Ultraviolet protection liquid for perovskite solar cell module and application thereof

Abstract

The application belongs to the technical field of solar cells, and relates to an ultraviolet protection liquid for a perovskite solar cell assembly and application thereof.The ultraviolet protection liquid for the perovskite solar cell assembly comprises ultraviolet curing glue and an organic solvent; the organic solvent comprises solvent A and solvent B, the solvent A comprises aromatic hydrocarbon solvents, the solvent B comprises any one of ketone solvents, ether solvents or aliphatic hydrocarbon solvents, and the viscosity of the ultraviolet protection liquid is 500 mPa.s to 800 mPa.s.The ultraviolet protection liquid is matched with the ultraviolet curing glue and two different organic solvents, has low viscosity, can quickly form a film under low-temperature and low-power conditions, and can avoid the influence of high temperature, high ultraviolet curing power and long-time ultraviolet curing on a functional layer in a preparation process; the ultraviolet protection liquid has high light transmittance and high film forming quality, and does not have a negative effect on normal use of the assembly, and improves long-term operation stability and photoelectric performance of the assembly.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of perovskite solar cells, and particularly relates to an ultraviolet protection liquid for a perovskite solar cell assembly and application thereof. BACKGROUND

[0002] The incidence of ultraviolet light can seriously affect the stability of the materials inside some photoelectric devices and the overall stability of the devices, and can also have an important impact on the photoelectric performance that can be achieved during use, such as LED devices, liquid crystal displays, or perovskite solar cells.

[0003] Taking perovskite solar cells (PSCs) as an example, perovskite solar cells have high photoelectric conversion efficiency and low-cost manufacturing processes, and are therefore considered as a strong contender for future solar technology. However, perovskite assemblies generally have weak stability under ultraviolet light, which mainly affects the perovskite light-absorbing layer. The specific effects include: 1) Ions (such as I - , Pb 2+ and MA + ) in the perovskite material can undergo ion migration under light, which can be driven by defects within the material or charges generated by light, causing changes in the material structure and affecting the performance and stability of the battery; meanwhile, ion migration also affects the fluorescence properties of the perovskite thin film, including fluorescence quenching or enhancement, which is directly related to the photoelectric performance of the material; 2) perovskite crystals can decompose under ultraviolet light, which is one of the main reasons for the decline in battery performance; 3) ion migration under light interacts with defect states in the material, which can cause phenomena such as photorepair, photodecomposition, and photo-induced phase separation in the perovskite thin film; 4) interface instability, especially the TiO2 / perovskite interface, TiO2 as a photocatalytic material, will photocatalytically decompose the perovskite at the interface between the electron layer and the light-absorbing layer under ultraviolet light; 5) non-radiative recombination caused by various defects in the perovskite absorber and related interfaces is one of the main factors limiting the further development of the battery, and these defects can become more active under ultraviolet light, thereby exacerbating the decline in battery performance; 6) the light irradiation stability of each functional layer in the perovskite solar cell is a key factor affecting the stability of the entire battery, and selecting appropriate functional layer materials can improve the stability of the battery under ultraviolet light; 7) the coupling of light with external factors such as oxygen and moisture can accelerate the failure process of the battery, and light becomes the dominant factor in failure.

[0004] Currently, the existing methods for improving the UV stability of perovskite solar cells include: 1) doping UV absorbers or other UV converters in the perovskite layer; 2) adding a UV absorption layer or a barrier layer in the perovskite layer or other structural layers of the perovskite assembly; 3) introducing rare earth down-conversion materials for UV light conversion, etc. However, the above methods are prone to cause problems such as defects in the cell, mismatch of energy levels, and additional transmission resistance, and the cost of rare earth down-conversion fluorescent materials is also relatively high.

[0005] Based on the above-mentioned defects, setting an ultraviolet cutoff layer on the light-incident side of the perovskite solar cell directly cuts off the incident ultraviolet light from the incident end, which is undoubtedly a relatively small impact on the perovskite solar cell itself under ultraviolet light. SUMMARY

[0006] To solve the above technical problems, the present application provides a kind of ultraviolet protection fluid for perovskite solar cell assembly and its application.The ultraviolet protection fluid provided by the present application is matched with ultraviolet curing adhesive and two different organic solvents, which has low viscosity, can quickly form film under low temperature and low ultraviolet curing power conditions, thereby avoiding the influence of high temperature, high ultraviolet curing power and long time ultraviolet curing on the functional layer in the preparation process;And it can also take into account the relatively high film forming quality, high light transmittance, and enhanced adhesion to the substrate, when used in the assembly, it will not have a negative effect on normal use, can effectively protect the assembly from potential damage caused by ultraviolet radiation, thereby improving the long-term operation stability and photoelectric performance of the assembly, in addition, the ultraviolet protection fluid has low viscosity, thin film, and reduced glue consumption, which greatly reduces the production cost.

[0007] To achieve this purpose, the present application adopts the following technical solutions:

[0008] In a first aspect, the present application provides an ultraviolet protection fluid for perovskite solar cell assembly, the ultraviolet protection fluid includes ultraviolet curing adhesive and organic solvent; the organic solvent includes solvent A and solvent B, the solvent A includes aromatic hydrocarbon solvent, the solvent B includes any one of ketone solvent, ether solvent or aliphatic hydrocarbon solvent, the viscosity of the ultraviolet protection fluid is 500 mPa·s~800 mPa·s, for example, 500 mPa·s, 550 mPa·s, 600 mPa·s, 650 mPa·s, 700 mPa·s, 750 mPa·s or 800 mPa·s, etc.

