Handheld plasma treatment equipment

Abstract

The present invention discloses a handheld plasma processing device, comprising a shell and a base assembly, and also comprising a gas mixing box, a guide plate assembly, a ceramic medium tube and an electrode column. The shell and the base assembly enclose a receiving cavity, the gas mixing box, the guide plate assembly, the ceramic medium tube and the electrode column are all arranged in the receiving cavity, and the electrode column is arranged in the ceramic medium tube; the base assembly is provided with a slot, the guide plate assembly is mounted on the slot, the ceramic medium tube is arranged at the bottom of the guide plate assembly, and a gap is provided between the ceramic medium tube and the slot, the guide plate assembly is provided with a guide hole, the guide hole is respectively connected with the gas mixing box and the gap, and the bottom of the slot is provided with a flame outlet hole. It has a simple structure, a small overall volume, is easy to carry and install, and has a good processing effect.

Description

Technical Field

[0001] The invention relates to the technical field of plasma processing, and in particular to a handheld plasma processing device. Background Art

[0002] Plasma is an ionized gaseous substance composed of positive and negative ions produced by ionization of atoms and atomic groups after some electrons are deprived. It is a macroscopic electrically neutral ionized gas with a scale larger than the Debye length. Its movement is mainly dominated by electromagnetic force and exhibits significant collective behavior. It is widely present in the universe and is often regarded as the fourth state of matter besides solid, liquid and gas. Plasma is a good conductor. Plasma can be captured, moved and accelerated by cleverly designed magnetic fields. The development of plasma physics has provided new technologies and processes for the further development of sciences such as materials, energy, information, environmental space, space physics, and geophysics. Plasma is the fourth state of matter different from solid, liquid and gas. Matter is composed of molecules, molecules are composed of atoms, and atoms are composed of positively charged nuclei and negatively charged electrons surrounding them. When heated to a high enough temperature or for other reasons, the outer electrons break free from the constraints of the nucleus and become free electrons. The process of electrons leaving the nucleus is called "ionization". At this time, the substance becomes a uniform "paste" composed of positively charged atomic nuclei and negatively charged electrons, so people jokingly call it ion plasma. The total amount of positive and negative charges in these ion plasmas is equal, so it is approximately electrically neutral. Therefore, plasma is widely used, including the digital industry, electronics industry, automotive industry, printing and packaging industry, etc.

[0003] The existing plasma treatment equipment mainly includes rotary spray guns, DC spray guns and wide-width plasma machines. The DC spray gun plasma flame can only process a small range of products, with a maximum width of 6~8mm; although the rotary spray gun nozzle can expand the range, the larger the processing range, the worse the processing effect and the lower the plasma utilization rate; the wide-width plasma machine is not conducive to processing some small and medium-sized products due to its large size and area, and is inconvenient to install. In addition, the length of the plasma flame is limited, which is not conducive to processing diversified products. Summary of the invention

[0004] The technical problem to be solved by the present invention is to provide a handheld plasma processing device which has good processing effect and is easy to carry and install.

[0005] In order to solve the above technical problems, the technical solution adopted by the present invention is:

[0006] A handheld plasma processing device comprises a shell and a base assembly, and also comprises a gas mixing box, a guide plate assembly, a ceramic medium tube and an electrode column. The shell and the base assembly form a receiving cavity, the gas mixing box, the guide plate assembly, the ceramic medium tube and the electrode column are all arranged in the receiving cavity, and the electrode column is arranged in the ceramic medium tube; the base assembly is provided with a groove, the guide plate assembly is mounted on the groove, the ceramic medium tube is arranged at the bottom of the guide plate assembly, and a gap is provided between the ceramic medium tube and the groove, the guide plate assembly is provided with a guide hole, the guide hole is respectively connected with the gas mixing box and the gap, and the bottom of the groove is provided with a flame outlet hole.

[0007] Furthermore, two rows of flame outlet holes are provided at the bottom of the slot, and each row of flame outlet holes is arranged along the length direction of the ceramic medium tube.

