Tail gas separation and purification equipment, method and semiconductor process system

Abstract

The present invention relates to a tail gas separation and purification device, method and semiconductor process system, wherein the tail gas separation and purification device comprises a first condensing unit, a first gas filtering unit, a second gas filtering unit, a second condensing unit, a first purification unit, a second purification unit and a conveying unit. The advantage is that the mixed gas of the upstream semiconductor process equipment is processed by the first condensing unit, the first gas filtering unit, the second gas filtering unit, the second condensing unit, the first purification unit and the second purification unit in sequence, thereby gradually removing trichlorosilane, PH3 gas, acidic gas, liquid molecules and impurities in the mixed gas, thereby obtaining H2 with a purity of 4N to 6N, realizing separation and purification of the mixed gas, realizing secondary recycling of the mixed gas, avoiding waste of production resources and reducing costs.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor process gas processing, and in particular to a tail gas separation and purification device, method and semiconductor process system. Background Art

[0002] The most widely used and largest amount of gas in semiconductor technology is hydrogen. This system is a recovery system for H2 tail gas in semiconductors. At present, in the production of semiconductor processes, the residual gases after these processes come out of the clean room through the vacuum tube, and need to be treated by tail gas treatment equipment through combustion or water washing, condensation, adsorption and other methods before being discharged into the central exhaust gas treatment system. This treatment method causes great waste.

[0003] At present, the most common way for semiconductor factories to treat hydrogen is to directly discharge it into the atmosphere after burning and washing. However, the existing hydrogen treatment method of direct combustion will cause a huge waste of hydrogen; in addition, the tail gas of semiconductor factories is a mixed tail gas, which also contains other toxic, harmful and highly corrosive gases, and the combustion method will pollute the environment; in addition, in the process of direct combustion of the mixed tail gas, if the concentration of hydrogen in the mixed tail gas is not well controlled, an explosion may occur, posing a safety hazard.

[0004] Currently, no effective solution has been proposed to address the problems of hydrogen waste, environmental pollution, and safety hazards caused by the mixed tail gas treatment methods existing in related technologies. Summary of the invention

[0005] The purpose of the present invention is to provide a tail gas separation and purification device, method and semiconductor process system to address the deficiencies in the prior art, so as to solve the problems of hydrogen waste, environmental pollution and safety hazards caused by the mixed tail gas treatment method in the related art.

[0006] To achieve the above object, the technical solution adopted by the present invention is:

[0007] In a first aspect, the present invention provides a tail gas separation and purification device, comprising:

[0008] a first condensation unit, the first condensation unit being in communication with an upstream semiconductor process device and configured to condense the mixed gas to remove dichlorosilane and / or trichlorosilane to obtain a first condensed gas and / or a second condensed gas;

[0009] a first gas filtering unit, the first gas filtering unit being in communication with the first condensing unit and being located downstream of the first condensing unit, and being used for filtering the first condensed gas and / or the second condensed gas to remove phosphine and / or diborane and / or germanium hydride so as to obtain the first filtered gas and / or the second filtered gas and / or the third filtered gas;

[0010] a second gas filter unit, which is connected to the first gas filter unit and is located downstream of the first gas filter unit, and is used to filter the first filtered gas and / or the second filtered gas and / or the third filtered gas to remove acidic gas to obtain H with a purity of 2N to 4N; 2 ;

[0011] The second condensing unit is connected to the second gas filtering unit and is located downstream of the second gas filtering unit, and is used for condensing H with a purity of 2N to 4N. 2 condensing to obtain a third condensed gas;

[0012] a first purification unit, the first purification unit being connected to the second condensing unit and being located downstream of the second condensing unit, and being used for filtering the third condensed gas to remove H 2 O thereby obtaining a first purified gas;

[0013] The second purification unit is connected to the first purification unit and the tail gas combustion treatment equipment respectively, and is located downstream of the first purification unit, and is used to filter the first purified gas to remove impurities to obtain H with a purity of 4N to 6N. 2 ;

[0014] The conveying unit is connected to the second purification unit and the downstream semiconductor process equipment respectively, and is used to transport 4N to 6N pure H 2 Delivered to downstream semiconductor process equipment.

[0015] In some of the embodiments, it also includes:

[0016] A gas analysis unit, wherein the gas analysis unit is connected to the first gas filter unit, the second gas filter unit, and the delivery unit respectively, and is used to detect whether the purity of the first filtered gas, the second filtered gas, the third filtered gas, and hydrogen meets the standard.

[0017] In some of the embodiments, it also includes:

[0018] A purge unit is connected to the first condensing unit, the first gas filtering unit, and the second gas filtering unit respectively, and is used to purge the first condensing unit, the first gas filtering unit, and the second gas filtering unit.

[0019] In some of the embodiments, it also includes:

[0020] A vacuum unit, wherein the vacuum unit is connected to the first condensing unit, the first gas filtering unit, and the second gas filtering unit respectively, and is used to discharge the gas inside the first condensing unit, the first gas filtering unit, and the second gas filtering unit.

[0021] In some of the embodiments, it also includes:

[0022] A pressure relief unit, wherein the pressure relief unit is respectively connected to the first condensing unit, the first gas filtering unit, the second gas filtering unit, the second condensing unit, and the conveying unit, and is used to relieve pressure on the first condensing unit, the first gas filtering unit, the second gas filtering unit, the second condensing unit, and the conveying unit.

[0023] In a second aspect, the present invention further provides a tail gas separation and purification method, comprising:

[0024] The first condensing unit obtains the mixed gas and condenses the mixed gas to obtain the first condensed gas or the second condensed gas;

[0025] The first gas filtering unit obtains the first condensed gas or the second condensed gas and reacts the first condensed gas or the second condensed gas with iron powder under high temperature conditions to remove phosphine in the first condensed gas or the second condensed gas to obtain a first filtered gas;

[0026] The second gas filtering unit obtains the first filtered gas and reacts the first filtered gas with a sodium hydroxide solution under normal temperature conditions to remove the acidic gas in the first filtered gas to obtain 2N to 4N pure H 2 ;

[0027] The second condensation unit obtains 2N to 4N pure H 2 And for 2N~4N purity H 2 condensing to form a third condensed gas;

[0028] The first purification unit obtains the third condensed gas and adsorbs H in the third condensed gas 2 O, thereby obtaining a first purified gas;

[0029] The second purification unit obtains the first purified gas and purifies the first purified gas to obtain H with a purity of 4N to 6N. 2 .

[0030] In some of the embodiments, it also includes:

[0031] The first gas filtering unit obtains the first condensed gas or the second condensed gas and reacts the first condensed gas or the second condensed gas with an aqueous solution under normal temperature conditions to remove diborane in the first condensed gas or the second condensed gas to obtain a second filtered gas.

[0032] In some of the embodiments, it also includes:

[0033] The first gas filtering unit obtains the first condensed gas or the second condensed gas and reacts the first condensed gas or the second condensed gas with a silver nitrate solution under normal temperature conditions to remove germanium hydride in the first condensed gas or the second condensed gas to obtain a third filtered gas.

[0034] In a third aspect, the present invention further provides a semiconductor process system, comprising:

[0035] The tail gas separation and purification equipment as described in the first aspect.

[0036] The present invention adopts the above technical solution, and has the following technical effects compared with the prior art:

[0037] The tail gas separation and purification equipment, method and semiconductor process system of the present invention are used to gradually remove trichlorosilane, PH and NH in the mixed gas by sequentially passing the mixed gas of the upstream semiconductor process equipment through a first condensation unit, a first gas filtration unit, a second gas filtration unit, a second condensation unit, a first purification unit and a second purification unit. 3 Gas, acid gas, liquid molecules and impurities, thus obtaining 4N to 6N purity H 2 , to achieve separation and purification of mixed gases, and secondary recycling of mixed gases, which can avoid waste of production resources and reduce costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] Figure 1 is a schematic diagram of a tail gas separation and purification device according to an embodiment of the present invention (I);

[0039] Figure 2 is a schematic diagram of a first condensing unit, a first gas filtering unit, a second gas filtering unit, a second condensing unit, a first purification unit, a second purification unit and an output unit according to an embodiment of the present invention (I);

[0040] Figure 3 is a schematic diagram of a first condensing unit according to an embodiment of the present invention (II);

[0041] Figure 4 is a schematic diagram of a first gas filter unit according to an embodiment of the present invention (II);

[0042] Figure 5is a schematic diagram of a first gas filter unit according to an embodiment of the present invention (III);

[0043] Figure 6 is a schematic diagram of a tail gas separation and purification device according to an embodiment of the present invention (II);

[0044] Figure 7 is a schematic diagram of a tail gas separation and purification device according to an embodiment of the present invention (III);

[0045] Figure 8 is a schematic diagram of a gas analysis unit according to an embodiment of the present invention;

[0046] Fig. 9 is a schematic diagram of a purge unit, a vacuum unit and a pressure relief unit according to an embodiment of the present invention;

[0047] Fig.10 is a schematic diagram of a specific embodiment of a tail gas separation and purification device according to an embodiment of the present invention;

[0048] Fig.11 It is a schematic diagram of a specific embodiment of the tail gas separation and purification equipment according to an embodiment of the present invention.

[0049] The reference numerals are: 100, first condensing unit; 110, first condensing element; 120, first liquid storage element; 130, first valve element; 140, second valve element; 150, first monitoring element; 160, second condensing element; 170, second liquid storage element; 180, third valve element; 190, second monitoring element;

[0050] 200, first gas filter unit; 210, first filter element; 220, fourth valve element; 230, third monitoring element; 240, second filter element; 250, fifth valve element; 260, fourth monitoring element; 270, third filter element; 280, sixth valve element; 290, fifth monitoring element;

[0051] 300, second gas filter unit; 310, fourth filter element; 320, seventh valve element; 330, sixth monitoring element;

[0052] 400, second condensing unit; 410, third condensing element; 420, third liquid storage element; 430, eighth valve element; 440, ninth valve element; 450, seventh monitoring element;

[0053] 500, first purification unit; 510, first purification element; 520, tenth valve element; 530, eighth monitoring element;

[0054] 600, second purification unit; 610, second purification element; 620, eleventh valve element; 630, ninth monitoring element;

[0055] 700, a conveying unit; 710, a conveying element; 720, a twelfth valve element; 730, a tenth monitoring element;

[0056] 800, gas analysis unit; 810, first gas analysis element; 820, second gas analysis element; 830, third gas analysis element; 840, fourth gas analysis element;

[0057] 900, purge unit; 910, purge element; 920, thirteenth valve element; 930, eleventh monitoring element;

[0058] 1000, vacuum unit; 1010, vacuum element; 1020, fourteenth valve element; 1030, twelfth monitoring element;

[0059] 1100, pressure relief unit; 1110, first pressure relief element; 1120, second pressure relief element; 1130, third pressure relief element; 1140, fourth pressure relief element; 1150, fifth pressure relief element. DETAILED DESCRIPTION

[0060] In order to make the purpose, technical solutions and advantages of the present application clearer, the present application is described and illustrated below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and are not intended to limit the present application. Based on the embodiments provided in the present application, all other embodiments obtained by ordinary technicians in the field without making creative work are within the scope of protection of the present application.

[0061] Obviously, the drawings described below are only some examples or embodiments of the present application. For ordinary technicians in this field, the present application can also be applied to other similar scenarios based on these drawings without creative work. In addition, it can also be understood that although the efforts made in this development process may be complicated and lengthy, for ordinary technicians in this field related to the content disclosed in this application, some changes in design, manufacturing or production based on the technical content disclosed in this application are just conventional technical means, and should not be understood as insufficient content disclosed in this application.

[0062] Reference to "embodiments" in this application means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those of ordinary skill in the art that the embodiments described in this application may be combined with other embodiments without conflict.

[0063] Unless otherwise defined, the technical terms or scientific terms involved in this application should be understood by people with ordinary skills in the technical field to which this application belongs. The words "one", "a", "a", "the" and the like involved in this application do not indicate a quantitative limitation, and may represent the singular or plural. The terms "include", "comprise", "have" and any of their variations involved in this application are intended to cover non-exclusive inclusions; for example, a process, method, system, product or device that includes a series of steps or modules (units) is not limited to the listed steps or units, but may also include steps or units that are not listed, or may also include other steps or units inherent to these processes, methods, products or devices. The words "connect", "connected", "coupled" and the like involved in this application are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. The "multiple" involved in this application refers to two or more. "And / or" describes the association relationship of associated objects, indicating that there may be three relationships, for example, "A and / or B" can represent: A exists alone, A and B exist at the same time, and B exists alone. The character " / " generally indicates that the objects before and after are in an "or" relationship. The terms "first", "second", "third", etc. involved in this application are only used to distinguish similar objects and do not represent a specific ordering of the objects.

[0064] Example 1

[0065] This embodiment relates to the tail gas separation and purification equipment in the present invention.

[0066] like Figure 1 As shown, a tail gas separation and purification device includes a first condensing unit 100, a first gas filtering unit 200, a second gas filtering unit 300, a second condensing unit 400, a first purification unit 500, a second purification unit 600 and a conveying unit 700. The first condensation unit 100 is connected to the upstream semiconductor process equipment, and is used to condense the mixed gas to remove dichlorosilane and / or trichlorosilane to obtain the first condensed gas and / or the second condensed gas; the first gas filtering unit 200 is connected to the first condensation unit 100 and is located downstream of the first condensation unit 100, and is used to filter the first condensed gas and / or the second condensed gas to remove phosphine and / or diborane and / or germanium hydride to obtain the first filtered gas and / or the second filtered gas and / or the third filtered gas; the second gas filtering unit 300 is connected to the first gas filtering unit 200 and is located downstream of the first gas filtering unit 200, and is used to filter the first filtered gas and / or the second filtered gas and / or the third filtered gas to remove acidic gas to obtain 2N to 4N purity H 2The second condensing unit 400 is connected to the second gas filtering unit 300 and is located downstream of the second gas filtering unit 300 for 2N to 4N purity H 2 The first purification unit 500 is connected to the second condensation unit 400 and is located downstream of the second condensation unit 400, and is used to filter the third condensation gas to remove H 2 O to obtain the first purified gas; the second purification unit 600 is connected to the first purification unit 500 and the tail gas combustion treatment equipment respectively, and is located downstream of the first purification unit 500, and is used to filter the first purified gas to remove impurities to obtain H with a purity of 4N to 6N 2 The conveying components are connected to the second purification unit 600 and the downstream semiconductor process equipment, respectively, to transfer 4N to 6N purity H 2 Delivered to downstream semiconductor process equipment.

[0067] It should be noted that the first end and the second end in the present invention are two ends in the length direction thereof.

[0068] like Figure 2 As shown, the first condensing unit 100 includes a first condensing element 110 and a first liquid storage element 120. The first condensing element 110 is respectively connected to the upstream semiconductor process equipment and the first gas filter unit 200, and is located downstream of the upstream semiconductor process equipment and upstream of the first gas filter unit 200, and is used to condense the mixed gas to remove trichlorosilane to obtain the first condensed gas, and to transport the first condensed gas to the first gas filter unit 200; the first liquid storage element 120 is connected to the first condensing element 110 and the waste liquid treatment equipment, and is used to store liquid trichlorosilane.

[0069] Specifically, the first condensation element 110 includes a first condenser, a first condensation pipeline, a second condensation pipeline, a third condensation pipeline, a first water bath, a first water bath pipeline and a second water bath pipeline. The first end of the first condensation pipeline is connected to the upstream semiconductor process equipment, and the second end of the first condensation pipeline is connected to the condenser for conveying the mixed gas; the first end of the second condensation pipeline is connected to the first condenser, and the second end of the second condensation pipeline is connected to the first liquid storage element 120 for conveying liquid trichlorosilane; the first end of the third condensation pipeline is connected to the first condenser, and the second end of the third condensation pipeline is connected to the first gas filter unit 200 for conveying the first condensed gas; the first end of the first water bath pipeline is connected to the first water bath, and the second end of the first water bath pipeline is connected to the first condenser for conveying the coolant; the first end of the second water bath pipeline is connected to the first condenser, and the second end of the second water bath pipeline is connected to the first water bath for conveying the coolant.

[0070] More specifically, the first condenser includes a first condenser body, a first condensation port, a second condensation port, a third condensation port, a fourth condensation port, and a fifth condensation port. The first condensation port is formed in the first condenser body for communicating with the second end of the first condensation pipeline; the second condensation port is formed in the first condenser body for communicating with the first end of the second condensation pipeline; the third condensation port is formed in the first condenser body for communicating with the first end of the third condensation pipeline; the fourth condensation port and the fifth condensation port are formed in the first condenser body for communicating with the first water bath.

[0071] More specifically, the first water bath includes a first water bath body, a first water bath port, and a second water bath port. The first water bath port is formed in the first water bath body for communicating with the first water bath pipeline; the second water bath port is formed in the first water bath body for communicating with the second water bath pipeline.

[0072] More specifically, the first end of the first water bath pipeline is communicated with the first water bath port of the first water bath body, and the second end of the first water bath pipeline is communicated with the fourth condensation port of the first condenser body.

[0073] More specifically, the first end of the second water bath pipeline is communicated with the fifth condensation port of the first condenser body, and the second end of the second water bath pipeline is communicated with the second water bath port of the first water bath body.

[0074] It should be noted that the temperature of the coolant in the first condenser body is 10° C. to 20° C. Preferably, the temperature of the coolant in the first condenser body is 15° C.

[0075] In some of the embodiments, the first condenser includes but is not limited to a water-cooled condenser; the first condensation pipeline includes but is not limited to a stainless steel pipe; the first condensation pipeline includes but is not limited to a stainless steel pipe; the third condensation pipeline includes but is not limited to a stainless steel pipe; the first water bath includes but is not limited to a heat exchanger; the first water bath pipeline includes but is not limited to a stainless steel pipe; the second water bath pipeline includes but is not limited to a stainless steel pipe.

[0076] Specifically, the first liquid storage element 120 includes a first liquid storage tank, a first liquid storage pipeline, and a second liquid storage pipeline. The first end of the first liquid storage pipeline is connected to the second end of the second condensation pipeline, and the second end of the first liquid storage pipeline is connected to the first liquid storage tank for conveying liquid trichlorosilane; the first end of the second liquid storage pipeline is connected to the first liquid storage tank, and the second end of the second liquid storage pipeline is connected to the waste liquid treatment equipment for conveying liquid trichlorosilane.