[0009] In the present application, the ultraviolet protection liquid comprises ultraviolet curing glue and organic solvent, and the viscosity of the ultraviolet protection liquid is 500 mPa·s-800 mPa·s. Compared with the high viscosity of the traditional ultraviolet curing glue, the ultraviolet protection liquid provided by the present application has lower viscosity. In the process of applying the ultraviolet protection liquid to the perovskite solar cell assembly, the ultraviolet protection liquid is easy to coat, and high-quality film formation can be achieved in low temperature, low ultraviolet curing power and extremely short curing time, thereby improving the long-term operation stability and photoelectric performance of the device assembly.

[0010] In addition, the two solvents in the present application can synergistically accelerate the film formation rate under low temperature and low ultraviolet curing power conditions, thereby improving the film formation quality. Solvent A mainly plays a dispersing and diluting role. Due to the high viscosity of the ultraviolet curing glue, the amount of glue used during coating will be larger, and film breakage often occurs during film formation, which cannot achieve uniform coating. The addition of solvent A can effectively disperse the ultraviolet curing glue without affecting the performance, forming a mixed solution with uniform composition and low viscosity (compared with pure ultraviolet curing glue), reducing the film breakage problem caused by excessive viscosity during coating, reducing the amount of glue used, and reducing the air bubbles in the film layer caused by air entrapment, thereby improving the film formation quality and the adhesion to the substrate. Solvent B has a low boiling point and mainly plays a diluting and fast-evaporating role. The addition of solvent B can effectively disperse and dilute the ultraviolet curing glue without affecting the performance, forming a mixed solution with uniform composition and low viscosity. At the same time, solvent A is carried during liquid film formation to achieve fast evaporation, greatly reducing the film formation time and effectively improving the preparation efficiency. The synergistic effect of solvent A and solvent B disperses the ultraviolet curing glue, greatly improves the film formation uniformity and substrate adhesion, and thereby realizes rapid and high-quality film formation and enhances the environmental resistance of the glue film.

[0011] As a preferred technical solution of the present application, the volume ratio of the ultraviolet curing glue to the organic solvent is (0.5-3):1, for example, 0.5:1, 1:1, 1.5:1, 2:1, 2.5:1 or 3:1, etc.

[0012] In the present application, by adjusting the volume ratio of the ultraviolet curing glue to the organic solvent, the ultraviolet curing glue can be better dispersed in the organic solvent to form a uniform low-viscosity ultraviolet protection liquid. If the amount of ultraviolet curing glue added is too much, the ultraviolet curing glue cannot be uniformly dispersed in the organic solvent, the viscosity of the ultraviolet protection liquid is too large, the amount of glue used is correspondingly increased, which is not conducive to the coating and film formation of the ultraviolet protection liquid in the later stage, and the light transmittance of the obtained ultraviolet cut glue film layer is affected. If the amount of ultraviolet curing glue added is too small, although the ultraviolet curing glue can be uniformly dispersed and the ultraviolet protection liquid can be coated and the liquid film can be formed in the later stage, the obtained ultraviolet cut glue film layer has poor ultraviolet light cutting effect and cannot cut most of the ultraviolet light, which still affects the stability of the device under ultraviolet light, and the improvement effect is not obvious.

[0013] As a preferred technical solution of the present application, the volume ratio of the solvent A and the solvent B is x:y, x+y=1, 0

[0014] In the present application, the volume ratio of the solvent A and the solvent B is regulated, so that the ultraviolet curing adhesive is fully and uniformly dispersed in the solvent, and the obtained ultraviolet cutoff adhesive film is transparent and uniformly continuous. If the amount of solvent A added is too small and the amount of solvent B added is too much, the obtained ultraviolet cutoff adhesive film will be turbid, the light transmittance will be poor, and the continuity will be poor.

[0015] As a preferred technical solution of the present application, the aromatic hydrocarbon solvent includes toluene and / or xylene.

[0016] And / or, the ketone solvent includes acetone and / or butanone.

[0017] And / or, the ether solvent includes diethyl ether and / or propylene glycol ether.

[0018] And / or, the aliphatic hydrocarbon solvent includes any one or a combination of at least two of n-hexane, cyclohexane or n-pentane.

[0019] As a preferred technical solution of the present application, the solid content of the ultraviolet protection liquid is 25% to 65%, for example, 25%, 35%, 45%, 55% or 65% and the like.

[0020] And / or, the viscosity of the ultraviolet curing adhesive is 3000 mPa·s to 6000 mPa·s, for example, 3000 mPa·s, 3500 mPa·s, 4000 mPa·s, 4500 mPa·s, 5000 mPa·s, 5500 mPa·s or 6000 mPa·s and the like.

[0021] And / or, the solid content of the ultraviolet curing adhesive is 80% to 95%, for example, 80%, 82%, 85%, 88%, 90%, 92% or 95% and the like.

[0022] It should be noted that the ultraviolet curing adhesive used in the present application can be prepared according to the known formula, or can be purchased on the market. Those skilled in the art can make adaptive selection according to the actual situation, for example, commercially available Han Gao 3494, Zhuoli De D5602 or Guangzhou Xin Yi New Material H55H352 can be used.

[0023] And / or, the ultraviolet waveband range cut off by the ultraviolet curing adhesive is 200 nm to 400 nm.

[0024] The UV curing adhesive used in the present invention has a cutoff UV wavelength range of 200nm~400nm, which can maximize the cutoff of UV light in different bands, thereby ensuring that most or all of the UV light is cut off, so that the device can still maintain long-term stability under UV light.

[0025] In a second aspect, the present invention further provides a UV cutoff adhesive film layer, which is prepared from the UV protective liquid described in the first aspect.

[0026] As a preferred technical solution of the present invention, the thickness of the UV cutoff film layer is 50μm~300μm, for example, 50μm, 80μm, 100μm, 120μm, 150μm, 180μm, 200μm, 220μm, 250μm, 280μm or 300μm, etc.

