A single crystal silicon pretreatment device

Abstract

The present invention relates to the field of industrial technology, specifically a single crystal silicon pretreatment device, comprising a flat plate, a support plate fixedly mounted on one side of the flat plate; a spray plate fixedly mounted on the top of the support plate; a water tank fixedly mounted on the top of the spray plate, a water inlet pipe provided on the water tank; a first motor fixedly mounted on the flat plate; a second motor fixedly mounted on the end of the rotating shaft of the first motor; a third motor fixedly mounted on the end of the rotating shaft of the second motor; a receiving panel fixedly mounted on the end of the rotating shaft of the third motor, the receiving panel being a continuously bent structure, comprising a first vertical plate, a second horizontal plate and a third vertical plate, the third vertical plate being located at the bottom; a protective mechanism installed on the receiving panel. The present invention receives, cleans and outputs silicon wafers, and completes the rinsing of pretreated silicon wafers on the basis of connecting the original conveyor belt feeding, thereby achieving efficient and low-cost rinsing of the silicon wafers, while greatly shortening the transfer distance and cost.

Description

Technical Field

[0001] The present invention relates to the field of industrial technology, in particular to a single crystal silicon pretreatment device. Background Art

[0002] Monocrystalline silicon pretreatment requires slitting, and the silicon wafers need to be rinsed after slitting. Currently, the rinsing step is separate and requires an independent rinsing device, which is relatively costly. In addition, the independent installation of equipment increases the transfer journey and cost.

[0003] If the pre-treatment rinsing step can be linked to the transfer device, then the cost can be reduced and the efficiency can be improved. Summary of the Invention

[0004] The object of the present invention is to provide a single crystal silicon pretreatment device to solve the problem in the above background technology that the pretreatment flushing is an independent step, which requires high investment cost and increases the transfer distance and cost.

[0005] To achieve the above object, the present invention provides the following technical solutions:

[0006] A single crystal silicon pretreatment device comprises a flat plate, with a support plate fixedly mounted on one side of the flat plate;

[0007] A spray plate is fixedly mounted on the top of the support plate;

[0008] A water tank is fixedly installed on the top of the spray plate, and a water inlet pipe is provided on the water tank;

[0009] A first motor is fixedly mounted on the flat plate;

[0010] a second motor, wherein the second motor is fixedly mounted on the end of the rotating shaft of the first motor;

[0011] a third motor, wherein the third motor is fixedly mounted on the end of the rotating shaft of the second motor;

[0012] A receiving panel is fixedly mounted on the end of the rotating shaft of the third motor. The receiving panel is a continuously bent structure and includes a first vertical plate, a second horizontal plate, and a third vertical plate, with the third vertical plate being located at the bottom.

[0013] A protective mechanism is installed on the receiving panel.

[0014] As a further description of the above technical solution:

[0015] The receiving panel is provided with a slide groove, a limit block, a through groove, a push block and a cylinder. A slide groove is provided on the side of the third vertical plate of the receiving panel. The limit block is fixedly installed on the middle position of the slide groove. A through groove is provided on the second horizontal plate. The push block is fitted in the through groove. The cylinder is fixedly installed on the bottom of the second horizontal plate. The inner rod of the cylinder is fixedly connected to the push block.

[0016] As a further description of the above technical solution:

[0017] The through slot is opened close to the first vertical plate.

[0018] As a further description of the above technical solution:

[0019] The protection mechanism includes a fourth motor, a first screw, a second screw, a slider and a protection rod. The fourth motor is fixedly installed on one end of the third vertical plate. The first screw and the second screw are arranged in the slide groove. The threads of the first screw and the second screw are arranged in opposite directions. The ends of the first screw and the second screw are fixedly connected. The first screw is fixedly connected to the rotating shaft of the fourth motor. The first screw and the second screw are both threadedly sleeved with sliders. The slider is slidably connected to the slide groove, and the protection rod is integrally connected to the slider.