[0008] Furthermore, a side surface of the ceramic medium tube close to the flame outlet hole is a plane.

[0009] Furthermore, the guide plate assembly includes a first guide plate and a second guide plate, the groove is in a Y-shape, the first guide plate is located in the groove, the second guide plate is arranged on the first guide plate, the gas mixing box is arranged on the side of the second guide plate away from the first guide plate, the guide holes are provided on the first guide plate and the second guide plate, and a mixing space is provided between the first guide plate and the second guide plate.

[0010] Furthermore, the guide holes on the first guide plate are staggered relative to the guide holes on the second guide plate.

[0011] Furthermore, the second guide plate is in a T-shape.

[0012] Furthermore, the electrode column is made of copper.

[0013] Furthermore, the base assembly includes a first base and a second base, the first base is arranged on the second base, a sealing groove is provided on a side surface of the first base close to the second base, and a sealing strip is provided in the sealing groove.

[0014] Furthermore, the minimum width of the gap between the ceramic medium tube and the two side walls of the slot is 0.5-1 mm.

[0015] Furthermore, the shell is provided with two air inlets which are spaced apart from each other, and the two air inlets are respectively connected to the gas mixing box.

[0016] Furthermore, the base assembly is also provided with a high-voltage input port and a cooling water inlet, the high-voltage input port is electrically connected to the electrode column, and the distance between the high-voltage input port and the cooling water inlet is greater than 10 mm.

[0017] The beneficial effects of the present invention are as follows: the working gas is mixed in the gas mixing box and then enters the gap between the ceramic medium tube and the slot through the guide hole, and the ceramic medium tube as the medium layer reacts with the working gas to generate plasma, and the generated plasma reaches the surface of the product to be processed through the flame outlet hole, and the position of the flame outlet hole can be set to a linear shape as needed to improve the processing effect. The plasma processing equipment of the present invention has a simple structure, a small overall volume, can be handheld, is easy to carry and install, and has a good processing effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 This is a schematic diagram of the overall structure of a handheld plasma processing device according to Embodiment 1 of the present invention;

[0019] Figure 2 It is a structural explosion diagram of a handheld plasma processing device according to the first embodiment of the present invention;

[0020] Figure 3 It is a cross-sectional view of a handheld plasma processing device according to the first embodiment of the present invention.

[0021] Description of labels:

[0022] 1. Shell; 11. Air inlet; 2. Base assembly; 21. High-pressure input port; 22. Cooling water inlet; 23. First base; 231. Sealing groove; 24. Second base; 3. Gas mixing box; 4. Ceramic medium tube; 5. Electrode column; 6. Gap; 7. First guide plate; 8. Second guide plate; 9. Guide hole; 10. Mixing space. DETAILED DESCRIPTION

[0023] In order to explain the technical content, achieved objectives and effects of the present invention in detail, the following is an explanation in conjunction with the implementation modes and the accompanying drawings.

[0024] Please refer to Figures 1 to 3A handheld plasma processing equipment includes a shell 1 and a base assembly 2, and also includes a gas mixing box 3, a guide plate assembly, a ceramic medium tube 4 and an electrode column 5. The shell 1 and the base assembly 2 form a accommodating cavity, and the gas mixing box 3, the guide plate assembly, the ceramic medium tube 4 and the electrode column 5 are all arranged in the accommodating cavity, and the electrode column 5 is arranged in the ceramic medium tube 4; the base assembly 2 is provided with a groove, the guide plate assembly is mounted on the groove, the ceramic medium tube 4 is arranged at the bottom of the guide plate assembly, and a gap 6 is provided between the ceramic medium tube 4 and the groove, the guide plate assembly is provided with a guide hole 9, and the guide hole 9 is respectively connected with the gas mixing box 3 and the gap 6, and the bottom of the groove is provided with a flame outlet hole.

