A FLASH radiotherapy dose control method, device and electronic equipment

Abstract

The present invention provides a FLASH radiotherapy dose control method, device and electronic equipment, comprising: calculating the number of beam outputs, the total beam output time and the beam output frequency of beam pulses of at least two different pulse widths, and sending them to a beam generating system, and sending the set beam stop dose threshold and the pulse conversion dose threshold and beam stop time threshold obtained by calculation to a beam sampling controller; judging whether the actual beam output dose is greater than or equal to the pulse conversion dose threshold, judging whether to output a level control signal for adjusting the pulse width to the beam generating system according to the judgment result, then judging whether the actual beam output dose is greater than or equal to the beam stop dose threshold, and judging whether the actual beam output time is greater than or equal to the beam stop time threshold, and judging whether to output a level control signal for stopping beam output to the beam generating system according to the judgment result, thereby improving the accuracy of FLASH beam dose control.

Description

Technical Field

[0001] The present invention relates to the technical field of FLASH radiotherapy dose control, and in particular to a FLASH radiotherapy dose control method, device and electronic equipment. Background Art

[0002] FLASH radiotherapy is a new radiotherapy technology that kills tumor cells and reduces toxic side effects on normal tissues by irradiating tumors with ultra-high dose rates of particle beams in a very short time. Taking electron Flash radiotherapy as an example, in an electron linear accelerator, the electron beam is usually generated in the form of pulses. In order to achieve ultra-high dose rate electron beams, the pulse frequency and single pulse dose must be increased. The increase in beam pulse frequency and single pulse dose makes it extremely difficult to accurately control the irradiation dose.

[0003] In order to meet the FLASH treatment mode, a high dose needs to be achieved in a short time. To achieve a high dose in a short time, the beam frequency and single pulse dose must be increased as much as possible. In terms of achieving accurate irradiation dose, high pulse dose and pulse frequency are meaningful for ultra-high dose rate, but have no practical significance for high-precision control. Therefore, it is necessary to tackle the problem from the direction of single pulse dose. To this end, it is necessary to require a small single pulse dose, or at least a small dose of a single pulse at the end of the beam. To ensure the accuracy of the total beam dose, it is bound to require a conversion between a high-dose pulse and a low-dose pulse in the beam control process, which involves the time and method of conversion, specifically including: amplitude, pulse width, if the amplitude is adjusted, it may affect the beam energy size; and by adjusting the pulse width, it is difficult to achieve a steep rising edge and falling edge. However, the prior art lacks a method for accurately controlling the irradiation dose by controlling the single pulse dose. Therefore, in order to overcome the above technical difficulties, a dose control method suitable for the FLASH mode is proposed.

[0004] Therefore, the prior art needs to be further developed. Summary of the invention

[0005] The purpose of the present invention is to overcome the above technical deficiencies and provide a FLASH radiotherapy dose control method, device and electronic equipment to solve the problems existing in the prior art.

[0006] To achieve the above technical objectives, according to a first aspect of the present invention, the present invention provides a FLASH radiotherapy dose control method, the FLASH radiotherapy dose control method is applied to a FLASH radiotherapy system, the FLASH radiotherapy system includes a beam control system, a beam generation system, and a beam monitoring system;

[0007] The FLASH radiotherapy dose control method includes a multi-pulse control mode, and the multi-pulse control mode includes:

[0008] S100, calculating the number of beam pulses with at least two different pulse widths, the total beam pulse time, and the beam pulse frequency in a beam control system;

[0009] S200, sending the beam frequency to the beam generating system, and sending the pulse widths of at least two beam pulses with different pulse widths and the dose rate of the multi-pulse control mode pre-set in the beam control system to the beam generating system; and sending the specification of the currently used source pre-set in the beam control system to the beam sampling controller in the beam monitoring system;

[0010] S300, the beam sampling controller determines whether the actual beam dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output a level control signal for adjusting the pulse width to the beam generating system according to the determination result.

[0011] Specifically, the S300 further includes:

[0012] The beam stop dose threshold value of the multi-pulse control mode pre-set in the beam control system and the beam stop time threshold value obtained by calculation are sent to the beam sampling controller in the beam monitoring system to judge whether the actual beam output dose is greater than or equal to the beam stop dose threshold value of the multi-pulse control mode. At the same time, the beam sampling controller judges whether the actual beam output time is greater than or equal to the beam stop time threshold value, and determines whether to output a level control signal for stopping beam output to the beam generating system according to the judgment result.

[0013] Specifically, the at least two beam pulses with different pulse widths include at least a first beam pulse and a second beam pulse;

[0014] The pulse widths of the at least two beam pulses with different pulse widths include:

[0015] The pulse width of the first beam pulse is a first preset pulse width, the pulse width of the second beam pulse is a second preset pulse width, and the first preset pulse width is greater than the second preset pulse width.

[0016] Specifically, the step of calculating the number of beam pulses with at least two different pulse widths, the total beam pulse time, and the beam pulse frequency in the beam control system includes:

[0017] The number D of the first beam pulse and the second beam pulse is calculated by using a beam stop dose threshold of a multi-pulse control mode preset in a beam control system;

[0018] The total beam time T of the first beam pulse and the second beam pulse is calculated by using the beam stop dose threshold and dose rate of the multi-pulse control mode pre-set in the beam control system. The specific calculation formula is as follows:

[0019] T = DoseSET / DoseRate;

[0020] Wherein, DoseSET is the beam stop dose threshold of the multi-pulse control mode set in the beam control system, and DoseRate is the dose rate of the multi-pulse control mode set in the beam control system;

[0021] The calculation formula of the beam frequency F is: F=D / T.

[0022] Specifically, the calculation of the number D of the first beam pulse and the second beam pulse by the beam stop dose threshold of the multi-pulse control mode preset in the beam control system includes:

[0023] Selecting a single pulse dose Dose1 of the first beam pulse and a single pulse dose Dose2 of the second beam pulse under the specifications of the applicator currently used;

[0024] The number of beams is calculated by using the beam stop dose threshold of the multi-pulse control mode preset in the beam control system and the single pulse dose Dose1 of the first beam pulse and the single pulse dose Dose2 of the second beam pulse. The specific calculation method is as follows:

[0025] DoseSET / Dose1=X...DoseRemain1;

[0026] DoseRemain1 / Dose2=Y...DoseRemain2;

[0027] The number of beams D is:

[0028] D=X+Y+1;

[0029] Wherein, DoseSET is the stop dose threshold of the multi-pulse control mode set in the beam control system, X is the number of the first beam pulses, Y is the number of the second beam pulses, DoseRemain1 is the remaining dose after the number of the first beam pulses is calculated by the stop dose threshold of the multi-pulse control mode, and DoseRemain2 is the remaining dose after the number of the second beam pulses is calculated by DoseRemain1.

[0030] Specifically, the single pulse dose Dose2 of the second beam pulse is controlled within a first preset threshold, so that the error between the actual beam-emitting dose and the beam-off dose threshold of the multi-pulse control mode is smaller than the first preset threshold.

[0031] Specifically, the pulse conversion dose threshold is calculated by the single pulse dose Dose1 of the first beam pulse and the number X of the first beam pulse. The specific calculation method is as follows:

[0032] DoseSET1=X*Dose1;

[0033] Wherein, DoseSET1 is the pulse conversion dose threshold.

