A batch preparation device and synthesis process of an N-doped Pt-based catalyst-rich

Abstract

The application discloses a batch preparation device and a synthesis process of a Pt-based catalyst rich in N doping, wherein a partition plate is introduced into a preparation bin, the preparation bin can be divided into two spaces with variable volumes through the partition plate, so that the preparation and the discharge are synchronously performed, and the two spaces positively affect each other, the space utilization efficiency of the preparation bin is fully improved, the preparation efficiency is improved, in addition, the first material uniformizing component and the second material uniformizing component can well uniformly distribute materials, and the preparation effect is ensured.

Description

TECHNICAL FIELD

[0001] The application relates to the technical field of catalyst preparation, in particular to a batch preparation device and synthesis process of a Pt-based catalyst rich in N doping. BACKGROUND

[0002] The Pt-based catalyst refers to a catalyst with platinum (Pt) as an active component, and the Pt-based catalyst rich in N doping is a catalyst with platinum (Pt) as a basis and with nitrogen (N) elements doped to improve the catalytic performance. At present, the reaction kettle cannot fully utilize the preparation space when preparing the Pt-based catalyst rich in N doping, and the uniform material and batching effect is general.

[0003] Therefore, it is necessary to develop a batch preparation device and synthesis process of a Pt-based catalyst rich in N doping to solve the above problems. SUMMARY

[0004] To achieve the above-mentioned purpose, the application provides the following technical scheme: a batch preparation device of a Pt-based catalyst rich in N doping, comprising:

[0005] A preparation bin has a first discharge pipe and a second discharge pipe which are symmetrically distributed;

[0006] A heating ring is sleeved outside the preparation bin for heating the inside of the preparation bin;

[0007] A first uniform material assembly is communicated in the preparation bin and close to the first discharge pipe;

[0008] A second uniform material assembly is communicated in the preparation bin and close to the second discharge pipe; and a partition plate is sealingly and slidingly arranged in the preparation bin.

[0009] Further, as a preferred, the first uniform material assembly and the second uniform material assembly are alternately operated.

[0010] Further, as a preferred, two limiting rings symmetrically arranged are embedded in the preparation bin for limiting the movement range of the partition plate.

[0011] Further, as a preferred, two vibration plates symmetrically arranged are embedded in the preparation bin, and a generator for vibrating the vibration plates is further arranged outside the preparation bin.

[0012] Further, as a preferred, a plurality of extension plates are fixed on the surface of the vibration plate.

[0013] Further, as a preferred, the first uniform material assembly and the second uniform material assembly are the same in structure and each comprises:

[0014] A uniform material bin has a feeding pipe at the top.

[0015] a homogenizing impeller, which is rotatably arranged in the homogenizing bin;

[0016] a homogenizing pipe, one end of which is connected to the homogenizing bin and the other end of which is communicated to the preparation bin;

[0017] a pump body, the inlet of which is connected to the homogenizing bin and the outlet of which is communicated with a backflow pipe, which is communicated to the homogenizing bin; and

[0018] a temperature controller, which is used for controlling the temperature of the backflow pipe.

[0019] Further, as preferred, one side of the homogenizing pipe is communicated with an extension bin, the upper part of the extension bin is communicated with a discharging bin, the bottom of the discharging bin is provided with a discharging port, a discharging baffle is slidably arranged in the discharging port, the discharging baffle is L-shaped, and the discharging baffle is driven to slide to achieve the plugging or unplugging of the discharging port.

[0020] The homogenizing pipe and the extension bin are jointly provided with a self-discharging assembly for driving the discharging baffle to slide.

[0021] Further, as preferred, the self-discharging assembly comprises:

[0022] a self-rotating impeller, which is rotatably arranged in the homogenizing pipe and can be driven to rotate when the liquid in the homogenizing bin flows downward naturally;

[0023] a raking wheel, which is rotatably arranged in the extension bin and can drive the discharging baffle to move when the raking wheel rotates; and

[0024] a synchronous belt, which is used for driving connection of the self-rotating impeller and the raking wheel.

