Quartz microneedle and method of making the same

Abstract

The application relates to the technical field of biological medicine, in particular to a quartz microneedle and a preparation method thereof. The quartz microneedle comprises a quartz substrate and quartz needle-shaped bodies arranged in an array on one side of the quartz substrate, the quartz needle-shaped bodies have cavities; a flow channel is arranged in the quartz substrate and is communicated with the cavities; a valve is arranged in the flow channel and is used for opening and closing the flow channel and / or adjusting the flow of fluid flowing through the flow channel. The quartz microneedle can be used for long-term and multiple drug delivery according to a complex drug delivery procedure.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of biological medicine, in particular to a quartz microneedle and a preparation method thereof. BACKGROUND

[0002] The microneedle is a new type of physical penetration device, generally comprising a substrate and a plurality of microneedle-shaped bodies arranged in an array on the substrate, and can be applied to many fields such as beauty, local anesthesia, diabetes, vaccine delivery, tumor, etc.

[0003] The traditional microneedle generally uses silicon as the substrate and uses organic matter as the needle-shaped body. Since the organic matter can be self-dissolved, the needle-shaped body is dissolved in the recipient after transmitting drugs to the recipient in batches through the needle-shaped body. Therefore, the traditional microneedle is generally used as a disposable consumable and cannot be used for multiple drug delivery according to a specific drug delivery program for a long time, and is limited in use in cell culture and some medical research. SUMMARY

[0004] Therefore, the present application provides a quartz microneedle and a preparation method thereof to solve the problem that the traditional microneedle cannot be used for multiple drug delivery according to a specific drug delivery program for a long time.

[0005] The first aspect of the present application provides a quartz microneedle, and the technical solution is as follows:

[0006] The quartz microneedle comprises a quartz substrate and quartz needle-shaped bodies arranged in an array on one side of the quartz substrate, and the quartz needle-shaped bodies have cavities.

[0007] The quartz substrate is internally provided with flow channels, and the flow channels are in communication with the cavities.

[0008] The flow channels are internally provided with valves, and the valves are used for opening and closing the flow channels and / or adjusting the flow rate of the fluid flowing through the flow channels.

[0009] In some embodiments, the number of flow channels is plural, each of the flow channels is independently in communication with one or more cavities, and at least one flow channel is provided with the valve.

[0010] In some embodiments, the material of the valve is electrostrictive material, and the quartz microneedle further comprises a controller electrically connected with the valve.

[0011] In some embodiments, the quartz needle-shaped body satisfies at least one of the following characteristics:

[0012] (1) The radial section of the quartz needle-shaped body is a circular ring, the inner diameter is 40-400 μm, and the outer diameter is 50-500 μm.

[0013] (2) the quartz needle-like body has the same size in each radial section;

[0014] (3) the length of the quartz needle-like body is 50-800 μm.

[0015] The second aspect of the present application provides a preparation method of the quartz micro-needle.

[0016] A preparation method of a quartz micro-needle, comprising the following steps:

[0017] providing a first quartz plate having opposite first and second surfaces;

[0018] forming quartz needle-like bodies in array distribution and having cavities on the first surface of the first quartz plate;

[0019] forming a first groove on the second surface of the first quartz plate, the first groove being in communication with the cavities;

[0020] providing a second quartz plate having a third surface corresponding to the second surface;

[0021] forming a second groove corresponding to the first groove on the third surface;

[0022] forming a valve in the first groove, or forming a valve in the second groove, or forming a first sub-valve in the first groove and a second sub-valve in the corresponding position of the second groove, the first and second sub-valves being capable of being combined to form a valve;

[0023] merging and connecting the first and second quartz plates in a manner that the second surface and the third surface are in contact, so that the first and second grooves form a flow channel provided with the valve, to form a quartz substrate having quartz needle-like bodies in array distribution on one side.

[0024] In some embodiments, the step of forming quartz needle-like bodies in array distribution and having cavities on the first surface of the first quartz plate comprises the following steps:

[0025] coating a first photoresist on the first surface to perform a first photopatterning process, and etching a part of the first quartz plate corresponding to the exposed area of the first photopatterning process to form quartz needle-like bodies in array distribution and having holes;

[0026] coating a second photoresist on the first surface to perform a second photopatterning process to expose the holes, and etching a part of the first quartz plate at the bottom of the holes to form quartz needle-like bodies in array distribution and having cavities.