[0027] In the present invention, the thickness of the UV-cut film layer significantly impacts UV light stability. A thickness range of 50 μm to 300 μm demonstrates superior stabilization of the battery under UV light. If the UV-cut film layer is too thick, light transmittance will decrease, affecting visible light utilization and the battery's photoelectric performance. If the UV-cut film layer is too thin, its UV-cutting effect is limited, failing to block most or all of the UV light. Consequently, UV light exposure can irreversibly affect the battery's stability.

[0028] As a preferred technical solution of the present invention, the method for preparing the UV cutoff film layer comprises the following steps:

[0029] S1, applying the UV protection liquid to the light incident surface of the perovskite solar cell module to obtain a UV protection wet film;

[0030] S2. UV-curing the UV-protective wet film to obtain a UV-cutoff adhesive film layer.

[0031] As a preferred technical solution of the present invention, the curing temperature of the UV curing in step S2 is 25°C to 30°C, for example, 25°C, 26°C, 27°C, 28°C, 29°C or 30°C.

[0032] And / or, the UV curing time in step S2 is 10s to 60s, for example, 10s, 20s, 30s, 40s, 50s or 60s.

[0033] And / or, the curing power of the UV curing in step S2 is 200mW / cm 2 ~600mW / cm 2 , for example 200mW / cm 2 , 230mW / cm2 , 250 mW / cm 2 , 280 mW / cm 2 , 300 mW / cm 2 , 320 mW / cm 2 , 350 W / cm 2 , 380 mW / cm 2 , 400 mW / cm 2 , 420 mW / cm 2 , 450 mW / cm 2 , 480 mW / cm 2 , 500 W / cm 2 , 520 mW / cm 2 , 550 W / cm 2 , 580 mW / cm 2 or 600 mW / cm 2 etc.

[0034] And / or, before the ultraviolet curing of step S2, the step of sequentially drying and leveling the ultraviolet protection wet film is further included.

[0035] And / or, the drying temperature is 40℃-70℃, such as 40℃, 45℃, 50℃, 55℃, 60℃, 65℃ or 70℃, etc.

[0036] And / or, the drying time is 10min-25min, such as 10min, 15min, 20min or 25min, etc.

[0037] As a preferred technical solution of the present application, the leveling method includes any one of standing leveling, blade coating leveling or roller coating leveling.

[0038] As a preferred technical solution of the present application, the standing leveling time is 5min-15min, such as 5min, 8min, 10min, 12min or 15min, etc.

[0039] In the present application, in order to further improve the quality of film forming, after coating, standing leveling in a natural state can be further included to automatically fill small concave defects and pores on the surface of the wet film, so that the wet film surface is more smooth and flat; it can also make the components in the wet film uniform, the thickness consistent, ensure the uniformity of the internal components of the ultraviolet cut-off film and the uniform light transmittance of each part; in addition, it can also enhance the bonding capacity with the light entrance surface and improve the film adhesion.

[0040] It should be noted that the position of the UV protective liquid coating on the "light incident surface of the perovskite solar cell module" mentioned in the present invention is different depending on the structure of the perovskite solar cell module, but it is only necessary to ensure that the incident light first enters the obtained UV cutoff film, first cuts off most or all of the UV light, and then enters the functional layer. For example, it can be set on the side surface of the substrate away from the transparent conductive layer, or, it can be set in a position between the substrate and the transparent conductive layer.

[0041] In a third aspect, the present invention further provides a perovskite solar cell assembly, comprising the UV cutoff adhesive film layer and a perovskite solar cell module as described in the second aspect, wherein the UV cutoff adhesive film layer is located on the light incident surface of the perovskite solar cell module.

[0042] As a preferred technical solution of the present invention, the perovskite solar cell module includes:

[0043] substrate;

[0044] A transparent conductive layer is laminated on one side of the substrate;

[0045] a first carrier transport layer, stacked on a side of the transparent conductive layer away from the substrate;

[0046] a perovskite light-absorbing layer, stacked on a side of the first carrier transport layer away from the transparent conductive layer;

[0047] A second carrier transport layer is stacked on a side of the perovskite light absorbing layer away from the first carrier transport layer;

[0048] a top electrode layer, stacked on a side of the second carrier transport layer away from the perovskite light absorbing layer; and

[0049] The encapsulation layer is stacked on a side of the top electrode layer away from the second carrier transport layer.

[0050] As a preferred technical solution of the present invention, the first carrier transport layer includes a hole transport layer, and the second carrier transport layer includes an electron transport layer, or the first carrier transport layer includes an electron transport layer, and the second carrier transport layer includes a hole transport layer.

[0051] In a fourth aspect, the present invention further provides a photovoltaic module, which includes the perovskite solar cell module as described in the third aspect.

[0052] And / or, the photovoltaic module includes a perovskite-crystalline silicon stacked solar cell module.

[0053] In a fifth aspect, the present application further provides a photovoltaic system comprising the photovoltaic module according to the fourth aspect.

[0054] And / or, the photovoltaic system comprises a photovoltaic power station or a photovoltaic support comprising the photovoltaic module and a combined structure of the photovoltaic module.

