Tail gas treatment device and tail gas treatment system

Abstract

The present invention discloses a tail gas treatment device and a tail gas treatment system, belonging to the technical field of tail gas treatment. The tail gas treatment device includes an intake pipe, a circulation pipe, an exhaust pipe and a tail gas treatment tank. The intake pipe is connected to the circulation pipe, and the tail gas treatment tank is filled with a reaction liquid. The tail gas treatment tank includes a first treatment area and a second treatment area isolated from each other, and the first treatment area and the second treatment area are both located below the liquid level of the reaction liquid; one end of the circulation pipe is connected to the first treatment area, and the other end is connected to the second treatment area. The reaction liquid can flow back from the second treatment area to the first treatment area through the circulation pipe, and the exhaust pipe is connected to the top of the tail gas treatment tank. The tail gas treatment system includes a plurality of tail gas treatment devices connected end to end in sequence along the flow direction of the tail gas, the intake pipe at the head end is connected to the tail gas discharge port of the tail gas discharge device, and the exhaust pipe at the tail end is connected to the intake port of the washing tower, which improves the absorption rate of arsine, realizes the pretreatment of the tail gas, and reduces the subsequent tail gas treatment pressure.

Description

Technical Field

[0001] The present invention relates to the technical field of tail gas treatment, and in particular to a tail gas treatment device and a tail gas treatment system. Background Art

[0002] Arsine is a highly toxic and flammable gas that can form a flammable mixed gas when mixed with air. For tail gas containing arsine, the arsine in the tail gas needs to be absorbed and then discharged into the atmosphere to prevent environmental pollution and harm to human health. Arsine is mainly produced in the tail gas of factory furnace tubes, ion implantation processes, MOCVD (Metal-organic Chemical Vapor Deposition) processes in semiconductor industrial production, as well as the tail gas produced during the arsine gas production process.

[0003] In the prior art, the tail gas containing arsine is usually directly discharged from bottom to top into a spray tower, and the spray tower sprays the reaction liquid from top to bottom to absorb arsine, and the treated tail gas is discharged into the outside atmosphere. This method has a large contact mass transfer resistance between the tail gas and the reaction liquid, and the arsine absorption rate is low. To achieve the expected treatment effect, the equipment investment and operating costs are relatively high. Summary of the invention

[0004] The purpose of the present invention is to provide a tail gas treatment device and a tail gas treatment system, which can improve the absorption rate of arsine and realize the pretreatment of tail gas to reduce the pressure of subsequent tail gas treatment.

[0005] To achieve this object, the present invention adopts the following technical solutions:

[0006] An exhaust gas treatment device comprises an intake pipe, a circulation pipe, an exhaust pipe and an exhaust gas treatment tank, wherein the intake pipe is used to introduce exhaust gas, the intake pipe is connected to the circulation pipe, the exhaust gas treatment tank is filled with a reaction liquid, the exhaust gas treatment tank comprises a first treatment area and a second treatment area isolated from each other, the first treatment area and the second treatment area are both located below the liquid level of the reaction liquid, one end of the circulation pipe is connected to the first treatment area, and the other end is connected to the second treatment area, the reaction liquid can flow back from the second treatment area to the first treatment area through the circulation pipe, and the exhaust pipe is connected to the top of the exhaust gas treatment tank.

[0007] As a preferred technical solution for an exhaust gas treatment device, packing is provided in both the first treatment zone and the second treatment zone, and both ends of the circulation pipe are located below the packing, and the packing is used to increase the contact area between the exhaust gas and the reaction liquid.

[0008] As a preferred technical solution of an exhaust gas treatment device, the exhaust gas treatment device further comprises an ejector arranged on the circulation pipe, and the intake pipe is connected to the ejector.

[0009] As a preferred technical solution of an exhaust gas treatment device, the exhaust gas treatment device further comprises a heat exchanger arranged on the circulation pipe, and the heat exchanger is located between the second treatment zone and the ejector.

[0010] As a preferred technical solution of an exhaust gas treatment device, the exhaust gas treatment device further includes a first circulation pump, and the first circulation pump is arranged on the circulation pipe.