[0027] In some embodiments, the coating a first photoresist on the first surface comprises:

[0028] depositing a metal layer on the first surface;

[0029] coating the first photoresist on the metal layer.

[0030] In some embodiments, after etching the portion of the first quartz plate at the bottom of the hole, the method further comprises removing the metal layer.

[0031] In some embodiments, the forming a first groove on a second surface of the first quartz plate comprises:

[0032] coating a third photoresist on the second surface for a third patterning process, and etching a portion of the first quartz plate corresponding to an exposed region of the third patterning process to form a first groove.

[0033] In some embodiments, the forming a second groove on the third surface corresponding to the first groove comprises:

[0034] coating a fourth photoresist on the third surface for a fourth patterning process, and etching a portion of the second quartz plate corresponding to an exposed region of the fourth patterning process to form a second groove.

[0035] In some embodiments, the forming a valve in the first groove comprises:

[0036] coating a fifth photoresist in the first groove for a fifth patterning process to expose a valve position region of the first groove;

[0037] depositing a electrostrictive material on the first groove to form an electrostrictive layer;

[0038] removing the fifth photoresist to obtain the first groove with a valve.

[0039] In some embodiments, the forming a valve in the second groove comprises:

[0040] coating a sixth photoresist in the second groove for a sixth patterning process to expose a valve position region of the second groove;

[0041] depositing a electrostrictive material on the second groove to form an electrostrictive layer;

[0042] removing the sixth photoresist to obtain the second groove with a valve.

[0043] In some embodiments, the forming the first sub-valve in the first groove and the forming the second sub-valve in the corresponding position of the second groove comprises the following steps:

[0044] performing a fifth patterning process on the first groove by coating a fifth photoresist to expose the valve position area of the first groove;

[0045] depositing an electrostrictive material on the first groove to form a first electrostrictive layer;

[0046] removing the fifth photoresist to obtain the first groove with the first sub-valve;

[0047] performing a sixth patterning process on the second groove by coating a sixth photoresist to expose the valve position area of the second groove, the valve position area of the second groove corresponding to the valve position area of the first groove;

[0048] depositing an electrostrictive material on the second groove to form a second electrostrictive layer;

[0049] removing the sixth photoresist to obtain the second groove with the second sub-valve.

[0050] Compared with the conventional scheme, the present application has the following beneficial effects:

[0051] The micro-needle of the present application is made of quartz, which is not conductive and does not react with or contaminate the receptor, and can be repeatedly used. Meanwhile, the base of the quartz micro-needle is provided with a flow channel communicating with the cavity of the quartz needle-shaped body, and the flow channel is provided with a valve. The flow channel and / or the flow of fluid in the flow channel can be opened and closed or adjusted through the valve. In this way, the release of the same or different or mixed fluid by the quartz needle-shaped bodies at different positions can be controlled, and the flow of fluid can also be controlled. When performing cell drug delivery experiments, the arrayed quartz needle-shaped bodies are batched into cells for reaction, and long-term and multiple drug delivery can be performed according to complex drug delivery programs. In the field of biological medicine, fine batch experiments are realized, and the present application also has wide application prospects in other fields. BRIEF DESCRIPTION OF DRAWINGS

[0052] In order to more clearly illustrate the technical solutions in the embodiments of the present application, more completely understand the present application and its beneficial effects, the drawings needed to be used in the embodiment description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor on the basis of these drawings.

[0053] Figure 1 is a top view of the quartz micro-needle of an embodiment;

[0054] Figure 2A cross-sectional view of the quartz microneedle along the A-A' section;

[0055] Figure 3 A cross-sectional view of the quartz microneedle along the B-B' section;

[0056] Figure 4 A scanning electron microscope image of an example quartz microneedle;

[0057] Figure 5 A flowchart of a method for preparing a quartz microneedle according to an embodiment. DETAILED DESCRIPTION

[0058] The present application is further described in detail by the following Examples. The present application can be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and fully convey the scope of the application to those skilled in the art.

