A processing method of a high-entropy alloy

Abstract

The application discloses a processing method of a high-entropy alloy, which comprises first laser action, second laser action, electric field action and He + ion irradiation, coupling of the three means, and can realize improvement of the corrosion resistance of the high-entropy alloy, and through accurate matching and regulation of multiple process parameters, a synergistic effect is realized. Specifically, a certain amount of He + ion irradiation can improve the residual stress distribution and mechanical properties of the surface layer of the high-entropy alloy, the electric field action can improve the diffusion of the composition of the high-entropy alloy, and the laser action can optimize the microstructure, so that the pitting corrosion resistance, the crevice corrosion resistance and the stress corrosion resistance of the high-entropy alloy can be significantly improved as a whole, the comprehensive corrosion resistance of the high-entropy alloy is significantly enhanced, and the market application value of the high-entropy alloy is increased, so as to meet the demand of nuclear power plants for corrosion-resistant materials.

Description

Technical Field

[0001] This invention relates to the field of materials processing, and more specifically, to a method for processing high-entropy alloys. Background Technology

[0002] Many components in nuclear power plants, such as coolant piping, steam generators, and fuel cladding, face the challenge of high-temperature corrosive environments. Simultaneously, nuclear power plants contain strong acid and alkali environments, requiring materials with excellent corrosion resistance, such as those used in acid washing equipment, wastewater treatment systems, and chemical processing facilities. Furthermore, some nuclear power plant applications involve chloride corrosion environments, such as seawater cooling systems. Therefore, the application of high-entropy alloys in nuclear power plants must meet the requirements for corrosion resistance.

[0003] High-entropy alloys are a novel type of alloy material with certain corrosion resistance, but they also face several limitations and challenges. First, the performance of high-entropy alloys is influenced by factors such as their composition, microstructure, defects, and surface treatment, requiring meticulous design and optimization—a complex undertaking. Second, the irradiation response of high-entropy alloys in nuclear reactors is not yet clear, requiring more data and theoretical support to support the mechanisms of their radiation damage resistance. Third, high-entropy alloys have low thermal conductivity, which may reduce their stability and reliability in high-temperature environments. Furthermore, the high cost of high-entropy alloys due to their inclusion of precious elements may limit their application in nuclear power plants. Finally, the preparation and processing technologies for high-entropy alloys are still immature and require further development and improvement to avoid introducing defects detrimental to corrosion resistance. Therefore, further improving the corrosion resistance of high-entropy alloys to meet specific application scenarios presents challenges due to the high difficulty and cost of their preparation processes. Summary of the Invention

[0004] Therefore, in order to address the problems of high manufacturing difficulty and high cost in further improving the corrosion resistance of high-entropy alloys, this invention provides a method for treating high-entropy alloys, the specific technical solution of which is as follows:

[0005] A method for processing high-entropy alloys, the method comprising the following steps:

[0006] The high-entropy alloy sample was placed in the irradiation system;

[0007] The laser parameters in the irradiation system are adjusted to perform the first laser action, and under the action of protective gas, the horizontal and vertical orthogonal scans are performed several times.

[0008] The laser parameters in the irradiation system were adjusted again to perform a second laser action. Under the action of protective gas and electric field, the system was scanned horizontally and vertically several times, with the electric field strength being 20 kV / m to 25 kV / m.

[0009] The high-entropy alloy sample was transferred to a vacuum environment, followed by evacuation and adjustment of the He... + The ionization flux is 1×10 12 ions / cm 2 ~1×10 15 ions / cm 2 The rotation speed is 5 r / min to 10 r / min, and the time is 20 min to 30 min.

[0010] Furthermore, the irradiation system includes a housing, a control panel, an electric field device, a laser device, and an ion beam device disposed within the housing, and the electric field device, the laser device, and the ion beam device are respectively connected to the control panel.

[0011] Furthermore, the electric field application device includes an anode electrode plate, a cathode electrode plate, and a base, and the anode electrode plate and the cathode electrode plate are respectively connected to the control panel, and the base is used to fix the high-entropy alloy sample.