[0034] Specifically, the step of sending the beam stop dose threshold value of the multi-pulse control mode pre-set in the beam control system and the beam stop time threshold value obtained by calculation to the beam sampling controller in the beam monitoring system includes:

[0035] The beam stop time threshold is calculated by the total beam time T of the first beam pulse and the second beam pulse and the preset time margin T0. The specific calculation method is as follows:

[0036] T1=T+T0;

[0037] Wherein, T1 is the beam-off time threshold.

[0038] Specifically, the beam sampling controller determines whether the actual beam dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output a level control signal for adjusting the pulse width to the beam generating system according to the determination result, including:

[0039] If the actual beam dose is greater than or equal to the pulse conversion dose threshold, the beam sampling controller outputs a level control signal for adjusting the pulse width to the beam generating system within a first preset time, and the beam generating system adjusts the pulse width within the first preset time;

[0040] If the actual beam-emitting dose is less than the pulse conversion dose threshold, the beam sampling controller does not output a level control signal for adjusting the pulse width to the beam generating system.

[0041] Specifically, the beam sampling controller determines whether the actual beam dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output a level control signal for adjusting the pulse width to the beam generating system according to the determination result, and further includes:

[0042] The beam sampling controller performs analog-to-digital conversion on the electrical signal collected by the beam detector in the beam monitoring system to obtain a value of the corresponding electrical signal;

[0043] Obtain the corresponding calibration coefficient according to the specifications of the applicator currently in use, and calculate the actual beam dose according to the value of the corresponding electrical signal and the calibration coefficient;

[0044] The calibration coefficient is used to calibrate the corresponding relationship between the value of the electrical signal collected by the beam detector and the actual beam dose value.

[0045] Specifically, the step of determining whether to output a level control signal for stopping beam generation to the beam generation system according to the judgment result includes:

[0046] If the actual beam dose is greater than or equal to the beam stop dose threshold of the multi-pulse control mode, or the actual beam emission time is greater than or equal to the beam stop time threshold, the beam sampling controller outputs a level control signal for stopping beam emission to the beam generating system within a first preset time, and the beam generating system closes the beam emission enable port within the first preset time to stop beam emission;

[0047] If the actual beam dose is less than the beam stop dose threshold of the multi-pulse control mode, and the actual beam time is less than the beam stop time threshold, the beam sampling controller does not output a level control signal for stopping beam emission to the beam generating system.

[0048] Specifically, the FLASH radiotherapy dose control method also includes a single pulse control mode, in which a fixed pulse width is used for dose output, and the single pulse control mode includes:

[0049] S1000, calculating the number of beam pulses with a fixed pulse width, the total beam pulse time, and the beam pulse frequency in a beam control system;

[0050] S2000, sending the beam frequency to the beam generating system, and sending the fixed pulse width and the dose rate of the single pulse control mode preset in the beam control system to the beam generating system; and sending the specification of the currently used source device preset in the beam control system to the beam sampling controller in the beam monitoring system;

[0051] S3000, the beam sampling controller determines whether the actual beam emission dose is greater than or equal to the beam stop dose threshold of the single pulse control mode. At the same time, the beam sampling controller determines whether the actual beam emission time is greater than or equal to the beam stop time threshold, and determines whether to output a level control signal for stopping fixed pulse beam emission to the beam generating system based on the judgment result.

[0052] Specifically, the step of determining whether to output a level control signal for stopping fixed pulse beam emission to the beam generating system according to the judgment result includes:

[0053] If the actual beam dose is greater than or equal to the beam stop dose threshold of the single pulse control mode, or the actual beam emission time is greater than or equal to the beam stop time threshold, the beam sampling controller outputs a level control signal for stopping fixed pulse beam emission to the beam generating system within a first preset time, and the beam generating system closes the beam emission enable port within the first preset time to stop beam emission;

[0054] If the actual beam dose is less than the beam stop dose threshold of the single pulse control mode, and the actual beam time is less than the beam stop time threshold, the beam sampling controller does not output a level control signal for stopping fixed pulse beam emission to the beam generation system.

[0055] According to a second aspect of the present invention, there is provided a FLASH radiotherapy device, comprising:

[0056] Beam control system: the beam control system includes a human-computer interaction interface and a controller, the beam control system is used to calculate the number of beam pulses with at least two different pulse widths, the total beam time, and the beam frequency of the beam pulses, and send the beam frequency to the beam generation system within a first preset time, and send the preset pulse width of the beam pulses with at least two different pulse widths and the dose rate of the multi-pulse control mode to the beam generation system, and send the preset beam stop dose threshold of the multi-pulse control mode, the specification of the source currently in use, and the pulse conversion dose threshold and beam stop time threshold obtained by calculation to the beam sampling controller in the beam monitoring system;

[0057] Beam generating system: the beam generating system includes a gun power supply, a klystron power supply, a microwave excitation source, a klystron, and an accelerating tube. The beam generating system is used to receive and complete the instructions issued by the beam control system and the beam monitoring system within a first preset time;

[0058] Beam monitoring system: The beam monitoring system includes a beam detector and a beam sampling controller. The beam monitoring system is used to determine whether the actual beam dose is greater than or equal to the pulse conversion dose threshold, and determine whether to output a level control signal for adjusting the pulse width to the beam generating system based on the determination result, and then determine whether the actual beam dose is greater than or equal to the beam stop dose threshold of the multi-pulse control mode. At the same time, determine whether the actual beam time is greater than or equal to the beam stop time threshold, and determine whether to output a level control signal for stopping beam emission to the beam generating system based on the determination result.

[0059] According to a third aspect of the present invention, there is provided an electronic device, comprising: a memory; and a processor, wherein the memory stores computer-readable instructions, and when the computer-readable instructions are executed by the processor, the above-mentioned FLASH radiotherapy dose control method is implemented.

[0060] Beneficial effects:

[0061] The present invention achieves the purpose of accurately controlling the beam dose of the FLASH beam by calculating the number of beam pulses with at least two different pulse widths, the total beam time, and the beam frequency of the beam pulses in the beam control system, and judging whether the actual beam dose is greater than or equal to the pulse conversion dose threshold through the beam monitoring system, and judging whether to output a level control signal for adjusting the pulse width to the beam generating system according to the judgment result, and then judging whether the actual beam dose is greater than or equal to the beam stop dose threshold and the actual beam time is greater than or equal to the beam stop time threshold, and judging whether to output a level control signal for stopping beam emission to the beam generating system according to the judgment result. The flow generation system greatly improves the safety of beam pulse dose control, solves the problems of high beam pulse frequency, large single pulse dose, and difficult to accurately control the beam dose in the FLASH beam, and realizes accurate control of the FLASH beam dose from two aspects of beam dose and beam time. At the same time, the present invention adopts level control signals for signal transmission, can quickly respond to changes in beam dose, does not require complex communication interfaces or protocols, is easy to implement, greatly reduces the complexity of the signal transmission process, further improves the stability and reliability of the FLASH beam dose control, and greatly improves the intelligence, safety and reliability of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0062] Figure 1 It is a flow chart of a FLASH radiotherapy dose control method provided in a specific embodiment of the present invention;

[0063] Figure 2 is a schematic diagram of the system composition of the FLASH radiotherapy system provided in a specific embodiment of the present invention;

[0064] Figure 3 It is a schematic diagram of the composition of the FLASH radiotherapy device provided in a specific embodiment of the present invention. DETAILED DESCRIPTION

[0065] In order to enable those skilled in the art to better understand the technical solution of the present invention, the technical solution of the present invention is clearly and completely described below in conjunction with the accompanying drawings of the present invention. Based on the embodiments in this application, other similar embodiments obtained by ordinary technicians in this field without making creative work should all fall within the scope of protection of this application. In addition, the directional words mentioned in the following embodiments, such as "up", "down", "left", "right", etc., are only reference to the directions of the accompanying drawings. Therefore, the directional words used are used to illustrate rather than limit the invention.

