Quantum dot composition, cured film and display device

Abstract

Provided is a quantum dot composition, which can produce fine droplets without satellite generation during inkjet jetting, maintains, even if exposed to a high temperature for a long period of time inside a jetting head, inkjet jetting properties compared to those before exposure, has no decrease in light conversion rate, and causes, even if inkjet jetting is performed for a long period of time, no contamination at the nozzle portion of the jetting head, and thus has excellent processability. In this regard, provided are: the quantum dot composition comprising quantum dots and a curable monomer, the quantum dots being surface-modified with a glycerol-based compound; a cured film comprising a cured product of the quantum dot composition; and a display device comprising the cured film.

Description

Quantum dot composition, cured film and display device

[0001] The present invention relates to a quantum dot composition, a cured film, and a display device.

[0002]

[0003] Quantum dot compositions containing quantum dots are required to exhibit excellent patternability, prevent degradation of quantum dot light efficiency during thermal processing, exposure, development, washing, deposition, and additional thermal processes, and increase productivity. In this regard, a method for jetting quantum dot compositions containing quantum dots using inkjet jetting is being introduced.

[0004] To improve inkjet jetting properties, methods such as changing the type or content of monomers and / or resins in the composition or using solvents are being considered. However, such changes require that other components in the composition also be changed and adjusted.

[0005] Accordingly, it is desirable to ensure that inkjet jetting is performed well, inkjet jetting properties are maintained even when the composition is exposed to high temperatures for a long period of time inside the jetting head, there is no decrease in the light conversion rate, and there is no contamination at the nozzle area of ​​the jetting head.

[0006]

[0007] The present invention provides a quantum dot composition capable of producing fine droplets without satellite formation when inkjet-jetted.

[0008] The present invention provides a quantum dot composition that maintains inkjet jetting properties compared to before exposure and has no decrease in the light conversion rate of the quantum dot even when exposed to high temperatures for a long period of time inside a jetting head during inkjet jetting.

[0009] The purpose is to provide a quantum dot composition with excellent processability, without contamination at the nozzle portion of the jetting head even during long-term inkjet jetting.

[0010]

[0011] According to one embodiment, a quantum dot composition is provided.

[0012] The quantum dot composition comprises a quantum dot; and a curable monomer, wherein the quantum dot is surface-modified with a glycerol-based compound.

[0013] According to another embodiment, a cured film is provided.

[0014] The above cured film includes a cured product of the quantum dot composition.

[0015] In another embodiment, a display device is provided.

[0016] The above display device includes the above cured film.

[0017]

[0018] A quantum dot composition is provided that can produce fine droplets without satellite formation when inkjet jetting, maintains inkjet jetting properties compared to before exposure even when exposed to high temperatures for a long period of time inside a jetting head, has no decrease in light conversion rate, and has excellent processability because there is no contamination at the nozzle area of ​​the jetting head even when inkjet jetting for a long period of time.

[0019]

[0020] Figure 1 is a conceptual diagram of a display device according to an embodiment.

[0021] Figure 2 shows the state of droplets when inkjet jetting is performed on the quantum dot compositions of examples and comparative examples using an inkjet jetting device.

[0022] Figure 3 shows the state of droplets after 72 hours of inkjet jetting using inkjet jetting equipment for quantum dot compositions of examples and comparative examples.

[0023] Figure 4 shows the contamination level of the nozzle portion of the jetting head at 72 hours after inkjet jetting was performed for 72 hours using an inkjet jetting facility for the quantum dot compositions of the examples and comparative examples.

[0024] In FIGS. 2 to 4, A represents the results of Comparative Example 1, B represents the results of Example 1, C represents the results of Example 2, and D represents the results of Example 4.

[0025]

[0026] Hereinafter, embodiments of the present application will be described in more detail with reference to the attached drawings. However, the technology disclosed in the present application is not limited to the embodiments described herein and may be embodied in other forms. However, the embodiments introduced herein are provided so that the disclosed content can be thorough and complete and so that the spirit of the present application can be sufficiently conveyed to those skilled in the art. In order to clearly express the components of each device in the drawings, the sizes of the components, such as width and thickness, are somewhat enlarged. However, the sizes of the components, such as width and thickness, in the present invention do not limit the scope of the present invention. The same reference numerals in multiple drawings indicate substantially the same components.

[0027] The terminology used herein is for the purpose of describing exemplary embodiments only and is not intended to limit the present invention. Singular expressions include plural expressions unless the context clearly dictates otherwise.

[0028] In this specification, "upper" and "lower" are defined based on the drawing, and depending on the perspective, "upper" may be changed to "lower" and "lower" may be changed to "upper", and reference to "on" or "on" may include not only directly on but also cases where another structure is interposed in between. On the other hand, reference to "directly on" or "directly above" or "directly formed" indicates cases where there is no intervening other structure such as an intermediate body.

[0029] When describing a numerical range in this specification, “X to Y” means X or more and Y or less (X≤ and ≤Y).

[0030] A quantum dot composition according to one embodiment comprises quantum dots and can be applied by inkjet jetting.

[0031] The quantum dot composition can produce satellite-free fine droplets when inkjet-jetted, and can maintain excellent inkjet jetting properties compared to before exposure even when exposed to high temperatures for a long period of time inside a jetting head during inkjet-jetting, and can have excellent processability because there is no contamination at the nozzle portion of the jetting head even during long-term inkjet-jetting. In addition, the quantum dot composition can prevent a decrease in the light conversion rate of the quantum dot compared to before exposure even when exposed to high temperatures for a long period of time inside a jetting head during inkjet-jetting.

[0032] Here, "satellite" refers to a phenomenon in which droplets formed by inkjet jetting are dragged, as shown in the comparative example of Fig. 2.

[0033] The quantum dot composition comprises a quantum dot and a curable monomer, and the quantum dot is surface-modified with a glycerol-based compound. The quantum dot composition is described in detail below.

[0034] quantum dots

[0035] The above quantum dots are surface-modified with a glycerol-based compound.