[0077] It should be noted that there are at least two first liquid storage elements 120 , and several first liquid storage elements 120 are connected to the first condensing element 110 respectively.

[0078] In some embodiments, there are two first liquid storage elements 120, and the two first liquid storage elements 120 are respectively connected to the first condensing element 110. When the liquid level in one first liquid storage element 120 exceeds a preset threshold, another first liquid storage element 120 may be switched.

[0079] More specifically, the first liquid storage tank includes a first liquid storage tank body, a first liquid storage port, a second liquid storage port, a third liquid storage port and a first thermostat. The first liquid storage port is formed in the first liquid storage tank body for communicating with the first liquid storage pipeline; the second liquid storage port is formed in the first liquid storage tank body for communicating with the second liquid storage pipeline; the third liquid storage port is formed in the first liquid storage tank body for communicating with the sensor; the cooling coil of the first thermostat is coiled on the outer side wall of the first liquid storage tank body, and the temperature inside the first liquid storage tank body can be kept constant through heat exchange between the cooling coil and the first liquid storage tank body.

[0080] In some of the embodiments, the first liquid storage tank includes but is not limited to a stainless steel tank; the first liquid storage pipeline includes but is not limited to a stainless steel pipe; the second liquid storage pipeline includes but is not limited to a stainless steel pipe; the first constant temperature component includes but is not limited to a constant temperature refrigerator compressor.

[0081] Furthermore, the first condensing unit 100 further includes a first valve element 130. The first valve element 130 is disposed on a pipeline connecting the first condensing element 110 and an upstream semiconductor process equipment, and is used to control the flow of the pipeline.

[0082] Specifically, the first valve element 130 includes a first regulating valve, a first non-return valve, a first pneumatic diaphragm valve, a first ball valve, and a second ball valve. The first regulating valve is arranged on the first condensation pipeline to regulate the gas pressure of the upstream semiconductor process equipment input into the mixed tail gas separation equipment to prevent excessive pressure from affecting the subsequent process; the first non-return valve is arranged on the first condensation pipeline and is located downstream of the first regulating valve to prevent the gas inside the first condensation pipeline from backflowing; the first pneumatic diaphragm valve is arranged on the first condensation pipeline and is located downstream of the first filter to control the circulation of the first condensation pipeline; the first ball valve is arranged on the first condenser body and is connected to the fourth condensation port to control the circulation between the first condenser body and the first water bath pipeline; the second ball valve is arranged on the first condenser body and is connected to the fifth condensation port to control the circulation between the first condenser body and the second water bath pipeline.

[0083] Furthermore, the first condensing unit 100 further includes a second valve element 140. The second valve element 140 is disposed on a pipeline connecting the first liquid storage element 120, the first condensing element 110 and the waste liquid treatment device, and is used to control the flow of the pipeline.

[0084] Specifically, the second valve element 140 includes a second pneumatic diaphragm valve, a first manual diaphragm valve, a second manual diaphragm valve and a third manual diaphragm valve. The second pneumatic diaphragm valve is arranged on the first liquid storage pipeline to control the circulation of the first liquid storage pipeline; the first manual diaphragm valve is arranged on the top of the first liquid storage tank body and is connected to the first liquid storage port to control the circulation between the first liquid storage tank body and the first liquid storage pipeline; the second manual diaphragm valve is arranged on the top of the first liquid storage tank body and is connected to the third liquid storage port to control the circulation between the first liquid storage tank body and the sensor; the third manual diaphragm valve is arranged on the side wall at the bottom of the first liquid storage tank body and is connected to the second liquid storage port to control the circulation between the first liquid storage tank body and the second liquid storage pipeline.

[0085] Furthermore, the first condensing unit 100 further includes a first monitoring element 150 . The first monitoring element 150 is in communication with the first liquid storage element 120 , and is used to monitor the pressure, temperature and liquid level inside the first liquid storage element 120 .

[0086] Specifically, the first monitoring element 150 includes a first pressure sensor, a first temperature sensor and a first liquid level sensor. The first pressure sensor is connected to the first liquid storage tank body through a pipeline and is located downstream of the second manual diaphragm valve, and is used to monitor the pressure inside the first liquid storage tank body; the first temperature sensor is arranged inside the first liquid storage tank body, and is used to monitor the temperature of the liquid inside the first liquid storage tank body; the first liquid level sensor is arranged inside the first liquid storage tank body, and is used to monitor the liquid level height inside the first liquid storage tank body.

[0087] Furthermore, the first condensing unit 100 further includes a first filter, wherein the first filter is disposed on the first condensing element 110 and is located downstream of the first valve element 130, and is used to filter particulate matter in the mixed gas.

[0088] Specifically, the first filter is arranged in the first condensation pipeline and is located downstream of the first one-way valve.

[0089] In some of these embodiments, the first filter includes, but is not limited to, a gas particle filter.

[0090] like Figure 2 As shown, the first gas filter unit 200 includes a first filter element 210. The first filter element 210 is respectively connected to the first condensation unit 100 and the second gas filter unit 300, and is located downstream of the first condensation unit 100 and upstream of the second gas filter unit 300, and is used to filter the first condensed gas and / or the second condensed gas to remove phosphine to obtain the first filtered gas, and to transport the first filtered gas to the second gas filter unit 300.

[0091] Specifically, the first filter element 210 includes a phosphine removal reactor, a first phosphine removal pipeline, a second phosphine removal pipeline, a third phosphine removal pipeline, a fourth phosphine removal pipeline and a temperature controller. The first end of the first phosphine removal pipeline is connected to the second end of the fifth condensation pipeline, and the second end of the first phosphine removal pipeline is connected to the phosphine removal reactor for conveying the second condensed gas; the first end of the second phosphine removal pipeline is connected to the phosphine removal reactor, and the second end of the second phosphine removal pipeline is connected to the second gas filter unit 300 for conveying the first filtered gas; the first end of the third phosphine removal pipeline is connected to the iron powder feeding device, and the second end of the third phosphine removal pipeline is connected to the phosphine removal reactor for conveying iron powder; the first end of the fourth phosphine removal pipeline is connected to the phosphine removal reactor, and the second end of the fourth phosphine removal pipeline is connected to the waste collection device; the temperature controller is arranged inside the phosphine removal reactor for controlling the temperature inside the phosphine removal reactor.

[0092] More specifically, the phosphine removal reactor comprises a phosphine removal reactor body, a first reactor port, a second reactor port, a third reactor port, a fourth reactor port and a fifth reactor port. The first reactor port is formed at the top of the phosphine removal reactor body and is used to communicate with the second end of the first phosphine removal pipeline; the second reactor port is formed at the bottom of the phosphine removal reactor body and is used to communicate with the first end of the second phosphine removal pipeline; the third reactor port is formed at the top of the phosphine removal reactor body and is used to communicate with the second end of the third phosphine removal pipeline; the fourth reactor port is formed at the top of the phosphine removal reactor body and is used to communicate with the first end of the fourth phosphine removal pipeline; the fifth reactor port is formed at the top of the phosphine removal reactor body and is used to communicate with the sensor.

[0093] It should be noted that the pH of the second condensed gas flowing into the phosphine removal reactor is 3 The gas can react with iron powder under high temperature conditions to generate solid FeP and hydrogen, achieving the pH value in the second condensed gas. 3 Gas removal.

[0094] In some of the embodiments, the phosphine removal reactor includes but is not limited to a high-temperature reactor; the first phosphine removal pipeline includes but is not limited to a stainless steel pipe; the second phosphine removal pipeline includes but is not limited to a stainless steel pipe; the third phosphine removal pipeline includes but is not limited to a stainless steel pipe; the first end and the second end of the fourth phosphine removal pipeline are respectively the two ends in its length direction.

[0095] Furthermore, the first gas filter unit 200 further includes a fourth valve element 220. The fourth valve element 220 is disposed on a pipeline connecting the first filter element 210 with the first condensation unit 100 and the second gas filter unit 300 to control the flow of the pipeline.

[0096] Specifically, the fourth valve element 220 includes a fourth pneumatic diaphragm valve, a seventh manual diaphragm valve, a fifth pneumatic diaphragm valve, an eighth manual diaphragm valve, a fifth ball valve, and a sixth ball valve. Among them, the fourth pneumatic diaphragm valve is arranged on the first phosphine removal pipeline to control the circulation of the first phosphine removal pipeline; the seventh manual diaphragm valve is arranged on the phosphine removal reactor body and is connected to the first reactor port to control the circulation between the phosphine removal reactor body and the first phosphine removal pipeline; the fifth pneumatic diaphragm valve is arranged on the second phosphine removal pipeline to control the circulation of the second phosphine removal pipeline; the eighth manual diaphragm valve is arranged on the phosphine removal reactor body and is connected to the second reactor port to control the circulation between the phosphine removal reactor body and the second phosphine removal pipeline; the fifth ball valve is arranged on the phosphine removal reactor body and is connected to the third reactor port to control the circulation between the phosphine removal reactor body and the third phosphine removal pipeline; the sixth ball valve is arranged on the phosphine removal reactor body and is connected to the fourth reactor port to control the circulation between the phosphine removal reactor body and the fourth phosphine removal pipeline.

[0097] Furthermore, the first gas filter unit 200 further includes a third monitoring element 230 , wherein the third monitoring element 230 is in communication with the first filter element 210 and is used to monitor the temperature inside the first filter element 210 .

[0098] Specifically, the third monitoring element 230 includes a third temperature sensor, which is connected to the phosphine removal reactor body through a pipeline and is located on the top of the phosphine removal reactor body to monitor the temperature inside the phosphine removal reactor body.

[0099] like Figure 2 As shown, the second gas filter unit 300 includes a fourth filter element 310. The fourth filter element 310 is connected to the first gas filter unit 200, the second condensation unit 400, and the waste liquid treatment device, and is located downstream of the first gas filter unit 200 and upstream of the downstream gas treatment device, and is used to filter the first filtered gas and / or the second filtered gas and / or the third filtered gas to remove acidic gas to obtain 2N to 4N purity H 2 .

[0100] Specifically, the fourth filter element 310 includes a first reaction water tank, a first acid gas removal pipeline, a second acid gas removal pipeline, a third acid gas removal pipeline, and a fourth acid gas removal pipeline. The first end of the first acid gas removal pipeline is connected to the second end of the second phosphine removal pipeline, and the second end of the first acid gas removal pipeline is connected to the first reaction water tank for conveying the first filtered gas; the first end of the second acid gas removal pipeline is connected to the first reaction water tank, and the second end of the second acid gas removal pipeline is connected to the downstream gas processing equipment for conveying 2N to 4N pure H 2 ; The first end of the third acid gas removal pipeline is connected to the NaOH solution source, and the second end of the third acid gas removal pipeline is connected to the first reaction water tank; the first end of the fourth acid gas removal pipeline is connected to the first reaction water tank, and the second end of the fourth acid gas removal pipeline is connected to the waste liquid treatment equipment.

[0101] More specifically, the first reaction water tank includes a first reaction water tank body, a first reaction interface, a second reaction interface, a third reaction interface, a fourth reaction interface and a fifth reaction interface. The first reaction interface is formed at the top of the first reaction water tank body, and is used to communicate with the second end of the first acid gas removal pipeline; the second reaction interface is formed at the top of the first reaction water tank body, and is used to communicate with the first end of the second acid gas removal pipeline; the third reaction interface is formed at the top of the first reaction water tank body, and is used to communicate with the sensor; the fourth reaction interface is formed at the top of the side wall of the first reaction water tank body, and is used to communicate with the second end of the third acid gas removal pipeline; the fifth reaction interface is formed at the bottom of the side wall of the first reaction water tank body, and is used to communicate with the first end of the fourth acid gas removal pipeline.

[0102] It should be noted that the acidic gas in the first filtered gas flowing into the first reaction water tank can react with the NaOH solution inside the first reaction water tank at room temperature, that is, the NaOH solution can absorb the acidic gas in the first filtered gas to achieve the effect of removing the acidic gas in the first filtered gas.

[0103] In some of the embodiments, the first reaction water tank includes but is not limited to a stainless steel water tank; the first acid gas removal pipeline includes but is not limited to a stainless steel pipe; the second acid gas removal pipeline includes but is not limited to a stainless steel pipe; the third acid gas removal pipeline includes but is not limited to a stainless steel pipe; the fourth acid gas removal pipeline includes but is not limited to a stainless steel pipe.

[0104] Furthermore, the second gas filter unit 300 further includes a seventh valve element 320. The seventh valve element 320 is disposed on a pipeline connecting the fourth filter element 310 with the first gas filter unit 200 and the downstream gas processing device to control the flow of the pipeline.

[0105] Specifically, the seventh valve element 320 includes a sixth pneumatic diaphragm valve, a ninth manual diaphragm valve, a seventh pneumatic diaphragm valve, a tenth manual diaphragm valve, an eleventh manual diaphragm valve, a seventh ball valve, and an eighth ball valve. Among them, the sixth pneumatic diaphragm valve is arranged on the first acid gas removal pipeline to control the circulation of the first acid gas removal pipeline; the ninth manual diaphragm valve is arranged on the first reaction water tank body and is connected to the first reaction interface to control the circulation between the first reaction water tank body and the first acid gas removal pipeline; the seventh pneumatic diaphragm valve is arranged on the second acid gas removal pipeline to control the circulation of the second acid gas removal pipeline; the tenth manual diaphragm valve is arranged on the first reaction water tank body and is connected to the second reaction interface to control the circulation between the first reaction water tank body and the second acid gas removal pipeline; the eleventh manual diaphragm valve is arranged on the first reaction water tank body and is connected to the third reaction interface to control the circulation between the first reaction water tank body and the sensor; the seventh ball valve is arranged on the first reaction water tank body and is connected to the fourth reaction interface to control the circulation between the first reaction water tank body and the NaOH solution source; the eighth ball valve is arranged on the first reaction water tank body and is connected to the fifth reaction interface to control the circulation between the first reaction water tank body and the waste liquid treatment equipment.

[0106] Furthermore, the second gas filter unit 300 further includes a sixth monitoring element 330 , wherein the sixth monitoring element 330 is in communication with the fourth filter element 310 and is used to monitor the pressure and liquid level inside the fourth filter element 310 .

[0107] Specifically, the sixth monitoring element 330 includes a third pressure sensor and a third liquid level sensor. The third pressure sensor is connected to the first reaction water tank body and is located downstream of the eleventh manual diaphragm valve, and is used to monitor the pressure inside the first reaction water tank body; the third liquid level sensor is arranged inside the first reaction water tank body, and is used to monitor the liquid level inside the first reaction water tank body.

[0108] like Figure 2 As shown in FIG. 1 , the second condensing unit 400 includes a third condensing element 410 and a third liquid storage element 420. The third condensing element 410 is connected to the second gas filtering unit 300 and the first purification unit 500, respectively, and is located downstream of the second gas filtering unit 300 and upstream of the first purification unit 500, and is used to purify H with a purity of 2N to 4N. 2 Condensation is performed to obtain a third condensed gas and a condensed liquid, and the third condensed gas is transported to the first purification unit 500; the third liquid storage element 420 is respectively connected to the third condensing element 410 and the waste liquid treatment equipment for storing the condensed liquid.

[0109] Specifically, the third condensing element 410 includes a third condenser, a sixth condensing main line, a sixth condensing branch line, a seventh condensing main line, a seventh condensing branch line, a third water bath, a fifth water bath line, and a sixth water bath line. The third condenser is connected to the upstream gas processing equipment and the first purification unit 500, respectively, and is used to purify H with a purity of 2N to 4N. 2 The third condensed gas is condensed to obtain the third condensed gas, and the third condensed gas is transported to the first purification unit 500; the first end of the sixth condensation main line is connected to the upstream gas processing equipment, and the second end of the sixth condensation main line is connected to the sixth condensation branch line for transporting 2N-4N purity H 2 The first end of the sixth condensation branch pipeline is connected to the second end of the sixth condensation main pipeline, and the second end of the sixth condensation branch pipeline is connected to the third condenser for conveying 2N to 4N purity H 2 ; The first end of the seventh condensation main pipeline is connected to the third condenser, and the second end of the seventh condensation main pipeline is connected to the seventh condensation branch pipeline, which is used to transport the third condensed gas and condensed liquid; the first end of the seventh condensation branch pipeline is connected to the second end of the seventh condensation main pipeline, and the second end of the seventh condensation branch pipeline is connected to the third liquid storage element 420, which is used to transport the third condensed gas and condensed liquid; the third water bath is connected to the third condenser, which is used to transport low-temperature liquid to the third condenser; the first end of the fifth water bath pipeline is connected to the third water bath, and the second end of the fifth water bath pipeline is connected to the third condenser, which is used to transport low-temperature liquid; the first end of the sixth water bath pipeline is connected to the third condenser, and the second end of the sixth water bath pipeline is connected to the third water bath, which is used to transport liquid with a higher temperature.

[0110] It should be noted that there are at least two third condensation elements 410 , and several third condensation elements 410 are arranged in parallel with each other and communicated with the second gas filter unit 300 .

[0111] In some embodiments, there are two third condensation elements 410 , and the two third condensation elements 410 are respectively arranged in parallel with each other and connected to the second gas filter unit 300 ; when one third condensation element 410 needs maintenance, it can be switched to another third condensation element 410 .

[0112] Specifically, the third condenser includes a third condenser body, an eleventh condensation port, a twelfth condensation port, a thirteenth condensation port, and a fourteenth condensation port. The eleventh condensation port is formed on the third condenser body, and the eleventh condensation port is connected to the second end of the sixth condensation pipeline; the twelfth condensation port is formed on the third condenser body, and the twelfth condensation outlet is connected to the first end of the seventh condensation pipeline; the thirteenth condensation port is formed on the third condenser body, and the thirteenth condensation inlet is connected to the second end of the fifth water bath pipeline; the fourteenth condensation port is formed on the third condenser body, and the second condensation outlet is connected to the first end of the sixth water bath pipeline.

[0113] It should be noted that the working environment of the third condenser body is between 1 and 10 degrees Celsius, and the condenser body can liquefy liquid molecules in the high-temperature gas.

[0114] Specifically, the third water bath includes a third water bath body, a fifth water bath port and a sixth water bath port. The fifth water bath port is formed in the third water bath body, and the fifth water bath inlet is connected to the first end of the fifth water bath pipeline; the sixth water bath port is formed in the third water bath body, and the sixth water bath port can be connected to the second end of the sixth water bath pipeline.

