Soaking equipment for silicon material processing

By designing a silicon material processing immersion equipment with multiple sets of soaking mechanisms and cleaning components, the problem of inefficiency of traditional equipment is solved, and efficient multiple soaking and cleaning of silicon material is achieved, which significantly improves the quality and production efficiency of silicon material.

CN222499469UActive Publication Date: 2025-02-18YANGZHOU JINGYING OPTOELECTRONICS TECH CO LTD
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Patent Information

Application Number
CN202421114674.X
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-05-21
Publication Date
2025-02-18
Estimated Expiration
2034-05-21

AI Technical Summary

Technical Problem

Traditional silicon material soaking equipment is mostly single-chamber design, which is inefficient and difficult to meet the needs of multiple soaking and cleaning, making it difficult to ensure the quality of silicon material.

Method used

A soaking equipment for processing silicon material including multiple sets of soaking mechanisms is designed. The equipment is equipped with lifting soaking components, rotating components, vibration mechanisms and placement soaking components, which can realize multiple soaking and automatic transfer of silicon material and clean the components. Carry out efficient silicon material.

Benefits of technology

It improves the soaking efficiency and continuity of silicon materials, ensures the multiple soaking and cleaning effects of silicon materials, and significantly improves the quality and production efficiency of silicon materials.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses soaking equipment for silicon material processing, and relates to the technical field of silicon material processing, the soaking equipment comprises a silicon material soaking table and multiple sets of soaking mechanisms, the multiple sets of soaking mechanisms are arranged on the inner side of the silicon material soaking table, a silicon material is put into a silicon material containing disc, then an electric control lifting rod is controlled by a lifting control table to operate, and the silicon material is soaked in the silicon material containing disc; the silicon material placing disc is driven to ascend and descend in the soaking pools to soak the silicon materials, meanwhile, by arranging the multiple sets of soaking pools, different chemical solutions are placed in the different soaking pools, the multiple sets of silicon materials can be soaked differently at the same time, the vibration motor is started to vibrate the silicon material placing disc, the silicon materials are turned over in the soaking process, and the soaking efficiency is improved. The chemical solution can better soak the silicon material, the electric control rotating table operates, the soaking connecting rod is controlled to drive the silicon material placing disc to rotate, and the silicon material is transferred in different soaking pools, so that the silicon material is automatically transferred in the soaking pools when being soaked.
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Description

Technical Field

[0001] The utility model relates to the technical field of silicon material processing, in particular to a soaking device for silicon material processing. Background Art

[0002] Silicon is an important semiconductor material that can be widely used in components such as diodes, triodes, light-emitting devices, varistors, solar cells, etc. During the preparation process of semiconductor materials, silicon materials need to be cleaned many times to remove surface impurities and improve the quality of silicon materials.

[0003] After searching, the patent number "CN219490242U" mentioned in the text that "the utility model discloses a silicon material soaking machine, which relates to the technical field of polysilicon ingot casting. The utility model includes a soaking barrel, and the left and right sides of the inner wall of the soaking barrel are provided with slide grooves. A silicon material holding mechanism is slidably installed on the surface of the inner wall of the soaking barrel. A lifting component is provided on the surface of the silicon material holding mechanism and the surface of the soaking barrel. A stirring paddle is fixedly installed on the surface of the lifting component. An exhaust pipe is fixedly installed on the upper part of the right side of the soaking barrel. A condenser is fixedly connected to the right end of the exhaust pipe, and a condenser mechanism is sleeved on the surface of the condenser pipe." It soaks the silicon material through a soaking barrel, but in actual use, the silicon material often contains a variety of impurities and needs to be soaked multiple times. The traditional cleaning method is mostly single-chamber soaking. After one soaking, the silicon material needs to be manually transferred to other soaking barrels for soaking, which is not only inefficient but also difficult to meet the requirements of post-immersion cleaning.

[0004] To this end, we provide a silicon material processing immersion equipment to solve the above problems. Utility Model Content

[0005] The purpose of the utility model is to provide an immersion device for silicon material processing to solve the problems raised in the above background technology.

[0006] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a silicon material processing soaking device, comprising a silicon material soaking table and multiple soaking mechanisms, wherein multiple soaking mechanisms are arranged inside the silicon material soaking table;

[0007] The multiple groups of immersion mechanisms include a lifting immersion component, a rotating component, a vibration mechanism and a placement immersion component. The lifting immersion component is arranged on the inner side of the silicon material immersion table, the rotating component is arranged on the top of the lifting immersion component, the vibration mechanism is installed on the outer side of the rotating component, and the placement immersion component is arranged on the bottom end of the vibration mechanism.

