Transport unit and substrate transport apparatus comprising same

Abstract

The present invention relates to a transport unit and a substrate transport apparatus comprising same, more specifically to a transport unit using magnetic levitation in vacuum to transport substrates and a substrate transport apparatus comprising same. The present invention provides a transport unit for transporting a substrate (1) by magnetically levitating and moving same via stators (200) that create electromagnetic field, the transport unit comprising: a permanent magnet part (300) that magnetically levitates due to the electromagnetic force of the stators (200); and a substrate support unit (400) having one end coupled to the side of the permanent magnet unit (300) facing the stators (200) and the other end supporting the substrate (1).

Description

Return unit and substrate return device including the same

[0001] The present invention relates to a transfer unit and a substrate transfer device including the same, and more particularly, to a transfer unit for transferring a substrate using magnetic levitation in a vacuum environment and a substrate transfer device including the same.

[0002] In general, a substrate processing system includes a load lock module that introduces a substrate and switches the pressure between the outside and the inside of the substrate processing system, a substrate return device that returns the substrate introduced through the load lock module, and a substrate processing device that is installed adjacent to the substrate return device and processes the introduced substrate.

[0003] At this time, the substrate transfer device transfers the substrate to be processed to the substrate processing device under a vacuum pressure atmosphere, or transfers the processed substrate from the substrate processing device to the load lock module.

[0004] Meanwhile, conventional substrate transport devices use a transport robot having a multi-joint arm for transporting substrates and a rotary motor for driving the transport robot. However, there are problems in that the driving range and application, such as turning and stretching of the transport robot, are limited due to the rotary motor, and various particles may be generated due to friction.

[0005] Due to this, a substrate transport device utilizing a planar motor driven by magnetic levitation has been proposed recently, but there is a problem that the stator cannot be placed within a high-vacuum transport space, and if the stator is placed outside the transport space, the electromagnetic force for driving the transport unit including the permanent magnet is not sufficiently transmitted, making it impossible or limited to implement and control magnetic levitation.

[0006] In order to improve such problems, the gap between the stator placed outside the return space and the return unit within the return space was minimized, and the wall of the chamber forming the return space was configured to be thin. However, in this case, there is a problem in that the wall of the chamber is deformed and the flatness is reduced depending on the high vacuum of the return space, resulting in uneven control depending on the position of the return unit.

[0007] Furthermore, since the transport unit that supports and transports a relatively high-temperature substrate is magnetically levitated and located in a vacuum transport space, the transport unit cannot discharge heat and static electricity transferred from the substrate and accumulates them, making particle management difficult.

[0008] In particular, the return unit placed in a vacuum space has a problem in that it does not have a separate medium for releasing heat, so heat release through conduction and radiation is not performed, and thus a high temperature is maintained, and various particles are scattered accordingly.

[0009] The purpose of the present invention is to provide a transfer unit capable of transferring a substrate using magnetic levitation in a vacuum environment and a substrate transfer device including the same, in order to solve the above-described problems.

[0010] The present invention has been created to achieve the above-described object of the present invention, and the present invention discloses a transport unit that transports a substrate (1) by moving by magnetic levitation through a stator portion (200) that generates an electromagnetic field, the transport unit including a permanent magnet portion (300) for magnetic levitation by the electromagnetic field according to the stator portion (200); and a substrate support portion (400) having one end coupled to an opposite surface of the permanent magnet portion (300) toward the stator portion (200) and supporting the substrate (1) at the other end.

[0011] The above substrate support part (400) may include a coupling part (410) coupled to the permanent magnet part (300), a support part (420) supporting the substrate (1), and a connecting part (430) connecting the coupling part (410) and the support part (420).

[0012] The above connecting portion (430) may include a vertical connecting portion (431) extending vertically from the connecting portion (410), and a horizontal connecting portion (432) extending horizontally from the vertical connecting portion (431) and connected to the support portion (420).

[0013] The above vertical connection part (431) can be installed in contact with and guided to a groove part (301) formed at a corresponding position on the side of the permanent magnet part (300).

[0014] The above substrate support member (400) may include at least one material among aluminum, stainless steel, and ceramic so that the electromagnetic field generated through the stator member (200) is transmitted toward the permanent magnet member (300).

[0015] The above substrate support member (400) may be made of a ceramic material with a conductive material coated on the surface opposite to the permanent magnet member (300).

[0016] In addition, the present invention discloses a substrate transport device including a chamber part (100) forming a vacuum space (S) inside; a transport unit (10) that transports a substrate (1) by moving by magnetic levitation within the vacuum space (S); and a plurality of stator parts (200) installed in the chamber part (100) and generating an electromagnetic field for magnetic levitation movement in the transport unit (10).

[0017] A control unit may additionally be included to control the movement of the return unit (10) by adjusting the electromagnetic field generated through the stator unit (200).

[0018] The above control unit can control the substrate support unit (400) to contact the inner surface of the chamber unit (100) that is maintained in a grounded state in order to discharge static electricity within the substrate support unit (400).