[0115] In some of the embodiments, the third condenser includes but is not limited to a water-cooled condenser; the third water bath includes but is not limited to a heat exchanger; the sixth condensation pipeline includes but is not limited to a stainless steel pipe; the seventh condensation pipeline includes but is not limited to a stainless steel pipe; the fifth water bath includes but is not limited to a stainless steel pipe; the sixth water bath pipeline includes but is not limited to a stainless steel pipe.

[0116] Specifically, the third liquid storage element 420 includes a third liquid storage tank, a fifth liquid storage pipeline, a sixth liquid storage branch pipeline, a sixth liquid storage main pipeline, a seventh liquid storage branch pipeline, a seventh liquid storage main pipeline and an eighth liquid storage pipeline. Among them, the first end of the fifth liquid storage pipeline is connected to the second end of the seventh condensation pipeline, and the second end of the fifth liquid storage pipeline is connected to the third liquid storage tank for conveying condensed liquid and the third condensed gas; the first end of the sixth liquid storage branch pipeline is connected to the third liquid storage tank, and the second end of the sixth liquid storage branch pipeline is connected to the sixth liquid storage main pipeline for conveying the third condensed gas; the first end of the sixth liquid storage main pipeline is connected to the second end of the sixth liquid storage branch pipeline, and the second end of the sixth liquid storage main pipeline is connected to the first purification unit 500 for conveying the third condensed gas; the first end of the seventh liquid storage branch pipeline is connected to the third liquid storage tank, and the second end of the seventh liquid storage branch pipeline is connected to the seventh liquid storage main pipeline for conveying condensed liquid; the first end of the seventh liquid storage main pipeline is connected to the seventh liquid storage branch pipeline, and the second end of the seventh liquid storage main pipeline is connected to the waste liquid treatment equipment for conveying condensed liquid; the first end of the eighth liquid storage pipeline is connected to the sixth liquid storage main pipeline, and the second end of the eighth liquid storage pipeline is connected to the exhaust gas combustion treatment equipment for conveying gas.

[0117] It should be noted that there are at least two third liquid storage elements 420 , and several third liquid storage elements 420 are respectively connected to the third condensing element 410 .

[0118] In some of the embodiments, there are two third liquid storage elements 420, and the two third liquid storage elements 420 are respectively connected to the third condensing element 410; when the liquid level height inside a third liquid storage element 420 exceeds a preset threshold, it can be switched to another third liquid storage element 420.

[0119] More specifically, the third liquid storage tank includes a third liquid storage tank body, a seventh liquid storage port, an eighth liquid storage port, a ninth liquid storage port, a tenth liquid storage port and a third thermostat. The seventh liquid storage port is formed in the third liquid storage tank body and is used to communicate with the second end of the fifth liquid storage pipeline; the eighth liquid storage port is formed in the third liquid storage tank body and is used to communicate with the first end of the sixth liquid storage pipeline; the ninth liquid storage port is formed in the third liquid storage tank body and is used to communicate with the sensor; the tenth liquid storage port is formed in the third liquid storage tank body and is used to communicate with the first end of the seventh liquid storage pipeline; the cooling coil of the third thermostat is coiled on the outer wall of the third liquid storage tank body, and the temperature inside the second liquid storage tank can be kept constant through heat exchange between the cooling coil and the third liquid storage tank body.

[0120] In some of the embodiments, the third liquid storage tank includes but is not limited to a stainless steel tank; the fifth liquid storage pipeline includes but is not limited to a stainless steel pipe; the sixth liquid storage pipeline includes but is not limited to a stainless steel pipe; the seventh liquid storage pipeline includes but is not limited to a stainless steel pipe; the third constant temperature element includes but is not limited to a constant temperature refrigerator compressor.

[0121] Furthermore, the second condensing unit 400 further includes an eighth valve element 430. The eighth valve element 430 is disposed on a pipeline connecting the third condensing element 410, the second gas filter unit 300 and the third liquid storage element 420, and is used to control the flow of the pipeline.

[0122] Specifically, the eighth valve element 430 includes an eighteenth manual diaphragm valve, a nineteenth manual diaphragm valve, a twentieth manual diaphragm valve, a twenty-first manual diaphragm valve, a thirteenth ball valve and a fourteenth ball valve. Among them, the eighteenth manual diaphragm valve is arranged on the sixth condensation main pipeline to control the circulation of the sixth condensation main pipeline; the nineteenth diaphragm valve is arranged on the sixth condensation branch pipeline to control the circulation of the sixth condensation branch pipeline; the twentieth manual diaphragm valve is arranged on the seventh condensation branch pipeline to control the circulation of the seventh condensation branch pipeline; the twenty-first manual diaphragm valve is arranged on the seventh condensation main pipeline to control the connection of the seventh condensation main pipeline; the thirteenth ball valve is arranged on the fifth water bath pipeline to control the circulation of the fifth water bath pipeline; the fourteenth ball valve is arranged on the sixth water bath pipeline to control the circulation of the sixth water bath pipeline.

[0123] Furthermore, the second condensing unit 400 further includes a ninth valve element 440. The ninth valve element 440 is disposed on a pipeline connecting the third liquid storage element 420 with the third condensing element 410, the first purification unit 500, and the waste liquid treatment device, and is used to control the flow of the pipeline.

[0124] Specifically, the ninth valve element 440 includes a twenty-second manual diaphragm valve, a twenty-third manual diaphragm valve, a twenty-fourth manual diaphragm valve, a twenty-fifth manual diaphragm valve, a twenty-sixth manual diaphragm valve, and a twenty-seventh manual diaphragm valve. Among them, the twenty-second manual diaphragm valve is arranged in the fifth liquid storage pipeline to control the circulation of the fifth liquid storage pipeline; the twenty-third manual diaphragm valve is arranged in the sixth liquid storage branch pipeline to control the circulation of the sixth liquid storage branch pipeline; the twenty-fourth manual diaphragm valve is arranged in the sixth liquid storage main pipeline to control the circulation of the sixth liquid storage main pipeline; the twenty-fifth manual diaphragm valve is arranged in the seventh liquid storage branch pipeline to control the circulation of the seventh liquid storage branch pipeline; the twenty-sixth manual diaphragm valve is arranged in the eighth liquid storage pipeline to control the circulation of the eighth liquid storage pipeline; the twenty-seventh manual diaphragm valve is arranged in the eighth liquid storage pipeline and is located downstream of the twenty-sixth manual diaphragm valve to control the circulation of the eighth liquid storage pipeline.

[0125] Furthermore, the second condensing unit 400 further includes a seventh monitoring element 450. The seventh monitoring element 450 is connected to the third condensing element 410 and the third liquid storage element 420, and is used to monitor the temperature of the third condensing element 410 and the temperature, liquid level and pressure of the third liquid storage element 420.

[0126] Specifically, the seventh monitoring element 450 includes a third temperature sensor, a sixth pressure sensor, a sixth liquid level sensor, a seventh pressure sensor and a fourth temperature sensor. The third temperature sensor is connected to the sixth condensation branch pipeline to monitor the temperature inside the sixth condensation branch pipeline; the sixth pressure sensor is connected to the third liquid storage tank to monitor the pressure inside the third liquid storage tank; the sixth liquid level sensor is arranged inside the third liquid storage tank to monitor the liquid level inside the third liquid storage tank; the seventh pressure sensor is connected to the sixth liquid storage main pipeline to monitor the pressure inside the sixth liquid storage main pipeline; the fourth temperature sensor is connected to the sixth liquid storage main pipeline to monitor the temperature inside the sixth liquid storage main pipeline.

[0127] like Figure 2 As shown, the first purification unit 500 includes a first purification element 510. The first purification element 510 is connected to the second condensing unit 400 and the second purification unit 600, respectively, and is located downstream of the second condensing unit 400 and upstream of the second purification unit 600, and is used to filter H in the third condensed gas. 2 O thereby obtaining a first purified gas, and delivering the first purified gas to the second purification unit 600.

[0128] Specifically, the first purification element 510 includes a desorption adsorption tank, a first adsorption pipeline, a second adsorption branch pipeline, and a second adsorption main pipeline. The first end of the first adsorption pipeline is connected to the second end of the sixth liquid storage main pipeline, and the second end of the first adsorption pipeline is connected to the desorption adsorption tank for conveying the third condensed gas; the first end of the second adsorption branch pipeline is connected to the desorption adsorption tank, and the second end of the second adsorption pipeline is connected to the second adsorption main pipeline for conveying the first purified gas; the first end of the second adsorption main pipeline is connected to the second adsorption branch pipeline, and the second end of the second adsorption main pipeline is connected to the second purification unit 600 for conveying the first purified gas.

[0129] More specifically, the desorption adsorption tank includes a desorption adsorption tank body, a first adsorption port, a second adsorption port, a third adsorption port and a fourth adsorption port. The first adsorption port is formed on the desorption adsorption tank body, and the first adsorption port can be connected to the first adsorption pipeline; the second adsorption port is formed on the desorption adsorption tank body, and the second adsorption port can be connected to the second adsorption branch pipeline; the third adsorption port is formed on the desorption adsorption tank body, and the third adsorption port is connected to the high-temperature nitrogen source; the fourth adsorption port is formed on the desorption adsorption tank body, and the fourth adsorption port can be connected to the waste collection device.

[0130] In some of the embodiments, the desorption adsorption tank includes but is not limited to an activated carbon adsorption tank; the first adsorption pipeline includes but is not limited to a stainless steel pipe; the second adsorption branch pipeline includes but is not limited to a stainless steel pipe; and the second adsorption main pipeline includes but is not limited to a stainless steel pipe.

[0131] Furthermore, the first purification unit 500 further includes a tenth valve element 520. The tenth valve element 520 is disposed on a pipeline connecting the first purification element 510 with the second condensing unit 400 and the second purification unit 600, and is used to control the flow of the pipeline.

[0132] Specifically, the tenth valve element 520 includes a twenty-eighth manual diaphragm valve, a twenty-ninth manual diaphragm valve, a second one-way valve, and a thirtieth manual diaphragm valve. The twenty-eighth manual diaphragm valve is disposed in the first adsorption pipeline to control the flow of the first adsorption pipeline; the twenty-ninth manual diaphragm valve is disposed in the second adsorption branch pipeline to control the flow of the second adsorption branch pipeline; the second one-way valve is disposed in the second adsorption main pipeline to prevent the gas inside the second adsorption main pipeline from backflowing; the thirtieth manual diaphragm valve is disposed in the second adsorption main pipeline to control the flow of the second adsorption main pipeline.

[0133] Furthermore, the first purification unit 500 further includes an eighth monitoring element 530 , which is in communication with the first purification element 510 and is used to monitor the pressure inside the first purification element 510 .

[0134] Specifically, the eighth monitoring element 530 includes an eighth pressure sensor, wherein the eighth pressure sensor is connected to the second adsorption main line and is used to monitor the pressure inside the second adsorption main line.

[0135] like Figure 2 As shown, the second purification unit 600 includes a second purification element 610. The second purification element 610 is connected to the first purification unit 500, the delivery unit 700, and the tail gas combustion treatment device, and is located downstream of the first purification unit 500 and upstream of the delivery unit 700, and is used to filter the impurities in the first purified gas to obtain H with a purity of 4N to 6N. 2 , and transport 4N to 6N purity H 2 To the conveying unit 700.

[0136] Specifically, the second purification element 610 includes a separation membrane tank, a first purification pipeline, a second purification pipeline, and a third purification pipeline. The separation membrane tank is connected to the first purification unit 500, the delivery unit 700, and the tail gas combustion treatment equipment, and is located downstream of the first purification unit 500 and upstream of the delivery unit 700, and is used to filter the impurities in the first purified gas to obtain H with a purity of 4N to 6N. 2 The first end of the first purification pipeline is connected to the second adsorption main pipeline, and the second end of the first purification pipeline is connected to the separation membrane tank for conveying the first purified gas; the first end of the second purification pipeline is connected to the separation membrane tank, and the second end of the second purification pipeline is connected to the conveying unit 700 for conveying 4N to 6N purity H 2 The first end of the third purification pipeline is connected to the separation membrane tank, and the second end of the third purification pipeline is connected to the tail gas combustion treatment equipment for conveying impurities.

[0137] More specifically, the separation membrane tank includes a separation membrane tank body, a first purification port, a second purification port, and a third purification port. The first purification port is formed at the bottom of the separation membrane tank body, and the first purification port can be connected to the first purification pipeline; the second purification port is formed at the top of the separation membrane tank body, and the second purification port can be connected to the second purification pipeline; the third purification port is formed at the top of the separation membrane tank body, and the third purification port can be connected to the third purification pipeline.

[0138] In some of the embodiments, the separation membrane tank includes but is not limited to a small molecule separation membrane tank; the first purification pipeline includes but is not limited to a stainless steel pipe; the second purification pipeline includes but is not limited to a stainless steel pipe; and the third purification pipeline includes but is not limited to a stainless steel pipe.

[0139] Furthermore, the second purification unit 600 further includes an eleventh valve element 620. The eleventh valve element 620 is disposed on a pipeline connecting the second purification element 610 with the first purification unit 500 and the delivery unit 700, and is used to control the flow of the pipeline.

[0140] Specifically, the eleventh valve element 620 includes a thirty-first manual diaphragm valve, a thirty-second manual diaphragm valve, a thirty-third manual diaphragm valve and a third one-way valve. The thirty-first manual diaphragm valve is arranged in the first purification pipeline to control the connection of the first purification pipeline; the thirtieth manual diaphragm valve is arranged in the second purification pipeline to control the circulation of the second purification pipeline; the thirty-second manual diaphragm valve is arranged in the third purification pipeline to control the circulation of the third purification pipeline; the third one-way valve is arranged in the third purification pipeline and is located downstream of the thirty-third manual diaphragm valve to prevent the gas in the third purification pipeline from backflowing.

[0141] Furthermore, the second purification unit 600 further includes a ninth monitoring element 630. The ninth monitoring element 630 is in communication with the second purification element 610 and is used to monitor the pressure inside the second purification element 610.

[0142] Specifically, the ninth monitoring element 630 includes a ninth pressure sensor, wherein the ninth pressure sensor is connected to the separation membrane tank and is used to monitor the pressure inside the separation membrane tank.

[0143] like Figure 2 As shown, the conveying unit 700 includes a conveying element 710. The conveying element 710 is connected to the first purification unit 500 and the downstream semiconductor process equipment respectively, and is used to convey H with a purity of 4N to 6N. 2 To downstream semiconductor process equipment.

[0144] Specifically, the conveying unit 700 includes a first conveying pipeline, a first vacuum pump, and a second conveying pipeline. The first end of the first conveying pipeline is connected to the second end of the second purification pipeline, and the second end of the first conveying pipeline is connected to the downstream semiconductor process equipment for conveying 4N-6N pure H 2 The first vacuum pump is arranged in the first delivery pipeline, and is used to provide vacuum negative pressure at the connection point between the first delivery pipeline and the second purification pipeline; the first end of the second delivery pipeline is connected to the first delivery pipeline and is located upstream of the first vacuum pump, and the second end of the second delivery pipeline is connected to the first delivery pipeline and is located downstream of the vacuum pump, and is used to deliver 4N to 6N purity H 2 .

[0145] It should be noted that the second delivery pipeline can discharge the gas in the first delivery pipeline to the downstream semiconductor process equipment when the first vacuum pump is under maintenance.

[0146] In some of the embodiments, the first delivery pipeline includes but is not limited to a stainless steel pipe; the second delivery pipeline includes but is not limited to a stainless steel pipe; the first vacuum pump includes but is not limited to a dry screw vacuum pump.

[0147] Furthermore, the delivery unit 700 further includes a twelfth valve element 720. The twelfth valve element 720 is disposed on a pipeline connecting the delivery element 710 with the second purification unit 600 and downstream semiconductor process equipment to control the flow of the pipeline.

[0148] Specifically, the twelfth valve element 720 includes a thirty-fourth manual diaphragm valve, a thirty-fifth manual diaphragm valve, a thirty-sixth manual diaphragm valve, a thirty-seventh manual diaphragm valve, a thirty-eighth manual diaphragm valve, a fourth check valve, and a twelfth pneumatic diaphragm valve. Among them, the thirty-fourth manual diaphragm valve is arranged on the first conveying pipeline and is located downstream of the connection point between the first end of the second conveying pipeline and the first conveying pipeline; the thirty-fifth manual diaphragm valve is arranged on the first conveying pipeline and is located downstream of the connection point between the first end of the second conveying pipeline and the first conveying pipeline; the thirty-sixth manual diaphragm valve is arranged on the first conveying pipeline and is located upstream of the connection point between the second end of the second conveying pipeline and the first conveying pipeline; the thirty-seventh manual diaphragm valve is arranged on the first conveying pipeline and is located downstream of the connection point between the second end of the second conveying pipeline and the first conveying pipeline; the fourth one-way valve is arranged on the first conveying pipeline and is located downstream of the thirty-seventh manual diaphragm valve, which is used to prevent the backflow of gas inside the first conveying pipeline; the twelfth pneumatic diaphragm valve is arranged on the first conveying pipeline and is located downstream of the fourth one-way valve, which is used to control the connection between the first conveying pipeline and the downstream semiconductor process equipment; the thirty-eighth manual diaphragm valve is arranged on the second conveying pipeline, which is used to control the circulation of the second conveying pipeline.

[0149] Furthermore, the conveying unit 700 further includes a tenth monitoring element 730 , wherein the tenth monitoring element 730 is in communication with the conveying element 710 and is used to monitor the pressure inside the conveying element 710 .

[0150] Specifically, the tenth monitoring element 730 includes a tenth pressure sensor and an eleventh pressure sensor. The tenth pressure sensor is connected to the first delivery pipeline and is located upstream of the thirty-second manual diaphragm valve, and is used to monitor the pressure inside the first delivery pipeline; the eleventh pressure sensor is connected to the first delivery pipeline and is located between the thirty-fifth manual diaphragm valve and the fourth one-way valve, and is used to monitor the pressure inside the first delivery pipeline.

[0151] The method of using this embodiment is as follows:

[0152] (Preparation process)

[0153] The first valve element 130, the third valve element 180, and the eighth valve element 430 are opened, so that the first water bath and the third water bath are connected to the first condensation element 110 and the third condensation element 410 respectively, so that the coolant in the first water bath and the third water bath can flow to the first condensation element 110 and the third condensation element 410, thereby making the internal temperature of the first condensation element 110 and the third condensation element 410 meet the requirements.

