Cleaning base station and cleaning system

Abstract

A cleaning base station (200) and a cleaning system (100). The cleaning base station (200) comprises a housing (210) and a suction assembly (220), wherein the housing (210) is provided with a waste water inlet (211) and a waste water outlet (212), a waste water channel (213) being formed between the waste water inlet (211) and the waste water outlet (212); and the suction assembly (220) is arranged in the housing (210), the suction assembly (220) comprises a waste water pump (221), the waste water pump (221) being provided with a suction part, which is arranged in the waste water channel (213). The cleaning base station (200) uses direct suction to treat waste water in the cleaning system (100), so that the provision of a vacuum electric motor in the cleaning base station (200) is unnecessary, and even the provision of a waste water tank in the cleaning base station (200) is unnecessary, thereby reducing the complexity of the cleaning base station (200) and reducing the size of the cleaning base station (200).

Description

Cleaning base station and cleaning system

[0001] Cross-reference to Related Applications

[0002] The present disclosure claims priority to Chinese Patent Application 202420789036.1, filed on April 16, 2024, entitled “Cleaning base station and cleaning system”, the entire contents of which are incorporated herein by reference. TECHNICAL FIELD

[0003] The present application relates to the technical field of cleaning equipment, in particular, to a cleaning base station and a cleaning system. BACKGROUND

[0004] The background section provided herein is merely for information and is not necessarily prior art.

[0005] At present, the sewage tank of a cleaning system is arranged in a base station, and a vacuum motor is also arranged in the base station, the vacuum motor is used to form a vacuum in the sewage tank, so that the sewage in the sewage tank is discharged from the sewage tank under the action of the pressure difference between the inside and outside of the sewage tank. Although the base station of such a cleaning system can realize manual dumping of the sewage tank, the base station has a complex structure and a large size, and more importantly, the cost of the base station is high, and the maintenance cost is high.

[0006] SUMMARY

[0007] The purpose of the present application is to at least solve the technical problem of a complex base station structure. The purpose is achieved by the following technical solutions:

[0008] The first aspect of the present application provides a cleaning base station, the cleaning base station further comprising:

[0009] a housing, the housing being provided with a sewage inlet and a sewage outlet, and a sewage channel being formed between the sewage inlet and the sewage outlet;

[0010] a suction assembly, the suction assembly being arranged in the housing, the suction assembly comprising a sewage pump, the sewage pump having a suction part, the suction part being arranged in the sewage channel.

[0011] The cleaning base station of the present application adopts a direct suction mode to process the sewage in the cleaning system, so that it is not necessary to arrange a vacuum motor in the base station, or even not necessary to arrange a sewage tank in the cleaning base station, thereby simplifying the complexity of the cleaning base station, reducing the size of the cleaning base station, making the base station of the cleaning system more easy to carry and place, and reducing the manufacturing cost and the maintenance cost of the cleaning base station.

[0012] In addition, the cleaning base station according to the present application can also have the following additional technical features:

[0013] In some embodiments of the present application, the cleaning base station further comprises a filter assembly disposed at the sewage inlet.

[0014] In some embodiments of the present application, the sewage pump comprises any one of a centrifugal pump, an axial flow pump and a mixed flow pump.

[0015] A second aspect of the present application provides a cleaning system comprising the cleaning base station of any one of the above, the cleaning system further comprising:

[0016] a cleaning device provided with a sewage tank and a sewage outlet, the sewage outlet being in communication with a receiving cavity of the sewage tank, the sewage inlet being used to connect and communicate with the sewage outlet;

[0017] a sealing assembly used to seal the gap between the sewage outlet and the sewage inlet.

[0018] In some embodiments of the present application, the cleaning system further comprises a connecting assembly used to connect the sewage outlet and the sewage inlet, and to detachably connect the sewage outlet and the sewage inlet.

[0019] In some embodiments of the present application, the cleaning device further comprises a suction pipe, one end of the suction pipe being in communication with the sewage inlet, and the other end being disposed in the receiving cavity of the sewage tank.

[0020] In some embodiments of the present application, at least part of the bottom of the sewage tank is disposed obliquely, and the other end of the suction pipe extends to the bottom end of the bottom.

[0021] In some embodiments of the present application, the bottom of the sewage tank is funnel-shaped, and the other end of the suction pipe is disposed at the bottom end of the bottom.