[0059] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used in the description of the application herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application.

[0060] Terminology

[0061] Unless otherwise indicated, or unless the context clearly indicates otherwise, the terms or phrases used in this document have the following meanings:

[0062] In the present application, the selection range involving "and / or", "or / and", "and / or" includes any one of two or more relevant listed items, and also includes any and all combinations of the relevant listed items, which includes any two relevant listed items, any more relevant listed items, or all relevant listed items. It should be noted that when at least three items are connected by at least two conjunctions selected from "and / or", "or / and", and "and / or", it should be understood that the technical solution undoubtedly includes the technical solution connected by "logical and", and also undoubtedly includes the technical solution connected by "logical or". For example, "A and / or B" includes three parallel solutions of A, B, and A+B. For another example, the technical solution of "A, and / or, B, and / or, C, and / or, D" includes any one of A, B, C, and D (i.e., the technical solution connected by "logical or"), and also includes any and all combinations of A, B, C, and D, i.e., includes the combination of any two or any three of A, B, C, and D, and also includes the four-item combination of A, B, C, and D (i.e., the technical solution connected by "logical and").

[0063] In the present application, "a plurality of", "a plurality of kinds", "a plurality of times", "a plurality of elements" and the like, if not otherwise specified, refer to more than two or equal to two in number. For example, "one or more" means one or more than two.

[0064] In the present application, "preferably", "more preferably", "even more preferably", "suitably" and the like are merely used to describe embodiments or examples, and should not be understood as a limitation to the protection scope of the present application.

[0065] In the present application, "further", "even further", "in particular" and the like are used for the purpose of description, and should not be understood as a limitation to the protection scope of the present application.

[0066] In the present application, "optionally", "optional" and the like mean that it can or can not exist, i.e. it means that it is selected from either of the two parallel schemes "with" or "without". If there are multiple "options" in a technical solution, and there is no special description, and there is no contradictory relationship or mutual restriction, each "option" is independent.

[0067] In the present application, in the terms "first aspect", "second aspect", "third aspect", "fourth aspect" and the like, the terms "first", "second", "third", "fourth" and the like are merely used for the purpose of description, and should not be understood as indicating or implying relative importance or quantity, nor should it be understood as implicitly indicating the importance or quantity of the indicated technical features. Moreover, "first", "second", "third", "fourth" and the like only serve the purpose of non-exhaustive enumeration description, and should be understood as not constituting a closed limitation on the quantity.

[0068] In the present application, if not otherwise specified, the numerical interval (i.e. the numerical range) is considered to be continuous within the above numerical interval, and includes the two numerical end points (i.e. the minimum value and the maximum value) of the numerical range, and every numerical value between the two numerical end points. If not otherwise specified, when the numerical interval only refers to the integers within the numerical interval, including the two end point integers of the numerical range, and every integer between the two end points, in this document, it is equivalent to directly listing each integer, for example, t is an integer selected from 1 to 10, which means that t is any one integer selected from the group consisting of 1, 2, 3, 4, 5, 6, 7, 8, 9 and 10. In addition, when multiple ranges are provided to describe characteristics or properties, these ranges can be combined. In other words, unless otherwise specified, the ranges disclosed in this document should be understood as including any and all sub-ranges incorporated therein.

[0069] The temperature parameter in the present application, if not particularly limited, allows for constant temperature treatment, and also allows for variation within a certain temperature range. It should be understood that the constant temperature treatment allows for fluctuations within the accuracy range controlled by the instrument. Fluctuations within a range such as ±5℃, ±4℃, ±3℃, ±2℃, ±1℃ are allowed.

[0070] In order to solve the problem that the conventional microneedle cannot be administered multiple times according to a specific administration procedure for a long time, an embodiment of the present application provides a quartz microneedle, which is shown in Figures 1-3 , Figure 1 is a top view of the quartz microneedle 01, Figure 2 is a sectional view along the A-A' section, Figure 3 is a sectional view along the B-B' section. The quartz microneedle 01 comprises a quartz substrate 11 and quartz needle bodies 12 arranged in an array on one side of the quartz substrate 11, the quartz needle bodies 12 having cavities 121; the quartz substrate 11 is internally provided with a flow channel 111, the flow channel 111 being in communication with the cavities 121; the flow channel 111 is internally provided with a valve 13, the valve 13 being used for opening and closing the flow channel 111 and / or adjusting the flow rate of the fluid flowing through the flow channel 111.