[0154] (First Condensation Step)

[0155] Opening the first valve element 130 allows the mixed gas generated by the upstream semiconductor process equipment to flow to the first condensing element 110, so that the first condensing element 110 liquefies the gaseous trichlorosilane in the mixed gas and obtains liquid trichlorosilane and the first condensed gas;

[0156] The second valve element 140 is opened to allow the first condensing element 110 to communicate with the first liquid storage element 120 , so that liquid trichlorosilane is stored in the first liquid storage element 120 .

[0157] (First Filtration Step)

[0158] The fourth valve element 220 is opened to connect the first filter element 210 with the first condensing element 110. The first filter element 210 passes through the first condensing gas. 3 The gas (phosphine gas) reacts with the iron powder under high temperature conditions to generate solid FeP and hydrogen and obtain the first filtered gas, thereby achieving the pH in the first condensed gas. 3 Gas removal.

[0159] (Second Filtration Step)

[0160] The seventh valve element 320 is opened to connect the fourth filter element 310 with the first filter element 210. The NaOH solution in the fourth filter element 310 can absorb the acidic gas in the first filtered gas, thereby obtaining H with a purity of 2N to 4N. 2 .

[0161] (Second condensation step)

[0162] The eighth valve element 430 is opened to connect the fourth filter element 310 with the third condensing element 410, so that the 2N-4N pure H 2 The third condensation element 410 can condense 2N to 4N pure H 2 The contained water vapor is condensed and liquefied, thereby obtaining a third condensed gas;

[0163] The ninth valve element 440 is opened so that the third condensing element 410 is communicated with the third liquid storage element 420 , so that the condensed liquid is stored in the third liquid storage element 420 .

[0164] (First purification step)

[0165] The tenth valve element 520 is opened so that the third condensed gas in the third liquid storage element 420 can flow to the first purification element 510 and the high-temperature nitrogen source delivers high-temperature nitrogen to the first purification element 510, thereby removing liquid molecules in the third condensed gas and obtaining the first purified gas.

[0166] (Second purification step)

[0167] The eleventh valve element 620 is opened, so that the first purified gas processed by the first purification element 510 flows to the second purification element 610, and the second purification element 610 only allows small molecular hydrogen to pass through, thereby removing impurities in the first purified gas and obtaining H with a purity of 4N to 6N. 2 .

[0168] (Conveying process)

[0169] Open the twelfth switch valve element so that the 4N-6N purity H 2 The liquid crystal may flow to downstream semiconductor processing equipment via the conveying element 710 for subsequent process flow.

[0170] The advantage of this embodiment is that the mixed gas of the upstream semiconductor process equipment is processed by the first condensation unit, the first gas filtration unit, the second gas filtration unit, the second condensation unit, the first purification unit and the second purification unit in sequence, thereby gradually removing trichlorosilane, PH 3 Gas, acid gas, liquid molecules and impurities, thus obtaining 4N to 6N purity H 2 , to achieve separation and purification of mixed gases, and secondary recycling of mixed gases, which can avoid waste of production resources and reduce costs.

[0171] Example 2

[0172] This embodiment is a variation of Embodiment 1.

[0173] like Figure 3As shown, the first condensing unit 100 further includes a second condensing element 160 and a second liquid storage element 170. The second condensing element 160 is respectively connected to the upstream semiconductor process equipment and the first gas filter unit 200, and is located downstream of the upstream semiconductor process equipment and upstream of the first gas filter unit 200, and is used to condense the first condensed gas to remove dichlorosilane to obtain the second condensed gas, and to transport the second condensed gas to the first gas filter unit 200; the second liquid storage element 170 is respectively connected to the second condensing element 160 and the waste liquid treatment equipment, and is used to store liquid dichlorosilane.

[0174] Specifically, the second condensation element 160 includes a second condenser, a fourth condensation pipeline, a fifth condensation pipeline, a second water bath, a third water bath pipeline and a fourth water bath pipeline. The first end of the fourth condensation pipeline is connected to the second condenser, and the second end of the fourth condensation pipeline is connected to the second liquid storage element 170 for conveying liquid dichlorosilane; the first end of the fifth condensation pipeline is connected to the second condenser, and the second end of the fifth condensation pipeline is connected to the first gas filter unit 200 for conveying the second condensed gas; the first end of the third water bath pipeline is connected to the second water bath, and the second end of the third water bath pipeline is connected to the second condenser for conveying coolant; the first end of the fourth water bath pipeline is connected to the second condenser, and the second end of the fourth water bath pipeline is connected to the second water bath for conveying coolant.

[0175] More specifically, the second condenser includes a second condenser body, a sixth condensation port, a seventh condensation port, an eighth condensation port, a ninth condensation port, and a tenth condensation port. The sixth condensation port is formed on the second condenser body and is used to communicate with the second end of the third condensation pipeline; the seventh condensation port is formed on the second condensation body and is used to communicate with the first end of the fourth condensation pipeline; the eighth condensation port is formed on the second condensation body and is used to communicate with the first end of the fifth condensation pipeline; the ninth condensation port and the tenth condensation port are formed on the second condenser body and are used to communicate with the second heat exchange element.

[0176] It should be noted that the temperature of the coolant in the second condenser body is 1° C. to 10° C. Preferably, the temperature of the coolant in the second condenser body is 5° C.

[0177] More specifically, the second water bath includes a second water bath body, a third water bath port and a fourth water bath port. The third water bath port is formed in the second water bath body for communicating with the third water bath pipeline; the fourth water bath port is formed in the second water bath body for communicating with the fourth water bath pipeline.

[0178] More specifically, a first end of the third water bath pipeline is communicated with the third water bath port of the second water bath body, and a second end of the third water bath pipeline is communicated with the ninth condensation port of the second condenser body.

[0179] More specifically, the first end of the fourth water bath pipeline is communicated with the tenth condensation port of the second condenser body, and the second end of the fourth water bath pipeline is communicated with the fourth water bath port of the second water bath body.

[0180] In some of the embodiments, the first condenser includes but is not limited to a water-cooled condenser; the fourth condensation pipeline includes but is not limited to a stainless steel pipe; the fifth condensation pipeline includes but is not limited to a stainless steel pipe; the second water bath includes but is not limited to a heat exchanger; the third water bath pipeline includes but is not limited to a stainless steel pipe; the fourth water bath pipeline includes but is not limited to a stainless steel pipe.

[0181] Specifically, the second liquid storage element 170 includes a second liquid storage tank, a third liquid storage pipeline and a fourth liquid storage pipeline. The first end of the third liquid storage pipeline is connected to the second end of the fourth condensation pipeline, and the second end of the third liquid storage pipeline is connected to the second liquid storage tank for conveying liquid dichlorosilane; the first end of the fourth liquid storage pipeline is connected to the second liquid storage tank, and the second end of the fourth liquid storage pipeline is connected to the waste liquid treatment equipment for conveying liquid dichlorosilane.

[0182] It should be noted that there are at least two second liquid storage elements 170 , and several second liquid storage elements 170 are respectively connected to the second condensing element 160 .

[0183] In some embodiments, there are two second liquid storage elements 170, and the two second liquid storage elements 170 are respectively connected to the second condensing element 160; when the liquid level height inside a second liquid storage element 170 exceeds a preset threshold, it can be switched to another second liquid storage element 170.

[0184] More specifically, the second liquid storage tank includes a second liquid storage tank body, a fourth liquid storage port, a fifth liquid storage port, a sixth liquid storage port and a second thermostat. The fourth liquid storage port is formed in the second liquid storage tank body for communicating with the third liquid storage pipeline; the fifth liquid storage port is formed in the second liquid storage tank body for communicating with the fourth liquid storage pipeline; the sixth liquid storage port is formed in the second liquid storage tank body for communicating with the sensor. The cooling coil of the second thermostat is coiled on the outer side wall of the second liquid storage tank body, and the temperature inside the second liquid storage tank body can be kept constant through heat exchange between the cooling coil and the second liquid storage tank body.

[0185] In some of the embodiments, the second liquid storage tank includes but is not limited to a stainless steel tank; the third liquid storage pipeline includes but is not limited to a stainless steel pipe; the fourth liquid storage pipeline includes but is not limited to a stainless steel pipe; the second constant temperature element includes but is not limited to a constant temperature refrigerator compressor.

[0186] Furthermore, the first condensing unit 100 further includes a third valve element 180. The third valve element 180 is disposed on a pipeline connecting the second condensing element 160 with the second liquid storage element 170, the first gas filter unit 200, and the waste liquid treatment device to control the flow of the pipeline.

[0187] Specifically, the third valve element 180 includes a third ball valve, a fourth ball valve, a third pneumatic diaphragm valve, a fourth manual diaphragm valve, a fifth manual diaphragm valve and a sixth manual diaphragm valve. The third ball valve is arranged on the second condenser body and communicated with the ninth condensation port to control the flow between the second condenser body and the third water bath pipeline; the fourth ball valve is arranged on the second condenser body and communicated with the tenth condensation port to control the flow between the second condenser body and the fourth water bath pipeline; the third pneumatic diaphragm valve is arranged on the third liquid storage pipeline to control the flow of the third liquid storage pipeline; the fourth manual diaphragm valve is arranged on the top of the second liquid storage tank body and communicated with the fourth liquid storage port to control the flow between the second liquid storage tank body and the third liquid storage pipeline; the fifth manual diaphragm valve is arranged on the top of the second liquid storage tank body and communicated with the sixth liquid storage port to control the flow between the second liquid storage tank and the sensor; the sixth manual diaphragm valve is arranged on the side wall at the bottom of the second liquid storage tank body and communicated with the fifth liquid storage port to control the flow between the second liquid storage tank body and the fourth liquid storage pipeline.

[0188] Furthermore, the first condensing unit 100 further includes a second monitoring element 190 . The second monitoring element 190 is in communication with the second liquid storage element 170 , and is used to monitor the pressure, temperature and liquid level inside the second liquid storage element 170 .

[0189] Specifically, the second monitoring element 190 includes a second pressure sensor, a second temperature sensor and a second liquid level sensor. The second pressure sensor is connected to the second liquid storage tank body through a pipeline and is located downstream of the fifth manual diaphragm valve, and is used to monitor the pressure inside the second liquid storage tank body; the second temperature sensor is arranged inside the second liquid storage tank body, and is used to monitor the temperature of the liquid inside the second liquid storage tank body; the second liquid level sensor is arranged inside the second liquid storage tank body, and is used to monitor the liquid level inside the second liquid storage tank body.

[0190] The method of using this embodiment is as follows:

[0191] (The first condensation step) also includes:

[0192] The first condensed gas flows to the second condensation element 160 through the pipeline, and the second condensation element 160 can liquefy the gaseous dichlorosilane in the first condensed gas to obtain liquid dichlorosilane and the second condensed gas;

[0193] The third valve element 180 is opened so that the second condensing element 160 is communicated with the second liquid storage element 170 , so that the liquid dichlorosilane is stored in the second liquid storage element 170 .

[0194] The advantage of this embodiment is that, by arranging the second condensing element between the first condensing element and the first filtering element, the gaseous dichlorosilane in the first condensed gas can be liquefied, thereby removing the gaseous dichlorosilane and improving the purity of the gas.

[0195] Example 3

[0196] This embodiment is a variation of Embodiments 1 to 2.

[0197] like Figure 4 As shown, the first gas filter unit 200 further includes a second filter element 240. The second filter element 240 is respectively connected to the first condensation unit 100, the second gas filter unit 300, and the waste liquid treatment device, and is located downstream of the first condensation unit 100 and upstream of the second gas filter unit 300, and is used to filter the first condensed gas and / or the second condensed gas to remove diborane to obtain a second filtered gas, and to transport the second filtered gas to the second gas filter unit 300.

[0198] Specifically, the second filter element 240 includes a second reaction water tank, a first diborane removal pipeline, a second diborane removal pipeline, a third diborane removal pipeline and a fourth diborane removal pipeline. The first end of the first diborane removal pipeline is connected to the second end of the second phosphine removal pipeline, and the second end of the first diborane removal pipeline is connected to the second reaction water tank for conveying the first filtered gas; the first end of the second diborane removal pipeline is connected to the second reaction water tank, and the second end of the second diborane removal pipeline is connected to the first end of the first acid gas removal pipeline for conveying the second filtered gas; the first end of the third diborane removal pipeline is connected to a water source, and the second end of the third diborane removal pipeline is connected to the second reaction water tank for conveying water; the first end of the fourth diborane removal pipeline is connected to the second reaction water tank, and the second end of the fourth diborane removal pipeline is connected to a waste liquid treatment device for conveying waste liquid.

[0199] More specifically, the second reaction water tank includes a second reaction water tank body, a sixth reaction interface, a seventh reaction interface, an eighth reaction interface, a ninth reaction interface and a tenth reaction interface. The sixth reaction interface is formed at the top of the second reaction water tank body, and is used to communicate with the second end of the first diborane removal pipeline; the seventh reaction interface is formed at the top of the second reaction water tank body, and is used to communicate with the first end of the second diborane removal pipeline; the eighth reaction interface is formed at the top of the second reaction water tank body, and is used to communicate with the sensor; the ninth reaction interface is formed at the top of the side wall of the second reaction water tank body, and is used to communicate with the second end of the third diborane removal pipeline; the tenth reaction interface is formed at the bottom of the side wall of the second reaction water tank body, and is used to communicate with the first end of the fourth diborane removal pipeline.

[0200] It should be noted that the borane gas in the first filtered gas flowing into the second reaction water tank can react with the aqueous solution inside the second reaction water tank at room temperature, that is, the aqueous solution can absorb the borane gas in the first filtered gas to achieve the effect of removing the borane gas in the first filtered gas.

[0201] In some of the embodiments, the second reaction water tank includes but is not limited to a stainless steel water tank; the first diborane removal pipeline includes but is not limited to a stainless steel pipe; the second diborane removal pipeline includes but is not limited to a stainless steel pipe; and the third diborane removal pipeline includes but is not limited to a stainless steel pipe.

[0202] Furthermore, the first gas filter unit 200 further includes a fifth valve element 250. The fifth valve element 250 is disposed on a pipeline connecting the second filter element 240 with the first condensation unit 100 and the second gas filter unit 300 to control the flow of the pipeline.

[0203] Specifically, the fifth valve element 250 includes an eighth pneumatic diaphragm valve, a twelfth manual diaphragm valve, a ninth pneumatic diaphragm valve, a thirteenth manual diaphragm valve, a fourteenth manual diaphragm valve, a ninth ball valve, and a tenth ball valve. Among them, the eighth pneumatic diaphragm valve is arranged on the first diborane removal pipeline to control the circulation of the first diborane removal pipeline; the twelfth manual diaphragm valve is arranged on the second reaction water tank body and is connected to the sixth reaction interface to control the circulation between the second reaction water tank body and the first diborane removal pipeline; the ninth pneumatic diaphragm valve is arranged on the second diborane removal pipeline to control the circulation of the second diborane removal pipeline; the thirteenth manual diaphragm valve is arranged on the second reaction water tank body and is connected to the seventh reaction interface to control the circulation between the second reaction water tank body and the second diborane removal pipeline; the fourteenth manual diaphragm valve is arranged on the second reaction water tank body and is connected to the eighth reaction interface to control the circulation between the second reaction water tank body and the sensor; the ninth ball valve is arranged on the second reaction water tank body and is connected to the ninth reaction interface to control the circulation between the second reaction water tank body and the aqueous solution source; the tenth ball valve is arranged on the second reaction water tank body and is connected to the tenth reaction interface to control the circulation between the second reaction water tank body and the waste liquid treatment equipment.

[0204] Furthermore, the first gas filter unit 200 further includes a fourth monitoring element 260 , which is in communication with the second filter element 240 and is used to monitor the pressure and liquid level inside the second filter element 240 .

[0205] Specifically, the fourth monitoring element 260 includes a fourth pressure sensor and a fourth liquid level sensor. The fourth pressure sensor is connected to the second reaction water tank body and is located downstream of the fourteenth manual diaphragm valve, and is used to monitor the pressure inside the second reaction water tank body; the fourth liquid level sensor is arranged inside the second reaction water tank body, and is used to monitor the liquid level inside the second reaction water tank body.

[0206] The method of using this embodiment is as follows:

[0207] The first filtering step further includes: opening the fifth valve element 250 so that the second filter element 240 and the first condensation element 110 are connected, and the aqueous solution inside the second filter element 240 can be used to filter B in the first filtered gas. 2 H 6 The gas (diborane gas) reacts with water at room temperature to obtain a second filtered gas.

[0208] (Second Filtration Step)

[0209] The seventh valve element 320 is opened to connect the fourth filter element 310 with the second filter element 240. The NaOH solution in the fourth filter element 310 can absorb the acidic gas in the second filtered gas, thereby obtaining H with a purity of 2N to 4N. 2 .

[0210] The advantage of this embodiment is that by arranging the second filter element between the first condensing element and the fourth filter element, B in the first condensed gas can be filtered. 2 H 6 Gas removal to further improve gas purity.

[0211] Example 4

[0212] This embodiment is a variation of Embodiments 1 to 3.

[0213] like Figure 5 As shown, the first gas filter unit 200 further includes a third filter element 270. The third filter element 270 is respectively connected to the first condensation unit 100, the second gas filter unit 300, and the waste liquid treatment device, and is located downstream of the first condensation unit 100 and upstream of the second gas filter unit 300, and is used to filter the first condensed gas and / or the second condensed gas to remove germanium hydride to obtain a third filtered gas, and to transport the third filtered gas to the second gas filter unit 300.

[0214] Specifically, the third filter element 270 includes a third reaction water tank, a first germanium hydride removal pipeline, a second germanium hydride removal pipeline, a third germanium hydride removal pipeline, and a fourth germanium hydride removal pipeline. The first end of the first germanium hydride removal pipeline is connected to the second end of the second phosphine removal pipeline, and the second end of the first germanium hydride removal pipeline is connected to the third reaction water tank for conveying the first filtered gas; the first end of the second germanium hydride removal pipeline is connected to the third reaction water tank, and the second end of the second germanium hydride removal pipeline is connected to the first end of the first acid gas removal pipeline for conveying the third filtered gas; the first end of the third germanium hydride removal pipeline is connected to the silver nitrate solution source, and the second end of the third germanium hydride removal pipeline is connected to the third reaction water tank for conveying the silver nitrate solution source; the first end of the fourth germanium hydride removal pipeline is connected to the third reaction water tank, and the second end of the fourth germanium hydride removal pipeline is connected to the waste liquid treatment equipment for conveying waste liquid.

