Unlock instant, AI-driven research and patent intelligence for your innovation.

Instrument for communication system and semiconductor integrated circuit device

A technology for communication systems and integrated circuits, which is used in semiconductor devices, amplifiers with semiconductor devices/discharge tubes, semiconductor/solid-state device manufacturing, etc., and can solve problems such as high operating costs, difficult impedance matching, and poor heat resistance.

Inactive Publication Date: 2002-06-19
PANASONIC CORP
View PDF0 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

GaAs has poor heat resistance, so in order to suppress the temperature rise, a cooling device with a strong cooling capacity is required, and a large operating cost is required to maintain the base station
Also, when applied to portable terminals, although it is necessary to miniaturize the circuit, components with poor heat resistance such as GaAsMESFETs are strictly restricted in position, that is, it must be far away from FETs that tend to rise to high temperatures due to high-frequency signals and inductance
Although various efforts have been made in the positional relationship of each component, the result is that the transmission and reception circuit itself can only be enlarged.
[0010] In addition, the most important part of the transceiver circuit, which is the signal amplification element, especially in the part required to amplify large power, although many MESFETs are provided, but with the increase of the frequency of the high-frequency signal, the reflection from the MESFET The influence caused by the wave is superimposed, so it is difficult to achieve impedance matching
As a result, it takes a lot of time to adjust for impedance matching

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Instrument for communication system and semiconductor integrated circuit device
  • Instrument for communication system and semiconductor integrated circuit device
  • Instrument for communication system and semiconductor integrated circuit device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0054] Hereinafter, embodiments of the present invention will be briefly described with reference to the drawings.

[0055] figure 1 The structure of the communication system in the embodiment of the present invention is briefly shown. As shown in the figure, the communication system of this embodiment includes a plurality of base stations 101 connected to each other through a switching network 100 (network), and mobile phone terminals 102 for communicating with each other through each base station 101 . Each base station 101 includes the following parts: an antenna device 111 for transmitting and receiving radio waves, a reception amplifier 112 having a function of amplifying the radio wave signal received by the antenna device 111, and a radio frequency signal for transmitting amplified radio waves to the antenna device 111. The signal transmitting amplifier 113, the wireless transceiver 114 connected together with the receiving amplifier 112 and the transmitting amplifier...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Equipment for a communication system has a semiconductor device formed by integrating a Schottky diode, a MOSFET, a capacitor, and an inductor in a SiC substrate. The SiC substrate has a first multilayer portion and a second multilayer portion provided upwardly in this order. The first multilayer portion is composed of delta-doped layers each containing an n-type impurity(nitrogen)at a high concentration and undoped layers which are alternately stacked. The second multilayer portion is composed of delta-doped layers each containing a p-type impurity(aluminum)at a high concentration and undoped layers which are alternately stacked. Carriers in the delta-doped layers spread out extensively to the undoped layers. Because of a low impurity concentration in each of the undoped layers, scattering by impurity ions is reduced so that a low resistance and a high breakdown voltage are obtained. Said equipment is suitable for arrangement under severe conditions of use temperature and space constrains or the like.

Description

technical field [0001] The present invention relates to a semiconductor integrated circuit device equipped with a semiconductor power supply device for high withstand voltage and high current, and equipment for communication systems such as portable terminals and base stations using the semiconductor integrated circuit device. Background technique [0002] Since silicon carbide (SiC) is a semiconductor with a larger band spacing than silicon (Si), it has high insulation withstand voltage and is also a stable semiconductor at high temperatures, so active elements formed with SiC substrates are expected to Applied to next-generation power supply devices and high-temperature working devices. [0003] In general, a power supply device is a general term for devices that perform high-power conversion and control, and are called power diodes, power transistors, and the like. Moreover, as the application of the power supply device, there are, for example, transistors and diodes arr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/82H01L27/06H01L29/10H01L29/15H01L29/24H01L29/36H01L29/772H01L29/812H01L29/872H03D7/12H03F3/60
CPCH03F2200/294H01L29/365H01L27/0605H01L29/7725H01L29/157H01L29/872H03F3/601H03D7/125H01L29/1608H01L29/812H01L29/105H01L21/8213
Inventor 横川俊哉高桥邦方内田正雄北畠真楠本修
Owner PANASONIC CORP