A pretreatment apparatus and method thereof

Abstract

This application relates to a pretreatment apparatus and method. The method includes: acquiring a first current intensity, a second current intensity, a first rate of change, and a second rate of change from current information; increasing the current applied to the filament to be treated to the first current intensity based on the first rate of change; controlling a dispensing device to perform a dispensing operation on the filament to be treated based on configuration parameters; and, after completing the dispensing operation, increasing the current applied to the second current intensity based on the second rate of change to obtain the target filament. The method selects appropriate current information based on the filament type and sample category of the filament to be treated, achieving precise control of the current intensity. The dispensing device is instructed to perform the dispensing operation on the filament to be treated according to the configuration parameters, thus meeting the requirements and needs of sample pretreatment, improving processing efficiency while reducing processing costs.

Description

Technical Field

[0001] This application relates to the field of mass spectrometry analysis technology, and in particular to a pretreatment device and method thereof. Background Technology

[0002] High-performance sample pretreatment is one of the keys to achieving accurate and sensitive analysis. When using a mass spectrometer for mass spectrometry analysis, the matrix needs to be dried and firmly attached to the filament surface to complete the sample pretreatment operation.

[0003] However, traditional techniques often rely on simple manual labor for sample pretreatment, which results in low processing efficiency and high processing costs. Summary of the Invention

[0004] Therefore, it is necessary to provide a preprocessing apparatus and method that can improve processing efficiency and reduce processing costs in response to the above-mentioned technical problems.

[0005] Firstly, this application provides a pretreatment method. The method is applied to a pretreatment apparatus equipped with a sample dispensing device; the method includes:

[0006] Acquire current information; the current information includes a first current intensity, a second current intensity, a first rate of change, and a second rate of change; wherein, the second current intensity is greater than the first current intensity;

[0007] Based on the first rate of change, the current energizing the filament to be treated is increased to the first current intensity, and configuration parameters are output; the configuration parameters are used to instruct the dripping device to perform a dripping operation on the filament to be treated.

[0008] The target filament is obtained by increasing the current from the first current intensity to the second current intensity based on the second rate of change.

[0009] In one embodiment, the first rate of change is less than the second rate of change, and the current information further includes a third rate of change, a first duration for maintaining the first current intensity, and a second duration for maintaining the second current intensity; the method further includes:

[0010] When the current reaches the first current intensity, the filament to be treated is energized according to the first holding time;

[0011] When the current reaches the second current intensity, the filament to be treated is energized based on the second holding time;

[0012] Once the target filament is obtained, the current is reduced from the second current intensity to zero according to the third rate of change.

[0013] In one embodiment, the configuration parameters include drop position information and the sample amount required for the drop operation; wherein, the drop position information is used to instruct the drop device to move to the position corresponding to the filament to be treated, and to perform the drop operation on the filament to be treated according to the sample amount.

[0014] In one embodiment, the first current intensity is selected based on the filament type to which the filament to be treated belongs and the sample type corresponding to the sample quantity; the second current intensity is used to characterize the current intensity required to make the filament to be treated emit light of a preset color after the sample drop operation is completed.

[0015] Secondly, this application also provides a pre-processing apparatus. The pre-processing apparatus is used to implement the above-described pre-processing method; the pre-processing apparatus includes an electronic compartment and has a guide rail support, and is configured with:

[0016] A sliding component is mounted on a guide rail bracket. The sliding component includes a slide rail and a dispensing device. The slide rail is fixedly mounted on the guide rail bracket, and the dispensing device is disposed on the slide rail.

[0017] The socket assembly includes a vertical filament support socket and a horizontal filament support socket. Filament supports are installed on both the vertical and horizontal filament support sockets to fix the filaments to be processed. Both the vertical and horizontal filament support sockets are located on the first side of the equipment's electronic compartment and are perpendicular to each other. The first side is the side where the guide rail bracket is located.

[0018] The equipment's electronic compartment includes a main controller, which is connected to the vertical filament support socket, the horizontal filament support socket, and the sample dispensing device.

[0019] In one embodiment, the device's electronic compartment further includes a user interaction device connected to the main controller. The user interaction device is used to respond to operation commands and output corresponding current information and configuration parameters to the main controller.

[0020] In one embodiment, the device's electronic compartment includes a selection circuit, the input of which is connected to the main controller, and the output of which is connected to the vertical filament support socket and the horizontal filament support socket, respectively.

[0021] The main controller outputs control commands based on current information, and the selection circuit switches the vertical filament bracket socket and the horizontal filament bracket socket on and off according to the control commands.

[0022] In one embodiment, the sample dispensing device includes a sample dispensing electronic compartment, and the sample dispensing electronic compartment is equipped with a dropper; the sample dispensing electronic compartment is equipped with a sample inlet and a slide rail gear buckle, the sample inlet being used to add a sample, and the slide rail gear buckle being used to fix the sample dispensing device on a slide rail;

[0023] The device uses two droppers. One dropper is used to apply the liquid to the filament that is fixed on the vertical filament support socket, while the other dropper is used to apply the liquid to the filament that is fixed on the horizontal filament support socket.