[0071] The microneedle of the present embodiment is made of quartz, which is not conductive and does not react with and contaminate many receptors, and can be repeatedly used. Meanwhile, the quartz microneedle of the present application is internally provided with a flow channel in communication with the cavities of the quartz needle bodies, and the flow channel is internally provided with a valve. The valve can be used to open and close the flow channel and / or adjust the flow rate of the fluid in the flow channel. In this way, the same or different or mixed fluids can be released from the quartz needle bodies at different positions, and the flow rate of the fluid can also be controlled. When performing cell administration experiments, the arrayed quartz needle bodies can be inserted into cells in batches for reaction, and long-term multiple administrations can be performed according to complex administration procedures. In the field of biological medicine, fine batch experiments can be realized, and the quartz microneedle also has wide application prospects in other fields.

[0072] Alternatively, the number of flow channels can be one or multiple. The number of flow channels can be designed according to actual conditions.

[0073] In some examples, the number of flow channels is one, the one flow channel is in communication with the cavities of the quartz needle bodies arranged in an array, and the one flow channel is internally provided with a valve. Alternatively, by controlling the valve, the opening and closing of the flow channel can be controlled to administer or stop administering the fluid into the cavities of the quartz needle bodies; alternatively, by controlling the valve, the flow rate of the fluid flowing through the flow channel can be adjusted to flexibly adjust the administration amount of the fluid into the cavities of the quartz needle bodies; alternatively, by controlling the valve, not only the opening and closing of the flow channel can be controlled, but also the flow rate of the fluid flowing through the flow channel can be adjusted, so as to control whether to administer the fluid into the cavities of the quartz needle bodies and control the administration amount.

[0074] In some examples, the number of flow channels is plural, each of the flow channels is independently communicated with one or more cavities, and at least one flow channel is provided with the valve.

[0075] It can be understood that when one flow channel is communicated with one cavity, the drug can be administered to the cavity through the flow channel; when one flow channel is communicated with multiple cavities, the drug can be administered to the multiple cavities through the flow channel. Alternatively, when the number of flow channels is plural, different fluids can be transmitted through different flow channels to achieve the distribution and release of multiple drugs from the cavities of the quartz needle-shaped bodies at different positions. Further alternatively, the flow channels transmitting different fluids are respectively provided with valves to achieve the controlled release of multiple drugs of the quartz needle-shaped bodies at different positions.

[0076] Alternatively, multiple flow channels can be communicated with the same cavity. At this time, different fluids can be transmitted through the multiple flow channels to mix the fluids in the same cavity to achieve the release of mixed drugs from the cavity of the quartz needle-shaped body at one position. Further alternatively, the flow channels transmitting different fluids are respectively provided with valves to achieve the control of the types of drugs of the mixed drugs and / or the proportions of various types of drugs.

[0077] Alternatively, the material of the valve 13 is an electrostrictive material. Please refer to Figure 3 The quartz micro-needle 01 further comprises a controller 14, and the controller 14 is electrically connected with the valve 13.

[0078] In the embodiment, the valve 13 comprises a first sub-valve 131 and a second sub-valve 132, and the controller 14 is electrically connected with the first sub-valve 131 and the second sub-valve 132 through wires.

[0079] It can be understood that the controller 14 comprises a power supply, and the valve is controlled by electrifying the power supply to apply voltage to the two stages of the valve. The electrostrictive material has different expansion and contraction sizes under different voltages, so as to control the valve and further achieve the opening and closing of the flow channel and / or the adjustment of the flow rate of the fluid flowing through the flow channel.

[0080] In the embodiment, please refer to Figure 1 The quartz needle-shaped bodies 12 are arranged in a 3x3 array on one side of the quartz substrate 11. In other embodiments, the quartz needle-shaped bodies can also be arranged in an nxm array on one side of the quartz substrate, where 1≤n≤50 and 1≤m≤50, for example, n is 1, 3, 5, 10, 20, 30, 40, or 50; and m is 1, 3, 5, 10, 20, 30, 40, or 50.