[0025] A synthesis process of a Pt-based catalyst rich in N doping, comprising the following steps:

[0026] S1. Preparing a Pt / C catalyst: a Pt / C catalyst is prepared, in which Pt nanoparticles are loaded on a carbon carrier;

[0027] S2. Preparing an N source precursor: a compound such as polyaniline, melamine, dopamine, etc. is selected as an N source precursor;

[0028] S3. Coating the N source precursor: an N source precursor solution or suspension is added to the P / C catalyst, so that it interacts with the surface of the Pt / C catalyst to be coated on the surface of the Pt / C catalyst;

[0029] S4. In-situ carbonization: the Pt / C catalyst coated with the N source precursor is subjected to carbonization treatment under in-situ conditions.

[0030] Compared with the prior art, the application provides a batch preparation device and a synthesis process of an N-doped Pt-based catalyst, and has the following beneficial effects:

[0031] In the embodiment of the application, a partition plate is introduced into the preparation bin, which can divide the preparation bin into two spaces with variable volumes, so as to synchronize preparation and discharge, and the two processes positively affect each other, thereby fully improving the space utilization efficiency of the preparation bin, improving the preparation efficiency, and the first and second material uniformizing components can well uniformize the material, thereby ensuring the preparation effect. BRIEF DESCRIPTION OF DRAWINGS

[0032] Figure 1 It is a structural schematic view of a batch preparation device of an N-doped Pt-based catalyst;

[0033] Figure 2 It is a structural schematic view of a first material uniformizing component in a batch preparation device of an N-doped Pt-based catalyst;

[0034] Figure 3 It is an enlarged structural schematic view of A in Figure 2

[0035] In the figure: 1, preparation bin; 2, partition plate; 3, first discharge pipe; 4, second discharge pipe; 5, first material uniformizing component; 6, second material uniformizing component; 7, limiting ring; 8, vibrating plate; 9, extension plate; 10, generator; 51, material uniformizing bin; 52, material uniformizing impeller; 53, material uniformizing pipe; 54, self-rotating impeller; 55, extension bin; 56, material stirring wheel; 57, synchronous belt; 58, discharging bin; 59, discharging baffle; 510, pump body; 511, backflow pipe; 512, temperature controller. DETAILED DESCRIPTION

[0036] Please refer to Figures 1-3 In the embodiment of the application, a batch preparation device of an N-doped Pt-based catalyst is provided, which comprises:

[0037] The preparation bin 1 has the first discharge pipe 3 and the second discharge pipe 4 which are symmetrically distributed, and the preparation bin 1 is preferably in a horizontal structure, which is convenient for placement and installation;

[0038] The heating ring is sleeved outside the preparation bin 1 and is used for heating the inside of the preparation bin 1. The heating ring can be an electric resistance type heating ring or a far-infrared electric heating ring. In the case of the far-infrared electric heating ring, the far-infrared electric heating ring uniformly radiates heat into the preparation bin 1 by using the electric heating mode combined with the far-infrared technology, and is a radiation type heating ring.

[0039] ​a first material uniformizing component 5, which is connected to the preparation bin 1 and is close to the first discharging pipe 3;

[0040] a second material uniformizing component 6, which is connected to the preparation bin 1 and is close to the second discharging pipe 4; and

[0041] a partition plate 2, which is sealingly and slidingly arranged in the preparation bin 1.

[0042] In this embodiment, the partition plate is arranged in the preparation bin 1, which can divide the preparation bin into two spaces with variable volumes, so as to synchronize the preparation and discharging, and the two spaces can positively affect each other, which can improve the space utilization efficiency of the preparation bin and the preparation efficiency. Specifically:

[0043] In this embodiment, as shown in Figure 1 , the partition plate 2 divides the preparation bin 1 into two spaces with variable volumes, i.e., a first space and a second space. When the first space increases, the second space decreases, and when the first space decreases, the second space increases. Figure 1 In this embodiment, the left side is the first space, and the right side is the second space. Figure 1 In this embodiment, the first space is small, and the second space is large. At this time, the first material uniformizing component 5 is used to inject the material into the first space, and the second material uniformizing component 6 stops injecting the material into the second space, i.e., the first material uniformizing component 5 and the second material uniformizing component 6 are alternately operated. At this time, since the first space is gradually injected with the material by the first material uniformizing component 5, the first space gradually increases, and the material in the second space is gradually discharged through the second discharging pipe 4, so the second space gradually decreases. Since the first space gradually increases with the gradual increase of the material, the first space can maintain a reasonable space range to accommodate the material from the first material uniformizing component 5, so as to ensure the uniformity of the mixture.