[0024] In one embodiment, the sample drop chamber includes a slide rail control circuit and a sample drop control circuit; both the slide rail control circuit and the sample drop control circuit are connected to the main controller.

[0025] In one embodiment, the equipment electronics compartment also includes an AC-DC conversion unit and a constant current source control unit;

[0026] One end of the AC-DC conversion unit is connected to the mains power, and the other end of the AC-DC conversion unit is connected to one end of the constant current source control unit, which in turn is connected to the main controller.

[0027] The AC-DC conversion unit converts the received AC power into DC power and outputs it to the constant current source control unit. The constant current source control unit receives control commands and regulates the DC power according to the control commands before outputting it to the main controller.

[0028] The aforementioned pretreatment apparatus and method acquires a first current intensity, a second current intensity, a first rate of change, and a second rate of change from current information. Based on the first rate of change, the energizing current for the filament to be treated is increased to the first current intensity. Based on configuration parameters, a dispensing device is controlled to perform a dispensing operation on the filament to be treated. After the dispensing operation is completed, the energizing current is increased from the first current intensity to the second current intensity based on the second rate of change to obtain the target filament. By precisely controlling the current intensity and realizing automatic dispensing operation, the processing efficiency is improved while the processing cost is reduced. Attached Figure Description

[0029] Figure 1 This is a structural block diagram of the preprocessing device in one embodiment;

[0030] Figure 2 This is a flowchart illustrating the preprocessing method in one embodiment;

[0031] Figure 3 This is a schematic diagram of the preprocessing device in one embodiment;

[0032] Figure 4 This is a schematic diagram of the filament support structure in one embodiment;

[0033] Figure 5 This is a schematic diagram of the pre-processing device in another embodiment;

[0034] Figure 6This is a structural block diagram of the device's electronic compartment and socket assembly in one embodiment;

[0035] Figure 7 This is a schematic diagram of the sample dropping device in one embodiment;

[0036] Figure 8 This is a structural block diagram of the device's electronic compartment, socket assembly, and drop sample electronic compartment in one embodiment;

[0037] Figure 9 This is a structural block diagram of the device's electronic compartment, socket assembly, and drop sample electronic compartment in another embodiment;

[0038] Figure 10 This is a schematic diagram of the electrical relationships of the pre-processing device in one embodiment. Detailed Implementation

[0039] To facilitate understanding of this application, a more complete description will be provided below with reference to the accompanying drawings, which illustrate embodiments of the present application. However, the present application can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided so that the disclosure of this application will be thorough and complete.

[0040] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application.

[0041] It is understood that, and should be noted, the terms “first” and “second” in this application are used to distinguish different objects, rather than to describe a specific order.

[0042] When used herein, the singular forms of “a,” “an,” and “the” may also include the plural forms unless the context clearly indicates otherwise. It should also be understood that the terms “comprising,” “including,” or “having,” etc., specify the presence of the stated feature, whole, step, operation, component, part, or combination thereof, but do not preclude the possibility of the presence or addition of one or more other features, wholes, steps, operations, components, parts, or combinations thereof.

[0043] When using a mass spectrometer for mass spectrometry analysis, the filament of the sample introduction system in the mass spectrometer needs to be pretreated. That is, the sample (matrix) needs to be attached to the surface of the filament, and then the filament is energized to vaporize or atomize the sample to complete the sample introduction and thus complete the mass spectrometry analysis.

[0044] However, current devices used for sample pretreatment of filaments in the field of mass spectrometry analysis suffer from at least the following problems: ① Electronic material issues: The electronic components and modules used in the device's electronic circuits have high purchase and maintenance costs and long maintenance cycles; ② Current control accuracy issues: In practical applications, the accuracy of current control greatly affects the processing results, and the current control accuracy is low; ③ Operational intelligence issues: The device often relies on simple manual labor for sample pretreatment, resulting in low processing efficiency and high processing costs; ④ Filament matching issues: Filaments are composed of different metal components, so their voltage and current parameters vary, and the device cannot meet the voltage and current requirements of various filaments.

[0045] The preprocessing method provided in this application embodiment can be applied to, for example... Figure 1 The pre-processing device shown may include a main controller 102, which communicates with a sample-dispensing device 104 via a cable interface. The main controller can instruct the sample-dispensing device to perform sample dispensing operations on the filament to be processed based on configuration parameters, and to energize the filament to be processed based on current information, thereby obtaining the target filament. This embodiment of the application satisfies both high current control accuracy and the voltage and current requirements of various filaments, improving processing efficiency and reducing processing costs. The sample-dispensing device 104 may refer to a device with a sample-dispensing function.

[0046] In one embodiment, such as Figure 2 As shown, a preprocessing method is provided, which is applied to... Figure 1 Taking a pretreatment device equipped with a sample dropping device as an example, the following steps are included:

[0047] S202, acquire current information; the current information includes a first current intensity, a second current intensity, a first rate of change, and a second rate of change; wherein, the second current intensity is greater than the first current intensity.