[0011] As a preferred technical solution of an exhaust gas treatment device, the exhaust gas treatment device further includes a liquid level measuring component, and the liquid level measuring component is used to measure the liquid level height of the reaction liquid in the exhaust gas treatment tank.

[0012] To achieve the above-mentioned purpose, the present invention also provides an exhaust gas treatment system, comprising a plurality of exhaust gas treatment devices as described above, which are connected end to end in sequence along the exhaust gas flow direction, the exhaust pipe of the previous exhaust gas treatment device serves as the inlet pipe of the next exhaust gas treatment device, the inlet pipe of the exhaust gas treatment device at the head end is connected to the exhaust gas emission port of the exhaust gas emission device, and the exhaust pipe of the exhaust gas treatment device at the tail end is connected to the inlet port of the washing tower.

[0013] As a preferred technical solution of an exhaust gas treatment system, the exhaust gas treatment system further includes a reaction liquid replenishing component, and the reaction liquid replenishing component is connected to the exhaust gas treatment tank and is used to replenish the reaction liquid into the exhaust gas treatment tank.

[0014] As a preferred technical solution of an exhaust gas treatment system, the exhaust gas treatment system further includes a liquid discharge component, the liquid discharge component is connected to the circulation pipe, and the liquid discharge component is used to discharge the reaction liquid to the outside.

[0015] As a preferred technical solution for an exhaust gas treatment system, the exhaust gas treatment system also includes a buffer tank, which is connected to the intake pipe of the exhaust gas treatment device at the head end, and is used to prevent the reaction liquid from flowing back into the exhaust gas emission device.

[0016] Compared with the prior art, the advantages and beneficial effects of the present invention are:

[0017] The present invention provides a tail gas treatment device, which includes an intake pipe, a circulation pipe, an exhaust pipe and a tail gas treatment tank. The intake pipe is connected to the circulation pipe, the tail gas treatment tank is filled with a reaction liquid, and the tail gas treatment tank includes a first treatment area and a second treatment area isolated from each other, and the first treatment area and the second treatment area are both located below the liquid level of the reaction liquid; one end of the circulation pipe is connected to the first treatment area, and the other end is connected to the second treatment area, and the reaction liquid can flow back from the second treatment area to the first treatment area through the circulation pipe, and the exhaust pipe is connected to the top of the tail gas treatment tank. The tail gas in the intake pipe is mixed with the reaction liquid in the circulation pipe and flows into the first treatment area, and the tail gas after reacting with the reaction liquid is discharged from the exhaust pipe, and the reaction liquid circulates in the first treatment area, the second treatment area and the circulation pipe. The tail gas treatment device improves the absorption rate of arsine, realizes the pretreatment of the tail gas, and can reduce the pressure of subsequent tail gas treatment.

[0018] The present invention also provides an exhaust gas treatment system, which includes a plurality of the above-mentioned exhaust gas treatment devices connected end to end in the exhaust gas flow direction, the exhaust pipe of the previous exhaust gas treatment device serves as the intake pipe of the next exhaust gas treatment device, the intake pipe of the exhaust gas treatment device at the head end is connected to the exhaust gas discharge port of the exhaust gas discharge device, and the exhaust pipe of the exhaust gas treatment device at the tail end is connected to the intake port of the washing tower. By setting up a plurality of exhaust gas treatment devices, the exhaust gas treatment system realizes multiple treatments of the exhaust gas to meet the emission standards, or serves as a pretreatment to reduce the subsequent exhaust gas treatment pressure. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 It is a structural schematic diagram of an exhaust gas treatment device provided in a specific embodiment of the present invention;

[0020] Figure 2 It is a schematic diagram of the structure of the tail gas treatment system provided by a specific embodiment of the present invention.

[0021] Reference numerals:

[0022] 1. Intake pipe; 2. Circulation pipe; 3. Exhaust pipe;

[0023] 4. tail gas treatment tank; 41. first treatment area; 42. second treatment area; 43. filler;

[0024] 5. Liquid level measurement component; 6. Concentration measurement component; 7. PH measurement component; 8. Ejector; 9. First circulation pump; 10. Heat exchanger;

[0025] 100, reaction liquid replenishing assembly; 1001, liquid medicine tank; 1002, alkali liquid tank; 1003, second circulation pump;

[0026] 200, drainage assembly; 2001, flow measurement assembly;

[0027] 300. Buffer tank. DETAILED DESCRIPTION

[0028] In order to make the technical problem solved by the present invention, the technical solution adopted and the technical effect achieved more clearly, the technical solution of the present invention is further explained below with reference to the accompanying drawings and through specific implementation methods.

