Anti-glare processing method of high-alumina glass

Abstract

The application discloses a high-aluminum glass anti-glare treatment method, relates to the technical field of anti-glare glass, and provides the treatment method, which can not only make the high-aluminum glass have the anti-glare function, but also make the prepared anti-glare glass have the characteristics of high transmittance, low roughness and high glossiness; and the roughness, glossiness and other optical parameters of the anti-glare glass can be adjusted according to different user requirements by adjusting etching time and polishing time.

Description

Technical field:

[0001] The invention relates to the technical field of anti-glare glass, and in particular to an anti-glare processing method for high-aluminum glass. Background technology:

[0002] Anti-glare glass (AG glass for short) is a glass surface that undergoes a special chemical treatment, transforming the original glass surface into a matte, diffusely reflective surface. AG glass works by treating one or both sides of high-quality glass to achieve a lower reflectance than ordinary glass. This reduces interference from ambient light, improves image clarity, and reduces screen reflections, creating a clear and transparent visual effect for consumers with a better visual experience. Due to its high aluminum oxide content, high-aluminum glass offers excellent mechanical properties, chemical stability, high transmittance, strong scratch resistance, impact resistance, crack resistance, and strong drop resistance. After anti-glare treatment, it has a broad market application in mobile phone displays, tablet computers, outdoor information display boards, plasma displays, large glass showcases, and other fields.

[0003] Currently, there are three relatively mature anti-glare glass processing methods: film coating, spray coating, and etching. AG film glass has poor weather resistance and wear resistance, and the film layer is prone to falling off. In addition, the hardness of the glass surface film is not high, and severe surface scratches will appear after a period of use. AG spray-coated glass also has poor weather resistance and wear resistance, and is not suitable for use on frequently touched and rubbed screen glass. It is prone to coating shedding and fat dissolution, resulting in screen problems. Chemical etching is simple and easy to operate, suitable for large-area glass etching and large-scale production. In the production process of AG glass, factors such as the chemical composition of the etching solution, etching time, and etching temperature will affect the surface roughness and glossiness of the glass after etching, which is related to the actual use value of the product. In view of the advantages and disadvantages of AG glass processing methods, it is of great significance to study the processing methods of high-aluminum AG glass. Summary of the invention:

[0004] The technical problem to be solved by the present invention is to provide an anti-glare treatment method for high-aluminum glass. Through conventional pretreatment, etching, polishing and cleaning processes, anti-glare treatment of high-aluminum glass is achieved, so that the prepared anti-glare glass has the characteristics of high transmittance, low roughness and high gloss.

[0005] The technical problem to be solved by the present invention is achieved by adopting the following technical solutions:

[0006] A method for anti-glare treatment of high-aluminum glass comprises the following steps:

[0007] (1) Pretreatment: Cleaning high aluminum glass;

[0008] (2) Etching: Place the prepared etching solution in the etching tank, apply a protective film to the side of the high-aluminum glass that does not need to be etched, and then immerse it in the etching solution;

[0009] (3) Polishing: Rinse the etched high-aluminum glass with distilled water and then place it in a polishing solution for chemical polishing;

[0010] (4) Cleaning: Rinse the polished high-aluminum glass with distilled water, cleaning solution, and distilled water in sequence, remove the protective film, and dry it to constant weight to obtain anti-glare glass.

[0011] The cleaning process includes sequentially immersing in an organic solvent, rinsing with distilled water, immersing in an acid solution, and rinsing with distilled water. This cleaning minimizes the impact of oil and dust on the glass surface during processing and transportation on subsequent processing. The immersion process can be performed under ultrasound.

[0012] Preferably, the organic solvent is anhydrous ethanol or acetone.

[0013] Preferably, the acid solution is dilute sulfuric acid with a mass concentration of 1 to 3%.

