Raw material supply device, substrate processing device, and raw material supply method

Abstract

The present invention relates to a raw material supply device for supplying a raw material to a chamber in which a process for processing a substrate is performed, and to the raw material supply device, a substrate processing device, and a raw material supply method, the raw material supply device comprising: a plurality of canisters for storing the raw material; a connection part having one end connected to the canisters and the other end connected to the chamber; and a plurality of supply valves for selectively opening or closing each of the canisters individually with respect to the inside of the connection part, wherein each of the canisters includes a heating part for heating the raw material, and each of the canisters is detachably mounted to the connection part.

Description

Raw material supply device, substrate processing device, and raw material supply method

[0001] The present invention relates to a substrate processing device that performs a processing process on a substrate, such as a deposition process or an etching process.

[0002] Typically, to manufacture semiconductor devices, display devices, solar cells, etc., a predetermined thin film layer, thin film circuit pattern, or optical pattern must be formed on a substrate. To this end, substrate processing processes are performed, such as a deposition process that deposits a thin film of a specific material onto the substrate, a photo process that selectively exposes the thin film using a photosensitive material, and an etching process that removes the thin film in the selectively exposed portion to form a pattern. These processing processes are performed by a substrate processing device.

[0003] A substrate processing device according to the prior art includes a chamber in which a processing process for a substrate is performed, and a supply unit for supplying a canister to the chamber. The supply unit includes a canister for storing raw materials, and a connection unit for connecting the canister and the chamber.

[0004] Here, since the raw material stored in the canister must be replaced when it runs out, the supply unit must stop supplying raw materials to the processing chamber while the canister is being replaced. Accordingly, the substrate processing device according to the prior art must also stop the processing process while the canister is being replaced, which causes a problem in that the productivity of the substrate on which the processing process has been performed is reduced.

[0005] The present invention has been devised to solve the above-described problems, and provides a raw material supply device, a substrate processing device, and a raw material supply method that can supply raw materials even while a canister is being replaced.

[0006] In order to solve the above-described problem, the present invention may include the following configuration.

[0007] A raw material supply device according to the present invention is for supplying raw materials to a chamber where a processing process for a substrate is performed, and may include: a plurality of canisters for storing raw materials; a connection portion having one end connected to the canisters and the other end connected to the chamber; and a plurality of supply valves for selectively opening or closing each of the canisters individually and within the connection portion. Each of the canisters may include a heating portion for heating the raw material. Each of the canisters may be detachably mounted to the connection portion.

[0008] In the raw material supply device according to the present invention, the connecting part may include a heater for heating the raw material.

[0009] In the raw material supply device according to the present invention, each of the canisters may include a supply block to be mounted on the connection portion. The supply valves may be connected to and operable with each of the supply blocks.

[0010] The raw material supply device according to the present invention may include an injection unit having the canisters connected on one side and a carrier gas storage unit in which a carrier gas is stored on the other side; and a plurality of injection valves for selectively opening or closing each of the canisters individually with respect to the inside of the injection unit.

[0011] In the raw material supply device according to the present invention, each of the canisters may include an injection block to be mounted on the injection unit. The injection valves may be connected to and operable with each of the injection blocks.

[0012] In the raw material supply device according to the present invention, each of the canisters may include a main body for storing raw materials. The heating unit may include a first heating unit for heating the main body at a lower portion of the main body, and a second heating unit for heating the main body at an upper portion of the main body.

[0013] In the raw material supply device according to the present invention, the main body may include a first side wall and a second side wall spaced apart from each other along a first axial direction. The canister may include a plurality of baffles spaced apart from each other along a second axial direction perpendicular to the first axial direction, thereby forming the interior of the main body into a flow path in which the flow direction changes.

[0014] In the raw material supply device according to the present invention, among the partition walls, the first partition walls arranged at odd positions based on the second axial direction may protrude from the first side wall toward the second side wall and may be spaced apart from the second side wall based on the first axial direction. Among the partition walls, the second partition walls arranged at even positions based on the second axial direction may protrude from the second side wall toward the first side wall and may be spaced apart from the first side wall based on the first axial direction.

[0015] In the raw material supply device according to the present invention, the first partition wall and the second partition wall may be arranged to be spaced apart from each other by a first interval based on the second axial direction. Each of the first partition walls may be spaced apart from the second side wall by the first interval based on the first axial direction. Each of the second partition walls may be spaced apart from the first side wall by the first interval based on the first axial direction.

[0016] In the raw material supply device according to the present invention, each of the partition walls may be arranged to be spaced apart from the first side wall by a first interval based on the first axial direction, and may be spaced apart from the second side wall by a first interval based on the first axial direction.

[0017] In the raw material supply device according to the present invention, each of the canisters may include a third side wall and a fourth side wall spaced apart from each other and facing each other along the second axial direction; an inlet portion through which raw materials are introduced; and a discharge portion through which raw materials are discharged.

[0018] In the raw material supply device according to the present invention, each of the inlet and outlet portions may be formed adjacent to the first side wall with respect to the first axial direction.

[0019] In the raw material supply device according to the present invention, one of the inlet and outlet may be formed adjacent to the first side wall based on the first axial direction, and the other may be formed adjacent to the second side wall based on the first axial direction.

[0020] In the raw material supply device according to the present invention, at least one of the first heating unit and the second heating unit may include a plurality of heating lines arranged parallel to the first axial direction. Each of the heating lines may be arranged at a position spaced apart from the partition walls by an equal distance based on the second axial direction.

[0021] In the raw material supply device according to the present invention, at least one of the first heating unit and the second heating unit may include a plurality of heating lines arranged parallel to the first axial direction. Each of the heating lines may be arranged at a position where the partition is formed based on the second axial direction.

[0022] In the raw material supply device according to the present invention, the heating unit may include a third heating unit that heats the main body from a side of the main body.

[0023] In the raw material supply device according to the present invention, the partition walls can be coupled to the main body so as to be in contact with the lower part of the main body and the upper part of the main body, respectively.

[0024] The raw material supply device according to the present invention may include an acquisition unit that acquires the internal temperature of each of the canisters; and a control unit that controls each of the heating units so that the heating temperature for heating the raw material is adjusted according to the temperature acquired by the acquisition unit.

[0025] The raw material supply device according to the present invention may include an acquisition unit that acquires the amount of raw material stored in each of the canisters. The supply valves may use the amount of raw material acquired by the acquisition unit to close canisters in which the amount of raw material remaining is less than a preset reference amount, and open canisters in which the amount of raw material remaining is greater than the reference amount.

[0026] A substrate processing device according to the present invention may include a chamber; a substrate support portion disposed inside the chamber and supporting one or more substrates; a spray portion for spraying a raw material toward the substrate support portion; and a raw material supply device for supplying the raw material to the spray portion.

[0027] The substrate processing device according to the present invention may include a connection line connected to the injection unit, and a switching unit coupled to the connection line. A plurality of raw material supply devices may be connected to the connection line. By the switching unit, either the first raw material supply device among the raw material supply devices or the second raw material supply device among the raw material supply devices may supply raw materials through the injection unit.

[0028] A raw material supply method according to the present invention is a raw material supply method of a raw material supply device including a plurality of canisters, and may include: a step of vaporizing a raw material of a first canister among the canisters and supplying the vaporized raw material to a chamber; a step of monitoring whether an acquisition value including at least one of an internal pressure of the first canister and a vaporization amount of the first canister is lower than a preset value; a step of vaporizing a raw material of a second canister among the canisters and supplying the raw material to the chamber when the acquisition value is lower than the value; and a step of stopping the supply of the first canister.

[0029] In the raw material supply method according to the present invention, the step of stopping the supply of the first canister may include reducing the supply amount of the first canister for a preset reference time when the obtained value becomes lower than or equal to the value, and then stopping the supply of the first canister when the reference time is reached. The step of vaporizing the raw material of the second canister and supplying it to the chamber may include increasing the supply amount of the raw material of the second canister to a preset reference supply amount for the preset reference time when the obtained value becomes lower than or equal to the value, and then supplying the raw material of the second canister to the chamber at the reference supply amount when the reference time is reached.

[0030] According to the present invention, the following effects can be achieved.

[0031] The present invention is implemented so that, when the raw material in a canister is exhausted, another canister is connected to the chamber via a connection portion to allow fluid flow, thereby continuously supplying raw material to the chamber. Accordingly, even if a canister is exhausted, the raw material supply to the chamber can be continued without interruption, thereby enabling the processing process in the chamber to continue without interruption. Consequently, the present invention can increase the productivity of substrates on which the processing process has been performed.

[0032] The present invention is implemented so that, since each canister is detachably mounted on the connection part, raw materials can be supplied to the chamber using the remaining canisters even while some of the canisters are being replaced. Accordingly, the present invention allows the processing process in the chamber to continue without interruption even while some of the canisters are being replaced. Therefore, the present invention can not only increase the productivity of substrates on which the processing process has been performed, but also improve the ease of canister replacement.

[0033] Figure 1 is a schematic diagram of a substrate processing device according to the present invention.

[0034] Figure 2 is a schematic perspective view of a raw material supply device according to the present invention.

[0035] Figure 3 is a schematic front view of a raw material supply device according to the present invention.

[0036] Figure 4 is a conceptual block diagram of a raw material supply device according to the present invention.

[0037] Figure 5 is a schematic exploded perspective view of a canister in a raw material supply device according to the present invention.

[0038] Figure 6 is a schematic plan view of the main body of the canister in the raw material supply device according to the present invention.

[0039] Figure 7 is a schematic cross-sectional view based on line II of Figure 6.

[0040] Figure 8 is an enlarged view showing part A of Figure 6.

[0041] Figure 9 is a schematic enlarged cross-sectional view showing the canister in the raw material supply device according to the present invention along line II-II of Figure 6.

[0042] Figure 10 is a schematic plan view of a main body of a canister according to a modified embodiment of a raw material supply device according to the present invention.

