High-thermostability transparent conductive film and preparation method and application thereof

Abstract

The invention relates to a transparent conductive film and a preparation method of the transparent conductive film. The transparent conductive film is a zinc oxide transparent conductive film which is formed by codoping one of the elements in an III main group with gallium. According to the film, the production cost is lowered when the thermostability (more than 300 DEG C) and the resistivity (less than 10<-2> ohm.m) of the film are guaranteed, and the film has the advantages of low gallium doping concentration, high thermostability, strong ageing resistance, long service life, low cost for raw materials, and the like.

Description

technical field

[0001] The invention relates to a transparent conductive film and a preparation method thereof. The film can be used for automobile glass, building glass, display cabinet glass, aircraft cab glass and train cab glass. Background technique

[0002] Electric heating glass is usually also called electric heating glass, which is a kind of laminated glass product that can generate heat and heat up after being energized. It is divided into resistance wire electric heating glass and film electric heating glass. Patents related to resistance wire electric heating glass include: CN201039504Y, CN201039503Y, CN201156830Y, CN201904931U, CN201491304U, CN2181662Y and so on. Resistance wire electric heating glass can also achieve the effect of defogging frost, but because the resistance wire is an opaque metal wire and cannot cover the entire glass surface, the transparency of the conductive heating glass is reduced and the heating is uneven. Patents related to thin-film e...

Examples

Embodiment 1

[0016] Preparation of Aluminum+Gallium Co-doped ZnO Thin Films by Electron Beam Evaporation:

[0017] ①Uniformly mix zinc oxide, aluminum oxide and gallium oxide powders with a purity of 99.99% according to the gallium doping content of 1.0 at.%, aluminum doping content of 2.0 at.%, press at 20MPa for 5min, and sinter at 1100°C for 360min to obtain ceramics target;

[0018] ②Clean and install the glass substrate, vacuum to 10 -3 Pa; the substrate is heated to 250°C, and the rotation speed is 2 rpm; the mixed gas of argon and oxygen is introduced to start evaporation, the high voltage is 6kV, the electron beam current is 30mA, and the evaporation time is 30min.

[0019] The thickness of the film obtained by this method is 200nm, and the resistivity is 3.0×10 -3 Ω·m, visible light transmittance > 85%.

technical field

[0001] The invention relates to a transparent conductive film and a preparation method thereof. The film can be used for automobile glass, building glass, display cabinet glass, aircraft cab glass and train cab glass. Background technique

[0002] Electric heating glass is usually also called electric heating glass, which is a kind of laminated glass product that can generate heat and heat up after being energized. It is divided into resistance wire electric heating glass and film electric heating glass. Patents related to resistance wire electric heating glass include: CN201039504Y, CN201039503Y, CN201156830Y, CN201904931U, CN201491304U, CN2181662Y and so on. Resistance wire electric heating glass can also achieve the effect of defogging frost, but because the resistance wire is an opaque metal wire and cannot cover the entire glass surface, the transparency of the conductive heating glass is reduced and the heating is uneven. Patents related to thin-film e...

Examples

Embodiment 1

[0016] Preparation of Aluminum+Gallium Co-doped ZnO Thin Films by Electron Beam Evaporation:

[0017] ①Uniformly mix zinc oxide, aluminum oxide and gallium oxide powders with a purity of 99.99% according to the gallium doping content of 1.0 at.%, aluminum doping content of 2.0 at.%, press at 20MPa for 5min, and sinter at 1100°C for 360min to obtain ceramics target;

[0018] ②Clean and install the glass substrate, vacuum to 10 -3 Pa; the substrate is heated to 250°C, and the rotation speed is 2 rpm; the mixed gas of argon and oxygen is introduced to start evaporation, the high voltage is 6kV, the electron beam current is 30mA, and the evaporation time is 30min.

[0019] The thickness of the film obtained by this method is 200nm, and the resistivity is 3.0×10 -3 Ω·m, visible light transmittance > 85%.