[0066] The present invention will be further described below in conjunction with the accompanying drawings and preferred embodiments.

[0067] See also Figure 1 , this embodiment provides a FLASH radiotherapy dose control method, the FLASH radiotherapy dose control method is applied to a FLASH radiotherapy system, the FLASH radiotherapy system includes a beam control system, a beam generation system, and a beam monitoring system;

[0068] It should be noted here that the beam stop dose threshold of the multi-pulse control mode, the dose rate of the multi-pulse control mode, the beam stop dose threshold of the single-pulse control mode, the dose rate of the single-pulse control mode, the specifications of the applicator currently used, the first preset threshold, the first preset time, the first preset pulse width, the second preset pulse width, the pulse width of the fixed pulse, and the preset time margin are pre-set in the beam control system.

[0069] It can be understood that the present invention does not limit the specific values ​​of the stop dose threshold of the multi-pulse control mode, the dose rate of the multi-pulse control mode, the stop dose threshold of the single-pulse control mode, the dose rate of the single-pulse control mode, the specification of the applicator currently used, the first preset threshold, the first preset time, the first preset pulse width, the second preset pulse width, the pulse width of the fixed pulse, and the preset time margin, as long as the FLASH radiotherapy dose control method proposed in the present invention can be applied.

[0070] Preferably, the present invention sets the beam stop dose threshold of the multi-pulse control mode to 60Gy, the present invention sets the dose rate of the multi-pulse control mode to 200Gy / S, the present invention sets the beam stop dose threshold of the single-pulse control mode to 30Gy, the present invention sets the dose rate of the single-pulse control mode to 50Gy / S, the present invention sets the diameter of the currently used source applicator to 10cm, the present invention sets the angle of the currently used source applicator to 0°, the present invention sets the first preset pulse width to 5μs, the present invention sets the second preset pulse width to 0.1μs, the present invention sets the pulse width of the fixed pulse to 0.1μs, the present invention sets the first preset threshold to 0.1Gy, the present invention sets the first preset time to 500μs, and the present invention sets the preset time margin to 50ms. The above settings are obtained by those skilled in the art after a large number of experiments, which can further improve the accuracy of FLASH beam dose control and greatly improve the usability and reliability of the present invention.

[0071] The FLASH radiotherapy dose control method includes a multi-pulse control mode, and the multi-pulse control mode includes:

[0072] S100, calculating the number of beam pulses with at least two different pulse widths, the total beam pulse time, and the beam pulse frequency in a beam control system;

[0073] Specifically, the at least two beam pulses with different pulse widths include at least a first beam pulse and a second beam pulse;

[0074] The pulse widths of the at least two beam pulses with different pulse widths include:

[0075] The pulse width of the first beam pulse is a first preset pulse width, the pulse width of the second beam pulse is a second preset pulse width, and the first preset pulse width is greater than the second preset pulse width.

[0076] Specifically, the step of calculating the number of beam pulses with at least two different pulse widths, the total beam pulse time, and the beam pulse frequency in the beam control system includes:

[0077] The number D of the first beam pulse and the second beam pulse is calculated by using a beam stop dose threshold of a multi-pulse control mode preset in a beam control system;

[0078] The total beam time T of the first beam pulse and the second beam pulse is calculated by the beam stop dose threshold and dose rate of the multi-pulse control mode set in the beam control system. The specific calculation formula is as follows:

[0079] T = DoseSET / DoseRate;

[0080] Wherein, DoseSET is the beam stop dose threshold of the multi-pulse control mode set in the beam control system, and DoseRate is the dose rate of the multi-pulse control mode set in the beam control system;

[0081] The calculation formula of the beam frequency F is: F=D / T.

[0082] It can be understood that the beam output number refers to the number of pulses emitted from the beam source, and the beam output frequency refers to the number of times the beam pulses are continuously emitted per unit time. After the beam control system calculates the beam output frequency F, the beam output frequency parameter F is sent to the beam generating system. At the same time, the beam control system sends at least two pulse width parameters, i.e., at least a first preset pulse width of a first beam pulse, and a second preset pulse width of a second beam pulse, i.e., a large pulse width and a small pulse width, to the beam generating system to execute beam output.

[0083] Specifically, the calculation of the number D of the first beam pulse and the second beam pulse by the beam stop dose threshold of the multi-pulse control mode preset in the beam control system includes:

[0084] Selecting a single pulse dose Dose1 of the first beam pulse and a single pulse dose Dose2 of the second beam pulse under the specifications of the applicator currently used;

[0085] The number of beams is calculated by using the beam stop dose threshold of the multi-pulse control mode preset in the beam control system and the single pulse dose Dose1 of the first beam pulse and the single pulse dose Dose2 of the second beam pulse. The specific calculation method is as follows:

[0086] DoseSET / Dose1=X...DoseRemain1;

[0087] DoseRemain1 / Dose2=Y...DoseRemain2;

[0088] The number of beams D is:

[0089] D=X+Y+1;

[0090] Wherein, DoseSET is the stop dose threshold of the multi-pulse control mode set in the beam control system, X is the number of the first beam pulses, Y is the number of the second beam pulses, DoseRemain1 is the remaining dose after the number of the first beam pulses is calculated by the stop dose threshold of the multi-pulse control mode, and DoseRemain2 is the remaining dose after the number of the second beam pulses is calculated by DoseRemain1.

[0091] It can be understood that the specifications of the applicator include the diameter and angle of the applicator. The single pulse dose of different beam pulses under different applicator specifications can be obtained by experimental measurement. Since the specifications of the applicator will affect the dose distribution of the beam, it is necessary to find the single pulse dose Dose1 corresponding to the first beam pulse under the applicator specifications and the single pulse dose Dose2 corresponding to the second beam pulse under the applicator specifications according to the specifications of the applicator set in the beam control system, so that the beam stop dose threshold DoseSET of the multi-pulse control mode pre-set in the beam control system can be achieved by adding several first beam pulses with large pulse widths to several second beam pulses with small pulse widths, wherein DoseRemain2 is the remaining dose after calculating the number of beams of the second beam pulses through DoseRemain1. Since DoseRemain2 is less than the single pulse dose Dose2 of the second beam pulse, it is necessary to add a second beam pulse with a small pulse width at the end to meet the set total beam dose, that is, the requirement of the beam stop dose threshold.

[0092] Specifically, the single pulse dose Dose2 of the second beam pulse is controlled within a first preset threshold, so that the error between the actual beam-emitting dose and the beam-off dose threshold of the multi-pulse control mode is smaller than the first preset threshold.

