A horizontal chemical vapor deposition device

Abstract

The present invention discloses a horizontal chemical vapor deposition device, including a furnace body rotating support assembly and a workpiece holding assembly; the axial direction of the furnace body is horizontal, the workpiece holding assembly is located in the furnace body, the workpiece holding assembly includes more than two circular rings arranged at intervals along the axial direction, all the circular rings are arranged vertically and connected in series through more than two connecting shafts, and the plane where the circular rings are located is perpendicular to the axial direction; positioning pieces are arranged on both sides of each circular ring, the workpiece can be held in the inner hole of the circular ring and between the positioning pieces on both sides, and there is a gap between the workpiece and the inner edge of the circular ring; the rotating support assembly is used to rotate all the circular rings of the workpiece holding assembly. The present invention realizes chemical vapor deposition without fixed support points, thereby advantageously overcoming the coating defect problem at the fixed support point position in the prior art; the workpiece and the circular ring are both in a vertical state, effectively avoiding coating defects caused by particles falling on the workpiece.

Description

Technical Field

[0001] The invention relates to horizontal chemical vapor deposition equipment, belonging to the technical field of chemical vapor deposition. Background Art

[0002] Chemical Vapor Deposition (CVD) is a technology that uses one or more gaseous compounds or single substances containing target coating elements to generate thin films through chemical reactions on the substrate surface using various energy sources such as heating, plasma excitation or light radiation.

[0003] Silicon carbide or tantalum carbide has excellent physical and chemical properties such as high thermal conductivity, low thermal expansion coefficient, good wear resistance and high hardness. With the development of third-generation semiconductor technology and materials, coating products represented by silicon carbide materials have received extensive attention and application, and the coating industry has ushered in a period of vigorous development. High-purity coated parts, such as graphite trays, effectively improve the service life and quality of parts, and become one of the important tools for successful mass production and yield assurance in the semiconductor field.

[0004] At present, the main coating component preparation technology is HTCVD (high temperature chemical vapor deposition) technology, that is, the precursor is continuously decomposed and reacted in a high temperature growth furnace to prepare it. CVD equipment is the main factor in efficiency, quality and cost in the production process of coating products, and the deposition furnace body is the most critical. At present, the CVD coating equipment in use is mainly vertical (the furnace body extends in the vertical direction as a whole), and there are two air intake modes: vertical air intake and horizontal air intake. In the deposition process of large-size coating products, the production capacity is higher under the horizontal air intake and exhaust mode, but the processed parts are in a horizontal support state, and the yield reduction caused by the falling of particles cannot be avoided; and because the processed parts are horizontally supported, the support points are prone to coating defects, which further reduces the yield. There are also some CVD devices in which the processed parts are in a vertical state to avoid the problem of yield reduction caused by the falling of particles. For example, Patent Document 1 (Publication No. CN103717784A) proposes a CVD device that improves the horizontally placed carbonaceous substrate in the existing CVD equipment into a vertically placed carbonaceous substrate. However, the CVD device in Patent Document 1 has low utilization rate of the space inside the furnace body, low utilization rate of the thermal field of the equipment, and at the same time there is inhomogeneity in the flow field and chemical field, and large deviations in the appearance and thickness of the coating; and the problem of coating defects in the supporting parts of the processed parts (carbonaceous substrate) is still not solved. Summary of the invention

[0005] In order to overcome the deficiencies in the prior art, the present invention provides a horizontal chemical vapor deposition device that can solve the problem of reduced yield due to falling particles and the problem of low space utilization in the furnace. The specific technical solution is as follows.

[0006] A horizontal chemical vapor deposition device comprises a furnace body and an air inlet assembly and an air outlet assembly arranged on the furnace body, characterized in that it also comprises: a rotating support assembly and a workpiece holding assembly;

[0007] The axis direction of the furnace body is horizontal, the workpiece holding assembly is located in the furnace body, and the workpiece holding assembly includes more than two circular rings arranged at intervals along the axis direction, all of the circular rings are arranged vertically and connected in series through more than two connecting shafts, and the plane where the circular rings are located is perpendicular to the axis direction; positioning pieces are arranged on both sides of each circular ring, and the workpiece can be held in the inner hole of the circular ring and located between the positioning pieces on both sides, and there is a gap between the workpiece and the inner edge of the circular ring;

[0008] The rotary support assembly is used to rotate the entire ring of the workpiece holding assembly.

