A system for cleaning sediment after chemical cleaning of thermal equipment and its use method

Abstract

The present invention discloses a system for cleaning sediment after chemical cleaning of thermal equipment and a method for using the system. The system has drainage and sediment cleaning functions. The positioning pipe in the system enters the interior of the header of the thermal equipment through the connecting pipe of the header under the guidance of the guide pipe, and the positioning pipe is connected to the sediment cleaning system by a flexible joint. After the residual water in the header is filtered after chemical cleaning, it is discharged by a self-priming pump. After the residual water in the header is discharged, the sediment after chemical cleaning is observed by an endoscope, and after the sediment position is determined, the positioning pipe is moved to the sediment. The system is provided with a gas-solid separator, a filter, a buffer tank, a dryer, and a vacuum pump. The sediment after chemical cleaning in the header is sucked into the gas-solid separator by the suction provided by the vacuum pump, and the sediment is discharged after separation by the separator. The system of the present invention is reliable and easy to implement, and solves the problem that the sediment in the header after chemical cleaning of thermal equipment is difficult to clean.

Description

Technical Field

[0001] The invention belongs to the technical field of chemical cleaning, and in particular relates to a system for cleaning sediment after chemical cleaning of thermal equipment and a method for using the system. Background Art

[0002] Chemical cleaning is a common method for removing scale deposits inside the heat exchange tubes of thermal equipment. Chemical cleaning uses the chemical reaction between the effective ingredients of the cleaning agent and the scale deposits in the heat exchange tubes to remove scale deposits and corrosion products from the heat exchange tubes. The chemical cleaning scale dissolving mechanism is composed of dissolution and stripping. The stripped scale layer is generally difficult to be dissolved again by the cleaning agent, and the stripped scale layer is generally in the form of powder. When the system flow rate is high enough, the scale layer stripped during chemical cleaning will be taken out of the cleaning system, but the chemical cleaning system will have a blind spot. In the blind spot, the cleaning solution is close to a static state, and the stripped scale layer is easy to accumulate in the blind spot to form cleaning residues. The end of the header of the thermal equipment being cleaned is often a large blind spot, and there will be a large amount of cleaning residues at the end of the header. If the residue is not effectively cleaned after cleaning, it will easily cause the water quality of the equipment to be unqualified after the equipment is started, and the cleaning residue will cause the heat exchange tube to be blocked and cause a pipe explosion accident. There are the following difficulties in cleaning the residue after chemical cleaning: after chemical cleaning, due to the special structure of the manifold or the manifold drain pipe is not at the lowest point, there will be residual water in the manifold. The presence of water in the manifold makes it difficult to observe and clean the residue. Generally, the residual water in the manifold is drained by cutting the manifold connecting pipe or hand hole using the siphon method, but the siphon method has a slow drainage speed and cannot completely drain the water in the manifold; cleaning the residue in the manifold usually requires cutting the manifold head for cleaning. Due to the thick wall of the manifold head, welding and heat treatment are required when the head is restored. The welding and heat treatment of thick-walled pipes are difficult and risky, and improper heat treatment can easily cause damage to the head.

[0003] Therefore, it is very necessary to develop a technology for cleaning sediment after chemical cleaning of thermal equipment that is easy to operate, can quickly drain residual water in the header, and does not require cutting the header head. Summary of the invention

[0004] In order to solve the problems existing in the above-mentioned prior art, the purpose of the present invention is to provide a system and a method for using the sediment cleaning after chemical cleaning of thermal equipment. The system is reliable and easy to implement, and solves the problem of sediment cleaning after chemical cleaning of thermal equipment.