[0055] Compared with the prior art, the present application has at least the following beneficial effects:

[0056] The present application adopts ultraviolet curing glue and two different organic solvents to form an ultraviolet protection liquid, wherein the organic solvents include solvent A and solvent B, the solvent A includes aromatic hydrocarbon solvents, the solvent B includes any one of ketone solvents, ether solvents or aliphatic hydrocarbon solvents, the viscosity of the ultraviolet protection liquid is 500 mPa·s~800 mPa·s, the viscosity of the ultraviolet protection liquid is regulated by the synergistic effect of the two organic solvents, the film can be formed quickly under the condition of low temperature and low ultraviolet curing power, and the film quality is improved, the ultraviolet transmittance is basically zero in the ultraviolet wave band of 300 nm~390 nm, the ultraviolet cutoff can be effectively realized, the visible light transmittance is relatively high in the visible wave band of 500 nm~800 nm, and the visible light utilization rate is relatively high. BRIEF DESCRIPTION OF DRAWINGS

[0057] Figure 1 It is a preparation method flow chart of the ultraviolet cutoff glue film layer of the present application.

[0058] Figure 2 It is a comparison chart of the light transmittance curves of the ultraviolet cutoff glue film layer before and after ultraviolet irradiation according to the embodiment 1 of the present application.

[0059] Figure 3 It is a comparison chart of the light transmittance curves of the ultraviolet cutoff glue film layer according to the embodiment 1, the embodiment 6 and the embodiment 7 of the present application. DETAILED DESCRIPTION

[0060] The technical solutions of the present application will be further described below by combining the drawings and specific embodiments. However, the following examples are only simple examples of the present application, and do not represent or limit the protection scope of the present application, and the protection scope of the present application is subject to the claims.

[0061] Unless otherwise specified, the raw materials and reagents used in the following examples are commercially available or can be prepared by known methods.

[0062] The embodiment of the present application provides a UV protection liquid for a perovskite solar cell module, the UV protection liquid comprises UV curing glue and an organic solvent; the organic solvent comprises solvent A and solvent B, the solvent A comprises aromatic hydrocarbon solvent, the solvent B comprises any one of ketone solvent, ether solvent or aliphatic hydrocarbon solvent, and the viscosity of the UV protection liquid is 500 mPa s-800 mPa s.

[0063] The UV curing glue can be commercially available Hengjiao 3494, Zhuolide D5602 or Guangzhou Xinyi New Material H55H352, etc.

[0064] The UV protection liquid comprises UV curing glue and an organic solvent, and the viscosity of the UV protection liquid is 500 mPa s-800 mPa s, compared with the high viscosity of the traditional UV curing glue, the UV protection liquid provided by the present application has low viscosity, is easy to coat in the application to the perovskite solar cell module, and can realize high-quality film forming in low temperature, low UV curing power and extremely short curing time, thereby improving the long-term operation stability and photoelectric performance of the device module.

[0065] Figure 1 The preparation method of the UV cut-off adhesive film layer is shown, and the preparation method comprises the following steps:

[0066] S1, the UV protection liquid is coated on the light surface of the perovskite solar cell module to obtain a UV protection wet film;

[0067] S2, the UV protection wet film is subjected to UV curing to obtain a UV cut-off adhesive film layer.

[0068] After the UV cut-off adhesive film layer is obtained, the perovskite solar cell module can be prepared, the perovskite solar cell module is used in a photovoltaic module, and the photovoltaic module is used in a photovoltaic system.

[0069] The structure of the perovskite solar cell module in the embodiment of the present application comprises a glass substrate, an FTO transparent conductive layer, a hole transport layer, a perovskite light absorption layer, an electron transport layer, a top electrode and an encapsulation layer which are sequentially stacked.

[0070] The perovskite solar cell module in the embodiment of the present application is prepared by using the preparation method disclosed in the prior art, and the preparation method disclosed in the prior art is suitable for the present application. The preparation method of the perovskite solar cell module in the embodiment of the present application comprises the following steps.

[0071] Step 1: stack the glass substrate and FTO transparent conductive layer, after laser etching P1 line groove on the FTO transparent conductive layer, clean the glass substrate and FTO transparent conductive layer with glass cleaning solution, water and ethanol respectively for 20 min, dry with nitrogen, and obtain a composite substrate.

[0072] Step 2: use the method of magnetron sputtering to sputter NiO on the surface of the FTO transparent conductive layer away from the glass substrate, and anneal at 300℃ for 30 min, and obtain a 20 nm hole transport layer. x

[0073] Step 3: scrape the perovskite solution on the hole transport layer, the scraping speed is 15 mm / s, the coating head height is 200 μm, anneal at 150℃ for 10 min, and obtain a perovskite light absorbing layer; in the perovskite solution, the molar ratio of lead iodide: formamidinium hydroiodide: methylammonium iodide: cesium iodide is 1:0.9:0.05:0.05, the mixed solvent DMF:DMSO is 4:1, and the concentration is 1.5 mol / L.

[0074] Step 4: scrape the electron transport layer solution on the perovskite light absorbing layer, the scraping speed is 15 mm / s, the coating head height is 100 μm, anneal at 70℃ for 10 min, and obtain an electron transport layer; in the electron transport layer solution, the component is PCBM, the solvent is chlorobenzene, and the concentration is 20 mg / mL.

[0075] Step 5: after laser etching P2 line groove on the overall structure of the hole transport layer, the perovskite light absorbing layer and the electron transport layer, evaporate the top (Ag) electrode layer, the evaporation rate is 5 Å / s, the electrode thickness is 150 nm, and obtain a top electrode.

[0076] Step 6: laser etch P3 line groove on the overall structure of the hole transport layer, the perovskite light absorbing layer, the electron transport layer and the top electrode layer, and clear the edges of the structure, wherein the clear edge width is 2 cm, laminate and encapsulate the structure at 140℃ for 100 s using cover glass, butyl glue and POE glue film to form an encapsulation layer, and obtain a perovskite solar cell module.

[0077] Example 1

[0078] The embodiment provides a UV protection liquid for a perovskite solar cell module, a UV cut-off adhesive film layer, a preparation method of the UV cut-off adhesive film layer and a perovskite solar cell module.