[0025] From the above description, it can be seen that the beneficial effect of the present invention is that the working gas enters the gap between the ceramic medium tube and the slot through the guide hole after being mixed in the gas mixing box, and the ceramic medium tube as the medium layer reacts with the working gas to generate plasma, and the generated plasma reaches the surface of the product to be processed through the flame outlet hole, and the position of the flame outlet hole can be set to a linear shape as needed to improve the processing effect. The plasma processing equipment of the present invention has a simple structure, a small overall volume, can be handheld, is easy to carry and install, and has a good processing effect.

[0026] Furthermore, two rows of flame outlet holes are provided at the bottom of the slot, and each row of flame outlet holes is arranged along the length direction of the ceramic medium tube 4 .

[0027] It can be seen from the above description that providing two rows of flame holes can increase the processing area and improve the processing efficiency.

[0028] Furthermore, a side surface of the ceramic medium tube 4 close to the flame outlet hole is a plane.

[0029] It can be seen from the above description that setting it as a plane can make the generated plasma more uniform.

[0030] Furthermore, the guide plate assembly includes a first guide plate 7 and a second guide plate 8, the groove is in a Y-shape, the first guide plate 7 is located in the groove, the second guide plate 8 is arranged on the first guide plate 7, the gas mixing box 3 is arranged on the side of the second guide plate 8 away from the first guide plate 7, the first guide plate 7 and the second guide plate 8 are both provided with the guide holes 9, and a mixing space 10 is provided between the first guide plate 7 and the second guide plate 8.

[0031] It can be seen from the above description that providing two guide plates can extend the gas path, and providing a mixing space between the first guide plate and the second guide plate can make the gas mixing more uniform.

[0032] Furthermore, the guide holes 9 on the first guide plate 7 are arranged in a staggered manner relative to the guide holes 9 on the second guide plate 8 .

[0033] From the above description, it can be seen that when the gas enters the cavity from the gas mixing box, the gas pressure will first act on the surface of the second guide plate, causing the gas to diffuse, and then enter the space where the first guide plate is located through the guide holes on the second guide plate. Due to the staggered setting of the guide holes, the gas will act on the first guide plate to disperse, and finally enter the gap from the guide holes on the first guide plate. This can increase the fluidity of the gas and make the gas distribution more uniform, thereby making the plasma reaction more thorough and uniform.

[0034] The gas flow path can be extended to make the gas mixing more uniform, and the plasma reaction can also be made more thorough and uniform.

[0035] Furthermore, the second guide plate 8 is in a T-shape.

[0036] Furthermore, the base assembly 2 includes a first base 23 and a second base 24 , the first base 23 is arranged on the second base 24 , a sealing groove 231 is provided on a side surface of the first base 23 close to the second base 24 , and a sealing strip is provided in the sealing groove 231 .

[0037] From the above description, it can be known that providing a sealing strip can prevent gas from leaking from the gap between the first base and the second base, prevent the internal gas pressure from being too low or the plasma concentration from being too low, and improve the stability of the plasma.

[0038] Furthermore, the electrode column 5 is made of copper.

[0039] Furthermore, the minimum width of the gap between the ceramic medium tube 4 and the two side walls of the slot is 0.5-1 mm.

[0040] From the above description, it can be seen that the width of the gap should not be too large or too small. If it is too large, it will lead to excessive gas and incomplete plasma reaction, thus causing plasma instability; if it is too small, it will lead to lack of medium during plasma reaction, resulting in a short flame and poor treatment effect.

[0041] Furthermore, the housing 1 is provided with two air inlets 11 spaced apart from each other, and the two air inlets 11 are respectively connected to the gas mixing box 3 .

[0042] From the above description, it can be seen that the two air inlets can be respectively arranged at the one-third position and the two-thirds position in the length direction of the shell, so that the gas distribution is more uniform during air intake.