[0036] The glycerol-based compound can facilitate dispersion of quantum dots within the quantum dot composition, thereby ensuring a jetting property without satellite formation even after the quantum dot composition is filled and left for a long period of time inside a head for inkjet jetting. In addition, the glycerol-based compound can maintain the same distance between quantum dots within the cured product when the quantum dot composition is cured, thereby densely packing the quantum dots within the cured product, protecting the outer layer of the quantum dots, and non-localizing the distribution between the quantum dots to prevent a decrease in the light efficiency of the quantum dots. In addition, the glycerol-based compound can maintain excellent inkjet jetting properties compared to before exposure even when exposed to high temperatures within the jetting head for a long period of time during inkjet jetting, and can provide excellent processability because there is no contamination at the nozzle portion of the jetting head even during long-term inkjet jetting.

[0037] According to one embodiment, the glycerol-based compound may be included in the surface modification material of the quantum dot at 90 wt% or more, for example, 99 to 100 wt%, or 100 wt%.

[0038] According to one embodiment, the glycerol-based compound may be a glycerol-based compound having an acyl group. The glycerol-based compound having an acyl group may have an acyl group represented by the following chemical formula 1.

[0039] [Chemical Formula 1]

[0040] *-C(=O)-R

[0041] (In the above, * is the connection part of the element,

[0042] R is a saturated straight-chain, branched-chain or cyclic aliphatic hydrocarbon group having 3 to 30 carbon atoms, or an unsaturated straight-chain, branched-chain or cyclic aliphatic hydrocarbon group having 3 to 30 carbon atoms). Here, 'carbon number' means only the number of carbons forming the main chain of the aliphatic hydrocarbon group.

[0043] In one specific example, R in the above chemical formula 1 may be a saturated straight-chain aliphatic hydrocarbon group having 3 to 20 carbon atoms, or a straight-chain aliphatic hydrocarbon group having 3 to 20 carbon atoms and having one or more unsaturated bonds.

[0044] In one specific example, R in the above chemical formula 1 may be a saturated straight-chain aliphatic hydrocarbon group having 6 to 18 carbon atoms, or a straight-chain aliphatic hydrocarbon group having 6 to 18 carbon atoms having two or more, for example, two to three, unsaturated bonds.

[0045] In one specific embodiment, R in the above formula 1 may have one or more, for example, 1 to 6, unsaturated bonds. Here, the 'unsaturated bond' includes -CH=CH-, -CH=C(CH3)-, -C(CH3)=C(CH3)-, or -C≡C-, and may include both cis and trans structures.

[0046] For example, in the above chemical formula 1, R may be derived from a saturated fatty acid or an unsaturated fatty acid.

[0047] In one specific example, the glycerol compound having the acyl group may include at least one of monoacylglycerol compounds including 1-acylglycerol compounds, 2-acylglycerol compounds, etc.; diacylglycerol compounds including 1,2-diacylglycerol compounds, 1,3-diacylglycerol compounds, etc.; and triacylglycerol compounds.

[0048] Preferably, the glycerol-based compound having the acyl group may be a triacylglycerol-based compound. The triacylglycerol-based compound has more acyl groups than monoacylglycerol-based compounds and diacylglycerol-based compounds, and the acyl groups within the glycerol-based compound can be easily controlled, thereby further stabilizing the quantum dot. This forms fine droplets without satellites, and even when exposed to heat for a long period of time inside the jetting head during inkjet jetting, the inkjet jetting properties can be maintained as they are before exposure, and even when exposed to heat for a long period of time inside the jetting head, there can be no contamination at the nozzle portion of the jetting head, so that the processability can be excellent. In addition, the quantum dot composition may not exhibit a decrease in the light efficiency of the quantum dot compared to before exposure even when exposed to heat for a long period of time inside the jetting head during inkjet jetting.

[0049] In one specific example, the glycerol-based compound having the acyl group may be represented by the following chemical formula 2:

[0050] [Chemical Formula 2]

[0051]

[0052] (In the above chemical formula 2,

[0053] R 1 , R 2 , R 3 are each independently hydrogen or the above chemical formula 1,

[0054] R 1 , R 2 , R 3 At least one of the above chemical formula 1).

[0055] In one specific example, in the chemical formula 2, R 1 , R 2 , R 3Two or more of these may be different. This allows the glycerol-based compounds to provide different hydrophobic properties, thereby allowing the hydrophobic portions to overlap each other when surrounding the quantum dots, thereby providing high-density surface-modified quantum dots. High-density surface-modified quantum dots can further enhance the stability and dispersibility of the quantum dots within the composition, thereby enhancing the aforementioned effects.

[0056] For example, R 1 , R 2 , R 3 are each independently saturated fatty acids such as C4:0, C5:0, C6:0, C7:0, C8:0, C9:0, C10:0, C11:0, C12:0, C13:0, C14:0, C15:0, C16:0, C17:0, C18:0, C19:0, C20:0, C21:0, C22:0, C23:0, C24:0, C25:0, C26:0, C27:0, C28:0, C29:0, C30:0, C16:1, C18:1, C18:2, C18:3, C18:4, C20:1, C20:3, C20:4, C20:5, C22:1, C22:4, C22:6, C24:1, etc. It may be derived from one or more types of unsaturated fatty acids.

[0057] The above glycerol-based compound can be included in an amount of 10 to 70 wt% of the quantum dot to perform surface modification. Within this range, the surface modification effect by the glycerol-based compound can be obtained without affecting the light conversion rate of the quantum dot.

[0058] Surface modification using the above glycerol-based compound can be performed by mixing the quantum dots and the glycerol-based compound before surface modification and treating them at a predetermined temperature. For example, the treatment can include heat treatment at 100°C or higher, for example, 100 to 200°C.