[0008] Preferably, the lifting and soaking assembly comprises a soaking pool, a lifting control console and an electrically controlled lifting rod, the soaking pool is installed on the inner side of the silicon material soaking table, the lifting control console is installed in the center of the silicon material soaking table, and the electrically controlled lifting rod is arranged on the top of the lifting control console.

[0009] Preferably, three groups of immersion pools are provided in the silicon material immersion table, and the immersion pools are evenly distributed at 120°.

[0010] Preferably, the rotating assembly comprises an electrically controlled rotating table and an immersion connecting rod, the top end of the electrically controlled lifting rod is fixedly connected to the electrically controlled rotating table, and the outer slot of the electrically controlled rotating table is connected to the immersion connecting rod.

[0011] Preferably, the vibration mechanism includes a movable connecting rod, a vibration motor and a vibration connecting rod, the outer bottom end of the immersion connecting rod is rotatably connected to the movable connecting rod, the inner bottom end of the immersion connecting rod is installed with a vibration motor, and the bottom end of the vibration motor is fixedly connected to the vibration connecting rod.

[0012] Preferably, the placement and immersion assembly includes a silicon material placement plate and a placement mesh plate, the bottom end slot of the vibration connecting rod is connected to the silicon material placement plate, and the inner side slot of the silicon material placement plate is connected to the placement mesh plate.

[0013] Preferably, a cleaning component is arranged on the outside of the soaking pool, and the cleaning component includes a cleaning pool, an air pump, an inflation ring pipe, a cleaning connecting valve and a spray port. A cleaning pool is arranged on the outside of the soaking pool, an air pump is installed on the outside of the cleaning pool, and an inflation ring pipe is arranged on the inside of the cleaning pool.

[0014] Preferably, a cleaning connection valve is installed at the bottom end of the cleaning pool, and a spray port is provided at the top end of the cleaning pool.

[0015] Compared with the prior art, the beneficial effects of the utility model are:

[0016] 1. Through the setting of the cleaning component, when the silicon material needs to be transferred to different immersion tanks, the silicon material placement plate is rotated and placed in the cleaning tank to clean the silicon material. At the same time, the air pump is started to inflate the clean water through the inflation ring tube to generate a large number of bubbles, thereby improving the cleaning effect of the silicon material and avoiding the mixing of different chemical solvents when transferring to different immersion tanks. After cleaning, the silicon material is sprayed and rinsed through the spray port to avoid chemical solvent residue and improve the cleaning effect of the silicon material.

[0017] 2. By setting up multiple groups of immersion mechanisms, the silicon material is placed in the silicon material placement tray, and then the electric-controlled lifting rod is controlled by the lifting console to operate, so as to drive the silicon material placement tray to rise and fall in the immersion tank to immerse the silicon material. At the same time, by setting up multiple groups of immersion tanks and putting different chemical solutions in different immersion tanks, multiple groups of silicon materials can be immersed in different ways at the same time. When immersing the silicon material, the vibration motor is started to vibrate the silicon material placement tray to make the silicon material turn over during the immersion process, so that the chemical solution can better immerse the silicon material. Through the operation of the electric-controlled rotating table, the immersion connecting rod is controlled to drive the silicon material placement tray to rotate, and the silicon material is transferred in different immersion tanks, so as to perform multiple immersion and impurity removal on the silicon material, so that the silicon material is automatically transferred in the immersion tank when immersing, and different immersion and impurity removal are completed, thereby improving the continuity and efficiency of the silicon material immersion. At the same time, when the silicon material is immersed and transferred, the silicon material is cleaned through the cleaning tank to remove the chemical solvent and residual impurities on the silicon material, thereby improving the immersion effect of the silicon material. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 This is a schematic diagram of the overall appearance structure proposed by the utility model;

[0019] Figure 2 This is a schematic diagram of the matching structure of the lifting and soaking component and the rotating component proposed in the utility model;

[0020] Figure 3 This is a schematic diagram of the matching structure of the vibration mechanism and the soaking assembly provided by the utility model;

[0021] Figure 4 This is a schematic diagram of the cleaning component structure proposed by the utility model.

[0022] In the figure: 1. Silicon material soaking table; 2. Multiple soaking mechanisms; 21. Lifting soaking assembly; 211. Soaking pool; 212. Lifting control console; 213. Electric lifting rod; 22. Rotating assembly; 221. Electric rotating table; 222. Soaking connecting rod; 23. Vibrating mechanism; 231. Active connecting rod; 232. Vibrating motor; 233. Vibrating connecting rod; 24. Place soaking assembly; 241. Silicon material placement plate; 242. Placement net plate; 3. Cleaning assembly; 31. Cleaning pool; 32. Air pump; 33. Inflatable ring tube; 34. Cleaning connecting valve; 35. Spray port. DETAILED DESCRIPTION