[0043] Figure 11 is a schematic block diagram of a raw material supply device according to the present invention.

[0044] Figure 12 is a schematic block diagram of a substrate processing device according to the present invention.

[0045] Hereinafter, an embodiment of a substrate processing device according to the present invention will be described in detail with reference to the attached drawings. Since the raw material supply device according to the present invention can be included in the substrate processing device according to the present invention, it will be described together with the embodiment of the substrate processing device according to the present invention. Meanwhile, FIGS. 6 and 10 are not cross-sectional views, but hatching is shown to distinguish them from spaces. FIG. 8 shows the first heating unit to explain the arrangement relationship between the first heating unit and the partition walls.

[0046] Referring to FIG. 1, the substrate processing device (10) according to the present invention performs a processing process on a substrate (100). The substrate (100) may be a silicon substrate, a glass substrate, a metal substrate, or the like. The substrate processing device (10) according to the present invention may perform a deposition process for depositing a thin film on the substrate (100), an etching process for removing a portion of the thin film deposited on the substrate (100), or the like. Hereinafter, an embodiment in which the substrate processing device (10) according to the present invention performs the deposition process will be described, but it will be apparent to those skilled in the art to which the present invention pertains to derive an embodiment in which the substrate processing device (10) according to the present invention performs other processing processes, such as the etching process.

[0047] Referring to FIG. 1, the substrate processing device (10) according to the present invention may include a chamber (11).

[0048] The chamber (11) may provide a processing space (111). In the processing space (111), a processing process for the substrate (100) may be performed. The processing space (111) may be arranged inside the chamber (11). An exhaust port (not shown) for exhausting gas or the like from the processing space (111) may be coupled to the chamber (11). The substrate support member (12) may be arranged inside the chamber (11).

[0049] Referring to FIG. 1, the substrate processing device (10) according to the present invention may include a substrate support unit (12).

[0050] The substrate support member (12) can support the substrate (100). The substrate support member (12) can support one or more substrates (100). When a plurality of substrates (100) are supported by the substrate support member (12), a processing process can be performed on a plurality of substrates (100) at once. The substrate support member (12) can be coupled to the chamber (11). The substrate support member (12) can be placed inside the chamber (11).

[0051] Referring to FIG. 1, the substrate processing device (10) according to the present invention may include a spray unit (13).

[0052] The above-described injection unit (13) can inject raw materials toward the substrate support unit (12). The injection unit (13) can be arranged inside the chamber (11). The injection unit (13) can be arranged to face the substrate support unit (12). The injection unit (13) can be arranged on the upper side of the substrate support unit (12). The processing space (111) can be arranged between the injection unit (13) and the substrate support unit (12). The injection unit (13) can be coupled to a lid (not shown). The lid can be coupled to the chamber (11) so as to cover the upper portion of the chamber (11).

[0053] Referring to FIGS. 1 to 4, the substrate processing device (10) according to the present invention may include a raw material supply device (1). The raw material supply device (1) may be implemented as a raw material supply device according to the present invention.

[0054] The above raw material supply device (1) can supply raw material to the chamber (11). The raw material supply device (1) can also supply raw material to the chamber (11) through the injection unit (13) by supplying raw material to the injection unit (13). The raw material supply device (1) can supply source gas as the raw material. The raw material supply device (1) can also supply reactant gas as the raw material. The raw material supply device (1) can supply the raw material that has been phase-changed into gas after sublimating or vaporizing a solid or liquid raw material to change its phase into gas. The raw material may be a precursor. The raw material may be molybdenum, parylene, perylene, an organic polymer, etc.

[0055] The above raw material supply device (1) may include a connecting portion (2), a plurality of supply valves (3), and a plurality of canisters (4).

[0056] The above-described connecting portion (2) may be connected to the chamber (11). The connecting portion (2) may have the canisters (4) storing raw materials connected on one side, and the other side connected to the chamber (11). Accordingly, the raw materials stored in each of the canisters (4) may be supplied to the chamber (11) through the connecting portion (2). The connecting portion (2) may be connected to the chamber (11) through a connecting line (14). The connecting line (14) may be implemented using at least one of a pipe, a hose, and a hole formed in a block.

[0057] The canisters (4) can be detachably mounted on the connecting portion (2). Accordingly, the substrate processing device (10) according to the present invention is implemented so that raw materials can be supplied to the chamber (11) using the remaining canisters (4) even while some of the canisters (4) are being replaced. Accordingly, the substrate processing device (10) according to the present invention can continue the processing process in the chamber (11) without interruption even while some of the canisters (4) are being replaced. Accordingly, the substrate processing device (10) according to the present invention can not only increase the productivity of the substrate (100) on which the processing process has been performed, but also improve the ease of replacement of the canisters (4). The canisters (4) can be detachably mounted individually on the connecting portion (2) through a fastening method, an interference fit method, or the like using a fastening means such as bolts.

[0058] The canisters (4) can be connected in parallel to the above-described connection portion (2). In this case, the canisters (4) can be individually connected to the chamber (11) through the connection portion (2). Accordingly, the connection portion (2) can be implemented so that only some of the canisters (4) are connected so that fluid can flow therethrough, so that the raw material stored in the corresponding canister (4) can be supplied to the chamber (11). Therefore, when compared to a comparative example in which the canisters (4) are connected in series to the connection portion (2), the substrate processing device (10) according to the present invention can continuously supply raw material to the chamber (11) when the raw material of the canister (4) connected so that fluid can flow therethrough to the chamber (11) through the connection portion (2) is exhausted. Accordingly, the substrate processing device (10) according to the present invention can continuously supply raw materials to the chamber (11) without stopping the operation of supplying raw materials to the chamber (11) even when a canister (4) in which raw materials are exhausted is generated, so that the processing process performed in the chamber (11) can also be continuously performed without interruption. Accordingly, the substrate processing device (10) according to the present invention can increase the productivity of the substrate (100) on which the processing process is performed.

[0059] The above connecting portion (2) may include a plurality of supply ports (21) and supply passages (22).

[0060] The above supply ports (21) can be connected to each of the canisters (4). The canisters (4) can be detachably mounted to each of the supply ports (21). The supply ports (21) can be coupled to a connecting body (20). The connecting body (20) can form the overall appearance of the connecting portion (2). The connecting body (20) can be formed in a rectangular shape that is elongated along the vertical direction (Z-axis direction), but is not limited thereto, and can be formed in another shape, such as a rectangular cylindrical shape, as long as the canisters (4) and the chamber (11) can be connected to allow fluid flow.

[0061] The above supply passage (22) can be connected to the chamber (11). The supply passage (22) is connected to the injection unit (13) and can supply raw materials to the processing space (111) through the injection unit (13). The supply ports (21) can be connected to the supply passage (22) so that fluid flow is possible. Accordingly, all of the canisters (4) are connected in parallel to the supply passage (22) through the supply ports (21), so that raw materials can be supplied to the chamber (11) through the supply ports (21) and the supply passage (22). Therefore, the substrate processing device (10) according to the present invention is implemented so that, when a canister (4) among the canisters (4) has run out of raw materials or a canister (4) needs to be replaced, raw materials can be supplied to the chamber (11) through another canister (4). The above supply passage (22) may be arranged inside the connecting body (20). The above supply passage (22) may be implemented as a groove formed inside the connecting body (20). In this case, the above supply ports (21) include portholes for the raw material to flow, and may be connected to the above supply passage (22) through the portholes.

[0062] The above supply passage (22) may be formed to extend along the vertical direction (Z-axis direction). In this case, the supply ports (21) may be arranged to be spaced apart from each other along the vertical direction (Z-axis direction) in the connecting body (20). The supply ports (21) may be arranged to be spaced apart from each other along the vertical direction (Z-axis direction) so that the fluid may be connected to different parts of the supply passage (22) to allow the flow of fluid. Accordingly, the canisters (4) may be detachably mounted on the supply ports (21) and stacked along the vertical direction (Z-axis direction). Therefore, the substrate processing apparatus (10) according to the present invention can reduce the installation area occupied by the canisters (4) within the work site based on the horizontal direction perpendicular to the vertical direction (Z-axis direction). In addition, even if the number of canisters (4) is increased in the substrate processing device (10) according to the present invention, the installation area occupied by the canisters (4) in the work place based on the horizontal direction does not increase. Therefore, the substrate processing device (10) according to the present invention can contribute to improving the space utilization of the installation area of ​​the work place by providing the canisters (4).

[0063] The above connecting portion (2) may include a heater (23, shown in FIG. 4).

[0064] The heater (23) can heat the raw material. Accordingly, the raw material supply device (1) according to the present invention can prevent the raw material from undergoing a phase change as the temperature of the raw material flowing through the connection portion (2) decreases. Therefore, the raw material supply device (1) according to the present invention can prevent the raw material from being deteriorated during the process in which the raw material is supplied from the canisters (4) to the chamber (11) through the connection portion (2), thereby improving the quality of the substrate (100) on which the processing process has been performed. The heater (23) can be coupled to the connection body (20). The heater (23) can heat the raw material flowing through the supply passage (22) by heating at least one of the connection body (20) and the supply passage (22). The heater (23) can heat the raw material by using electric heat, emitting heating light, circulating a heating medium such as water, etc.

[0065] Referring to FIGS. 1 to 4, the supply valves (3, illustrated in FIG. 4) can individually open or close each of the canisters (4) to the interior of the connection portion (2). When a canister (4) among the canisters (4) requires replacement, such as when the raw material is exhausted, the supply valves (3) can block the fluid-flowable connection between the corresponding canister (4) and the interior of the connection portion (2), while allowing the fluid-flowable connection between another canister (4) and the interior of the connection portion (2). Accordingly, the substrate processing apparatus (10) according to the present invention can continue to perform the processing process in the chamber (11) without interruption even while the replacement process is performed on some of the canisters (4), thereby increasing the productivity of the substrate (100) on which the processing process is performed, and improving the ease of the replacement process for the canisters (4).