[0059] According to one embodiment, the surface-modified quantum dot may have a micelle structure. The glycerol-based compound may facilitate the formation of the micelle structure by the quantum dot. The micelle structure may facilitate the dispersion of the quantum dot in the quantum dot composition, thereby preventing the formation of satellites during inkjet jetting of the quantum dot composition. In addition, the quantum dot having a micelle structure surface-modified with the glycerol-based compound may ensure satellite-free jetting even after being filled inside a head for inkjet jetting and left for a long period of time. In addition, the quantum dot having a micelle structure surface-modified with the glycerol-based compound may maintain the same distance between quantum dots within the cured product when the quantum dot composition is cured, thereby ensuring a dense packing of quantum dots within the cured product, thereby protecting the outer layer of the quantum dots and preventing a delocalized distribution between quantum dots, thereby preventing a decrease in the light efficiency of the quantum dots.

[0060] The above micelle structure may have a structure in which the quantum dots before surface modification described below are completely surrounded by the glycerol-based compound.

[0061] The above quantum dots before surface modification can each independently be composed of a core and a shell surrounding the core, and the core and shell can each independently have a structure such as a core, core / shell, core / first shell / second shell, alloy, alloy / shell, etc., made of group II-IV, group III-V, etc., but are not limited thereto.

[0062] For example, the core may include at least one material selected from the group consisting of, but not limited to, CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs, AgInGaS (AIGS), CuInGaS (CIGS), and alloys thereof.

[0063] For example, the shell surrounding the core may include at least one material selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, HgSe and alloys thereof, but is not necessarily limited thereto.

[0064] In one implementation example, since environmental concerns have been increasing significantly worldwide and regulations on toxic substances have been strengthened, environmentally friendly non-cadmium-based luminescent materials (such as InP / ZnS, InP / ZeSe / ZnS) with somewhat lower quantum yields were used instead of luminescent materials having cadmium-based cores, but this is not necessarily limited thereto.

[0065] The above quantum dots may have a maximum fluorescence emission wavelength between 500 nm and 680 nm.

[0066] The quantum dot can absorb light in a wavelength range of 360 nm to 780 nm, for example, a wavelength range of 400 nm to 780 nm, and emit fluorescence in a wavelength range of 500 nm to 700 nm, for example, 500 nm to 580 nm, or emit fluorescence in a wavelength range of 600 nm to 680 nm. That is, the quantum dot can have a maximum fluorescence emission wavelength (fluorescence λ) in a wavelength range of 500 nm to 680 nm. em ) can have.

[0067] The above quantum dots may each independently have a full width at half maximum (FWHM) of 20 nm to 100 nm, for example, 20 nm to 50 nm. When the quantum dots have a full width at half maximum (FWHM) within the above range, the color purity is high, thereby increasing the color reproducibility when used as a color material in a color filter.

[0068] The above quantum dots may each independently be organic, inorganic, or a hybrid (hybrid) of organic and inorganic materials.

[0069] In the case of the quantum dot of the above core / shell structure, the size (average particle diameter) of each quantum dot including the shell may be 1 nm to 15 nm, for example, 5 nm to 15 nm.

[0070] For example, the quantum dots may each independently include red quantum dots, green quantum dots, or a combination thereof. The red quantum dots may each independently have an average particle diameter of 10 nm to 15 nm. The green quantum dots may each independently have an average particle diameter of 5 nm to 8 nm.

[0071] When the quantum dot composition according to one embodiment is a solvent-free quantum dot composition that does not contain a solvent, the quantum dots may be included in an amount of 5 to 60 wt%, such as 10 to 60 wt%, such as 20 to 60 wt%, such as 30 to 50 wt%. When the quantum dots are included within the above range, high light retention and light efficiency can be achieved even after curing.

[0072] When the quantum dot composition according to one embodiment is a solvent-type quantum dot composition containing a solvent, the quantum dots may be included in an amount of 1 to 40 wt%, for example, 3 to 30 wt%, based on the total amount of the quantum dot composition. When the quantum dots are included within the above range, the photoconversion rate is excellent and the pattern characteristics and development characteristics are not impaired, thereby enabling excellent processability.

[0073] Meanwhile, in order to ensure dispersion stability of the quantum dots, the quantum dot composition according to one embodiment may further include a dispersant. The dispersant helps to uniformly disperse the photoconversion material, such as quantum dots, within the quantum dot composition, and any nonionic, anionic, or cationic dispersant may be used. Specifically, polyalkylene glycol or its esters, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonic acid esters, sulfonic acid salts, carboxylic acid esters, carboxylic acid salts, alkyl amide alkylene oxide adducts, alkyl amines, and the like may be used alone or in combination of two or more. The dispersant may be used in an amount of 0.1 wt% to 100 wt%, for example, 10 wt% to 20 wt%, relative to the solid content of the photoconversion material, such as quantum dots.

[0074] curable monomer

[0075] The above quantum dot composition includes a curable monomer. The curable monomer may include at least one of a photocurable monomer and a thermocurable monomer.

[0076] The above curable monomer may be a polyfunctional monomer.

[0077] For example, the photocurable monomer may be a photocurable monomer having a carbon-carbon double bond at the terminal.

[0078] The photocurable monomer may be included in an amount of 30 to 70 wt%, for example, 40 to 70 wt%, for example, 45 to 65 wt%, for example, 45 to 60 wt%, based on the total amount of the quantum dot composition (e.g., based on solid content). Within this range, a composition having a viscosity that enables ink-jetting, particularly a solvent-free quantum dot composition, can be produced, and furthermore, the quantum dots in the produced composition, particularly the solvent-free quantum dot composition, can have excellent dispersibility, so that the optical properties can also be improved.

[0079] The photocurable monomer may have a molecular weight of 150 g / mol to 1,000 g / mol. Within this range, the composition may be advantageous for ink-jetting because the viscosity of the composition may not be increased without impairing the optical properties of the quantum dots.

[0080] The above photocurable monomer may be represented by the following chemical formula 3, but is not necessarily limited thereto:

[0081] [Chemical Formula 3]

[0082]

[0083] (In the above chemical formula 3,

[0084] R 4　 and R 5 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group,

[0085] L 21 and L 23 are each independently a substituted or unsubstituted C1 to C10 alkylene group,

[0086] L 22 is a substituted or unsubstituted C1 to C10 alkylene group or ether group (*-O-*).