[0009] With the above technical solution, a workpiece to be processed can be placed in the inner hole of each ring, and the several rings of the workpiece holding assembly are arranged at intervals along the axis of the furnace body. Therefore, in order to increase the number of workpieces processed at a time, it is only necessary to increase the number of rings of the workpiece holding assembly, which greatly improves the space utilization rate in the furnace and can achieve batch deposition of large-sized workpieces. At the same time, the rings are arranged vertically, and the workpieces in their inner holes are also in a vertical state, which can effectively solve the problem of reduced yield due to the falling of particles.

[0010] Furthermore, at least a portion of the positioning member extends to the inner side of the circular ring to within the inner edge of the circular ring; among the positioning members on both sides of the circular ring, the positioning member on at least one side is a movable positioning member or a detachable positioning member. Preferably, the positioning member is a positioning plate that is fixedly arranged, movably arranged, or detachably arranged on the circular ring. Preferably, at least three positioning members are arranged on both sides of each of the circular rings. The function of the positioning member is to restrict the workpiece in the inner hole of the circular ring, so that the workpiece will not accidentally fall out of the inner hole of the circular ring during the chemical vapor deposition process; after the chemical vapor deposition process is completed, the processed workpiece is taken out from the inner hole of the circular ring by moving (removing) the movable (detachable) positioning member.

[0011] Furthermore, the spacing between the positioning members on both sides of the circular ring is greater than the thickness of the edge of the workpiece. With such a setting, the workpiece is in an active state in the inner hole of the circular ring instead of being clamped and fixed. When the circular ring rotates continuously under the action of the rotating support assembly, the workpiece in the circular ring will also rotate with the circular ring, and the contact point between the workpiece and the circular ring will continuously change; at the same time, in this process, the contact position and contact state (whether contact) between the workpiece and the positioning member are also constantly changing. In short, during the process of chemical vapor deposition, the contact point (contact state) between the workpiece and the circular ring and the contact point (contact state) between the workpiece and the positioning member are constantly changing, so the workpiece does not have a fixed support point, thereby overcoming the technical problem that the support point is prone to coating defects in the prior art. Among them, the spacing between the positioning members on both sides of the circular ring refers to the spacing between the positioning members on both sides along the axial direction; the edge of the workpiece refers to the part of the workpiece corresponding to the positioning members on both sides of the circular ring.

[0012] Further, the rotating support assembly includes at least two supporting shafts and rollers or gears arranged on the supporting shafts, at least some of the rollers or gears are driving wheels; the outer edges of at least two circular rings of the workpiece holding assembly are supported on the rollers or gears. Preferably, the rotating support assembly includes more than two supporting shafts and at least four rollers or gears.

[0013] When the roller or gear (driving wheel) on the support shaft rotates, it will drive the corresponding ring to rotate. Since all the rings of the workpiece holding assembly are connected as a whole through the connecting shaft, the entire workpiece holding assembly is kept in a rotating state together. The advantage of setting up such a rotating support assembly is that the rotating support assembly and the workpiece holding assembly are easy to separate, which is conducive to loading and unloading the workpiece; when loading the workpiece, the workpiece can be completely loaded in several rings of the workpiece holding assembly outside the furnace body, and then the entire workpiece holding assembly is placed on the rotating support assembly inside the furnace body; when unloading the workpiece, the entire workpiece holding assembly is taken out of the furnace body, and then the processed workpiece is taken out. Because of the split setting of the rotating support assembly and the workpiece holding assembly, loading and unloading of the workpiece becomes very simple.

[0014] Preferably, the outer edges of at least two circular rings of the workpiece holding assembly have teeth. When a gear is provided on the support shaft, the outer edges of the corresponding circular rings also have teeth, so that the rotation of the circular rings is more reliable and stable.

[0015] Compared with the prior art, the present invention has the following beneficial effects.