[0066] The supply valves (3) can individually open or close each of the canisters (4) with respect to the supply passage (22). The supply valves (3) can individually open or close passages through which the canisters (4) and the supply passage (22) are connected to each other so that fluid can flow between them, thereby individually opening or closing the canisters (4) with respect to the supply passage (22). The supply valves (3) can be coupled to each of the canisters (4). Accordingly, a canister (4) separated from the connection portion (2) for replacement can be maintained in a state in which the passage is closed by the supply valves (3). The supply valves (3) can also be coupled to the connection portion (2). In this case, the supply valves (3) can be coupled to the supply ports (21). The supply valves (3) can be coupled to both the canisters (4) and the supply ports (21).

[0067] For example, when three canisters (4a, 4b, 4c) are connected in parallel to the connection portion (2) as illustrated in FIG. 4, three supply valves (3a, 3b, 3c) may be provided. The supply valves (3a, 3b, 3c) can individually selectively open or close each of the canisters (4a, 4b, 4c) with respect to the supply passage (22). Although not illustrated, two or four or more canisters (4) may be connected in parallel to the connection portion (2). In this case, the raw material supply device (1) may include the same number of supply valves (3) as the canisters (4).

[0068] Referring to FIGS. 1 to 4, each of the canisters (4) can store raw materials. The canisters (4) can be connected to the connection portion (2) and can be detachably mounted on the connection portion (2). Accordingly, the substrate processing device (10) according to the present invention is implemented so that, when a canister (4) among the canisters (4) requires replacement due to exhaustion of raw materials, the raw materials can be supplied to the chamber (11) through another canister (4) while the replacement of the corresponding canister (4) is being performed. Accordingly, the substrate processing device (10) according to the present invention can continue to perform the processing process in the chamber (11) without interruption even while the replacement of some of the canisters (4) is being performed, thereby increasing the productivity of the substrate (100) on which the processing process has been performed, and improving the ease of the replacement of the canisters (4). The above canisters (4) may be connected in parallel to the connection portion (2). The canisters (4) may be detachably mounted on the supply ports (21) and stacked along the vertical direction (Z-axis direction). Each of the canisters (4) may sublimate or vaporize a solid or liquid raw material to change its phase into a gas, and then supply the raw material that has changed into a gas to the connection portion (2).

[0069] Referring to FIGS. 1 to 4, each of the canisters (4) may include a supply block (41).

[0070] The above supply blocks (41) can be mounted on the connection portion (2). The canisters (4) can be mounted on the connection portion (2) through the supply blocks (41). When the supply blocks (41) are mounted on the connection portion (2), the internal space of the canisters (4) and the supply ports (21) can be connected to enable the flow of fluid. Accordingly, the internal space of the canisters (4) can be connected to the supply passage (22) through the supply blocks (41) and the supply ports (21) to enable the flow of fluid, thereby enabling the flow of fluid to the chamber (11) through the supply passage (22). The supply blocks (41) include supply holes for the flow of raw materials, and can be connected to the port holes of the supply ports (21) through the supply holes. The supply valves (3) can be connected to and operated by each of the supply blocks (41). In this case, the supply valves (3) are coupled to each of the supply blocks (41) so that the supply blocks (41) and the supply ports (21) can be individually opened or closed. The supply valves (3) can individually open and close the supply holes.

[0071] Referring to FIGS. 1 to 4, each of the canisters (4) may include a guide pin (not shown).

[0072] The above guide pins can be inserted into the connecting portion (2). In this case, guide grooves (not shown) can be formed in the connecting portion (2). The guide pins can be inserted into each of the guide grooves to guide the mounting positions of the canisters (4). Therefore, the substrate processing device (10) according to the present invention can improve the ease and accuracy of the mounting work for detachably mounting the canisters (4) to the connecting portion (2).

[0073] The above guide pins may be protrudingly coupled from each of the supply blocks (41). A plurality of the guide pins may be coupled to each of the supply blocks (41). The guide pins and the supply blocks (41) may be formed integrally. The guide pins and the guide grooves may be formed in a corresponding shape. The guide grooves may be formed in the connecting body (20).

[0074] Referring to FIGS. 1 to 9, each of the canisters (4) may include a main body (42). Since all of the canisters (4) may be implemented identically, the following description will be based on one canister (4).

[0075] The main body (42) can store raw materials. A storage unit (40) can be arranged inside the main body (42). The storage unit (40) can correspond to the internal space of the canister (4). The storage unit (40) can be formed in the main body (42). The main body (42) can be formed in the shape of a rectangular parallelepiped with an interior that is hollow due to the storage unit (40), but is not limited thereto, and can be formed in another shape, such as a disk shape, as long as the raw materials can be accommodated through the storage unit (40).

[0076] The storage unit (40) may be implemented as a groove formed with a certain depth on the upper surface of the main body (42). The upper surface of the main body (42) may be formed to be open by the storage unit (40). In this case, the main body (42) may include a cover (43). The cover (43) may be arranged on the upper portion of the main body (42) to cover the storage unit (40). Based on the up-down direction (Z-axis direction), the cover (43) may be arranged on the upper side of the storage unit (40). The cover (43) may be formed in an overall rectangular plate shape, but is not limited thereto, and may be formed in another shape, such as a disc shape, as long as it can cover the storage unit (40).

[0077] The main body (42) may include a first side wall (421) and a second side wall (422). The first side wall (421) and the second side wall (422) may be spaced apart from each other and disposed to face each other along the first axial direction (X-axis direction). The first side wall (421) and the second side wall (422) may be formed to protrude upward from the bottom wall (420). The storage unit (40) may be disposed between the first side wall (421) and the second side wall (422) based on the first axial direction (X-axis direction). The bottom wall (420) may be disposed below the storage unit (40) based on the up-down direction (Z-axis direction). The above bottom wall (420) may be formed in a plate shape lying in the horizontal direction, and the first side wall (421) and the second side wall (422) may be formed in a plate shape standing up in the vertical direction (Z-axis direction).

[0078] The main body (42) may include a third side wall (423) and a fourth side wall (424). The third side wall (423) and the fourth side wall (424) may be spaced apart from each other and disposed to face each other along the second axial direction (Y-axis direction). The second axial direction (Y-axis direction) and the first axial direction (X-axis direction) may be axial directions that are disposed perpendicular to each other in one horizontal plane. The third side wall (423) and the fourth side wall (424) may be formed to protrude upward from the bottom wall (420). The storage unit (40) may be disposed between the third side wall (423) and the fourth side wall (424) based on the second axial direction (Y-axis direction). The third side wall (423) and the fourth side wall (424) may be formed in a plate shape erected in the vertical direction (Z-axis direction). The third side wall (423) and the fourth side wall (424) may be respectively coupled to the first side wall (421) and the second side wall (422). The third side wall (423) and the fourth side wall (424) may be arranged parallel to the first axial direction (X-axis direction), and the first side wall (421) and the second side wall (422) may be arranged parallel to the second axial direction (Y-axis direction). The first side wall (421), the second side wall (422), the third side wall (423), the fourth side wall (424), and the bottom wall (420) may be formed integrally. With reference to Fig. 6, the third side wall (423) may be placed on the right side, and the fourth side wall (424) may be placed on the left side. The supply block (41) may be coupled to the third side wall (423).

[0079] The main body (42) may include a discharge unit (425). The discharge unit (425) may be connected to the storage unit (40) and the supply block (41) so that fluid may flow therethrough. Accordingly, the raw material stored in the storage unit (40) may be discharged to the supply block (41) through the discharge unit (425) and then supplied to the connection unit (2) through the supply block (41). The discharge unit (425) may protrude upward from the bottom wall (420). The discharge unit (425) may be arranged at a portion where the first side wall (421) and the third side wall (423) contact each other. In this case, the discharge unit (425) may protrude from each of the first side wall (411) and the third side wall (423) toward the storage unit (40).

[0080] The above discharge portion (425) may include a discharge groove (425a) and a discharge port (425b).

[0081] The above discharge groove (425a) may be formed on the upper surface of the discharge portion (425). The discharge groove (425a) may be implemented as a groove formed with a certain depth on the upper surface of the discharge portion (425). The discharge groove (425a) may be formed to allow the flow of fluid to each of the storage portion (40) and the discharge port (425b). Based on the up-down direction (Z-axis direction), the length of the discharge groove (425a) may be formed to be shorter than the distance between the lower end of the discharge groove (425a) and the upper surface of the bottom wall (420). Accordingly, a discharge protrusion (425c) may be formed between the lower end of the discharge groove (425a) and the upper surface of the bottom wall (420) based on the up-down direction (Z-axis direction). Accordingly, the discharge unit (425) can be implemented so that the raw material stored in the storage unit (40) can enter the discharge groove (425a) by passing the discharge jaw (425c) only when the raw material has undergone a phase change and rises to a height higher than the discharge jaw (425c). That is, the discharge jaw (425c) can block the raw material with a less phase change from entering the discharge groove (425a). Accordingly, the raw material supply device (1) according to the present invention can increase the phase change rate of the raw material stored in the storage unit (40), and thus improve the quality of the raw material supplied to the chamber (11).

[0082] The above discharge port (425b) can discharge raw materials. The discharge port (425b) can be connected to the discharge groove (425a) and the supply block (41) so that fluid can flow therethrough. Accordingly, raw materials that have passed the discharge protrusion (425c) and entered the discharge groove (425a) can be discharged from the storage unit (40) through the discharge port (425b) and supplied to the connection unit (2) through the supply block (41). The discharge port (425b) can be formed by penetrating the third side wall (423). The discharge port (425b) can be connected to the supply hole of the supply block (41) so that fluid can flow therethrough. Based on the above-mentioned vertical direction (Z-axis direction), the discharge port (425b) may be positioned at a position where the distance from the bottom surface of the main body (42) is longer than the distance from the top surface of the main body (42). That is, the discharge port (425b) may be positioned closer to the top surface of the main body (42) than to the bottom surface of the main body (42).