[0215] More specifically, the third reaction water tank includes a third reaction water tank body, an eleventh reaction interface, a twelfth reaction interface, a thirteenth reaction interface, a fourteenth reaction interface and a fifteenth reaction interface. Among them, the eleventh reaction interface is formed at the top of the third reaction water tank body, and is used to communicate with the second end of the first germanium hydride removal pipeline; the twelfth reaction interface is formed at the top of the third reaction water tank body, and is used to communicate with the first end of the second germanium hydride removal pipeline; the thirteenth reaction interface is formed at the top of the third reaction water tank body, and is used to communicate with the sensor; the fourteenth reaction interface is formed at the top of the side wall of the third reaction water tank body, and is used to communicate with the second end of the third germanium hydride removal pipeline; the fifteenth reaction interface is formed at the bottom of the side wall of the third reaction water tank body, and is used to communicate with the first end of the fourth germanium hydride removal pipeline.

[0216] It should be noted that the germane gas in the first filtered gas flowing into the third reaction water tank can react with the silver nitrate solution inside the third reaction water tank at room temperature, that is, the silver nitrate solution can absorb the germane gas in the first filtered gas to achieve the effect of removing the germane gas in the first filtered gas.

[0217] In some of the embodiments, the third reaction water tank includes but is not limited to a stainless steel water tank; the first germanium hydride removal pipeline includes but is not limited to a stainless steel pipe; the second germanium hydride removal pipeline includes but is not limited to a stainless steel pipe; the third germanium hydride removal pipeline includes but is not limited to a stainless steel pipe; the fourth germanium hydride removal pipeline includes but is not limited to a stainless steel pipe.

[0218] Furthermore, the first gas filter unit 200 further includes a sixth valve element 280. The sixth valve element 280 is disposed on a pipeline connecting the third filter element 270 with the first condensation unit 100 and the second gas filter unit 300 to control the flow of the pipeline.

[0219] Specifically, the sixth valve element 280 includes a tenth pneumatic diaphragm valve, a fifteenth manual diaphragm valve, an eleventh pneumatic diaphragm valve, a sixteenth manual diaphragm valve, a seventeenth manual diaphragm valve, an eleventh ball valve, and a twelfth ball valve. Among them, the tenth pneumatic diaphragm valve is arranged on the first germanium hydride removal pipeline to control the circulation of the first germanium hydride removal pipeline; the fifteenth manual diaphragm valve is arranged on the third reaction water tank body and is connected to the eleventh reaction interface to control the circulation between the third reaction water tank body and the first germanium hydride removal pipeline; the eleventh pneumatic diaphragm valve is arranged on the second germanium hydride removal pipeline to control the circulation of the second germanium hydride removal pipeline; the sixteenth manual diaphragm valve is arranged on the third reaction water tank body and is connected to the twelfth reaction interface to control the circulation between the third reaction water tank body and the second germanium hydride removal pipeline; the seventeenth manual diaphragm valve is arranged on the third reaction water tank body and is connected to the thirteenth reaction interface to control the circulation between the third reaction water tank body and the sensor; the eleventh ball valve is arranged on the third reaction water tank body and is connected to the fourteenth reaction interface to control the circulation between the third reaction water tank body and the silver nitrate solution source; the twelfth ball valve is arranged on the third reaction water tank body and is connected to the fifteenth reaction interface to control the circulation between the third reaction water tank body and the waste liquid treatment equipment.

[0220] Furthermore, the first gas filter unit 200 further includes a fifth monitoring element 290 , wherein the fifth monitoring element 290 is in communication with the third filter element 270 and is used to monitor the pressure and liquid level inside the third filter element 270 .

[0221] Specifically, the fifth monitoring element 290 includes a fifth pressure sensor and a fifth liquid level sensor. The fifth pressure sensor is connected to the third reaction water tank body and is located downstream of the seventeenth manual diaphragm valve, and is used to monitor the pressure inside the third reaction water tank body; the fifth liquid level sensor is arranged inside the third reaction water tank body, and is used to monitor the liquid level inside the third reaction water tank body.

[0222] The method of using this embodiment is as follows:

[0223] (The first filtering step) also includes:

[0224] The sixth valve element 280 is opened to connect the third filter element 270 and the first condensation element 110. The silver nitrate solution in the third filter element 270 can remove the GeH 4 The gas (germane gas) reacts with the silver nitrate solution at room temperature to obtain a third filtered gas.

[0225] (Second Filtration Step)

[0226] The seventh valve element 320 is opened to connect the fourth filter element 310 with the third filter element 270. The NaOH solution in the fourth filter element 310 can absorb the acidic gas in the third filtered gas, thereby obtaining H with a purity of 2N to 4N. 2 .

[0227] The advantage of this embodiment is that by arranging the third filter element between the first condensing element and the fourth filter element, the GeH in the first condensing gas can be filtered. 4 Gas removal to further improve gas purity.

[0228] Example 5

[0229] This embodiment is a variation of Embodiments 1 to 4.

[0230] like Figure 6 As shown, the first gas filter unit 200 includes a second filter element 240 and a third filter element 270. The second filter element 240 is disposed between the first filter element 210 and the fourth filter element 310, and is located downstream of the first filter element 210 and upstream of the fourth filter element 310; the third filter element 270 is disposed between the second filter element 240 and the fourth filter element 310, and is located downstream of the second filter element 240 and upstream of the fourth filter element 310.

[0231] The method of using this embodiment is as follows:

[0232] (The first filtering step) also includes:

[0233] The fifth valve element 250 is opened to connect the second filter element 240 with the first filter element 210, and the aqueous solution inside the second filter element 240 can pass through the B in the first filter gas. 2 H 6 The gas (borane gas) reacts with water at room temperature to obtain a second filtered gas;

[0234] The sixth valve element 280 is opened to connect the third filter element 270 with the second filter element 240. The silver nitrate solution in the third filter element 270 can remove the GeH 4 The gas (germane gas) reacts with the silver nitrate solution at room temperature to obtain a third filtered gas.

[0235] (Second Filtration Step)

[0236] The seventh valve element 320 is opened to connect the fourth filter element 310 with the third filter element 270. The NaOH solution in the fourth filter element 310 can absorb the acidic gas in the third filtered gas, thereby obtaining H with a purity of 2N to 4N. 2 .

[0237] The advantages of this embodiment are the same as those of embodiments 1 to 4, and will not be repeated here.

[0238] Example 6

[0239] This embodiment is a variation of Embodiments 1 to 5.

[0240] There are at least two first gas filter units 200, and several first gas filter units 200 are arranged in parallel.

[0241] In some embodiments, there are two first gas filter units 200. It should be noted that when one first gas filter unit 200 needs to discharge waste and add iron powder, discharge waste liquid and add aqueous solution, or discharge waste liquid and add silver nitrate solution, it can be switched to another first gas filter unit 200.

[0242] There are at least two second gas filter units 300 , and several second gas filter units 300 are arranged in parallel.

[0243] In some embodiments, there are two second gas filter units 300. It should be noted that when one second gas filter unit 300 needs to discharge waste liquid and add sodium hydroxide solution, it can be switched to another second gas filter unit 300.

[0244] There are at least two second condensing units 400, and several second condensing units 400 are arranged in parallel.

[0245] In some embodiments, there are two second condensing units 400. It should be noted that when one second condensing unit 400 needs to be repaired, it can be switched to another second condensing unit 400.

[0246] There are at least two first purification units 500, and several first purification units 500 are arranged in parallel.

[0247] In some embodiments, there are two first purification units 500. It should be noted that when a first purification unit 500 needs to be desorbed, it can be switched to another first purification unit 500. There are at least two second purification units 600, and several second purification units 600 are arranged in parallel.

[0248] In some embodiments, there are two second purification units 600. It should be noted that when one second purification unit 600 needs to be repaired, it can be switched to another second purification unit 600.

[0249] The usage and advantages of this embodiment are the same as those of embodiments 1 to 5, and will not be described in detail here.

[0250] Example 7

[0251] This embodiment is a variation of Embodiments 1 to 5.

[0252] like Figure 7 As shown, the tail gas separation and purification equipment also includes a gas analysis unit 800, a purge unit 900, a vacuum unit 1000 and a pressure relief unit 1100. The gas analysis unit 800 is respectively connected to the first gas filter unit 200, the second gas filter unit 300 and the conveying unit 700, and is used to detect whether the purity of the first filtered gas, the second filtered gas, the third filtered gas and hydrogen meets the standard; the purge unit 900 is respectively connected to the first condensing unit 100, the first gas filter unit 200 and the second gas filter unit 300, and is used to purge the first condensing unit 100, the first gas filter unit 200 and the second gas filter unit 300; the vacuum unit 1000 is respectively connected to the first condensing unit 100, the first gas filter unit 200 and the second gas filter unit 300. 0, the first gas filter unit 200, and the second gas filter unit 300 are connected to discharge the gas inside the first condensing unit 100, the first gas filter unit 200, and the second gas filter unit 300; the pressure relief unit 1100 is respectively connected to the first condensing unit 100, the first gas filter unit 200, the second gas filter unit 300, the second condensing unit 400 and the conveying unit 700, and is used to relieve the pressure of the first condensing unit 100, the first gas filter unit 200, the second gas filter unit 300, the second condensing unit 400, and the conveying unit 700.

[0253] like Figure 8 As shown, the gas analysis unit 800 includes a first gas analysis element 810, a second gas analysis element 820, a third gas analysis element 830 and a fourth gas analysis element 840. The first gas analysis element 810 is connected to the second phosphine removal pipeline to detect whether the first filtered gas meets the standard; the second gas analysis element 820 is connected to the second diborane removal pipeline to detect whether the second filtered gas meets the standard; the third gas analysis element 830 is connected to the second germanium hydride removal pipeline to detect whether the third incoming gas meets the standard; the fourth gas analysis element 840 is connected to the first delivery pipeline to detect whether the purity of 4N-6N purity H2 meets the standard.

[0254] In some of the embodiments, the first gas analysis element 810 includes but is not limited to a gas analyzer; the second gas analysis element 820 includes but is not limited to a gas analyzer; the third gas analysis element 830 includes but is not limited to a gas analyzer; and the fourth gas analysis element 840 includes but is not limited to a gas analyzer.

[0255] like Fig. 9As shown, the purge unit 900 includes a purge element 910. The purge element 910 is respectively connected to the first condensing unit 100, the first gas filter unit 200, and the second gas filter unit 300, and is used to purge the first condensing unit 100, the first gas filter unit 200, and the second gas filter unit 300.

[0256] Specifically, the purge element 910 includes a purge gas source, a purge main line, a first purge branch line, a second purge branch line, a third purge branch line and a fourth purge branch line. Among them, the first end of the purge main line is connected to the purge gas source, and the second end of the purge main line is connected to the first purge branch line, the second purge branch line, the third purge branch line, the fourth purge branch line, the fifth purge branch line and the sixth purge branch line respectively; the first end of the first purge branch line is connected to the purge main line, and the second end of the first purge branch line is connected to the first liquid storage line, and the connection point between the first purge branch line and the first liquid storage line is located between the second pneumatic diaphragm valve and the first manual diaphragm valve for conveying purge gas; the first end of the second purge branch line is connected to the purge main line, and the second end of the second purge branch line is connected to the third liquid storage line, and the second purge branch line and the first purge branch line are connected to the third liquid storage line. The connecting point of the three liquid storage pipelines is located between the third pneumatic diaphragm valve and the fourth manual diaphragm valve, and is used to transport purge gas; the first end of the third purge branch pipeline is connected to the main purge pipeline, the second end of the third purge branch pipeline is connected to the first phosphine removal pipeline, and the connecting point of the third purge branch pipeline and the first phosphine removal pipeline is located between the fourth pneumatic diaphragm valve and the seventh manual diaphragm valve, and is used to transport purge gas; the first end of the fourth purge branch pipeline is connected to the third purge branch pipeline, the second end of the fourth purge branch pipeline is connected to the second phosphine removal pipeline, and the connecting point of the fourth purge branch pipeline and the second phosphine removal pipeline is located between the fifth pneumatic diaphragm valve and the eighth manual diaphragm valve, and is used to transport purge gas.

[0257] In some embodiments, the purge gas source includes but is not limited to PN 2 Gas source.

[0258] In some of the embodiments, the main purge pipeline includes but is not limited to a stainless steel pipe; the first purge branch pipeline includes but is not limited to a stainless steel pipe; the second purge branch pipeline includes but is not limited to a stainless steel pipe; the third purge branch pipeline includes but is not limited to a stainless steel pipe; and the fourth purge branch pipeline includes but is not limited to a stainless steel pipe.

[0259] Furthermore, the purge unit 900 further includes a thirteenth valve element 920. The thirteenth valve element 920 is disposed on a pipeline connecting the purge element 910 with the first condensing unit 100, the first gas filter unit 200, and the second gas filter unit 300, for controlling the flow of the pipeline.

[0260] Specifically, the thirteenth valve element 920 includes a thirty-ninth manual diaphragm valve, a second regulating valve, a thirteenth pneumatic diaphragm valve, a fifth one-way valve, a fourteenth pneumatic diaphragm valve, a sixth one-way valve, a fifteenth pneumatic diaphragm valve, a seventh one-way valve, a sixteenth pneumatic diaphragm valve and an eighth one-way valve. Among them, the thirty-ninth manual diaphragm valve is arranged in the purge main line to control the flow of the purge main line; the second regulating valve is arranged in the purge main line and is located downstream of the thirty-seventh manual diaphragm valve to adjust the pressure inside the purge main line; the thirteenth pneumatic diaphragm valve is arranged in the first purge branch line to control the flow of the first purge branch line; the fifth one-way valve is arranged in the first purge branch line and is located downstream of the thirteenth pneumatic diaphragm valve to prevent the gas inside the first purge branch line from backflowing; the fourteenth pneumatic diaphragm valve is arranged in the second purge branch line to control the flow of the second purge branch line; the sixth one-way valve is arranged in the second purge branch line The fourth pneumatic diaphragm valve is disposed on the fourth purge branch pipeline and is located downstream of the fourteenth pneumatic diaphragm valve, for preventing the backflow of gas inside the second purge branch pipeline; the fifteenth pneumatic diaphragm valve is disposed on the third purge branch pipeline and is located downstream of the fifteenth pneumatic diaphragm valve, for preventing the backflow of gas inside the third purge branch pipeline; the seventh one-way valve is disposed on the third purge branch pipeline and is located downstream of the fifteenth pneumatic diaphragm valve, for preventing the backflow of gas inside the third purge branch pipeline; the sixteenth pneumatic diaphragm valve is disposed on the fourth purge branch pipeline and is located downstream of the sixteenth pneumatic diaphragm valve, for preventing the backflow of gas inside the fourth purge branch pipeline.

[0261] Furthermore, the purge unit 900 further includes an eleventh monitoring component 930. The eleventh monitoring component 930 is disposed on a pipeline connected to the purge element 910, and is used to monitor the pressure inside the pipeline.

[0262] Specifically, the eleventh monitoring component 930 includes a twelfth pressure sensor, wherein the twelfth pressure sensor is connected to the main purge line and is located downstream of the second regulating valve, and is used to monitor the pressure inside the main purge line.

[0263] like Fig. 9 As shown, the vacuum unit 1000 includes a vacuum element 1010. The vacuum element 1010 is respectively connected to the first condensing unit 100, the first gas filtering unit 200, and the second gas filtering unit 300, and is used to discharge the gas inside the first condensing unit 100, the first gas filtering unit 200, and the second gas filtering unit 300.

[0264] Specifically, the vacuum element 1010 includes a second vacuum pump, a vacuum main line, a first vacuum branch line, a second vacuum branch line, a third vacuum branch line and a fourth vacuum branch line. The first end of the vacuum main line is connected to the second vacuum pump, and the second end of the vacuum main line is connected to the first vacuum branch line, the second vacuum branch line, the third vacuum branch line, the fourth vacuum branch line and the pressure relief unit 1100 respectively; the first end of the first vacuum branch line is connected to the vacuum main line, and the second end of the first vacuum branch line is connected to the first liquid storage line, and the connection point between the first vacuum branch line and the first liquid storage line is located between the second pneumatic diaphragm valve and the first manual diaphragm valve for conveying gas; the first end of the second vacuum branch line is connected to the vacuum main line, and the second end of the second vacuum branch line is connected to the third liquid storage line, and the second vacuum branch line and the third storage line are connected to each other. The connecting point of the liquid pipeline is located between the third pneumatic diaphragm valve and the fourth manual diaphragm valve, and is used for conveying gas; the first end of the third vacuum branch pipeline is connected to the vacuum main pipeline, the second end of the third vacuum branch pipeline is connected to the first phosphine removal pipeline, and the connecting point of the third vacuum branch pipeline and the first phosphine removal pipeline is located between the fourth pneumatic diaphragm valve and the seventh manual diaphragm valve, and is used for conveying gas; the first end of the fourth vacuum branch pipeline is connected to the third vacuum branch pipeline, the second end of the fourth vacuum branch pipeline is connected to the second phosphine removal pipeline, and the connecting point of the fourth vacuum branch pipeline and the second phosphine removal pipeline is located between the fifth pneumatic diaphragm valve and the eighth manual diaphragm valve, and is used for conveying gas.

[0265] In some of the embodiments, the main vacuum pipeline includes but is not limited to a stainless steel pipe; the first vacuum branch pipeline includes but is not limited to a stainless steel pipe; the second vacuum branch pipeline includes but is not limited to a stainless steel pipe; the third vacuum branch pipeline includes but is not limited to a stainless steel pipe; the fourth vacuum branch pipeline includes but is not limited to a stainless steel pipe; the second vacuum pump includes but is not limited to a dry screw vacuum pump.

[0266] Furthermore, the vacuum unit 1000 includes a fourteenth valve element 1020. The fourteenth valve element 1020 is disposed on a pipeline connecting the vacuum element 1010 with the first condensing unit 100, the first gas filtering unit 200, and the second gas filtering unit 300, for controlling the flow of the pipeline.

