Distributed equivalent circuit of GaN HEMT device
By adopting a distributed equivalent circuit model in GaN HEMT device modeling, the problem that traditional modeling methods cannot describe the high-frequency distributed effects of devices is solved, and more accurate and physically meaningful model parameters are achieved, thereby better guiding device and circuit design.
Patent Information
- Application Number
- CN202411746902.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-02
- Publication Date
- 2025-05-02
- Estimated Expiration
- 2044-12-02
AI Technical Summary
The traditional GaN HEMT device modeling method cannot accurately describe the distributed effects of the device in a high-frequency working environment, resulting in the loss of physical significance and insufficient accuracy of model parameters.
The distributed equivalent circuit model is adopted to characterize the distributed effect inside the device by connecting multiple gate-source capacitors, gate-leakage capacitors, first intrinsic resistors in parallel.
The accuracy and physical significance of model parameters are improved, making the model more suitable for guiding device process design and circuit design, especially under high-frequency working conditions.
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Figure CN119918474A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of semiconductor device modeling, and in particular to a distributed equivalent circuit of a GaN HEMT device. Background Art
[0002] Microwave transistors play an important role in both military and communication fields. High electron mobility transistors (HEMTs) made of GaN materials have been widely used in microwave circuits due to their high frequency, high power, and high efficiency. In order to improve the efficiency of circuit design and shorten the cycle of circuit design, it is very meaningful to establish an accurate model for GaN HEMT. With the continuous progress and development of semiconductor materials, devices, and their preparation processes, traditional semiconductor device modeling methods can no longer accurately describe complex device characteristics. On the other hand, the continuous development of GaN HEMT devices has also put forward higher requirements on model accuracy, wide bandwidth, and multi-bias applicability. There have been many empirical models of GaN HEMT, and the empirical model modeling technology has become increasingly mature. However, most empirical models use lumped equivalent circuit models. When the device is in a high-frequency working environment, it is necessary to consider the distribution effect inside the components. Therefore, the lumped model parameters will make the model parameters lose their physical meaning, and the accuracy of the model is not enough; in addition, the lumped empirical model parameters usually lack physical meaning, and it is difficult to establish an intuitive connection with the device, so it is impossible to provide guidance for device technology and manufacturing. Summary of the invention
[0003] In order to solve the above technical problems, the purpose of the present invention is to provide a distributed equivalent circuit of a GaN HEMT device, which can characterize the distributed effects inside the GaN HEMT device under high-frequency working conditions, so that the parameters of the model are more accurate.
[0004] The first technical solution adopted by the present invention is: a distributed equivalent circuit of a GaN HEMT device, the circuit having a gate terminal, a drain terminal and a source terminal, a distributed gate-source capacitor and a distributed first intrinsic resistor are arranged between the gate terminal and the source terminal, a distributed gate-drain capacitor and a distributed second intrinsic resistor are arranged between the gate terminal and the drain terminal, a current source, a first capacitor and a first resistor are arranged at the drain terminal and the source terminal, a distributed gate inductor and a distributed gate resistor are arranged at the gate terminal, a second resistor and a first inductor are arranged at the drain terminal, and a third resistor and a second inductor are arranged at the source terminal, wherein:
[0005] The distributed gate-source capacitor includes a plurality of gate-source capacitors, and the plurality of gate-source capacitors are connected in parallel;
[0006] The distributed first intrinsic resistor includes a plurality of first intrinsic resistors, and the plurality of first intrinsic resistors are connected in parallel;
[0007] The distributed gate-drain capacitor includes a plurality of gate-drain capacitors, and the plurality of gate-drain capacitors are connected in parallel;
[0008] The distributed second intrinsic resistor includes a plurality of second intrinsic resistors, and the plurality of second intrinsic resistors are connected in parallel;
[0009] The distributed gate inductor includes a plurality of gate inductors, the distributed gate resistor includes a plurality of gate resistors, and the plurality of gate resistors are connected in series with the plurality of gate inductors.