[0012] Furthermore, the laser action device includes a laser head and a protective gas storage tank, and the laser head and the protective gas storage tank are respectively connected to the control panel.

[0013] Furthermore, the ion beam irradiation device includes a vacuum chamber and an ion beam irradiation generator disposed within the vacuum chamber, the vacuum chamber being connected to the base via a conveyor belt.

[0014] Furthermore, the irradiation system also includes an exhaust device and an intake device disposed on the housing, and the exhaust device and the intake device are respectively connected to the housing.

[0015] Furthermore, the process parameters for the first laser treatment are: laser power of 40W to 45W and scanning speed of 2200mm / s to 2250mm / s.

[0016] Furthermore, the protective gas for the first laser treatment is argon, with a flow rate of 15 L / min to 20 L / min.

[0017] Furthermore, the process parameters for the second laser treatment are: laser power of 40W to 45W and scanning speed of 2240mm / s to 2250mm / s.

[0018] The above scheme involves subjecting high-entropy alloys to laser treatment, electric field treatment, and He... + The combined effect of ion irradiation and three other methods can improve the corrosion resistance of high-entropy alloys. A synergistic effect is achieved through precise matching and control of multiple process parameters. Specifically, a certain amount of He... +Ion irradiation improves the residual stress distribution and mechanical properties of high-entropy alloys on the surface, electric field enhances the diffusion of high-entropy alloy components, and laser treatment optimizes the microstructure. Overall, it can significantly improve the pitting corrosion resistance, crevice corrosion resistance, and stress corrosion resistance of high-entropy alloys, thereby significantly enhancing their comprehensive corrosion resistance and increasing their market application value to meet the needs of nuclear power plants for corrosion-resistant materials. Attached Figure Description

[0019] Figure 1 These are schematic diagrams of the AC impedance spectra of Example 3, Comparative Example 1, and the blank control;

[0020] Figure 2 This is a schematic diagram of the irradiation system of the present invention.

[0021] Explanation of symbols in the attached diagram:

[0022] 1. Control panel; 2. Anode electrode plate; 3. Conveyor belt; 4. Vacuum chamber; 5. Exhaust device; 6. Ion beam irradiation generator; 7. Laser head; 8. Gas inlet device; 9. Protective gas storage tank; 10. Cathode electrode plate; 11. Base; 12. High-entropy alloy sample. Detailed Implementation

[0023] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to its embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and do not limit the scope of protection of the invention.

[0024] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0025] A method for processing high-entropy alloys according to one embodiment of the present invention includes the following steps:

[0026] The high-entropy alloy sample was placed in the irradiation system;

[0027] The laser parameters in the irradiation system are adjusted to perform the first laser action, and under the action of protective gas, the horizontal and vertical orthogonal scans are performed several times.

[0028] The laser parameters in the irradiation system were adjusted again to perform a second laser action. Under the action of protective gas and electric field, the system was scanned horizontally and vertically several times, with the electric field strength being 20 kV / m to 25 kV / m.

[0029] The high-entropy alloy sample was transferred to a vacuum environment, followed by evacuation and adjustment of the He... + The ionization flux is 1×10 12 ions / cm 2 ~1×10 15 ions / cm 2 The rotation speed is 5 r / min to 10 r / min, and the time is 20 min to 30 min.

[0030] In one embodiment, the irradiation system includes a housing, a control panel, an electric field device, a laser device, and an ion beam device disposed within the housing, and the electric field device, the laser device, and the ion beam device are respectively connected to the control panel.

[0031] In one embodiment, the electric field application device includes an anode electrode plate, a cathode electrode plate, and a base, wherein the anode electrode plate and the cathode electrode plate are respectively connected to the control panel, and the base is used to fix the high-entropy alloy sample.

[0032] In one embodiment, the laser action device includes a laser head and a protective gas storage tank, the laser head and the protective gas storage tank being connected to the control panel respectively.

[0033] In one embodiment, the ion beam irradiation device includes a vacuum chamber and an ion beam irradiation generator disposed within the vacuum chamber, the vacuum chamber being connected to the base via a conveyor belt.