[0083] Referring to FIGS. 1 to 9, the canister (4) may include a plurality of bulkheads (44).

[0084] The above-described partition walls (44) can be arranged to be spaced apart from each other along the second axial direction (Y-axis direction) to form the interior of the main body (42) as a flow path in which the flow direction changes. By the partition walls (44), the canister (4) can increase the flow distance of the raw material stored in the main body (42) until the raw material is phase-changed and supplied to the connecting portion (2). Accordingly, the canister (4) can increase the residence time of the raw material in the main body (42), and thus can further increase the phase-change rate of the raw material stored in the main body (42). In this case, the partition walls (44) can form the storage unit (40) as a flow path in which the flow direction changes. The partition walls (44) can be arranged in the storage unit (40) by being coupled to the main body (42). The partition walls (44) can be formed in a plate shape that is erected in the vertical direction (Z-axis direction). The above bulkheads (44) can be arranged parallel to the first axis direction (X-axis direction).

[0085] Among the above partition walls (44), the first partition walls (441) may protrude from the first side wall (421) toward the second side wall (422). The first partition walls (441) may be spaced apart from the second side wall (422) based on the first axial direction (X-axis direction). Accordingly, the canister (4) can increase the flow distance of the raw material and the residence time of the raw material by inducing the raw material stored in the storage unit (40) to flow between the first partition walls (441) and the second side wall (422).

[0086] Among the above partition walls (44), the second partition walls (442) may protrude from the second side wall (422) toward the first side wall (421). The second partition walls (442) may be spaced apart from the first side wall (421) based on the first axial direction (X-axis direction). Accordingly, the canister (4) can increase the flow distance of the raw material and the residence time of the raw material by inducing the raw material stored in the storage unit (40) to flow between the second partition walls (442) and the first side wall (421).

[0087] The second bulkheads (442) may be arranged in even positions among the bulkheads (44) based on the second axial direction (Y-axis direction). In this case, the first bulkheads (441) may be arranged in odd positions among the bulkheads (44) based on the second axial direction (Y-axis direction). Accordingly, the storage unit (40) may include a first passage through which a raw material may pass, provided between the first bulkhead (441) and the second side wall (422), and a second passage through which a raw material may pass, provided between the second bulkhead (442) and the first side wall (421). In addition, the storage unit (40) may be formed in a winding shape in which the first passage and the second passage are alternately arranged along the second axial direction (Y-axis direction).

[0088] In this way, the canister (4) can be implemented so that the raw material changes phase while flowing along a flow path having a relatively narrow width and a relatively long flow distance by using the first partition walls (441) and the second partition walls (442). Accordingly, the raw material supply device (1) can increase the phase change rate of the raw material stored in the storage unit (40), thereby improving the quality of the raw material supplied to the chamber (11), thereby contributing to improving the quality of the substrate on which the processing process has been performed.

[0089] As illustrated in FIG. 8, the gap (44a) between the second partition wall (442) and the first partition wall (441) based on the second axial direction (Y-axis direction) may be formed as a first gap. In this case, the second partition wall (442) and the first partition wall (441) may be arranged to be spaced apart from each other by the first gap based on the second axial direction (Y-axis direction). The gap (441a) between each of the first partition walls (441) and the second side wall (422) based on the first axial direction (X-axis direction) may be formed as the first gap. In this case, each of the first partition walls (441) may be spaced apart from the second side wall (422) by the first gap based on the first axial direction (X-axis direction). The distance (442a) at which each of the second partition walls (442) is spaced apart from the first side wall (421) based on the first axial direction (X-axis direction) may be formed as the first distance. In this case, each of the second partition walls (442) may be spaced apart from the first side wall (421) based on the first axial direction (X-axis direction) at the first distance. Accordingly, the canister (4) is implemented so that the raw material flows along a flow path having a uniform width, thereby improving the uniformity of the phase change of the raw material.

[0090] Referring to FIGS. 1 to 9, the canister (4) may include a heating unit (5).

[0091] The heating unit (5) can heat the raw material. As the heating unit (5) heats the raw material, the raw material can undergo a phase change into a gas. The heating unit (5) can heat the raw material stored in the storage unit (40) by heating at least one of the lower part of the main body (42) and the upper part of the main body (42). In this case, the heating unit (5) can heat at least one of the main body (42) and the cover (43). The heating unit (5) can heat the raw material by using an electric heat source, emitting heating light, circulating a heating medium such as water, etc.

[0092] The above heating unit (5) may include a first heating unit (51).

[0093]

[0094] *The first heating unit (51) can heat the main body (42) from the lower portion of the main body (42). The first heating unit (51) can be coupled to the main body (42). The first heating unit (51) can heat the raw material stored in the storage unit (40) through the lower portion of the main body (42) by heating the lower portion of the main body (42). The first heating unit (51) can be extended in a shape corresponding to the storage unit (40) and disposed on the lower portion of the storage unit (40). For example, the first heating unit (51) can be formed to extend in a winding shape corresponding to the storage unit (40) formed in a winding shape, as shown by the dotted line in FIG. 6. Accordingly, the first heating unit (51) can improve the uniformity of heating for the raw material stored in the storage unit (40).

[0095] The above first heating unit (51) may include a plurality of first heating lines (511).

[0096] The first heating lines (511) may be arranged parallel to the first axial direction (X-axis direction). The first heating lines (511) may be arranged spaced apart from each other along the second axial direction (Y-axis direction). Each of the first heating lines (511) may be arranged between the partition walls (44) based on the second axial direction (Y-axis direction). In this case, one first heating line (511) may be arranged between two partition walls (44) based on the second axial direction (Y-axis direction).

[0097] Each of the first heating lines (511) may be arranged at a position spaced apart from the partition walls (44) by the same distance based on the second axial direction (Y-axis direction). Accordingly, each of the first heating lines (511) may uniformly heat the space between the partition walls (44) based on the second axial direction (Y-axis direction). When the partition walls (44) are implemented as the first partition walls (441) and the second partition walls (442), each of the first heating lines (511) may be arranged at a position where the distance (511a, illustrated in FIG. 8) spaced apart from the first partition wall (441) and the distance (511b, illustrated in FIG. 8) spaced apart from the second partition wall (442) are the same.

[0098] The above first heating unit (51) may include a plurality of first joint lines (512).

[0099] The first connecting lines (512) can connect the first heating lines (511). Each of the first connecting lines (512) can have the first heating lines (511) connected to both sides. Through the first connecting lines (512) and the first heating lines (511), the first heating unit (51) can be formed to form one connected heating line. Each of the first connecting lines (512) can connect two first heating lines (511).

[0100] Based on the first axial direction (X-axis direction), the first joint lines (512) arranged between the first partition wall (441) and the second side wall (422) can be arranged at positions spaced apart from each of the first partition wall (441) and the second side wall (422) by the same distance. Accordingly, each of the first joint lines (512) can uniformly heat the space between the first partition wall (441) and the second side wall (422) based on the first axial direction (X-axis direction).

[0101] Based on the first axial direction (X-axis direction), the first joint lines (512) arranged between the second partition wall (442) and the first side wall (421) can be arranged at positions spaced apart from each of the second partition wall (442) and the first side wall (421) by the same distance. Accordingly, each of the first joint lines (512) can uniformly heat the space between the second partition wall (442) and the first side wall (421) based on the first axial direction (X-axis direction).

[0102] Each of the first joining lines (512) may be formed to form a curve. Each of the first heating lines (511) may be formed to form a straight line. The first joining lines (512) and the first heating lines (511) may be formed integrally.

[0103] The first heating unit (51) may include a first heating plate (510). The first joining lines (512) and the first heating lines (511) may be coupled to the first heating plate (510). The first joining lines (512) and the first heating lines (511) may be embedded in the inside of the first heating plate (510). The first heating plate (510) may be arranged on the lower side of the main body (42). The first heating plate (510) may be in contact with the bottom surface of the main body (42). The first heating plate (510) may correspond to the lower part of the main body (42). The first connecting lines (512) and the first heating lines (511) can heat the first heating plate (510) and heat the main body (42) through the first heating plate (510). The first heating unit (51) can also be directly connected to the main body (42) without the first heating plate (510). In this case, the first heating unit (51) can also be embedded in the inside of the bottom wall (420).

[0104] The above heating unit (5) may include a second heating unit (52).

[0105] The second heating unit (52) can heat the main body (42) from the upper portion of the main body (42). The second heating unit (52) can be coupled to the main body (42). When the main body (42) includes the cover (43), the second heating unit (52) can be coupled to the cover (43). The second heating unit (52) heats the upper portion of the main body (42), thereby heating the raw material stored in the storage unit (40) through the upper portion of the main body (42). The second heating unit (52) can be extended in a shape corresponding to the storage unit (40) and disposed on the upper side of the storage unit (40). For example, the second heating unit (52) can be formed by extending in a winding shape to correspond to the storage unit (40) formed in a winding shape, as shown by the dotted line in FIG. 6. Accordingly, the second heating unit (52) can improve the uniformity of heating of the raw material stored in the storage unit (40). When the heating unit (5) includes both the second heating unit (52) and the first heating unit (51), the raw material stored in the storage unit (40) can be heated more uniformly through both the upper part of the main body (42) and the lower part of the main body (42).

[0106] The above second heating unit (52) may include a plurality of second heating lines (521).

[0107] The second heating lines (521) may be arranged parallel to the first axial direction (X-axis direction). The second heating lines (521) may be arranged spaced apart from each other along the second axial direction (Y-axis direction). Each of the second heating lines (521) may be arranged between the partition walls (44) based on the second axial direction (Y-axis direction). In this case, one second heating line (521) may be arranged between two partition walls (44) based on the second axial direction (Y-axis direction).