[0087] For example, the photocurable monomer may be represented by the following chemical formula 3-1 or 3-2, but is not necessarily limited thereto.

[0088] [Chemical Formula 3-1]

[0089]

[0090] [Chemical Formula 3-2]

[0091]

[0092] For example, the photocurable monomer, in addition to the compound represented by the chemical formula 3-1 or 3-2, may be selected from the group consisting of ethylene glycol diacrylate, triethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, bisphenol A diacrylate, trimethylolpropane triacrylate, novolac epoxy acrylate, ethylene glycol dimethacrylate, triethylene glycol dimethacrylate, propylene glycol dimethacrylate, 1,4-butanediol dimethacrylate, 1,6-hexanedioldimethacrylate or a combination thereof may be further included.

[0093] The above thermosetting monomer can further increase the crosslinking density of the cured film by being thermosetted in a subsequent process of the quantum dot composition, thereby reducing the degree of quantum efficiency degradation of the quantum dot and improving the reliability of the display device.

[0094] The above thermosetting monomer may include at least one of an epoxy monomer and an oxetane monomer.

[0095] The above epoxy monomer may have one or more, for example, one to three epoxy groups. The above oxetane monomer may have one or more, for example, one to three epoxy groups. The above epoxy monomer and the above oxetane monomer may be selected from common types known to those skilled in the art and used.

[0096] The thermosetting monomer is included in an amount of 1 to 10 wt% based on the total amount of the quantum dot composition (e.g., based on solid content). For example, the thermosetting monomer may be included in an amount of 3 to 7 wt%.

[0097] The above quantum dot composition may further include a photopolymerization initiator.

[0098] photopolymerization initiator

[0099] The above photopolymerization initiator is a radical initiator capable of initiating a radical polymerization reaction by light, and examples thereof include, but are not limited to, acetophenone-based compounds, benzophenone-based compounds, thioxanthone-based compounds, benzoin-based compounds, triazine-based compounds, oxime-based compounds, and aminoketone-based compounds.

[0100] Examples of the above acetophenone compounds include 2,2'-diethoxy acetophenone, 2,2'-dibutoxy acetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyltrichloro acetophenone, pt-butyldichloro acetophenone, 4-chloro acetophenone, 2,2'-dichloro-4-phenoxy acetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, etc.

[0101] Examples of the above benzophenone compounds include benzophenone, benzoyl benzoate, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, etc.

[0102] Examples of the above thioxanthone compounds include thioxanthone, 2-methylthioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthone, 2-chlorothioxanthone, etc.

[0103] Examples of the above benzoin compounds include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyldimethyl ketal, etc.

[0104] Examples of the above triazine compounds include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, Examples thereof include 2-(naphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-bis(trichloromethyl)-6-piperonyl-s-triazine, and 2-4-bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine.

[0105] Examples of the above oxime compounds include O-acyloxime compounds, 2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(O-acetyloxime)-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one, etc. Specific examples of the O-acyl oxime compounds include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butan-1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1-oneoxime-O-acetate, and 1-(4-phenylsulfanylphenyl)-butan-1-oneoxime-O-acetate.

[0106] Examples of the above aminoketone compounds include 2-Benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1.

[0107] In addition to the above compound, the photopolymerization initiator may also include a carbazole compound, a diketone compound, a sulfonium borate compound, a diazo compound, an imidazole compound, a biimidazole compound, etc.

[0108] The above photopolymerization initiator may also be used together with a photosensitizer that causes a chemical reaction by absorbing light, becoming excited, and then transferring the energy.

[0109] Examples of the above photosensitizer include tetraethylene glycol bis-3-mercapto propionate, pentaerythritol tetrakis-3-mercapto propionate, dipentaerythritol tetrakis-3-mercapto propionate, and the like.

[0110] The photopolymerization initiator may be included in an amount of 0.1 to 5 wt%, for example, 0.1 to 4 wt%, based on the total amount of the quantum dot composition (e.g., based on solid content). When included within the above range, sufficient curing occurs upon exposure to light or thermal curing, thereby achieving excellent reliability, and preventing a decrease in transmittance due to unreacted initiator, thereby preventing a decrease in the optical properties of the quantum dot.

[0111] The quantum dot composition according to one embodiment may further include a light scattering agent.

[0112] light scattering agent

[0113] The above light scattering agent may include barium sulfate (BaSO4), calcium carbonate (CaCO3), titanium dioxide (TiO2), zirconia (ZrO2), or a combination thereof.

[0114] The light-scattering agent reflects light not absorbed by the aforementioned quantum dots and allows the reflected light to be reabsorbed by the quantum dots. In other words, the light-scattering agent can increase the amount of light absorbed by the quantum dots, thereby increasing the photoconversion efficiency of the quantum dot composition.

[0115] The above light scattering agent has an average particle diameter (D 50) may be 150 nm to 250 nm, and specifically, 180 nm to 230 nm. When the average particle diameter of the light diffusing agent is within the above range, it may have a better light diffusing effect and increase the light conversion efficiency.

[0116] The light-scattering agent may be included in an amount of 0.1 to 20 wt%, for example 0.1 to 15 wt%, for example 0.5 to 10 wt%, based on the total amount of the quantum dot composition (e.g., based on solid content). Within this range, an effect of improving the light conversion efficiency due to the use of the light-scattering agent can be expected, and quantum dot sedimentation problems may not occur.

[0117] additives

[0118] In order to improve the stability and dispersibility of the above quantum dots, the solvent-free quantum dot composition according to one embodiment may further include a polymerization inhibitor.

[0119] The polymerization inhibitor may include, but is not necessarily limited to, a hydroquinone-based compound, a catechol-based compound, or a combination thereof. According to one embodiment, since the solvent-free quantum dot composition further includes the hydroquinone-based compound, the catechol-based compound, or a combination thereof, crosslinking at room temperature can be prevented during exposure after printing (coating) the solvent-free quantum dot composition.