[0079] The preparation method of the UV cut-off adhesive film layer comprises the following steps.

[0080] ​S1, the ultraviolet curing adhesive, toluene and n-hexane are stirred and mixed according to the volume ratio of 1:0.75:0.25 to obtain a uniform ultraviolet protection liquid, the solid content is 45%, the ultraviolet protection liquid is coated on the side surface of the glass substrate of the perovskite solar cell module away from the FTO transparent conductive layer by using the scraping method, the speed of the scraper is 5mm / s, and the ultraviolet protection wet film is obtained.

[0081] S2, the obtained ultraviolet protection wet film is placed and leveled for 10min, dried at 60℃ for 8min, and then ultraviolet cured at 300mW / cm 2 at 25℃ for 20s, and the ultraviolet cutoff adhesive film layer with a thickness of 50μm is obtained.

[0082] The ultraviolet cutoff adhesive film layer and the perovskite solar cell module constitute a perovskite solar cell assembly, which is used in a photovoltaic assembly, and the photovoltaic assembly is used in a photovoltaic power station.

[0083] Figure 2 The ultraviolet cutoff adhesive film layer provided by the embodiment 1 of the present application is shown in the comparison diagram of the light transmittance curves before and after ultraviolet irradiation, and it can be known from the diagram that before and after ultraviolet aging, the ultraviolet transmittance is basically zero in the ultraviolet wave band of 300nm~390nm, which indicates that after ultraviolet aging, the ultraviolet cutoff adhesive film layer provided by the present application can still achieve the cutoff of ultraviolet light, and has no any influence on the effective cutoff of ultraviolet light (ultraviolet aging condition: total irradiation amount 120KWh / m 2 ).

[0084] Embodiment 2

[0085] The embodiment provides an ultraviolet protection liquid for a perovskite solar cell assembly, an ultraviolet cutoff adhesive film layer, a preparation method thereof and a perovskite solar cell assembly, the ultraviolet protection liquid for the perovskite solar cell assembly comprises ultraviolet curing adhesive (Hengko 3494, viscosity 6000mPa·s, solid content 90%), solvent A toluene and solvent B n-hexane, and the viscosity of the ultraviolet protection liquid is 500mPa·s.

[0086] The preparation method of the ultraviolet cutoff adhesive film layer comprises the following steps.

[0087] S1, the ultraviolet curing adhesive, toluene and n-hexane are stirred and mixed according to the volume ratio of 1:0.75:0.25 to obtain a uniform ultraviolet protection liquid, the solid content is 45%, the ultraviolet protection liquid is coated on the side surface of the glass substrate of the perovskite solar cell module away from the FTO transparent conductive layer by using the scraping method, the speed of the scraper is 5mm / s, and the ultraviolet protection wet film is obtained.

[0088] S2, the obtained ultraviolet protection wet film is placed and leveled for 10min, dried at 60℃ for 8min, and then ultraviolet cured at 300mW / cm 2, 25℃ conditions, UV curing 30s, obtained thickness of 100 μm UV cut-off film layer.

[0089] The UV cut-off film layer and perovskite solar cell module constitute a perovskite solar cell module, which is used in a photovoltaic module, and the photovoltaic module is used in a photovoltaic power station.

[0090] Example 3

[0091] The embodiment provides a UV protection liquid for a perovskite solar cell module, a UV cut-off film layer, a preparation method of the UV cut-off film layer and a perovskite solar cell module, the UV protection liquid for the perovskite solar cell module comprises UV curing adhesive (Hengjiao 3494, viscosity 6000 mPa·s, solid content 90%), solvent A toluene and solvent B n-hexane, and the viscosity of the UV protection liquid is 620 mPa·s.

[0092] The preparation method of the UV cut-off film layer comprises the following steps.

[0093] S1, the UV curing adhesive, toluene and n-hexane are stirred and mixed according to a volume ratio of 0.8:0.75:0.25, a uniform UV protection liquid is obtained, the solid content is 40%, the UV protection liquid is coated on the side surface of the glass substrate of the perovskite solar cell module away from the FTO transparent conductive layer in a scraping manner, the speed of the scraper is 5 mm / s, and the UV cut-off film layer is obtained.

[0094] S2, the obtained UV protection wet film is placed and leveled for 5 min, dried at 60℃ for 10 min, and then subjected to UV curing at 320 mW / cm 2 , 25℃ conditions, UV curing 25s, obtained thickness of 80 μm UV cut-off film layer.

[0095] The UV cut-off film layer and perovskite solar cell module constitute a perovskite solar cell module, which is used in a photovoltaic module, and the photovoltaic module is used in a photovoltaic power station.

[0096] Example 4

[0097] The embodiment provides a UV protection liquid for a perovskite solar cell module, a UV cut-off film layer, a preparation method of the UV cut-off film layer and a perovskite solar cell module, the UV protection liquid for the perovskite solar cell module comprises UV curing adhesive (Hengjiao 3494, viscosity 6000 mPa·s, solid content 90%), solvent A toluene and solvent B n-hexane, and the viscosity of the UV protection liquid is 620 mPa·s.

[0098] The preparation method of the UV cut-off film layer comprises the following steps.

[0099] S1, the ultraviolet curing adhesive, toluene and acetone are stirred and mixed according to the volume ratio of 2:0.9:0.1 to obtain a uniform ultraviolet protective liquid, the solid content is 60%, and the ultraviolet protective liquid is coated on the surface of the glass substrate of the perovskite solar cell module away from the FTO transparent conductive layer by using the scraping method, the speed of the scraper is 5mm / s, and an ultraviolet protective wet film is obtained.