[0093] It should be noted here that the present invention preferably sets the first preset threshold value to 0.1Gy, that is, to achieve the purpose of controlling the error between the actual beam dose and the beam stop dose threshold value of the multi-pulse control mode set by the user to be within 0.1Gy. Therefore, when adapting to the specifications of different applicators, the beam dose with a small pulse width is controlled, that is, the single pulse dose of the second beam pulse, is less than 0.1Gy under applicators of different specifications, thereby ensuring that the final actual beam dose is closer to the preset beam stop dose, further reducing the beam dose error of the beam pulse, and greatly improving the accuracy and stability of the FLASH beam pulse dose control.

[0094] S200, sending the beam frequency to the beam generating system, and sending the pulse widths of at least two beam pulses with different pulse widths and the dose rate of the multi-pulse control mode pre-set in the beam control system to the beam generating system; and sending the specification of the currently used source pre-set in the beam control system to the beam sampling controller in the beam monitoring system;

[0095] It can be understood that the beam control system can complete the issuance of beam emission instructions, the beam monitoring system can complete the issuance of instructions such as beam stop and pulse width adjustment, the beam generating system can complete the corresponding instruction actions according to the instruction actions of the beam control system and the beam monitoring system, the beam monitoring system can realize multi-zone detection of ultra-high dose rate electron beam, and convert the electron beam into electrical signals, and configure the action instructions for the electrical signals. The above-mentioned beam control system, beam generating system, and beam monitoring system together constitute a highly integrated and coordinated beam dose control system, which improves the accuracy of electron beam pulse dose control and greatly improves the safety and reliability of the present invention.

[0096] S300, the beam sampling controller determines whether the actual beam dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output a level control signal for adjusting the pulse width to the beam generating system according to the determination result.

[0097] Specifically, the S300 further includes:

[0098] The beam stop dose threshold value of the multi-pulse control mode pre-set in the beam control system and the beam stop time threshold value obtained by calculation are sent to the beam sampling controller in the beam monitoring system to judge whether the actual beam output dose is greater than or equal to the beam stop dose threshold value of the multi-pulse control mode. At the same time, the beam sampling controller judges whether the actual beam output time is greater than or equal to the beam stop time threshold value, and determines whether to output a level control signal for stopping beam output to the beam generating system according to the judgment result.

[0099] Specifically, the pulse conversion dose threshold is calculated by the single pulse dose Dose1 of the first beam pulse and the number X of the first beam pulse. The specific calculation method is as follows:

[0100] DoseSET1=X*Dose1;

[0101] Wherein, DoseSET1 is the pulse conversion dose threshold.

[0102] Specifically, the step of sending the beam stop dose threshold value of the multi-pulse control mode pre-set in the beam control system and the beam stop time threshold value obtained by calculation to the beam sampling controller in the beam monitoring system includes:

[0103] The beam stop time threshold is calculated by the total beam time T of the first beam pulse and the second beam pulse and the preset time margin T0. The specific calculation method is as follows:

[0104] T1=T+T0;

[0105] Wherein, T1 is the beam-off time threshold.

[0106] It is understandable that in order to improve the safety of beam dose control, in addition to setting the beam stop dose threshold of the multi-pulse control mode, the beam control system also ensures beam safety from the perspective of beam time. For example, after setting the dose rate and beam stop dose threshold of the multi-pulse control mode in the beam control system, the total beam time T is calculated, and a time margin T0 is added to the total beam time T to obtain the beam stop time threshold T1. The present invention sets the preset time margin T0 to 50ms. If the beam monitoring system detects that the actual beam time of the beam generation system reaches the beam stop time threshold T1, the beam is stopped immediately. In this way, beam safety is achieved in terms of both beam dose and beam time, which greatly improves the safety and accuracy of beam pulse beam dose control.

[0107] Specifically, the beam sampling controller determines whether the actual beam dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output a level control signal for adjusting the pulse width to the beam generating system according to the determination result, including:

[0108] If the actual beam dose is greater than or equal to the pulse conversion dose threshold, the beam sampling controller outputs a level control signal for adjusting the pulse width to the beam generating system within a first preset time, and the beam generating system adjusts the pulse width within the first preset time;

[0109] If the actual beam dose is less than the pulse conversion dose threshold, the beam sampling controller does not output a level control signal for adjusting the pulse width to the beam generating system.

[0110] It should be further explained that the beam generating system and the beam monitoring system in the present invention are required to complete the issuance and execution of instructions within the first preset time, and the sum of the first preset time of the process of the beam monitoring system issuing instructions and the beam generating system executing instructions is required to be less than the interval between two first beam pulses, that is, the interval between large pulses, that is, the interval between the end of this pulse and the generation of the next pulse; thereby ensuring that each instruction has enough time to be completely received and processed, and then ensuring that the pulse width adjustment signal can be issued to the beam generating system and the small pulse beam output preparation can be completed before the next large pulse is generated. The present invention sets the first preset time to 500μs, which means that the beam sampling controller must complete the signal processing and output in a very short time, and the beam generating system must also complete the reception and execution of instructions in a very short time, ensuring timely pulse conversion and controllable irradiation dose. At the same time, the beam generation system is directly controlled by giving a level control signal through the beam monitoring system. Compared with the communication control connection through the beam control system, it does not require complex communication protocols, reduces the complexity of the system, and has a faster response speed. It can quickly respond and adjust the beam parameters, further improving the timeliness, stability and controllability of the beam dose.

[0111] It should be noted here that the beam stop dose threshold of the multi-pulse control mode in the present invention is the total beam dose of the beam pulse set by the user, and the pulse conversion dose threshold is the total beam dose of the first beam pulse obtained by calculation in the beam control system. In order to achieve precise control of the beam dose, the total beam dose of the first beam pulse, that is, the pulse conversion dose threshold, and the set total beam dose of the beam pulse, that is, the beam stop dose threshold of the multi-pulse control mode, need to be sent to the beam sampling controller in the beam monitoring system for real-time monitoring of whether the current beam dose of the beam pulse reaches the pulse conversion dose threshold. If the pulse conversion dose threshold is reached, it is determined whether the current beam dose reaches the beam stop dose threshold, and then it is determined whether to stop beam emission, which greatly improves the accuracy and safety of beam pulse dose control.

[0112] Specifically, the beam sampling controller determines whether the actual beam dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output a level control signal for adjusting the pulse width to the beam generating system according to the determination result, and further includes:

[0113] The beam sampling controller performs analog-to-digital conversion on the electrical signal collected by the beam detector to obtain a value of the corresponding electrical signal;

[0114] Obtain the corresponding calibration coefficient according to the specifications of the applicator currently in use, and calculate the actual beam dose according to the value of the corresponding electrical signal and the calibration coefficient;

[0115] The calibration coefficient is used to calibrate the corresponding relationship between the value of the electrical signal collected by the beam detector and the actual beam dose value.