[0120] For example, the hydroquinone-based compound, catechol-based compound, or combinations thereof may include, but are not necessarily limited to, hydroquinone, methyl hydroquinone, methoxyhydroquinone, t-butyl hydroquinone, 2,5-di-t-butyl hydroquinone, 2,5-bis(1,1-dimethylbutyl) hydroquinone, 2,5-bis(1,1,3,3-tetramethylbutyl) hydroquinone, catechol, t-butyl catechol, 4-methoxyphenol, pyrogallol, 2,6-di-t-butyl-4-methylphenol, 2-naphthol, tris(N-hydroxy-N-nitrosophenylaminato-O,O')aluminium, or combinations thereof.

[0121] The above hydroquinone-based compound, catechol-based compound, or a combination thereof may be used in the form of a dispersion, and the polymerization inhibitor in the form of the dispersion may be included in an amount of 0.001 wt% to 3 wt%, for example, 0.1 wt% to 2 wt%, based on the total amount of the solvent-free quantum dot composition. When the polymerization inhibitor is included within the above range, the problem of aging at room temperature can be solved, while at the same time preventing a decrease in sensitivity and surface peeling.

[0122] The solvent in the above composition may be included in an amount of 2 parts by weight or less per 100 parts by weight of the solid content of the above composition.

[0123] In addition, the solvent-free quantum dot composition according to one embodiment may further include malonic acid; 3-amino-1,2-propanediol; a silane coupling agent; a leveling agent; a fluorinated surfactant; or a combination thereof to improve heat resistance and reliability.

[0124] For example, a solvent-free quantum dot composition according to one embodiment may further include a silane coupling agent having a reactive substituent such as a vinyl group, a carboxyl group, a methacryloxy group, an isocyanate group, or an epoxy group to improve adhesion to a substrate, etc.

[0125] Examples of the above silane coupling agent include trimethoxysilyl benzoic acid, γ-methacryloxypropyl trimethoxysilane, vinyl triacetoxysilane, vinyl trimethoxysilane, γ-isocyanate propyl triethoxysilane, γ-glycidoxy propyl trimethoxysilane, β-epoxycyclohexyl)ethyl trimethoxysilane, etc., and these may be used alone or in combination of two or more.

[0126] The above silane coupling agent may be included in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the quantum dot composition. When the silane coupling agent is included within the above range, adhesion, storability, etc. are excellent.

[0127] In addition, the above-described solvent-free quantum dot composition may further include a surfactant, such as a fluorinated surfactant, to improve coating properties and prevent defects, i.e., to improve leveling performance, as needed.

[0128] The above fluorinated surfactant may have a low weight average molecular weight of 4,000 g / mol to 10,000 g / mol, specifically, may have a weight average molecular weight of 6,000 g / mol to 10,000 g / mol. In addition, the fluorinated surfactant may have a surface tension of 18 mN / m to 23 mN / m (measured in a 0.1% propylene glycol monomethyl ether acetate (PGMEA) solution). When the weight average molecular weight and surface tension of the fluorinated surfactant are within the above ranges, the leveling performance can be further improved, the occurrence of spots can be prevented during high-speed coating, and since there are few bubbles and thus fewer film defects, it imparts excellent properties to slit coating, which is a high-speed coating method. For example, the fluorinated surfactant may be a perfluorinated surfactant.

[0129] Additionally, the solvent-free quantum dot composition according to one embodiment may use a silicone-based surfactant together with the aforementioned fluorine-based surfactant. Specific examples of the silicone-based surfactant include, but are not limited to, TSF400, TSF401, TSF410, and TSF4440 from Toshiba Silicone Co., Ltd.

[0130] The surfactant, including the fluorinated surfactant, may be included in an amount of 0.01 to 5 wt%, for example, 0.1 to 2 wt%, based on the total amount of the quantum dot composition (e.g., based on solid content). When the surfactant is included within the above range, the phenomenon of foreign substances occurring in the sprayed composition is reduced.

[0131] Additionally, the solvent-free quantum dot composition according to one embodiment may further include a certain amount of other additives, such as antioxidants, within a range that does not impair physical properties.

[0132] According to one embodiment, the quantum dot composition may have a viscosity of 10 to 30 cps, for example, 15 to 30 cps, at 25°C.

[0133] Another aspect provides a cured film manufactured using the above-described composition and a display device including the cured film.

[0134] According to one embodiment, the cured film comprises a cured product of the quantum dot composition.

[0135] One of the methods for manufacturing the above-mentioned cured film includes a step (S1) of forming a pattern by applying the above-mentioned solvent-free quantum dot composition and solvent-type quantum dot composition onto a substrate using an inkjet jetting method; and a step (S2) of curing the pattern.

[0136] (S1) Pattern forming step

[0137] The above-described solvent-free quantum dot composition is preferably applied to a substrate at a thickness of 0.5 to 20 μm using an inkjet jetting method. The inkjet jetting method can form a pattern by repeatedly spraying only a single color per nozzle according to the required number of colors. To reduce the process, the pattern can also be formed by simultaneously spraying the required number of colors through each inkjet nozzle.

[0138] The above inkjet jetting method can use an inkjet printer having an inkjet head equipped with a piezo-type nozzle that applies pressure according to voltage.

[0139] More specifically, the quantum dot composition is ejected from a nozzle of an inkjet head onto a substrate. At this time, the ejection amount of the composition may be 1 to 30 pL / time, for example, 1 to 20 pL / time, or as another example, 1 to 10 pL / time.

[0140] The aperture of the inkjet head may be, but is not limited to, 5 to 100 μm, for example, 10 to 80 μm, to minimize clogging of the nozzle and improve ejection precision.