[0048] Among them, current information can refer to information used to describe various parameters of the current, such as the current intensity and the rate of change of the current. The current intensity and the rate of change of the current can be set according to the actual situation.

[0049] Specifically, the main controller acquires the first current intensity, the second current intensity, the first rate of change, and the second rate of change from the current information.

[0050] In one embodiment, the first current intensity is selected based on the filament type to which the filament to be treated belongs and the sample type corresponding to the sample quantity; the second current intensity is used to characterize the current intensity required to make the filament to be treated emit light of a preset color after the sample drop operation is completed.

[0051] The filament to be processed can refer to a filament-like material (alloy filament) made of one or more metals, which is not limited in this embodiment; the preset color can refer to dark red.

[0052] Specifically, the first current intensity can be set between 0.8A and 1A, and the specific first current intensity can be selected according to the filament type (metal type) and sample (matrix) type of the filament to be treated; the second current intensity can be set between 1.8A and 2A, and the specific second current intensity can be used to characterize the current intensity required for the filament to be treated to emit dark red light after the sample drop operation is completed.

[0053] In this embodiment, different first current intensities are selected based on the filament type and matrix type of the filament to be treated, and a second current intensity is selected that can emit dark red light for the filament to be treated to complete the drop sample operation. This satisfies the needs and requirements of sample pretreatment while improving the current control accuracy, thereby improving the processing efficiency.

[0054] S204, according to the first rate of change, the current energizing the filament to be treated is increased to the first current intensity, and the configuration parameters are output; the configuration parameters are used to instruct the dripping device to perform the dripping operation on the filament to be treated.

[0055] Specifically, the main controller increases the energizing current of the filament to be treated to a first current intensity according to a first rate of change. When the energizing current reaches the first current intensity, the main controller outputs configuration parameters and instructs the dispensing device to perform a dispensing operation on the filament to be treated according to the configuration parameters.

[0056] In one embodiment, the configuration parameters include drop position information and the sample amount required for the drop operation; wherein, the drop position information is used to instruct the drop device to move to the position corresponding to the filament to be treated, and to perform the drop operation on the filament to be treated according to the sample amount.

[0057] The drop position information can refer to the location of the filament to be processed; the sample amount can be set according to the actual situation and is not limited in this embodiment.

[0058] Specifically, the main controller instructs the dispensing device to move to the position corresponding to the filament to be treated based on the dispensing position information, and the main controller performs quantitative dispensing operation on the filament to be treated according to the sample amount.

[0059] In this embodiment of the application, by acquiring the dripping position information and the sample amount, the filament to be treated can be accurately dripped while the sample amount dripped into the dripping device can be precisely controlled, thereby improving the processing accuracy.

[0060] S206, based on the second rate of change, the current is increased from the first current intensity to the second current intensity to obtain the target filament.

[0061] The matrix (sample) can be a liquid substance that needs to be analyzed by mass spectrometry; the target filament can refer to a filament on which the matrix is ​​dried and firmly attached to the filament surface.

[0062] Specifically, the main controller increases the current from the first current intensity to the second current intensity based on the second rate of change, thereby obtaining the target filament.

[0063] In one embodiment, the first rate of change is less than the second rate of change, and the current information further includes a third rate of change, a first duration for maintaining the first current intensity, and a second duration for maintaining the second current intensity; the method further includes:

[0064] When the current reaches the first current intensity, the filament to be treated is energized according to the first holding time;

[0065] When the current reaches the second current intensity, the filament to be treated is energized based on the second holding time;

[0066] Once the target filament is obtained, the current is reduced from the second current intensity to zero according to the third rate of change.

[0067] The selection of the first rate of change is related to the resistivity of the material used in the filament to be treated (usually in the range of tens to hundreds of mΩ). Filaments with higher resistance have a lower rate of change, while those with lower resistance have a higher rate of change. This is to prevent the total power conducted on the filament from suddenly becoming too high and burning out the filament. The selection of the second rate of change is related to the sample (matrix). Generally, matrices made of solid materials have a higher rate of change than matrices made of liquid materials.

[0068] The first holding time characterizes the time required for the sample to be evaporated at a first current intensity after it has adhered to the filament surface in a liquid state. The first holding time can be set according to actual conditions, depending on the sample type and amount, and is not limited in this embodiment. The second holding time characterizes the time required for the evaporated matrix to firmly adhere to the surface of the filament under a second current intensity, causing the entire surface of the filament to emit a dark red glow without any black spots (matrix). Furthermore, both the second holding time and the third rate of change can be set according to actual conditions, and are not limited in this embodiment.