[0116] It should be further explained that the calibration coefficients in the beam monitoring system are usually used to calibrate the correspondence between the electrical signal values ​​collected by the beam detector and the actual beam dose values. The calibration coefficients are related to the selected source specifications and the pulse width of the beam pulse. The actual beam dose can be tested using dose film or a calibrated detector, and the electrical signal values ​​collected by the beam detector are recorded at the same time. In this way, the calibration coefficients between the electrical signal collection values ​​of the beam pulses of different specifications of source applicators at different beam pulse widths and the actual beam dose values ​​can be calibrated. These calibration coefficients will be sent to the beam sampling controller through the beam sampling controller when the source applicator is selected and the beam pulse width is set, so as to calculate the actual beam dose value.

[0117] Specifically, the step of determining whether to output a level control signal for stopping beam generation to the beam generation system according to the judgment result includes:

[0118] If the actual beam dose is greater than or equal to the beam stop dose threshold of the multi-pulse control mode, or the actual beam emission time is greater than or equal to the beam stop time threshold, the beam sampling controller outputs a level control signal for stopping beam emission to the beam generating system within a first preset time, and the beam generating system closes the beam emission enable port within the first preset time to stop beam emission;

[0119] If the actual beam dose is less than the beam stop dose threshold of the multi-pulse control mode, and the actual beam time is less than the beam stop time threshold, the beam sampling controller does not output a level control signal for stopping beam emission to the beam generating system.

[0120] It can be understood that in the multi-pulse control mode, during the beam emission process, the beam generating system first starts to emit beams with a large pulse width, that is, the state of the first beam pulse. The beam sampling controller in the beam monitoring system will collect the electrical signal of the beam conversion in real time, and perform analog-to-digital conversion to obtain the value of the electrical signal. The beam sampling controller calculates the actual beam dose according to the calibration coefficient tested. When the actual beam dose is greater than or equal to the pulse conversion dose threshold, the beam sampling controller will output a level control signal for adjusting the pulse width to the beam generating system within 500 μs. After receiving the level control signal, the beam generating system will change the beam pulse width to the second beam pulse, that is, the small pulse width state, within 500 μs. At this time, the beam monitoring system will continue to monitor in real time whether the value of the beam dose is greater than or equal to the beam stop dose threshold of the multi-pulse control mode. When the actual beam dose is greater than or equal to the beam stop dose threshold of the multi-pulse control mode, the beam sampling controller will output a beam stop level control signal within 500 μs. It should be noted that the beam monitoring system monitors the real beam time in real time from the beginning of beam emission. When the real beam time is greater than or equal to the beam stop time threshold, the beam sampling controller will output a beam stop level control signal within 500μs. At this time, the beam generation system will close the beam enable port within 500μs to stop beam emission. The beam stop is controlled by both the beam dose and the beam time. That is, the beam can be stopped if any one of the beam dose and the beam time is met. This method greatly improves the accuracy and safety of the FLASH beam dose control of the present invention.

[0121] See also Figure 2 , the following is a specific example to illustrate the specific working principle of the multi-pulse control mode:

[0122] S1: The user sets the beam stop dose threshold of the multi-pulse control mode to 60Gy, the dose rate to 200Gy / S, the selected applicator diameter to 10cm, the angle to 0°, and the preset time margin T0 to 50ms through the interactive interface. At this time, the controller confirms that the single pulse dose Dose1 of the first beam pulse corresponding to the applicator with a diameter of 10cm and an angle of 0° is 2.3Gy, and the single pulse dose Dose2 of the second beam pulse is 0.08Gy according to the set applicator specifications, and then calculates the number of beams D:

[0123] 60 / 2.3=26……0.2;

[0124] 0.2 / 0.08=2……0.04;

[0125] D=26+2+1=29;

[0126] Calculate the beam time T:

[0127] T = 60 / 200 = 0.3s;

[0128] Calculate the beam frequency F:

[0129] F=29 / 0.3=96.7Hz;

[0130] Then the beam frequency F is rounded up to 97Hz;

[0131] S2: The controller sends the calculated pulse width control frequency, i.e., the beam frequency F, and the first preset pulse width W1 of 5 μs, i.e., the large pulse width, and the second preset pulse width W2 of 0.1 μs, i.e., the small pulse width, to the beam generation system;

[0132] S3: The pulse conversion dose threshold DoseSET1 obtained by calculation is 59.8Gy. The controller sends the calibration coefficient, pulse conversion dose threshold DoseSET1, beam stop dose threshold DoseSET, and beam stop time threshold to the beam sampling controller. After the parameters are sent successfully, the beam control system prompts that the beam emission conditions are met.

[0133] S4: The user clicks the beam-emitting button to trigger the electron beam-emitting switch, and the electron beam begins to emit beams with a large pulse width (W1, 5μs);

[0134] S5: After the beam starts to emerge, the beam detector monitors the beam signal in real time and converts it into an electrical signal to the beam sampling controller. The beam sampling controller converts the electrical signal into a real beam dose value in real time through analog-to-digital conversion and calibration coefficients.

[0135] S6: When the real-time beam dose value calculated by the beam sampling controller is greater than or equal to the pulse conversion dose threshold DoseSET1 (59.8Gy), the beam sampling controller will output a pulse width adjustment level control signal to the beam generation system within 500μs. After receiving the level control signal, the beam generation system will change the beam pulse width to the second beam pulse within 500μs, that is, the small pulse width W2 (0.1μs) state;

[0136] S7: The calculated beam stop time threshold T1 is 0.35s. When the real-time beam output dose value calculated by the beam sampling controller is greater than or equal to the beam stop dose threshold DoseSET (60Gy), or when the beam sampling controller detects that the actual beam output time is greater than or equal to the beam stop time threshold T1 (0.35s), the beam sampling controller will output the beam stop level control signal to the beam generation system within 500μs. After receiving the level control signal, the beam generation system will stop the beam within 500μs, and finally achieve precise control of the beam dose. It is required that the sum of the time for the beam control system and the beam monitoring system to issue instructions and the time for the beam generation system to execute instructions is less than the interval between the two first beam pulses, that is, the interval between the end of this pulse and the generation of the next pulse; thereby ensuring that each instruction has enough time to be fully received and processed, and then ensuring that the pulse width adjustment signal can be sent to the beam generation system before the next large pulse is generated and the small pulse beam preparation is completed.

[0137] Specifically, the FLASH radiotherapy dose control method also includes a single pulse control mode, in which a fixed pulse width is used for dose output, and the single pulse control mode includes:

[0138] S1000, calculating the number of beam pulses with a fixed pulse width, the total beam pulse time, and the beam pulse frequency in a beam control system;

[0139] S2000, sending the beam frequency to the beam generating system, and sending the fixed pulse width and the dose rate of the single pulse control mode preset in the beam control system to the beam generating system; and sending the specification of the currently used source device preset in the beam control system to the beam sampling controller in the beam monitoring system;

[0140] S3000, the beam sampling controller determines whether the actual beam emission dose is greater than or equal to the beam stop dose threshold of the single pulse control mode. At the same time, the beam sampling controller determines whether the actual beam emission time is greater than or equal to the beam stop time threshold, and determines whether to output a level control signal for stopping fixed pulse beam emission to the beam generating system based on the judgment result.