[0044] As a preferred embodiment, two limiting rings 7 are embedded in the preparation bin 1 and are symmetrically arranged, which are used to limit the moving range of the partition plate 2. The main function is to reserve the minimum values of the first space and the second space, so that the space sizes are not zero, which is convenient for the first material uniformizing component 5 and the second material uniformizing component 6 to smoothly supply the material.

[0045] In order to improve the uniformity of the liquid in the preparation bin 1, two vibration plates 8 are embedded in the preparation bin 1 and are symmetrically arranged. The outside of the preparation bin 1 is also provided with a generator 10 for vibrating the vibration plates 8. The vibration plates vibrate at high frequency under the mechanical vibration of the generator, so as to be transmitted to the preparation bin 1, thereby improving the uniformity of the liquid in the preparation bin 1.

[0046] As a preferred embodiment, a plurality of extension plates 9 are fixed to the surface of the vibration plate 8.

[0047] In the embodiment, the first material uniformizing assembly 5 and the second material uniformizing assembly 6 are identical in structure, and each comprises:

[0048] a material uniformizing bin 51 provided with a feeding pipe at the top;

[0049] a material uniformizing impeller 52 rotatably arranged in the material uniformizing bin 51;

[0050] a material uniformizing pipe 53 connected to the material uniformizing bin 51 at one end and communicated to the preparation bin 1 at the other end;

[0051] a pump body 510 connected to the material uniformizing bin 51 at the liquid inlet end and communicated with a backflow pipe 511 at the liquid outlet end, the backflow pipe 511 being communicated to the material uniformizing bin 51; and

[0052] a temperature controller 512 for controlling the temperature of the backflow pipe 511.

[0053] In implementation, the polyaniline, melamine, dopamine and water can be fed into the material uniformizing bin 51 through the feeding pipe, and the polyaniline, melamine, dopamine and water can be fully stirred by the material uniformizing impeller 52, so that the polyaniline, melamine, dopamine and water can be uniformly distributed in the water, and in this process, the pump body 510 can flow the polyaniline, melamine, dopamine and water to ensure the mixing effect.

[0054] In the embodiment, one side of the material uniformizing pipe 53 is communicated with an extension bin 55, the upper portion of the extension bin 55 is communicated with a discharging bin 58, the bottom of the discharging bin 58 is provided with a discharging opening, a discharging baffle 59 is slidably arranged in the discharging opening, the discharging baffle 59 is L-shaped, and the discharging baffle 59 is driven to slide to achieve the plugging or unplugging of the discharging opening.

[0055] The material uniformizing pipe 53 and the extension bin 55 are jointly provided with a self-discharging assembly for driving the discharging baffle 59 to slide.

[0056] In addition, the self-discharging assembly comprises:

[0057] a self-rotating impeller 54 rotatably arranged in the material uniformizing pipe 53 and capable of driving the self-rotating impeller 54 to rotate when the liquid in the material uniformizing bin 51 flows downward naturally;

[0058] a poking wheel 56 rotatably arranged in the extension bin 55 and capable of driving the discharging baffle 59 to move when the poking wheel 56 rotates; and

[0059] a synchronous belt 57 for drivingly connecting the self-rotating impeller 54 and the poking wheel 56.

[0060] In implementation, a valve body can be arranged on the uniform material pipe 53, after the valve body is opened, the liquid in the uniform material bin 51 flows downward, thereby impacting the self-rotating impeller 54, so that the self-rotating impeller 54 rotates, and under the action of the synchronous belt 57, the poking wheel 56 rotates, and the poking wheel 56 can poke the discharging baffle 59 in the rotating process, so that the discharging baffle 59 unblocks the discharging port, thereby realizing the discharging of the Pt / C catalyst, and when the poking wheel 56 continues to rotate, the discharging baffle 59 is reset under the action of the spring;

[0061] It should be noted that the discharging speed of the Pt / C catalyst is matched with the discharging speed of the uniform material bin 51, so that the preparation effect can be improved;

[0062] A synthesis process of a Pt-based catalyst rich in N doping, comprising the following steps:

[0063] S1. Preparing Pt / C catalyst: preparing Pt / C catalyst, wherein Pt nanoparticles are loaded on a carbon carrier;

[0064] S2. Preparing N source precursor: polyaniline, melamine, dopamine and the like compounds are selected as the N source precursor;

[0065] S3. Coating N source precursor: the N source precursor solution or suspension is added to the P / C catalyst, so as to interact with the surface of the Pt / C catalyst, so as to be coated on the surface of the Pt / C catalyst;

[0066] S4. In-situ carbonization: the Pt / C catalyst coated with the N source precursor is subjected to carbonization treatment under in-situ conditions.