[0005] The present invention adopts the following technical solution:

[0006] A system for cleaning sediment after chemical cleaning of thermal equipment, the system comprising a drainage subsystem and a sediment removal subsystem, a positioning pipe 2 enters a header from a connecting pipe of a thermal equipment header under the guidance of a flow guide pipe 3, a flexible joint 4 is used to divide the outlet of the positioning pipe 2 into two paths respectively connected to the drainage subsystem and the sediment removal subsystem, the drainage subsystem comprising a first filter 6 arranged on the drainage pipe, the first filter 6 is provided with a front isolation valve 5 and a rear isolation valve 7, the rear isolation valve 7 is connected to the inlet of a self-priming pump 8; the sediment removal subsystem comprises a first gas-solid separator 11 and a second gas-solid separator 16 arranged in parallel on the sediment removal pipe, the first gas-solid separator 11 is provided with a first front isolation valve 9 and a first rear isolation valve 13, the top of the first gas-solid separator 11 is provided with a first gas-solid separator 16, and the first gas-solid separator 11 is provided with a first front isolation valve 9 and a first rear isolation valve 13. The first gas valve 10 and the first solid valve 12 are respectively arranged at the top and the bottom, the second gas-solid separator 16 is provided with a second front isolation valve 14 and a second rear isolation valve 18, the second gas valve 15 and the second solid valve 17 are respectively arranged at the top and the bottom of the second gas-solid separator 16, the outlets of the first rear isolation valve 13 and the second rear isolation valve 18 are connected to the second filter 19, the second filter 19 is connected to the filter rear isolation valve 20, the filter rear isolation valve 20 is connected to the dryer 21, the dryer 21 is connected to the dryer rear isolation valve 22, the dryer rear isolation valve 22 is connected to the vacuum buffer tank 23, the vacuum buffer tank 23 is connected to the vacuum buffer tank rear isolation valve 24, and the vacuum buffer tank rear isolation valve 24 is connected to the inlet of the vacuum pump 25.

[0007] Preferably, the positioning tube 2 is a metal hose, and the flow guide tube 3, the drainage tube and the sediment removal tube are made of plastic or metal. The positioning tube is a metal hose, which can be bent from the flow guide tube to penetrate into the header, and can maintain a certain strength, so that it is easy to move toward the sediment when in use. The flow guide tube 3 guides the positioning tube 2 in a direction to prevent the positioning tube from bending or partially rotating when entering the header.

[0008] Preferably, the first filter 6 and the second filter 19 are cartridge filters, and the pore size of the filter cartridge is less than 2 mm, so as to prevent powdery sediment with a smaller diameter from entering the self-priming pump or vacuum pump. Preferably, the first gas-solid separator 11 and the second gas-solid separator 16 are provided with observation holes to facilitate observation of the sediment in the gas-solid separator. The gas-solid mixture enters from the middle of the separator, and the gas after gas-solid separation is discharged from the top.

[0009] Preferably, the self-priming pump 8 is made of plastic, the suction range of the self-priming pump 8 is not less than 3 meters, the vacuum pump 25 is a single vacuum pump or a vacuum pump group, and the suction rate of the vacuum pump 25 is 50L / s to 1500L / s, which can provide sufficient power for clearing residual water and residue in the header, which is conducive to the rapid discharge of residual water and sediment.

[0010] The method for using the system for cleaning the sediment after chemical cleaning of thermal equipment is as follows: first, the residual water in the header box after chemical cleaning of the thermal equipment is discharged, the positioning pipe 2 is extended into the header box of the thermal equipment through the guide pipe 3, the positioning pipe 2 and the flexible joint 4 are connected, the first front isolation valve 9 and the second front isolation valve 14 are closed, the front isolation valve 5 and the rear isolation valve 7 are opened, and the self-priming pump 8 is started; after the residual water in the header box is drained, the self-priming pump 8 is stopped, the front isolation valve 5 is closed, and the endoscope is extended into the header box to observe the position of the sediment 1 after cleaning. After the position is determined, the positioning pipe is moved above the sediment 1 after cleaning, and the second front isolation valve 14, the second rear isolation valve 18, the first gas valve 10, the second gas valve 11, the second gas valve 12, the second gas valve 13, the second gas valve 14, the second gas valve 15, the second gas valve 16, the second gas valve 17, the first gas valve 18, the second gas valve 19, the second gas valve 20, the second gas valve 21, the second gas valve 22, the second gas valve 23, the second gas valve 24, the second gas valve 25, the first gas valve 26, the second gas valve 27, the second gas valve 28, the first gas valve 29, the second gas valve 30, the second gas valve 31, the second gas valve 32, the first gas valve 33, the second gas valve 34, the second gas valve 35, the first gas valve 36, the second gas valve 37, the first gas valve 38, the second gas valve 39, the first gas valve 30, the second gas valve 31, the second gas valve 31, the second gas valve 32, the first gas valve 33, the second gas valve 34, the second gas valve 35, the A solid valve 12, a second gas valve 15, a second solid valve 17 and a vacuum buffer tank rear isolation valve 24, open the first front isolation valve 9, the first rear isolation valve 13, the filter rear isolation valve 20 and the dryer rear isolation valve 22, start the vacuum pump 25, and adjust the opening of the vacuum buffer tank rear isolation valve 24 to allow the sediment to be sucked into the first gas-solid separator 11; when the sediment needs to be discharged, it is necessary to switch the slag removal circuit: open the second front isolation valve 14 and the second rear isolation valve 18, close the first front isolation valve 9 and the first rear isolation valve 13, open the first gas valve 10 and the first solid valve 12; after the slag removal is completed, close the vacuum buffer tank rear isolation valve 24 and stop the vacuum pump 25.