[0029] In the description of the present invention, unless otherwise clearly specified and limited, the terms "connected", "connected", and "fixed" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0030] In the present invention, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may include that the first and second features are in direct contact, or may include that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, a first feature being "above", "above" and "above" a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being "below", "below" and "below" a second feature includes that the first feature is directly below and obliquely below the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0031] In the description of this embodiment, the terms "upper", "lower", "left", "right" and other directions or positional relationships are based on the directions or positional relationships shown in the drawings, and are only for the convenience of description and simplification of operation, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operate in a specific direction, and therefore cannot be understood as limiting the present invention. In addition, the terms "first" and "second" are only used to distinguish in the description and have no special meaning.

[0032] like Figure 1 As shown, this embodiment provides an exhaust gas treatment device, which includes an intake pipe 1, a circulation pipe 2, an exhaust pipe 3 and an exhaust gas treatment tank 4. Among them, the intake pipe 1 is used to pass exhaust gas, the intake pipe 1 is connected to the circulation pipe 2, the exhaust gas treatment tank 4 is filled with a reaction liquid, and the exhaust gas treatment tank 4 includes a first treatment area 41 and a second treatment area 42 isolated from each other, and the first treatment area 41 and the second treatment area 42 are both located below the liquid level of the reaction liquid. One end of the circulation pipe 2 is connected to the first treatment area 41, and the other end is connected to the second treatment area 42. The reaction liquid can flow back from the second treatment area 42 to the first treatment area 41 through the circulation pipe 2, and the exhaust pipe 3 is connected to the top of the exhaust gas treatment tank 4.

[0033] Specifically, a baffle is provided below the liquid level of the reaction liquid in the tail gas treatment tank 4, one side of the baffle is the first treatment area 41, and the other side is the second treatment area 42. The reaction liquid in the first treatment area 41 can only flow from above the baffle to the second treatment area 42.

[0034] The tail gas enters the circulation pipe 2 from the intake pipe 1, mixes with the reaction liquid circulating in the circulation pipe 2 and enters the tail gas treatment tank 4, the arsine in the tail gas reacts chemically with the reaction liquid and is absorbed, and the treated tail gas overflows from the reaction liquid and is discharged through the exhaust pipe 3; the reaction liquid circulates in the first treatment area 41, the second treatment area 42 and the circulation pipe 2. By dividing the tail gas treatment tank 4 into the first treatment area 41 and the second treatment area 42, the flow of the reaction liquid in the tail gas treatment tank 4 increases, the contact time of the tail gas and the reaction liquid is extended, and the contact area is increased, so that the tail gas and the reaction liquid react fully, thereby increasing the absorption rate of arsine in the tail gas, realizing the pretreatment of the tail gas, and thus reducing the subsequent treatment pressure of the tail gas. Preferably, in this embodiment, the first treatment area 41 is larger than the second treatment area 42 to further increase the contact time of the tail gas and the reaction liquid.

[0035] Optionally, a filler 43 is provided in both the first treatment area 41 and the second treatment area 42, and both ends of the circulation pipe 2 are connected to the bottom of the filler 43, so that the reaction liquid containing the tail gas is dispersed in the filler 43, thereby increasing the contact area between the tail gas and the reaction liquid. The filler 43 is generally made of inert solid material. In this embodiment, the filler 43 is preferably a high-efficiency random filler such as a spherical or stepped shape. The setting of the filler 43 allows the tail gas to be strongly mixed with the reaction liquid, thereby enhancing the reaction degree of arsine in the tail gas and the reaction liquid, thereby improving the absorption rate of arsine.

[0036] Preferably, one end of the circulation pipe 2 extends between the filler 43 and the bottom of the tail gas treatment tank 4, and a plurality of distribution holes are provided on the extending portion of the pipe section. The distribution holes can evenly disperse the mixture of tail gas and reaction liquid in the circulation pipe 2 below the first treatment zone 41, thereby improving the absorption rate of arsine in the tail gas.

