A plasma automatic cleaning device and working method thereof

Abstract

The present invention relates to a plasma automatic cleaning device, belonging to the technical field of semiconductor processing; the device comprises a frame, a cleaning mechanism arranged on the frame, a feeding device arranged outside two sides of the cleaning mechanism, a storage device arranged between the feeding device and the cleaning mechanism, a return device slidably connected to the frame, and a cover shell arranged on the periphery, wherein the feeding device can push a material plate from the storage device to the cleaning mechanism, and the return device can push the cleaned material plate back to the storage device; the present invention provides a plasma automatic cleaning device and a working method thereof, which can realize the automatic operation of feeding, cleaning and returning, improve the cleaning efficiency, reduce the manual work, reduce the labor cost, and improve the economic benefit.

Description

Technical Field

[0001] The invention relates to a plasma automatic cleaning device and a working method thereof, belonging to the technical field of semiconductor processing. Background Art

[0002] Plasma cleaning machine, also known as plasma cleaning machine or plasma surface treatment machine, is a new cleaning technology that uses plasma to achieve effects that conventional cleaning methods cannot achieve. Plasma cleaning machine uses the properties of these active components to treat the sample surface, thereby achieving cleaning, coating and other purposes.

[0003] Currently, plasma cleaning machines are commonly used in the semiconductor field and can clean lead frames, PCB boards, wafers, ceramics and other materials. However, current plasma cleaning machines mostly use manual retrieval, that is, the material board to be cleaned is manually placed in the cleaning chamber, and then manually taken out from the cleaning chamber after cleaning. This not only reduces the cleaning efficiency, but also increases a lot of labor costs, resulting in low economic benefits. Summary of the invention

[0004] The purpose of the present invention is to overcome the deficiencies in the prior art and provide a plasma automatic cleaning device and a working method thereof, which can realize the automated operation of feeding, cleaning and returning materials, improve the cleaning efficiency, reduce the manual workload, reduce labor costs and improve economic benefits.

[0005] To achieve the above object, the present invention adopts the following technical solution:

[0006] A plasma automatic cleaning device comprises a frame, a cleaning mechanism arranged on the frame, a feeding device arranged outside the two sides of the cleaning mechanism, a storage device arranged between the feeding device and the cleaning mechanism, a return device slidably connected to the frame, and a cover shell arranged on the periphery, wherein the feeding device can push a material plate from the storage device to the cleaning mechanism, and the return device can push the cleaned material plate back into the storage device.

[0007] Furthermore, the cleaning mechanism includes a cleaning cavity tray arranged on the machine platform, a rotating seat slidably connected to the frame, a rotating support beam rotatably hinged to the rotating seat, a cover shell arranged on the rotating support beam, and a limit device capable of limiting the rotation of the rotating support beam, the cover shell is arranged above the cleaning cavity tray, the cleaning cavity tray is provided with a cleaning cavity slide groove capable of allowing the material plate to slide, and the cover shell can be sealed and arranged on the cleaning cavity tray.

[0008] Furthermore, the limiting device includes a horizontal limiting hanging shaft arranged on the outside of the rotating seat, a flip cover limiting hanging shaft arranged on the outside of the rotating seat, and a limiting hook rotatably connected to the rotating support beam. When the cover shell is rotated to a horizontal position, the limiting hook can be hooked on the horizontal limiting hanging shaft. When the limiting hook is hooked on the flip cover limiting hanging shaft, the outermost side of the cover shell is higher than the innermost side of the cover shell.

[0009] Furthermore, the material storage device includes a material box vertically slidably connected to the frame, and a plurality of mutually parallel material storage chutes are arranged in the material box, the material plate can slide in the material storage chutes, and the material box can pass through to the top of the frame.

[0010] Furthermore, the feeding device includes a pushing mechanism and a pushing driving mechanism arranged on the frame, the pushing mechanism includes a guide seat, a conveyor belt slidably connected to the guide seat, a pushing head arranged at the front end of the conveyor belt, and a guide wheel, the other end of the conveyor belt is connected to the pushing driving mechanism, the conveyor belt is arranged between the guide wheel and the guide seat, the conveyor belt is bent after being transmitted by the guide wheel, the conveyor belt is an elastic structure, the guide wheel is connected to the fixed seat by an elastic connecting rod, one end of the elastic connecting rod is rotatably connected to the fixed seat, the other end of the elastic connecting rod is rotatably connected to the guide wheel, and the middle part of the elastic connecting rod is connected to the fixed seat by a spring.