[0016] 1. The present invention realizes chemical vapor deposition without a fixed support point, thereby advantageously overcoming the coating defect problem at the fixed support point position in the prior art;

[0017] 2. The workpiece and the ring are in a vertical state, which effectively avoids coating defects caused by particles falling from the workpiece;

[0018] 3. The entire workpiece holding assembly occupies most of the workpiece in the furnace body, and the workpiece holding assembly remains in a rotating state, which effectively utilizes the thermal field space, reduces process costs, and helps to improve coating quality;

[0019] 4. The circular rings of the workpiece holding assembly are arranged at intervals along the axis of the furnace body. Increasing the number of circular rings can increase the number of workpieces processed at a single time, which is conducive to the batch deposition of large-sized workpieces. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 is a three-dimensional schematic diagram of a horizontal chemical vapor deposition apparatus of the present invention;

[0021] Figure 2 is a three-dimensional schematic diagram of a workpiece holding assembly of the present invention;

[0022] Figure 3 is a front view of a workpiece holding assembly of the present invention;

[0023] Figure 4 is a side view of a workpiece holding assembly of the present invention;

[0024] Figure 5 It is a schematic cross-sectional view of the ring and the workpiece;

[0025] Figure 6 It is a schematic diagram of the cooperation between the workpiece holding assembly and the rotating support assembly;

[0026] Figure 7 is a schematic diagram of the rotating support assembly.

[0027] In the figure: axial direction A, furnace body 1, air intake assembly 2, cover body 3, workpiece holding assembly 4, ring 4.1, connecting shaft 4.2, positioning member 4.3, inner hole 4.4, rotating support assembly 5, support shaft 5.1, gear 5.2, workpiece 6. DETAILED DESCRIPTION

[0028] The present invention is further described in detail below in conjunction with the accompanying drawings.

[0029] See also Figure 1-Figure 7 A horizontal chemical vapor deposition device comprises a furnace body 1 and an air inlet assembly 2 and an air outlet assembly (not shown) arranged on the furnace body 1. The furnace body 1 is a cylindrical structure, and its axial direction A is a horizontal direction, so it can be called a horizontal chemical vapor deposition device. The air inlet assembly 2 and the air outlet assembly are both conventional and necessary structures of chemical vapor deposition equipment, and will not be introduced in detail herein; covers 3 are arranged at both ends of the furnace body 1 in the axial direction, and at least one of the covers 3 can be opened / closed.

[0030] The horizontal chemical vapor deposition equipment also includes a rotating support assembly 5 and a workpiece holding assembly 4;

[0031] The workpiece holding assembly 4 is located in the furnace body 1. The workpiece holding assembly 4 includes more than two circular rings 4.1 arranged at intervals along the axial direction. All the circular rings 4.1 are arranged vertically and connected in series through more than two connecting shafts 4.2. The circular rings 4.1 are of a flat structure, and the plane where the circular rings 4.1 are located is perpendicular to the axial direction; positioning members 4.3 are arranged on both sides of each circular ring 4.1, and the workpiece 6 (the workpiece 6 in this embodiment is a disc-shaped graphite disc) can be held in the inner hole 4.4 of the circular ring 4.1 and between the positioning members 4.3 on both sides, and there is a gap between the workpiece 6 and the inner edge of the circular ring 4.1; the rotating support assembly 5 is used to rotate all the circular rings 4.1 of the workpiece holding assembly 4.

[0032] like Figure 2 , Figure 4 , Figure 5 As shown, at least a portion of the positioning member 4.3 extends to the inner side of the ring 4.1 to within the inner edge of the ring 4.1; among the positioning members 4.3 on both sides of the ring 4.1, the positioning member 4.3 on one side is a movable positioning member 4.3, and the positioning member 4.3 on the other side is a fixed positioning member 4.3, wherein the movable positioning member 4.3 is arranged on the ring 4.1 by fasteners such as screws / pin shafts 4.5, when the positioning member 4.3 rotates around the screw / pin shaft 4.5 to face inward, the workpiece 6 can be positioned, and when the workpiece 6 needs to be removed, the positioning member 4.3 is rotated around the screw / pin shaft 4.5 to face outward. It can be understood by those skilled in the art that the movable positioning member 4.3 can also be replaced by a detachable positioning member 4.3, and the positioning members 4.3 on both sides of the ring 4.1 can also be set as movable (or detachable) positioning members 4.3. Preferably, the positioning member 4.3 is a positioning plate fixedly arranged, movably arranged, or detachably arranged on the ring 4.1. At least two positioning members 4.3 are arranged on each side of the ring 4.1 to prevent the workpiece 6 from accidentally falling off.