[0022] In some embodiments of the present application, the cleaning device further comprises a spraying assembly, the spraying assembly being provided with at least one spraying port,

[0023] the spraying port being disposed in the receiving cavity of the sewage tank and facing the side wall of the receiving cavity.

[0024] In some embodiments of the present application, the spraying assembly comprises a plurality of spraying ports, the plurality of spraying ports respectively facing different directions. BRIEF DESCRIPTION OF DRAWINGS

[0025] Various other advantages and benefits will become apparent to those of ordinary skill in the art upon reading the following detailed description of the preferred embodiments with reference made to the accompanying drawings. The drawings are for purposes of illustration only and are not intended to be limiting in

[0026] Fig. 1 is a flow chart of the drainage process of the cleaning system of the present application;

[0027] Fig. 2 is a schematic diagram of the structure of the cleaning system of the present application, in which a cleaning base station and a cleaning device are shown;

[0028] Fig. 3 is a schematic diagram of the internal structure of the cleaning base station of the cleaning system of the present application;

[0029] Fig. 4 is a schematic diagram of the structure of the sewage pump of the cleaning system of the present application, in which a conical impeller suction end is shown;

[0030] Fig. 5 is a schematic diagram of one structure of the sewage tank of the cleaning system of the present application;

[0031] Fig. 6 is a sectional view of Fig. 5;

[0032] Fig. 7 is a schematic diagram of another structure of the sewage tank of the cleaning system of the present application;

[0033] Fig. 8 is a sectional view of Fig. 7.

[0034] Reference Signs

[0035] 100, cleaning system;

[0036] 200, cleaning base station;

[0037] 210, housing; 211, sewage inlet; 212, sewage outlet; 213, sewage passage;

[0038] 220, suction assembly; 221, sewage pump; 222, conical impeller suction end; 2221, impeller; 223, drain pipe;

[0039] 230, filter assembly;

[0040] 300, cleaning device;

[0041] 310, sewage tank; 311, drain outlet; 312, side wall; 313, funnel-shaped bottom; 314, concave-shaped bottom; 315, spraying assembly; 3151, spraying member; 3152, spraying outlet; 3153, water delivery pipe;

[0042] 320, sealing assembly;

[0043] 330, suction pipe;

[0044] 340. A floor brush assembly;

[0045] 350. A walking assembly. DETAILED DESCRIPTION

[0046] Example embodiments of the present disclosure will be described more fully hereinafter with reference to the accompanying drawings. While example embodiments of the present disclosure are shown in the drawings, it is understood that the present disclosure can be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and fully convey the scope of the present disclosure to those skilled in the art.

[0047] It is to be understood that the terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. The terms "comprises", "comprising", "includes", "including" and "has" are inclusive and therefore specify the presence of stated features, steps, operations, elements, and / or components, but do not preclude the presence or addition of one or more other features, steps, operations, elements, components, and / or groups thereof. The method steps, processes, and operations described herein are not to be construed as necessarily requiring their performance in the particular order in which they are described, unless specifically identified as an order dependent step. It is also to be understood that additional or alternative steps can be employed.

[0048] Although the terms first, second, third, and the like can be used herein to describe various elements, components, regions, layers and / or sections, these elements, components, regions, layers and / or sections should not be limited by these terms. These terms can be only used to distinguish one element, component, region, layer or section from another region, layer or section. Terms such as "first", "second", and other numerical terms when used herein do not imply a sequence or order unless clearly indicated by the context. Thus, a first element, component, region, layer or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the example embodiments.

[0049] For ease of description, spatial relative terms can be used herein to describe the relationship of one element or feature to another element or feature as shown in the drawings, such as "inner", "outer", "inside", "outside", "lower", "below", "upper", "above", and the like. Such spatial relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the drawings. For example, if the device in the drawings is turned over, elements described as "below" or "under" other elements or features would then be oriented "above" or "over" the other elements or features. Thus, the example term "below" can encompass both an orientation of above and below. The device can be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

[0050] The cleaning system of the present application comprises a cleaning device and a cleaning base station, wherein the cleaning device is used to clean dirt on the ground, and the cleaning base station is used to pump and discharge sewage in the cleaning device.

[0051] The cleaning system provided by the present application sets a sewage tank in the cleaning device, and when the cleaning device is connected with the cleaning base station, the cleaning base station pumps and discharges the sewage in the sewage tank in the cleaning device.