[0267] Specifically, the fourteenth valve element 1020 includes a seventeenth pneumatic diaphragm valve, a ninth one-way valve, an eighteenth pneumatic diaphragm valve, a tenth one-way valve, a nineteenth pneumatic diaphragm valve, an eleventh one-way valve, a twentieth pneumatic diaphragm valve and a twelfth one-way valve. Among them, the seventeenth pneumatic diaphragm valve is arranged in the first vacuum branch pipeline to control the flow of the first vacuum branch pipeline; the ninth one-way valve is arranged in the first vacuum branch pipeline and is located downstream of the seventeenth pneumatic diaphragm valve to prevent the gas inside the first vacuum branch pipeline from flowing back; the eighteenth pneumatic diaphragm valve is arranged in the second vacuum branch pipeline to control the flow of the second vacuum branch pipeline; the tenth one-way valve is arranged in the second vacuum branch pipeline and is located downstream of the eighteenth pneumatic diaphragm valve to prevent the gas inside the second vacuum branch pipeline from flowing back ; The nineteenth pneumatic diaphragm valve is arranged on the third vacuum branch pipeline, and is used to control the circulation of the third vacuum branch pipeline; the eleventh one-way valve is arranged on the third vacuum branch pipeline, and is located downstream of the nineteenth pneumatic diaphragm valve, and is used to prevent the backflow of gas inside the third vacuum branch pipeline; the twentieth pneumatic diaphragm valve is arranged on the fourth vacuum branch pipeline, and is used to control the circulation of the fourth vacuum branch pipeline; the twelfth one-way valve is arranged on the fourth vacuum branch pipeline, and is located downstream of the twentieth pneumatic diaphragm valve, and is used to prevent the backflow of gas inside the fourth vacuum branch pipeline.

[0268] Furthermore, the vacuum unit 1000 further includes a twelfth monitoring component 1030. The twelfth monitoring component 1030 is disposed on a pipeline connected to the vacuum element 1010, and is used to monitor the pressure inside the pipeline.

[0269] Specifically, the twelfth monitoring component 1030 includes a thirteenth pressure sensor, wherein the thirteenth pressure sensor is connected to the vacuum main line and is used to monitor the pressure inside the vacuum main line.

[0270] like Fig. 9 As shown, the pressure relief unit 1100 includes a first pressure relief element 1110, a second pressure relief element 1120, a third pressure relief element 1130, a fourth pressure relief element 1140 and a fifth pressure relief element 1150. The first pressure relief element 1110 is respectively connected to the first condensing unit 100 and the vacuum unit 1000, and is used to relieve pressure on the first condensing unit 100; the second pressure relief element 1120 is respectively connected to the first gas filter unit 200 and the vacuum unit 1000, and is used to relieve pressure on the first gas filter unit 200; the third pressure relief element 1130 is respectively connected to the second gas filter unit 300 and the vacuum unit 1000, and is used to relieve pressure on the second gas filter unit 300; the fourth pressure relief element 1140 is respectively connected to the second condensing unit 400 and the exhaust gas combustion treatment device, and is used to relieve pressure on the second condensing unit 400; the fifth pressure relief element 1150 is respectively connected to the conveying unit 700 and the exhaust gas combustion treatment device, and is used to relieve pressure on the conveying unit 700.

[0271] Specifically, the first pressure relief element 1110 includes a first pressure relief pipeline, a first pressure relief valve, a second pressure relief pipeline, and a second pressure relief valve. The first end of the first pressure relief pipeline is connected to the first liquid storage element 120, and the second end of the first pressure relief pipeline is connected to the first vacuum branch pipeline; the first pressure relief valve is arranged on the first pressure relief pipeline, and is used for automatically relieving pressure when the pressure inside the first liquid storage element 120 is too high; the first end of the second pressure relief pipeline is connected to the second liquid storage element 170, and the second end of the second pressure relief pipeline is connected to the second vacuum branch pipeline; the second pressure relief valve is arranged on the second pressure relief pipeline, and is used for automatically relieving pressure when the pressure inside the second liquid storage element 170 is too high.

[0272] In some of the embodiments, the first pressure relief pipeline includes but is not limited to a stainless steel pipe; the second pressure relief pipeline includes but is not limited to a stainless steel pipe; the first pressure relief valve includes but is not limited to a spring-loaded pressure relief valve and a lever-type pressure relief valve; the second pressure relief valve includes but is not limited to a spring-loaded pressure relief valve and a lever-type pressure relief valve.

[0273] Specifically, the second pressure relief element 1120 includes a third pressure relief pipeline, a third pressure relief valve, a fourth pressure relief pipeline and a fourth pressure relief valve. The first end of the third pressure relief pipeline is connected to the first reaction water tank, and the second end of the third pressure relief pipeline is connected to the vacuum main pipeline; the third pressure relief valve is arranged on the third pressure relief pipeline, and is used for automatically releasing pressure when the pressure inside the first reaction water tank is too high; the first end of the fourth pressure relief pipeline is connected to the second reaction water tank, and the second end of the fourth pressure relief pipeline is connected to the vacuum main pipeline; the fourth pressure relief valve is arranged on the fourth pressure relief pipeline, and is used for automatically releasing pressure when the pressure inside the second reaction water tank is too high.

[0274] In some of the embodiments, the third pressure relief pipeline includes but is not limited to a stainless steel pipe; the fourth pressure relief pipeline includes but is not limited to a stainless steel pipe; the third pressure relief valve includes but is not limited to a spring-loaded pressure relief valve and a lever-type pressure relief valve; the fourth pressure relief valve includes but is not limited to a spring-loaded pressure relief valve and a lever-type pressure relief valve.

[0275] Specifically, the third pressure relief element 1130 includes a fifth pressure relief pipeline and a fifth pressure relief valve. The first end of the fifth pressure relief pipeline is connected to the third reaction water tank, and the second end of the fifth pressure relief pipeline is connected to the vacuum main pipeline; the fifth pressure relief valve is arranged on the fifth pressure relief pipeline, and is used for automatically relieving pressure when the internal pressure of the third reaction water tank is too high.

[0276] In some of the embodiments, the fifth pressure relief pipeline includes but is not limited to a stainless steel pipe; the fifth pressure relief valve includes but is not limited to a spring-type pressure relief valve and a lever-type pressure relief valve.

[0277] Specifically, the fourth pressure relief element 1140 includes a sixth pressure relief pipeline, a sixth pressure relief valve and a thirteenth one-way valve. The first end of the sixth pressure relief pipeline is connected to the seventh liquid storage pipeline, and the connection point between the first end of the sixth pressure relief pipeline and the seventh liquid storage pipeline is located between the twenty-sixth manual diaphragm valve and the twenty-seventh manual diaphragm valve. The second end of the sixth pressure relief pipeline is connected to the exhaust gas combustion treatment device; the sixth pressure relief valve is arranged on the sixth pressure relief pipeline, and is used to relieve pressure on the third liquid storage element 420 through the sixth pressure relief pipeline and the eighth liquid storage pipeline; the thirteenth one-way valve is arranged on the sixth pressure relief pipeline, and is located downstream of the sixth pressure relief valve, and is used to prevent gas backflow inside the sixth pressure relief pipeline.

[0278] In some of the embodiments, the sixth pressure relief pipeline includes but is not limited to a stainless steel pipe; the sixth pressure relief valve includes but is not limited to a spring-type pressure relief valve and a lever-type pressure relief valve.

[0279] Specifically, the fifth pressure relief element 1150 includes a seventh pressure relief pipeline, a fortieth manual diaphragm valve, a seventh pressure relief valve and a fourteenth one-way valve. Among them, the seventh pressure relief pipeline and the seventh pressure relief valve. Among them, the first end of the seventh pressure relief pipeline is connected to the first delivery pipeline, and the connection point between the first end of the seventh pressure relief pipeline and the first delivery pipeline is located between the thirty-sixth manual diaphragm valve and the thirty-seventh manual diaphragm valve, and the second end of the seventh pressure relief pipeline is connected to the exhaust gas combustion treatment device; the fortieth manual diaphragm valve is arranged on the seventh pressure relief pipeline to control the circulation of the seventh pressure relief pipeline; the seventh pressure relief valve is arranged on the seventh pressure relief pipeline and is located downstream of the fortieth manual diaphragm valve to realize automatic pressure relief; the fourteenth one-way valve is arranged on the seventh pressure relief pipeline and is located downstream of the seventh pressure relief valve to prevent the gas inside the seventh pressure relief pipeline from backflowing.

[0280] In some of the embodiments, the seventh pressure relief pipeline includes but is not limited to a stainless steel pipe; the seventh pressure relief valve includes but is not limited to a spring-type pressure relief valve and a lever-type pressure relief valve.

[0281] The method of using this embodiment is as follows:

[0282] (Purge process)

[0283] Open the thirteenth valve element 920 and the fourteenth valve element 1020, and the purge element 910 will fill the entire equipment and pipelines with the purge gas. Then, open the vacuum element 1010 to discharge the purge gas and the residual gas in the equipment and pipelines to ensure the cleanliness of the equipment and pipelines.

[0284] (Pressure relief process)

[0285] When the internal pressure of the first liquid storage element 120, the second liquid storage element 170, the second filter element 240, the third filter element 270, the fourth filter element 310, the third liquid storage element 420 and the conveying element 710 is too high, the first pressure relief element 1110, the second pressure relief element 1120, the third pressure relief element 1130, the fourth pressure relief element 1140 and the fifth pressure relief element 1150 can respectively realize automatic pressure relief for the first liquid storage element 120, the second liquid storage element 170, the second filter element 240, the third filter element 270, the fourth filter element 310, the third liquid storage element 420 and the conveying element 710 to ensure the safety of the overall equipment.

[0286] Among them, the purging process is carried out before the preparation process, and can also be carried out simultaneously with the preparation process; the pressure relief process can be carried out at any time.

[0287] The advantage of this embodiment is that by connecting the purge unit and the vacuum unit with the first condensing unit, the first gas filter unit, the second gas filter unit, the second condensing unit and the conveying unit respectively, the entire equipment and the pipeline can be purged to ensure the cleanliness of the pipeline; by connecting the pressure relief unit with the first condensing unit, the first gas filter unit, the second gas filter unit, the second condensing unit and the conveying unit respectively, the pressure relief of the entire equipment can be achieved to ensure the safety of the entire equipment.

[0288] Example 8

[0289] This embodiment relates to the tail gas separation and purification method of the present invention, which is applied to the tail gas separation and purification equipment described in Examples 1 to 6.

[0290] A tail gas separation and purification method, comprising:

[0291] The first condensing unit 100 obtains the mixed gas and condenses the mixed gas to obtain the first condensed gas or the second condensed gas;

[0292] The first gas filtering unit 200 obtains the first condensed gas or the second condensed gas and reacts the first condensed gas with iron powder under high temperature conditions to remove phosphine in the first condensed gas or the second condensed gas to obtain the first filtered gas;

[0293] The second gas filtering unit 300 obtains the first filtered gas and reacts the first filtered gas with a sodium hydroxide solution under normal temperature conditions to remove the acidic gas in the first filtered gas to obtain 2N to 4N pure H 2 ;

[0294] The second condensing unit 400 obtains H with a purity of 2N to 4N 2 And for 2N~4N purity H 2 condensing to form a third condensed gas;

[0295] The first purification unit 500 obtains the third condensed gas and adsorbs H in the third condensed gas. 2 O, thereby obtaining a first purified gas;

[0296] The second purification unit 600 obtains the first purified gas and purifies the first purified gas to obtain H with a purity of 4N to 6N. 2 .

[0297] Furthermore, it also includes:

[0298] The first gas filtering unit 200 obtains the first condensed gas or the second condensed gas and reacts the first condensed gas or the second condensed gas with an aqueous solution at room temperature to remove diborane in the first condensed gas or the second condensed gas to obtain a second filtered gas.

[0299] Furthermore, it also includes:

[0300] The first gas filtering unit 200 obtains the first condensed gas or the second condensed gas and reacts the first condensed gas or the second condensed gas with a silver nitrate solution at room temperature to remove germanium hydride in the first condensed gas or the second condensed gas to obtain a third filtered gas.

[0301] Specifically, the tail gas separation and purification method refers to Example 1 to Example 6.

[0302] More specifically, the tail gas separation and purification method of this embodiment is as follows:

[0303] (1) opening the eighteenth manual diaphragm valve, the twelfth pneumatic diaphragm valve, the thirteenth pneumatic diaphragm valve, the fourteenth pneumatic diaphragm valve and the fifteenth pneumatic diaphragm valve, and the second regulating valve regulating the pressure of the gas entering the purge main pipeline so that the purge gas fills the first liquid storage tank, the second liquid storage tank, the phosphine removal reactor and the pipeline;

[0304] (2) turning on the vacuum pump, and opening the sixteenth pneumatic diaphragm valve, the seventeenth pneumatic diaphragm valve, the eighteenth pneumatic diaphragm valve, and the nineteenth pneumatic diaphragm valve, so that the vacuum pump forms a vacuum negative pressure at the first end of the vacuum main line, so that the gas in the first liquid storage tank, the second liquid storage tank, the phosphine removal reactor, and the inside of the pipeline is discharged;

[0305] (3) Open the first ball valve, the second ball valve, the third ball valve, and the fourth ball valve so that the first water bath and the second water bath are connected to the first condenser and the second condenser respectively, so that the coolant in the first water bath and the second water bath can flow to the first condenser and the second condenser, thereby making the internal temperatures of the first condenser and the second condenser meet the requirements;

[0306] (4) opening the first pneumatic diaphragm valve and the first manual diaphragm valve, and adjusting the gas pressure of the upstream semiconductor process equipment input into the mixed tail gas separation device through the first regulating valve, so that the mixed gas generated by the upstream semiconductor process equipment flows to the first condenser, so that the first condenser liquefies the gaseous trichlorosilane in the mixed gas, and obtains liquid trichlorosilane and the first condensed gas;

[0307] (5) opening the second pneumatic diaphragm valve and the first manual diaphragm valve so that the first condenser is connected to the first liquid storage tank, thereby allowing liquid trichlorosilane to be stored in the first liquid storage tank;

[0308] (6) The first condensed gas flows to the second condenser through the pipeline, and the second condenser can liquefy the gaseous dichlorosilane in the first condensed gas to obtain liquid dichlorosilane and the second condensed gas;

[0309] (7) opening the third pneumatic diaphragm valve and the fourth manual diaphragm valve so that the second condenser is connected to the second liquid storage tank, thereby allowing liquid dichlorosilane to be stored in the first liquid storage tank;

[0310] (8) Open the fourth pneumatic diaphragm valve and the seventh manual diaphragm valve to connect the phosphine removal reactor to the second condenser. The phosphine removal reactor removes the PH in the second condensed gas. 3 The gas (phosphine gas) reacts with the iron powder under high temperature conditions to generate solid FeP and hydrogen and obtain the first filtered gas, thereby achieving the pH in the second condensed gas. 3 Gas removal;

[0311] (9) Open the fifth pneumatic diaphragm valve, the eighth manual diaphragm valve, the eighth pneumatic diaphragm valve, and the twelfth manual diaphragm valve to connect the phosphine removal reactor to the second reaction tank. The aqueous solution in the second reaction tank can remove B in the first filtered gas. 2 H 6 The gas (borane gas) reacts with water at room temperature to obtain a second filtered gas;

[0312] (10) Open the ninth pneumatic diaphragm valve, the thirteenth manual diaphragm valve, the tenth pneumatic diaphragm valve, and the fifteenth manual diaphragm valve to connect the second reaction tank and the third reaction water tank. The silver nitrate solution in the third reaction water tank can react with the GeH 4 The gas (germane gas) reacts with the silver nitrate solution at room temperature to obtain a third filtered gas;

[0313] (11) Open the eleventh pneumatic diaphragm valve, the sixteenth manual diaphragm valve, the sixth pneumatic diaphragm valve, and the ninth manual diaphragm valve to connect the third reaction tank to the first reaction tank. The NaOH solution in the first reaction tank can absorb the acidic gas in the third filtered gas, thereby obtaining H with a purity of 2N to 4N.2 ;

[0314] (12) Open the seventh pneumatic diaphragm valve and the tenth manual diaphragm valve to connect the first reaction tank with the downstream gas processing equipment, and transfer 2N-4N pure H 2 To downstream gas processing equipment.

[0315] (13) Open the thirteenth ball valve and the fourteenth ball valve to allow the low-temperature liquid in the third water bath to flow to the third condenser, thereby making the internal temperature of the third condenser meet the requirements;

[0316] (14) Open the 18th and 19th manual diaphragm valves to allow 2N to 4N purity H 2 Flow to the point condenser, the point condenser is 2N ~ 4N pure H 2 condensing to obtain a third condensed gas and a condensed liquid;

[0317] (15) opening the 20th manual diaphragm valve, the 21st manual diaphragm valve, and the 22nd manual diaphragm valve, so that the condensed liquid and the third condensed gas flow to the third liquid storage tank, and the third liquid storage tank can store the condensed liquid;

[0318] (16) opening the twenty-third manual diaphragm valve, the twenty-fourth manual diaphragm valve, and the twenty-eighth manual diaphragm valve so that the third condensed gas can flow to the desorption adsorption tank, and the desorption adsorption tank can adsorb liquid molecules in the third condensed gas to obtain a first purified gas;

[0319] (17) Open the 29th manual diaphragm valve, the 30th manual diaphragm valve, and the 31st manual diaphragm valve so that the first purified gas can flow to the separation membrane tank. The separation membrane tank only allows small molecular hydrogen to pass through and obtains H with a purity of 4N to 6N. 2 and mixed air;

[0320] (18) Open the 32nd manual diaphragm valve to allow 4N to 6N purity H 2 Accessible to a first delivery pipeline;

[0321] (19) Start the first vacuum pump and open the 34th manual diaphragm valve, the 35th manual diaphragm valve, the 36th manual diaphragm valve, the 37th manual diaphragm valve, and the 12th pneumatic diaphragm valve. The vacuum pump forms a vacuum negative pressure in the first delivery pipeline. 4N-6N pure H 2 The liquid may flow to downstream semiconductor process equipment through the first delivery pipeline.