[0034] In one embodiment, the irradiation system further includes an exhaust device and an intake device disposed on the housing, and the exhaust device and the intake device are respectively connected to the housing.

[0035] In one embodiment, the process parameters for the first laser treatment are: laser power of 40W to 45W and scanning speed of 2200mm / s to 2250mm / s.

[0036] In one embodiment, the protective gas for the first laser treatment is argon, with a flow rate of 15 L / min to 20 L / min.

[0037] In one embodiment, the process parameters for the second laser action are: laser power of 40W to 45W and scanning speed of 2240mm / s to 2250mm / s.

[0038] In one embodiment, the protective gas for the second laser action is air, with a flow rate of 15 L / min to 20 L / min.

[0039] The implementation schemes of the present invention will now be described in detail with reference to specific embodiments.

[0040] Example 1:

[0041] A method for processing high-entropy alloys includes the following steps:

[0042] Step 1: Place the AlCoCrFeNi high-entropy alloy sample on the base and fix it;

[0043] Step 2: Adjust the process parameters via the control panel: laser power is 42W, scanning speed is 2220mm / s, protective gas (argon) flow rate is 18L / min, and perform two transverse and longitudinal orthogonal scans.

[0044] Step 3: After step 2 is completed, adjust the process parameters through the control panel: laser power is 42W, scanning speed is 2242mm / s, protective gas (air) flow rate is 18L / min, electric field strength is 22kv / m, and the horizontal and vertical orthogonal scans are performed twice.

[0045] Step 4: After step 3 is completed, the high-entropy alloy sample is sent into the vacuum chamber by conveyor belt, and then a vacuum is drawn.

[0046] Step 5: After step 4 is completed, adjust the process parameters again via the control panel: He + The ionization flux is 1×10 12 ions / cm 2 The base rotates at a speed of 8 r / min for a duration of 22 min.

[0047] Example 2:

[0048] A method for processing high-entropy alloys includes the following steps:

[0049] Step 1: Place the AlCoCrFeNi high-entropy alloy sample on the base and fix it;

[0050] Step 2: Adjust the process parameters via the control panel: laser power is 43W, scanning speed is 2250mm / s, protective gas (argon) flow rate is 18L / min, and perform two transverse and longitudinal orthogonal scans.

[0051] Step 3: After step 2 is completed, adjust the process parameters through the control panel: laser power is 42W, scanning speed is 2250mm / s, protective gas (air) flow rate is 18L / min, electric field strength is 24kv / m, and the horizontal and vertical orthogonal scans are performed twice.

[0052] Step 4: After step 3 is completed, the high-entropy alloy sample is sent into the vacuum chamber by conveyor belt, and then a vacuum is drawn.

[0053] Step 5: After step 4 is completed, adjust the process parameters again via the control panel: He + The ionization flux is 1×10 13 ions / cm 2 The base rotates at a speed of 8 r / min for 25 min.

[0054] Example 3:

[0055] A method for processing high-entropy alloys includes the following steps:

[0056] Step 1: Place the AlCoCrFeNi high-entropy alloy sample on the base and fix it;

[0057] Step 2: Adjust the process parameters via the control panel: laser power is 40W, scanning speed is 2240mm / s, protective gas (argon) flow rate is 16L / min, and perform two transverse and longitudinal orthogonal scans.

[0058] Step 3: After step 2 is completed, adjust the process parameters through the control panel: laser power is 40W, scanning speed is 2240mm / s, protective gas (air) flow rate is 16L / min, electric field strength is 20kv / m, and horizontal and vertical orthogonal scanning is performed twice.

[0059] Step 4: After step 3 is completed, the high-entropy alloy sample is sent into the vacuum chamber by conveyor belt, and then a vacuum is drawn.

[0060] Step 5: After step 4 is completed, adjust the process parameters again via the control panel: He + The ionization flux is 1×10 12 ions / cm 2 The base rotates at a speed of 5 r / min for 20 min.