[0141] Specifically, the step of determining whether to output a level control signal for stopping fixed pulse beam emission to the beam generating system according to the judgment result includes:

[0142] If the actual beam dose is greater than or equal to the beam stop dose threshold of the single pulse control mode, or the actual beam emission time is greater than or equal to the beam stop time threshold, the beam sampling controller outputs a level control signal for stopping fixed pulse beam emission to the beam generating system within a first preset time, and the beam generating system closes the beam emission enable port within the first preset time to stop beam emission;

[0143] If the actual beam dose is less than the beam stop dose threshold of the single pulse control mode, and the actual beam time is less than the beam stop time threshold, the beam sampling controller does not output a level control signal for stopping fixed pulse beam emission to the beam generation system.

[0144] It should be further explained that, in the single-pulse control mode, the beam generating system starts to emit beams in a fixed pulse state, and the beam sampling controller in the beam monitoring system will collect the electrical signal converted by the beam in real time, and perform analog-to-digital conversion to obtain the value of the electrical signal. The beam sampling controller calculates the actual beam dose based on the calibration coefficient tested. At this time, the beam monitoring system monitors the beam dose and beam time in real time from the beginning of beam emission. When it is detected that the actual beam dose is greater than or equal to the beam stop dose threshold of the single-pulse control mode, or when it is detected that the actual beam time is greater than or equal to the beam stop time threshold, the beam sampling controller will output a beam stop level control signal within 500μs. At this time, the beam generating system will close the beam enable port within 500μs and stop beam emission.

[0145] The following is a specific example to illustrate the specific working principle of the single pulse control mode:

[0146] S11: Through the interactive interface, the stop dose threshold of the single pulse control mode is set to 30Gy, the dose rate is 50Gy / S, the selected applicator diameter is 10cm, the angle is 0°, and the preset time margin T0 is 50ms. At this time, the controller confirms that the single pulse dose Dose3 of the fixed beam pulse corresponding to the applicator with a diameter of 10cm and an angle of 0° is 0.08Gy according to the set applicator specifications, and then calculates the number of beams D:

[0147] D=30 / 0.08=375;

[0148] Calculate the beam time T:

[0149] T = 30 / 50 = 0.6s;

[0150] Calculate the beam frequency F:

[0151] F=375 / 0.6=625Hz;

[0152] The controller sends the calculated pulse width control frequency, i.e., the beam frequency of 625 Hz, and the fixed pulse width W3 of 0.1 μs, to the beam generation system;

[0153] S21: Sending a beam frequency of 625 Hz to the beam generation system, and sending a fixed pulse width of 0.1 μs and a dose rate of 50 Gy / S pre-set in the beam control system to the beam generation system; and sending the specification of the currently used applicator pre-set in the beam control system to the beam sampling controller in the beam monitoring system;

[0154] S31: The beam sampling controller determines whether the actual beam dose is greater than or equal to the pulse stop dose threshold of 30Gy. At the same time, the beam sampling controller determines whether the actual beam time is greater than or equal to the stop time threshold of 650ms, and determines whether to output a level control signal to stop the fixed pulse beam to the beam generation system based on the judgment result. The stop time threshold here is calculated by summing the beam time T and the preset time margin T0. When the real-time beam dose value calculated by the beam sampling controller is greater than or equal to the stop dose threshold of 30Gy, or when the beam sampling controller monitors that the actual beam time is greater than or equal to the stop time threshold of 650ms, the beam sampling controller will output a stop beam level control signal to the beam generation system within 500μs. After receiving the level control signal, the beam generation system will stop beaming within 500μs, and finally achieve precise control of the beam dose.

[0155] It can be understood that, relative to the multi-pulse control mode, the fixed pulse control mode is equivalent to the pulse width of the beam generating system being fixed to the second preset pulse width, that is, only small pulses are used to apply the entire dose.

[0156] It should be noted that the present invention achieves the purpose of accurately controlling the beam dose of the FLASH beam by calculating the number of beam pulses with at least two different pulse widths, the total beam time, and the beam frequency of the beam pulses in the beam control system, and judging whether the actual beam dose is greater than or equal to the pulse conversion dose threshold through the beam monitoring system, and judging whether to output the level control signal for adjusting the pulse width to the beam generation system according to the judgment result, and then judging whether the actual beam dose is greater than or equal to the beam stop dose threshold and whether the actual beam time is greater than or equal to the beam stop time threshold, and judging whether to output the level control signal for stopping the beam according to the judgment result. The signal to beam generating system greatly improves the safety of beam pulse dose control, solves the problems of high beam pulse frequency, large single pulse dose, and difficult to accurately control the beam dose in the FLASH beam, and realizes accurate control of the FLASH beam dose from two aspects of beam dose and beam time. At the same time, the present invention adopts level control signal for signal transmission, can quickly respond to changes in beam dose, does not require complex communication interface or protocol, is easy to implement, greatly reduces the complexity of the signal transmission process, further improves the stability and reliability of FLASH beam dose control, and greatly improves the intelligence, safety and reliability of the present invention.

[0157] See also Figure 3 , this embodiment provides a FLASH radiotherapy device, including:

[0158] Beam control system 100: The beam control system includes a human-computer interaction interface and a controller, and is used to calculate the number of beam pulses with at least two different pulse widths, the total beam time, and the beam frequency of the beam pulses, and send the beam frequency to the beam generation system within a first preset time, and send the preset pulse widths of at least two different pulse widths of beam pulses and the dose rate of the multi-pulse control mode to the beam generation system, and send the preset beam stop dose threshold of the multi-pulse control mode, the specification of the currently used source applicator, and the pulse conversion dose threshold and beam stop time threshold obtained by calculation to the beam sampling controller in the beam monitoring system;

[0159] Beam generating system 200: the beam generating system comprises a gun power supply, a klystron power supply, a microwave excitation source, a klystron, and an accelerating tube, and the beam generating system is used to receive and complete the instructions issued by the beam control system and the beam monitoring system within a first preset time;

[0160] Beam monitoring system 300: The beam monitoring system includes a beam detector and a beam sampling controller. The beam monitoring system is used to determine whether the actual beam dose is greater than or equal to the pulse conversion dose threshold, and determine whether to output a level control signal for adjusting the pulse width to the beam generating system based on the determination result, and then determine whether the actual beam dose is greater than or equal to the beam stop dose threshold of the multi-pulse control mode. At the same time, determine whether the actual beam time is greater than or equal to the beam stop time threshold, and determine whether to output a level control signal for stopping beam emission to the beam generating system based on the determination result.

[0161] It is understandable that the user sets the output parameters of the electron gun power supply, klystron power supply and microwave excitation source according to the beam pulse width parameters and beam pulse frequency parameters issued by the beam control system and debugging experience.

[0162] It should be noted that the present invention achieves the purpose of accurately controlling the beam dose of the FLASH beam by calculating the number of beam pulses with at least two different pulse widths, the total beam time, and the beam frequency of the beam pulses in the beam control system, and judging whether the actual beam dose is greater than or equal to the pulse conversion dose threshold through the beam monitoring system, and judging whether to output the level control signal for adjusting the pulse width to the beam generation system according to the judgment result, and then judging whether the actual beam dose is greater than or equal to the beam stop dose threshold and whether the actual beam time is greater than or equal to the beam stop time threshold, and judging whether to output the level control signal for stopping the beam according to the judgment result. The signal to beam generating system greatly improves the safety of beam pulse dose control, solves the problems of high beam pulse frequency, large single pulse dose, and difficult to accurately control the beam dose in the FLASH beam, and realizes accurate control of the FLASH beam dose from two aspects of beam dose and beam time. At the same time, the present invention adopts level control signal for signal transmission, can quickly respond to changes in beam dose, does not require complex communication interface or protocol, is easy to implement, greatly reduces the complexity of the signal transmission process, further improves the stability and reliability of FLASH beam dose control, and greatly improves the intelligence, safety and reliability of the present invention.