[0052] Specifically, a sewage pump is arranged in the cleaning base station, and the sewage pump is used to discharge the sewage in the sewage tank in the cleaning device in a direct pumping manner.

[0053] Since the cleaning base station of the cleaning system of the present application no longer sets a sewage tank, the volume of the cleaning base station is smaller, the cleaning base station is convenient to carry, occupies a smaller space, and brings better use experience to the user.

[0054] The cleaning base station of the present application adopts a sewage pump direct pumping method to discharge sewage, compared with the sewage discharge method of the prior art which discharges sewage by pumping the sewage tank, the structure is simpler, and the sewage tank does not need to be completely sealed, so whether it is for processing and manufacturing, or for later maintenance of the cleaning base station, it is more convenient.

[0055] Among them, the sewage pump in the cleaning base station comprises any one of a centrifugal pump, an axial flow pump and a mixed flow pump.

[0056] It can be understood that when the cleaning device in the cleaning system cleans the dirt on the ground, a large amount of sundries is collected in the sewage tank. Using a common gear water pump to discharge sewage can easily cause damage to the water pump, and it is difficult to completely discharge the sewage with sundries. Therefore, the common practice in the prior art is to vacuum the sewage tank, use the pressure difference between the inside and outside of the sewage pump, and set up a separate sewage discharge pipeline to discharge the sewage with sundries.

[0057] The cleaning system of the present application improves the sewage pump in the cleaning base station and overcomes the technical prejudice that the sewage in the sewage tank cannot be directly pumped out by setting a sewage discharge channel suitable for sewage with sundries.

[0058] The cleaning system of the present application will be described in detail below with reference to the accompanying drawings. It should be noted that the drawings and examples are only used to explain the present application and cannot be understood as a limitation on the present application.

[0059] Figure 1 is a flowchart of the drainage process of the cleaning system of the present application. As shown in Figure 1, the cleaning system 100 is provided with a sewage tank 310 in the cleaning device 300, one end of the suction pipe 330 extends into the sewage tank 310, and the other end is connected to the inlet of the sewage pump 221 in the cleaning base station 200. Under the action of the sewage pump 221, the sewage with dirt in the sewage tank 310 is discharged through the suction pipe 330 and the sewage discharge pipe 223. As can be seen from the present embodiment, the cleaning system 100 provided by the present application uses a direct suction method to discharge the sewage in the sewage tank 310.

[0060] The cleaning system of the present embodiment discharges sewage in a more simple and easy way, discards the practice of vacuuming the sewage tank 310 in the prior art, and has obvious advantages.

[0061] Figure 3 is a schematic diagram of the internal structure of the cleaning base station of the cleaning system of the present application. As shown in Figure 3, the cleaning base station 200 of the cleaning system 100 includes a housing 210 and a suction assembly 220. The housing 210 is provided with a sewage inlet 211 and a sewage outlet 212, and a sewage passage 213 is formed between the sewage inlet 211 and the sewage outlet 212. As shown by the arrow in Figure 3, the sewage enters the sewage passage 213 at the sewage inlet 211 and is discharged from the sewage passage 213 at the sewage outlet 212.

[0062] The sewage can flow in the sewage channel 213 due to the pumping action of the sewage pump 221 in the suction assembly 220. As shown in FIG. 3, the sewage pump 221 in the suction assembly 220 has a conical impeller suction end 222 extending downward into the sewage channel 213. The conical impeller suction end 222 is arranged in the sewage channel 213, which is beneficial to form a larger flow area in the sewage channel 213, so that the sewage containing dirt can flow smoothly in the sewage channel 213.

[0063] In addition, the conical impeller suction end 222 is arranged in the sewage channel 213 from top to bottom. During the operation of the sewage pump 221, even if some sundries are adhered to the impeller 2221, the conical impeller suction end 222 is more likely to get rid of the entanglement of sundries under the action of gravity and the flow of sewage, and some dirt will not accumulate on the conical impeller suction end 222 of the sewage pump 221.

[0064] Therefore, the cleaning system 100 in the embodiment can suck the sewage in a straight suction manner by improving the sewage pump 221 and the installation mode of the conical impeller suction end 222 of the sewage pump 221.