[0069] Specifically, when the energizing current reaches a first current intensity, the main controller energizes the filament to be processed after the sample drop operation has been completed according to a first holding time; the main controller increases the energizing current from the first current intensity to the second current intensity based on a second rate of change; when the energizing current reaches the second current intensity, the main controller continues to energize the filament to be processed after the sample drop operation has been completed according to a second holding time to obtain the target filament; when the target filament is obtained, the main controller reduces the energizing current from the second current intensity to zero (reduced until power is cut off) according to a third rate of change.

[0070] In this embodiment, the third rate of change, the first duration, and the second duration in the current information meet the needs and requirements of sample pretreatment, achieve precise control of current intensity, improve processing efficiency, and reduce processing costs.

[0071] In the above pretreatment method, by acquiring the first current intensity, second current intensity, first rate of change, and second rate of change from the current information, the energizing current of the filament to be treated is increased to the first current intensity according to the first rate of change. Based on the configuration parameters, the dispensing device is controlled to perform a dispensing operation on the filament to be treated. After the dispensing operation is completed, the energizing current is increased from the first current intensity to the second current intensity according to the second rate of change, thus obtaining the target filament. By selecting the corresponding current information based on the filament type and sample category of the filament to be treated, precise control of the current intensity is achieved. The dispensing device is instructed to perform a dispensing operation on the filament to be treated according to the configuration parameters, which meets the requirements and needs of sample pretreatment, improves processing efficiency, and reduces processing costs.

[0072] It should be understood that although the steps in the flowcharts of the embodiments described above are shown sequentially according to the arrows, these steps are not necessarily executed in the order indicated by the arrows. Unless explicitly stated herein, there is no strict order restriction on the execution of these steps, and they can be executed in other orders. Moreover, at least some steps in the flowcharts of the embodiments described above may include multiple steps or multiple stages. These steps or stages are not necessarily completed at the same time, but can be executed at different times. The execution order of these steps or stages is not necessarily sequential, but can be performed alternately or in turn with other steps or at least some of the steps or stages of other steps.

[0073] Based on the same inventive concept, this application also provides a preprocessing apparatus for implementing the preprocessing method described above. The solution provided by this apparatus is similar to the implementation described in the above method; therefore, the specific limitations in one or more preprocessing apparatus embodiments provided below can be found in the limitations of the preprocessing method described above, and will not be repeated here.

[0074] In one embodiment, such as Figure 3 As shown, a pretreatment apparatus is provided, which includes an equipment electronics compartment 310 and a guide rail bracket 320. The pretreatment apparatus is configured with:

[0075] The sliding component 330 is mounted on the guide rail bracket 320. The sliding component 330 includes a slide rail 331 and a sample dispensing device 333. The slide rail 331 is fixedly mounted on the guide rail bracket 320, and the sample dispensing device 333 is mounted on the slide rail 331.

[0076] The socket assembly 340 includes a vertical filament support socket 341 and a horizontal filament support socket 343. Filament supports 350 are installed on the vertical filament support socket 341 and the horizontal filament support socket 343, and the filament supports 350 are used to fix the filaments to be processed. The vertical filament support socket 341 and the horizontal filament support socket 343 are both located on the first side of the equipment's electronic compartment, and the vertical filament support socket 341 and the horizontal filament support socket 343 are arranged perpendicular to each other. The first side is the side where the guide rail bracket 320 is located.

[0077] The equipment electronic compartment 310 includes a main controller, which is connected to the vertical filament support socket 341, the horizontal filament support socket 343, and the sample drop device 333.

[0078] It should be noted that, as Figure 3 As shown, the main controller is located inside the equipment's electronics compartment 310, therefore... Figure 3 The slide rail 331 is fixedly mounted on the guide rail bracket 320 via a slide rail fixing buckle 321. (Not shown in the image)

[0079] Specifically, the socket assembly 340 may include multiple vertical filament bracket sockets 341 and multiple horizontal filament bracket sockets 343. The specific number can be set according to the actual situation. In this embodiment, the socket assembly 340 includes 5 vertical filament bracket sockets 341 and 5 horizontal filament bracket sockets 343 as an example for illustration.

[0080] In some examples, the schematic diagram of the filament support is as follows: Figure 4 As shown; it should be noted that the filament bracket can refer to the bracket used to fix the alloy filament, and two energized pins are connected to the two ends of the alloy filament contact.

[0081] In this embodiment, by configuring vertical filament support sockets and horizontal filament support sockets, the needs and requirements of sample pretreatment are met; by configuring slide rails and a sample dispensing device, the sample dispensing operation can be completed while the amount of sample dispensed can be precisely controlled, improving processing efficiency and reducing processing costs.

[0082] In one embodiment, the device's electronic compartment further includes a user interaction device connected to the main controller. The user interaction device is used to respond to operation commands and output corresponding current information and configuration parameters to the main controller.

[0083] Specifically, the operation instructions received by the user interaction device may include parameters such as the amount of substrate dripped, the current intensity at each stage (first current intensity, second current intensity), the current rise / fall rate at each stage (first rate of change, second rate of change, third rate of change), and the duration of each stage (first holding time, second holding time), which are not limited in the embodiments of this application.