[0081] It can be understood that the shape and size of the quartz needle-shaped body can be customized according to requirements.

[0082] Optionally, the radial section of the quartz needle is a circular ring, the inner diameter is 40-400 μm, and the outer diameter is 50-500 μm. For example, the inner diameter is 40 μm, 80 μm, 100 μm, 200 μm, 300 μm, or 400 μm, and the outer diameter is 50 μm, 80 μm, 100 μm, 200 μm, 300 μm, 400 μm, or 500 μm.

[0083] Optionally, the radial section of the quartz needle is a circular ring, the inner diameter is 40-400 μm, and the outer diameter is 50-500 μm. For example, the inner diameter is 40 μm, 80 μm, 100 μm, 200 μm, 300 μm, or 400 μm, and the outer diameter is 50 μm, 80 μm, 100 μm, 200 μm, 300 μm, 400 μm, or 500 μm.

[0084] Optionally, the length of the quartz needle is 50-800 μm. For example, the length is 50 μm, 100 μm, 200 μm, 300 μm, 400 μm, 500 μm, 600 μm, 700 μm, or 800 μm.

[0085] Figure 4 For a scanning electron microscope image of an example quartz micro-needle, it can be seen that the quartz needles are arranged on one side of the quartz substrate and have cavities.

[0086] The quartz micro-needle of the present embodiment is resistant to acid, alkali, and corrosion, easy to clean, and not easily reacted with other substances, and is suitable for long-term administration according to a specific administration procedure multiple times. In the field of biomedicine, especially in the field of cell culture, the application prospect is good.

[0087] The present embodiment further provides a micro-nano processing preparation method for preparing the above-mentioned quartz micro-needle, and the preparation method comprises the following steps:

[0088] S1, referring to Figure 5 a first quartz plate 21 is provided, which has opposite first and second surfaces. The thickness of the first quartz plate can be selected according to the length of the quartz needle and the size of the flow channel.

[0089] It can be understood that the step of cleaning the first quartz plate is further included.

[0090] S2, forming quartz needles 12 arranged in an array and having cavities 121 on the first surface of the first quartz plate 21.

[0091] Optionally, the step of forming quartz needles arranged in an array and having cavities on the first surface of the first quartz plate comprises the following steps:

[0092] depositing a metal layer on the first surface;

[0093] coating the first photoresist on the metal layer to perform a first patterning process, and etching a portion of the first quartz plate corresponding to the exposed area of the first patterning process to form quartz needles arranged in an array and having holes.

[0094] coating a second photoresist on the first surface to perform a second patterning process to expose the holes, and etching a part of the first quartz plate at the bottom of the holes;

[0095] removing the metal layer to form the quartz needle-shaped body with cavities in an array.

[0096] Optionally, the metal layer is a Cr layer. The method of depositing the metal layer is evaporation. The thickness of the metal layer is 4-8 μm. For example, the thickness of the metal layer is 6 μm. By depositing the metal layer, the quartz needle-shaped body can be protected during subsequent etching of the first quartz plate.

[0097] Optionally, the first patterning process comprises the steps of baking, exposing and developing the coated first photoresist.

[0098] It can be understood that, during the exposing process, a mask plate with a pattern corresponding to the distribution of the quartz needle-shaped body is overlaid on the first photoresist to perform masking, and the first photoresist after masking is exposed to ultraviolet light under a mask exposure machine. During the developing process, part of the first photoresist is removed to expose the underlying first quartz plate.

[0099] Optionally, the second patterning process comprises the steps of baking, exposing and developing the coated second photoresist.

[0100] It can be understood that, during the exposing process, a mask plate with a pattern corresponding to the distribution of the holes of the quartz needle-shaped body is used to perform masking, and the second photoresist after masking is exposed to ultraviolet light under a mask exposure machine. During the developing process, part of the second photoresist is removed to expose the underlying first quartz plate.

[0101] Optionally, the etching method is plasma etching.

[0102] Through twice etching, the depth of the cavities is greater than the length of the quartz needle-shaped body, so as to be communicated with the flow channel subsequently.