[0037] like Figure 1As shown, the exhaust gas treatment device also includes an ejector 8 arranged on the circulation pipe 2, and the air intake pipe 1 is connected to the ejector 8. The ejector 8 includes a nozzle, an intake chamber and a diffuser, the intake chamber includes a mixing chamber and an air guide pipe that are interconnected, the air guide pipe is connected to the air intake pipe 1, and the diffuser is connected to the circulation pipe 2. The reaction liquid is ejected at high speed after passing through the nozzle. When the high-speed reaction liquid passes through the mixing chamber, a vacuum is formed in the mixing chamber, and the exhaust gas in the air intake pipe 1 is introduced by the air guide pipe. After the exhaust gas enters the mixing chamber, it is violently mixed with the reaction liquid to form a gas-liquid mixture, which is finally discharged by the diffuser. The ejector 8 relies on its own special structure and the movement of the fluid to disperse the exhaust gas and the reaction liquid, and the mixing with each other increases the contact area between the reaction liquid and the exhaust gas, thereby improving the absorption rate of arsine.

[0038] Optionally, the tail gas treatment device further comprises a first circulation pump 9, which is arranged on the circulation pipe 2. Before the tail gas treatment device treats the tail gas, the first circulation pump 9 is turned on to allow the reaction liquid to circulate between the circulation pipe 2 and the tail gas treatment tank 4, and after the ejector 8 establishes a vacuum, the tail gas is introduced for treatment. This prevents the gas in the tail gas treatment device from escaping to the upstream tail gas emission device and causing pollution, and the vacuum environment established by the ejector 8 can more smoothly suck the tail gas into the intake pipe 1, so that the tail gas treatment is carried out smoothly.

[0039] Since the first circulating pump 9 does work on the reaction liquid, and the chemical reaction between the arsine in the tail gas and the reaction liquid is an exothermic reaction, the temperature of the reaction liquid rises. If the temperature of the reaction liquid is too high, it is not conducive to the mixing of the tail gas and the reaction liquid, and the too high temperature will cause the reaction rate to decrease, which is not conducive to the chemical reaction. Therefore, the tail gas treatment device also includes a heat exchanger 10 arranged on the circulation pipe 2, and the heat exchanger 10 is located between the second processing area 42 and the ejector 8. The heat exchanger 10 can adjust the temperature of the reaction liquid in the circulation pipe 2 to improve the mixing degree of the tail gas and the reaction liquid, thereby improving the reaction rate of arsine and the reaction liquid, and improving the absorption rate of arsine. In the present embodiment, the temperature of the reaction liquid is maintained at room temperature.

[0040] Preferably, the tail gas treatment device also includes a liquid level measuring component 5, which is used to measure the liquid level of the reaction liquid in the tail gas treatment tank 4. The liquid level measuring component 5 is used to monitor the liquid level to ensure that the operator can observe the liquid level of the reaction liquid in real time, and ensure that when the liquid level drops to the set value, the operator can replenish the reaction liquid in time to ensure that the tail gas treatment is carried out smoothly. Preferably, in this embodiment, the liquid level is about 10cm to 20cm higher than the filler 43. The liquid level measuring component 5 is preferably a differential pressure level gauge, which is connected to the tail gas treatment tank 4.

[0041] Preferably, the exhaust gas treatment device also includes a concentration measuring component 6 and a pH measuring component 7. The concentration measuring component 6 and the pH measuring component 7 are used to monitor the concentration and pH of the reaction liquid, respectively. One end of the concentration measuring component 6 extends below the liquid level of the reaction liquid, and the other end extends out of the exhaust gas treatment tank 4, so that the operator can monitor the concentration of the reaction liquid in real time. One end of the pH measuring component 7 extends below the liquid level of the reaction liquid, and the other end extends out of the exhaust gas treatment tank 4, so that the operator can monitor the pH value of the reaction liquid in real time. Specifically, the pH value is generally maintained at 9 to 12. Preferably, in this embodiment, the concentration measuring component 6 is a concentration probe, and the pH measuring component 7 is a pH probe.