[0011] Furthermore, the pushing head includes a pushing guide plate and a pushing block arranged in front of the pushing guide plate, the pushing block is provided with a pushing notch, the pushing guide plate is provided with a curved reinforcement groove, the extension direction of the reinforcement groove is parallel to the pushing direction, and the lower surface of the reinforcement groove is in contact with the conveyor belt; the two adjacent edges of the pushing guide plate are connected by chamfering transition, the pushing notch is arranged in a trapezoidal shape, and the vertical distance of the outer side is greater than the vertical distance of the inner side.

[0012] Furthermore, the material return device includes a mounting seat slidably connected to the frame, a connecting block slidably connected to the mounting seat, a double-headed push plate arranged on the connecting block, an elastic device arranged between the connecting block and the mounting seat, and a displacement detection device arranged between the connecting block and the mounting seat, the sliding direction of the connecting block is parallel to the feeding direction, and concave material return notches are provided at both ends of the double-headed push plate, and the material return notch is arranged in a trapezoidal shape and the vertical distance of the outer side is greater than the vertical distance of the inner side.

[0013] Furthermore, a feeding baffle is provided between the storage device and the feeding device, and a transition hole is provided on the feeding baffle, and a transition chute is provided in the transition hole. The material plate in the storage device can enter the cleaning mechanism through the transition chute, and the material plate in the cleaning mechanism can enter the storage device through the transition chute.

[0014] The working method of the above-mentioned plasma automatic cleaning equipment comprises the following steps:

[0015] A. Place the material plate to be cleaned in the material storage chutes of the material boxes on both sides, lift the cover shell vertically to separate the cover shell from the cleaning cavity plate, and move the return device to one side of the cleaning mechanism.

[0016] B. Move the material boxes on both sides until the material plate at the bottom of the material box is in the same plane as the transition chute and the cleaning chute;

[0017] C. Start the feeding device on the side farther from the return device, and after the material plate in the adjacent material box is completely pushed into the cleaning chute, the pushing head of the feeding device on this side is reset, and the cover shell moves down until the sealing cover is placed on the cleaning cavity plate, and the cleaning mechanism is started to start cleaning;

[0018] D. After cleaning is completed, lift the cover shell, start the material return device to push the cleaned material plate back to the material box, and then lower the material box to move the adjacent upper layer material plate to the same plane as the transition chute and the cleaning chute;

[0019] E. At the same time as step D, start the feeding device on the other side to push the material plate in the adjacent material box into the cleaning chute of the cleaning cavity tray;

[0020] F. The material return device moves to the outside of the cleaning mechanism. After the feeding device on the other side completely pushes the material plate into the cleaning tank, the feeding device on this side is reset, the cover shell presses down the sealing cover set in the cleaning cavity plate, the cleaning mechanism is started, and cleaning begins;

[0021] G. Repeat steps DF until all the material plates in the material boxes on both sides are cleaned, stop the equipment, remove the material boxes, and take out the material plates.

[0022] This technical solution is equipped with a feeding device, a storage device and a return device, which can realize automatic feeding and return of material plates, reduce manual work and improve work efficiency;

[0023] This technical solution is equipped with a feeding device and a storage device on both sides of the cleaning mechanism. The material return operation on the other side can be carried out while feeding the material. The feeding and returning operations on both sides are repeated alternately, which effectively utilizes the equipment operation time, shortens the single cleaning cycle, and improves the operation efficiency.

[0024] The conveyor belt bending setting of the feeding device of the technical solution fully utilizes the upper space of the equipment, reduces the horizontal space occupied by the equipment, and makes the equipment more compact and integrated. More equipment can be arranged in the same horizontal area, thereby improving the working efficiency.