[0023] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0024] Embodiment 1

[0025] See also Figure 1-4 As shown, a soaking device for silicon material processing includes a silicon material soaking station 1 and multiple soaking mechanisms 2. Multiple soaking mechanisms 2 are arranged inside the silicon material soaking station 1;

[0026] The multiple groups of immersion mechanisms 2 include a lifting immersion component 21, a rotating component 22, a vibration mechanism 23 and a placement immersion component 24. The lifting immersion component 21 is arranged on the inner side of the silicon material immersion table 1, the rotating component 22 is arranged on the top of the lifting immersion component 21, the vibration mechanism 23 is installed on the outer side of the rotating component 22, and the placement immersion component 24 is arranged on the bottom end of the vibration mechanism 23.

[0027] Furthermore, the lifting and soaking assembly 21 includes a soaking pool 211, a lifting control console 212 and an electric-controlled lifting rod 213. The soaking pool 211 is installed on the inner side of the silicon material soaking platform 1, and the lifting control console 212 is installed in the center of the silicon material soaking platform 1. The top of the lifting control console 212 is provided with an electric-controlled lifting rod 213. The electric-controlled lifting rod 213 is controlled by the lifting control console 212 to operate, thereby driving the silicon material placement plate 241 to be lifted and lowered in the soaking pool 211, so as to facilitate the soaking of the silicon material.

[0028] Furthermore, three groups of immersion pools 211 are arranged in the silicon material immersion station 1, and the immersion pools 211 are evenly distributed at 120°. By setting multiple groups of immersion pools 211 and putting different chemical solutions in different immersion pools 211, different types of impurities on the surface of the silicon material sheet can be removed simultaneously.

[0029] Furthermore, the rotating assembly 22 includes an electrically controlled rotating table 221 and an immersion connecting rod 222. The top of the electrically controlled lifting rod 213 is fixedly connected to the electrically controlled rotating table 221. The outer card slot of the electrically controlled rotating table 221 is connected to the immersion connecting rod 222. Through the operation of the electrically controlled rotating table 221, the immersion connecting rod 222 is controlled to drive the silicon material placement plate 241 to rotate, and the silicon material is transferred among different immersion tanks 211, thereby performing multiple immersion and impurity removal on the silicon material.

[0030] Furthermore, the vibration mechanism 23 includes a movable connecting rod 231, a vibration motor 232 and a vibration connecting rod 233. The outer bottom end of the immersion connecting rod 222 is rotatably connected to the movable connecting rod 231, the inner bottom end of the immersion connecting rod 222 is installed with a vibration motor 232, and the bottom end of the vibration motor 232 is fixedly connected to the vibration connecting rod 233. When the silicon material is soaked, the vibration motor 232 is started to vibrate the silicon material placement plate 241, so that the silicon material is turned over during the soaking process, so that the chemical solution can better soak the silicon material.

[0031] Furthermore, the placement and immersion component 24 includes a silicon material placement plate 241 and a placement mesh plate 242. The bottom end slot of the vibration connecting rod 233 is connected to the silicon material placement plate 241, and the inner side slot of the silicon material placement plate 241 is connected to the placement mesh plate 242. By placing the mesh plate 242, the chemical solution can better enter the silicon material placement plate 241, thereby improving the effect of soaking the silicon material.

[0032] Embodiment 2

[0033] See also Figure 2 As shown, in contrast to Example 1, as another implementation of the utility model, a cleaning component 3 is arranged on the outside of the soaking tank 211, and the cleaning component 3 includes a cleaning tank 31, an air pump 32, an inflation ring tube 33, a cleaning connecting valve 34 and a spray port 35. A cleaning tank 31 is arranged on the outside of the soaking tank 211, an air pump 32 is installed on the outside of the cleaning tank 31, and an inflation ring tube 33 is arranged on the inside of the cleaning tank 31. When the silicon material needs to be transferred to a different soaking tank 211, the silicon material placement plate 241 is rotated and placed in the cleaning tank 31 to clean the silicon material. At the same time, the air pump 32 is started to inflate the clean water through the inflation ring tube 33 to generate a large number of bubbles, thereby improving the cleaning effect of the silicon material and avoiding the mixing of different chemical solvents when transferring to different soaking tanks 211, which leads to a reduction in the soaking effect.

[0034] Furthermore, a cleaning connection valve 34 is installed at the bottom of the cleaning pool 31, and a spray port 35 is provided at the top of the cleaning pool 31. After cleaning, the silicon material is sprayed and rinsed through the spray port 35 to avoid chemical solvent residue and improve the cleaning effect of the silicon material.