[0019] The chamber section (100) is formed with a grounding area (S1) maintained in a grounded state on a portion of the inner surface of the transfer area of ​​the transfer unit (10) formed through the stator section (200), and the control section can control the transfer unit (10) to move to the grounding area (S1) to bring the substrate support section (400) into contact with the grounding area (S1) in order to discharge static electricity within the substrate support section (400).

[0020] The chamber part (100) may include an electrostatic sensor that measures the static electricity of the substrate support part (400) within the vacuum space (S).

[0021] The above control unit can control the substrate support unit (400) to come into contact with the inner surface of the chamber unit (100) when the electrostatic value measured through the electrostatic sensor exceeds a preset value.

[0022] The above control unit can control the substrate support unit (400) to come into contact with the inner surface of the chamber unit (100) for heat dissipation of the substrate support unit (400).

[0023] The chamber section (100) has a heat dissipation area (S2) formed on a portion of the inner surface of the transfer area of ​​the transfer unit (10) formed through the stator section (200), and the control section can control the transfer unit (10) to move to the heat dissipation area (S2) to bring the substrate support section (400) into contact with the heat dissipation area (S2) in order to dissipate heat from the substrate support section (400).

[0024] At least one of the chamber portion (100) and the stator portion (200) corresponding to the heat dissipation area (S2) may include a cooling portion for heat exchange with the substrate support portion (400).

[0025] The above chamber part (100) may include a temperature sensor that measures the temperature of the substrate support part (400) within the vacuum space (S).

[0026] The above control unit can control the substrate support unit (400) to come into contact with the inner surface of the chamber unit (100) when the temperature value measured by the temperature sensor exceeds a preset value.

[0027] The above stator unit (200) may include a coil unit (210) that generates an electromagnetic field for magnetically levitating the return unit (10), a circuit unit (220) that controls the coil unit (210) and receives power from the outside, and a cooling unit (230) that cools the coil unit (210).

[0028] The return unit according to the present invention and the substrate return device including the same have the advantage of being capable of returning a substrate by magnetic levitation using a plane motor in a high vacuum space.

[0029] In particular, the return unit according to the present invention and the substrate return device including the same have the advantage of being able to provide sufficient electromagnetic force for magnetic levitation and drive control of the return unit within a vacuum space by arranging the stator portion in the installation groove of the chamber module, while also being able to implement a high-vacuum vacuum space without deformation of the chamber module.

[0030] That is, the transfer unit according to the present invention and the substrate transfer device including the same have the advantage of stably providing an electromagnetic force between a stator portion outside a vacuum space and a transfer unit inside a vacuum space while preventing deformation of a high-vacuum vacuum space, thereby maintaining the flatness of the inner surface of a chamber module forming a vacuum space, thereby maintaining the precision of movement of the transfer unit and transfer of the substrate.

[0031] In particular, the transport unit according to the present invention and the substrate transport device including the same have the advantage of maintaining a stable electrical state of the transport unit by discharging static electricity accumulated in the transport unit due to contact support of the substrate, and of enabling particle management.

[0032] In addition, the transfer unit according to the present invention and the substrate transfer device including the same have the advantage of being able to stably manage the temperature of the transfer unit and particles resulting therefrom by releasing heat transferred to the transfer unit by contact-supporting a relatively high-temperature substrate.

[0033] Fig. 1 is a cross-sectional view showing a substrate transport device according to the present invention.

[0034] Fig. 2 is a perspective view showing the bottom surface of the base plate of the chamber module according to the present invention.

[0035] Fig. 3 is a perspective view showing the insertion of the installation groove of the stator part among the chamber modules according to Fig. 2.

[0036] Fig. 4 is a perspective view showing the appearance of the stator part of the chamber module according to Fig. 2.

[0037] Fig. 5 is an exploded perspective view showing the configuration of the stator portion of the chamber module according to Fig. 2.

[0038] Fig. 6 is a cross-sectional view showing the installation of the stator part of the chamber module according to Fig. 2.

[0039] Fig. 7 is a drawing showing a return unit among the substrate return devices according to Fig. 1.

[0040] Fig. 8 is a cross-sectional view showing the heat dissipation or static electricity discharge of the transfer unit among the substrate transfer devices according to Fig. 7.

[0041] The return unit according to the present invention and the substrate return device including the same are described in detail with reference to the attached drawings.

[0042] The substrate transport device according to the present invention, as illustrated in FIG. 1, includes a chamber module (20) forming a vacuum space (S) therein; and a transport unit (10) disposed in the vacuum space (S) and transporting the substrate (1) by moving by magnetic levitation according to an electromagnetic force through the stator unit (200).

[0043] Here, the substrate (1) to be processed and returned according to the present invention may include a semiconductor substrate, a substrate used in a display device such as an LED or LCD, a solar cell substrate, a glass substrate, etc., and any type of target substrate disclosed in the past may be applied.

