Substrate processing apparatus and substrate processing method
By combining the base, placement module, nozzle module and anti-spillage module of the substrate processing device, variable operation is achieved by utilizing rotational force and centrifugal force, which solves the problem of liquid spillage in substrate processing and achieves effective liquid processing and cost control.
Patent Information
- Application Number
- CN202210854918.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Priority Date
- 2021-10-08
- Filing Date
- 2022-07-19
- Publication Date
- 2026-06-23
- Estimated Expiration
- 2042-07-19
AI Technical Summary
Existing substrate processing devices are difficult to effectively handle different rotational states of the substrate when dealing with spilled pharmaceutical solutions, and they are also complex in structure or have high installation costs.
It adopts a combined design of base, placement module, nozzle module and anti-spread module, and uses rotational force and centrifugal force to achieve variable operation, guide and discharge the scattered liquid. Through the multi-layer structure of the anti-spread module and the cooperation of moving parts, the angle can be moved variably according to the degree and type of liquid spread.
To effectively prevent the spillage of the liquid medicine, the direction of liquid medicine discharge and the location of recovery are taken into account, avoiding complex structure and increased installation costs, and multiple ways to deal with the spillage of the liquid medicine are implemented.