chassis 5 may also be provided with a second electrode hole 521 for receiving a second heating electrode. The second electrode holes 521 may be provided in a one-to-one correspondence with the second heating electrodes, and the number of second electrode holes 521 may include at least one of polygonal holes, circular holes, and elliptical holes. Specifically, the second electrode holes 521 may be provided in the connecting portion 51 or the sealing portion 52. When the second electrode holes 521 are provided in the connecting portion 51, the second foot plate and the second heating electrode are at least partially located within the thermal insulation tube 1, preventing heat loss through the first electrode holes 511.

[0078] Specifically, the second electrode hole 521 can be spaced apart from the exhaust hole 522. The thermal field of the single crystal furnace described in the embodiment of the present application has at least the following advantages:

[0079] In an embodiment of the present application, the insulating cylinder is disposed around the crucible, and a groove is provided on the inner wall of the insulating cylinder opposite the crucible, with the opening of the groove facing the crucible. The first heater is disposed within the groove, facilitating the first heater to radiate heat laterally to the crucible, thereby melting the silicon material within the crucible for crystal pulling. Because the opening of the groove faces the crucible, and at least a portion of the first heater is disposed within the groove, the groove wall can block longitudinal heat radiation from the first heater, preventing heat transfer from the first heater to the bottom and reducing heat loss.

[0080] Although preferred embodiments of the present invention have been described, those skilled in the art may make additional changes and modifications to these embodiments once they become aware of the basic inventive concepts. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments and all changes and modifications that fall within the scope of the embodiments of the present invention.

[0081] Finally, it should be noted that, in this document, relational terms such as first and second, etc., are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "comprises," "comprising," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or terminal device that includes a series of elements includes not only those elements, but also other elements not explicitly listed, or elements inherent to such process, method, article, or terminal device. In the absence of further limitations, an element defined by the phrase "comprising a ..." does not exclude the presence of additional identical elements in the process, method, article, or terminal device that includes the element.

[0082] The above is a detailed introduction to the single crystal furnace thermal field provided by the present application. Specific examples are used in this article to illustrate the principles and implementation methods of the present application. The description of the above embodiments is only used to help understand the method of the present application and its core idea; at the same time, for general technical personnel in this field, based on the ideas of the present application, there will be changes in the specific implementation methods and application scope. In summary, the content of this specification should not be understood as a limitation on the present application.

Claims

1. A single crystal furnace thermal field, characterized in that: include: A heat preservation cylinder, a first heater and a crucible for containing silicon material; wherein, The heat preservation tube is arranged around the crucible; A groove is provided on the inner wall of the heat preservation cylinder opposite to the crucible, and the notch of the groove faces the crucible; At least a portion of the first heater is disposed in the groove.

2. The single crystal furnace thermal field according to claim 1, characterized in that: The body of the heat-insulating cylinder is provided with a through hole which is conductive along its axis, and at least a part of the first heater is arranged in the through hole.

3. The single crystal furnace thermal field according to claim 1, characterized in that: The first heater includes a first heating body, a first heating electrode and a first foot plate; The heat-insulating cylinder is provided with a through hole that is conductive along its axis; The first heating body is disposed around the crucible and is used to heat the crucible; The first heat generating body is disposed in the groove; The first foot plate and / or the first heating electrode are arranged in the through hole; One end of the first foot plate is connected to the first heating body, and the other end is connected to the first heating electrode.

4. The single crystal furnace thermal field according to claim 3, characterized in that: A portion of the first foot plate and a portion of the first heating electrode are located in the through hole; Alternatively, the first foot plate passes through the through hole, and the first heating electrode is located at the bottom of the heat preservation tube; Alternatively, the first heating electrode is an electrode column; the electrode column passes through the through hole.

5. The single crystal furnace thermal field according to claim 3 or 4, characterized in that: The first heating body and the first foot plate are of a spliced ​​split structure; Alternatively, the first heating body and the first foot plate are an integrated structure.

6. The single crystal furnace thermal field according to claim 3, characterized in that: The heat-insulating tube comprises an upper heat-insulating tube, a middle heat-insulating tube and a lower heat-insulating tube which are arranged in sequence along the axial direction thereof; The inner diameter of the middle insulation tube is larger than the inner diameter of the upper insulation tube and the inner diameter of the lower insulation tube, and the middle insulation tube, the upper insulation tube and the lower insulation tube enclose the groove; The through hole is arranged on the cylinder body of the lower heat-insulating cylinder and penetrates the lower heat-insulating cylinder.

7. The single crystal furnace thermal field according to claim 6, characterized in that: The upper heat-insulating cylinder, the middle heat-insulating cylinder and the lower heat-insulating cylinder are respectively integrally formed structures; Alternatively, the upper insulation tube, the middle insulation tube and the lower insulation tube are respectively of a spliced ​​split structure; Alternatively, the upper insulation tube, the middle insulation tube and the lower insulation tube are integrally formed into the insulation tube structure.

8. The single crystal furnace thermal field according to claim 3, characterized in that: The heat-insulating tube comprises a middle heat-insulating tube and a lower heat-insulating tube which are arranged in sequence along the axial direction thereof; The inner diameter of the middle heat-insulating tube is greater than the inner diameter of the lower heat-insulating tube, and the middle heat-insulating tube and the lower heat-insulating tube are enclosed to form a step, and the step is the groove; The through hole is arranged on the cylinder body of the lower heat-insulating cylinder and penetrates the lower heat-insulating cylinder.

9. The single crystal furnace thermal field according to claim 8, characterized in that: The middle insulation cylinder and the lower insulation cylinder are respectively integrally formed structures; Alternatively, the middle insulation tube and the lower insulation tube are respectively of a spliced ​​split structure; Alternatively, the middle insulation tube and the lower insulation tube are integrally formed into the insulation tube structure.

10. The single crystal furnace thermal field according to claim 6 or 8, characterized in that: The inner diameter of the first heating body is larger than the inner diameter of the lower heat-insulating cylinder.

11. The single crystal furnace thermal field according to claim 6 or 8, characterized in that: The first foot plate is located at the joint of the middle insulation tube and the lower insulation tube; The first heating electrode passes through the through hole and is connected to the first foot plate.

12. The single crystal furnace thermal field according to claim 3, characterized in that: The first foot plate extends in a direction away from the outer wall of the first heat generating body; The body of the heat preservation cylinder is also provided with a receiving groove, the notch of the receiving groove is opposite to the through hole, and the receiving groove is communicated with the groove; The first foot plate is arranged in the accommodating groove.

13. The single crystal furnace thermal field according to claim 1, characterized in that: The single crystal furnace thermal field also includes a second heater; The second heater is arranged in the heat-insulating cylinder, the second heater is arranged below the crucible, and the second heater is opposite to the bottom of the crucible.

14. The single crystal furnace thermal field according to claim 13, characterized in that: The second heater is a flat plate heater.

15. The single crystal furnace thermal field according to claim 3, characterized in that: The single crystal furnace thermal field also includes a chassis; The bottom plate is arranged at the bottom of the heat preservation tube and is enclosed with the heat preservation tube to form a receiving cavity for receiving the crucible; A first electrode hole for penetrating the first heating electrode is provided at a position on the chassis opposite to the through hole.

16. The single crystal furnace thermal field according to claim 15, characterized in that: The chassis is provided with an exhaust hole; The exhaust hole is communicated with the accommodating cavity.

17. The single crystal furnace thermal field according to claim 1, characterized in that: The heat-insulating cylinder as a whole is an integrally formed cylindrical structure made of solid felt.

Citation Information

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