[0014] The etching solution is prepared by mixing component A and component B in a mass ratio of 1:2 and adding nitric acid to adjust the pH to 2-3; wherein component A is prepared by mixing ammonium bifluoride, potassium fluoride, barium sulfate, potassium nitrate, zinc acetate and oxalic acid in a mass ratio of (50-100):(10-15):(3-5):(15-25):(10-30):(5-10); and component B is prepared by mixing a surfactant, sodium carboxymethyl starch, an emulsifier, a dispersant, a pH regulator and distilled water in a mass ratio of (1-3):(2-5):(5-10):(5-10):(10-20):(400-600).

[0015] The protective film can be any commonly used protective film in the art, preferably a polyethylene film.

[0016] The surfactant can be selected from commonly used surfactants in the art, including but not limited to cetyltrimethylammonium bromide.

[0017] The emulsifier can be selected from commonly used emulsifiers in the art, including but not limited to lauryl alcohol polyoxyethylene ether and allyloxy polyoxyethylene ether.

[0018] The dispersant may be any commonly used dispersant in the art, including but not limited to polyvinyl alcohol.

[0019] The pH regulator can be selected from commonly used pH regulators in the art, including but not limited to sodium hexametaphosphate and sodium tripolyphosphate.

[0020] The etching temperature is 25° C. and the etching time is 2 to 10 minutes.

[0021] The polishing liquid is prepared by mixing hydrofluoric acid and sulfuric acid, wherein the mass concentration of the hydrofluoric acid is 5-10%, and the mass concentration of the sulfuric acid is 10-20%.

[0022] The polishing time is 30 to 120 seconds.

[0023] During the rinsing, the water column of the distilled water or the cleaning liquid is at an angle of 45 to 60 degrees to the glass surface.

[0024] The cleaning solution includes the following components: 5-10 g / L of sodium hydroxide, 5-10 g / L of anhydrous sodium carbonate, 1-3 g / L of sodium citrate, 1-3 g / L of citric acid, 0.5-1 g / L of ethylenediaminetetramethylenephosphonic acid, 0.2-0.5 g / L of sodium lauryl sulfate, 0.2-0.5 g / L of ethylene glycol, and 0.1-0.3 g / L of tributyl phosphate.

[0025] The surface roughness of the anti-glare glass is 0.05-0.1 μm, and the 60° glossiness is 110-120.

[0026] The beneficial effects of the present invention are:

[0027] 1. The present invention utilizes hydrofluoric acid generated by the reaction of fluoride and nitric acid to directly and effectively etch the glass, avoiding the direct use of highly corrosive hydrofluoric acid and improving process safety.

[0028] 2. The high aluminum glass of the present invention is rinsed with a cleaning solution after being etched. Compared with directly rinsing with distilled water, the surface of the anti-glare glass obtained is cleaner.

[0029] 3. The processing method provided by the present invention not only enables high-aluminum glass to have anti-glare function, but also enables the prepared anti-glare glass to have the characteristics of high transmittance, low roughness and high gloss; and it can also adjust the optical parameters such as roughness and glossiness of the anti-glare glass by adjusting the etching time and polishing time according to different user requirements. Specific implementation method:

[0030] In order to make the technical means, creative features, objectives and effects achieved by the present invention easier to understand, the present invention is further described below in conjunction with specific embodiments.

[0031] The high-aluminum glass used in the following examples and comparative examples is high-aluminum glass of the same model and the same batch from the same manufacturer; the polyvinyl alcohol used is polyvinyl alcohol 1799.

[0032] Examples 1-3

[0033] (1) Pretreatment: The high-aluminum glass was soaked in anhydrous ethanol, rinsed with distilled water, soaked in dilute sulfuric acid (mass concentration 3%), and rinsed with distilled water in sequence.