[0163] In a preferred embodiment, the present application further provides an electronic device, the electronic device comprising:

[0164] A memory; and a processor, wherein the memory stores computer-readable instructions, and when the computer-readable instructions are executed by the processor, the FLASH radiotherapy dose control method is implemented. The computer device can be broadly a server, a terminal, or any other electronic device with necessary computing and / or processing capabilities. In one embodiment, the computer device may include a processor, a memory, a network interface, a communication interface, etc. connected via a system bus. The processor of the computer device can be used to provide necessary computing, processing and / or control capabilities. The memory of the computer device may include a non-volatile storage medium and an internal memory. An operating system, a computer program, etc. may be stored in or on the non-volatile storage medium. The internal memory may provide an environment for the operation of the operating system and the computer program in the non-volatile storage medium. The network interface and the communication interface of the computer device can be used to connect and communicate with external devices via a network. When the computer program is executed by the processor, the steps of the method of the present invention are performed.

[0165] The present invention may be implemented as a computer-readable storage medium having a computer program stored thereon, which causes the steps of the method of an embodiment of the present invention to be executed when executed by a processor. In one embodiment, the computer program is distributed on a plurality of computer devices or processors coupled to a network so that the computer program is stored, accessed and executed in a distributed manner by one or more computer devices or processors. A single method step / operation, or two or more method steps / operations, may be performed by a single computer device or processor or by two or more computer devices or processors. One or more method steps / operations may be performed by one or more computer devices or processors, and one or more other method steps / operations may be performed by one or more other computer devices or processors. One or more computer devices or processors may perform a single method step / operation, or perform two or more method steps / operations.

[0166] It will be appreciated by a person skilled in the art that the method steps of the present invention may be performed by instructing related hardware such as a computer device or a processor through a computer program, and the computer program may be stored in a non-temporary computer-readable storage medium, which causes the steps of the present invention to be performed when the computer program is executed. Depending on the circumstances, any reference to memory, storage, database, or other media herein may include non-volatile and / or volatile memory. Examples of non-volatile memory include read-only memory (ROM), programmable ROM (PROM), electrically programmable ROM (EPROM), electrically erasable programmable ROM (EEPROM), flash memory, magnetic tape, floppy disk, magneto-optical data storage device, optical data storage device, hard disk, solid state disk, etc. Examples of volatile memory include random access memory (RAM), external cache memory, etc.

[0167] It should be noted that the present invention achieves the purpose of accurately controlling the beam dose of the FLASH beam by calculating the number of beam pulses with at least two different pulse widths, the total beam time, and the beam frequency of the beam pulses in the beam control system, and judging whether the actual beam dose is greater than or equal to the pulse conversion dose threshold through the beam monitoring system, and judging whether to output the level control signal for adjusting the pulse width to the beam generation system according to the judgment result, and then judging whether the actual beam dose is greater than or equal to the beam stop dose threshold and whether the actual beam time is greater than or equal to the beam stop time threshold, and judging whether to output the level control signal for stopping the beam according to the judgment result. The signal to beam generating system greatly improves the safety of beam pulse dose control, solves the problems of high beam pulse frequency, large single pulse dose, and difficult to accurately control the beam dose in the FLASH beam, and realizes accurate control of the FLASH beam dose from two aspects of beam dose and beam time. At the same time, the present invention adopts level control signal for signal transmission, can quickly respond to changes in beam dose, does not require complex communication interface or protocol, is easy to implement, greatly reduces the complexity of the signal transmission process, further improves the stability and reliability of FLASH beam dose control, and greatly improves the intelligence, safety and reliability of the present invention.

[0168] The various technical features described above can be combined arbitrarily. Although all possible combinations of these technical features are not described, any combination of these technical features should be considered to be covered by this specification as long as there is no contradiction in such combination.

[0169] The specific implementation of the present invention described above does not constitute a limitation on the protection scope of the present invention. Any other corresponding changes and modifications made based on the technical concept of the present invention should be included in the protection scope of the claims of the present invention.

Claims

1. A FLASH radiotherapy dose control method, characterized in that: The FLASH radiotherapy dose control method is applied to a FLASH radiotherapy system, which includes a beam control system, a beam generation system, and a beam monitoring system; The FLASH radiotherapy dose control method includes a multi-pulse control mode, and the multi-pulse control mode includes: S100, calculating the number of beam pulses with at least two different pulse widths, the total beam pulse time, and the beam pulse frequency in a beam control system; S200, sending the beam frequency to the beam generating system, and sending the pulse widths of at least two beam pulses with different pulse widths and the dose rate of the multi-pulse control mode pre-set in the beam control system to the beam generating system; and sending the specification of the currently used source pre-set in the beam control system to the beam sampling controller in the beam monitoring system; S300, the beam sampling controller determines whether the actual beam dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output a level control signal for adjusting the pulse width to the beam generating system according to the determination result; The at least two beam pulses with different pulse widths include at least a first beam pulse and a second beam pulse; The pulse widths of the at least two beam pulses with different pulse widths include: The pulse width of the first beam pulse is a first preset pulse width, the pulse width of the second beam pulse is a second preset pulse width, and the first preset pulse width is greater than the second preset pulse width; The step of calculating the number of beam pulses with at least two different pulse widths, the total beam pulse time, and the beam pulse frequency in the beam control system includes: The number D of the first beam pulse and the second beam pulse is calculated by using a beam stop dose threshold of a multi-pulse control mode preset in a beam control system; The total beam time T of the first beam pulse and the second beam pulse is calculated by using the beam stop dose threshold and dose rate of the multi-pulse control mode pre-set in the beam control system. The specific calculation formula is as follows: T = DoseSET / DoseRate; Wherein, DoseSET is the beam stop dose threshold of the multi-pulse control mode set in the beam control system, and DoseRate is the dose rate of the multi-pulse control mode set in the beam control system; The calculation formula of the beam frequency F is: F=D / T; The method of calculating the number D of the first beam pulse and the second beam pulse by using the beam stop dose threshold of the multi-pulse control mode preset in the beam control system includes: Selecting a single pulse dose Dose1 of the first beam pulse and a single pulse dose Dose2 of the second beam pulse under the specifications of the applicator currently used; The number of beams is calculated by using the beam stop dose threshold of the multi-pulse control mode preset in the beam control system and the single pulse dose Dose1 of the first beam pulse and the single pulse dose Dose2 of the second beam pulse. The specific calculation method is as follows: DoseSET / Dose1=X...DoseRemain1; DoseRemain1 / Dose2=Y...DoseRemain2; The number of beams D is: D=X+Y+1; Wherein, DoseSET is the stop dose threshold of the multi-pulse control mode set in the beam control system, X is the number of the first beam pulses, Y is the number of the second beam pulses, DoseRemain1 is the remaining dose after the number of the first beam pulses is calculated by the stop dose threshold of the multi-pulse control mode, and DoseRemain2 is the remaining dose after the number of the second beam pulses is calculated by DoseRemain1.