[0141] The ejection pressure of the inkjet head is 1000 to 100000s based on the shear speed. -1 It may be, but is not limited to,

[0142] The temperature at the time of discharge is not particularly limited, but may be 10 to 70°C, for example, 15 to 60°C, as another example, 15 to 40°C, or as another example, 20 to 35°C, from the viewpoint of suppressing crystallization of materials included in the ink composition.

[0143] (S2) Hardening stage

[0144] The pattern thus obtained can be cured to obtain pixels. A photocuring process can be employed as a curing method. The photocuring process involves irradiating active rays, such as UV rays, with a wavelength of 190 nm to 450 nm, for example, 200 nm to 500 nm. Light sources used for the irradiation include low-pressure mercury lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, metal halide lamps, and argon gas lasers. X-rays, electron beams, and the like can also be employed, depending on the circumstances.

[0145] Another method of manufacturing the above-mentioned cured film is to manufacture the cured film using a lithography method using the above-mentioned solvent-free quantum dot composition and solvent-type quantum dot composition, and the manufacturing method is as follows.

[0146] (1) Application and film formation stage

[0147] The above-described quantum dot composition is applied to a substrate that has undergone a predetermined pretreatment using a spin or slit coating method, a roll coating method, a screen printing method, an applicator method, or the like to a desired thickness, for example, 2 μm to 10 μm, and then heated at a temperature of 70°C to 90°C for 1 to 10 minutes to remove the solvent, thereby forming a film.

[0148] (2) Exposure stage

[0149] In order to form a necessary pattern on the obtained film, a mask of a predetermined shape is interposed, and then an active ray such as UV light of 190 nm to 450 nm, for example, 200 nm to 500 nm, is irradiated. Light sources used for irradiation include low-pressure mercury lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, metal halide lamps, argon gas lasers, etc., and in some cases, X-rays, electron beams, etc. can also be used.

[0150] The exposure dose varies depending on the type, mixing amount, and dry film thickness of each component of the quantum dot composition, but for example, when using a high-pressure mercury lamp, it is 500 mJ / cm 2　Below (based on 365 nm sensor).

[0151] (3) Phenomenon stage

[0152] Following the above exposure step, an alkaline aqueous solution is used as a developer to dissolve and remove unnecessary portions, leaving only the exposed portions to form an image pattern. That is, when developing with an alkaline developer, the unexposed portions are dissolved, and an image color filter pattern is formed.

[0153] (4) Post-processing stage

[0154] The image pattern obtained by the above phenomenon can be cured by reheating or irradiating with active rays, etc., to obtain a pattern superior in terms of heat resistance, light resistance, adhesion, crack resistance, chemical resistance, high strength, storage stability, etc.

[0155] The above display device includes the above cured film.

[0156] The above display device may be a light-emitting element display device including an organic light-emitting display device.

[0157] Figure 1 is a cross-sectional view of a light-emitting display device according to one embodiment.

[0158] Referring to FIG. 1, a display device (11) according to one embodiment includes a first substrate (111), two or more first electrodes (112) formed on the first substrate (111), a pixel defining film (113) formed between adjacent first electrodes (112), and a light source (10) including an organic light-emitting layer (120) formed on each of the first electrodes (112) and emitting a first light, a second electrode layer (114) formed on the organic light-emitting layer (120), and a first planarization layer (115) formed on the second electrode layer (114), a sealing layer (119) formed on the first planarization layer (115), a second planarization layer (118) formed on the sealing layer (119), and a color filter layer (130) formed on the second planarization layer (118), wherein the color filter layer includes quantum dots (3) that convert the first light into at least one of different second light and third light, It includes a second substrate (116) formed on a color filter layer (130).

[0159] In a display device (11) according to one embodiment, the organic light-emitting layer (120) can be defined as a first pixel area, a second pixel area, and a third pixel area, and each pixel area is spaced apart at a predetermined interval by a pixel definition film (113). In one embodiment, unit layers belonging to the first to third pixel areas of the organic light-emitting layer (120) are defined as first to third organic light-emitting layers (120a to 120c), respectively.

[0160] The color filter layer (130) is formed to cover the space between adjacent light-blocking members (117). The color filter layer (130) includes first to third color filters (130r, 130g, 130b) formed at positions that overlap the first to third pixel areas described above, respectively.

[0161] In one embodiment, the first color filter (130r) can emit a second light different from the first light, the second color filter (130g) can emit a third light different from the first light, and the third color filter (130b) can emit the first light.

[0162] Although not shown in FIG. 1, the display device may further include a color conversion layer.

[0163]

[0164] Hereinafter, the structure and operation of the present invention will be described in more detail through preferred embodiments of the present invention. However, these are presented as preferred examples of the present invention and should not be construed as limiting the present invention in any way.

[0165]

[0166] Manufacturing Example 1

[0167] (Manufacture of surface-modified quantum dots)

[0168] A magnetic bar is placed in a three-necked round bottom flask, and a green quantum dot dispersion solution (InP / ZnSe / ZnS; quantum dot solid content 23 wt%) is added.

[0169] Here, R in the above chemical formula 2 1 = Acyl group derived from C17:0, R 2 = Acyl group derived from C17:0, R 3 = Triacylglycerol (chemical formula 2-1 below), which is an acyl group derived from C17:1, is added. Triacylglycerol is added in an amount of 10 wt% based on the content of the green quantum dots. Then, the mixture is stirred at 200°C under a nitrogen atmosphere. After the reaction is complete, the mixture is cooled to room temperature (23°C) and the quantum dot reaction solution is added to cyclohexane to precipitate. The precipitate and cyclohexane are separated by centrifugation, and the precipitate is sufficiently dried in a vacuum oven for one day to obtain quantum dots that are surface-modified with the triacylglycerol and have a micellar structure.

[0170] The manufactured quantum dots were dispersed in hydrophilic solvents, hydrophobic solvents, etc., and centrifuged to evaluate whether the quantum dots precipitated. If the quantum dots precipitated, the quantum dots were evaluated to have a micelle structure.