[0011] Compared with the prior art, the present invention has the following advantages:

[0012] 1) The system is simple, easy to install and easy to implement.

[0013] 2) Using a self-priming pump as the drainage power has high drainage efficiency.

[0014] 3) There is no need to cut off the hand hole of the thermal equipment header, but only the small-diameter connecting pipe on the thermal equipment header needs to be cut off. After cleaning the sediment, the recovery cycle of the thermal equipment system is short. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 Schematic diagram of the system of the present invention. DETAILED DESCRIPTION

[0016] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0017] like Figure 1As shown, a system for cleaning sediment after chemical cleaning of thermal equipment and a method for using the system, the system has the functions of drainage and sediment cleaning; first, cut off the connecting pipe at the appropriate position of the thermal equipment header to be cleaned; put the guide pipe 3 from the connecting pipe into the header; extend the positioning pipe 2 into the thermal equipment header through the guide pipe 3, connect the positioning pipe 2 and the flexible joint 4, close the first front isolation valve 9 and the second front isolation valve 14, open the front isolation valve 5 and the rear isolation valve 7, and start the self-priming pump 8; after the residual water in the header is drained, stop the self-priming pump 8, close the front isolation valve 5, extend the endoscope into the header to observe the position of the sediment 1 after cleaning, and after determining the position, move the positioning pipe to above the sediment 1 after cleaning, close the second front isolation valve 14, the second rear isolation valve 18, The first gas valve 10, the first solid valve 12, the second gas valve 15, the second solid valve 17 and the vacuum buffer tank rear isolation valve 24 are opened, the first front isolation valve 9, the first rear isolation valve 13, the filter rear isolation valve 20 and the dryer rear isolation valve 22 are opened, and after the vacuum pump 25 is started, the opening of the vacuum buffer tank rear isolation valve 24 is adjusted to allow the sediment to be sucked into the first gas-solid separator 11; when the sediment needs to be discharged, the slag removal circuit needs to be switched: the second front isolation valve 14 and the second rear isolation valve 18 are opened, the first front isolation valve 9 and the first rear isolation valve 13 are closed, and the first gas valve 10 and the first solid valve 12 are opened; after the slag removal is completed, the vacuum buffer tank rear isolation valve 24 is closed and the vacuum pump 25 is stopped to complete the sediment cleaning after chemical cleaning of the thermal equipment.

[0018] The above examples are illustrative of the present invention, but are not intended to limit the present invention. Any simple modifications, equivalent changes and modifications made to the above examples by any person skilled in the art without creative work are within the protection scope of the technical solution of the present invention.