[0034] (2) Etching: Place the prepared etching solution in an etching tank, attach a polyethylene film to the side of the high-aluminum glass that does not need to be etched, and then immerse it in the etching solution. The etching temperature is 25°C and the etching time is 8 minutes. The etching solution is prepared by mixing component A and component B in a mass ratio of 1:2 and then adding nitric acid to adjust the pH to 2-3. Component A is a mixture of ammonium bifluoride, potassium fluoride, barium sulfate, potassium nitrate, zinc acetate, and oxalic acid in a mass ratio of (50-100):12:4:20:20:5. Component B is a mixture of hexadecyltrimethylammonium bromide, sodium carboxymethyl starch, lauryl alcohol polyoxyethylene ether, polyvinyl alcohol, sodium hexametaphosphate, and distilled water in a mass ratio of 1:2.5:5:5:15:500.

[0035] (3) Polishing: Rinse the etched high-aluminum glass with distilled water and then place it in a polishing solution for chemical polishing. The polishing solution is a mixture of hydrofluoric acid and sulfuric acid. The mass concentration of hydrofluoric acid is 5%, and the mass concentration of sulfuric acid is 10%. The polishing time is 60s.

[0036] (4) Cleaning: Rinse the polished high-aluminum glass with distilled water, cleaning solution, and distilled water in sequence. During rinsing, the water column of the distilled water and cleaning solution is at 60 degrees to the glass surface. Remove the protective film and dry to constant weight to obtain anti-glare glass. The cleaning solution includes the following components: 6.75 g / L sodium hydroxide, 8.5 g / L anhydrous sodium carbonate, 1 g / L sodium citrate, 1.25 g / L citric acid, 1 g / L ethylenediaminetetramethylenephosphonic acid, 0.25 g / L sodium lauryl sulfate, 0.25 g / L ethylene glycol, and 0.15 g / L tributyl phosphate.

[0037] By adjusting the ammonium bifluoride content in the etching solution, Examples 1-3 were obtained. Specifically, the ammonium bifluoride content in the etching solution used in Example 1 was 5% by weight, the ammonium bifluoride content in the etching solution used in Example 2 was 6% by weight, and the ammonium bifluoride content in the etching solution used in Example 3 was 7% by weight.

[0038] Comparative Example 1

[0039] The only difference between Comparative Example 1 and Examples 1-3 is that the mass content of ammonium bifluoride in the etching solution is adjusted to 9%.

[0040] The roughness and glossiness of the high aluminum glass after the anti-glare treatment of Examples 1-3 and Comparative Example 1 were measured respectively. The results are shown in Table 1.

[0041] Table 1

[0042] Ammonium bifluoride content / % Roughness / μm Gloss value Example 1 5 0.08 115 Example 2 6 0.08 110 Example 3 7 0.06 113 Comparative Example 1 9 0.15 127

[0043] It can be seen from Table 1 that as the NH4HF2 content in the etching solution increases from 5% to 7%, the NH4 + The concentration of NH4 + SiF6 generated in the etching solution 2+ This can form the more soluble (NH4)2SiF6, resulting in smaller crystallites on the glass surface. This also prevents the formation of less soluble K2SiF6, resulting in fewer large-sized crystallites. Consequently, the glass surface roughness decreases, with more uniform bumps forming, lowering light reflectivity and reducing gloss. When the NH4HF2 content continues to increase to 9%, a layer of white material forms on the glass surface, reducing the glass's transmittance and increasing surface roughness. The glossiness of the glass surface also fluctuates significantly.

[0044] Examples 4-5

[0045] (1) Pretreatment: The high-aluminum glass was soaked in anhydrous ethanol, rinsed with distilled water, soaked in dilute sulfuric acid (mass concentration 3%), and rinsed with distilled water in sequence.

[0046] (2) Etching: Place the prepared etching solution in an etching tank, attach a polyethylene film to the side of the high-aluminum glass that does not need to be etched, and then immerse it in the etching solution. The etching temperature is 25°C and the etching time is 8 minutes. The etching solution is prepared by mixing component A and component B in a mass ratio of 1:2 and then adding nitric acid to adjust the pH to 2-3. Component A is prepared by mixing ammonium bifluoride, potassium fluoride, barium sulfate, potassium nitrate, zinc acetate, and oxalic acid in a mass ratio of 80:12:4:20:(10-30):5. Component B is prepared by mixing hexadecyltrimethylammonium bromide, sodium carboxymethyl starch, lauryl alcohol polyoxyethylene ether, polyvinyl alcohol, sodium hexametaphosphate, and distilled water in a mass ratio of 1:2.5:5:5:15:500.