[0020] As a further description of the above technical solution:

[0021] A clamping groove is provided between the sliding block and the protective rod, and the connection between the second horizontal plate and the third vertical plate is clamped in the clamping groove.

[0022] As a further description of the above technical solution:

[0023] The connection point between the first screw and the second screw corresponds to the position of the limiting block.

[0024] As a further description of the above technical solution:

[0025] The first motor and the second motor are arranged vertically, the second motor and the third motor are arranged horizontally, the receiving panel is located above the third motor, and the rotating shaft of the third motor is fixedly connected to the second horizontal plate of the receiving panel.

[0026] As a further description of the above technical solution:

[0027] The surfaces of the protection rod opposite to the receiving panel are both covered with rubber sheets.

[0028] Compared with the prior art, the present invention provides a single crystal silicon pretreatment device with the following beneficial effects:

[0029] 1. In the present invention, the pre-treatment device is designed at the position where the transmission conveyor belt turns. The pre-treatment device plays the role of receiving, cleaning and outputting silicon wafers. On the basis of connecting with the original conveyor belt feeding, the pre-treated silicon wafers are rinsed, thereby achieving efficient and low-cost rinsing of silicon wafers, while greatly shortening the transfer distance and cost.

[0030] 2. In the present invention, multiple motors are used to achieve multi-directional rotation drive, allowing the silicon wafer to be washed vertically. During the vertical washing, there is a slight shaking, which can achieve comprehensive washing of the silicon wafer;

[0031] 3. In the present invention, a protective mechanism is installed on the receiving panel, and the displacement change of the protective rod is used to achieve flushing protection of the silicon wafer and unobstructed material feeding. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 It is a schematic diagram of a three-dimensional structure of the present invention;

[0033] Figure 2 This is a schematic diagram of the three-dimensional structure of the present invention;

[0034] Figure 3 This is a schematic diagram of the installation structure of the first motor, the second motor and the third motor of the present invention;

[0035] Figure 4 This is a schematic diagram of the assembly structure of the first screw and the second screw of the present invention;

[0036] Figure 5 This is a schematic diagram of the installation structure of the slider of the present invention;

[0037] Figure 6 This is a schematic diagram of the chute structure of the present invention.

[0038] Legend:

[0039] 1. Flat plate; 2. Support plate; 3. Spray plate; 4. Water tank; 5. First motor; 6. Second motor; 7. Third motor; 8. Support panel; 801. Slide; 802. Limit block; 803. Through slot; 804. Push block; 805. Cylinder; 9. Protective mechanism; 901. Fourth motor; 902. First screw; 903. Second screw; 904. Slider; 905. Protective rod. DETAILED DESCRIPTION

[0040] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0041] Example:

[0042] See also Figures 1-6 , the present invention provides a single crystal silicon pretreatment device, comprising a flat plate 1, a support plate 2 is fixedly mounted on one side of the flat plate 1;

[0043] The spray plate 3 is fixedly installed on the top of the support plate 2;

[0044] Water tank 4, the water tank 4 is fixedly installed on the top of the spray plate 3, and a water inlet pipe is set on the water tank 4;

[0045] A first motor 5 is fixedly mounted on the flat plate 1;

[0046] A second motor 6 is fixedly mounted on the end of the rotating shaft of the first motor 5;

[0047] A third motor 7 is fixedly mounted on the end of the rotating shaft of the second motor 6;

[0048] The receiving panel 8 is fixedly mounted on the end of the rotating shaft of the third motor 7. The receiving panel 8 is a continuously bent structure. The receiving panel 8 includes a first vertical plate, a second horizontal plate and a third vertical plate. The third vertical plate is located at the bottom.

[0049] The protective mechanism 9 is installed on the receiving panel 8.

[0050] Specifically, such as Figure 2 、 Figure 4 and Figure 6 As shown, the receiving panel 8 is provided with a slide groove 801, a limit block 802, a through groove 803, a push block 804 and a cylinder 805. The slide groove 801 is provided on the side of the third vertical plate of the receiving panel 8, and the third vertical plate is located in the middle position of the slide groove 801 to fix the limit block 802. The through groove 803 is provided on the second horizontal plate, and the push block 804 is fitted in the through groove 803. The cylinder 805 is fixedly installed at the bottom of the second horizontal plate, and the inner rod of the cylinder 805 is fixedly connected to the push block 804 to facilitate pushing the silicon wafer out.