[0025] The material return device of the technical solution can push the cleaned material plate to the storage devices on both sides respectively, which is convenient, fast and efficient;

[0026] The return material device of the technical solution is equipped with a displacement sensing device to know the working status of the double-head push plate at any time, thereby reducing damage to the material plate and the equipment and facilitating personnel operation;

[0027] The cleaning mechanism of the present technical solution is provided with a limiting device, which can limit and fix the cover shell after the cover shell is lifted, thereby providing convenience for the operator and ensuring safety in use. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 It is a schematic diagram of the main structure of a plasma automatic cleaning device provided by an embodiment of the present invention;

[0029] Figure 2 It is a three-dimensional structural schematic diagram of a plasma automatic cleaning device provided by an embodiment of the present invention;

[0030] Figure 3 It is a partial structure enlarged schematic diagram of a plasma automatic cleaning device provided by an embodiment of the present invention;

[0031] Figure 4 It is a partially enlarged schematic diagram of the three-dimensional structure of a material box of a plasma automatic cleaning device provided by an embodiment of the present invention;

[0032] Figure 5 It is a schematic diagram of the three-dimensional structure of a feeding device of a plasma automatic cleaning device provided in an embodiment of the present invention;

[0033] Figure 6 It is a three-dimensional structural schematic diagram of a pushing mechanism of a feeding device of a plasma automatic cleaning device provided by an embodiment of the present invention;

[0034] Figure 7 It is a schematic diagram of the three-dimensional structure of a pusher head of a feeding device of a plasma automatic cleaning device provided by an embodiment of the present invention;

[0035] Figure 8 The present invention provides a plasma automatic cleaning equipment feeding device of the local structure of the cleaning mechanism of the use state schematic diagram Figure 1 ;

[0036] Fig. 9 The present invention provides a plasma automatic cleaning equipment feeding device of the local structure of the cleaning mechanism of the use state schematic diagram Figure 2 ;

[0037] Fig.10It is a schematic diagram of the three-dimensional structure of a return device of a feeding device of a plasma automatic cleaning device provided in an embodiment of the present invention.

[0038] Explanation of reference numbers: 1-frame, 2-cleaning mechanism, 3-feeding device, 4-storage device, 5-returning device, 6-cover, 7-material plate, 8-cleaning cavity plate, 9-rotating seat, 10-rotating support beam, 11-cover, 12-limiting device, 13-cleaning cavity chute, 14-horizontal limit hanging shaft, 15-lid limit hanging shaft, 16-limit hook, 17-material box, 18-storage chute, 19-push mechanism, 20-push drive machine Structure, 21-guide seat, 22-transmission plate belt, 23-push head, 24-guide wheel, 25-elastic connecting rod, 26-spring, 27-push guide plate, 28-push block, 29-push notch, 30-reinforcement groove, 31-chamfer, 32-mounting seat, 33-connecting block, 34-double-head push plate, 35-elastic device, 36-displacement detection device, 37-return notch, 38-feeding baffle, 39-transition hole, 40-transition slide. DETAILED DESCRIPTION

[0039] The present invention will be further described below in conjunction with the accompanying drawings. The following embodiments are only used to more clearly illustrate the technical solution of the present invention, and cannot be used to limit the protection scope of the present invention.

[0040] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", and the like are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", and the like may explicitly or implicitly include one or more of the features. In the description of the present invention, unless otherwise specified, "multiple" means two or more.

[0041] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood by specific circumstances.

[0042] As shown in the attached drawings, a plasma automatic cleaning device comprises a frame 1, a cleaning mechanism 2 arranged on the frame, a feeding device 3 arranged outside the two sides of the cleaning mechanism, a storage device 4 arranged between the feeding device and the cleaning mechanism, a return device 5 slidably connected to the frame, and a cover shell 6 arranged on the periphery, wherein the feeding device can push a material plate 7 from the storage device to the cleaning mechanism, and the return device can push the cleaned material plate back to the storage device;

[0043] The cleaning mechanism needs to provide plasma for cleaning and needs to operate under vacuum. A feeding device and a storage device are provided on both sides of the cleaning mechanism. Both sides can feed and return materials, which has higher operating efficiency. The return device is used to push the cleaned material plate back into the storage device. The material plate to be cleaned and the cleaned material plate are placed in the same storage device, which is more convenient to collect and organize, more efficient and less costly.

[0044] The entire device can realize automatic feeding, automatic cleaning, and automatic return material storage, which greatly reduces the workload of manual labor, improves cleaning efficiency, and achieves better economic benefits.