[0047] (3) Polishing: Rinse the etched high-aluminum glass with distilled water and then place it in a polishing solution for chemical polishing. The polishing solution is a mixture of hydrofluoric acid and sulfuric acid. The mass concentration of hydrofluoric acid is 5%, and the mass concentration of sulfuric acid is 10%. The polishing time is 60s.

[0048] (4) Cleaning: Rinse the polished high-aluminum glass with distilled water, cleaning solution, and distilled water in sequence. During rinsing, the water column of the distilled water and cleaning solution is at 60 degrees to the glass surface. Remove the protective film and dry to constant weight to obtain anti-glare glass. The cleaning solution includes the following components: 6.75 g / L sodium hydroxide, 8.5 g / L anhydrous sodium carbonate, 1 g / L sodium citrate, 1.25 g / L citric acid, 1 g / L ethylenediaminetetramethylenephosphonic acid, 0.25 g / L sodium lauryl sulfate, 0.25 g / L ethylene glycol, and 0.15 g / L tributyl phosphate.

[0049] By adjusting the zinc acetate content in the etching solution, Examples 4-5 were obtained. Specifically, the zinc acetate content in the etching solution used in Example 4 was 1% by weight, and the zinc acetate content in the etching solution used in Example 5 was 2% by weight.

[0050] Comparative Examples 2-3

[0051] The only difference between Comparative Example 2-3 and Examples 4-5 is that the mass content of zinc acetate in the etching solution is adjusted to 3% and 5%, respectively.

[0052] The roughness and glossiness of the high aluminum glass after the anti-glare treatment of Examples 4-5 and Comparative Examples 2-3 were measured respectively. The results are shown in Table 2.

[0053] Table 2

[0054] Zinc acetate content / % Roughness / μm Gloss value Example 4 1 0.08 115 Example 5 2 0.06 108 Comparative Example 2 3 0.10 120 Comparative Example 3 5 0.12 129

[0055] As can be seen from Table 2, as the zinc acetate content in the etching solution increases, the roughness of the glass shows a trend of first decreasing and then increasing. When the zinc acetate content reaches 2%, the roughness of the glass is the lowest; but when the zinc acetate content exceeds 2%, the roughness of the glass increases with the increase of the zinc acetate content. Zinc acetate will also react with SiF6 in the etching solution. 2+ A reaction occurs to generate easily soluble ZnSiF6, which dissolves immediately after it is generated, causing the particle size of the tiny particles etching the glass surface to become smaller, and thus the surface roughness becomes smaller.

[0056] To further optimize the anti-glare treatment effect, the present invention also prepares glycerol ether-modified polyvinyl alcohol to replace polyvinyl alcohol as a dispersant. In this way, the roughness can be further reduced without increasing the amount of polyvinyl alcohol, and the glossiness will not be affected.

[0057] The dispersant is glyceryl ether-modified polyvinyl alcohol, which is prepared by adding polyvinyl alcohol and anhydrous aluminum chloride to glycidyl ether, heating to 120°C for reaction, stopping the reaction when the hydroxyl content in the reaction system no longer changes, filtering while hot, and naturally cooling the filtrate to obtain glyceryl ether-modified polyvinyl alcohol. The mass ratio of the polyvinyl alcohol, glycidyl ether, and anhydrous aluminum chloride is 1:1:0.05.

[0058] Glycidyl ether CAS: 13236-02-7.

[0059] Example 6

[0060] The only difference between Example 6 and Example 3 is that polyvinyl alcohol is replaced by the same amount of glycerol ether-modified polyvinyl alcohol.

[0061] The roughness and glossiness of the high-aluminum glass after the anti-glare treatment of Example 6 were measured. The results are shown in Table 3.