[0051] Specifically, such as Figure 6 As shown, the through slot 803 is opened close to the first vertical plate, so that the push block 804 can fully contact the silicon wafer.

[0052] Specifically, such as Figure 3 、 Figure 4 and Figure 5As shown, the protective mechanism 9 includes a fourth motor 901, a first screw 902, a second screw 903, a slider 904 and a protective rod 905. The fourth motor 901 is fixedly installed at one end of the third vertical plate. The first screw 902 and the second screw 903 are arranged in the slide groove 801. The threads of the first screw 902 and the second screw 903 are arranged in opposite directions. The ends of the first screw 902 and the second screw 903 are fixedly connected. The first screw 902 is fixedly connected to the rotating shaft of the fourth motor 901. The slider 904 is threadedly mounted on the first screw 902 and the second screw 903. The slider 904 is slidably connected to the slide groove 801. The protective rod 905 is integrally connected to the slider 904. The protective rod 905 moves to the position where the silicon wafer is located to prevent the erected silicon wafer from falling, thereby playing a blocking and protective role.

[0053] Specifically, a slot is provided between the slider 904 and the protection rod 905 , and the connection between the second horizontal plate and the third vertical plate is stuck in the slot, thereby increasing the guiding stability of the movement of the protection rod 905 .

[0054] Specifically, the connection between the first screw rod 902 and the second screw rod 903 corresponds to the position of the limit block 802 to prevent the slider 904 from moving and contacting.

[0055] Specifically, such as Figure 3 As shown, the first motor 5 and the second motor 6 are arranged vertically, the second motor 6 and the third motor 7 are arranged horizontally, the receiving panel 8 is located above the third motor 7, and the rotating shaft of the third motor 7 is fixedly connected to the second horizontal plate of the receiving panel 8. The motor positions are different and the functions they play are different, which can realize multi-directional movement of the receiving panel 8 to achieve the purpose of silicon wafer feeding, washing and discharging.

[0056] Specifically, the surfaces of the protective rod 905 facing the receiving panel 8 are both covered with rubber sheets to protect the silicon wafer from being damaged.

[0057] Working principle:

[0058] Connect silicon wafer;

[0059] The second motor 6 drives the third motor 7 to rotate, and the receiving panel 8 rotates horizontally. Then the first motor 5 drives the second motor 6 to rotate, and the receiving panel 8 turns in the plane, and the silicon wafers on the conveyor belt are transferred to the receiving panel 8. Then the fourth motor 901 drives the first screw 902 to rotate. Because the first screw 902 and the second screw 903 are fixedly connected, when the first screw 902 rotates, the second screw 903 rotates. Because the threads of the first screw 902 and the second screw 903 are set in opposite directions, the slider 904 installed thereon moves in opposite directions when the fourth motor 901 works. The slide 801 has a moving guiding effect on the slider 904. At this time, the protective rod 905 moves from the side of the third vertical plate of the receiving panel 8 to the middle of the third vertical plate. It is limited by the limit block 802, and the protective rod 905 cannot move and stick together, and the slider 904 is always kept in the installation state with its respective first screw 902 and second screw 903;

[0060] Rinse the silicon wafer;

[0061] The first motor 5 drives the second motor 6 to rotate in the opposite direction and reset, and then the second motor 6 drives the third motor 7 to move and reset. Water enters the spray plate 3 from the water tank 4 and sprays toward the silicon wafer. During the spraying, the second motor 6 drives the third motor 7 to move slightly back and forth, causing the silicon wafer to swing back and forth on the receiving panel 8 and the protective rod 905, achieving double-sided washing;

[0062] Output silicon wafer;

[0063] After flushing is completed, the second motor 6 drives the third motor 7 to flip, and the receiving panel 8 is horizontal. The first motor 5 then drives the second motor 6 to rotate in a plane. The third motor 7 drives the receiving panel 8 to tilt slightly, so that the receiving panel 8 faces the conveyor belt at the output position. The cylinder 805 extends, and the push block 804 pushes the silicon wafer down to the conveyor belt. Then the first motor 5 drives the second motor 6 to rotate horizontally to the conveyor belt mouth at the material receiving position, and the protective rod 905 is reset.