[0042] like Figure 2 As shown, the present embodiment also provides an exhaust gas treatment system, which includes a plurality of the above-mentioned exhaust gas treatment devices connected end to end in sequence along the exhaust gas flow direction, the exhaust pipe 3 of the previous exhaust gas treatment device serves as the inlet pipe 1 of the subsequent exhaust gas treatment device, the inlet pipe 1 of the exhaust gas treatment device at the head end is connected to the exhaust gas emission port of the exhaust gas emission device, and the exhaust pipe 3 of the exhaust gas treatment device at the tail end is connected to the air inlet of the washing tower.

[0043] After the tail gas is discharged from the tail gas discharge port, it is sucked into the circulation pipe 2 by the ejector 8, and enters the first tail gas treatment tank 4 through the circulation pipe 2. The treated tail gas overflows from the liquid level of the reaction liquid, and enters the air intake pipe 1 of the next tail gas treatment device through the exhaust pipe 3. The tail gas passes through multiple tail gas treatment devices in sequence, and multiple treatments of the tail gas are achieved, which improves the treatment effect of the pretreatment, further reduces the pressure of subsequent tail gas treatment, and improves the absorption rate of arsine. The number of tail gas treatment devices in the tail gas treatment system is set according to the concentration of arsine in the exhaust tail gas. The tail gas treated by the tail gas treatment system can meet the emission standard, or be sprayed and washed by a subsequent spray tower, and finally discharged into the environment, meeting environmental protection requirements. Preferably, in the present embodiment, the tail gas treatment system includes two tail gas treatment devices connected end to end in the direction of tail gas flow.

[0044] Optionally, the tail gas treatment system further includes a reaction liquid supplement component 100, which is connected to the tail gas treatment tank 4 and is used to supplement the reaction liquid to the tail gas treatment tank 4. Specifically, the reaction liquid supplement component 100 includes a liquid medicine tank 1001 and an alkali liquid tank 1002, which are respectively connected to the tail gas treatment tank 4 through pipelines, and a second circulation pump 1003 is provided on the pipeline. The liquid medicine tank 1001 is filled with a sodium hypochlorite solution with a concentration of 1% to 10%, and the alkali liquid tank 1002 is filled with a sodium hydroxide solution with a concentration of 1% to 40%. When the liquid level measuring component 5 monitors that the liquid level is lower than the preset value, the operator can add the liquid medicine in the liquid medicine tank 1001 to the exhaust gas treatment tank 4; when the concentration measuring component 6 detects that the concentration of the reaction liquid is lower than the preset value, the liquid medicine in the liquid medicine tank 1001 and the alkali liquid in the alkali liquid tank 1002 can be added to the exhaust gas treatment tank 4 to make the concentration of the reaction liquid reach the preset value; when the pH measuring component 7 monitors that the pH value of the reaction liquid is lower than the preset value, the alkali liquid in the alkali liquid tank 1002 can be added to the exhaust gas treatment tank 4 to make the pH value of the reaction liquid return to the preset range.

[0045] Optionally, the tail gas treatment system also includes a drain assembly 200, which is connected to the circulation pipe 2, and the drain assembly 200 is used to discharge the reaction solution outward. Specifically, the drain assembly 200 includes a drain main pipe, a plurality of drain branches and a plurality of flow measurement components 2001, and the flow measurement component 2001 corresponds to the drain branch pipe one by one and is arranged on the drain branch pipe, one end of the drain branch pipe is connected to the circulation pipe 2 of the tail gas treatment device, and the other end extends and is connected to the drain main pipe, and the drain main pipe is connected to the arsenic-containing wastewater system. After the reaction solution circulates for a period of time, the product concentration increases due to the decrease in the reaction concentration of the reaction solution and the arsine, in order to maintain the reaction solution and the product concentration within a certain range, it is necessary to have a certain discharge to the reaction solution in the tail gas treatment tank 4, to ensure that the tail gas treatment can be continuously and effectively carried out. Preferably, in the present embodiment, the flow measurement component 2001 is selected as a flow meter.