[0045] The cleaning mechanism comprises a cleaning cavity tray 8 arranged on the machine platform, a rotating seat 9 slidably connected to the frame, a rotating support beam 10 rotatably hinged to the rotating seat, a cover shell 11 arranged on the rotating support beam, and a limit device 12 capable of limiting the rotation of the rotating support beam, the cover shell is arranged above the cleaning cavity tray, the cleaning cavity tray is provided with a cleaning cavity chute 13 capable of allowing the material plate to slide, and the cover shell can be sealed and arranged on the cleaning cavity tray;

[0046] A plasma generator is connected under the cleaning cavity tray, and the cleaning chute is used to place the material plate and provide a guide for the sliding of the material plate. Before cleaning, the cover shell is rotated to a position parallel to the cleaning cavity tray and then limited, and then the cover shell is lowered until it is sealed and pressed on the cleaning cavity tray. The pressure cover is made of metal and is heavy. It can be sealed and pressed on the cleaning cavity tray by its own gravity. A vacuum device is connected inside the cleaning cavity tray, and the material plate is plasma cleaned under a vacuum state.

[0047] The limiting device includes a horizontal limiting hanging shaft 14 arranged on the outside of the rotating seat, a lifting cover limiting hanging shaft 15 arranged on the outside of the rotating seat, and a limiting hook 16 rotatably connected to the rotating support beam. When the cover shell rotates to a horizontal position, the limiting hook can be hooked on the horizontal limiting hanging shaft. When the limiting hook is hooked on the lifting cover limiting hanging shaft, the outermost side of the cover shell is higher than the innermost side of the cover shell.

[0048] The cleaning cavity tray is generally placed horizontally, and the cooperation of the horizontal limit hanging shaft and the limit hook can limit the cover shell in a horizontal state, so that the cover shell can be sealed and pressed on the cleaning cavity tray. In order to ensure the sealing effect, a rubber ring is also provided between the cover shell and the cleaning cavity tray. In order to facilitate observation, a transparent observation window should also be provided on the outer periphery of the cover shell. If it is necessary to enter the cleaning cavity tray for operation, the cover shell needs to be opened and kept opened for a long time. At this time, after the cover shell is opened to the specified position, the limit hook can be hooked on the cover limit hanging shaft to keep the cover shell in the opened state, which is more convenient and safer to use.

[0049] The material storage device includes a material box 17 vertically slidably connected to the frame, and a plurality of mutually parallel material storage chutes 18 are arranged in the material box, and the material plate can slide in the material storage chutes, and the material box can pass through to the top of the frame;

[0050] The sliding connection between the material box and the frame can be achieved through linear motion modules such as guide pillars and guide sleeves, slide rails and slide sleeves. The driving device can be realized by device structures such as electric lead screws and synchronous belts. The material box is used to store material plates. Only one material plate is placed in each layer of the storage chute. The feeding device only pushes one layer of material plates in the storage chute to the cleaning mechanism at a time, and the material plates after cleaning are still pushed back to the original storage chute by the return device. The storage and sorting efficiency is higher and the use is more convenient.

[0051] The feeding device includes a pushing mechanism 19 and a pushing drive mechanism 20 arranged on the frame, the pushing mechanism includes a guide seat 21, a conveying plate belt 22 slidably connected to the guide seat, a pushing head 23 and a guide wheel 24 arranged at the front end of the conveying plate belt, the other end of the conveying plate belt is connected to the pushing drive mechanism, the conveying plate belt is arranged between the guide wheel and the guide seat, the conveying plate belt is bent after being conveyed by the guide wheel, the conveying plate belt is an elastic structure, the guide wheel is connected to the fixed seat through an elastic connecting rod 25, one end of the elastic connecting rod is rotatably connected to the fixed seat, the other end of the elastic connecting rod is rotatably connected to the guide wheel, and the middle part of the elastic connecting rod is connected to the fixed seat through a spring 26;

[0052] The push drive device needs to drive one end of the conveyor belt to move back and forth. The sliding connection between it and the frame can be achieved by a linear motion module matched with a slide rail and a slide sleeve. The driving force can be provided by a screw nut pair or a synchronous belt.

[0053] The conveyor belt is bent and the conveying path is non-horizontal, which effectively utilizes the other space of the equipment and improves the stroke of pushing materials. More equipment can be placed in the same horizontal space to improve work efficiency, or for the same cleaning workload, the equipment occupies less horizontal space, is more convenient to use, and has higher economic benefits.