[0065] It should be further explained that, as shown in FIG. 3, at the position of the conical impeller suction end 222 of the sewage pump 221, the sewage in the sewage channel 213 can flow freely in the flow channel indicated by the arrow, reducing the possibility of sewage blockage.

[0066] Under the suction action of the sewage pump 221, the sewage flows downward at the conical impeller suction end 222 and is pumped to the sewage outlet 212.

[0067] In an embodiment of the present application, a filter assembly 230 is further arranged at the sewage inlet 211 of the cleaning base station 200. The filter assembly 230 can filter the sewage and collect the filterable dirt in the sewage in the filter assembly 230, reducing the influence of impurities in the sewage on the sewage pump 221, and also avoiding the blockage of the sewage channel 213.

[0068] The filter assembly 230 can be arranged in detachable connection with the shell 210 to facilitate regular cleaning of sundries in the filter assembly 230 or regular replacement of the filter screen in the filter assembly 230.

[0069] It can be understood that the filter assembly 230 can be arranged in multiple stages to filter the sewage, and the filtering effect is more obvious.

[0070] The filtering precision of the filter assembly 230 can also be selected according to actual needs, so that different types of particulate impurities in the sewage can be filtered.

[0071] Figure 4 is a structural schematic diagram of the sewage pump of the cleaning system of the present application, wherein a conical impeller suction end is shown. As shown in Figure 4, the sewage pump 221 of the cleaning device 300 has a conical impeller suction end 222, wherein a plurality of impellers 2221 are arranged at the conical impeller suction end 222, the plurality of impellers 2221 are uniformly distributed along the rotation axis of the conical impeller suction end 222, and the plurality of impellers 2221 rotate to pump the sewage in the sewage passage 213 to the sewage outlet 212.

[0072] In Figure 4, in order to see the impellers 2221 therein, the connecting piece of the conical impeller suction end 222 of the sewage pump 221 is separated from the impellers 2221, as indicated by the arrow, the sewage is sucked into the impellers 2221 at the inlet of the connecting piece, and is discharged at the sewage outlet 212 of the sewage passage 213.

[0073] In an embodiment of the present application, the cleaning device 300 further comprises a suction pipe 330, one end of the suction pipe 330 is in communication with the sewage inlet 211 of the cleaning base station 200, and the other end extends into the containing cavity of the sewage tank 310. Under the suction action of the sewage pump 221, the sewage in the sewage tank 310 is sucked into the sewage passage 213 and pumped to the sewage outlet 212, and finally discharged.

[0074] Figure 2 is a structural schematic diagram of the cleaning system of the present application, wherein the cleaning base station 200 and the cleaning device 300 are shown. As shown in Figure 2, the cleaning system 100 further comprises the cleaning device 300 and the cleaning base station 200,

[0075] Among them, the sewage tank 310 is arranged in the cleaning device 300, wherein the sewage tank 310 can be arranged in front of the cleaning device 300, and the sewage tank 310 can also be arranged behind the cleaning device 300.

[0076] The brush assembly 340 and the walking assembly 350 are arranged below the sewage tank 310. Under the driving of the walking assembly 350, the entire cleaning device 300 walks along the predetermined track, and at the same time, the brush assembly 340 cleans the ground passed by the cleaning device 300. A joystick is arranged along the height direction of the sewage tank 310, so as to facilitate the user to operate the cleaning device 300 through the joystick. The arrangement of the joystick can improve the overall height of the cleaning device 300, and is more in line with the user's usage habit.

[0077] As shown in Figure 2, the cleaning system 100 further comprises the cleaning base station 200. When the cleaning device 300 returns to the cleaning base station 200 and is connected with the cleaning base station 200, the cleaning base station 200 sucks and discharges the sewage in the sewage tank 310 of the cleaning device 300.

[0078] The cleaning device 300 is provided with a sewage tank 310 and a sewage outlet 311, the sewage outlet 311 is communicated with the containing cavity of the sewage tank 310, when the cleaning device 300 returns to the cleaning base station 200, the sewage outlet 311 of the cleaning device 300 is communicated with the sewage inlet 211 of the cleaning base station 200, so that the sewage pump 221 in the cleaning base station 200 can suck the sewage in the sewage tank 310.