[0103] S3, forming a first groove 211 on the second surface of the first quartz plate 21, the first groove 211 being communicated with the cavities 121;

[0104] Optionally, the step of forming the first groove on the second surface of the first quartz plate comprises the following steps:

[0105] coating a third photoresist on the second surface to perform a third patterning process, and etching a part of the first quartz plate corresponding to the exposed area of the third patterning process to form the first groove.

[0106] Optionally, the third patterning process comprises the steps of baking, exposing and developing the coated third photoresist.

[0107] It is understood that during the exposing process, a mask plate corresponding to the pattern of the first groove distribution can be covered on the third photoresist for masking, and then the third photoresist after the masking is exposed to ultraviolet light under a mask exposure machine. During the developing process, part of the third photoresist is removed to expose the underlying first quartz plate.

[0108] Optionally, the etching method is plasma etching.

[0109] S4, providing a second quartz plate 31 having a third surface corresponding to the second surface;

[0110] S5, forming a second groove 311 corresponding to the first groove 211 on the third surface.

[0111] Optionally, the step of forming a second groove corresponding to the first groove on the third surface comprises the following steps:

[0112] A fourth photoresist is coated on the third surface for fourth patterning process, and part of the second quartz plate corresponding to the exposed area of the fourth patterning process is etched to form a second groove.

[0113] Optionally, the fourth patterning process comprises the steps of baking, exposing and developing the coated fourth photoresist.

[0114] It is understood that during the exposing process, a mask plate corresponding to the pattern of the second groove distribution can be covered on the fourth photoresist for masking, and then the fourth photoresist after the masking is exposed to ultraviolet light under a mask exposure machine. During the developing process, part of the fourth photoresist is removed to expose the underlying second quartz plate.

[0115] Optionally, the etching method is plasma etching.

[0116] S6, forming a first sub-valve (not shown in the figure) in the first groove, and forming a second sub-valve (not shown in the figure) at the corresponding position of the second groove, and the first and second sub-valves can be combined to form a valve. Figure 5 Figure 5 Optionally, the step of forming a first sub-valve in the first groove and forming a second sub-valve at the corresponding position of the second groove comprises the following steps:

[0117] Optionally, the step of forming a first sub-valve in the first groove and forming a second sub-valve at the corresponding position of the second groove comprises the following steps:

[0118] A fifth photoresist is coated in the first groove for fifth patterning process to expose the valve position area of the first groove; ​

[0119] depositing electrostrictive material on the first recess to form a first electrostrictive layer;

[0120] removing the fifth photoresist to obtain the first recess with a first sub-valve;

[0121] coating a sixth photoresist on the second recess to perform a sixth patterning process to expose a valve position area of the second recess, the valve position area of the second recess corresponding to the valve position area of the first recess;

[0122] depositing electrostrictive material on the second recess to form a second electrostrictive layer;

[0123] removing the sixth photoresist to obtain the second recess with a second sub-valve.

[0124] Optionally, the fifth patterning process comprises the steps of baking, exposing and developing the coated fifth photoresist.

[0125] It can be understood that when the exposing process is performed, a mask corresponding to the distribution of the valve position area can be covered on the fifth photoresist to perform masking, and then the fifth photoresist after the masking is exposed to ultraviolet light under a mask exposure machine. When the developing process is performed, part of the fifth photoresist is removed to expose the underlying first recess.

[0126] It can be understood that when the electrostrictive material is deposited on the first recess to form the first electrostrictive layer, the first electrostrictive layer covers the fifth photoresist and the valve position area of the first recess. After the fifth photoresist is removed, the first electrostrictive layer above the fifth photoresist is also removed, leaving the first electrostrictive layer at the valve position area to obtain the first recess with the first sub-valve.

[0127] Optionally, the sixth patterning process comprises the steps of baking, exposing and developing the coated sixth photoresist.

[0128] It can be understood that when the exposing process is performed, a mask corresponding to the distribution of the valve position area can be covered on the sixth photoresist to perform masking, and then the sixth photoresist after the masking is exposed to ultraviolet light under a mask exposure machine. When the developing process is performed, part of the sixth photoresist is removed to expose the underlying second recess.