[0044] The above-described return unit (10) is placed in a sealed vacuum space (S) formed by a chamber module (20), and may be configured to return a substrate (1) by moving by magnetic levitation according to an electromagnetic force through a stator unit (200) described later.

[0045] That is, the above-mentioned return unit (10) is configured to move in a planar motor manner, and includes a permanent magnet inside, so that it can move by magnetic levitation according to the electromagnetic force generated through the stator unit (200) described later.

[0046] Meanwhile, the return unit according to the present invention will be described in detail with reference to the attached drawings as follows.

[0047] The transport unit according to the present invention, as illustrated in FIG. 7, is a transport unit that transports a substrate (1) by moving by magnetic levitation through a stator portion (200) that generates an electromagnetic force, and includes a permanent magnet portion (300) for magnetic levitation by the electromagnetic force according to the stator portion (200); and a substrate support portion (400) having one end coupled to an opposite surface of the permanent magnet portion (300) toward the stator portion (200) and the other end supporting the substrate (1).

[0048] For example, the above-mentioned return unit (10) may include a permanent magnet part (300) for magnetic levitation by electromagnetic force according to a stator part (200), and a substrate support part (400) that is installed in conjunction with the permanent magnet part (300) and supports a substrate (1).

[0049] The above permanent magnet part (300) is configured to induce magnetic levitation and movement by interacting with the electromagnetic force generated through the stator part (200), and various configurations are possible.

[0050] In particular, the permanent magnet part (300) can be applied as a plurality of permanent magnets arranged to move by acting on an electromagnetic field in which the stator part (200) is formed, and at this time, various shapes and structures disclosed in the past can be applied to the permanent magnets.

[0051] Furthermore, the permanent magnet part (300) can be applied with a specific arrangement of a plurality of permanent magnets, and for example, various types of Halbach Arrays disclosed in the past can be applied.

[0052] The above substrate support part (400) is configured to be installed in conjunction with the permanent magnet part (300) and supports the substrate (1), and various configurations are possible.

[0053] For example, the substrate support member (400) is installed in conjunction with a permanent magnet member (300) that moves through a stator member (200), and can move integrally with the movement of the permanent magnet member (300), and can support the substrate (1) by making contact with it.

[0054] At this time, the substrate support part (400) may be configured such that one end is coupled to the surface facing the stator part (200) of the permanent magnet part (300) and the other end supports the substrate (1).

[0055] That is, the substrate support part (400) can be coupled to the surface of the permanent magnet part (300) facing the stator part (200) so as to be positioned between the permanent magnet part (300) and the stator part (200) described later, thereby moving integrally with the permanent magnet part (300) and supporting and returning the substrate (1).

[0056] For example, the substrate support part (400) may include a coupling part (410) coupled to a permanent magnet part (300), a support part (420) supporting the substrate (1), and a connecting part (430) connecting the coupling part (410) and the support part (420), as illustrated in FIG. 7.

[0057] The above-mentioned coupling part (410) is configured to be coupled to the permanent magnet part (300), and various configurations are possible.

[0058] That is, the above-mentioned coupling portion (410) is formed in a planar shape corresponding to the permanent magnet portion (300) and can be coupled by making surface contact with the permanent magnet portion (300). For example, the above-mentioned coupling portion (410) is formed in a circular plate shape corresponding to the permanent magnet portion (300) having a circular planar shape and can be coupled by making contact with the opposite surface of the stator portion (200) among the permanent magnet portions (300).

[0059] At this time, the coupling portion (410) may be formed of a material that allows easy passage of an electromagnetic field to facilitate electromagnetic interaction between the permanent magnet portion (300) and the stator portion (200), and may be formed with a relatively thin thickness.

[0060] The above support member (420) is provided on the opposite side of the joint member (410) and is connected to the joint member (410) through the connection member (430) to support the substrate (1), and various configurations are possible.

[0061] For example, the support member (420) may be formed in a plate shape having a plane area greater than a certain size to stably support the substrate (1), and as another example, may be formed of a plurality of support members extending spaced apart from each other to stably support the substrate (1) while minimizing the contact area with the substrate (1).

[0062] In addition, the support member (420) can be positioned at a relatively higher position than the coupling member (410) by being connected through the connecting member (430) described later, and further, can be positioned at a relatively higher position than the permanent magnet member (300) to prevent contact with the bottom surface of the chamber member (100) due to some movement in the up-and-down direction while the substrate (1) is supported, and can stably return the substrate (1).

[0063] The above connecting portion (430) is a configuration that connects the joining portion (410) and the support portion (420), and various configurations are possible.

[0064] For example, the connecting portion (430) may include a vertical connecting portion (431) extending vertically from the connecting portion (410), and a horizontal connecting portion (432) extending horizontally from the vertical connecting portion (431) and connected to the support portion (420).

[0065] At this time, the vertical connection part (431) is formed by extending upwardly in a vertical direction from a preset position on the edge of the connecting part (410), and may be provided with an appropriate length so that the support part (420) is positioned at a preset height.