[0054] The push head includes a push guide plate 27 and a push block 28 arranged in front of the push guide plate, the push block is provided with a push notch 29, the push guide plate is provided with a curved reinforcement groove 30, the extension direction of the reinforcement groove is parallel to the push direction, and the lower surface of the reinforcement groove is in contact with the conveyor belt; the two adjacent edges of the push guide plate are transitionally connected by chamfers 31, the push notch is arranged in a trapezoidal shape, and the vertical distance of the outer side is greater than the vertical distance of the inner side;

[0055] The push head is used to push the material plate. When in use, the material plate needs to be pushed from the material box to the cleaning cavity. The trapezoidal setting of the push notch can ensure the docking tolerance when the push block pushes the material. The front end opening of the card notch is larger, and the possible contact distance with the material is larger, which can reduce the probability of deviating from the material and being empty when pushing the material. In addition, the trapezoidal setting can automatically guide the material to the rear end of the notch when pushing the material. The chamfered transition around the push guide plate can make the width of the front and rear ends of the push guide plate smaller than the width in the middle, which is more convenient to dock with the material trough in the material box, and more smoothly insert or extract from the material trough to reduce jamming. Similar rounded corner structures can also meet the needs;

[0056] The conveyor belt is clamped between the guide wheel and the guide seat. The guide wheel plays a guiding role, which can ensure the stability of the conveying path shape of the entire conveyor belt and the smoothness of the conveying of the conveyor belt.

[0057] The conveyor belt is made of materials and structures similar to "tape measure". Its cross section is arc-shaped in its natural state, and it has a certain structural strength, which can meet the needs of the equipment for pushing materials. It can ensure that the tape measure will not be deformed by local bulges under the external force in the process of pushing materials. At the same time, it has a certain elasticity. After overcoming its own structural strength under the action of external force, it can bend as needed at all places, and can return to its original state in time without external force, maintaining the original structural strength.

[0058] After the conveyor belt is bent by the guide wheel, a horizontal conveying section and an inclined conveying section are formed. In order to ensure the stability of the shape and structural strength of the conveyor belt in the horizontal conveying section, the top surface of the guide seat, the outer periphery of the guide wheel and the reinforcement groove should be set in close contact with the conveyor belt to avoid deformation of the conveyor belt during the conveying of this section, which affects the conveying. When the conveyor belt is conveyed in the inclined conveying section, it can maintain an overall straight shape and an arc-shaped cross-section under the action of its own elastic force, ensuring a certain structural strength to meet the thrust requirements of the conveying;

[0059] The guide wheel can overcome the structural strength of the conveyor belt itself, causing it to bend and deform. However, in order to ensure that the conveyor belt can smoothly transmit the thrust during the conveying process, the conveyor belt must always be in a taut state and cannot bulge or deform. The elastic connection between the guide wheel and the guide seat can ensure that the conveyor belt is always in a taut state after being squeezed and guided by the guide wheel, which can ensure the smooth transmission of the pushing thrust and ensure working stability.

[0060] The material return device comprises a mounting seat 32 slidably connected to the frame, a connecting block 33 slidably connected to the mounting seat, a double-headed push plate 34 arranged on the connecting block, an elastic device 35 arranged between the connecting block and the mounting seat, and a displacement detection device 36 arranged between the connecting block and the mounting seat. The sliding direction of the connecting block is parallel to the feeding direction. Both ends of the double-headed push plate are provided with concave material return notches 37. The material return notches are arranged in a trapezoidal shape, and the vertical distance of the outer side is greater than the vertical distance of the inner side.

[0061] The double-head push plate is used for bidirectional pushing of the material plate, pushing the material plate from the cleaning chute to the storage chute. When the material plate is pushed normally, the friction between the material plate and the cleaning chute is a fixed value or within a certain range, and the corresponding expansion and contraction amount of the elastic device is a fixed value or within a certain range. The fixed value or range is marked as a normal working state. The displacement detection device senses that the movement of the connection block compared to the mounting seat is within the range, which indicates that the push head is in a normal pushing state.

[0062] If the material plate and the slide are stuck, the resistance between the material plate and the slide is large, the expansion and contraction of the elastic device is large, which is greater than the expansion and contraction during normal pushing. The displacement of the connection block sensed by the corresponding displacement detection device is also greater than the range corresponding to the normal working state. The displacement detection device is often connected to the control panel and display of the equipment, and can timely feedback the movement of the connection block to the operator, so that the operator can always understand the pushing state, promptly know that the pushing is stuck, and respond to the next operation in time;

[0063] The elastic device adopts spring, which is easy to install and use. It can reset the double-head push plate in time when the equipment is idle, which is convenient to use;

[0064] The displacement sensor is a common standard electronic component and should include a sensing piece arranged on the connecting block and a displacement sensor arranged on the mounting base; the displacement sensor is used to sense the displacement of the connecting block and use this as a basis to determine the pushing state of the pushing head; it is convenient for the operator to know the operating state of the equipment in time, make timely adjustments, and ensure safe use.