[0108] Each of the second heating lines (521) may be arranged at a position spaced apart from the partition walls (44) by the same distance based on the second axial direction (Y-axis direction). Accordingly, each of the second heating lines (521) may uniformly heat the space between the partition walls (44) based on the second axial direction (Y-axis direction). When the partition walls (44) are implemented as the first partition walls (441) and the second partition walls (442), each of the second heating lines (521) may be arranged at a position where the distance from the first partition wall (441) and the distance from the second partition wall (442) are the same.

[0109] The above second heating unit (52) may include a plurality of second joining lines (522).

[0110] The second connecting lines (522) can connect the second heating lines (521). Each of the second connecting lines (522) can have the second heating lines (521) connected to both sides. Through the second connecting lines (522) and the second heating lines (521), the second heating unit (52) can be formed to form one connected heating line. Each of the second connecting lines (522) can connect two second heating lines (521).

[0111] Based on the first axial direction (X-axis direction), the second joint lines (522) arranged between the first partition wall (441) and the second side wall (422) can be arranged at positions spaced apart from each of the first partition wall (441) and the second side wall (422) by the same distance. Accordingly, each of the second joint lines (522) can uniformly heat the space between the first partition wall (441) and the second side wall (422) based on the first axial direction (X-axis direction).

[0112] Based on the first axial direction (X-axis direction), the second joint lines (522) arranged between the second partition wall (442) and the first side wall (421) can be arranged at positions spaced apart from each of the second partition wall (442) and the first side wall (421) by the same distance. Accordingly, each of the second joint lines (522) can uniformly heat the space between the second partition wall (442) and the first side wall (421) based on the first axial direction (X-axis direction).

[0113] Each of the second connecting lines (522) may be formed to form a curve. Each of the second heating lines (521) may be formed to form a straight line. The second connecting lines (522) and the second heating lines (521) may be formed integrally.

[0114] The second heating unit (52) may include a second heating plate (520). The second joining lines (522) and the second heating lines (521) may be coupled to the second heating plate (520). The second joining lines (522) and the second heating lines (521) may be embedded in the inner side of the second heating plate (520). The second heating plate (520) may be disposed on the upper side of the cover (43). The second heating plate (520) may be in contact with the upper surface of the cover (43). The second joining lines (522) and the second heating lines (521) may heat the second heating plate (520) and heat the cover (43) through the second heating plate (520). The second heating unit (52) may be directly connected to the cover (43) without the second heating plate (520). In this case, the second heating unit (52) may be embedded in the inside of the cover (43). The second heating plate (520) may correspond to the upper portion of the main body (42).

[0115] When the second heating unit (52) heats the upper portion of the main body (42) and the first heating unit (51) heats the lower portion of the main body (42), the second heating unit (52) and the first heating unit (51) may be implemented to heat the partition walls (44). In this case, the partition walls (44) may be coupled to the main body (42) so as to contact the upper portion of the main body (42) and the lower portion of the main body (42), respectively. Accordingly, when the second heating unit (52) heats the upper portion of the main body (42), the partition walls (44) may be heated through the upper portion of the main body (42). When the first heating unit (51) heats the lower portion of the main body (42), the partition walls (44) may be heated through the lower portion of the main body (42). Accordingly, the canister (4) is implemented so that the storage section (40) is heated more uniformly as a whole by using the heating section (5), thereby further increasing the vaporization rate of the raw material stored in the storage section (40). When the main body (42) includes the cover (43), the cover (43) can be coupled to the main body (42) so as to come into contact with the partition walls (44). Accordingly, when the second heating section (52) heats the cover (43), the partition walls (44) can be heated through the cover (43).

[0116] Meanwhile, according to a modified embodiment of the heating unit (5), each of the first heating lines (511) may be positioned at a position where the partition wall (44) is formed based on the second axial direction (Y-axis direction). In this case, each of the first heating lines (511) may heat the lower portion of the main body (42) below the partition wall (44), as illustrated in FIG. 9. Accordingly, the heating efficiency of the first heating lines (511) in heating the partition walls (44) may be increased.

[0117] Meanwhile, according to a modified embodiment of the heating unit (5), each of the second heating lines (521) may be positioned at a position where the partition wall (44) is formed based on the second axial direction (Y-axis direction). In this case, each of the second heating lines (521) may heat the upper portion of the main body (42) above the partition wall (44), as illustrated in FIG. 9. Accordingly, the heating efficiency of the second heating lines (521) in heating the partition walls (44) may be increased.

[0118] Meanwhile, the heating unit (5) may be implemented such that at least one of the first heating unit (51) and the second heating unit (52) includes a plurality of heating lines arranged parallel to the first axial direction (X-axis direction). In this case, only the first heating unit (51) may be implemented such that it includes the heating lines, only the second heating unit (52) may be implemented such that it includes the heating lines, or both the first heating unit (51) and the second heating unit (52) may be implemented such that it includes the heating lines. When the first heating unit (51) includes the heating lines, the heating lines may correspond to the first heating lines (511). When the second heating unit (52) includes the heating lines, the heating lines may correspond to the second heating lines (521). Each of the above heating lines may be positioned at an equal distance from the partition walls (44) based on the second axial direction (Y-axis direction). Each of the above heating lines may also be positioned at a position where the partition walls (44) are formed based on the second axial direction (Y-axis direction).

[0119] Referring to FIGS. 1 to 10, the heating unit (5) may include a third heating unit (53).

[0120] The third heating unit (53) can heat the main body (42) from the side of the main body (42) as illustrated in FIG. 10. The third heating unit (53) can be coupled to the side of the main body (42) from the outside of the main body (42). The third heating unit (53) can be arranged to surround the side of the main body (42). The third heating unit (53) heats the side of the main body (42), thereby heating the raw material stored in the storage unit (40) through the side of the main body (42). When the heating unit (5) includes all of the third heating unit (53), the second heating unit (52), and the first heating unit (51), the raw material stored in the storage unit (40) can be heated more uniformly through the side of the main body (42), the upper portion of the main body (42), and the lower portion of the main body (42).

[0121] Referring to FIGS. 1 to 10, the raw material supply device (1) may include an injection unit (6) and a plurality of injection valves (7).

[0122] The above injection unit (6) may be connected to a carrier gas storage unit (200). The injection unit (6) may have the canisters (4) connected to one side, and the other side may be connected to the carrier gas storage unit (200) in which the carrier gas is stored. Accordingly, the carrier gas stored in the carrier gas storage unit (200) may be supplied to each of the canisters (4) through the injection unit (6). The injection unit (6) may be connected to the carrier gas storage unit (200) through an injection line (6a). The injection line (6a) may be implemented using at least one of a pipe, a hose, and a hole formed in a block. The carrier gas may be an inert gas such as argon (Ar). The carrier gas may provide a fluid force to cause the raw material stored in the canister (4) to flow toward the chamber (11), thereby allowing the raw material to be smoothly supplied toward the chamber (11).

[0123] Meanwhile, the raw material supply device (1) can selectively use a carrier gas when supplying raw materials to the chamber (11) depending on the type of raw materials stored in the canisters (4), whether they are in a liquid or solid state, etc. In this case, the types of raw materials stored in the canisters (4) may include molybdenum, parylene, perylene, organic polymers, etc. When a carrier gas is required when supplying the raw materials stored in the canisters (4) to the chamber (11), the raw material supply device (1) can supply the carrier gas to the canisters (4) using the injection unit (6) and the injection valves (7). When a carrier gas is not required when supplying the raw materials stored in the canisters (4) to the chamber (11), the raw material supply device (1) may not supply the carrier gas to the canisters (4).

[0124] The canisters (4) can be connected in parallel to the injection unit (6). In this case, the canisters (4) can be individually connected to the carrier gas storage unit (200) through the injection unit (6). Accordingly, the injection unit (6) can be implemented so that only some of the canisters (4) can be connected to allow fluid flow, thereby supplying carrier gas supplied from the carrier gas storage unit (200) to the corresponding canisters (4). Therefore, when compared to the comparative example in which the canisters (4) are connected in series to the injection unit (6), the substrate processing device (10) according to the present invention can continuously supply raw materials to the chamber (11) using carrier gas by connecting another canister (4) to the carrier gas storage unit (200) through the injection unit (6) so that the fluid can flow when the raw material in the canister (4) is exhausted. Accordingly, even if a canister (4) whose raw material is exhausted is generated, the substrate processing device (10) according to the present invention can continuously perform the work of supplying carrier gas to the canister (4) and the work of supplying raw materials to the chamber without interruption, and thus the processing process performed in the chamber (11) can also be continuously performed without interruption. Therefore, the substrate processing device (10) according to the present invention can increase the productivity of the substrate (100) on which the processing process is performed.

[0125] The canisters (4) can be detachably mounted on the injection unit (6). Accordingly, the substrate processing device (10) according to the present invention is implemented so that even while some of the canisters (4) are being replaced, the work of supplying carrier gas to the canisters (4) and the work of supplying raw materials to the chamber can be continuously performed using the remaining canisters (4). Accordingly, the substrate processing device (10) according to the present invention can continuously perform the processing process performed in the chamber (11) without interruption even while some of the canisters (4) are being replaced. Accordingly, the substrate processing device (10) according to the present invention can not only increase the productivity of the substrate (100) on which the processing process has been performed, but also improve the ease of replacing the canisters (4). The above canisters (4) can be individually and detachably mounted to the injection unit (6) through a fastening method, a force-fit method, etc. using a fastening means such as bolts.

[0126] The above injection unit (6) may include a plurality of injection ports (61) and injection passages (62).

[0127] The above injection ports (61) can be connected to each of the canisters (4). The canisters (4) can be detachably mounted to each of the injection ports (61). The injection ports (61) can be coupled to an injection body (60). The injection body (60) can form the overall appearance of the injection unit (6). The injection body (60) can be formed in a rectangular shape that extends long along the vertical direction (Z-axis direction), but is not limited thereto, and can be formed in another shape, such as a rectangular cylindrical shape, as long as the canisters (4) and the carrier gas storage unit (200) can be connected to allow fluid flow.