[0066] In addition, the vertical connection part (431) can be installed in contact with the groove part (301) formed on the side of the permanent magnet part (300) so as to position the permanent magnet part (300) in which a number of permanent magnets are installed in a specific arrangement and structure preset inside, in a fixed position with respect to the substrate support part (400).

[0067] That is, the vertical connection part (431) can be inserted into a groove part (301) formed at a corresponding position on the side of the permanent magnet part (300).

[0068] The above horizontal connection part (432) may be configured to extend horizontally from the vertical connection part (431) and be connected to the support part (420).

[0069] That is, the horizontal connection part (432) may be configured to extend horizontally from the upper end of the vertical connection part (431) and have a support part (420) provided at the end.

[0070] Meanwhile, as described above, the substrate support part (400) may be configured such that the coupling part (410) is positioned between the permanent magnet part (300) and the stator part (200) and is positioned at a relatively lower position than the support part (420). As another example, the coupling part (410) may be positioned between the permanent magnet part (300) and the stator part (200), or may be provided such that the support part (420) is positioned at a relatively lower position than the permanent magnet part (300) while being coupled to the opposite side of the stator part (200) among the permanent magnet parts (300).

[0071] That is, the substrate support part (400) is positioned closer to the stator part (200) than the permanent magnet part (300), so that the electromagnetic force on the stator part (200) side is controlled and lowered according to control through the control part described later, thereby contacting the inner surface of the chamber part (100), thereby releasing heat transferred from the relatively high-temperature substrate (1) and discharging accumulated static electricity.

[0072] For example, the substrate support part (400) controls the electromagnetic force of the stator part (200) through the control part described below, thereby bringing the coupling part (410) arranged between the permanent magnet part (300) and the stator part (200) into contact with the inner surface of the chamber part (100), and thereby discharging heat and static electricity transmitted from the support part (420) supporting the substrate (1) through the connection part (430) to the outside through the inner surface of the chamber part (100).

[0073] Meanwhile, the substrate support part (400) is located inside the chamber part (100), i.e., between the stator part (200) and the permanent magnet part (300), and may be made of a material that allows smooth electromagnetic action between the stator part (200) and the permanent magnet part (300) so that magnetic levitation and driving of the permanent magnet part (300) can be precisely controlled.

[0074] That is, the substrate support portion (400), particularly the bonding portion (410), has a low permeability and thus allows easy passage of electromagnetic fields, and may be made of a metal material, for example, may be manufactured including aluminum or stainless steel including SUS.

[0075] Furthermore, the substrate support member (400) may be made of a metal material having a low investment rate but excellent electrical and thermal conductivity, as described above, since static electricity and heat must be released through contact. As another example, it may be manufactured by coating a conductive material on a contact surface that comes into contact with the inner surface of the chamber member (100) with a ceramic material having a low investment rate.

[0076] The above chamber module (20) is configured to form a vacuum space (S) inside, and various configurations are possible.

[0077] That is, the chamber module (20) is configured to form a vacuum space (S) inside and to return the substrate (1), and a return unit (10) for returning the substrate (1) can be placed inside.

[0078] Hereinafter, the chamber module according to the present invention will be described in detail with reference to the attached drawings.

[0079] The chamber module according to the present invention, as illustrated in FIG. 2, includes a chamber portion (100) having a vacuum space (S) formed inside and a plurality of installation grooves (101) formed on the outer surface; and a plurality of stator portions (200) that are respectively installed in the plurality of installation grooves (101) and generate electromagnetic force for magnetic levitation movement in the return unit (10).

[0080] The above chamber part (100) is configured to form a vacuum space (S) inside and a number of installation grooves (101) are formed on the outer surface, and various configurations are possible.

[0081] That is, the chamber portion (100) may be configured to form a sealed vacuum space (S) inside and have a plurality of installation grooves (101) formed on the outer surface to insert and install a stator portion (200) described later.

[0082] At this time, the chamber part (100) may have a plurality of installation grooves (101) formed on at least one of the six sides based on the rectangular solid, and, if necessary, installation grooves (101) may be formed on all six sides depending on the formation of the movement path of the return unit (10) within the vacuum space (S).

[0083] In addition, the chamber part (100) may have multiple installation grooves (101) formed throughout even within one surface, and it is also obvious that the installation grooves (101) may be formed at specific locations in consideration of the movement path of the return unit (10) as needed.

[0084] Meanwhile, the following description assumes that an installation groove (101) is formed on the outer side of the bottom surface forming the bottom of the chamber part (100), but is not limited thereto.

[0085] The chamber part (100) may include a chamber body (110) having an opening formed on the lower surface, and a base plate (120) that is coupled to the opening to form a bottom surface and forms a vacuum space (S) sealed with the chamber body (110), and has a plurality of installation grooves (101) formed on the lower surface.

[0086] The above chamber body (110) may be configured to have an opening formed on the lower surface, and a base plate (120) may be installed in the opening to form a sealed vacuum space (S) together with the base plate (120).