[0033] The function of the positioning member 4.3 is to restrict the workpiece 6 in the inner hole 4.4 of the ring 4.1, so that during the chemical vapor deposition process, the workpiece 6 will not accidentally escape from the inner hole 4.4 of the ring 4.1; after the chemical vapor deposition process is completed, the processed workpiece 6 is taken out from the inner hole 4.4 of the ring 4.1 by moving (removing) the movable (detachable) positioning member 4.3.

[0034] Preferably, the spacing between the positioning members 4.3 on both sides of the circular ring 4.1 is greater than the thickness of the edge of the workpiece 6. The gap between the workpiece 6 and the inner edge of the circular ring 4.1 means that the diameter of the workpiece 6 is smaller than the inner diameter of the circular ring 4.1, and when the workpiece 6 is positioned in the inner hole 4.4 of the circular ring 4.1, the inner edge of the workpiece 6 will contact the outer edge of the workpiece 6 to support the workpiece 6. With such a setting, the workpiece 6 is in an active state in the inner hole 4.4 of the circular ring 4.1 instead of being clamped and fixed. When the circular ring 4.1 rotates continuously under the action of the rotating support assembly 5, the workpiece 6 in the circular ring 4.1 will also rotate with the circular ring 4.1, and the contact point of the workpiece 6 with the circular ring 4.1 will continuously change; at the same time, in this process, the contact position and contact state (whether in contact) of the workpiece 6 with the positioning member 4.3 are also continuously changing. In short, during the chemical vapor deposition process, the contact point (contact state) between the workpiece 6 and the ring 4.1, and the contact point (contact state) between the workpiece 6 and the positioning member 4.3 are constantly changing, so the workpiece 6 does not have a fixed support point, thereby overcoming the technical problem of coating defects easily generated at the support point in the prior art. Among them, the spacing between the positioning members 4.3 on both sides of the ring 4.1 refers to the spacing between the positioning members 4.3 on both sides along the axial direction A; the edge of the workpiece 6 refers to the portion of the workpiece 6 corresponding to the positioning members 4.3 on both sides of the ring 4.1.

[0035] Furthermore, if Figure 1 , Figure 6As shown, the rotating support assembly 5 includes three supporting shafts 5.1 and rollers or gears 5.2 arranged on the supporting shafts 5.1, at least part of the rollers or gears 5.2 are driving wheels; the driving wheels can be driven to rotate separately, or the corresponding rollers or gears 5.2 can be driven to rotate by the rotating supporting shafts 5.1. The outer edges of at least two rings 4.1 of the workpiece holding assembly 4 are supported on the rollers or gears 5.2, and of course, rollers or gears 5.2 can be set for each ring 4.1. The rotating support assembly 5 can include at least two supporting shafts 5.1 and four rollers or gears 5.2, and the four rollers or gears 5.2 support the two rings 4.1, two of which are driving wheels, and the other two can be auxiliary driven wheels. When the rollers or gears 5.2 (driving wheels) on the supporting shafts 5.1 rotate, the corresponding rings 4.1 will be driven to rotate. Since all the rings 4.1 of the workpiece holding assembly 4 are connected as a whole through the connecting shaft 4.2, the entire workpiece holding assembly 4 is kept in a rotating state together. The advantage of setting up such a rotating support assembly 5 is that the rotating support assembly 5 and the workpiece holding assembly 4 are easy to separate, which is beneficial to the loading and unloading of the workpiece 6; when loading the workpiece 6, the workpiece 6 can be completely loaded into the several rings 4.1 of the workpiece holding assembly 4 outside the furnace body 1, and then the entire workpiece holding assembly 4 is placed on the rotating support assembly 5 inside the furnace body 1; when unloading the workpiece 6, the entire workpiece holding assembly 4 is taken out of the furnace body 1, and then the processed workpiece 6 is taken out. Because of the split setting of the rotating support assembly 5 and the workpiece holding assembly 4, the loading and unloading of the workpiece 6 becomes very simple.

[0036] Preferably, the outer edges of at least two rings 4.1 of the workpiece holding assembly 4 have teeth. When gears are provided on the support shaft 5.1, the outer edges of the corresponding rings 4.1 also have teeth, which makes the rotation of the rings 4.1 more reliable and stable.