[0043] Furthermore, the base assembly 2 is also provided with a high-voltage input port 21 and a cooling water inlet 22. The high-voltage input port 21 is electrically connected to the electrode column 5, and the distance between the high-voltage input port 21 and the cooling water inlet 22 is greater than 10 mm.

[0044] From the above description, it can be seen that the distance between the high-voltage input port and the cooling water inlet is greater than 10 mm to avoid high-voltage discharge to the edge during operation, making the plasma processing equipment safer and more stable during operation.

[0045] Please refer to Figures 1 to 3 , Embodiment 1 of the present invention is:

[0046] A handheld plasma treatment device, such as Figure 1 and Figure 2 As shown, it includes a shell 1 and a base assembly 2, and also includes a gas mixing box 3, a guide plate assembly, a ceramic medium tube 4 and an electrode column 5. The shell 1 and the base assembly 2 form a receiving cavity, and the gas mixing box 3, the guide plate assembly, the ceramic medium tube 4 and the electrode column 5 are all arranged in the receiving cavity. The electrode column 5 is arranged in the ceramic medium tube 4, and the material of the electrode column 5 is copper. The shell 1 is provided with two air inlets 11 arranged at intervals, and the two air inlets 11 are respectively connected to the gas mixing box 3. The two air inlets 11 can be respectively arranged at one-third and two-thirds of the length direction of the shell, so that the gas distribution is more uniform during air intake. . The base assembly 2 is provided with a cooling water inlet 22 and a high-voltage input port 21. The high-voltage input port 21 is electrically connected to the electrode column 5. Cooling water can be introduced through the cooling water inlet 22 to cool the equipment, and the distance between the high-voltage input port 21 and the cooling water inlet 22 is greater than 10 mm. In this embodiment, there are two cooling water inlets 22, which are respectively located on both sides of the high-voltage input port 21.

[0047] like Figure 3 As shown, the base assembly 2 is provided with a slot, the guide plate assembly is mounted on the slot, the ceramic medium tube 4 is arranged at the bottom of the guide plate assembly, and a gap 6 is provided between the ceramic medium tube 4 and the slot, and the minimum width of the gap between the ceramic medium tube 4 and the two side walls of the slot is 0.5~1mm. The guide plate assembly is provided with a guide hole 9, and the guide hole 9 is connected to the gas mixing box 3 and the gap 6 respectively, and a flame outlet hole is provided at the bottom of the slot. Preferably, two rows of flame outlet holes are provided at the bottom of the slot, and the flame outlet holes of each row are arranged along the length direction of the ceramic medium tube 4, and the number of flame outlet holes in each row can be set as needed. One side of the ceramic medium tube 4 close to the flame outlet hole is a plane.

[0048] In this embodiment, the base assembly 2 includes a first base 23 and a second base 24. The first base 23 is arranged on the second base 24. A sealing groove 231 is provided on a side surface of the first base 23 close to the second base 24. A sealing strip is provided in the sealing groove 231. The sealing strip can prevent gas from flowing out from the gap between the first base 23 and the second base 24.

[0049] In this embodiment, the guide plate assembly includes a first guide plate 7 and a second guide plate 8. The shape of the groove is Y-shaped. The first guide plate 7 is located in the groove. The second guide plate 8 is arranged on the first guide plate 7. The shape of the first guide plate 7 is adapted to the shape of the groove. The shape of the second guide plate 8 is T-shaped. The first guide plate 7 is installed together with the first base in an inlaid manner when it cooperates with the first base, and does not need to be fixed by screws or other means, which is convenient and quick. The gas mixing box 3 is arranged on the side of the second guide plate 8 away from the first guide plate 7. The guide holes 9 are provided on the first guide plate 7 and the second guide plate 8, and a mixing space 10 is provided between the first guide plate 7 and the second guide plate 8. The working gas can be further mixed evenly in the mixing space 10. The guide holes 9 on the first guide plate 7 are staggered relative to the guide holes 9 on the second guide plate 8, so that the gas flow path can be extended. The gas mixing box 3 is provided with an inner groove which is compatible with the second guide plate 8. By directly pressing, the gas mixing box 3 and the second guide plate 8 can be exactly embedded together. Then, when the gas mixing box 3 and the base assembly 2 are installed, seamless pressing can be achieved. No additional fixing method is required, and the installation is simple and quick.

