Tantalum carbide coating and preparation method thereof
By using the combination of physical vapor deposition method, sol-gel method and chemical vapor deposition method in the preparation of tantalum carbide coating, the defect problem in the preparation of ultra-thick tantalum carbide coating is solved, and the coating preparation with high density and low process difficulty is achieved.
CN119753683APending Publication Date: 2025-04-04MEISHAN BOYA ADVANCED MATERIALS CO LTD
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Patent Information
- Application Number
- CN202411930279.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-25
- Publication Date
- 2025-04-04
AI Technical Summary
Technical Problem
When preparing ultra-thick tantalum carbide coatings, defects such as cracks and pores are prone to occur, resulting in loose and porous coatings, reducing performance advantages, and increasing density, which is more difficult to process.
Method used
The first tantalum carbide coating is generated as the guiding layer by physical vapor deposition method, and an ultra-thick second tantalum carbide coating is generated by sol-gel method, spraying method, etc., and the third tantalum carbide coating is generated by chemical vapor deposition method for void sealing to improve density.
Benefits of technology
The preparation of an ultra-thick and dense tantalum carbide coating is achieved, reducing process requirements and preparation difficulty, and enhancing implementability.
✦ Generated by Eureka AI based on patent content.
Abstract
The embodiment of the invention provides a tantalum carbide coating and a preparation method thereof. The method comprises the following steps: by taking tantalum carbide as a raw material, generating a first tantalum carbide coating on the surface of a coating carrier through a physical vapor deposition method, a first tantalum source and a first carbon source are selected, and a second tantalum carbide coating is generated on the surface of the first tantalum carbide coating in a second preparation mode; and a second tantalum source and a second carbon source are selected, and a third tantalum carbide coating is generated on the surface of the second tantalum carbide coating through the chemical vapor deposition method. The tantalum carbide coating is prepared by adopting a tantalum carbide coating preparation method. The second tantalum carbide coating is loose and porous and has many defects, the compactness of the second tantalum carbide coating can be improved by preparing the first tantalum carbide coating to guide the second tantalum carbide coating and preparing the third tantalum carbide coating to block pores of the second tantalum carbide coating, and therefore the super-thick compact tantalum carbide coating with the total thickness larger than 200 micrometers is prepared; and the process requirements and the preparation difficulty are greatly reduced.
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