[0010] Further, the gate terminal of the circuit is connected to the first end of the distributed gate inductor, the second end of the distributed gate inductor is connected to the first end of the distributed gate resistor, the second end of the distributed gate resistor and the first end of the distributed gate-drain capacitor are connected to the first end of the distributed gate-source capacitor, the second end of the distributed gate-source capacitor is connected to the first end of the distributed first intrinsic resistor, the second end of the distributed gate-drain capacitor is connected to the first end of the distributed second intrinsic resistor, the second end of the distributed first intrinsic resistor, the second end of the current source, the second end of the first capacitor, the second end of the first resistor are connected to the first end of the third resistor, the second end of the distributed second intrinsic resistor, the first end of the current source, the first end of the first capacitor, the first end of the first resistor are connected to the first end of the second resistor, the second end of the second resistor is connected to the first end of the first inductor, the second end of the first inductor is connected to the drain terminal of the circuit, the second end of the third resistor is connected to the first end of the second inductor, and the second end of the second inductor is connected to the source terminal of the circuit.
[0011] Furthermore, the circuit further includes a gate pad parasitic capacitor, a drain pad parasitic capacitor and a gate-drain pad coupling capacitor, wherein:
[0012] The first end of the gate pad parasitic capacitor is respectively connected to the gate terminal of the circuit, the first end of the distributed gate inductor is connected to the first end of the gate-drain pad coupling capacitor;
[0013] The second end of the gate pad parasitic capacitor is connected to the source end of the circuit, the second end of the second inductor is connected to the second end of the drain pad parasitic capacitor respectively:
[0014] The second end of the gate-drain pad coupling capacitor is respectively connected to the drain end of the circuit, and the second end of the first inductor is connected to the first end of the drain pad parasitic capacitor.
[0015] Furthermore, the circuit further includes a distributed gate-drain metal coupling capacitor, a distributed gate-source metal coupling capacitor and a second capacitor, wherein:
[0016] The distributed gate-drain metal coupling capacitor includes a plurality of gate-drain metal coupling capacitors, and the plurality of gate-drain metal coupling capacitors are connected in parallel;
[0017] The distributed gate-source metal coupling capacitor includes a plurality of gate-source metal coupling capacitors, and the plurality of gate-source metal coupling capacitors are connected in parallel.
[0018] Further, the first end of the distributed gate-drain metal coupling capacitor is respectively connected to the second end of the distributed gate inductor, the first end of the distributed gate resistor is respectively connected to the first end of the distributed gate-source metal coupling capacitor, the second end of the distributed gate-drain metal coupling capacitor is respectively connected to the second end of the second resistor, the first end of the first inductor is respectively connected to the first end of the second capacitor, and the second end of the distributed gate-source metal coupling capacitor is respectively connected to the second end of the third resistor, the first end of the second inductor is respectively connected to the second end of the second capacitor.
[0019] The beneficial effect of the circuit of the present invention is that the present invention replaces the traditional gate-source capacitance, gate-drain capacitance and intrinsic resistance with corresponding distributed structures. The distributed equivalent circuit model can characterize the distributed effects inside the device under high-frequency working conditions. The parameters of the model are more accurate and have certain physical meanings, which can better guide device process design and circuit design. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] Figure 1 It is a structural schematic diagram of a distributed equivalent circuit of a GaN HEMT device of the present invention;
[0021] Figure 2 is a structural schematic diagram of a distributed equivalent circuit of a second GaN HEMT device provided in a specific embodiment of the present invention;
[0022] Figure 3 It is a structural schematic diagram of a distributed equivalent circuit of a third GaN HEMT device provided in a specific embodiment of the present invention. DETAILED DESCRIPTION
[0023] The present invention is further described in detail below in conjunction with the accompanying drawings and specific embodiments. The step numbers in the following embodiments are only provided for the convenience of explanation and description, and the order between the steps is not limited in any way. The execution order of each step in the embodiment can be adaptively adjusted according to the understanding of those skilled in the art.