[0064] While embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions, and variations may be made to these embodiments without departing from the principles and spirit of the invention, and that the scope of the invention is defined by the appended claims and their equivalents.

Claims

1. A single crystal silicon pretreatment device, characterized in that: include: A plane plate (1), a support plate (2) being fixedly mounted on one side of the plane plate (1); A spray plate (3), the spray plate (3) being fixedly mounted on the top of the support plate (2); A water tank (4), the water tank (4) is fixedly installed on the top of the spray plate (3), and a water inlet pipe is provided on the water tank (4); A first motor (5), the first motor (5) being fixedly mounted on the plane plate (1); a second motor (6), the second motor (6) being fixedly mounted on the end of the rotating shaft of the first motor (5); a third motor (7), the third motor (7) being fixedly mounted on the end of the rotating shaft of the second motor (6); A receiving panel (8), the receiving panel (8) is fixedly mounted on the end of the rotating shaft of the third motor (7), the receiving panel (8) is a continuously bent structure, and the receiving panel (8) includes a first vertical plate, a second horizontal plate and a third vertical plate, and the third vertical plate is located at the bottom; A protective mechanism (9) is installed on the receiving panel (8); the receiving panel (8) is provided with a slide groove (801), a limit block (802), a through groove (803), a push block (804) and a cylinder (805); a slide groove (801) is provided on the side of the third vertical plate of the receiving panel (8); the limit block (802) is fixedly installed on the third vertical plate at the middle position of the slide groove (801); a through groove (803) is provided on the second horizontal plate; the push block (804) is fitted in the through groove (803); the cylinder (805) is fixedly installed at the bottom of the second horizontal plate; the inner rod of the cylinder (805) is fixedly connected to the push block (804); the protective mechanism (9) includes a fourth motor (901), a first screw rod (902) , a second screw rod (903), a slider (904) and a protective rod (905), one end of the third vertical plate is fixedly installed with a fourth motor (901), a first screw rod (902) and a second screw rod (903) are arranged in the slide groove (801), the threads of the first screw rod (902) and the second screw rod (903) are arranged in opposite directions, the ends of the first screw rod (902) and the second screw rod (903) are fixedly connected, the first screw rod (902) is fixedly connected to the rotating shaft of the fourth motor (901), the first screw rod (902) and the second screw rod (903) are both threadedly sleeved with a slider (904), the slider (904) is slidably connected to the slide groove (801), and the slider (904) is integrally connected with the protective rod (905).

2. A single crystal silicon pretreatment device according to claim 1, characterized in that: The through slot (803) is opened close to the first vertical plate.

3. The single crystal silicon pretreatment device according to claim 1, characterized in that: A slot is provided between the slider (904) and the protection rod (905), and the connection between the second horizontal plate and the third vertical plate is locked in the slot.

4. The single crystal silicon pretreatment device according to claim 1, characterized in that: The connection point between the first screw rod (902) and the second screw rod (903) corresponds to the position of the limiting block (802).

5. The single crystal silicon pretreatment device according to claim 1, characterized in that: The first motor (5) and the second motor (6) are arranged vertically, the second motor (6) and the third motor (7) are arranged horizontally, the receiving panel (8) is located above the third motor (7), and the rotating shaft of the third motor (7) is fixedly connected to the second horizontal plate of the receiving panel (8).

6. The single crystal silicon pretreatment device according to claim 1, characterized in that: The surfaces of the protective rod (905) facing the receiving panel (8) are both covered with rubber sheets.

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