[0065] A feeding baffle 38 is further provided between the storage device and the feeding device, and a transition hole 39 is provided on the feeding baffle, and a transition chute 40 is provided in the transition hole, so that the material plate in the storage device can enter the cleaning mechanism through the transition chute, and the material plate in the cleaning mechanism can enter the storage device through the transition chute;

[0066] The end of the material box is placed against the feeding baffle to prevent the material box from moving when the feeding device pushes the material plate. The transition chute should be on the same level as the pushing notch, storage chute, cleaning chute and return notch. The material plate always moves in the chute, supported by gravity. The feeding device and return device only provide horizontal thrust.

[0067] The working method of the above-mentioned plasma automatic cleaning equipment comprises the following steps:

[0068] Place the material plate to be cleaned in the material storage chutes of the material boxes on both sides, vertically lift the cover shell to separate the cover shell from the cleaning cavity plate, and move the material return device to one side outside the cleaning mechanism;

[0069] Move the material boxes on both sides until the material plate at the bottom of the material box is in the same plane as the transition chute and the cleaning chute;

[0070] The feeding device on the side farther from the return device is started, and after the material plate in the adjacent material box is completely pushed into the cleaning chute, the pushing head of the feeding device on this side is reset, and the cover shell moves down until the sealing cover is placed on the cleaning cavity plate, and the cleaning mechanism is started to start cleaning;

[0071] After cleaning is completed, the cover shell is lifted, and the material return device is started to push the cleaned material plate back to the material box, and then the material box is lowered to move the adjacent upper layer material plate to the same plane as the transition chute and the cleaning chute;

[0072] At the same time as step D, the feeding device on the other side is started to push the material plate in the adjacent material box into the cleaning chute of the cleaning cavity tray;

[0073] The material return device moves to the outside of the cleaning mechanism, and after the feeding device on the other side completely pushes the material plate into the cleaning tank, the feeding device on this side is reset, the cover shell presses down the sealing cover set in the cleaning cavity plate, the cleaning mechanism is started, and cleaning begins;

[0074] Repeat steps DF until all the material plates in the material boxes on both sides are cleaned, stop the equipment, remove the material boxes, and take out the material plates;

[0075] The other side mentioned in each step is for the previous step. For the convenience of explanation, this method is to clean from the bottom material plate of the material box, but those skilled in the art can easily think that this method can also be applied to cleaning from the top material plate of the material box. The lowering material box in the corresponding step can be replaced by raising the material box.

[0076] The feeding operation on one side and the returning operation on the other side are carried out simultaneously, and the feeding operation and the returning operation on both sides are carried out alternately, which greatly improves the operation efficiency and reduces the idle waiting time of the equipment.

[0077] The above is only a preferred embodiment of the present invention. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the technical principles of the present invention. These improvements and modifications should also be regarded as the scope of protection of the present invention.

Claims

1. A plasma automatic cleaning device, characterized in that: The invention comprises a frame (1), a cleaning mechanism (2) arranged on the frame, a feeding device (3) arranged outside the two sides of the cleaning mechanism, a storage device (4) arranged between the feeding device and the cleaning mechanism, a return device (5) slidably connected to the frame, and a cover (6) arranged on the outer periphery, wherein the feeding device can push a material plate (7) from the storage device to the cleaning mechanism, and the return device can push the cleaned material plate back to the storage device; The cleaning mechanism comprises a cleaning cavity tray (8) arranged on the machine platform, a rotating seat (9) slidably connected to the frame, a rotating support beam (10) rotatably hinged to the rotating seat, a cover shell (11) arranged on the rotating support beam, and a limit device (12) capable of limiting the rotation of the rotating support beam, the cover shell is arranged above the cleaning cavity tray, the cleaning cavity tray is provided with a cleaning cavity slide groove (13) capable of allowing the material plate to slide, and the cover shell can be sealed and arranged on the cleaning cavity tray; The feeding device comprises a pushing mechanism (19) and a pushing drive mechanism (20) arranged on a frame, the pushing mechanism comprising a guide seat (21), a conveyor belt (22) slidably connected to the guide seat, a pushing head (23) arranged at the front end of the conveyor belt, and a guide wheel (24), the other end of the conveyor belt is connected to the pushing drive mechanism, the conveyor belt is arranged between the guide wheel and the guide seat, the conveyor belt is bent after being conveyed by the guide wheel, the conveyor belt is an elastic structure, the guide wheel is connected to the fixed seat via an elastic connecting rod (25), one end of the elastic connecting rod is rotatably connected to the fixed seat, the other end of the elastic connecting rod is rotatably connected to the guide wheel, and the middle part of the elastic connecting rod is connected to the fixed seat via a spring (26); The push head comprises a push guide plate (27) and a push block (28) arranged in front of the push guide plate, the push block is provided with a push notch (29), the push guide plate is provided with a curved reinforcement groove (30), the extension direction of the reinforcement groove is parallel to the pushing direction, and the lower surface of the reinforcement groove is in contact with the conveyor belt; the two adjacent edges of the push guide plate are transitionally connected by chamfering (31), the push notch is arranged in a trapezoidal shape, and the vertical distance of the outer side is greater than the vertical distance of the inner side.