[0024] Reference Figure 1The present invention provides a GaN HEMT device distributed equivalent circuit, the circuit has a gate terminal G, a drain terminal D and a source terminal S, and a distributed gate-source capacitor C is arranged between the gate terminal and the source terminal gs With the distributed first intrinsic resistance R gs A distributed gate-drain capacitor C is provided between the gate terminal and the drain terminal. gd With the distributed second intrinsic resistance R gd The drain terminal and the source terminal are provided with a current source I ds , the first capacitor C ds With the first resistor R ds The gate end is provided with a distributed gate inductor L g With the distributed gate resistance R g The drain terminal is provided with a second resistor R d With the first inductor L d The source terminal is provided with a third resistor R s With the second inductor L s ,in:
[0025] The distributed gate-source capacitor includes a plurality of gate-source capacitors C gs1 ,C gs2 ,…C gsn , a plurality of gate-source capacitors are connected in parallel;
[0026] The distributed first intrinsic resistor includes a plurality of first intrinsic resistors R gs1 ,R gs2 ,…R gsn , a plurality of said first intrinsic resistors are connected in parallel;
[0027] The distributed gate-drain capacitor includes a plurality of gate-drain capacitors C gd1 ,C gd2 ,…C gdn , a plurality of gate-drain capacitors are connected in parallel;
[0028] The distributed second intrinsic resistor includes a plurality of second intrinsic resistors R gd1 ,R gd2 ,…R gdn , a plurality of said second intrinsic resistors are connected in parallel;
[0029] The distributed gate inductor includes a plurality of gate inductors L g1 ,L g2 ,…L gn , the distributed gate resistor includes several gate resistors R g1 ,R g2 ,…R gn , a plurality of the gate resistors and a plurality of the gate inductors are connected in series.
[0030] It should be further explained that the gate terminal G of the circuit and the distributed gate inductance L g The first end of the distributed gate inductor L g The second end of the distributed gate resistor R g The first end of the distributed gate resistor R g The second end of the distributed gate-drain capacitor C gd The first end of the distributed gate-source capacitance C gs The first end of the distributed gate-source capacitor C gs The second end of the distributed first intrinsic resistor R gs The first end of the distributed gate-drain capacitor C gd The second end of the distributed second intrinsic resistor R gd The first end of the distributed first intrinsic resistor R gs The second end of the current source I ds The second end of the first capacitor C ds The second end of the first resistor R ds The second end of the third resistor R s The first end of the distributed second intrinsic resistor R gd The second end of the current source I ds The first end of the first capacitor C ds The first end of the first resistor R ds The first end and the second resistor R d The first end of the second resistor R d The second end of the first inductor L d The first end of the first inductor L is connected d The second end of the third resistor R s The second end of the second inductor L s The first end of the second inductor L s The second end of is connected to the source terminal S of the circuit.