[0322] Furthermore, the mixed tail gas separation method also includes:

[0323] (20) when the liquid level height inside the first liquid storage tank monitored by the first liquid level sensor exceeds a preset threshold, opening the third manual diaphragm valve so that the liquid inside the first liquid storage tank can be discharged to the waste liquid treatment equipment;

[0324] (21) When the internal pressure of the first liquid storage tank monitored by the first pressure sensor exceeds a preset threshold, the first pressure relief valve automatically opens, and the gas inside the first liquid storage tank can be discharged through the first pressure relief pipeline;

[0325] (22) When the internal pressure of the second liquid storage tank monitored by the second pressure sensor exceeds a preset threshold, the second pressure relief valve automatically opens, and the gas inside the second liquid storage tank can be discharged through the second pressure relief pipeline;

[0326] (23) when the liquid level height inside the second liquid storage tank monitored by the second liquid level sensor exceeds a preset threshold, opening the sixth manual diaphragm valve so that the liquid inside the second liquid storage tank can be discharged to the waste liquid treatment equipment;

[0327] (24) When it is necessary to replace the iron powder in the phosphine removal reactor, open the sixth ball valve to discharge the waste in the phosphine removal reactor; then, open the fifth ball valve and close the sixth ball valve to add iron powder to the phosphine removal reactor;

[0328] (25) When it is necessary to replace the aqueous solution in the second reaction tank, open the tenth ball valve to discharge the waste liquid in the second reaction tank to the waste liquid treatment equipment; then, open the ninth ball valve and close the tenth ball valve so that the aqueous solution source can add the aqueous solution to the second reaction tank;

[0329] (26) When the pressure monitored by the fourth pressure sensor exceeds a preset threshold, the third pressure relief valve automatically opens, so that the gas inside the second reaction tank can be discharged through the third pressure relief pipeline;

[0330] (27) When the silver nitrate solution in the third reaction tank needs to be replaced, the twelfth ball valve is opened to discharge the waste liquid in the third reaction tank to the waste liquid treatment equipment; then, the eleventh ball valve is opened and the twelfth ball valve is closed, so that the silver nitrate solution source can add the silver nitrate solution to the third reaction tank;

[0331] (28) When the pressure monitored by the fifth pressure sensor exceeds a preset threshold, the fourth pressure relief valve automatically opens, so that the gas inside the third reaction tank can be discharged through the fourth pressure relief pipeline;

[0332] (29) When the NaOH solution in the first reaction tank needs to be replaced, the eighth ball valve is opened to discharge the waste liquid in the first reaction tank to the waste liquid treatment equipment; then, the seventh ball valve is opened and the eighth ball valve is closed, so that the NaOH solution source can add the NaOH solution to the first reaction tank;

[0333] (30) When the pressure monitored by the third pressure sensor exceeds a preset threshold, the fifth pressure relief valve automatically opens, so that the gas inside the first reaction tank can be discharged through the fifth pressure relief pipeline;

[0334] (31) when the liquid level inside the third liquid storage tank monitored by the sixth liquid level sensor exceeds a preset threshold, opening the twenty-fifth manual diaphragm valve so that the liquid inside the third liquid storage tank can be discharged to the waste liquid treatment device;

[0335] (32) When it is necessary to discharge the gas inside the third liquid storage tank, open the twenty-sixth manual diaphragm valve and the twenty-seventh manual diaphragm valve to discharge the gas inside the third liquid storage tank to the exhaust gas combustion treatment device;

[0336] (33) when the pressure inside the separation membrane tank monitored by the ninth pressure sensor is too high, opening the thirty-third manual diaphragm valve so that the impurity gas in the separation membrane tank can flow to the exhaust gas combustion treatment device;

[0337] (34) When the second vacuum pump needs maintenance, open the thirty-eighth manual diaphragm valve so that the gas at both ends of the second vacuum pump can be discharged through the second delivery pipeline;

[0338] (35) When the pressure inside the fourth liquid storage pipeline is too high, the sixth pressure relief valve automatically opens, and the gas inside the fourth liquid storage pipeline can flow to the exhaust gas combustion treatment device through the sixth pressure relief pipeline;

[0339] (36) When the pressure inside the first delivery pipeline is too high, the 40th manual diaphragm valve is opened, and the seventh pressure relief valve is automatically opened, so that the gas inside the first delivery pipeline can flow to the exhaust gas combustion treatment device through the seventh pressure relief pipeline.

[0340] Example 9

[0341] This embodiment relates to a semiconductor process system in the present invention.

[0342] A semiconductor process system includes the tail gas separation and purification equipment as described in Examples 1 to 6.

[0343] Furthermore, the tail gas separation and purification equipment also includes an iron powder feeding device, a waste liquid treatment device, a waste material collection device, a high temperature nitrogen source and a tail gas combustion treatment device. Among them, the iron powder feeding device and the waste material collection device are connected to the first filter element 210, the waste liquid treatment device is respectively connected to the first liquid storage element 120, the second liquid storage element 170, the second filter element 240, the third filter element 270, the fourth filter element 310, and the third liquid storage element 420; the high temperature nitrogen source and the waste material collection device are connected to the desorption adsorption tank; the third liquid storage element 420 and the separation membrane tank are respectively connected to the tail gas combustion treatment equipment.

[0344] Example 10

[0345] This embodiment relates to a specific implementation of the tail gas separation and purification equipment and method of the present invention.

[0346] like Fig.10 and Fig.11 As shown, the first condensation component includes a condenser (CO1), a liquid storage tank (CA1.1, CA1.2), a pneumatic diaphragm valve (PV1, PV1.5, PV1.6), a manual diaphragm valve (MV1, MV1.1, MV1.2, MV1.3, MV1.4, MV1.5, MV1.6), a regulating valve (REG1), a one-way valve (CV1), a filter (FILITER1), a pressure sensor (PT1, PT1.1, PT1.2), a thermostat (CJ1.1, CJ1.2), a temperature sensor (TE1.1, TE1.2), a liquid level sensor (LE1.1, LE1.2), and a ball valve (BV1.1, BV1.2).

[0347] The second condensing component includes a condenser (CO2), a liquid storage tank (CA2.1, CA2.2), a pneumatic diaphragm valve (PV2.5, PV2.6), a manual diaphragm valve (MV2.1, MV2.2, MV2.3, MV2.4, MV2.5, MV2.6), a pressure sensor (PT2.1, PT2.2), a thermostat (CJ2.1, CJ2.2), a temperature sensor (TE2.1, TE2.2), a liquid level sensor (LE2.1, LE2.2), and a ball valve (BV2.1, BV2.2).

[0348] The phosphine removal components include high-temperature reaction furnace (HO3.1, HO3.2), pneumatic diaphragm valves (PV3.1, PV3.2, PV3.11, PV3.12), manual diaphragm valves (MV3.1, MV3.2, MV3.3, MV3.4), ball valves (BV3.1, BV3.2, BV3.3, BV3.4), and temperature sensors (TIC3.1, TIC3.2).

[0349] The borane removal components include reaction water tank (HLS4.1, HLS4.2), pneumatic diaphragm valve (PV4.1, PV4.2, PV4.3, PV4.4), manual diaphragm valve (MV4.1, MV4.2, MV4.3, MV4.4, MV4.5, MV4.6), ball valve (BV4.1, BV4.2, BV4.3, BV4.4), and pressure sensor (PT4.1, PT4.2).

[0350] The germane removal components include reaction water tank (HLS5.1, HLS5.2), pneumatic diaphragm valve (PV5.1, PV5.2, PV5.3, PV5.4), manual diaphragm valve (MV5.1, MV5.2, MV5.3, MV5.4, MV5.5, MV5.6), ball valve (BV5.1, BV5.2, BV5.3, BV5.4), and pressure sensor (PT5.1, PT5.2).

[0351] Acid gas removal components include reaction water tank (HLS6.1, HLS6.2), pneumatic diaphragm valve (PV6.1, PV6.2, PV6.3, PV6.4), manual diaphragm valve (MV6.1, MV6.2, MV6.3, MV6.4, MV6.5, MV6.6), ball valve (BV6.1, BV6.2, BV6.3, BV6.4), pressure sensor (PT6.1, PT6.2), and PH detector (PH6.1, PH6.2).

[0352] The third condensation component includes condenser (CONDA, CONDB), manual diaphragm valve (MV1, MV2A, MV2B, MV3A, MV3B, MV4), ball valve (BV1A, BV1B, BV2A, BV2B), pressure sensor (PT1A, PT1B), water bath equipment (HX1), liquid storage tank (CANA, CANB), manual diaphragm valve (MV5A, MV5B, MV6A, MV6B, MV7, MV8A, MV8B, MV9A, MV9B, MV10A, MV10B), cooling coil (HX2A, HX2B), liquid level sensor (LEA, LEB), pressure sensor (PT2A, PT2B, PT4), and temperature sensor (PT3).

[0353] The first purification component includes a desorption adsorption tank (TDA, TDB), a manual diaphragm valve (MV11A, MV11B, MV12A, MV12B, MV13), a one-way valve (CV1), and a pressure sensor (PT5).

[0354] The second purification component includes separation membrane tanks (ROA, ROB), manual diaphragm valves (MV14A, MV14B, MV15A, MV15B, MV16, MV17A, MV17B), one-way valves (CV2A, CV2B), and pressure sensors (PT6A, PT6B, PT7).

[0355] The conveying components include a vacuum pump (DRY), a manual diaphragm valve (MV18, MV19, MV20, MV21), a one-way valve (CV3), a pressure sensor (PT8), and a pneumatic diaphragm valve (PV1).

[0356] The gas analysis components include gas analyzers (GD3, GD4, GD5, GD).

[0357] The purge unit includes a manual diaphragm valve (MV2), a regulating valve (REG2), a filter (FILITER2), a pneumatic diaphragm valve (PV1.1, PV1.3, PV2.1, PV2.3, PV3.4, PV3.6), a one-way valve (CV1.1, CV1.3, CV2.1, CV2.3, CV3.2, CV3.4), and a pressure sensor (PT2).

[0358] The vacuum unit includes a pneumatic diaphragm valve (PV1.2, PV1.4, PV2.2, PV2.4, PV3.3, PV3.5), a one-way valve (CV1.2, CV1.3, CV2.2, CV2.4, CV3.1, CV3.3), and a pressure sensor (PT3).

[0359] The pressure relief unit includes pressure relief valves (SV1.1, SV1.2, SV2.1, SV2.2, SV4.1, SV4.2, SV5.1, SV5.2, SV6.1, SV6.2, SV1A, SV1B, SV2), check valves (CV4A, CV4B, CV5), and manual diaphragm valves (MV22).

[0360] Specifically, the mixed tail gas separation method of this embodiment is as follows:

[0361] (1) Open MV2, PV1.1, PV1.3, PV2.1, PV2.3, PV3.4, and PV3.6, and REG2 adjusts the gas pressure entering the purge main pipeline so that the purge gas fills the first liquid storage tank, the second liquid storage tank, the phosphine removal reactor, and the pipeline;

[0362] (2) Turn on the vacuum pump, and open PV1.2, PV1.4, PV2.2, PV2.4, PV3.3, and PV3.5, so that the vacuum pump forms a vacuum negative pressure at the first end of the vacuum main line, so that the gas in CA1.1, CA1.2, CA2.1, CA2.2, HLS4.1, HLS4.2 and the pipeline is discharged;

[0363] (3) Open BV1.1, BV1.2, BV2.1, and BV2.2, so that the first water bath and the second water bath are connected to CO1 and CO2, respectively, so that the coolant in the first water bath and the second water bath can flow to CO1 and CO2, thereby making the internal temperature of CO1 and CO2 meet the requirements;

[0364] (4) Open MV1 and PV1, and adjust the gas pressure of the upstream semiconductor process equipment input into the mixed tail gas separation device through REG1, so that the mixed gas generated by the upstream semiconductor process equipment flows to CO1, so that CO1 liquefies the gaseous trichlorosilane in the mixed gas, and obtains liquid trichlorosilane and the first condensed gas;

[0365] (5) Open PV1.5 and MV1.1 to connect CO1 with CA1.1, so that liquid trichlorosilane is stored in CA1.1; when switching to CA1.2, open PV1.6 and MV1.2, close PV1.5 and MV1.1, so that CO1 is connected with CA1.2;

[0366] (6) The first condensed gas flows to CO2 through a pipeline, and CO2 can liquefy the gaseous dichlorosilane in the first condensed gas to obtain liquid dichlorosilane and a second condensed gas;

[0367] (7) Open PV2.5 and MV2.1 to connect CO2 with CA2.1, so that liquid dichlorosilane is stored in CA2.1; when switching to CA2.2, open PV2.6 and MV2.2, close PV2.5 and MV2.1, so that CO2 is connected with CA2.2, so that liquid dichlorosilane is stored in CA2.2;

[0368] (8) Open PV3.1 and MV3.1 to connect HO3.1 and CO2. HO3.1 is connected by the pH in the second condensed gas. 3 The gas (phosphine gas) reacts with the iron powder under high temperature conditions to generate solid FeP and hydrogen and obtain the first filtered gas, thereby achieving the pH in the second condensed gas. 3 Gas removal;

[0369] When switching to HO3.2, open PV3.2 and MV3.3, and close PV3.1 and MV3.1, so that HO3.2 and CO2 are connected;

[0370] (9) Open PV3.12, MV3.2 or PV3.11, MV3.4, PV4.2, MV4.2, so that HO3.1 or HO3.2 is connected to HLS4.1, and the aqueous solution inside HLS4.1 can be used to filter B in the first filtered gas. 2 H 6 The gas (borane gas) reacts with water at room temperature to obtain a second filtered gas;

[0371] When switching to HLS4.2, turn on PV4.4 and MV4.6, and turn off PV4.2 and MV4.2, so that HO3.1 or HO3.2 is connected to HLS4.2;

[0372] (10) Open PV4.1, MV4.1 or PV4.3, MV4.4, PV5.2, MV5.2, so that HLS4.1 or HLS4.2 is connected to HLS5.1. The silver nitrate solution in HLS5.1 can react with GeH in the second filtered gas. 4 The gas (germane gas) reacts with the silver nitrate solution at room temperature to obtain a third filtered gas;

[0373] When switching to HLS5.2, turn on PV5.4 and MV5.5, and turn off PV5.2 and MV5.2, so that HLS4.1 or HLS4.2 is connected to HLS5.2;

[0374] (11) Open PV5.1, MV5.1 or PV5.3, MV5.4, PV6.1, MV6.1, so that HLS5.1 or HLS5.2 is connected to HLS6.1. The NaOH solution in HLS6.1 can absorb the acidic gas in the third filtered gas, thereby obtaining H with a purity of 2N to 4N. 2 ;

[0375] When switching to HLS6.2, open PV6.3 and MV6.4, and close PV6.1 and MV6.1, so that HLS5.1 or HLS5.2 is connected with HLS6.2;

[0376] (12) Open PV6.2, MV6.2 or PV6.4, MV6.5 to connect HLS6.1 or HLS6.2 to the downstream gas processing equipment, and transfer 2N to 4N pure H 2 To downstream gas processing equipment.

[0377] (13) When using CONDA, open BV1A and BV1B so that the cryogenic liquid in HX1 flows to the third condenser; when using CONDB, open BV2A and BV2B so that the cryogenic liquid in HX1 flows to the third condenser;

[0378] (14) Open MV1 and MV2A to allow the high-temperature gas to flow to CONDA, which is sensitive to 2N to 4N purity H 2 Condensation is performed to obtain condensed liquid and a third condensed gas; when switching to CONDB, MV1 and MV2B are opened to make H with a purity of 2N to 4N 2 Flow to CONDB;

[0379] (15) When using CONDA, open MV3A, MV4 and MV5A so that the condensed liquid and the third condensed gas flow to CANA, and CANA can store the condensed liquid;

[0380] When CONDB is used, MV3B, MV4 and MV5A are opened so that the condensed liquid and the third condensed gas flow to CANA, which can store the condensed liquid;

[0381] When it is necessary to switch to CANB, open MV5 B so that the condensed liquid and the third condensed gas flow to CANB;

[0382] (16) When using CANA, MV6A, MV7 and MV11A are opened so that the third condensed gas can flow to TDA, and TDA can adsorb liquid molecules in the condensed gas to obtain the first purified gas;

[0383] In the case of using CANB, MV6B, MV7 and MV11A are opened so that the condensed gas can flow to TDA, and TDA can adsorb the liquid molecules in the third condensed gas to obtain the first purified gas;

[0384] When it is necessary to switch to TDB, open MV11B so that the third condensed gas can flow to TDB;

[0385] (17) When using TDA, open MV12A, MV13, and MV14A so that the first purified gas can flow to ROA, and ROA only allows small molecular hydrogen to pass through to obtain H with a purity of 4N to 6N. 2 and mixed air;

[0386] When TDB is used, MV12B, MV13, and MV14A are opened so that the first purified gas can flow to ROA, and ROA only allows small molecular hydrogen to pass through to obtain H with a purity of 4N to 6N. 2and mixed air;

[0387] When it is necessary to switch to ROB, MV14B is opened so that the first purified gas can flow to ROA;

[0388] (18) When using ROA, open MV15A and MV16 to make 4N to 6N pure H 2 It can be connected to the first delivery pipeline; when using ROB, open MV15B and MV16 to make 4N to 6N purity H 2 Accessible to a first delivery pipeline;

[0389] (19) Start DRY and open MV18, MV19, MV20 and PV1. DRY forms a vacuum negative pressure in the first delivery pipeline, and 4N-6N pure H 2 The liquid may flow to downstream semiconductor process equipment through the first delivery pipeline.