[0084] In addition, the user interaction device includes a display device and buttons. The display device can refer to a device with display function, such as a display screen. In this application, an OLED (Organic Light-Emitting Diode) display screen is used as an example.

[0085] Furthermore, the OLED display screen in this embodiment can be used to display the on / off indicators of each vertical filament bracket socket and each horizontal filament bracket socket, display the configuration interface corresponding to the current information and configuration parameters, and display the real-time power-on current, etc., which can be set according to the actual situation.

[0086] In some examples, such as Figure 5 As shown, the buttons may include a vertical filament bracket on / off switch 510, a horizontal filament bracket on / off switch 520, a programmable button 530, and a current adjustment knob 540. In practical applications, the main controller responds to the button operations of the vertical filament bracket on / off switch 510 and the horizontal filament bracket on / off switch 520, and controls the OLED display to show the corresponding content (on / off indicators of each vertical filament bracket socket and each horizontal filament bracket socket). The main controller selects the corresponding operating mode based on the operation recognition of the programmable button 530. The main controller responds to the operation recognition of the current adjustment knob 540, and then controls the current intensity of the energized current. Furthermore, the buttons may also include buttons related to configuration parameters, which are not limited in this embodiment.

[0087] It should be noted that the number of vertical filament bracket on / off switches 510 and horizontal filament bracket on / off switches 520 corresponds one-to-one with the number of vertical filament bracket sockets and horizontal filament bracket sockets. In this embodiment, five vertical filament bracket on / off switches 510 and five horizontal filament bracket on / off switches 520 are used as an example. The number of programmable buttons 530 can be set according to actual needs; in this embodiment, five programmable buttons 530 are used as an example.

[0088] In other examples, the operating mode may include manual mode and program-controlled mode. In manual mode, the operator performs the corresponding operation through the user interaction device to complete the corresponding processing and obtain the target filament. In program-controlled mode, the user interaction device responds to the operation command and outputs the corresponding current information and configuration parameters to the main controller. Then, the main controller performs the corresponding operation based on the current information and configuration parameters to obtain the target filament.

[0089] In this embodiment, the user interaction device responds to various operation commands to complete the output of corresponding current information and configuration parameters, thereby improving processing efficiency. Furthermore, the user interaction device may include a display device and buttons. The display device can display the current intensity and program execution status, making the device operation more convenient. It adopts a high-definition OLED screen, which can display the current intensity, program execution status, and configuration interface corresponding to the current information and configuration parameters in real time, greatly satisfying the needs of business personnel to control the pre-processing operation status. In addition, the main controller selects the corresponding operation mode based on the operation recognition of the program control button 530. In addition to the manual mode for business personnel, a program control mode is added. Only the execution parameters (current information and configuration parameters) of each stage need to be set to start automated operation, which improves processing efficiency and reduces processing costs.

[0090] In one embodiment, such as Figure 6 As shown, the electronic compartment of the equipment includes a selection circuit. The input of the selection circuit is connected to the main controller, and the output of the selection circuit is connected to the vertical filament bracket socket and the horizontal filament bracket socket, respectively.

[0091] The main controller outputs control commands based on current information, and the selection circuit switches the vertical filament bracket socket and the horizontal filament bracket socket on and off according to the control commands.

[0092] Among them, the selection circuit can refer to a circuit with a selection function.

[0093] Specifically, the main controller outputs control commands based on current information, and the selection circuit switches the vertical filament bracket sockets and horizontal filament bracket sockets on and off according to the control commands. In addition, the control commands can also be used to instruct the OLED display to show the on / off indicators of each vertical filament bracket socket and each horizontal filament bracket socket.

[0094] In this embodiment, by selecting the circuit to switch the vertical filament bracket socket and the horizontal filament bracket socket on and off respectively, the device can be repaired by replacing the circuit during maintenance, which greatly shortens the maintenance cycle. Moreover, the electronic circuit uses general-purpose components, so there is no risk of being difficult to replace or even being discontinued.

[0095] In one embodiment, such as Figure 7 As shown, the sample dispensing device includes a sample dispensing electronic chamber 710, and the sample dispensing electronic chamber 710 is equipped with a dropper 720; the sample dispensing electronic chamber 710 is equipped with a sample inlet 730 and a slide rail gear buckle 740, the sample inlet 730 is used to add samples, and the slide rail gear buckle 740 is used to fix the sample dispensing device on a slide rail; wherein, there are two droppers 720, the dispensing position of one dropper 720 is for the filament to be treated fixed on the vertical filament support socket, and the dispensing position of the other dropper 720 is for the filament to be treated fixed on the horizontal filament support socket.

[0096] The diameter of the dropper can be set according to actual conditions. In this embodiment, a small-diameter dropper is used as an example. One drop from a small-diameter dropper can be 0.05 ml, that is, the sample volume can be a multiple of 0.05 ml. The sample can be configured according to actual conditions, and there is no limitation in this embodiment.