[0087] The above base plate (120) may be configured to be coupled to an opening to form a bottom surface and form a sealed vacuum space (S) with the chamber body (110), and a number of installation grooves (101) are formed on the bottom surface.

[0088] At this time, a number of installation grooves (101) can be formed on the outer surface of the base plate (120).

[0089] The above installation groove (101) can be formed to form a grid structure, and accordingly can be formed in a square shape on a plane.

[0090] Accordingly, a plurality of installation grooves (101) in a grid structure are formed on the outer surface of the base plate (120), and frames that are perpendicular to each other on the plane of the base plate (120) can be formed between adjacent installation grooves (101).

[0091] Meanwhile, the base plate (120) may be formed integrally with the chamber body (110), unlike as described above, or may be formed by combining a separate grid frame so that an installation groove (101) is formed on the lower wall of the chamber body (110).

[0092] In addition, the chamber part (100) may additionally include a cover member (not shown) that is coupled to the installation groove (101) to cover the installation groove (101) into which the stator part (200) is inserted and installed. At this time, the cover member may be coupled to and fastened to a grid frame formed between the installation grooves (101) on the lower surface of the base plate (120), or may be coupled within the installation groove (101) in which the stator part (200) is inserted and installed.

[0093] In addition, the chamber part (100) may include a support part (102) provided on the inner surface of the bottom surface or the installation groove (101) and supporting the stator part (200) inserted into the installation groove (101).

[0094] For example, the support member (102) may protrude from the inner surface of the installation groove (101) to support the stator member (200), and as another example, may be provided to extend toward the installation groove (101) on the bottom surface of the grid frame to support the stator member (200).

[0095] In this way, the support member (102) can support the stator member (200) by interfering with the lower side of the stator member (200), that is, a part of the bottom surface of the circuit member (220), while the stator member (200) is inserted and installed in the installation groove (101).

[0096] At this time, the chamber part (100) may additionally include a fastening member (130) that penetrates the support part (102) and is coupled to the stator part (200) to fix the stator part (200), thereby fixing the stator part (200) within the installation groove (101).

[0097] Meanwhile, the support member (102) may be formed by protruding from the lowest side of the inner surface where the installation groove (101) is formed, as shown in FIG. 6, and may be arranged in pairs facing each other, or in pairs diagonally arranged on a plane, or may be provided in four pieces corresponding to the corners of the stator member (200) which is rectangular on a plane.

[0098] In addition, the support member (102) may be a structure that simply protrudes in a horizontal direction, and as another example, as shown in FIG. 6, it may be applied as a frame having an opening formed in the center and a cross-section in the shape of the letter 'ㄱ' in a shape corresponding to the inner surface of the installation groove (101), and may be configured such that a fastening member (130) passes through it in a horizontal direction and is fixed to the inner surface of the installation groove (101), and a fastening member (130) passes through it in a vertical direction and is fixed to the stator part (200).

[0099] Meanwhile, the support member (102) may, as another example, be simply provided with a plurality of 'ㄱ' shaped brackets, each of which is fixedly connected to the stator member (200) and the chamber member (100) and can support the stator member (200).

[0100] At this time, the chamber part (100) may cover at least a portion of the installation groove (101) by installing a cover member as a separate member as described above, but as another example, it may cover at least a portion of the installation groove (101) through a support member (102) applied as the frame as described above, thereby allowing the support member (102) to perform the function of a cover.

[0101] Accordingly, the stator part (200) is connected to an external or neighboring stator part (200) by passing through the inner surface of the support part (102) while being supported by the support part (102), and can be connected to various lines for transmitting power, refrigerant, and various control signals.

[0102] In addition, the chamber section (100) may be formed separately with a grounding area (S1) and a heat dissipation area (S2) maintained in a grounded state in a portion of the inner surface of the transfer area of ​​the return unit (10) formed through the stator section (200) in the vacuum space (S).

[0103] At this time, the grounding area (S1) and the heat dissipation area (S2) may be distinct areas within the transfer area, or as another example, may be areas that overlap at least partially with each other, or may be formed in a portion of the entire transfer area.

[0104] Meanwhile, the grounding area (S1) may be an area that is connected to an external ground on the inner surface of the chamber portion (100) and is maintained in a grounded state so that static electricity can be discharged when the substrate support portion (400) descends and comes into contact with the inner surface, and may be an area that is distinguished from other areas of the transfer area to which a separate coating or non-conductive cover can be applied, and in which the contact surface with the substrate support portion (400) is formed of a conductor and a static electricity discharge path is established through the surface of the chamber portion (100).

[0105] At this time, the grounding area (S1) may be an area where an electrostatic sensor described later may be installed, and where the electrostatic amount of the substrate support part (400) is measured by the electrostatic sensor installed in the chamber part (100).

[0106] The above heat dissipation area (S2) may be a part of the inner surface of the chamber portion (100) forming the transfer area, and may be an area where the substrate support portion (400) comes into contact to release heat to the outside.