[0390] Furthermore, the tail gas recovery and treatment method of this embodiment also includes:

[0391] (20) When the liquid level inside CA1.1 or CA1.2 monitored by LE1.1 or LE1.2 exceeds a preset threshold, open MV1.5 or MV1.6 so that the liquid in CA1.1 or CA1.2 can be discharged to the waste liquid treatment equipment;

[0392] (21) When the internal pressure of CA1.1 or CA1.2 monitored by PT1.1 or PT1.2 exceeds a preset threshold, SV1.1 or SV1.2 automatically opens, and the gas inside CA1.1 or CA1.2 can be discharged through the first pressure relief pipeline;

[0393] (22) When the internal pressure of CA2.1 or CA2.2 monitored by PT2.1 or PT2.2 exceeds a preset threshold, SV2.1 or SV2.2 automatically opens, and the gas inside CA2.1 or CA2.2 can be discharged through the second pressure relief pipeline;

[0394] (23) When the liquid level inside CA2.1 or CA2.2 monitored by LE2.1 or LE2.2 exceeds a preset threshold, open MV2.5 or MV2.6 so that the liquid inside CA2.1 or CA2.2 can be discharged to the waste liquid treatment equipment;

[0395] (24) When the iron powder in HO3.1 or HO3.2 needs to be replaced, open BV3.2 or BV3.4 to discharge the waste in HO3.1 or HO3.2; then, open BV3.1 or BV3.3, close BV3.2 or BV3.4, and add iron powder to HO3.1 or HO3.2;

[0396] (25) When it is necessary to replace the aqueous solution in HLS4.1 or HLS4.2, open BV4.2 or BV4.4 to discharge the waste liquid in HLS4.1 or HLS4.2 to the waste liquid treatment equipment; then, open BV4.1 or BV4.3 and close BV4.2 or BV4.4 so that the aqueous solution source can add aqueous solution to HLS4.1 or HLS4.2;

[0397] (26) When the pressure monitored by PT4.1 or PT4.2 exceeds a preset threshold, SV4.1 or SV4.2 automatically opens, so that the gas inside HLS4.1 or HLS4.2 can be discharged through the third pressure relief pipeline;

[0398] (27) When the silver nitrate solution in HLS5.1 or HLS5.2 needs to be replaced, open BV5.2 or BV5.4 to discharge the waste liquid in HLS5.1 or HLS5.2 to the waste liquid treatment equipment; then, open BV5.1 or BV5.3 and close BV5.2 or BV5.4 so that the silver nitrate solution source can add silver nitrate solution to HLS5.1 or HLS5.2;

[0399] (28) When the pressure monitored by PT5.1 or PT5.2 exceeds a preset threshold, SV5.1 or SV5.2 automatically opens, so that the gas inside HLS5.1 or HLS5.2 can be discharged through the fourth pressure relief pipeline;

[0400] (29) When it is necessary to replace the NaOH solution in HLS6.1 or HLS6.2, open BV6.2 or BV6.4 to discharge the waste liquid in HLS6.1 or HLS6.2 to the waste liquid treatment equipment; then, open BV6.1 or BV6.3 and close BV6.2 or BV6.4 so that the NaOH solution source can add NaOH solution to HLS6.1 or HLS6.2;

[0401] (30) When the pressure monitored by PT6.1 or PT6.2 exceeds a preset threshold, SV6.1 or SV6.2 automatically opens, so that the gas inside HLS6.1 or HLS6.2 can be discharged through the fifth pressure relief pipeline;

[0402] (31) When the liquid level inside CANA and CANB monitored by LEA and LEB exceeds a preset threshold, MV8A and MV8B are opened so that the liquid inside CANA and CANB can be discharged to the waste liquid treatment equipment;

[0403] (32) When it is necessary to exhaust the gas inside CANA and CANB, open MV9A, MV9B, MV10A, and MV10B to exhaust the gas inside CANA and CANB to the exhaust gas combustion treatment equipment;

[0404] (33) When the internal pressure of ROA and ROB monitored by PT6A and PT6B is too high, MV17A and MV17B are opened so that the impurities of ROA and ROB can flow to the exhaust gas combustion treatment equipment;

[0405] (34) When DRY needs maintenance, open MV21 so that the gas at both ends of DRY can be discharged through the second delivery pipeline;

[0406] (35) When the internal pressure of CANA and CANB is too high, SV1A and SV1B are automatically opened, and the gas inside the fourth liquid storage pipeline can flow to the exhaust gas combustion treatment equipment through the first pressure relief pipeline;

[0407] (36) When the pressure inside the first delivery pipeline is too high, MV22 is opened, SV2 is automatically opened, and the gas inside the first delivery pipeline can flow to the exhaust gas combustion treatment equipment through the second pressure relief pipeline.

[0408] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0409] The above-mentioned embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent of the present application shall be subject to the attached claims.

Claims

1. A tail gas separation and purification device, characterized in that: include: a first condensation unit, the first condensation unit being in communication with an upstream semiconductor process device and configured to condense the mixed gas to remove trichlorosilane to obtain a first condensed gas and to condense the first condensed gas to remove dichlorosilane to obtain a second condensed gas; a first gas filtering unit, the first gas filtering unit being connected to the first condensing unit and being located downstream of the first condensing unit, and being used for obtaining a second condensed gas and allowing the second condensed gas to react with iron powder under high temperature conditions to remove phosphine in the second condensed gas to obtain a first filtered gas, obtaining the first filtered gas and allowing the first filtered gas to react with an aqueous solution under normal temperature conditions to remove diborane in the first filtered gas to obtain a second filtered gas, and obtaining the second filtered gas and allowing the second filtered gas to react with a silver nitrate solution under normal temperature conditions to remove germanium hydride in the second filtered gas to obtain a third filtered gas; a second gas filtering unit, which is connected to the first gas filtering unit and is located downstream of the first gas filtering unit, and is used to obtain a third filtered gas under normal temperature conditions so that the third filtered gas reacts with a sodium hydroxide solution to remove acidic gas in the third filtered gas, thereby obtaining H2 with a purity of 2N to 4N; a second condensing unit, the second condensing unit being in communication with the second gas filtering unit and being located downstream of the second gas filtering unit, and being used for condensing H2 with a purity of 2N to 4N to obtain a third condensed gas; a first purification unit, the first purification unit being in communication with the second condensation unit and being located downstream of the second condensation unit, and configured to filter the third condensed gas to remove H2O so as to obtain a first purified gas; A second purification unit, which is connected to the first purification unit and the tail gas combustion treatment device respectively and is located downstream of the first purification unit, and is used to filter the first purified gas to remove impurities to obtain H2 with a purity of 4N to 6N; A conveying unit, wherein the conveying component is connected to the second purification unit and the downstream semiconductor process equipment respectively, and is used to convey H2 with a purity of 4N to 6N to the downstream semiconductor process equipment; Wherein, the first condensing unit comprises: a first condensing element, the first condensing element being connected to an upstream semiconductor process equipment and the first gas filter unit, respectively, and being located downstream of the upstream semiconductor process equipment and upstream of the first gas filter unit, and being used for condensing the mixed gas to remove trichlorosilane to obtain a first condensed gas, and conveying the first condensed gas to the first gas filter unit; a first liquid storage element, the first liquid storage element being in communication with the first condensing element and the waste liquid treatment device and being used for storing liquid trichlorosilane; a second condensing element, the second condensing element being in communication with the first condensing element and the first gas filtering unit, respectively, and being located downstream of the first condensing element and upstream of the first gas filtering unit, and being used for condensing the first condensed gas to remove dichlorosilane to obtain a second condensed gas, and conveying the second condensed gas to the first gas filtering unit; a second liquid storage element, the second liquid storage element being connected to the second condensing element and the waste liquid treatment device, respectively, and being used for storing liquid dichlorosilane; Wherein, the first gas filtering unit comprises: a first filter element, the first filter element being in communication with the first condensation unit and being located downstream of the first condensation unit, and being used for filtering the second condensed gas to remove phosphine so as to obtain a first filtered gas; a second filter element, the second filter element being in communication with the first filter element and the waste liquid treatment device and being located downstream of the first filter element, and being used for filtering the first filtered gas to remove diborane to obtain a second filtered gas; a third filter element, the third filter element being in communication with the second filter element, the second gas filter unit, and the waste liquid treatment device, and being located downstream of the second filter element and upstream of the second gas filter unit, and being used for filtering the second filtered gas to remove germanium hydride to obtain a third filtered gas, and conveying the third filtered gas to the second gas filter unit; Wherein, the second gas filtering unit comprises: a fourth filter element, the fourth filter element being connected to the first gas filter unit, the second condensation unit, and the waste liquid treatment device, respectively, and being located downstream of the first gas filter unit and upstream of the downstream gas treatment device, and being used for filtering the third filtered gas to remove acidic gas to obtain H2 with a purity of 2N to 4N; Wherein, the second condensing unit comprises: a third condensing element, the third condensing element being connected to the second gas filtering unit and the first purification unit respectively, and being located downstream of the second gas filtering unit and upstream of the first purification unit, for condensing H2 with a purity of 2N to 4N to obtain a third condensed gas, and conveying the third condensed gas to the first purification unit; a third liquid storage element, the third liquid storage element being connected to the third condensing element and the waste liquid treatment device respectively, and being used for storing condensed liquid; Wherein, the first purification unit comprises: a first purification element, the first purification element being connected to the second condensing unit and the second purification unit respectively, and being located downstream of the second condensing unit and upstream of the second purification unit, and being used for filtering the third condensed gas to remove H2O so as to obtain a first purified gas; Wherein, the second purification unit comprises: A second purification element, which is connected to the first purification unit, the delivery unit, and the tail gas combustion treatment device, respectively, and is located downstream of the first purification unit and upstream of the delivery unit, and is used to filter the first purified gas to remove impurities to obtain H2 with a purity of 4N to 6N; Wherein, the conveying unit comprises: A delivery element, wherein the delivery element is connected to the first purification unit and a downstream semiconductor process equipment respectively, and is used for delivering H2 with a purity of 4N to 6N to the downstream semiconductor process equipment.

2. The tail gas separation and purification equipment according to claim 1, characterized in that: The first condensing unit further comprises: a first valve element, the first valve element being disposed on a pipeline connecting the first condensing unit and an upstream semiconductor process device, and being used to control the flow of the pipeline; and / or The first condensing unit further comprises: a second valve element, the second valve element being disposed on a pipeline connecting the first liquid storage element, the first condensing element and the waste liquid treatment device, and being used to control the flow of the pipeline; and / or The first condensing unit further comprises: a third valve element, the third valve element being disposed on a pipeline connecting the second condensing element with the second liquid storage element, the first gas filtration unit, and the waste liquid treatment device, and being used to control the flow of the pipeline; and / or The first gas filter unit also includes: a fourth valve element, the fourth valve element being disposed on a pipeline connecting the first filter element with the first condensing unit and the second gas filter unit, and being used to control the flow of the pipeline; and / or The first gas filter unit also includes: a fifth valve element, the fifth valve element being disposed on a pipeline connecting the second filter element with the first condensation unit and the second gas filter unit, and being used to control the flow of the pipeline; and / or The first gas filter unit also includes: a sixth valve element, the sixth valve element being disposed on a pipeline connecting the third filter element and the first condensation unit and the second gas filter unit, and being used to control the flow of the pipeline; and / or The second gas filter unit also includes: a seventh valve element, the seventh valve element being disposed on a pipeline connecting the fourth filter element with the first gas filter unit and a downstream gas processing device, and being used to control the flow of the pipeline; and / or The second condensing unit further comprises: an eighth valve element, the eighth valve element being disposed on a pipeline connecting the third condensing element, the second gas filter unit and the third liquid storage element, and being used to control the flow of the pipeline; a ninth valve element, the ninth valve element being disposed on a pipeline connecting the third liquid storage element with the third condensing element, the first purification unit, and the waste liquid treatment device, and being used to control the flow of the pipeline; and / or The first purification unit also includes: a tenth valve element, the tenth valve element being disposed on a pipeline connecting the first purification element with the second condensing unit and the second purification unit, and being used to control the flow of the pipeline; and / or The second purification unit also includes: an eleventh valve element, the eleventh valve element being disposed on a pipeline connecting the second purification element with the first purification unit and the delivery unit, and being used to control the flow of the pipeline; and / or The conveying unit further comprises: a twelfth valve element, the twelfth valve element being disposed on a pipeline connecting the conveying element with the second purification unit and a downstream semiconductor process equipment, and being used to control the flow of the pipeline; and / or The first condensing unit further comprises: A first monitoring element, which is in communication with the first liquid storage element and is used to monitor the pressure, temperature and liquid level inside the first liquid storage element; and / or The first condensing unit further comprises: A second monitoring element, which is in communication with the second liquid storage element and is used to monitor the pressure, temperature and liquid level inside the second liquid storage element; and / or The first gas filtering unit further comprises: A third monitoring element, the third monitoring element is connected to the first filter element and is used to monitor the temperature inside the first filter element; and / or The first gas filter unit also includes: a fourth monitoring element, the fourth monitoring element being in communication with the second filter element and being used for monitoring the pressure and liquid level inside the second filter element; and / or The first gas filter unit also includes: a fifth monitoring element, the fifth monitoring element being in communication with the third filter element and being used for monitoring the pressure and liquid level inside the third filter element; and / or The second gas filter unit also includes: a sixth monitoring element, the sixth monitoring element being in communication with the fourth filter element and being used for monitoring the pressure and liquid level inside the fourth filter element; and / or The second condensing unit further comprises: a seventh monitoring element, the seventh monitoring element being in communication with the third condensing element and the third liquid storage element, and being used for monitoring the temperature of the third condensing element and the temperature, liquid level and pressure of the third liquid storage element; and / or The first purification unit also includes: an eighth monitoring element, the eighth monitoring element being in communication with the first purification element and being used for monitoring the pressure inside the first purification element; and / or The second purification unit also includes: a ninth monitoring element, the ninth monitoring element being in communication with the second purification element and being used for monitoring the pressure inside the second purification element; and / or The conveying unit further comprises: A tenth monitoring element is connected to the conveying element and is used to monitor the pressure inside the conveying element.

3. The tail gas separation and purification equipment according to claim 1, characterized in that: There are at least two first gas filter units, and several of the first gas filter units are arranged in parallel; and / or There are at least two second gas filter units, and several of the second gas filter units are arranged in parallel; and / or There are at least two second condensing units, and several of the second condensing units are arranged in parallel; and / or There are at least two first purification units, and several of the first purification units are arranged in parallel; and / or There are at least two second purification units, and several of the second purification units are arranged in parallel.

4. The tail gas separation and purification equipment according to any one of claims 1 to 3, characterized in that: Also includes: a gas analysis unit, the gas analysis unit being connected to the first gas filter unit, the second gas filter unit, and the delivery unit, respectively, and being used to detect whether the purity of the first filtered gas, the second filtered gas, the third filtered gas, and the hydrogen meets the standard; and / or a purge unit, the purge unit being connected to the first condensing unit, the first gas filtering unit, and the second gas filtering unit, respectively, and being used to purge the first condensing unit, the first gas filtering unit, and the second gas filtering unit; and / or a vacuum unit, wherein the vacuum unit is connected to the first condensing unit, the first gas filtering unit, and the second gas filtering unit, respectively, and is used to discharge the gas inside the first condensing unit, the first gas filtering unit, and the second gas filtering unit; and / or A pressure relief unit, wherein the pressure relief unit is respectively connected to the first condensing unit, the first gas filtering unit, the second gas filtering unit, the second condensing unit, and the conveying unit, and is used to relieve pressure on the first condensing unit, the first gas filtering unit, the second gas filtering unit, the second condensing unit, and the conveying unit.

5. The tail gas separation and purification equipment according to claim 4, characterized in that: The purge unit comprises: a purge element, the purge element being connected to the first condensing unit, the first gas filter unit, and the second gas filter unit, respectively, and being used to purge the first condensing unit, the first gas filter unit, and the second gas filter unit; and / or The vacuum unit comprises: a vacuum element, wherein the vacuum element is connected to the first condensing unit, the first gas filtering unit, and the second gas filtering unit, respectively, and is used to discharge the gas inside the first condensing unit, the first gas filtering unit, and the second gas filtering unit; and / or The pressure relief unit comprises: a first pressure relief element, the first pressure relief element being connected to the first condensing unit and the vacuum unit respectively, and being used for relieving pressure on the first condensing unit; a second pressure relief element, the second pressure relief element being connected to the first gas filter unit and the vacuum unit respectively, and being used for relieving pressure on the first gas filter unit; a third pressure relief element, the third pressure relief element being connected to the second gas filter unit and the vacuum unit respectively, and being used for relieving pressure on the second gas filter unit; a fourth pressure relief element, the fourth pressure relief element being connected to the second condensing unit and the tail gas combustion treatment device respectively, and being used for relieving pressure on the second condensing unit; A fifth pressure relief element, wherein the fifth pressure relief element is connected to the delivery unit and the exhaust gas combustion treatment device respectively, and is used for relieving pressure on the delivery unit.

6. The tail gas separation and purification equipment according to claim 5, characterized in that: The purge unit also includes: a thirteenth valve element, the thirteenth valve element being disposed on a pipeline connecting the purge element with the first condensing unit, the first gas filtering unit, and the second gas filtering unit, for controlling circulation in the pipeline; and / or The vacuum unit comprises: a fourteenth valve element, the fourteenth valve element being disposed on a pipeline connecting the vacuum element with the first condensing unit, the first gas filtering unit, and the second gas filtering unit, and being used to control the flow of the pipeline; and / or The purge unit also includes: an eleventh monitoring component, the eleventh monitoring component being disposed on a pipeline connected to the purge element and being used for monitoring the pressure inside the pipeline; and / or The vacuum unit also includes: A twelfth monitoring component is arranged on a pipeline connected to the vacuum element, and is used to monitor the pressure inside the pipeline.

7. A tail gas separation and purification method, applied to the tail gas separation and purification equipment according to any one of claims 1 to 6, characterized in that: include: The first condensing unit obtains the mixed gas and condenses the mixed gas to obtain the first condensed gas and the second condensed gas; The first gas filtering unit obtains the second condensed gas and reacts the second condensed gas with iron powder under high temperature conditions to remove phosphine in the second condensed gas to obtain the first filtered gas, obtains the first filtered gas and reacts the first filtered gas with an aqueous solution under normal temperature conditions to remove diborane in the first filtered gas to obtain the second filtered gas, obtains the second filtered gas and reacts the second filtered gas with a silver nitrate solution under normal temperature conditions to remove germanium hydride in the second filtered gas to obtain the third filtered gas; The second gas filtering unit obtains the third filtered gas and reacts the third filtered gas with a sodium hydroxide solution under normal temperature conditions to remove the acidic gas in the third filtered gas to obtain H2 with a purity of 2N to 4N; The second condensing unit obtains H2 with a purity of 2N to 4N and condenses the H2 with a purity of 2N to 4N, thereby producing a third condensed gas; The first purification unit obtains the third condensed gas and adsorbs H2O in the third condensed gas, thereby obtaining a first purified gas; The second purification unit obtains the first purified gas and purifies the first purified gas to obtain H2 with a purity of 4N to 6N.

8. A semiconductor process system, characterized in that: include: The tail gas separation and purification equipment according to any one of claims 1 to 6.

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