Container for storing and transporting liquid chemical agent
Patent Information
- Authority / Receiving Office
- US · United States
- Current Assignee / Owner
- Publication Date
- 2006-06-15
- Estimated Expiration
- Not applicable · inactive patent
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Figure 1 
Figure 2 
Figure 3
Abstract
Description
FIELD OF THE INVENTION
[0001] The present invention relates to a liquid chemical storage and / or transport container. More particularly, the present invention relates to a storage and / or transport container for chemical liquids for electronic materials, for example, photoresist compositions, particularly chemical liquids sensitive to temperatures, such as photosensitive antireflection coating compositions, rinsing liquids, developing solutions, stripping liquids, etching liquids, solvents and the like. BACKGROUND ART
[0002] In production plants, in transporting a chemical liquid for an electronic material such as photoresist, it is common practice to fill the chemical liquid, for example, into a glass bottle or a plastic container formed of polyethylene, polypropylene or the like. In recent years, however, a method is adopted wherein, in transporting a chemical liquid for an electronic material, a plastic bag is placed in a stainless steel container and the chemical liquid for an ele...
Examples
examples
[0033] The following examples further illustrate the present invention. However, it should be noted that embodiments of the present invention are not limited to these examples only.
examples 1 and 2
[0034] A positive-working photoresist AZ 1350 manufactured by Clariant Japan K.K. was filled into a container shown in FIG. 1 and a container shown in FIG. 5 and was stored in the containers with the preset internal temperature (preset temperature of contents) of the container being 5° C. For the photoresist, the sensitivity and the number of fine particles having a size of not more than 0.5 μm in the resist were measured by the following methods immediately after the filling and one month, three months and six months after the filling. The results were as shown in Tables 1 and 2.
Sensitivity
[0035] AZ 1350 manufactured by Clariant Japan was spin coated onto a 4-in. silicon wafer. The coating was baked on a hot plate at 100° C. for 90 sec to prepare a 1.5 μm-thick resist film. This resist film was subjected to 1 mm-square punched pattern exposure by means of a g line stepper (DSW 6300, manufactured by GCA), followed by development with a 2.38 wt % aqueous tetramethylammonium hydrox...
example 3
[0040] A container shown in FIG. 5 was provided for measuring its heat insulating property. The container shown in FIG. 5 was provided with a Peltier element as a device which can electrically control the temperature. In such an environment the ambient temperature was kept at about 23° C., water of 5.0° C. was filled into the container. The Peltier element was energized for temperature control. The temperature of the contents of the container was measured over time. The results were as shown in Table 3. From the results shown in Table 3, it is apparent that when the container shown in FIG. 5 was used, the temperature of the contents of the container can be maintained without a substantial temperature change.
TABLE 3Heat insulation testTime, hour0246810Ambient22.423.023.123.123.023.2temp., ° C.Temp. of 5.0 5.1 5.6 6.0 6.3 6.3contents, ° C.