[0079] The cleaning device 300 further comprises a sealing assembly 320, the sealing assembly 320 is used for sealing the gap between the sewage outlet 311 and the sewage inlet 211, after the sewage inlet 211 of the cleaning base station 200 is sealed with the sewage outlet 311 of the cleaning device 300, it is beneficial to suck the sewage in the sewage tank 310.

[0080] The sewage outlet 311 of the cleaning device 300 and the sewage inlet 211 of the cleaning base station 200 are connected through a connecting assembly, the connecting assembly can be buckle, flange, etc., in order to facilitate the separation of the cleaning device 300 and the cleaning base station 200, the connecting assembly should set the sewage outlet 311 of the cleaning device 300 and the sewage inlet 211 of the cleaning base station 200 as detachable connection.

[0081] As can be seen from FIG. 2, the volume of the cleaning base station 200 is much smaller than that of the cleaning device 300, which is used to place the cleaning base station 200 in a limited space, reducing the trouble brought to the user by the cleaning base station 200 due to being too large.

[0082] As shown in FIGS. 5 and 6, the bottom of the containing cavity of the sewage tank 310 is funnel-shaped, the funnel-shaped bottom can concentrate the dirt in the sewage, under the action of gravity, when the sundries in the sewage are concentrated in the funnel-shaped bottom, one end of the suction pipe 330 is communicated with the sewage inlet 211 of the cleaning base station 200, the other end extends to the low end of the funnel-shaped bottom 313 of the sewage tank 310, which can concentrate and discharge the dirt concentrated in the bottom end, and is beneficial to keep the inside of the sewage tank 310 clean.

[0083] As shown in FIGS. 5 and 6, the cleaning device 300 further comprises a spraying assembly 315, the spraying assembly 315 is provided with at least one spraying port 3152, the spraying port 3152 is arranged in the containing cavity of the sewage tank 310 and faces the side wall 312 of the containing cavity, the spraying port 3152 sprays water on the side wall 312 of the sewage tank 310, which can clean the inner wall of the sewage tank 310 and reduce the dirt remaining on the side wall 312 of the sewage tank 310.

[0084] It can be understood that after the spray port 3152 sprays the side wall 312 of the sewage tank 310, the sewage will gather to the funnel-shaped bottom, and the sewage in the funnel-shaped bottom is pumped and discharged through the sewage pump 221 and the suction pipe 330, and after the containing cavity of the sewage tank 310 is cleaned for many times, it is beneficial to keep the sewage tank 310 at a high cleanliness.

[0085] Among them, along the circumference of the sewage tank 310, a plurality of spray ports 3152 can be arranged, so that the plurality of spray ports 3152 can spray and clean the side wall 312 in different directions, and the dirt in each corner of the sewage tank 310 is cleaned.

[0086] In order to be able to clean different kinds of dirt, the water pipe 3153 connected with the spray port 3152 can also deliver a certain pressure of cleaning water, and under the action of a certain water pressure, the residue of dirt on the inner wall of the sewage tank 310 can be reduced; wherein the size of the water pressure should be determined according to the volume of the sewage tank 310 and the size of the spray port 3152.

[0087] Figure 7 is another structure schematic view of the sewage tank 310 of the cleaning system 100 of the present application, and Figure 8 is a sectional view of Figure 7. As shown in Figures 7 and 8, in an embodiment of the present application, the bottom of at least part of the containing cavity of the sewage tank 310 is inclined, and the other end of the suction pipe 330 extends to the bottom end of the inclined bottom.

[0088] The bottom of the containing cavity of the sewage tank 310 can be provided as a concave type, and the concave bottom 314 will force the dirt in the sewage to gather at the lower edge of the side wall 312, and the other end of the suction pipe 330 should be arranged at the lower edge of the side wall 312 of the sewage tank 310 to suck the gathered dirt.

[0089] The bottom of the sewage tank 310 can also be inclined to one side, which is beneficial to the dirt in the sewage to gather on one side of the bottom of the sewage tank 310, and the other end of the suction pipe 330 extends to the bottom end of the bottom of the sewage tank 310, which can also concentrate the dirt gathered on one side of the bottom of the sewage tank 310.

[0090] In an embodiment of the present application, as shown in Figures 7 and 8, the cleaning device 300 further comprises a spray assembly 315, the spray assembly 315 is provided with at least one spray port 3152, the spray port 3152 is arranged in the containing cavity of the sewage tank 310 and faces the side wall 312 of the containing cavity. When the spray port 3152 sprays cleaning water on the side wall 312 of the sewage tank 310, the sewage on the side wall 312 is washed away and concentrated at the lower edge of the side wall 312.