[0107] At this time, the heat dissipation area (S2) may be an area that can release heat by contact with the lowering of the substrate support part (400) by being controlled to a relatively low temperature compared to other areas of the transfer area in the inner surface of the chamber part (100), and may be controlled to a relatively low temperature or a low temperature by being distinguished from other areas that cannot be separately temperature-controlled and are maintained at a relatively high temperature.

[0108] For example, the heat dissipation area (S2) may include a cooling unit (230) described later in the corresponding stator unit (200), and the coolant flow rate of the cooling unit (230) may be relatively increased or the coolant temperature may be lowered compared to other cooling units (230) to induce heat dissipation of the substrate support unit (400) in contact.

[0109] In addition, as another example, the heat dissipation area (S2) can be controlled to have a low temperature by supplying a separate refrigerant to the wall surface of the corresponding chamber section (100), and a separate cooling section with the same configuration as the cooling section (230) applied to the stator section (200) can be provided in the chamber section (100) corresponding to the heat dissipation area (S2).

[0110] In addition, as another example, the heat dissipation area (S2) may be an area with a relatively low temperature in the vacuum space (S1), and may be an area located at a relatively long distance from a substrate processing device installed adjacent to a substrate transport device, where substrate processing is performed.

[0111] In addition, as another example, the heat dissipation area (S2) may be an area that can be controlled at a low temperature and an area where the temperature of the substrate support member (400) rises. For example, it may be an area where a high-temperature substrate that has completed substrate processing is delivered to a substrate processing device installed adjacent to a substrate transport device where substrate processing is performed.

[0112] At this time, the heat dissipation area (S2) may be an area where a temperature sensor described later may be installed, and where temperature measurement of the substrate support part (400) is performed by a temperature sensor installed in the chamber part (100).

[0113] The above stator part (200) is installed in each of a plurality of installation grooves (101) and is configured to generate electromagnetic force for magnetic levitation movement in the return unit (10), and various configurations are possible.

[0114] In particular, the stator part (200) is configured as a single module so that a single module can be installed in an installation groove (101), and is provided in multiple units so that it can be installed in each of a plurality of installation grooves (101) to form a movement path within the vacuum space (S) of the return unit (10).

[0115] Accordingly, the stator unit (200) has the advantage of being able to independently control some of the plurality of stator units (200) as needed, and of being able to control each single module, which is the smallest unit.

[0116] For example, the stator unit (200) may include a coil unit (210) for applying electromagnetic force to the return unit (10), a circuit unit (220) for controlling the coil unit (210) and receiving power from the outside, and a cooling unit (230) for cooling the coil unit (210), as shown in FIGS. 4 and 5.

[0117] At this time, the stator part (200), as shown in FIG. 3, can be inserted and arranged in the order of the coil part (210), cooling part (230), and circuit part (220) from the vacuum space (S) side within the insertion groove (101), and can be combined as one module.

[0118] That is, in order to facilitate the electromagnetic force action according to the formation of an electromagnetic field with the return unit (10), the coil part (210) is placed on the vacuum space (S) side of the insertion groove (101) closest to the return unit (10), and the circuit part (220) can be placed in a state in which the cooling part (230) for cooling the high temperature state according to the application of the electromagnetic field as needed is placed at a position adjacent to the coil part (210) and electrically connected to the coil part (210).

[0119] At this time, the coil portion (210) may be configured to provide electromagnetic force through electromagnetic action with a permanent magnet provided in the return unit (10), and a coil plate in the form of a PCB may be applied.

[0120] The above circuit unit (220) may be configured to apply power to the coil unit (210) and control the power applied to the coil unit (210) according to various control signals.

[0121] In addition, the coil part (210) can be placed and secured in a mounting groove (232) formed on the upper surface of the cooling part (230), and a sealing member (240) for sealing is provided between the inner surface of the mounting groove (101) so that the sealing can be maintained.

[0122] The above cooling unit (230) may be configured to form a refrigerant circulation path (231) for bringing in and taking out refrigerant from the outside, and to perform cooling through refrigerant circulating in the refrigerant circulation path (231).

[0123] That is, the cooling unit (230) has a refrigerant circulation path (231) formed within a case made of a material that facilitates heat transfer, and can perform cooling by performing heat exchange with surrounding components such as the bottom surface of the coil unit (210) and the chamber unit (100) through refrigerant supplied from the outside and circulating.

[0124] At this time, the cooling unit (230) can transmit cooled refrigerant through an external heat exchanger, and the refrigerant circulation paths (231) within the cooling unit (230) between neighboring stator units (200) are connected to each other so that the refrigerant can circulate.

[0125] Meanwhile, a plurality of the above stator parts (200) can be divided into a plurality of control units including at least two stator parts (200) and independently controlled for each control unit. At this time, a plurality of cooling parts (230) within a single control unit can be commonly controlled by sharing refrigerant through refrigerant circulation paths (231) that are connected to each other.

[0126] Accordingly, independent cooling control is possible for each control unit, and, if necessary, cooling can be strengthened for a specific area among the stator sections (200), that is, an area adjacent to the substrate processing device among the chamber sections (100) that are maintained at a relatively high temperature.