[0100] S2, the obtained ultraviolet protective wet film is placed and leveled for 5min, dried at 40℃ for 25min, and then ultraviolet cured at 200mW / cm 2 at 30℃ for 60s to obtain an ultraviolet cutoff adhesive film layer with a thickness of 200μm.

[0101] The ultraviolet cutoff adhesive film layer and the perovskite solar cell module constitute a perovskite solar cell assembly, which is used in a photovoltaic assembly, and the photovoltaic assembly is used in a photovoltaic power station.

[0102] Example 5

[0103] The embodiment provides an ultraviolet protective liquid for a perovskite solar cell assembly, an ultraviolet cutoff adhesive film layer, a preparation method thereof and a perovskite solar cell assembly, the ultraviolet protective liquid for the perovskite solar cell assembly comprises ultraviolet curing adhesive (Hanko 3494, viscosity 6000mPa·s, solid content 90%), solvent A toluene and solvent B diethyl ether, and the viscosity of the ultraviolet protective liquid is 800mPa·s.

[0104] The preparation method of the ultraviolet cutoff adhesive film layer comprises the following steps.

[0105] S1, the ultraviolet curing adhesive, toluene and acetone are stirred and mixed according to the volume ratio of 2:0.9:0.1 to obtain a uniform ultraviolet protective liquid, the solid content is 60%, and the ultraviolet protective liquid is coated on the surface of the glass substrate of the perovskite solar cell module away from the FTO transparent conductive layer by using the scraping method, the speed of the scraper is 5mm / s, and an ultraviolet protective wet film is obtained.

[0106] S2, the obtained ultraviolet protective wet film is placed and leveled for 5min, dried at 40℃ for 25min, and then ultraviolet cured at 200mW / cm 2 at 30℃ for 60s to obtain an ultraviolet cutoff adhesive film layer with a thickness of 200μm.

[0107] The ultraviolet cutoff adhesive film layer and the perovskite solar cell module constitute a perovskite solar cell assembly, which is used in a photovoltaic assembly, and the photovoltaic assembly is used in a photovoltaic power station.

[0108] Example 6

[0109] The embodiment provides an ultraviolet protection liquid for a perovskite solar cell assembly, an ultraviolet cut-off adhesive film layer, a preparation method of the ultraviolet cut-off adhesive film layer and the perovskite solar cell assembly, and the composition and parameters of the ultraviolet protection liquid are consistent with those of the embodiment 1.

[0110] The preparation method is different from that of the embodiment 1 in that the thickness of the ultraviolet cut-off adhesive film layer is 100 mu m, and the rest of the preparation method and the parameters are consistent with those of the embodiment 1.

[0111] Embodiment 7

[0112] The embodiment provides an ultraviolet protection liquid for a perovskite solar cell assembly, an ultraviolet cut-off adhesive film layer, a preparation method of the ultraviolet cut-off adhesive film layer and the perovskite solar cell assembly, and the composition and parameters of the ultraviolet protection liquid are consistent with those of the embodiment 1.

[0113] The preparation method is different from that of the embodiment 1 in that the thickness of the ultraviolet cut-off adhesive film layer is 300 mu m, and the rest of the preparation method and the parameters are consistent with those of the embodiment 1.

[0114] Embodiment 8

[0115] The embodiment provides an ultraviolet protection liquid for a perovskite solar cell assembly, an ultraviolet cut-off adhesive film layer, a preparation method of the ultraviolet cut-off adhesive film layer and the perovskite solar cell assembly, and the composition and parameters of the ultraviolet protection liquid are consistent with those of the embodiment 1.

[0116] The preparation method is different from that of the embodiment 1 in that the ultraviolet curing adhesive, toluene and n-hexane are stirred and mixed according to a volume ratio of 1:0.50:0.50, the solid content is 45%, and the rest of the preparation method and the parameters are consistent with those of the embodiment 1.

[0117] Embodiment 9

[0118] The embodiment provides an ultraviolet protection liquid for a perovskite solar cell assembly, an ultraviolet cut-off adhesive film layer, a preparation method of the ultraviolet cut-off adhesive film layer and the perovskite solar cell assembly, and the composition and parameters of the ultraviolet protection liquid are consistent with those of the embodiment 1.

[0119] The preparation method is different from that of the embodiment 1 in that the thickness of the ultraviolet cut-off adhesive film layer is 400 mu m, and the rest of the preparation method and the parameters are consistent with those of the embodiment 1.

[0120] Comparative example 1

[0121] The comparative example provides a UV protective liquid for a perovskite solar cell assembly, a UV cut-off adhesive film layer, a preparation method thereof and a perovskite solar cell assembly, wherein the UV protective liquid is different from example 1 in that the toluene solvent is omitted, the viscosity of the UV protective liquid is 670 mPa·s, and the rest of the composition and parameters remain the same as in example 1.

[0122] The preparation method is different from example 1 in that the UV curing adhesive and n-hexane are stirred and mixed at a volume ratio of 1:1, the solid content is 45%, and the rest of the preparation method and parameters remain the same as in example 1.

[0123] Comparative example 2

[0124] The comparative example provides a UV protective liquid for a perovskite solar cell assembly, a UV cut-off adhesive film layer, a preparation method thereof and a perovskite solar cell assembly, wherein the UV protective liquid is different from example 1 in that the n-hexane solvent is omitted, the viscosity of the UV protective liquid is 640 mPa·s, and the rest of the composition and parameters remain the same as in example 1.

[0125] The preparation method is different from example 1 in that the n-hexane solvent is omitted, the UV curing adhesive and toluene are stirred and mixed at a volume ratio of 1:1, the solid content is 45%, and the rest of the preparation method and parameters remain the same as in example 1.