[0097] Specifically, the sample dispensing device is fixed on the slide rail based on the slide rail gear buckle 740. When a dispensing operation is required, the corresponding sample is added to the sample dispensing electronic chamber 710 through the sample inlet 730, and the corresponding dropper 720 is used to perform the dispensing operation according to the sample volume indication.

[0098] In the embodiments of this application, a dripping device is used to drip the filament to be treated, and the quality of the dripped substrate is precisely controllable, which improves the accuracy and intelligence of sample pretreatment.

[0099] In one embodiment, such as Figure 8 As shown, the sample drop chamber includes a slide rail control circuit and a sample drop control circuit; both the slide rail control circuit and the sample drop control circuit are connected to the main controller.

[0100] Specifically, the slide rail control circuit and the sample drop control circuit receive configuration parameters output by the main controller through a cable interface. The slide rail control circuit controls the sample drop electronic chamber to move left and right on the slide rail to the position corresponding to the filament to be treated based on the drop position information in the configuration parameters. The sample drop control circuit drops the pre-injected matrix onto the filament to be treated according to the sample amount.

[0101] In this embodiment, a slide rail control circuit and a sample drop control circuit are set up to automatically drop the matrix, making the sample pretreatment operation more precise and intelligent. It realizes the operation of automatically dropping the matrix onto the filament to be treated, and the amount of sample dropped is precisely controllable, thus improving the processing efficiency.

[0102] In one embodiment, such as Figure 9 As shown, the equipment's electronic compartment also includes an AC-DC conversion unit and a constant current source control unit; one end of the AC-DC conversion unit is connected to the mains power, and the other end of the AC-DC conversion unit is connected to one end of the constant current source control unit, which in turn is connected to the main controller; the AC-DC conversion unit converts the received mains power into DC power and outputs it to the constant current source control unit, which receives control commands and regulates the DC power according to the control commands and outputs it to the main controller.

[0103] Specifically, AC mains power can refer to 220V alternating current (AC), and DC power can refer to 24V direct current (DC). The AC-DC conversion unit can convert 220V AC power to 24V DC power; the constant current source control unit can convert 24V DC power into adjustable voltage and adjustable current. The adjustment range can be set according to actual conditions. In this embodiment, the adjustable voltage range is 0V to 12V, and the adjustable current range is 0A to 6A, with the voltage adjustment range being 0.01V and the current adjustment range being 0.01A, as an example for illustration.

[0104] In some examples, in addition to receiving instructions from the main controller and the voltage and current output values ​​of the constant current source control unit, the constant current source control unit also has a built-in 16-bit resolution voltage and current sampling chip, which can send the sampled voltage and current data to the main controller.

[0105] In this embodiment, an AC-DC conversion unit is used to convert the mains power, and a constant current source control unit is selected to convert the DC power into an adjustable voltage and an adjustable current. The adjustment range of voltage and current is relatively fine, which improves the detection accuracy and control accuracy of sample pretreatment.

[0106] To facilitate understanding by those skilled in the art, the preprocessing apparatus is described below with reference to a specific example: Figure 10 As shown, Figure 10The electrical diagram of the pretreatment unit is shown; the AC-DC conversion unit receives mains power through the mains power access circuit; the constant current source control unit includes a constant current source control circuit and a constant current source circuit; the selection circuit is connected to the vertical filament support socket and the horizontal filament support socket through the filament support bracket socket; the equipment's electronic compartment also includes an on / off switch control unit, a button control unit, a knob control unit, and a display screen control unit, all connected to the main controller. The on / off switch control unit is connected to the vertical filament support on / off switch and the horizontal filament support on / off switch, the button control unit is connected to the programmable button, the knob control unit is connected to the current adjustment knob, and the display screen control unit is connected to the OLED display screen.

[0107] Specifically, such as Figure 10 As shown, 1 is the equipment electronic compartment; 2 is the vertical filament bracket on / off switch; 3 is the OLED display screen; 4 is the current adjustment knob; 5 is the programmable button; 6 is the horizontal filament bracket on / off switch; 7 is the vertical filament bracket socket; 8 is the horizontal filament bracket socket; 9 is the dropper; 10 is the slide rail; 11 is the mains power input circuit; 12 is the AC-DC conversion unit; 13 is the constant current source circuit; 14 is the constant current source control circuit; 15 is the main controller; 16 is the on / off switch control unit; 17 is the knob control unit; 18 is the button control unit; 19 is the display screen control unit; 20 is the selection circuit; 21 is the filament bracket holder; 22 is cable interface 1; 23 is cable interface 2; 24 is the sample drop electronic compartment; 25 is the slide rail control circuit; 26 is the sample drop control circuit.