[0127] Hereinafter, a substrate transport device including a transport unit according to the present invention will be described with reference to the attached drawings.

[0128] A substrate transport device according to the present invention may further include a chamber portion (100) forming a vacuum space (S) therein; a transport unit (10) that transports a substrate (1) by magnetically levitating and moving within the vacuum space (S); a plurality of stator portions (200) installed in the chamber portion (100) that generate an electromagnetic force for magnetically levitating movement of the transport unit (10); and a control portion that controls the movement of the transport unit (10) by adjusting the electromagnetic force generated through the stator portions (200).

[0129] In addition, the substrate transport device according to the present invention may include an electrostatic sensor provided in the chamber section (100) to measure the static electricity of the substrate support section (400) within the vacuum space (S).

[0130] In addition, the substrate transport device according to the present invention may include a temperature sensor provided in the chamber section (100) to measure the temperature of the substrate support section (400) within the vacuum space (S).

[0131] The configuration of the chamber section (100), stator section (200) and return unit (10) is identical to the configuration described above, so a duplicate description is omitted.

[0132] The above control unit is configured to control the movement of the return unit (10) by controlling the electromagnetic force generated through the stator unit (200), and various configurations are possible.

[0133] That is, the control unit can control the electromagnetic force generated through the stator unit (200) and control the movement of the return unit (10) by appropriately controlling the power applied to the coil unit (210) through the circuit unit (220) of the stator unit (200).

[0134] Meanwhile, the conventional transport unit has a problem in that heat is transferred from the substrate (1) and static electricity is accumulated around the substrate support member (400) that supports the relatively high-temperature substrate (1), but since it is placed in a high-vacuum vacuum space (S) in a magnetically levitating state, it is difficult to discharge the accumulated heat and static electricity, making particle management difficult.

[0135] To improve this problem, the control unit can control the substrate support unit (400) to contact the inner surface of the chamber unit (100) that is maintained in a grounded state in order to discharge static electricity within the substrate support unit (400).

[0136] That is, the control unit can, as shown in FIG. 8, stop the generation of electromagnetic force of a specific stator unit (200) to induce the permanent magnet unit (300) to descend in order to discharge static electricity accumulated in the substrate support unit (400), and accordingly, the coupling unit (410) arranged between the permanent magnet unit (300) and the stator unit (200) can be induced to contact the bottom surface of the chamber unit (100) and discharge static electricity along the bottom surface of the chamber unit (100) that is in a grounded state.

[0137] To this end, the control unit is provided inside or outside the chamber unit (100) to receive a measurement value of an electrostatic sensor that measures the static electricity of the substrate support unit (400) in the vacuum space (S) through contact or non-contact, and when the measurement value exceeds a preset value, a control signal is applied to lower the return unit (10) and make it contact the inner surface of the chamber unit (100).

[0138] That is, the control unit can control the substrate support unit (400) to come into contact with the inner surface of the chamber unit (100) when the electrostatic value measured through the electrostatic sensor exceeds a preset value.

[0139] Meanwhile, it is also obvious that the control unit can lower the substrate support unit (400) and bring it into contact with the inner surface of the chamber unit (100) after a certain period of time has elapsed in accordance with a preset cycle, rather than through a measurement value from a separate electrostatic sensor.

[0140] In addition, the control unit can control the substrate support unit (400) to come into contact with the inner surface of the chamber unit (100) for heat dissipation of the substrate support unit (400).

[0141] That is, as shown in FIG. 8, the control unit lowers the transfer unit (10) in a magnetically levitating state, particularly the substrate support unit (400), to release heat to the high-vacuum vacuum space (S) without a separate medium for heat transfer, and allows the coupling unit (410) to contact the bottom surface of the chamber unit (100) to release heat through conduction.

[0142] Meanwhile, in this case, the substrate support part (400), which is maintained at a relatively high temperature by receiving heat from the substrate (1) through the cooling part (230) in the stator part (200), contacts the inside of the chamber part (100), which is maintained at a relatively low temperature, and thus heat exchange is performed to cool the substrate support part (400).

[0143] At this time, the control unit receives the measurement value of a temperature sensor that is provided inside or outside the chamber unit (100) and measures the temperature of the substrate support unit (400) in the vacuum space (S) through contact or non-contact, and when the measurement value exceeds a preset value, applies a control signal to lower the return unit (10) and induce it to contact the inner surface of the chamber unit (100) and cool it.

[0144] That is, the control unit can control the substrate support unit (400) to come into contact with the inner surface of the chamber unit (100) when the temperature value measured by the temperature sensor exceeds a preset value.

[0145] Meanwhile, it is also obvious that the control unit can lower the substrate support unit (400) and bring it into contact with the inner surface of the chamber unit (100) after a certain period of time has elapsed in accordance with a preset cycle, rather than through a measurement value from a separate temperature sensor.