[0126] Comparative example 3

[0127] The comparative example provides a UV protective liquid for a perovskite solar cell assembly, a UV cut-off adhesive film layer, a preparation method thereof and a perovskite solar cell assembly, wherein the UV protective liquid is different from example 1 in that the viscosity of the UV protective liquid is 850 mPa·s, and the rest of the composition and parameters remain the same as in example 1.

[0128] The preparation method is different from example 1 in that the UV curing adhesive, toluene and n-hexane are stirred and mixed at a volume ratio of 3.5:0.75:0.25, the solid content is 70%, and the rest of the preparation method and parameters remain the same as in example 1.

[0129] Comparative example 4

[0130] The example provides a UV protective liquid for a perovskite solar cell assembly, a UV cut-off adhesive film layer, a preparation method thereof and a perovskite solar cell assembly, wherein the UV protective liquid is different from example 1 in that the viscosity of the UV protective liquid is 160 mPa·s, and the rest of the composition and parameters remain the same as in example 1.

[0131] The preparation method is different from that of Example 1 in that the ultraviolet curing adhesive, toluene and n-hexane are stirred and mixed in a volume ratio of 0.2:0.75:0.25, the solid content is 15%, and the rest of the preparation method and parameters remain the same as those of Example 1.

[0132] Figure 3 A comparison chart of the light transmittance curves of the ultraviolet cutoff adhesive film layers provided by Example 1, Example 6 and Example 7 of the present application is shown. As can be seen from the chart, in the ultraviolet waveband of 300nm~390nm, the ultraviolet transmittance of the ultraviolet cutoff adhesive film layers with three different thicknesses is basically zero, which can effectively achieve ultraviolet cutoff, and in the visible waveband of 500nm~800nm, the transmittance is relatively high, reaching more than 90%, which can achieve relatively high visible light utilization.

[0133] The ultraviolet cutoff adhesive film layers provided by Examples 1~9 and Comparative Examples 1~4 are subjected to light transmittance tests, and the specific test results are shown in Table 1.

[0134] Table 1

[0135]

[0136] From the test results in Table 1, it can be seen that:

[0137] (1) From Examples 1 to 7, it can be seen that the ultraviolet protection liquid provided by the present application matches the ultraviolet curing adhesive with two different organic solvents, and the two solvents synergistically combine with the ultraviolet curing adhesive. The obtained ultraviolet protection liquid can quickly form a film under low temperature and low ultraviolet curing power conditions, and can also take into account relatively high film forming quality, high light transmittance, and enhanced adhesion to the substrate. When applied to devices, it does not have a negative effect on normal use, can effectively protect the devices from potential damage caused by ultraviolet radiation, and thus improves the long-term operation stability and optoelectronic performance of the devices. Specifically, after ultraviolet aging, the transmittance in the 300nm~390nm ultraviolet waveband can be as low as 0.002%~6.17% (Example 1), and the highest is only 0.27%~15.31% (Example 7), the ultraviolet transmittance is relatively low, which can effectively cut off ultraviolet light; the transmittance in the 500nm~800nm visible light waveband can be as high as 92.58%~92.76% (Example 3), and the lowest can reach 90.43%~91.11% (Example 7).

[0138] (2) From Examples 1 and 8, it can be seen that by adjusting the volume ratio of solvent A and solvent B, the ultraviolet curing adhesive can be fully and uniformly dispersed in the solvent, ensuring that the obtained ultraviolet cutoff adhesive film is transparent and uniformly continuous. If the amount of solvent A is too small and the amount of solvent B is too large, the dispersion and dilution of the ultraviolet curing adhesive will be poor, which will result in a turbid ultraviolet cutoff adhesive film, poor light transmittance, poor continuity and reduced visible light utilization.

[0139] (3) It can be seen from Example 1 and Example 9 that the thickness of the ultraviolet cut-off adhesive film layer has a great influence on the ultraviolet light irradiation stability, and within the thickness range of 50 μm to 300 μm, it has a more optimal stabilizing effect on the battery stability under ultraviolet light irradiation. If the thickness of the ultraviolet cut-off adhesive film layer is too thick, the light transmittance will be reduced, thereby affecting the visible light utilization rate. If the thickness of the ultraviolet cut-off adhesive film layer is too thin, the degree of ultraviolet light cutting is limited, and most or all of the ultraviolet light cannot be cut off, which will still have an irreversible effect on the stability of the battery under ultraviolet light irradiation.

[0140] (4) It can be seen from Example 1, Comparative Examples 1 and 2 that the solvent A and the solvent B are jointly matched in the present application, and the two solvents have a synergistic effect. The solvent A mainly plays a dispersing and diluting role, and the solvent B has a low boiling point and mainly plays a diluting and fast-evaporating role. The addition of the solvent B can effectively disperse and dilute the ultraviolet curing adhesive in cooperation with the solvent A without affecting the performance, so as to form a mixed solution with uniform composition and low viscosity. At the same time, the solvent A is carried to realize fast evaporation during the liquid film forming process, thereby greatly reducing the film forming time. If only n-hexane (omitting toluene) is added, the obtained ultraviolet cut-off adhesive film layer will be turbid (the viscosity of the ultraviolet protection liquid will be slightly larger), and if only toluene (omitting n-hexane) is added, the dispersibility of the ultraviolet curing adhesive will be poor. The above will all cause the light transmittance to be reduced, thereby affecting the visible light utilization rate.