[0128] The above injection passage (62) may be connected to the carrier gas storage unit (200). The injection ports (61) may be connected to the injection passage (62) so that fluid may flow therethrough. Accordingly, all of the canisters (4) may be connected in parallel to the injection passage (62) through the injection ports (61), thereby supplying carrier gas from the carrier gas storage unit (200) through the injection ports (61) and the injection passage (62). The injection passage (62) may be arranged inside the injection body (60). The injection passage (62) may be implemented as a groove formed inside the injection body (60). In this case, the injection ports (61) may include portholes through which the carrier gas may flow, and may be connected to the injection passage (62) through the portholes. The above injection passage (62) may be formed to extend along the vertical direction (Z-axis direction). In this case, the injection ports (61) may be arranged to be spaced apart from each other along the vertical direction (Z-axis direction) in the injection body (60). The injection ports (61) may be arranged to be spaced apart from each other along the vertical direction (Z-axis direction) so that the fluid may be connected to different parts of the injection passage (62) to allow the flow of fluid. Accordingly, the canisters (4) may be detachably mounted on the injection ports (61) and stacked along the vertical direction (Z-axis direction). Therefore, the substrate processing apparatus (10) according to the present invention can reduce the installation area occupied by the canisters (4) within the work site based on the horizontal direction perpendicular to the vertical direction (Z-axis direction). In addition, even if the number of canisters (4) is increased in the substrate processing device (10) according to the present invention, the installation area occupied by the canisters (4) in the work place based on the horizontal direction does not increase. Therefore, the substrate processing device (10) according to the present invention can contribute to improving the space utilization of the installation area of ​​the work place by providing the canisters (4).

[0129] Referring to FIGS. 1 to 10, the injection valves (7, illustrated in FIG. 4) can individually open or close each of the canisters (4) to the interior of the injection portion (6). When a canister (4) among the canisters (4) requires replacement, such as when the raw material is exhausted, the injection valves (7) can block the fluid-flowable connection between the corresponding canister (4) and the interior of the injection portion (6), while allowing the fluid-flowable connection between another canister (4) and the interior of the injection portion (6). Accordingly, the substrate processing device (10) according to the present invention can continue to perform the processing process in the chamber (11) without interruption even while the replacement process is performed on some of the canisters (4), thereby increasing the productivity of the substrate (100) on which the processing process is performed, and improving the ease of the replacement process for the canisters (4).

[0130] The above injection valves (7) can individually open or close each of the canisters (4) and the injection passage (62). The injection valves (7) individually open and close the passages through which the canisters (4) and the injection passage (62) are connected to each other so that the fluid can flow therethrough, thereby individually connecting the canisters (4) to the injection passage (62). The injection valves (7) can be coupled to each of the canisters (4). Accordingly, a canister (4) separated from the injection portion (6) for replacement can be maintained in a state in which the passage is closed by the injection valves (7). The injection valves (7) can also be coupled to the injection portion (6). In this case, the injection valves (7) can be coupled to the injection ports (61). The injection valve (7) may be coupled to both the above canisters (4) and the above injection ports (61).

[0131] For example, as illustrated in FIG. 4, when three canisters (4a, 4b, 4c) are connected in parallel to the injection unit (6), three injection valves (7a, 7b, 7c) may be provided. The injection valves (7a, 7b, 7c) can individually selectively open or close each of the canisters (4a, 4b, 4c) with respect to the injection passage (62). Although not illustrated, two or four or more canisters (4) may be connected in parallel to the injection unit (6). In this case, the raw material supply device (1) may include the same number of injection valves (7) as the canisters (4).

[0132] Meanwhile, when the above injection unit (6) is provided, each of the canisters (4) may include an injection block (45).

[0133] The above injection blocks (45) can be mounted on the injection unit (6). The canisters (4) can be mounted on the injection unit (6) through the injection blocks (45). When the injection blocks (45) are mounted on the injection unit (6), the internal space of the canisters (4) and the injection ports (61) can be connected to enable the flow of fluid. Accordingly, the internal space of the canisters (4) can be connected to the injection passage (62) through the injection blocks (45) and the injection ports (61) to enable the flow of fluid, thereby enabling the flow of fluid to be connected to the carrier gas storage unit (200) through the injection passage (62). The injection blocks (45) include injection holes for the flow of carrier gas, and can be connected to the port holes of the injection ports (61) through the injection holes. The injection valves (7) can be connected to and operate respectively with respect to the injection blocks (45). In this case, the injection valves (7) are coupled to each of the injection blocks (47) so that the injection blocks (45) and the injection ports (61) can be individually opened or closed. The injection valves (7) can individually open and close the injection holes.

[0134] Meanwhile, when the injection unit (6) is provided, the main body (42) may include an inlet unit (426). The inlet unit (426) may be connected to the storage unit (40) and the injection block (45) so that fluid flow is possible. Accordingly, the carrier gas may be introduced into the storage unit (40) through the injection block (45) and the inlet unit (426) and then supplied to the connection unit (2) together with the raw material through the discharge unit (425) and the supply block (41). The inlet unit (426) may protrude upward from the bottom wall (420). The inlet unit (426) may be arranged at a portion where the first side wall (421) and the fourth side wall (424) contact each other. In this case, the inlet (426) may protrude from each of the first side wall (411) and the fourth side wall (424) toward the storage unit (40).

[0135] The above inlet (426) may include an inlet groove (426a) and an inlet port (426b).

[0136] The above inlet groove (426a) may be formed on the upper surface of the inlet portion (426). The inlet groove (426a) may be implemented as a groove formed with a certain depth on the upper surface of the inlet portion (426). The inlet groove (426a) may be formed to allow the flow of fluid to each of the storage portion (40) and the inlet port (426b). Based on the up-down direction (Z-axis direction), the length of the inlet groove (426a) may be formed to be shorter than the distance between the lower end of the inlet groove (426a) and the upper surface of the bottom wall (420). Accordingly, an inlet protrusion (426c) may be formed between the lower end of the inlet groove (426a) and the upper surface of the bottom wall (420) based on the up-down direction (Z-axis direction). Accordingly, the inlet (426) can be implemented so that the raw material stored in the storage (40) can rise to a height higher than the inlet ledge (426c) to pass over the inlet ledge (426c) and enter the inlet groove (426a). That is, the inlet ledge (426c) can block the raw material stored in the storage (40) from flowing back into the inlet groove (426a).

[0137] The above inlet (426b) can introduce raw materials. The inlet (426b) can be connected to the inlet groove (426a) and the injection block (45) so that fluid can flow therethrough. The inlet (426b) can be formed by penetrating the fourth side wall (424). In this case, the inlet (426b) and the outlet (425b) can be formed in side walls that are arranged to face each other among the side walls of the main body (42). Accordingly, the canister (4) can increase the flow distance of the raw material flowing along the storage unit (40). The inlet (426b) can be connected to the injection hole of the injection block (45) so that fluid can flow therethrough. Based on the above vertical direction (Z-axis direction), the inlet (426b) may be positioned at a position where the distance from the bottom surface of the main body (42) is longer than the distance from the top surface of the main body (42). That is, the inlet (426b) may be positioned closer to the top surface of the main body (42) than to the bottom surface of the main body (42).

[0138] As illustrated in FIG. 6, the inlet portion (426) and the outlet portion (425) may be formed adjacent to the first side wall (421) with respect to the first axial direction (X-axis direction). In this case, the inlet portion (426) and the outlet portion (425) may be positioned at a shorter distance from the first side wall (421) than the distance from the second side wall (422) with respect to the first axial direction (X-axis direction). That is, the inlet portion (426) and the outlet portion (425) may be positioned closer to the first side wall (421) than to the second side wall (422). The inlet portion (426) and the outlet portion (425) may also be positioned on the same line with respect to the first axial direction (X-axis direction). In this case, the same line may be parallel to the second axial direction (Y-axis direction). When the inlet (426) and the outlet (425) are each formed adjacent to the first side wall (421) based on the first axial direction (X-axis direction), the canister (4) may include an odd number of the partition walls (44).

[0139] Meanwhile, the canister (4) can be implemented in a modified embodiment as follows depending on the arrangement of the partition walls (44). Since the modified embodiment of the canister (4) is implemented to be approximately the same as the embodiment of the canister (4) described above, the following description will focus on the differences.

[0140] Referring to FIGS. 1 to 10, according to a modified embodiment of the canister (4), each of the partition walls (44) may be arranged to be spaced apart from each of the first side wall (421) and the second side wall (422) based on the first axial direction (X-axis direction). As illustrated in FIG. 10, the interval (44b) at which each of the partition walls (44) is spaced apart from the first side wall (421) based on the first axial direction (X-axis direction) may be formed as the first interval. In this case, each of the partition walls (44) may be arranged to be spaced apart from the first side wall (421) by the first interval based on the first axial direction (X-axis direction). The interval (44c) at which each of the partition walls (44) is spaced apart from the second side wall (422) with respect to the first axial direction (X-axis direction) may be formed as the first interval. In this case, each of the partition walls (44) may be arranged to be spaced apart from the second side wall (422) with respect to the first axial direction (X-axis direction) with respect to the first axial direction. The interval (44a) at which the partition walls (44) are spaced apart from each other with respect to the second axial direction (Y-axis direction) may be formed as the first interval. In this case, the partition walls (44) may be arranged to be spaced apart from each other with respect to the second axial direction (Y-axis direction). Accordingly, the modified embodiment of the canister (4) can improve the uniformity of the phase change of the raw material by being implemented so that the raw material flows along a flow path having a uniform width. In addition, the modified embodiment of the canister (4) can prevent heat loss to the outside through the first side wall (421) and the second side wall (422) since the partition walls (44) are arranged spaced apart from both the first side wall (421) and the second side wall (422).