[0171] [Chemical Formula 2-1]

[0172]

[0173] Manufacturing Example 2

[0174] Quantum dots having a micelle structure and surface-modified with triacylglycerol are obtained in the same manner as in Manufacturing Example 1, except that the content of the chemical formula 2-1 is changed to 40 wt%.

[0175] Manufacturing Example 3

[0176] Quantum dots having a micelle structure and surface-modified with triacylglycerol are obtained in the same manner as in Manufacturing Example 1, except that the content of the chemical formula 2-1 is changed to 70 wt%.

[0177] Manufacturing Example 4

[0178] In Manufacturing Example 2, R in the chemical formula 2 1 = C17:0, R 2 = C17:1, R 3 = Quantum dots having a micelle structure and surface-modified with triacylglycerol are obtained in the same manner as in Manufacturing Example 2, except that the surface-modifying compound of Chemical Formula 2-2 below is used by changing to C17:3.

[0179] [Chemical Formula 2-2]

[0180]

[0181] Manufacturing Example 5

[0182] Quantum dots surface-modified with triacylglycerol are obtained in the same manner as in Manufacturing Example 2, except that a surface-modifying compound of the following chemical formula is used instead of the compound of the chemical formula 2-1 in Manufacturing Example 2. These quantum dots do not form a micelle structure.

[0183] [chemical formula]

[0184]

[0185] (Manufacturing of quantum dot composition)

[0186] (A) Multifunctional acrylic monomer; Dipentaerythritol hexaacrylate

[0187] (B) Multifunctional additive; perfluorooctanoic acid (fluorinated surfactant)

[0188] (C) Radical initiator: TPO-L (Polynetran)

[0189] (D) Quantum dots: Surface-modified quantum dots manufactured in Manufacturing Examples 1 to 5

[0190] (E) Light scattering agent: Titanium dioxide dispersion (TiO2; D50 (180 nm), solid content 50 wt%

[0191]

[0192] Example 1

[0193] The surface-modified quantum dots and multifunctional acrylic monomer are mixed and stirred at room temperature for 12 hours. A multifunctional additive is added and stirred at room temperature for 5 minutes. Next, a radical initiator and a light-scattering agent are added and mixed to produce a solvent-free quantum dot composition.

[0194] Examples 2 to 4

[0195] A quantum dot composition is manufactured in the same manner as in Example 1, except that the type and content of each component in Example 1 are changed as shown in Table 1 below.

[0196] Comparative Example 1

[0197] A quantum dot composition is prepared in the same manner as in Example 1 by mixing a green quantum dot dispersion solution (InP / ZnSe / ZnS; quantum dot solid content 23 wt%), a multifunctional acrylic monomer, a multifunctional additive, a radical initiator, and a light scattering agent.

[0198] Comparative Example 2

[0199] A quantum dot composition is prepared in the same manner as in Example 1, except that the quantum dots of Preparation Example 5 are used instead of the quantum dots of Preparation Example 1 in Example 2.

[0200] Comparative Example 123412 Multifunctional acrylic binder 555555555555 Multifunctional additive 1.81.81.81.81.81.8 Radical initiator 0.10.10.10.10.10.1 Quantum dot R 1 C17:0C17:0C17:0C17:0--R 2 C17:0C17:0C17:0C17:1--R 3 C17:1C17:1C17:1C17:3--Modified compound content 10 wt% 40 wt% 70 wt% 40 wt% -40 wt% Content in composition 42.242.242.242.242.242.242.2 Light scattering agent 0.90.90.90.90.90.9

[0201]

[0202] Table 1 above shows the content of each component based on the solid content of the quantum dot compositions manufactured in the examples and comparative examples.

[0203]

[0204] The properties of the manufactured quantum dot composition were evaluated in Table 2 below, and the results are shown in Figures 2 to 4 and Table 2.

[0205] (1) Satellite generation 1: 2 ml of the manufactured quantum dot composition was placed in an inkjet jetting device, and the morphology of the droplets was evaluated by jetting at a voltage of 6 V or higher and a head temperature of 45°C at a rate of drop / 1 μs.

[0206] (2) Satellite generation 2: 2 ml of the manufactured quantum dot composition was placed in an inkjet jetting device, and the shape of the droplet was evaluated by jetting at a voltage of 6 V or higher and a head temperature of 45°C at a rate of 1 μs for 72 hours.

[0207] (3) Nozzle contamination: When jetting was performed as in (2), the nozzle contamination was evaluated.

[0208] (4) Jetting speed (unit: m / s): 2 ml of the manufactured quantum dot composition was placed in an inkjet jetting device, and the jetting speed was evaluated by jetting at a voltage of 6 V or higher and a head temperature of 25°C or 45°C for 24 to 72 hours.

[0209] (5) Light absorption rate, light conversion rate, and light conversion rate maintenance rate (unit: %): After applying 2 mL of each quantum dot composition corresponding to the examples and comparative examples on a glass substrate, spin coating was performed at 1500 rpm and exposed using an exposure device (wavelength 395 nm). Thereafter, the light conversion rate (PRB light conversion rate) was measured for a single film (width x length x thickness, 2 cm x 2 cm x 7 nm) on the glass substrate using an integrating hemisphere quantum efficiency meter (Otsuka, QE-2100).

[0210] Afterwards, curing (POB) was performed in a nitrogen atmosphere at 180°C for 30 minutes, and then cooling was performed for 1 hour. The photoconversion rate (POB photoconversion rate) was measured using the same method as above.

[0211] The retention rate was calculated as the percentage of the light conversion rate measured in POB relative to the light conversion rate measured after exposure. A higher retention rate indicates that the light efficiency of the cured film formed with the quantum dot composition did not decrease.

[0212] (6) Whether micelles were formed: To check the jetting latency, 20 ml of ink was filled into the KM Head of 1024 nozzles, and the cumulative jetting time from 0 to 72 hours was checked, and the contamination level and velocity of the nozzle were checked.