[0108] In practical applications, the AC mains circuit connects 220V AC power to the device's electronic compartment. The AC-DC conversion unit converts the 220V AC power to 24V DC power. The constant current source circuit converts the 24V DC power into adjustable voltage (0-12V) and adjustable current (0-6A) output power, with voltage and current adjustment ranges of 0.01V and 0.01A respectively. Besides receiving commands from the main controller and controlling the voltage and current output values ​​of the constant current source circuit, the constant current source control circuit also incorporates a 16-bit resolution voltage and current sampling chip, sending the sampled voltage and current data back to the main controller. The main controller controls the entire device's circuitry. The main controller uses a selection circuit to control the selection and switching of the filament support holders, which are electrically connected to the vertical and horizontal filament support holder sockets. The on / off switch control unit receives button operations from the vertical and horizontal filament support on / off switches and sends the operations to the main controller. The knob control unit recognizes the operation of the current adjustment knob and sends the operation to the main controller. The button control unit recognizes the operation of the programmable buttons and sends the operation to the main controller. The display control unit receives the control commands from the main controller and controls the OLED display to show the corresponding content. Cable interface 1 sends the main controller's control commands to the sample collection chamber.

[0109] The sample-dispensing electronic chamber includes cable interface 2, a slide rail control circuit, and a sample-dispensing control circuit. Cable interface 2 outputs control commands from the main controller to the slide rail control circuit and the sample-dispensing control circuit; the slide rail control circuit controls the left and right movement of the sample-dispensing electronic chamber on the slide rail. The sample-dispensing control circuit controls the dropper to dispense the pre-injected matrix.

[0110] Those skilled in the art will understand that Figure 10 The electrical relationship diagram shown is merely a block diagram of a portion of the structure related to the present application and does not constitute a limitation on the pre-processing device to which the present application is applied. A specific pre-processing device may include more or fewer components than those shown in the figure, or combine certain components, or have different component arrangements.

[0111] To facilitate understanding by those skilled in the art, the workflow of the pretreatment device is explained below with reference to a specific example:

[0112] S10, after the pretreatment device has completed the initialization operation, according to the type and quantity of filaments to be processed required for the sample pretreatment operation, insert the filament holder into the corresponding filament holder slot, and turn on the corresponding filament holder slot through the horizontal or vertical filament holder on / off switch. At this time, the corresponding filament holder slot indicator on the OLED display will light up.

[0113] S20: Select the operating mode via the programmable button. There are two modes: manual mode and programmable mode. If manual mode is selected, execute S30. If programmable mode is selected, execute S40.

[0114] S30: The pretreatment device enters manual mode and checks if the current adjustment knob is zero. If the current adjustment knob is not zero, a warning message is displayed on the screen until the knob is manually zeroed. The operator increases the current intensity to the first current intensity using the current adjustment knob, and drips the pre-prepared substrate onto the surface of the filament to be treated on the filament holder using a dropper. The operator waits for the substrate to evaporate and adhere to the filament (after the first holding time). The operator continues to slowly increase the current intensity to the second current intensity using the current adjustment knob until a relatively obvious dark red glow is observed from the filament (after the second holding time), then quickly reduces the current intensity until power is cut off, executing S60.

[0115] S40: When the device enters programmable mode, a configuration interface corresponding to the current information and configuration parameters will be displayed. If configuration has been completed, the previously configured current information and parameters will be displayed. Operators can modify parameters such as the substrate dripping volume (in multiples of 0.05 ml), the current intensity at each stage, the current rise / fall rate at each stage, and the duration of each stage, according to the actual situation. If no modifications are needed, proceed directly to S50; if no settings have been made, all parameters must be set before executing S50.

[0116] S50, with parameters set, the programmable mode is activated. The device automatically increases the current intensity to the first current intensity according to a preset rate of change (first rate of change). Then, the sample dispensing device dispenses the substrate onto the filament surface of the filament holder at the illuminated filament holder position according to preset configuration parameters. After a preset waiting time (first holding time) is completed, the current intensity is increased to the second current intensity. After a preset waiting time (second holding time) is completed, the current intensity is reduced until power is cut off according to a preset rate of decrease (third rate of change).

[0117] S60, remove the filament bracket and target filament, turn off the pretreatment device and disconnect the mains power.

[0118] It should be noted that the data involved in this application (including but not limited to current information, configuration parameters, etc.) are all information and data authorized by the user or fully authorized by all parties, and the collection, use and processing of the relevant data must comply with the relevant laws, regulations and standards of the relevant countries and regions.

[0119] Those skilled in the art will understand that all or part of the processes in the methods of the above embodiments can be implemented by a computer program instructing related hardware. The computer program can be stored in a non-volatile computer-readable storage medium, and when executed, it can include the processes of the embodiments of the above methods. Any references to memory, databases, or other media used in the embodiments provided in this application can include at least one of non-volatile and volatile memory. Non-volatile memory can include read-only memory (ROM), magnetic tape, floppy disk, flash memory, optical memory, high-density embedded non-volatile memory, resistive random access memory (ReRAM), magnetic random access memory (MRAM), ferroelectric random access memory (FRAM), phase change memory (PCM), graphene memory, etc. Volatile memory can include random access memory (RAM) or external cache memory, etc. By way of illustration and not limitation, RAM can take many forms, such as Static Random Access Memory (SRAM) or Dynamic Random Access Memory (DRAM). The databases involved in the embodiments provided in this application may include at least one type of relational database and non-relational database. Non-relational databases may include, but are not limited to, blockchain-based distributed databases. The processors involved in the embodiments provided in this application may be general-purpose processors, central processing units, graphics processing units, digital signal processors, programmable logic devices, quantum computing-based data processing logic devices, etc., and are not limited to these.