[0046] Optionally, the exhaust gas treatment system further includes a buffer tank 300, which is connected to the air inlet pipe 1 of the exhaust gas treatment device at the head end, and is used to prevent the reaction liquid from flowing back into the exhaust gas emission device. When the exhaust gas treatment system fails or the power is cut off, causing the system to stop working, since the air inlet pipe 1 is in a negative pressure state, the reaction liquid will be sucked back due to the pressure difference. By setting up the buffer tank 300, the reaction liquid sucked back can be stored to prevent the reaction liquid from flowing into the exhaust gas emission device.

[0047] The above contents are only preferred embodiments of the present invention. For ordinary technicians in this field, according to the concept of the present invention, there will be changes in the specific implementation methods and application scopes. The content of this specification should not be understood as limiting the present invention.

Claims

1. A tail gas treatment device, characterized in that: The invention comprises an intake pipe (1), a circulation pipe (2), an exhaust pipe (3) and an exhaust gas treatment tank (4), wherein the intake pipe (1) is used to introduce exhaust gas, the intake pipe (1) is connected to the circulation pipe (2), the exhaust gas treatment tank (4) contains a reaction liquid, the exhaust gas treatment tank (4) comprises a first treatment area (41) and a second treatment area (42) which are isolated from each other, the first treatment area (41) and the second treatment area (42) are both located below the liquid level of the reaction liquid, one end of the circulation pipe (2) is connected to the first treatment area (41), and the other end is connected to the second treatment area (42), the reaction liquid can flow back from the second treatment area (42) to the first treatment area (41) through the circulation pipe (2), and the exhaust pipe (3) is connected to the top of the exhaust gas treatment tank (4); The reaction liquid volume of the first treatment zone (41) is greater than the reaction liquid volume of the second treatment zone (42).

2. The exhaust gas treatment device according to claim 1, characterized in that: The first treatment zone (41) and the second treatment zone (42) are both provided with fillers (43), and both ends of the circulation pipe (2) are located below the fillers (43). The fillers (43) are used to increase the contact area between the tail gas and the reaction liquid.

3. The exhaust gas treatment device according to claim 1, characterized in that: The exhaust gas treatment device further comprises an ejector (8) arranged on the circulation pipe (2), and the intake pipe (1) is connected to the ejector (8).

4. The exhaust gas treatment device according to claim 3, characterized in that: The tail gas treatment device further comprises a heat exchanger (10) arranged on the circulation pipe (2), and the heat exchanger (10) is located between the second treatment zone (42) and the ejector (8).

5. The exhaust gas treatment device according to claim 1, characterized in that: The exhaust gas treatment device further comprises a first circulation pump (9), wherein the first circulation pump (9) is arranged on the circulation pipe (2).

6. The exhaust gas treatment device according to claim 1, characterized in that: The tail gas treatment device further comprises a liquid level measurement component (5), and the liquid level measurement component (5) is used to measure the liquid level height of the reaction liquid in the tail gas treatment tank (4).

7. An exhaust gas treatment system, characterized in that: It comprises a plurality of exhaust gas treatment devices as claimed in any one of claims 1 to 6 which are connected end to end in sequence along the exhaust gas flow direction, the exhaust pipe (3) of the first exhaust gas treatment device serves as the air inlet pipe (1) of the second exhaust gas treatment device, the air inlet pipe (1) of the exhaust gas treatment device at the head end is connected to the exhaust gas discharge port of the exhaust gas discharge device, and the exhaust pipe (3) of the exhaust gas treatment device at the tail end is connected to the air inlet of a washing tower.

8. The exhaust gas treatment system according to claim 7, characterized in that: The exhaust gas treatment system further comprises a reaction liquid replenishing component (100), wherein the reaction liquid replenishing component (100) is connected to the exhaust gas treatment tank (4) and is used to replenish the reaction liquid into the exhaust gas treatment tank (4).

9. The exhaust gas treatment system according to claim 7, characterized in that: The tail gas treatment system further comprises a liquid discharge component (200), wherein the liquid discharge component (200) is connected to the circulation pipe (2), and the liquid discharge component (200) is used to discharge the reaction liquid to the outside.

10. The exhaust gas treatment system according to claim 7, characterized in that: The exhaust gas treatment system further comprises a buffer tank (300), wherein the buffer tank (300) is connected to the air inlet pipe (1) of the exhaust gas treatment device at the head end, and the buffer tank (300) is used to prevent the reaction liquid from flowing back into the exhaust gas emission device.

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