Photomask protective film pasting jig

Abstract

The utility model discloses a photomask protective film pasting jig which comprises a bottom support and a cover plate. A protective film groove is formed in the top surface of the bottom support, a plurality of limiting columns for limiting the photolithography mask and a plurality of spring columns are arranged on the top surface of the bottom support around the protective film groove, and the spring columns are used for supporting the photolithography mask; and a plurality of stress columns corresponding to the spring columns are arranged on the bottom surface of the cover plate. A protective film to be pasted is limited through the protective film groove, a photomask to be pasted is positioned through the limiting columns, and the photomask is elastically pressed through the spring columns, so that the photomask is effectively attached to the protective film, and the photomask is conveniently taken out. The device improves the film pasting efficiency and accuracy of the photomask, improves the utilization rate of the photomask, solves the problems of productivity and time loss of a production line due to the fact that the photomask is conveyed out for film pasting, meets the productivity requirement of the production line, and has very high practicability and wide applicability.

Description

Technical Field

[0001] The invention relates to a film sticking jig, in particular to a photolithography protective film sticking jig, and belongs to the technical field of semiconductor packaging photolithography exposure process. Background Art

[0002] Photolithography is a comprehensive technology of precision surface processing that combines pattern copying and chemical etching. It is a process of using photographic copying to expose the pattern on the photomask to ultraviolet light, and then developing it to form the corresponding pattern on the film. This process has high requirements on the clarity and integrity of the pattern on the photomask, so it is particularly important to protect the chrome layer pattern on the photomask.

[0003] At present, a protective film is applied to the main surface of the photomask pattern to prevent dust particles from polluting the chrome layer pattern. When a photomask is repeatedly exposed to the film and reaches the film life limit or is affected by other human factors, the protective film will change color, wrinkle, break, and other abnormalities, affecting the photolithography results; at this time, the photomask protective film needs to be replaced. Generally, the photomask needs to be sent back to the manufacturer for re-cleaning and film application, and then sent back to the customer after testing. This process takes a lot of time and has a great impact on the product production process.

[0004] Therefore, it is necessary to provide a photolithography protective film film sticking jig. Summary of the invention

[0005] In order to solve the deficiencies of the prior art, the purpose of the present invention is to provide a jig for laminating a photolithography protective film.

[0006] In order to achieve the above object, the present invention adopts the following technical solution:

[0007] A jig for laminating a photolithography protective film, comprising a base and a cover plate;

[0008] The top surface of the bottom bracket is provided with a protective film groove.

[0009] The protective film groove is surrounded by a plurality of limiting posts for limiting the photolithography plate on the top surface of the bottom support;

[0010] The protective film groove is surrounded by a plurality of spring columns on the top surface of the bottom support, and the spring columns are used to support the photolithography plate;

[0011] The bottom surface of the cover plate is provided with a plurality of force-bearing columns corresponding to the spring columns.

[0012] There are at least three limiting columns, and the connecting line of two of them is parallel to the edge of the protective film groove, and the other limiting column is placed on the adjacent side of the protective film groove.

[0013] There are four limiting columns, and the line connecting two of them is parallel to the sides of the protective film groove, and the line connecting the other two limiting columns is parallel to the adjacent sides of the protective film groove.

[0014] The cover plate is a rectangular frame.

[0015] There are four spring columns mentioned above, which are respectively placed at the end corners of the base.

[0016] The present invention is beneficial in that:

[0017] The invention discloses a jig for laminating a photoresist protective film, which limits a protective film to be laminarized by a protective film groove, positions the photoresist to be laminarized by a limiting column, and utilizes a spring column to elastically press the photoresist, so that the photoresist and the protective film are effectively laminarized and the removal of the photoresist is convenient.

[0018] The photoresist protective film laminating jig of the present invention improves the laminating efficiency and accuracy of the photoresist, improves the utilization rate of the photoresist, solves the production capacity and time loss caused by sending the photoresist out for laminating, meets the production line capacity requirements, and has strong practicality and wide applicability. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 It is a schematic diagram of the vertical three-dimensional structure of the base.

[0020] Figure 2 It is a schematic diagram of the vertical three-dimensional structure of the cover plate.

[0021] Figure 3 This is an exploded view of the jig with protective film.

[0022] Figure 4 This is an assembly diagram for using a jig with a protective film.