[0037] In order to adapt to the high temperature environment of chemical vapor deposition, the workpiece holding assembly 4 and the rotating support assembly 5 are both made of carbon material (such as graphite).

[0038] By adopting the technical solution of the present invention, a workpiece 6 to be processed can be placed in the inner hole 4.4 of each circular ring 4.1, and several circular rings 4.1 of the workpiece holding assembly 4 are arranged at intervals along the axial direction of the furnace body 1. Therefore, in order to increase the number of workpieces 6 processed at a single time, it is only necessary to increase the number of circular rings 4.1 of the workpiece holding assembly 4, which greatly improves the space utilization rate in the furnace and enables batch deposition of large-sized workpieces 6. At the same time, the circular ring 4.1 is arranged vertically, and the workpiece 6 in its inner hole 4.4 is also in a vertical state, which can effectively solve the problem of decreased yield due to falling particles. In addition, the horizontal chemical vapor deposition equipment of the present invention realizes the rotational support of the workpiece in a manner without a fixed support point, thereby advantageously overcoming the coating defect problem at the fixed support point position in the prior art.

[0039] The embodiments of the present invention are described above in conjunction with the accompanying drawings. In the absence of conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other. The present invention is not limited to the above-mentioned specific implementations, which are merely illustrative and not restrictive. Under the enlightenment of the present invention, those skilled in the art can also make many forms without departing from the scope of protection of the present invention and the claims, all of which belong to the protection scope of the present invention.

Claims

1. A horizontal chemical vapor deposition device, comprising a furnace body (1) and an air inlet assembly (2) and an air outlet assembly arranged on the furnace body (1), characterized in that: Also includes: A rotating support assembly (5) and a workpiece holding assembly (4); The axial direction (A) of the furnace body (1) is horizontal; the workpiece holding assembly (4) is located in the furnace body (1); the workpiece holding assembly (4) comprises two or more circular rings (4.1) arranged at intervals along the axial direction (A); all the circular rings (4.1) are arranged vertically and connected in series via two or more connecting shafts (4.2); the plane where the circular rings (4.1) are located is perpendicular to the axial direction (A); positioning members (4.3) are arranged on both sides of each circular ring (4.1); a workpiece (6) can be held in an inner hole (4.4) of the circular ring (4.1) and between the positioning members (4.3) on both sides; and a gap exists between the workpiece (6) and the inner edge of the circular ring (4.1); The rotating support assembly (5) is used to rotate all the circular rings (4.1) of the workpiece holding assembly (4); At least a portion of the positioning member (4.3) extends toward the inner side of the circular ring (4.1) to within the inner edge of the circular ring (4.1); among the positioning members (4.3) on both sides of the circular ring (4.1), at least one of the positioning members (4.3) is a movable positioning member (4.3) or a detachable positioning member (4.3); The rotary support assembly (5) comprises at least two support shafts (5.1) and rollers or gears (5.2) arranged on the support shafts (5.1), and at least part of the rollers or gears (5.2) are driving wheels; the outer edges of at least two circular rings (4.1) of the workpiece holding assembly (4) are supported on the rollers or gears (5.2).

2. A horizontal chemical vapor deposition device according to claim 1, characterized in that: The workpiece holding assembly (4) is made of carbon material.

3. The horizontal chemical vapor deposition equipment according to claim 1, characterized in that: The positioning member (4.3) is a positioning plate that is fixedly arranged, movably arranged, or detachably arranged on the circular ring (4.1).

4. The horizontal chemical vapor deposition equipment according to claim 1, characterized in that: At least three positioning members (4.3) are arranged on both sides of each circular ring (4.1).

5. The horizontal chemical vapor deposition equipment according to claim 1, characterized in that: The distance between the positioning pieces (4.3) on both sides of the circular ring (4.1) is greater than the thickness of the edge of the workpiece (6).

6. The horizontal chemical vapor deposition equipment according to claim 1, characterized in that: The rotating support assembly (5) is made of carbon material.

7. The horizontal chemical vapor deposition equipment according to claim 1, characterized in that: The rotating support assembly (5) comprises more than two support shafts (5.1) and at least four rollers or gears (5.2).

8. The horizontal chemical vapor deposition equipment according to claim 1, characterized in that: The outer edges of at least two circular rings (4.1) of the workpiece holding assembly (4) have teeth.

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