[0031] In this embodiment, the equivalent circuit topology of the GaN HEMT has three electrodes: a gate G, a drain D, and a source S, wherein the gate-source capacitance C between the gate G and the source S is gs , the gate-drain capacitance C between the gate G and the drain D gd , the intrinsic resistance R between the gate G and the source S gs , the intrinsic resistance R between the gate G and the drain D gd , gate inductance L g , Gate resistance R gIn signal transmission, it is no longer simply abstracted as a single component, but is replaced by distributed capacitors, resistors and inductors;
[0032] The gate-source capacitance C between the gate G and the source S gs , replaced by C gs1 ,C gs2 ,…C gsn ;
[0033] The gate-drain capacitance C between the gate G and the drain D gd , replaced by C gd1 ,C gd2 ,…C gdn ;
[0034] The intrinsic resistance R between the gate G and the source S gs , replaced by R gs1 ,R gs2 ,…R gsn ;
[0035] The intrinsic resistance R between the gate G and the drain D gd , replaced by R gd1 ,R gd2 ,…R gdn ;
[0036] Gate inductance L g , replaced by L g1 ,L g2 ,…L gn ;
[0037] Gate resistance R g , replaced by R g1 ,R g2 ,…R gn ;
[0038] Gate G connected to inductor L g1 One end of the source S is connected to the inductor L s One end of the drain D is connected to the inductor L d one end of
[0039] Inductance L g1 The other end of the resistor R g1 One end of the resistor R g1 The other end of the inductor L g2 , capacitor C gd1 and capacitor C gs1 One end of each; capacitor C gd1 The other end of the resistor R gd1 One end of the capacitor C gs1 The other end of the resistor R gs1 One end of the resistor R gs1 The other end of the resistor Rs ; Resistance R gd1 The other end is connected to the current source I ds , capacitor C ds , resistor R ds and resistor R d One end of each; inductance L g2 The other end of the resistor R g2 One end of the resistor R g2 The other end of the inductor L g3 , capacitor C gd2 and capacitor C gs2 One end of each; capacitor C gd2 The other end of the resistor R gd2 One end of the capacitor C gs2 The other end of the resistor R gs2 One end of the resistor R gs2 The other end of the resistor R s One end of the resistor R gd2 The other end is connected to the current source I ds , capacitor C ds , resistor R ds and resistor R d Each end.
[0040] Similar description to L gn ; Inductance L gn The other end of the resistor R gn One end of the resistor R gn The other end of the inductor L gn , capacitor C gdn and capacitor C gsn One end of each; capacitor C gdn The other end of the resistor R gdn One end of the capacitor C gsn The other end of the resistor R gsn One end of the resistor R gs The other end of the resistor R s One end of the resistor R gdn The other end is connected to the current source I ds , capacitor C ds , resistor R ds and resistor R d One end of each; resistance R d The other end of the inductor L d The other end of the resistor R s The other end of the inductor L s the other end.
[0041] Wherein n≥2, and n selects different values according to the gate electrode structure and operating frequency of the GaN HEMT device.
[0042] Further, refer to Figure 2 , the circuit also includes a gate pad parasitic capacitance C pgo , Drain pad parasitic capacitance C pdo Coupling capacitance C between gate and drain pad pgdo ,in:
[0043] The gate pad parasitic capacitance C pgo The first end is respectively connected to the gate terminal G of the circuit, the distributed gate inductor L g The first end of the gate drain pad is coupled to the capacitor C pgdo A first end is connected;
[0044] The gate pad parasitic capacitance C pgo The second end of the circuit is connected to the source terminal S of the circuit, the second inductor L s The second end and the drain pad parasitic capacitance C pdo The second end of the connection:
[0045] The gate-drain pad coupling capacitor P pgdo The second end of the circuit is connected to the drain terminal D of the circuit, the first inductor L d The second end and the drain pad parasitic capacitance C pdo The first end of the connection.
[0046] In this embodiment, the parasitic capacitance C pgo , Drain pad parasitic capacitance C pdo , gate pad and drain pad coupling capacitance C pgdo ; Gate G connects to capacitor C pgo And the capacitor C pgdo One end of each; source S is connected to capacitor C pgo and capacitor C pdo One end of each; drain D connects to capacitor C pgdo and capacitor C pdo Each end.
[0047] Further, refer to Figure 3 The circuit also includes a distributed gate-drain metal coupling capacitor C pgdi , Distributed gate-source metal coupling capacitance C pgi With the second capacitor C pdi ,in:
[0048] The distributed gate-drain metal coupling capacitor includes a plurality of gate-drain metal coupling capacitors C pgdi1 ,C pgdi2 ,…,C pgdin , a plurality of the gate-drain metal coupling capacitors are connected in parallel;
[0049] The distributed gate-source metal coupling capacitor includes a plurality of gate-source metal coupling capacitors C pgi1 ,C pgi2 ,…,C pgin , several of the gate-source metal coupling capacitors are connected in parallel.