[0050] The working principle of the handheld plasma processing equipment of this embodiment is as follows: when the equipment is working, working gas and cooling water are connected, and the working gas is mixed in the gas mixing box 3 and enters the gap 6 between the ceramic medium tube 4 and the slot through the guide hole 9. The plasma power supply is turned on, and the energy reaches the electrode column 5 through the high-voltage input port 21. Then, the ceramic medium tube 4 is used as the medium layer to react with the working gas to generate plasma, and the generated plasma reaches the surface of the product to be processed through the flame outlet hole.

[0051] In summary, the handheld plasma processing equipment provided by the present invention has a simple structure, a small overall volume, is easy to carry and install, and has a good processing effect.

[0052] The above descriptions are merely embodiments of the present invention and are not intended to limit the patent scope of the present invention. Any equivalent transformations made using the contents of the present invention's specification and drawings, or directly or indirectly applied in related technical fields, are also included in the patent protection scope of the present invention.

Claims

1. A handheld plasma processing device, comprising a housing and a base assembly, characterized in that: It also includes a gas mixing box, a guide plate assembly, a ceramic medium tube and an electrode column. The shell and the base assembly form a accommodating cavity. The gas mixing box, the guide plate assembly, the ceramic medium tube and the electrode column are all arranged in the accommodating cavity, and the electrode column is arranged in the ceramic medium tube. The base assembly is provided with a groove, the guide plate assembly is mounted on the groove, the ceramic medium tube is arranged at the bottom of the guide plate assembly, and a gap is provided between the ceramic medium tube and the groove. The guide plate assembly is provided with guide holes, and the guide holes are respectively connected to the gas mixing box and the gap, and the bottom of the groove is provided with a flame outlet hole.

2. The handheld plasma processing device according to claim 1, characterized in that: The bottom of the slot is provided with two rows of flame outlet holes, and each row of flame outlet holes is arranged along the length direction of the ceramic medium tube.

3. The handheld plasma processing device according to claim 2, characterized in that: A side surface of the ceramic medium tube close to the flame outlet hole is a plane.

4. The handheld plasma processing device according to claim 1, characterized in that: The guide plate assembly includes a first guide plate and a second guide plate, the groove is in a Y-shape, the first guide plate is located in the groove, the second guide plate is arranged on the first guide plate, the gas mixing box is arranged on the side of the second guide plate away from the first guide plate, the first guide plate and the second guide plate are both provided with the guide holes, and a mixing space is provided between the first guide plate and the second guide plate.

5. The handheld plasma processing device according to claim 4, characterized in that: The guide holes on the first guide plate are arranged in a staggered manner relative to the guide holes on the second guide plate.

6. The handheld plasma processing device according to claim 4, characterized in that: The second guide plate is in a T-shape.

7. The handheld plasma processing device according to claim 1, characterized in that: The base assembly comprises a first base and a second base, wherein the first base is arranged on the second base, a sealing groove is arranged on a side surface of the first base close to the second base, and a sealing strip is arranged in the sealing groove.

8. The handheld plasma processing device according to claim 1, characterized in that: The minimum width of the gap between the ceramic medium tube and the two side walls of the slot is 0.5-1 mm.

9. The handheld plasma processing device according to claim 1, characterized in that: The shell is provided with two air inlets spaced apart from each other, and the two air inlets are respectively communicated with the gas mixing box.

10. The handheld plasma processing device according to claim 1, characterized in that: The base assembly is also provided with a high-voltage input port and a cooling water inlet. The high-voltage input port is electrically connected to the electrode column, and the distance between the high-voltage input port and the cooling water inlet is greater than 10 mm.

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