2. The FLASH radiotherapy dose control method according to claim 1, characterized in that: The S300 further includes: The beam stop dose threshold value of the multi-pulse control mode pre-set in the beam control system and the beam stop time threshold value obtained by calculation are sent to the beam sampling controller in the beam monitoring system to judge whether the actual beam output dose is greater than or equal to the beam stop dose threshold value of the multi-pulse control mode. At the same time, the beam sampling controller judges whether the actual beam output time is greater than or equal to the beam stop time threshold value, and determines whether to output a level control signal for stopping beam output to the beam generating system according to the judgment result.

3. The FLASH radiotherapy dose control method according to claim 1, characterized in that: The single pulse dose Dose2 of the second beam pulse is controlled within a first preset threshold, so that the error between the actual beam-out dose and the beam-off dose threshold of the multi-pulse control mode is smaller than the first preset threshold.

4. The FLASH radiotherapy dose control method according to claim 1, characterized in that: The pulse conversion dose threshold is calculated by the single pulse dose Dose1 of the first beam pulse and the number X of the first beam pulse. The specific calculation method is as follows: DoseSET1=X*Dose1; Wherein, DoseSET1 is the pulse conversion dose threshold.

5. The FLASH radiotherapy dose control method according to claim 1, characterized in that: The method of sending the beam stop dose threshold value of the multi-pulse control mode pre-set in the beam control system and the beam stop time threshold value obtained by calculation to the beam sampling controller in the beam monitoring system includes: The beam stop time threshold is calculated by the total beam time T of the first beam pulse and the second beam pulse and the preset time margin T0. The specific calculation method is as follows: T1=T+T0; Wherein, T1 is the beam-off time threshold.

6. The FLASH radiotherapy dose control method according to claim 1, characterized in that: The beam sampling controller determines whether the actual beam dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output a level control signal for adjusting the pulse width to the beam generation system according to the determination result, including: If the actual beam dose is greater than or equal to the pulse conversion dose threshold, the beam sampling controller outputs a level control signal for adjusting the pulse width to the beam generating system within a first preset time, and the beam generating system adjusts the pulse width within the first preset time; If the actual beam-emitting dose is less than the pulse conversion dose threshold, the beam sampling controller does not output a level control signal for adjusting the pulse width to the beam generating system.

7. The FLASH radiotherapy dose control method according to claim 6, characterized in that: The beam sampling controller determines whether the actual beam dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output a level control signal for adjusting the pulse width to the beam generating system according to the determination result, and further includes: The beam sampling controller performs analog-to-digital conversion on the electrical signal collected by the beam detector in the beam monitoring system to obtain a value of the corresponding electrical signal; Obtain the corresponding calibration coefficient according to the specifications of the applicator currently in use, and calculate the actual beam dose according to the value of the corresponding electrical signal and the calibration coefficient; The calibration coefficient is used to calibrate the corresponding relationship between the value of the electrical signal collected by the beam detector and the actual beam dose value.

8. The FLASH radiotherapy dose control method according to claim 2, characterized in that: The step of determining whether to output a level control signal for stopping beam generation to the beam generation system according to the judgment result comprises: If the actual beam dose is greater than or equal to the beam stop dose threshold of the multi-pulse control mode, or the actual beam emission time is greater than or equal to the beam stop time threshold, the beam sampling controller outputs a level control signal for stopping beam emission to the beam generating system within a first preset time, and the beam generating system closes the beam emission enable port within the first preset time to stop beam emission; If the actual beam dose is less than the beam stop dose threshold of the multi-pulse control mode, and the actual beam time is less than the beam stop time threshold, the beam sampling controller does not output a level control signal for stopping beam emission to the beam generating system.

9. The FLASH radiotherapy dose control method according to claim 1, characterized in that: The FLASH radiotherapy dose control method also includes a single pulse control mode, in which a fixed pulse width is used for dose output, and the single pulse control mode includes: S1000, calculating the number of beam pulses with a fixed pulse width, the total beam pulse time, and the beam pulse frequency in a beam control system; S2000, sending the beam frequency to the beam generating system, and sending the fixed pulse width and the dose rate of the single pulse control mode preset in the beam control system to the beam generating system; and sending the specification of the currently used source device preset in the beam control system to the beam sampling controller in the beam monitoring system; S3000, the beam sampling controller determines whether the actual beam emission dose is greater than or equal to the beam stop dose threshold of the single pulse control mode. At the same time, the beam sampling controller determines whether the actual beam emission time is greater than or equal to the beam stop time threshold, and determines whether to output a level control signal for stopping fixed pulse beam emission to the beam generating system based on the judgment result.

10. The FLASH radiotherapy dose control method according to claim 9, characterized in that: The method of determining whether to output a level control signal for stopping the fixed pulse beam to the beam generating system according to the judgment result comprises: If the actual beam dose is greater than or equal to the beam stop dose threshold of the single pulse control mode, or the actual beam emission time is greater than or equal to the beam stop time threshold, the beam sampling controller outputs a level control signal for stopping fixed pulse beam emission to the beam generating system within a first preset time, and the beam generating system closes the beam emission enable port within the first preset time to stop beam emission; If the actual beam dose is less than the beam stop dose threshold of the single pulse control mode, and the actual beam time is less than the beam stop time threshold, the beam sampling controller does not output a level control signal for stopping fixed pulse beam emission to the beam generation system.

11. A FLASH radiotherapy device, characterized in that: The FLASH radiotherapy dose control method according to any one of claims 1 to 10 comprises: A beam control system (100): the beam control system comprises a human-computer interaction interface and a controller, the beam control system is used to calculate the number of beam pulses with at least two different pulse widths, the total beam time, and the beam frequency of the beam pulses, and send the beam frequency to the beam generation system within a first preset time, and send the preset pulse widths of the beam pulses with at least two different pulse widths and the dose rate of the multi-pulse control mode to the beam generation system, and send the preset beam stop dose threshold of the multi-pulse control mode, the specification of the source currently in use, and the pulse conversion dose threshold and beam stop time threshold obtained by calculation to the beam sampling controller in the beam monitoring system; A beam generating system (200): the beam generating system comprises a gun power supply, a klystron power supply, a microwave excitation source, a klystron, and an accelerating tube, and the beam generating system is used to receive and complete instructions issued by the beam control system and the beam monitoring system within a first preset time; A beam monitoring system (300): the beam monitoring system comprises a beam detector and a beam sampling controller, the beam monitoring system is used to judge whether the actual beam dose is greater than or equal to a pulse conversion dose threshold, and to judge whether to output a level control signal for adjusting the pulse width to a beam generating system according to the judgment result, and then to judge whether the actual beam dose is greater than or equal to a beam stop dose threshold of a multi-pulse control mode, and at the same time, to judge whether the actual beam time is greater than or equal to a beam stop time threshold, and to judge whether to output a level control signal for stopping beam emission to the beam generating system according to the judgment result.

12. An electronic device, characterized in that: include: Memory; and a processor, wherein the memory stores computer-readable instructions, and when the computer-readable instructions are executed by the processor, the FLASH radiotherapy dose control method according to any one of claims 1 to 10 is implemented.

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