[0120] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0121] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of this patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this application should be determined by the appended claims.

Claims

1. A preprocessing method, characterized in that, The method is applied to a pretreatment apparatus equipped with a sample dropping device; the method includes: Acquire current information; the current information includes a first current intensity, a second current intensity, a first rate of change, and a second rate of change; wherein the second current intensity is greater than the first current intensity; The current applied to the filament to be treated is increased to the first current intensity according to the first rate of change, and configuration parameters are output. The configuration parameters are used to instruct the dispensing device to perform a dispensing operation on the filament to be treated. The configuration parameters include dispensing position information and the sample amount required for the dispensing operation. The dispensing position information is used to instruct the dispensing device to move to the position corresponding to the filament to be treated and to perform the dispensing operation on the filament to be treated according to the sample amount. The first current intensity is selected according to the filament category to which the filament to be treated belongs and the sample type corresponding to the sample amount. The second current intensity is used to characterize the current intensity required for the filament to be treated to emit light of a preset color after the dispensing operation is completed. Based on the second rate of change, the energizing current is increased from the first current intensity to the second current intensity to obtain the target filament.

2. The pretreatment method according to claim 1, characterized in that, The first rate of change is less than the second rate of change, and the current information further includes a third rate of change, a first duration for maintaining the first current intensity, and a second duration for maintaining the second current intensity. The method further includes: When the energizing current reaches the first current intensity, the filament to be treated is energized according to the first holding time; When the energizing current reaches the second current intensity, the filament to be treated is energized based on the second holding time; Having obtained the target filament, the energizing current is reduced from the second current intensity to zero according to the third rate of change.

3. A pretreatment apparatus, characterized in that, The pretreatment device is used to implement the pretreatment method as described in any one of claims 1 or 2; the pretreatment device includes an electronic compartment and has a guide rail support, and the pretreatment device is configured with: A sliding assembly is disposed on the guide rail bracket. The sliding assembly includes a slide rail and the sample dispensing device. The slide rail is fixedly disposed on the guide rail bracket, and the sample dispensing device is disposed on the slide rail. A socket assembly includes a vertical filament support socket and a horizontal filament support socket. Filament supports are mounted on both the vertical and horizontal filament support sockets, and these supports are used to fix the filaments to be processed. Both the vertical and horizontal filament support sockets are located on a first side of the equipment's electronic compartment, and are perpendicular to each other. The first side is the side where the guide rail bracket is located. The equipment's electronic compartment includes a main controller, which is connected to the vertical filament support socket, the horizontal filament support socket, and the sample-dropping device.

4. The pretreatment apparatus according to claim 3, characterized in that, The equipment's electronic compartment also includes: A user interaction device is connected to the main controller. The user interaction device is used to respond to operation commands and output the corresponding current information and configuration parameters to the main controller.

5. The pretreatment apparatus according to claim 3, characterized in that, The electronic compartment of the equipment includes a selection circuit. The input terminal of the selection circuit is connected to the main controller, and the output terminal of the selection circuit is connected to the vertical filament bracket socket and the horizontal filament bracket socket, respectively. The main controller outputs control commands based on the current information, and the selection circuit switches the vertical filament bracket socket and the horizontal filament bracket socket on and off according to the control commands.

6. The pretreatment apparatus according to claim 3, characterized in that, The sample dispensing device includes a sample dispensing electronic compartment, and the sample dispensing electronic compartment is equipped with a dropper; the sample dispensing electronic compartment is equipped with a sample inlet and a slide rail gear buckle, the sample inlet is used to add a sample, and the slide rail gear buckle is used to fix the sample dispensing device on the slide rail; The number of droppers is two. One dropper is used to apply the liquid to the filament to be treated, which is fixed on the vertical filament support socket, and the other dropper is used to apply the liquid to the filament to be treated, which is fixed on the horizontal filament support socket.

7. The pretreatment apparatus according to claim 6, characterized in that, The sample drop chamber includes a slide rail control circuit and a sample drop control circuit; both the slide rail control circuit and the sample drop control circuit are connected to the main controller.

8. The pretreatment apparatus according to any one of claims 3 to 7, characterized in that, The equipment's electronic compartment also includes an AC-DC conversion unit and a constant current source control unit; One end of the AC-DC conversion unit is connected to the mains power, and the other end of the AC-DC conversion unit is connected to one end of the constant current source control unit, and the other end of the constant current source control unit is connected to the main controller; The AC-DC conversion unit converts the received mains power into DC power and outputs it to the constant current source control unit. The constant current source control unit receives control commands and regulates the DC power according to the control commands and outputs it to the main controller.

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