[0062] Table 3

[0063]

[0064]

[0065] As can be seen from Table 3, when glycerol ether-modified polyvinyl alcohol is used instead of polyvinyl alcohol as a dispersant, the surface roughness of the high-aluminum glass can be reduced from 0.06 to 0.05. Although the change in roughness is only 0.01, the rate of change in roughness reaches 16.67%. Since the content of the dispersant in the etching solution is very small, the present invention can achieve substantial improvement in the surface roughness of the high-aluminum glass without increasing the amount of dispersant used; and the use of glycerol ether-modified polyvinyl alcohol instead of polyvinyl alcohol as a dispersant does not affect the surface gloss of the high-aluminum glass.

[0066] The basic principles, main features, and advantages of the present invention are shown and described above. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The above embodiments and descriptions are merely illustrative of the principles of the present invention. Various changes and modifications may be made to the present invention without departing from the spirit and scope of the present invention. Such changes and modifications are intended to fall within the scope of the present invention. The scope of protection claimed in the present invention is defined by the appended claims and their equivalents.

Claims

1. A method for anti-glare treatment of high aluminum glass, characterized in that: The following steps are involved: (1) Pretreatment: cleaning high aluminum glass; (2) Etching: Place the prepared etching solution in the etching tank, apply a protective film to the side of the high-aluminum glass that does not need to be etched, and then immerse it in the etching solution; (3) Polishing: Rinse the etched high-aluminum glass with distilled water and then place it in a polishing solution for chemical polishing; (4) Cleaning: Rinse the polished high-aluminum glass with distilled water, cleaning solution, and distilled water in sequence, remove the protective film, and dry it to constant weight to obtain anti-glare glass; The etching solution is prepared by mixing component A and component B in a mass ratio of 1:2 and adding nitric acid to adjust the pH to 2-3; wherein component A is prepared by mixing ammonium bifluoride, potassium fluoride, barium sulfate, potassium nitrate, zinc acetate and oxalic acid in a mass ratio of (50-100): (10-15): (3-5): (15-25): (10-30): (5-10); and component B is prepared by mixing a surfactant, sodium carboxymethyl starch, an emulsifier, a dispersant, a pH adjuster and distilled water in a mass ratio of (1-3): (2-5): (5-10): (5-10): (10-20): (400-600); The mass content of zinc acetate in the etching solution is 1-2%.

2. The anti-glare treatment method according to claim 1, wherein: The cleaning comprises sequentially soaking in an organic solvent, rinsing with distilled water, soaking in an acid solution and rinsing with distilled water.

3. The anti-glare treatment method according to claim 1, wherein: The protective film is a polyethylene film.

4. The anti-glare treatment method according to claim 1, wherein: The etching temperature is 25° C. and the etching time is 2 to 10 minutes.

5. The anti-glare treatment method according to claim 1, wherein: The polishing liquid is prepared by mixing hydrofluoric acid and sulfuric acid, wherein the mass concentration of the hydrofluoric acid is 5-10%, and the mass concentration of the sulfuric acid is 10-20%.

6. The anti-glare treatment method according to claim 1, wherein: The polishing time is 30 to 120 seconds.

7. The anti-glare treatment method according to claim 1, wherein: During the rinsing, the water column of the distilled water or the cleaning liquid is at an angle of 45 to 60 degrees to the glass surface.

8. The anti-glare treatment method according to claim 1, wherein: The cleaning solution comprises the following components: 5-10 g / L of sodium hydroxide, 5-10 g / L of anhydrous sodium carbonate, 1-3 g / L of sodium citrate, 1-3 g / L of citric acid, 0.5-1 g / L of ethylenediaminetetramethylenephosphonic acid, 0.2-0.5 g / L of sodium lauryl sulfate, 0.2-0.5 g / L of ethylene glycol, and 0.1-0.3 g / L of tributyl phosphate.

9. The anti-glare treatment method according to claim 1, wherein: The surface roughness of the anti-glare glass is 0.05-0.1 μm, and the glossiness at 60° is 110-120.

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