[0050] It should be further explained that the distributed gate-drain metal coupling capacitor C pgdi The first end of each of the distributed gate inductors L g The second end of the distributed gate resistor R g The first end of the distributed gate-source metal coupling capacitor C pgi The first end of the distributed gate-drain metal coupling capacitor C pgdi The second end of the second resistor R d The second end of the first inductor L d The first terminal and the second capacitor C pdi The first end of the distributed gate-source metal coupling capacitor C pgi The second end of each resistor R s The second end of the second inductor L s The first terminal and the second capacitor C pdi The second end of the connection.
[0051] In this embodiment, the gate-drain metal coupling capacitance C is added to reflect the coupling capacitance between the gate and drain metal and the coupling capacitance between the gate and source metal. pgdi and gate-source metal coupling capacitance C pgi In signal transmission, it is no longer simply abstracted as a single component, but is replaced by distributed capacitors;
[0052] Gate-drain metal coupling capacitance C pgdi , replaced by C pgdi1 ,C pgdi2 ,…,C pgdin ;
[0053] Gate-source metal coupling capacitance C pgi , replaced by C pgi1 ,C pgi2 ,…,C pgin .
[0054] Inductance L g1 One end of the capacitor C pgi and capacitor C pgdi1 One end of each; inductance L g2 One end of the capacitor C pgi2 and capacitor C pgdi2 Each end.
[0055] Similar description to Lgn ; Inductance L gn One end of the capacitor C pgin and capacitor C pgdin One end of each; capacitor C pgin One end is connected to the inductor L s The other end of the capacitor C pgdin One end of the inductor L is connected d The other end of the resistor R d One end of the capacitor C pdi and capacitor C pgdi1 ,C pgdi2 ,…,C pgdin The other end of each; resistance R s One end of the capacitor C pdi And the capacitor C pgi1 ,C pgi2 ,…,C pgin The other end of each.
[0056] Finally, it should be noted that the circuit topology of the embodiment of the present invention can be applied to GaN HMET device construction models and process development kits (PDKs) to further assist in RF circuit design.
[0057] In summary, in the embodiment of the present invention, the internal distributed effect of the device is significant at high frequencies, and the traditional lumped parameter circuit model is no longer applicable, while the distributed model can be more accurately characterized, so that the model can better guide the device process design and circuit design. Accurate distributed models can quickly verify and improve design solutions through simulation and optimization tools, reduce data optimization iterations, reduce the number of data tests, and improve design efficiency.
[0058] Finally, it should be noted that the drawings of the present invention show various structural schematic diagrams drawn according to the embodiments of the present invention, which are not made according to the actual scale. Some details are enlarged for clearer expression, and some details may be omitted for simplified display. gs , the gate capacitance C between the gate G and the drain D gd , the intrinsic resistance R between the gate G and the source S gs , the intrinsic resistance R between the gate G and the drain D gd , gate inductance L g , Gate resistance R g , gate-drain metal coupling capacitance C pgdi and gate-source metal coupling capacitance C pgi In signal transmission, they can no longer be simply abstracted as single components, but should be replaced by distributed capacitors, resistors and inductors.
[0059] The above is a specific description of the preferred implementation of the present invention, but the invention is not limited to the embodiments. Those skilled in the art may make various equivalent modifications or substitutions without violating the spirit of the present invention. These equivalent modifications or substitutions are all included in the scope defined by the claims of this application.