[0091] The cleaning water with pressure can be delivered through the water delivery pipe 3153, and the cleaning water with pressure can clean the side wall 312 of the sewage tank 310 more thoroughly.

[0092] It can be understood that the spray assembly 315 can be provided with a plurality of spray openings 3152, and the spray openings 3152 are arranged opposite to the side wall 312, so as to clean the side wall 312 of the sewage tank 310 from top to bottom.

[0093] When the side wall 312 of the sewage tank 310 is inclined to a certain angle with the vertical direction, the spray openings 3152 arranged opposite to the side wall 312 can clean the inclined side wall 312, and the dirt remaining on the side wall 312 can be washed to the bottom of the sewage tank 310 under the flushing of the cleaning water.

[0094] The sewage tank 310 in the cleaning device 300 in the embodiment is inclined at the bottom, and the suction pipe 330 can be arranged at the edge of the sewage tank 310 close to the side wall 312, so as to avoid the interference between the suction pipe 330 and the spray assembly 315.

[0095] In summary, the cleaning system 100 provided by the application improves the cleaning base station 200, the sewage tank 310 is no longer arranged in the cleaning base station 200, and the sewage is discharged by using the direct suction mode. Such improvement can reduce the overall volume outside the cleaning base station 200, is conducive to the carrying and prevention of the cleaning base station 200, and no longer occupies a large space.

[0096] In addition, the vacuum pumping device is no longer arranged in the cleaning base station 200, and therefore, the structure is simpler, which is conducive to the processing and manufacturing and the later maintenance and repair.

[0097] The cleaning system 100 of the application can clean the sewage tank 310 of the cleaning device multiple times, so as to ensure the cleanliness inside the sewage tank 310. The spray assembly 315 cooperates with the sewage pump 221 to clean the sewage tank 310 and discharge the sewage in time.

[0098] The above is only the preferred specific embodiment of the application, but the protection scope of the application is not limited to this. Any changes or replacements within the technical range disclosed by the application can be easily thought by those skilled in the art, and should be covered in the protection scope of the application. Therefore, the protection scope of the application should be subject to the protection scope of the claims.

Claims

1. A cleaning base station, wherein, The cleaning base station comprises: a housing, which is provided with a sewage inlet and a sewage outlet, and a sewage channel is formed between the sewage inlet and the sewage outlet; a suction assembly arranged in the housing, which comprises a sewage pump with a suction part arranged in the sewage channel.

2. The cleaning dock of claim 1, wherein, The cleaning base station further comprises a filter assembly arranged at the sewage inlet.

3. The cleaning dock of claim 1, wherein, The sewage pump comprises any one of a centrifugal pump, an axial flow pump and a mixed flow pump.

4. A cleaning system wherein, The cleaning system comprises the cleaning base station according to any one of claims 1-3, and further comprises: a cleaning device provided with a sewage tank and a sewage outlet, the sewage outlet being in communication with a containing cavity of the sewage tank, and the sewage inlet being used to connect and communicate with the sewage outlet; a sealing assembly used to seal a gap between the sewage outlet and the sewage inlet.

5. The cleaning system of claim 4, wherein, The cleaning system further comprises a connecting assembly used to connect the sewage outlet and the sewage inlet, and to detachably connect the sewage outlet and the sewage inlet.

6. The cleaning system of claim 4, wherein, The cleaning device further comprises a suction pipe, one end of which is in communication with the sewage inlet, and the other end of which is arranged in the containing cavity of the sewage tank.

7. The cleaning system of claim 6, wherein, At least part of the bottom of the sewage tank is arranged to be inclined, and the other end of the suction pipe extends to the bottom end of the bottom.

8. The cleaning system of claim 7, wherein, The bottom of the sewage tank is funnel-shaped, and the other end of the suction pipe is arranged at the bottom end of the bottom.

9. The cleaning system of any one of claims 4-8, wherein, The cleaning device further comprises a spraying assembly, which is provided with at least one spraying port, The spraying port is arranged in the containing cavity of the sewage tank, and faces the side wall of the containing cavity.

10. The cleaning system of claim 9, wherein, The spraying assembly comprises a plurality of spraying ports, which respectively face different directions.

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