[0061] Comparative Example 1:

[0062] The difference between Comparative Example 1 and Example 3 is that the process of Comparative Example 1 is as follows:

[0063] A method for processing high-entropy alloys includes the following steps:

[0064] Step 1: Place the AlCoCrFeNi high-entropy alloy sample on the base and fix it;

[0065] Step 2: Adjust the process parameters via the control panel: laser power is 40W, scanning speed is 2240mm / s, protective gas (argon) flow rate is 16L / min, electric field strength is 20kv / m, and perform two transverse and longitudinal orthogonal scans.

[0066] Comparative Example 2:

[0067] The difference between Comparative Example 2 and Example 3 is that no electric field was applied in Comparative Example 2, while the rest is the same as in Example 3.

[0068] Comparative Example 3:

[0069] The difference between Comparative Example 3 and Example 3 is that Comparative Example 3 was not subjected to laser treatment, but otherwise it was the same as Example 3.

[0070] Electrochemical experiments were directly performed on the AlCoCrFeNi high-entropy samples of Examples 1-3 and Comparative Examples 1-3, and AC impedance spectra were measured.

[0071] The AC impedance fitting data for Examples 1-3 and Comparative Examples 1-3 are shown in Table 1 below.

[0072]

[0073] The results are as follows Figure 1 As shown. Figure 1 This is a schematic diagram of the AC impedance spectra of Example 3, Comparative Example 1, and the blank control. Figure 1 The data shows that a larger capacitive arc indicates better corrosion resistance. The Nquist impedance diagram shows the capacitive arc from largest to smallest: irradiation + electric field + laser cleaning, laser cleaning, and blank control. Therefore, the order of corrosion resistance from highest to lowest is: laser cleaning + electric field > laser cleaning > blank control. Thus, electric field + laser polishing has a significant effect on improving the corrosion resistance of high-entropy alloys.

[0074] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0075] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this invention patent should be determined by the appended claims.

Claims

1. A method for processing high-entropy alloys, characterized in that, The processing method includes the following steps: The high-entropy alloy sample was placed in the irradiation system; The laser parameters in the irradiation system are adjusted to perform the first laser treatment. The process parameters for the first laser treatment are: laser power of 40W~45W, scanning speed of 2200mm / s~2250mm / s, and several horizontal and vertical orthogonal scans are performed under the action of protective gas. The laser parameters in the irradiation system were adjusted again for a second laser treatment. The process parameters for the second laser treatment were: laser power of 40W~45W, scanning speed of 2240 mm / s~2250mm / s, and under the action of protective gas and electric field, the transverse and longitudinal orthogonal scanning was performed several times, and the electric field strength was 20kV / m~25kV / m. The high-entropy alloy sample was transferred to a vacuum environment, followed by evacuation and adjustment of the He... + The ionization flux is 1×10 12 ions / cm 2 ~ 1×10 15 ions / cm 2 The rotation speed is 5 r / min to 10 r / min, and the time is 20 min to 30 min. The He... + Ion irradiation is used to modulate the distribution of residual compressive stress on the surface of high-entropy alloys.

2. The processing method according to claim 1, characterized in that, The irradiation system includes a housing, a control panel, an electric field device, a laser device, and an ion beam device disposed within the housing, and the electric field device, the laser device, and the ion beam device are respectively connected to the control panel.

3. The processing method according to claim 2, characterized in that, The electric field application device includes an anode electrode plate, a cathode electrode plate, and a base, wherein the anode electrode plate and the cathode electrode plate are respectively connected to the control panel, and the base is used to fix the high-entropy alloy sample.

4. The processing method according to claim 3, characterized in that, The laser-acting device includes a laser head and a protective gas storage tank, which are respectively connected to the control panel.

5. The processing method according to claim 4, characterized in that, The ion beam irradiation device includes a vacuum chamber and an ion beam irradiation generator disposed inside the vacuum chamber. The vacuum chamber and the base are connected by a conveyor belt.

6. The processing method according to claim 5, characterized in that, The irradiation system also includes an exhaust device and an intake device disposed on the housing, and the exhaust device and the intake device are respectively connected to the housing.

7. The processing method according to claim 6, characterized in that, The protective gas used for the first laser treatment is argon, with a flow rate of 15 L / min to 20 L / min.

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