Claims

1. A system for cleaning sediment after chemical cleaning of thermal equipment, characterized in that: The system comprises a drainage subsystem and a sediment removal subsystem. A positioning pipe (2) enters a header from a connecting pipe of a thermal equipment header under the guidance of a flow guide pipe (3). A flexible joint (4) is used to divide the outlet of the positioning pipe (2) into two paths, which are respectively connected to the drainage subsystem and the sediment removal subsystem. The drainage subsystem comprises a first filter (6) arranged on the drainage pipe. The first filter (6) is provided with a front isolation valve (5) and a rear isolation valve (7). The rear isolation valve (7) is connected to the inlet of a self-priming pump (8). The sediment removal subsystem comprises a first gas-solid separator (11) and a second gas-solid separator (16) which are arranged in parallel on the sediment removal pipe. The first gas-solid separator (11) is provided with a first front isolation valve (9) and a first rear isolation valve (13). The top and bottom of the first gas-solid separator (11) are respectively provided with a first gas valve (1 0), a first solid valve (12), a second gas-solid separator (16) is provided with a second front isolation valve (14) and a second rear isolation valve (18), a second gas valve (15) and a second solid valve (17) are respectively provided at the top and the bottom of the second gas-solid separator (16), the outlets of the first rear isolation valve (13) and the second rear isolation valve (18) are both connected to a second filter (19), the second filter (19) is connected to a filter rear isolation valve (20), the filter rear isolation valve (20) is connected to a dryer (21), the dryer (21) is connected to a dryer rear isolation valve (22), the dryer rear isolation valve (22) is connected to a vacuum buffer tank (23), the vacuum buffer tank (23) is connected to a vacuum buffer tank rear isolation valve (24), and the vacuum buffer tank rear isolation valve (24) is connected to the inlet of a vacuum pump (25); The positioning pipe (2) is a metal hose, and the flow guide pipe (3), the drainage pipe and the sediment removal pipe are made of plastic or metal. The flow guide pipe (3) guides the positioning pipe (2) to prevent the positioning pipe from bending or partially rotating when entering the header. The first filter (6) and the second filter (19) are cartridge filters, and the pore size of the filter cartridge is less than 2 mm.

2. A system for cleaning sediment after chemical cleaning of thermal equipment according to claim 1, characterized in that: The first gas-solid separator (11) and the second gas-solid separator (16) are provided with observation holes, the gas-solid mixture enters from the middle of the separator, and the gas after gas-solid separation is discharged from the top.

3. A system for cleaning sediment after chemical cleaning of thermal equipment according to claim 1, characterized in that: The self-priming pump (8) is made of plastic, the suction range of the self-priming pump (8) is not less than 3 meters, the vacuum pump (25) is a single vacuum pump or a vacuum pump group, and the suction rate of the vacuum pump (25) is 50L / s to 1500L / s.

4. A method for using a system for cleaning sediment after chemical cleaning of thermal equipment according to any one of claims 1 to 3, characterized in that: First, drain the residual water in the header after chemical cleaning of the thermal equipment, extend the positioning tube (2) into the header of the thermal equipment through the guide tube (3), connect the positioning tube (2) and the flexible joint (4), close the first front isolation valve (9) and the second front isolation valve (14), open the front isolation valve (5) and the rear isolation valve (7), and start the self-priming pump (8); after the residual water in the header is drained, stop the self-priming pump (8), close the front isolation valve (5), extend the endoscope into the header to observe the position of the sediment (1) after cleaning, and after determining the position, move the positioning tube to the top of the sediment (1) after cleaning, close the second front isolation valve (14), the second rear isolation valve (18), the first gas valve (10), the first solid valve (12), and the second gas valve (15), the second solid valve (17) and the vacuum buffer tank rear isolation valve (24), open the first front isolation valve (9), the first rear isolation valve (13), the filter rear isolation valve (20) and the dryer rear isolation valve (22), start the vacuum pump (25), adjust the opening of the vacuum buffer tank rear isolation valve (24) to allow the sediment to be sucked into the first gas-solid separator (11); when the sediment needs to be discharged, it is necessary to switch the slag removal circuit: open the second front isolation valve (14) and the second rear isolation valve (18), close the first front isolation valve (9) and the first rear isolation valve (13), open the first gas valve (10) and the first solid valve (12); after the slag removal is completed, close the vacuum buffer tank rear isolation valve (24) and stop the vacuum pump (25).

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