[0023] The meanings of the marks in the accompanying drawings are as follows: 1. base, 2. limiting column, 3. protective film groove, 4. spring column, 5. frame, 6. force column, 7. photolithography plate, 8. protective film. DETAILED DESCRIPTION

[0024] The present invention is described in detail below with reference to the accompanying drawings and specific embodiments.

[0025] A jig for laminating a photolithography protective film consists of a base 1 and a cover plate.

[0026] The top surface of the bottom bracket is provided with a protective film groove 3; surrounding the protective film groove, the top surface of the bottom bracket is provided with a plurality of limiting posts 2 for limiting the photolithography plate; preferably, there are 4 limiting posts, 2 limiting posts form a group, and the 2 groups of limiting posts are respectively placed on the adjacent sides of the protective film groove, and the connecting line of the 2 limiting posts is respectively parallel to the sides of the protective film groove. Preferably, the connecting line of the 2 groups of limiting posts is perpendicular to each other.

[0027] The protective film groove is formed around the bottom bracket, and a plurality of spring columns 4 are arranged on the top surface of the bottom bracket. Preferably, there are four spring columns, which are respectively arranged at the four end corners of the bottom bracket, and the spring columns are used to support the photolithography plate.

[0028] The cover plate is composed of a rectangular frame 5 and a load-bearing column 6. The end corners of the rectangular frame are provided with load-bearing columns corresponding to the spring columns.

[0029] The bottom bracket is used to keep the entire fixture flat and stable.

[0030] The protective film slot is used to hold the protective film.

[0031] The limit column is used to ensure the accuracy of the photoresist film position.

[0032] The spring column is used to ensure that the protective film fits tightly when applying the film.

[0033] The steps to use this jig for film application are as follows:

[0034] 1. Place the base in the correct position on a horizontal table;

[0035] 2. Place the protective film 8 with the protective film frame in the protective film groove, with the height slightly higher than the upper surface of the bottom bracket, and tear off the protective layer on the protective film;

[0036] 3. Place the cleaned photomask 7 with the front side facing up, and place it horizontally on the spring column against the limit column. Pay attention to the position of the photomask to ensure the accurate film sticking position. The photomask is supported by the spring column at the bottom, so that the spring column is under pressure and does not reach the bottom position.

[0037] 4. Use the cover plate, gently place it on the photoresist, and press the cover plate evenly with both hands for 5 seconds. The force-bearing column presses the photoresist and the protective film tightly to ensure that the protective film fits smoothly;

[0038] There is sealant on the protective film frame, which can seal the effective pattern area after pressing down the photomask. The spring is pressed down to the upper surface of the protective film, and the sealant is tightly attached to the photomask to ensure that no particles enter the lower surface of the photomask;

[0039] 5. Place the photoresist into the photoresist box, clean the upper surface of the photoresist, and check whether the photoresist and protective film are in normal condition. The film pasting process is now completed.

[0040] The above shows and describes the basic principles, main features and advantages of the present invention. Those skilled in the art should understand that the above embodiments do not limit the present invention in any form, and any technical solution obtained by equivalent replacement or equivalent transformation falls within the protection scope of the present invention.

Claims

1. A jig for laminating a photolithography protective film, characterized in that: Including base and cover; The top surface of the bottom bracket is provided with a protective film groove. The protective film groove is surrounded by a plurality of limiting posts for limiting the photolithography plate on the top surface of the bottom support; The protective film groove is surrounded by a plurality of spring columns on the top surface of the bottom support, and the spring columns are used to support the photolithography plate; The bottom surface of the cover plate is provided with a plurality of force-bearing columns corresponding to the spring columns.

2. The film sticking jig according to claim 1, characterized in that: There are at least three limiting columns, and the connecting line of two of them is parallel to the edge of the protective film groove, and the other limiting column is placed on the adjacent side of the protective film groove.

3. The film sticking jig according to claim 1, characterized in that: There are four limiting columns, and the line connecting two of them is parallel to the sides of the protective film groove, and the line connecting the other two limiting columns is parallel to the adjacent sides of the protective film groove.

4. The film sticking jig according to claim 1, characterized in that: The cover plate is a rectangular frame.

5. The film sticking jig according to claim 1, characterized in that: There are four spring columns, which are respectively placed at the end corners of the base.

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