[0129] It can be understood that when the electrostrictive material is deposited on the second recess to form the second electrostrictive layer, the second electrostrictive layer covers the sixth photoresist and the valve position area of the second recess. After the sixth photoresist is removed, the second electrostrictive layer above the sixth photoresist is also removed, leaving the second electrostrictive layer at the valve position area to obtain the second recess with the second sub-valve.

[0130] In the embodiment, the first self-valve and the second self-valve can present different sizes under different voltages, so as to realize the opening and closing of the flow channel and / or adjust the flow rate of the fluid flowing through the flow channel.

[0131] Optionally, the method further comprises the step of providing a controller and electrically connecting the controller to the first sub-valve and the second self-valve through wires.

[0132] In other embodiments, a valve can also be formed in the first groove.

[0133] Optionally, a fifth photoresist is coated in the first groove for fifth photopatterning to expose the valve position area of the first groove;

[0134] A electrostrictive material is deposited on the first groove to form an electrostrictive layer.

[0135] The fifth photoresist is removed to obtain the first groove with a valve.

[0136] The valve can be electrically connected to a controller through wires, and the valve presents different sizes under different voltages, so as to realize the opening and closing of the flow channel and / or adjust the flow rate of the fluid flowing through the flow channel.

[0137] In other embodiments, a valve can also be formed in the second groove.

[0138] Forming a valve in the second groove includes the following steps:

[0139] Optionally, a sixth photoresist is coated in the second groove for sixth photopatterning to expose the valve position area of the second groove;

[0140] A electrostrictive material is deposited on the second groove to form an electrostrictive layer.

[0141] The sixth photoresist is removed to obtain the second groove with a valve.

[0142] The valve can be electrically connected to a controller through wires, and the valve presents different sizes under different voltages, so as to realize the opening and closing of the flow channel and / or adjust the flow rate of the fluid flowing through the flow channel.

[0143] The fifth photopatterning and the sixth photopatterning are as described above, and will not be described here.

[0144] S7, the first quartz plate and the second quartz plate are combined and connected in a manner that the second surface and the third surface are in contact, so that the first groove 211 and the second groove 311 form a flow channel 111 provided with the valve, to form a quartz substrate 11 carrying quartz needle-shaped bodies arranged in an array.

[0145] Compared with silicon material, quartz cannot be obtained by 3D printing or thermoplastic extrusion stretching. The embodiment can etch quartz needle-shaped bodies and cavities inside the quartz needle-shaped bodies, and can etch flow channels and valves by the micro-nano processing method, and further prepare quartz needle-shaped bodies in array distribution with micron-level precision, for batch cell reaction, and further realize batch biomedical experiments or clinical applications.

[0146] The technical features of the above-described embodiments can be combined in any manner. To make the description concise, all possible combinations of the technical features in the above-described embodiments are not described, but as long as the combinations of the technical features do not exist, they should be considered as within the scope of the present disclosure.

[0147] The above-described embodiments only express several embodiments of the present application, and the description is more specific and detailed, but it should not be understood as a limitation on the scope of the patent. It should be pointed out that for ordinary skilled in the art, without departing from the concept of the present application, a number of modifications and improvements can be made, which are within the scope of the present application. Therefore, the scope of protection of the present application should be subject to the appended claims.

Claims

1. A method for preparing a quartz microneedle, characterized by, Includes the following steps: A first quartz plate is provided, the first quartz plate having opposing first and second surfaces; Quartz needles with cavities are formed in an array on the first surface of the first quartz plate; A first groove is formed on the second surface of the first quartz plate, and the first groove communicates with the cavity; A second quartz plate is provided, the second quartz plate having a third surface corresponding to the second surface; A second groove corresponding to the first groove is formed on the third surface; A valve is formed in the first groove, or in the second groove, or a first sub-valve is formed in the first groove and a second sub-valve is formed at the corresponding position in the second groove, wherein the first sub-valve and the second sub-valve can be combined to form a valve; The first quartz plate and the second quartz plate are joined together in such a way that the second surface and the third surface are in contact, so that the first groove and the second groove form a flow channel in which the valve is provided, thereby forming a quartz substrate carrying quartz needles distributed in an array.