Claims
1. A GaN HEMT device distributed equivalent circuit, characterized in that: The circuit has a gate terminal, a drain terminal and a source terminal, a distributed gate-source capacitor and a distributed first intrinsic resistor are arranged between the gate terminal and the source terminal, a distributed gate-drain capacitor and a distributed second intrinsic resistor are arranged between the gate terminal and the drain terminal, a current source, a first capacitor and a first resistor are arranged at the drain terminal and the source terminal, a distributed gate inductor and a distributed gate resistor are arranged at the gate terminal, a second resistor and a first inductor are arranged at the drain terminal, and a third resistor and a second inductor are arranged at the source terminal, wherein: The distributed gate-source capacitor includes a plurality of gate-source capacitors, and the plurality of gate-source capacitors are connected in parallel; The distributed first intrinsic resistor includes a plurality of first intrinsic resistors, and the plurality of first intrinsic resistors are connected in parallel; The distributed gate-drain capacitor includes a plurality of gate-drain capacitors, and the plurality of gate-drain capacitors are connected in parallel; The distributed second intrinsic resistor includes a plurality of second intrinsic resistors, and the plurality of second intrinsic resistors are connected in parallel; The distributed gate inductor includes a plurality of gate inductors, the distributed gate resistor includes a plurality of gate resistors, and the plurality of gate resistors are connected in series with the plurality of gate inductors.
2. A GaN HEMT device distributed equivalent circuit according to claim 1, characterized in that: The gate terminal of the circuit is connected to the first end of the distributed gate inductor, the second end of the distributed gate inductor is connected to the first end of the distributed gate resistor, the second end of the distributed gate resistor and the first end of the distributed gate-drain capacitor are connected to the first end of the distributed gate-source capacitor, the second end of the distributed gate-source capacitor is connected to the first end of the distributed first intrinsic resistor, the second end of the distributed gate-drain capacitor is connected to the first end of the distributed second intrinsic resistor, the second end of the distributed first intrinsic resistor, the second end of the current source, the second end of the first capacitor, the second end of the first resistor are connected to the first end of the third resistor, the second end of the distributed second intrinsic resistor, the first end of the current source, the first end of the first capacitor, the first end of the first resistor are connected to the first end of the second resistor, the second end of the second resistor is connected to the first end of the first inductor, the second end of the first inductor is connected to the drain terminal of the circuit, the second end of the third resistor is connected to the first end of the second inductor, and the second end of the second inductor is connected to the source terminal of the circuit.
3. The GaN HEMT device distributed equivalent circuit according to claim 2, characterized in that: The circuit also includes a gate pad parasitic capacitor, a drain pad parasitic capacitor and a gate-drain pad coupling capacitor, wherein: The first end of the gate pad parasitic capacitor is respectively connected to the gate terminal of the circuit, the first end of the distributed gate inductor is connected to the first end of the gate-drain pad coupling capacitor; The second end of the gate pad parasitic capacitor is connected to the source end of the circuit, the second end of the second inductor is connected to the second end of the drain pad parasitic capacitor respectively: The second end of the gate-drain pad coupling capacitor is respectively connected to the drain end of the circuit, and the second end of the first inductor is connected to the first end of the drain pad parasitic capacitor.
4. A GaN HEMT device distributed equivalent circuit according to claim 3, characterized in that: The circuit further includes a distributed gate-drain metal coupling capacitor, a distributed gate-source metal coupling capacitor and a second capacitor, wherein: The distributed gate-drain metal coupling capacitor includes a plurality of gate-drain metal coupling capacitors, and the plurality of gate-drain metal coupling capacitors are connected in parallel; The distributed gate-source metal coupling capacitor includes a plurality of gate-source metal coupling capacitors, and the plurality of gate-source metal coupling capacitors are connected in parallel.
5. A GaN HEMT device distributed equivalent circuit according to claim 4, characterized in that: The first end of the distributed gate-drain metal coupling capacitor is respectively connected to the second end of the distributed gate inductor, the first end of the distributed gate resistor is respectively connected to the first end of the distributed gate-source metal coupling capacitor, the second end of the distributed gate-drain metal coupling capacitor is respectively connected to the second end of the second resistor, the first end of the first inductor is respectively connected to the first end of the second capacitor, and the second end of the distributed gate-source metal coupling capacitor is respectively connected to the second end of the third resistor, the first end of the second inductor is respectively connected to the second end of the second capacitor.
Citation Information
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