[0146] In addition, the electrostatic sensor and temperature sensor described above may be provided to perform non-contact measurement on the outer surface of the chamber part (100), but as another example, they may also be placed within a vacuum space (S) to measure electrostatic electricity and temperature, respectively.

[0147]

[0148] The above is only a description of some of the preferred embodiments that can be implemented by the present invention, and as is well known, the scope of the present invention should not be construed as being limited to the above embodiments, and the technical ideas of the present invention described above and the technical ideas underlying them are all included in the scope of the present invention.

Claims

1. A transport unit that transports a substrate (1) by moving by magnetic levitation through a stator unit (200) that generates an electromagnetic field. A permanent magnet part (300) for magnetic levitation with the electromagnetic field according to the above stator part (200); A transport unit characterized in that it includes a substrate support part (400) that is coupled to the surface facing the stator part (200) of the permanent magnet part (300) at one end and supports the substrate (1) at the other end.

2. In claim 1, The above substrate support member (400) is A return unit characterized by including a coupling part (410) coupled to the permanent magnet part (300), a support part (420) supporting the substrate (1), and a connecting part (430) connecting the coupling part (410) and the support part (420).

3. In claim 2, The above connecting part (430) is A return unit characterized by including a vertical connection part (431) extending vertically from the above-mentioned connecting part (410), and a horizontal connection part (432) extending horizontally from the above-mentioned vertical connection part (431) and connected to the above-mentioned supporting part (420).

4. In claim 3, The above vertical connection part (431) is A return unit characterized in that it is installed in contact with and guided by a groove (301) formed at a corresponding position on the side of the permanent magnet (300).

5. In claim 1, The above substrate support member (400) is A transport unit characterized in that it includes at least one material among aluminum, stainless steel, and ceramic so that the electromagnetic field generated through the stator section (200) is transmitted toward the permanent magnet section (300).

6. In claim 1, The above substrate support member (400) is A return unit characterized by being made of a ceramic material coated with a conductive material on the opposite surface of the permanent magnet portion (300).

7. A chamber part (100) forming a vacuum space (S) inside; A transport unit (10) according to any one of claims 1 to 6, which transports a substrate (1) by moving by magnetic levitation within the vacuum space (S); A substrate transport device characterized in that it is installed in the chamber section (100) and includes a plurality of stator sections (200) that generate an electromagnetic field for magnetic levitation movement in the transport unit (10).

8. In claim 7, A substrate transport device characterized in that it further includes a control unit that controls the movement of the transport unit (10) by adjusting the electromagnetic field generated through the stator unit (200).

9. In claim 8, The above control unit, A substrate transport device characterized in that the substrate support member (400) is controlled to contact the inner surface of the chamber member (100) that is maintained in a grounded state in order to discharge static electricity within the substrate support member (400).

10. In claim 8, The above chamber part (100) is A grounding area (S1) maintained in a grounded state is formed on a part of the inner surface of the transfer area of ​​the return unit (10) formed through the stator section (200). The above control unit, A substrate transport device characterized in that, in order to discharge static electricity within the substrate support portion (400), the transport unit (10) is moved to the grounding area (S1) and the substrate support portion (400) is controlled to come into contact with the grounding area (S1).

11. In claim 9, A substrate transport device characterized in that the chamber portion (100) is provided with an electrostatic sensor that measures the static electricity of the substrate support portion (400) within the vacuum space (S).

12. In claim 11, The above control unit, A substrate transport device characterized in that the substrate support part (400) is controlled to come into contact with the inner surface of the chamber part (100) when the electrostatic value measured through the electrostatic sensor exceeds a preset value.

13. In claim 8, The above control unit, A substrate transport device characterized in that, for heat dissipation of the substrate support portion (400), the substrate support portion (400) is controlled to come into contact with the inner surface of the chamber portion (100).

14. In claim 8, The above chamber part (100) is A heat dissipation area (S2) is formed on a part of the inner surface of the transport area of ​​the return unit (10) formed through the stator section (200). The above control unit, A substrate transport device characterized in that, for heat dissipation of the substrate support member (400), the transport unit (10) is moved to the heat dissipation area (S2) and the substrate support member (400) is controlled to come into contact with the heat dissipation area (S2).

15. In claim 14, A substrate transport device characterized in that at least one of the chamber section (100) and the stator section (200) corresponding to the heat dissipation area (S2) includes a cooling section for heat exchange with the substrate support section (400).

16. In claim 13, A substrate transport device characterized in that the chamber portion (100) includes a temperature sensor that measures the temperature of the substrate support portion (400) within the vacuum space (S).

17. In claim 16, The above control unit, A substrate transport device characterized in that the substrate support member (400) is controlled to come into contact with the inner surface of the chamber member (100) when the temperature value measured through the temperature sensor exceeds a preset value.

18. In claim 13, The above stator part (200) is A substrate transport device characterized by comprising a coil unit (210) that generates an electromagnetic field for magnetically levitating the transport unit (10), a circuit unit (220) that controls the coil unit (210) and receives power from the outside, and a cooling unit (230) that cools the coil unit (210).

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