[0141] According to a modified embodiment of the canister (4), the inlet (426) and the outlet (425) may be arranged at positions spaced apart from each other with respect to the first axial direction (X-axis direction). Accordingly, even if the residence time of the raw material may be reduced by providing a passage through which the raw material can flow on each of the partition walls (44) with respect to the first axial direction (X-axis direction), the modified embodiment of the canister (4) can compensate for the residence time of the raw material by arranging the inlet (426) and the outlet (425) at positions spaced apart from each other with respect to the first axial direction (X-axis direction). Therefore, the modified embodiment of the canister (4) can increase the vaporization rate of the raw material stored in the storage unit (40). In this case, with respect to the first axial direction (X-axis direction), one of the inlet (426) and the outlet (425) may be formed adjacent to the first side wall (421), and the other may be formed adjacent to the second side wall (422). According to a modified embodiment of the canister (4), the distance (426d, illustrated in FIG. 10) at which the inlet (426) is spaced apart from the second side wall (422) and the distance (425d, illustrated in FIG. 10) at which the outlet (425) is spaced apart from the first side wall (421) with respect to the first axial direction (X-axis direction) may be the same. The distance (426d) at which the inlet (426) is spaced apart from the second side wall (422) may correspond to the distance at which the inlet (426b) and the second side wall (422) are spaced apart from each other. The distance (425d) at which the discharge portion (425) is spaced from the first side wall (421) may correspond to the distance at which the discharge port (425b) is spaced from the first side wall (421).

[0142] A modified embodiment of the above canister (4) may include a first compartment plate (40a) and a second compartment plate (40b).

[0143] The first partition plate (40a) may protrude from the second side wall (422) toward the first side wall (421). The first partition plate (40a) may be spaced apart from the first side wall (421) based on the first axial direction (X-axis direction). Accordingly, the modified embodiment of the canister (4) is implemented so that the carrier gas introduced through the inlet (426) flows toward the first side wall (421) along the space between the fourth side wall (424) and the first partition plate (40a) and then passes through the first partition plate (40a) only between the first partition plate (40a) and the first side wall (421). Therefore, the modified embodiment of the canister (4) can increase the flow distance and residence time of the carrier gas and the raw material, respectively, by using the first partition plate (40a). Based on the first axis direction (X-axis direction), the first partition plate (40a) and the first side wall (421) can be spaced apart by the first interval.

[0144] The second partition plate (40b) may protrude from the first side wall (421) toward the second side wall (422). The second partition plate (40b) may be spaced apart from the second side wall (422) based on the first axial direction (X-axis direction). Accordingly, the modified embodiment of the canister (4) is implemented so that the carrier gas and the raw material can pass through the second partition plate (40b) only between the second partition plate (40b) and the second side wall (422), and the carrier gas and the raw material that have passed through the second partition plate (40b) can flow toward the first side wall (421) along the space between the third side wall (423) and the second partition plate (40b) to reach the discharge portion (425). Therefore, the modified embodiment of the canister (4) can increase the flow distance and residence time of the carrier gas and the raw material, respectively, by using the second partition plate (40b).

[0145] Referring to FIGS. 1 to 11, the raw material supply device (1) may include an acquisition unit (8).

[0146] The above-described acquisition unit (8) can acquire the storage amount of the raw material stored in each of the canisters (4). The acquisition unit (8) can acquire the storage amount of the raw material by using at least one of the internal pressure and the vaporization amount of each of the canisters (4). At least one of the storage amount of the raw material according to the internal pressure of each of the canisters (4) and the storage amount of the raw material according to the vaporization amount of each of the canisters (4) can be derived through a prior test or the like and stored in advance in the acquisition unit (8). When the acquisition unit (8) acquires the storage amount of the raw material by using the internal pressure of each of the canisters (4), the acquisition unit (8) can include pressure sensors installed in the canisters (4). When the acquisition unit (8) acquires the storage amount of the raw material by using the vaporization amount of each of the canisters (4), the acquisition unit (8) can include mass flow meters (MFMs) installed in the supply blocks (41).

[0147] The above-described acquisition unit (8) can provide the storage amount of the acquired raw material to the supply valves (3). The acquisition unit (8) can provide the storage amount of the acquired raw material to the supply valves (3) through wired communication, wireless communication, etc. The supply valves (3) can use the storage amount of the raw material acquired by the acquisition unit (8) to close a canister (4) in which the raw material remains below a preset reference amount, and to open a canister (4) in which the raw material remains above the reference amount. Accordingly, the raw material supply device (1) can prevent raw material of low quality from being supplied to the chamber (11) by blocking the supply of raw material from a canister (4) in which the raw material remains below the reference amount. In addition, when the amount of raw material stored in the canister (4) that supplied the raw material to the chamber (11) falls below the reference amount, the raw material supply device (1) can automatically connect the canister (4) having the amount of raw material stored greater than the reference amount to the chamber (11) using the acquisition unit (8) and the supply valves (3) so that the fluid can flow. Therefore, the raw material supply device (1) can improve the stability of raw material supply to the chamber (11).

[0148] The above-described acquisition unit (8) may also measure the internal temperature of each of the canisters (4). In this case, the acquisition unit (8) may include temperature sensors installed in the canisters (4). The acquisition unit (8) may provide the acquired temperature to the heating units (5). The acquisition unit (8) may provide the acquired temperature to the heating units (5) through wired communication, wireless communication, or the like. The heating units (5) may use the temperature acquired by the acquisition unit (8) to control the heating temperature for heating the raw material. Accordingly, the raw material supply device (1) may improve the stability of the raw material supply to the chamber (11) by improving the stability of the vaporization of the raw material stored in the canister (4).

[0149] Referring to FIGS. 1 to 11, the raw material supply device (1) may include a control unit (9).

[0150] The above control unit (9) can control each of the heating units (5) so that the heating temperature for heating the raw material is adjusted according to the temperature acquired by the acquisition unit (8). The control unit (9) can receive the temperature from the acquisition unit (8) through wired communication, wireless communication, etc., and transmit a control signal to each of the heating units (5).

[0151] The above control unit (9) can control each of the supply valves (3) according to the storage amount of the raw material acquired by the acquisition unit (8). The control unit (9) can receive the storage amount of the raw material from the acquisition unit (8) through wired communication, wireless communication, etc., and transmit a control signal to each of the supply valves (3).

[0152] Referring to FIGS. 1 to 12, the substrate processing device (10) according to the present invention may include the connecting line (14) and the switching unit (15).

[0153] The above connecting line (14) can be connected to the chamber (11). The connecting line (14) can also be connected to the injection unit (13) arranged inside the chamber (11). A plurality of the raw material supply devices (1) can be connected to the connecting line (14). For example, as shown in Fig. 12, two raw material supply devices (1a, 1b) can be connected to the connecting line (14). In this case, the connecting portions (2) of each of the raw material supply devices (1a, 1b) can be connected to the connecting line (14).

[0154] The switching unit (15) may be coupled to the connecting line (14). The switching unit (15) may be coupled to the connecting line (14) so ​​as to be arranged between the chamber (11) and the raw material supply devices (1). By the switching unit (15), either the first raw material supply device (1a) among the raw material supply devices (1) or the second raw material supply device (1b) among the raw material supply devices (1) may supply raw materials through the injection unit (13). In this case, the switching unit (15) may connect either the first raw material supply device (1a) or the second raw material supply device (1b) to the injection unit (13). For example, when an abnormality, such as a breakdown, occurs in the first raw material supply device (1a) while the first raw material supply device (1a) is connected to the injection unit (13), the switching unit (15) can block the connection between the first raw material supply device (1a) and the injection unit (13) and simultaneously allow the connection between the second raw material supply device (1b) and the injection unit (13). In this way, the substrate processing device (10) according to the present invention is implemented so that, when an abnormality occurs in the raw material supply device (1) connected to the injection unit (13) among the raw material supply devices (1), the raw material can be continuously supplied to the chamber (11) by connecting any one of the remaining raw material supply devices (1) to the injection unit (13). Therefore, the substrate processing device (10) according to the present invention can improve the stability of the raw material supply to the chamber (11), thereby improving the stability of the processing process. The switching unit (15) may include a valve.

[0155] When the switching unit (15) is provided, the connecting line (14) may include a plurality of branch lines. One side of the branch lines may be connected to each of the raw material supply devices (1). The other side of the branch lines may be connected to the switching unit (15). The switching unit (15) and the injection unit (13) may be connected through a single connecting line (14).

[0156] Hereinafter, an embodiment of a raw material supply method according to the present invention will be described in detail with reference to the attached drawings.

[0157] Referring to FIGS. 1 to 12, a raw material supply method according to the present invention is for supplying raw materials to the chamber (11). The raw material supply method according to the present invention can be performed by the raw material supply device (1) of the substrate processing device (10) according to the present invention described above. The raw material supply method according to the present invention can include the following steps.

[0158] First, the raw material of the first canister (4a) among the canisters (4) is vaporized and supplied to the chamber (11). This step can be accomplished by vaporizing the raw material stored in the storage portion (40) of the first canister (4a) and supplying it to the chamber (11) through the connection portion (2). In this case, among the supply valves (3), only the first supply valve (3a) can open the passage connecting the first canister (4a) and the supply passage (22) to allow the fluid to flow. Among the supply valves (3), the remaining supply valves (3) can close the passages connecting the canisters (4) and the supply passage (22) to allow the fluid to flow. Therefore, among the canisters (4), only the first canister (4a) can vaporize the raw material and supply it to the chamber (11). The step of vaporizing the raw material of the first canister and supplying it to the chamber may supply a carrier gas to the first canister (4a). In this case, among the injection valves (7), only the first injection valve (7a) may open the passage connecting the first canister (4a) and the injection passage (62) to allow the fluid to flow. Among the injection valves (7), the remaining injection valves (7) may close the passages connecting the canisters (4) and the injection passage (62) to allow the fluid to flow.