[0035] Working principle: When in use, the first step is to move the device to the desired location, then put the silicon material into the silicon material placement tray 241, and then control the electric lifting rod 213 through the lifting console 212 to operate, so as to drive the silicon material placement tray 241 to rise and fall in the soaking tank 211 to soak the silicon material. At the same time, by setting up multiple groups of soaking tanks 211 and putting different chemical solutions in different soaking tanks 211, multiple groups of silicon materials can be soaked differently at the same time. The second step is to start the vibration motor 232 to vibrate the silicon material placement tray 241 when soaking the silicon material, so that the silicon material is turned over during the soaking process, so that the chemical solution can better soak the silicon material. The third step is to operate the electric control rotating table 221 to control the silicon material placement tray 241. The immersion connecting rod 222 drives the silicon material placement plate 241 to rotate, and the silicon material is transferred among different immersion tanks 211, so as to perform multiple immersion and impurity removal on the silicon material. In the fourth step, when the silicon material needs to be transferred to different immersion tanks 211, the silicon material placement plate 241 is rotated and placed into the cleaning tank 31 to clean the silicon material. At the same time, the air pump 32 is started to inflate the clean water through the inflation ring tube 33 to generate a large number of bubbles, thereby improving the cleaning effect of the silicon material and avoiding the mixing of different chemical solvents when transferring to different immersion tanks 211. After cleaning, the silicon material is sprayed and rinsed through the spray port 35 to avoid chemical solvent residue and improve the cleaning effect of the silicon material. In this way, the use of an immersion device for silicon material processing is completed.

[0036] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A silicon material processing soaking device, comprising a silicon material soaking station (1) and a plurality of soaking mechanisms (2), characterized in that: A plurality of immersion mechanisms (2) are arranged inside the silicon material immersion platform (1); The multiple groups of soaking mechanisms (2) include a lifting soaking component (21), a rotating component (22), a vibration mechanism (23) and a placement soaking component (24); the lifting soaking component (21) is arranged on the inner side of the silicon material soaking platform (1); the rotating component (22) is arranged on the top of the lifting soaking component (21); the vibration mechanism (23) is installed on the outer side of the rotating component (22); and the placement soaking component (24) is arranged on the bottom end of the vibration mechanism (23).

2. The immersion equipment for silicon material processing according to claim 1, characterized in that: The lifting and soaking assembly (21) comprises a soaking pool (211), a lifting control console (212) and an electrically controlled lifting rod (213); the soaking pool (211) is installed on the inner side of the silicon material soaking platform (1); the lifting control console (212) is installed at the center of the silicon material soaking platform (1); and the electrically controlled lifting rod (213) is arranged at the top of the lifting control console (212).

3. The immersion equipment for silicon material processing according to claim 2, characterized in that: Three groups of the immersion pools (211) are arranged in the silicon material immersion platform (1), and the immersion pools (211) are evenly distributed at an angle of 120°.

4. The immersion equipment for silicon material processing according to claim 2, characterized in that: The rotating assembly (22) comprises an electrically controlled rotating platform (221) and an immersion connecting rod (222); the top end of the electrically controlled lifting rod (213) is fixedly connected to the electrically controlled rotating platform (221); and the outer slot of the electrically controlled rotating platform (221) is connected to the immersion connecting rod (222).

5. The immersion equipment for silicon material processing according to claim 4, characterized in that: The vibration mechanism (23) comprises a movable connecting rod (231), a vibration motor (232) and a vibration connecting rod (233); the outer bottom end of the soaking connecting rod (222) is rotatably connected to the movable connecting rod (231); the inner bottom end of the soaking connecting rod (222) is installed with a vibration motor (232); and the bottom end of the vibration motor (232) is fixedly connected to the vibration connecting rod (233).

6. The immersion equipment for silicon material processing according to claim 5, characterized in that: The placement and soaking assembly (24) comprises a silicon material placement plate (241) and a placement net plate (242); the bottom end slot of the vibration connecting rod (233) is connected to the silicon material placement plate (241); and the inner side slot of the silicon material placement plate (241) is connected to the placement net plate (242).

7. The immersion equipment for silicon material processing according to claim 2, characterized in that: A cleaning component (3) is arranged outside the soaking tank (211), and the cleaning component (3) comprises a cleaning tank (31), an air pump (32), an air ring pipe (33), a cleaning connection valve (34) and a spray port (35). A cleaning tank (31) is arranged outside the soaking tank (211), an air pump (32) is installed outside the cleaning tank (31), and an air ring pipe (33) is arranged inside the cleaning tank (31).

8. The immersion equipment for silicon material processing according to claim 7, characterized in that: A cleaning connection valve (34) is installed at the bottom end of the cleaning pool (31), and a spray port (35) is provided at the top end of the cleaning pool (31).

Citation Information

Patent Citations

  • Silicon material soaking machine

    CN219490242U