2. The plasma automatic cleaning equipment according to claim 1, characterized in that: The limiting device comprises a horizontal limiting hanging shaft (14) arranged on the outside of the rotating seat, a lifting cover limiting hanging shaft (15) arranged on the outside of the rotating seat, and a limiting hook (16) rotatably connected to the rotating support beam; when the cover shell is rotated to a horizontal position, the limiting hook can be hooked on the horizontal limiting hanging shaft; when the limiting hook is hooked on the lifting cover limiting hanging shaft, the outermost side of the cover shell is higher than the innermost side of the cover shell.

3. The plasma automatic cleaning equipment according to claim 1, characterized in that: The material storage device comprises a material box (17) vertically slidably connected to the frame, wherein a plurality of mutually parallel material storage chutes (18) are arranged in the material box, wherein a material plate can slide in the material storage chutes, and the material box can pass out to the top of the frame.

4. The plasma automatic cleaning equipment according to claim 1, characterized in that: The material return device comprises a mounting seat (32) slidably connected to the frame, a connecting block (33) slidably connected to the mounting seat, a double-headed push plate (34) arranged on the connecting block, an elastic device (35) arranged between the connecting block and the mounting seat, and a displacement detection device (36) arranged between the connecting block and the mounting seat, wherein the sliding direction of the connecting block is parallel to the feeding direction, and concave material return notches (37) are arranged at both ends of the double-headed push plate, wherein the material return notches are arranged in a trapezoidal shape and the vertical distance of the outer side is greater than the vertical distance of the inner side.

5. The plasma automatic cleaning equipment according to claim 1, characterized in that: A feeding baffle (38) is also provided between the material storage device and the feeding device, the feeding baffle is provided with a transition hole (39), a transition chute (40) is provided in the transition hole, the material plate in the material storage device can enter the cleaning mechanism through the transition chute, and the material plate in the cleaning mechanism can enter the material storage device through the transition chute.

6. A plasma automatic cleaning device according to any one of claims 1 to 5, wherein the working method thereof comprises the following steps: A. Place the material plate to be cleaned in the material storage chutes of the material boxes on both sides, lift the cover shell vertically to separate the cover shell from the cleaning cavity plate, and move the return device to one side of the cleaning mechanism. B. Move the material boxes on both sides until the material plate at the bottom of the material box is in the same plane as the transition chute and the cleaning chute; C. Start the feeding device on the side farther from the return device, and after the material plate in the adjacent material box is completely pushed into the cleaning chute, the pushing head of the feeding device on this side is reset, and the cover shell moves down until the sealing cover is placed on the cleaning cavity plate, and the cleaning mechanism is started to start cleaning; D. After cleaning is completed, lift the cover shell, start the material return device to push the cleaned material plate back to the material box, and then lower the material box to move the adjacent upper layer material plate to the same plane as the transition chute and the cleaning chute; E. At the same time as step D, start the feeding device on the other side to push the material plate in the adjacent material box into the cleaning chute of the cleaning cavity tray; F. The material return device moves to the outside of the cleaning mechanism. After the feeding device on the other side completely pushes the material plate into the cleaning tank, the feeding device on this side is reset, the cover shell presses down the sealing cover set in the cleaning cavity plate, the cleaning mechanism is started, and cleaning begins; G. Repeat steps DF until all the material plates in the material boxes on both sides are cleaned, stop the equipment, remove the material boxes, and take out the material plates.

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