[0141] (5) It can be seen from Example 1 and Comparative Examples 3 and 4 that the viscosity of the ultraviolet protection liquid is controlled to be 500 mPa·s to 800 mPa·s in the present application, which can make the ultraviolet curing adhesive better dispersed in the organic solvent, and the composition of the protection liquid is uniform. If the viscosity of the ultraviolet protection liquid is too large, the ultraviolet curing adhesive cannot be uniformly dispersed in the organic solvent, which will affect the light transmittance and the visible light utilization rate of the obtained ultraviolet cut-off adhesive film layer, and is also not conducive to the coating and curing process in the later stage. If the viscosity of the ultraviolet protection liquid is too small, although the ultraviolet curing adhesive can be uniformly dispersed, and the coating and liquid film forming of the ultraviolet protection liquid in the later stage can be better realized, the obtained ultraviolet cut-off adhesive film layer has a poor ultraviolet light cutting effect, cannot cut most of the ultraviolet light, and still has an effect on the stability of the device under ultraviolet light irradiation, and the improvement effect is not obvious.

[0142] In summary, the ultraviolet protection liquid provided by the present application matches ultraviolet curing glue and two different organic solvents, has low viscosity, can quickly form a film under low temperature and low ultraviolet curing power conditions, thereby avoiding the influence of high temperature, high ultraviolet curing power and long time ultraviolet curing on the functional layer in the assembly during preparation; and can also take into account relatively high film forming quality, high light transmittance, and enhanced adhesion to the substrate, when applied to the assembly, does not have a negative effect on normal use, can effectively protect the assembly from potential damage caused by ultraviolet light, thereby improving the long-term operation stability and photoelectric performance of the assembly, in addition, the ultraviolet protection liquid has low viscosity, thin film forming, and reduced glue usage, greatly reducing the production cost.

[0143] The above merely provides a specific implementation of the present application, but the protection scope of the present application is not limited thereto, and those skilled in the art should understand that any changes or replacements within the technical scope disclosed by the present application, which can be easily thought of by any person skilled in the art, falls within the protection scope and disclosure scope of the present application.

Claims

1. An ultraviolet protection liquid for a perovskite solar cell module, characterized by, The ultraviolet protection liquid comprises an ultraviolet curing adhesive and an organic solvent; the organic solvent comprises solvent A and solvent B, the solvent A comprises toluene and / or xylene, the solvent B comprises any one of acetone, butanone, diethyl ether, propylene glycol ether, n-hexane, cyclohexane or n-pentane, and the viscosity of the ultraviolet protection liquid is 500 mPa·s-800 mPa·s; The volume ratio of the solvent A to the solvent B is x:y, x+y=1, and 0 The ultraviolet curing adhesive has a cut-off ultraviolet wave band range of 200 nm-400 nm. 2.The UV protection liquid for a perovskite solar cell module according to claim 1, wherein The volume ratio of the ultraviolet curing adhesive to the organic solvent is (0.5-3):

1. 3.The UV protection liquid for perovskite solar cell module according to claim 1, wherein The solid content of the ultraviolet protection liquid is 25%-65%. The viscosity of the ultraviolet curing adhesive is 3000 mPa·s-6000 mPa·s. The solid content of the ultraviolet curing adhesive is 80%-95%.

4. An ultraviolet cut-off adhesive film layer, characterized by, The ultraviolet cut-off adhesive film layer is prepared from the ultraviolet protection liquid for a perovskite solar cell module according to any one of claims 1-3.

5. The ultraviolet cut-off adhesive film layer according to claim 4, wherein The thickness of the ultraviolet cut-off adhesive film layer is 50 μm-300 μm.

6. The ultraviolet cut-off adhesive film layer of claim 4, wherein, The preparation method of the ultraviolet cut-off adhesive film layer comprises the following steps: S1, applying the ultraviolet protection liquid to the light-entering surface of a perovskite solar cell module to obtain an ultraviolet protection wet film; S2, ultraviolet curing the ultraviolet protection wet film to obtain an ultraviolet cut-off adhesive film layer.

7. The ultraviolet cut-off adhesive film layer of claim 6, wherein, The curing temperature of the ultraviolet curing in step S2 is 25°C-30°C. The curing time of the ultraviolet curing in step S2 is 10 s-60 s. And / or, the curing power of the ultraviolet curing in step S2 is 200 mW / cm 2 600 mW / cm 2 ; Before the ultraviolet curing in step S2, the ultraviolet protection wet film is further subjected to the steps of drying and flow leveling in sequence. The drying temperature is 40°C-70°C. The drying time is 10 min-25 min.

8. A perovskite solar cell module, characterized by, The perovskite solar cell module comprises the ultraviolet cut-off adhesive film layer according to any one of claims 4-7 and a perovskite solar cell module, and the ultraviolet cut-off adhesive film layer is located on the light-entering surface of the perovskite solar cell module.

9. The perovskite solar cell module according to claim 8, characterized by, The perovskite solar cell module comprises: a substrate; a transparent conductive layer, which is arranged on one side of the substrate in a stacked manner; a first carrier transport layer, which is arranged on the side of the transparent conductive layer away from the substrate in a stacked manner; a perovskite light-absorbing layer, which is arranged on the side of the first carrier transport layer away from the transparent conductive layer in a stacked manner; a second carrier transport layer, which is arranged on the side of the perovskite light-absorbing layer away from the first carrier transport layer in a stacked manner; a top electrode layer, which is arranged on the side of the second carrier transport layer away from the perovskite light-absorbing layer in a stacked manner; and an encapsulation layer, which is arranged on the side of the top electrode layer away from the second carrier transport layer in a stacked manner.

10. The perovskite solar cell module according to claim 9, characterized in that, The first carrier transport layer comprises a hole transport layer, and the second carrier transport layer comprises an electron transport layer, or the first carrier transport layer comprises an electron transport layer, and the second carrier transport layer comprises a hole transport layer.

11. A photovoltaic module, characterized by The photovoltaic module comprises the perovskite solar cell module according to any one of claims 8-10.

12. A photovoltaic system characterized by, The photovoltaic system comprises the photovoltaic module according to claim 11.

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