2. The method of claim 1, wherein the quartz microneedle is prepared by the steps of: The process of forming quartz needle-like bodies in an array and having cavities on the first surface of the first quartz plate includes the following steps: A first photoresist is coated on the first surface to perform a first patterning process, and a portion of the first quartz plate corresponding to the exposed area of ​​the first patterning process is etched to form quartz needles that are distributed in an array and have holes. A second photoresist is coated on the first surface to perform a second patterning process to expose the hole, and a portion of the first quartz plate at the bottom of the hole is etched to form quartz needles that are distributed in an array and have cavities.

3. The method of claim 2, wherein the quartz microneedle is prepared by the steps of: The process of coating the first photoresist onto the first surface includes the following steps: ​ A metal layer is deposited on the first surface; The first photoresist is coated on the metal layer.

4. The method of claim 3, wherein the quartz microneedle is prepared by the steps of: preparing a quartz glass rod; cutting the quartz glass rod to a predetermined length; and polishing the cut quartz glass rod to a predetermined diameter. After etching a portion of the first quartz plate at the bottom of the hole, the process further includes the step of removing the metal layer.

5. The method for preparing quartz microneedles according to any one of claims 1 to 4, characterized in that, The process of forming a first groove on the second surface of the first quartz plate includes the following steps: A third photoresist is coated onto the second surface to perform a third patterning process, and a portion of the first quartz plate corresponding to the exposed area of ​​the third patterning process is etched to form a first groove; and / or The step of forming a second groove on the third surface corresponding to the first groove includes the following steps: A fourth photoresist is coated on the third surface to perform a fourth patterning process, and a portion of the second quartz plate corresponding to the exposed area of ​​the fourth patterning process is etched to form a second groove.

6. The method for preparing quartz microneedles according to any one of claims 1 to 4, characterized in that, The process of forming a valve in the first groove includes the following steps: A fifth photoresist is coated in the first groove to perform a fifth patterning process to expose the valve position area of ​​the first groove; An electrostrictive material is deposited on the first groove to form an electrostrictive layer; The fifth photoresist is removed to obtain a first groove with a valve.

7. The method for preparing quartz microneedles according to any one of claims 1 to 4, characterized in that, Forming a valve in the second groove includes the following steps; A sixth photoresist is coated in the second groove to perform a sixth patterning process to expose the valve location area of ​​the second groove; An electrostrictive material is deposited on the second groove to form an electrostrictive layer; The sixth photoresist is removed to obtain a second groove with a valve.

8. The method for preparing quartz microneedles according to any one of claims 1 to 4, characterized in that, The process of forming a first sub-valve in the first groove and forming a second sub-valve at the corresponding position in the second groove includes the following steps: A fifth photoresist is coated in the first groove to perform a fifth patterning process to expose the valve position area of ​​the first groove; An electrostrictive material is deposited on the first groove to form a first electrostrictive layer; Remove the fifth photoresist to obtain a first groove with a first sub-valve; A sixth photoresist is coated in the second groove to perform a sixth patterning process to expose the valve position area of ​​the second groove, and the valve position area of ​​the second groove corresponds to the valve position area of ​​the first groove. An electrostrictive material is deposited on the second groove to form a second electrostrictive layer; The sixth photoresist is removed to obtain a second groove with a second sub-valve.

9. The method for preparing quartz microneedles according to claim 1, characterized in that, There are multiple flow channels, each of which is independently connected to one or more cavities, and at least one flow channel is equipped with the valve.

10. The method for preparing quartz microneedles according to claim 1, characterized in that, The valve is made of an electrostrictive material, and the quartz microneedle also includes a controller, which is electrically connected to the valve.

11. The method for preparing quartz microneedles according to claim 1, characterized in that, The quartz needle-like body satisfies at least one of the following characteristics: (1) The radial cross-section of the quartz needle is annular, with an inner diameter of 40μm~400μm and an outer diameter of 50μm~500μm; (2) The radial cross-sections of the quartz needle-like bodies are all the same size; (3) The length of the quartz needle is 50μm~800μm.

12. A quartz microneedle, characterized in that, It is prepared by any one of the preparation methods according to claims 1 to 11.

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