[0067] The above is only a preferred specific embodiment of the present application, but the protection scope of the present application is not limited thereto, any person skilled in the art can make equivalent replacement or change according to the technical solution and the inventive concept of the present application within the technical range disclosed by the present application, which should be covered in the protection scope of the present application.

Claims

1. A batch preparation device for a Pt-based catalyst enriched with N-doping, characterized in that: The preparation bin (1) has a first discharge pipe (3) and a second discharge pipe (4) arranged symmetrically at the bottom thereof; A heating ring is sleeved outside the preparation bin (1) and used for heating the inside of the preparation bin (1); A first material uniformizing assembly (5) and a second material uniformizing assembly (6) are arranged at the top of the preparation bin (1) and communicate with the preparation bin (1), and the first material uniformizing assembly (5) and the second material uniformizing assembly (6) are located at the same side of the first discharge pipe (3) and the second discharge pipe (4) respectively; A partition plate (2) is sealingly and slidably arranged in the preparation bin (1), and the partition plate (2) is located between the first discharge pipe (3) and the second discharge pipe (4); The first material uniformizing assembly (5) and the second material uniformizing assembly (6) are alternately operated; Two limiting rings (7) are embedded in the preparation bin (1) and arranged symmetrically, and used for limiting the moving range of the partition plate (2) to not exceed the first discharge pipe (3) and the second discharge pipe (4); Two vibration plates (8) are embedded in the preparation bin (1) and arranged symmetrically, and located at the sides of the first discharge pipe (3) and the second discharge pipe (4) away from the limiting rings (7), and a generator (10) for vibrating the vibration plates (8) is further arranged outside the preparation bin (1); The first material uniformizing assembly (5) and the second material uniformizing assembly (6) are the same in structure and each include: A material uniformizing bin (51) has a feeding pipe at the top thereof; A material uniformizing impeller (52) is rotatably arranged in the material uniformizing bin (51); A material uniformizing pipe (53) is connected with the material uniformizing bin (51) at one end and communicates with the preparation bin (1) at the other end; A pump body (510) is connected with the material uniformizing bin (51) at the liquid inlet end and has a return pipe (511) connected with the liquid outlet end, and the return pipe (511) communicates with the material uniformizing bin (51); A temperature controller (512) is used for controlling the temperature of the return pipe (511). A plurality of extension plates (9) are fixed to the surface of the vibration plate (8).

2. A device for batch preparation of a N-doped Pt-based catalyst according to claim 1, characterized in that: An extension bin (55) is connected with one side of the material uniformizing pipe (53), a discharging bin (58) is connected above the extension bin (55), the bottom of the discharging bin (58) has a discharging opening, a discharging baffle (59) is slidably arranged in the discharging opening in a resettable manner, the discharging baffle (59) is L-shaped, and the discharging baffle (59) is driven to slide to achieve the plugging or unplugging of the discharging opening; 3. A device for batch preparation of N-doped Pt-based catalysts according to claim 1, characterized in that: A self-discharging assembly is arranged in the material uniformizing pipe (53) and the extension bin (55) and used for driving the discharging baffle (59) to slide. The self-discharging assembly includes:

4. A device for batch production of a Pt-based catalyst enriched with N-dopant according to claim 3, characterized in that: A self-rotating impeller (54) is rotatably arranged in the material uniformizing pipe (53) and can be driven to rotate when the liquid in the material uniformizing bin (51) naturally flows downward; A poking wheel (56) is rotatably arranged in the extension bin (55) and can drive the discharging baffle (59) to move when the poking wheel (56) rotates. ​ A synchronous belt (57) for drivingly connecting the self-rotating impeller (54) and the paddle wheel (56).

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