[0213] Example Comparative Example 123412 Satellite generation 1 (@0 hour) None None None None None None Satellite generation 2 (@72 hours) None None None None None Nozzle contamination None None None None None Yes Yes Jetting speed (@25℃) @0 hour 6.16.16.16.36.06.2 @24 hour 5.9 6.06.16.36.36.0 @48 hour 5.9 6.06.16.35.95.8 @72 hour 5.6 6.06.16.35.65.7 Jetting Speed ​​(@45℃)@0hr6.96.97.07.26.56.3@24hr6.76.87.07.26.06.0@48hr6.66.87.07.26.05.8@72hr6.66.86.97.25.65.7Incident light absorption84.0084.7285.2287.2183.9084.33Light conversion ratePRB37.9038.2138.4539.8837.6038.10POB37.5538.0138.3539.4537.1136.05Light conversion rate retention99.0899.4899.7498.9298.7094.61Micell formation Whether or not it is formed, formed, formed, formed, unformed, unformed

[0214]

[0215] According to Table 2 above, the quantum dot composition of the example can produce fine droplets without satellite generation when inkjet jetting, maintains inkjet jetting properties compared to before exposure even when exposed to high temperatures for a long period of time inside the jetting head, does not have a decrease in light conversion rate, and provides a quantum dot composition with excellent processability because there is no contamination at the nozzle area of ​​the jetting head even when inkjet jetting for a long period of time.

[0216] FIG. 2 shows the state of droplets when inkjet-jetting the quantum dot compositions of the examples and comparative examples using an inkjet jetting equipment. Referring to FIG. 2, it can be confirmed that the quantum dot compositions of Example 1 (B of FIG. 1), Example 2 (C of FIG. 2), and Example 3 (D of FIG. 2) can produce fine droplets without generating satellites. On the other hand, referring to FIG. 2, it can be confirmed that Comparative Example 1 (A of FIG. 2) generated a lot of satellites.

[0217] FIG. 3 shows the state of droplets after 72 hours of inkjet jetting using an inkjet jetting equipment for quantum dot compositions of examples and comparative examples. Referring to FIG. 3, it can be confirmed that Example 1 (B of FIG. 3), Example 2 (C of FIG. 3), and Example 3 (D of FIG. 3) can produce fine droplets without satellite formation when the quantum dot compositions were inkjet-jetted in the start state and after 72 hours. On the other hand, referring to FIG. 3, it can be confirmed that Comparative Example 1 (A of FIG. 3) generated a lot of satellites when inkjet-jetting was performed after 72 hours compared to the start state.

[0218] FIG. 4 shows the contamination level of the nozzle portion of the jetting head at 72 hours after inkjet jetting using an inkjet jetting equipment for the quantum dot compositions of the examples and comparative examples. Referring to FIG. 4, it can be confirmed that the nozzle portion of the jetting head of Example 1 (B of FIG. 4), Example 2 (C of FIG. 4), and Example 3 (D of FIG. 4) was not contaminated at all at 72 hours. On the other hand, referring to FIG. 4, it can be seen that the nozzle portion of the jetting head of Comparative Example 1 (A of FIG. 4) was severely contaminated at 72 hours.

[0219]

[0220] Simple modifications or changes of the present invention can be easily implemented by a person having ordinary skill in the art, and all such modifications or changes can be considered to be included in the scope of the present invention.

Claims

1. A quantum dot composition comprising a quantum dot and a curable monomer, wherein the quantum dot is surface-modified with a glycerol-based compound.

2. A quantum dot composition according to claim 1, wherein the glycerol-based compound comprises a glycerol-based compound having an acyl group.

3. In the second paragraph, the glycerol-based compound is a quantum dot composition comprising a compound of the following chemical formula 2: [Chemical Formula 2] (In the above chemical formula 2, R 1 , R 2 , R 3 are each independently hydrogen or the chemical formula 1 below, R 1 , R 2 , R 3 At least one of them is chemical formula 1 below. [Chemical Formula 1] *-C(=O)-R (In the above, * is the connection part of the element, R is a saturated straight-chain, branched-chain or cyclic aliphatic hydrocarbon group having 3 to 30 carbon atoms, or an unsaturated straight-chain, branched-chain or cyclic aliphatic hydrocarbon group having 3 to 30 carbon atoms.

4. In the third paragraph, the R 1 , R 2 , R 3 All of the quantum dot compositions are of the above chemical formula 1.

5. In the third paragraph, the R 1 , R 2 , R 3 Two or more of the quantum dot compositions are different from each other.

6. In paragraph 3, R 1 , R 2 , R 3 are each independently selected from at least one of C4:0, C5:0, C6:0, C7:0, C8:0, C9:0, C10:0, C11:0, C12:0, C13:0, C14:0, C15:0, C16:0, C17:0, C18:0, C19:0, C20:0, C21:0, C22:0, C23:0, C24:0, C25:0, C26:0, C27:0, C28:0, C29:0, C30:0, C16:1, C18:1, C18:2, C18:3, C18:4, C20:1, C20:3, C20:4, C20:5, C22:1, C22:4, C22:6, C24:

1. A quantum dot composition derived from.

7. A quantum dot composition in which the glycerol-based compound is included in an amount of 10 to 70 wt% relative to the quantum dot and the surface is modified in the first paragraph.

8. A quantum dot composition according to claim 1, wherein the quantum dot has a micelle structure.

9. A quantum dot composition in the first paragraph, wherein the glycerol-based compound comprises 95 wt% or more of the surface modifying material of the quantum dot.

10. A quantum dot composition according to claim 1, wherein the quantum dot comprises a red quantum dot, a green quantum dot, or a combination thereof.

11. A quantum dot composition according to claim 1, wherein the quantum dot has a core / shell structure.

12. A quantum dot composition according to claim 1, wherein the quantum dot composition is solvent-free.

13. A quantum dot composition according to claim 1, wherein the composition further comprises at least one of a curable monomer, a light scattering agent, a polymerization inhibitor, and an additive.

14. A cured film comprising a cured product of the quantum dot composition of any one of claims 1 to 13.

15. A display device including a cured film of Article 13.

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