[0159] Next, it is monitored whether an acquisition value including at least one of the internal pressure of the first canister (4a) and the vaporization amount of the first canister (4a) is lower than a preset value. This step can be achieved by the acquisition unit (8) measuring at least one of the internal pressure of the first canister (4a) and the vaporization amount of the first canister (4a) to acquire the acquisition value, and comparing the acquired value with the value. The value is an acquisition value that affects the processing process by changing the raw material supply status to the chamber (11) according to the storage amount of the raw material stored in the canister (4), and can be derived through a preliminary test or the like and stored in advance in the acquisition unit (8).

[0160] Next, when the obtained value becomes lower than the above value, the raw material of the second canister (4b) among the canisters (4) is vaporized and supplied to the chamber. This step can be achieved by vaporizing the raw material stored in the storage portion (40) of the second canister (4b) and supplying it to the chamber (11) through the connection portion (2). In this case, the second supply valve (3b) among the supply valves (3) can open the passage connecting the second canister (4b) and the supply passage (22) to allow the fluid to flow. Since the first supply valve (3a) is in a state where the passage connecting the first canister (4a) and the supply passage (22) to allow the fluid to flow is opened, the raw material stored in the second canister (4b) and the raw material stored in the first canister (4a) can be supplied together to the chamber (11). The step of vaporizing the raw material of the second canister and supplying it to the chamber may supply carrier gas to the second canister (4b). In this case, among the injection valves (7), the second injection valve (7b) may open a passage connecting the second canister (4b) and the injection passage (62) to allow fluid flow.

[0161] Next, the supply of the first canister (4a) is stopped. This step can be achieved by the first supply valve (3a) closing the passage connecting the first canister (4a) and the supply passage (22) to allow the flow of fluid. Accordingly, among the canisters (4), only the second canister (4b) can vaporize the raw material and supply it to the chamber (11). While the second canister (4b) is supplying the raw material to the chamber (11), the first canister (4a) can be separated from the connection part (2) and replaced with another canister (4). The step of stopping the supply of the first canister can stop the supply of carrier gas to the first canister (4a). In this case, the first injection valve (7a) can close the passage connecting the first canister (4a) and the injection passage (62) to allow fluid flow.

[0162] Here, the step of stopping the supply of the first canister may be performed by reducing the supply amount of the first canister (4a) for a preset standard time when the obtained value becomes lower than the value, and then stopping the supply of the first canister (4a) when the standard time is reached. The standard time is the time taken from the time the canister (4) starts vaporizing the raw material until the vaporization of the raw material becomes stable, and may be derived through a preliminary test or the like and stored in advance in the control unit (9).

[0163] In this case, the step of vaporizing the raw material of the second canister and supplying it to the chamber may be performed by increasing the supply amount of the raw material of the second canister (4b) to a preset standard supply amount during the standard time when the obtained value is lower than the value, and then supplying the raw material of the second canister (4b) to the chamber (11) at the standard supply amount when the standard time is reached. The standard supply amount is the flow rate of the raw material required to perform the processing process, and may be derived through a prior test or the like and stored in advance in the control unit (9).

[0164] In this way, the raw material supply method according to the present invention can be implemented so that, when the raw material storage capacity of the first canister (4a) that supplied the raw material to the chamber (11) is exhausted and the raw material supply to the chamber (11) is replaced with the second canister (4b), the raw material supply amount of the first canister (4a) to the chamber (11) is reduced while the raw material supply amount of the second canister (4b) is increased through a section in which only the second canister (4b) supplies the raw material. Therefore, the raw material supply method according to the present invention can contribute to improving the quality of the substrate on which the processing process is performed by stably supplying the raw material even in the process of changing the canister (4) that supplies the raw material to the chamber (11).

[0165] The present invention described above is not limited to the above-described embodiments and the attached drawings, and it will be apparent to a person skilled in the art to which the present invention pertains that various substitutions, modifications, and changes are possible within a scope that does not depart from the technical spirit of the present invention.

Claims

1. A raw material supply device for supplying raw materials to a chamber where a processing process for a substrate is performed. Multiple canisters for storing raw materials; A connecting portion having the canisters connected on one side and the chamber connected on the other side; and Each of said canisters comprises a plurality of supply valves individually configured to selectively open or close the interior of said connection portion; Each of the above canisters includes a heating element for heating the raw material, A raw material supply device characterized in that each of the canisters is detachably mounted on the above connecting portion.

2. In paragraph 1, A raw material supply device, characterized in that the above connecting part includes a heater for heating the raw material.

3. In paragraph 1, Each of the above canisters comprises a supply block for mounting to the above connecting member, A raw material supply device characterized in that the above supply valves are connected to and operate respectively with the above supply blocks.

4. In paragraph 1, An injection unit having the canisters connected on one side and a carrier gas storage unit having a carrier gas stored on the other side; and A raw material supply device characterized in that each of the canisters includes a plurality of injection valves that individually open or close the interior of the injection portion and selectively open or close the interior of the injection portion.

5. In paragraph 4, Each of the above canisters comprises an injection block for mounting in the injection unit, A raw material supply device characterized in that the above injection valves are connected to and operate respectively with the above injection blocks.

6. In paragraph 1, Each of the above canisters includes a body for storing raw materials, A raw material supply device, characterized in that the heating unit includes a first heating unit that heats the main body at the lower portion of the main body, and a second heating unit that heats the main body at the upper portion of the main body.

7. In paragraph 6, The above body includes a first side wall and a second side wall spaced apart from each other along the first axis direction, A raw material supply device characterized in that the canister includes a plurality of baffles arranged spaced apart along a second axial direction perpendicular to the first axial direction to form the interior of the main body into a flow path in which the flow direction is changed.

8. In paragraph 7, Among the above bulkheads, the first bulkheads arranged at odd positions based on the second axial direction protrude from the first side wall toward the second side wall and are spaced apart from the second side wall based on the first axial direction. A raw material supply device characterized in that the second bulkheads, which are arranged in even numbers based on the second axial direction among the bulkheads, protrude from the second side wall toward the first side wall and are spaced apart from the first side wall based on the first axial direction.

9. In paragraph 8, The first bulkhead and the second bulkhead are arranged spaced apart from each other by a first interval based on the second axial direction, Each of the above first bulkheads is spaced apart from the second side wall by the first interval based on the first axial direction, A raw material supply device, characterized in that each of the second bulkheads is spaced apart from the first side wall by the first interval based on the first axial direction.

10. In paragraph 7, A raw material supply device, characterized in that each of the above bulkheads is arranged to be spaced apart from the first side wall by a first interval based on the first axial direction, and is spaced apart from the second side wall by the first interval based on the first axial direction.

11. In paragraph 10, each of the canisters Third side walls and fourth side walls are arranged spaced apart from each other along the second axis direction; An inlet into which raw materials are introduced; and A raw material supply device characterized by including a discharge portion through which raw materials are discharged.

12. In paragraph 11, Each of the above inlet and outlet is formed adjacent to the first side wall based on the first axial direction, or A raw material supply device, characterized in that one of the inlet and outlet portions is formed adjacent to the first side wall with respect to the first axial direction, and the other is formed adjacent to the second side wall with respect to the first axial direction.

13. In paragraph 7, At least one of the first heating unit and the second heating unit includes a plurality of heating lines arranged parallel to the first axial direction, A raw material supply device, characterized in that each of the above heating lines is arranged at an equal distance from the bulkheads based on the second axial direction.

14. In paragraph 7, At least one of the first heating unit and the second heating unit includes a plurality of heating lines arranged parallel to the first axial direction, A raw material supply device, characterized in that each of the above heating lines is arranged at a position where the bulkhead is formed based on the second axial direction.

15. In paragraph 6, A raw material supply device, characterized in that the heating unit includes a third heating unit that heats the main body on the side of the main body.

16. In paragraph 7, A raw material supply device characterized in that the above bulkheads are joined to the main body so as to be in contact with the lower part of the main body and the upper part of the main body, respectively.

17. In paragraph 1, An acquisition unit for acquiring the internal temperature of each of the above canisters; and A raw material supply device characterized by including a control unit that controls each of the heating units so that the heating temperature for heating the raw material is adjusted according to the temperature acquired by the acquiring unit.

18. In paragraph 1, Including an acquisition unit for acquiring the storage amount of raw materials stored in each of the above canisters, A raw material supply device characterized in that the above supply valves close a canister in which the raw material remaining is less than a preset standard amount by using the storage amount of the raw material obtained by the above obtaining unit, and open a canister in which the raw material remaining is more than the standard amount.

19. Chamber; A substrate support member disposed inside the chamber and supporting one or more substrates; A spray unit for spraying raw materials toward the substrate support unit; and A substrate processing device including a raw material supply device according to any one of claims 1 to 20 for supplying raw materials to the injection unit.

20. In paragraph 19, A connecting line connected to the above injection unit, and a switching unit coupled to the connecting line, A plurality of the above raw material supply devices are connected to the above connecting line. A substrate processing device characterized in that one of the first raw material supply device among the raw material supply devices and the second raw material supply device among the raw material supply devices supplies the raw material through the injection unit by the switching unit.

21. A raw material supply method of a raw material supply device including a plurality of canisters, A step of vaporizing the raw material of the first canister among the above canisters and supplying it to the chamber; A step of monitoring whether an acquisition value including at least one of the internal pressure of the first canister and the vaporization amount of the first canister is lower than a preset value; When the above-mentioned acquisition value becomes lower than the above-mentioned value, a step of vaporizing the raw material of the second canister among the canisters and supplying it to the chamber; and A raw material supply method comprising a step of stopping the supply of the first canister.

22. In paragraph 21, The step of stopping the supply of the first canister is to reduce the supply amount of the first canister for a preset standard time when the acquisition value becomes lower than the value, and then stop the supply of the first canister when the standard time is reached. A raw material supply method characterized in that the step of vaporizing the raw material of the second canister and supplying it to the chamber comprises: when the obtained value becomes lower than or equal to the value, increasing the supply amount of the raw material of the second canister to a preset standard supply amount during the standard time; and then supplying the raw material of the second canister to the chamber at the standard supply amount when the standard time is reached.

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