A battery cell precursor supply device and method
By designing a cell pioneer supply device that can convert between atomic layer deposition and chemical vapor deposition methods, the problem of low production efficiency in the prior art is solved, and high precision and rapid deposition of the alumina layer on the cell is achieved.
Patent Information
- Application Number
- CN202411570558.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-06
- Publication Date
- 2025-03-07
- Estimated Expiration
- 2044-11-06
AI Technical Summary
The existing battery back passivation production device can only meet a single deposition method, and cannot achieve high-precision and rapid passivation layer deposition at the same time, resulting in low production efficiency.
A cell precursor supply device is designed to inject the first precursor and the second precursor through the through holes and the gas supply assembly on the substrate, and the conversion between atomic layer deposition and chemical vapor deposition modes is realized by opening and closing of the distribution assembly.
High precision and rapid deposition of alumina layer on the cell is achieved, production efficiency is improved, and the needs of high precision and rapid deposition are met at the same time.
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Figure CN119069334B_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of battery manufacturing, and in particular to a battery sheet precursor supply device and method thereof. Background Art
[0002] In the production process of solar cells, back passivation is required. The passivation material forms a passivation layer on the surface of the cell, which helps to reduce the carrier recombination on the surface of the cell, thereby improving the minority carrier life of the cell and the overall performance of the battery. The passivation layer has high chemical stability and good insulation properties, which can effectively block the contact between the carrier and the silicon wafer surface and reduce the surface recombination loss. The passivation layer on the cell is currently passivated by ALD and CVD. ALD, which stands for Atomic Layer Deposition, is a precise thin film deposition technology that accurately deposits the required materials layer by layer on the solid surface to form a thin film with precise controllable thickness and extremely high uniformity. CVD, which stands for Chemical Vapor Deposition, is a commonly used material synthesis method. Gases containing pre-deposited elements or compounds can be introduced into the reaction chamber. Under appropriate temperature, pressure and catalyst conditions, these gases undergo chemical reactions and are deposited on the substrate surface to form a solid film.
[0003] Atomic layer deposition and chemical vapor deposition are used for back passivation of battery cells. Due to the different deposition principles of atomic layer deposition and chemical vapor deposition, back passivation of battery cells mostly adopts a single deposition method. At present, when supplying precursors, battery cell deposition devices can only meet one of the atomic layer deposition method or chemical vapor deposition method. Among them, a single deposition method cannot simultaneously meet the requirements of high-precision deposition of the battery cell passivation layer and rapid deposition of the battery cell passivation layer to the required thickness, that is, it is impossible to shorten the deposition time while ensuring high-precision deposition on the battery cell, and the production efficiency is low. Summary of the invention
[0004] The purpose of the present invention is to provide a cell precursor supply device and method thereof, which can meet the requirements of high-precision deposition of cell passivation layer while shortening the cell back passivation time, thus solving the problem of low production efficiency of ordinary cell back passivation.
[0005] To achieve the above-mentioned purpose, in a first aspect, the present invention provides a precursor supply device for a battery cell, comprising: a base component, comprising a substrate, the substrate being provided with through holes for circulating gas; a gas supply component, mounted on the substrate, the gas supply component being used to supply precursors, the precursors comprising a first precursor and a second precursor; a first distribution component, mounted on the bottom end surface of the substrate, the first distribution component being connected to the gas outlet end of the gas supply component, the first distribution component being used to spray the first precursor; a second distribution component, mounted on the bottom end surface of the substrate, the second distribution component being connected to the gas outlet end of the gas supply component, the second distribution component being used to spray the second precursor; in a working state, the first distribution component and the second distribution component are partially opened so that the first precursor and the second precursor sprayed therefrom are not in contact, so as to form a passivation layer on the battery cell by atomic layer deposition, and then the first distribution component and the second distribution component are fully opened so that the first precursor and the second precursor sprayed therefrom are in contact, so as to form a passivation layer on the battery cell by chemical vapor deposition.
[0006] In the present invention, the first distribution component and the second distribution component are partially opened, there is a spatial gap between the distribution area of the first precursor and the distribution area of the second precursor, the first precursor and the second precursor are partitioned and covered on the battery cell, and the battery cell combines the first precursor with the second precursor when moving to form a multi-layer high-precision and dense atomic layer deposited aluminum oxide layer, and then the first distribution component and the second distribution component are fully opened, the first precursor and the second precursor are in contact in the air, and are quickly deposited to form a chemical vapor deposition aluminum oxide layer, and the aluminum oxide layer reaches the required thickness, realizing the conversion between the atomic layer deposition method and the chemical vapor deposition method, so that the aluminum oxide layer on the battery cell can simultaneously meet the requirements of high precision and rapid deposition, thereby improving production efficiency.
[0007] In some embodiments, the first distribution component and the second distribution component both include a distribution part and a plurality of injection parts; the distribution part of the first distribution component and the distribution part of the second distribution component are both connected to the gas supply component for conveying the precursor; the injection part connects the distribution part of the first distribution component and the distribution part of the second distribution component for injecting the precursor; the plurality of injection parts of the first distribution component and the plurality of injection parts of the second distribution component are arranged at intervals and arranged on the same horizontal plane. The beneficial effect is that the injection distance of the first precursor and the second precursor is ensured to be the same as that of the battery sheet at the bottom, and the injection distribution range of the first precursor and the second precursor is ensured to be the same, thereby better controlling the distribution range of the first precursor and the second precursor.
[0008] In some embodiments, the distribution member includes a distribution rod; a plurality of connection holes are arranged on the distribution rod, the air inlet end of the distribution rod is connected to the air supply assembly, the connection hole is connected to the injection member, and the distribution rod is used to transport the precursor and introduce a plurality of the injection members. The beneficial effect is that a plurality of injection members quickly introduce the corresponding first precursor and second precursor through the distribution rod, and the first precursor and the second precursor are injected synchronously in multiple stages through the plurality of injection members.
[0009] In some embodiments, the cross section of the distribution rod is square, and the plurality of connection holes on the distribution rod are arranged at equal intervals, and the connection holes are used to connect the injection member accordingly. The beneficial effect is that the distribution rod with a square cross section is easy to match and fit on the bottom end surface of the substrate, and the plurality of connection holes at equal intervals on the distribution rod are connected to the injection member, so that the first precursor distribution area and the second precursor distribution area sprayed by the injection member are distributed at equal intervals, and the spatial spacing distance between the first precursor distribution area and the second precursor distribution area is better controlled.
[0010] In some embodiments, the injection member includes a crossbar, a valve body, a bottom plate and an injection plate; the crossbar is used to transport the precursor; one end of the valve body is connected to the air inlet end of the crossbar, and the other end is connected to the connecting hole to cut off or flow the precursor; the bottom plate is connected to the air outlet end of the crossbar, and a groove is provided on the bottom plate for circulating gas; the injection plate is arranged between the air outlet end of the crossbar and the bottom plate, and a plurality of injection holes are arranged on the injection plate, and the injection holes correspond to the grooves to inject the precursor. The beneficial effect is that the first precursor and the second precursor are passed into the crossbar, and the valve body controls the cutoff or flow to control the injection state of the current crossbar, thereby realizing the conversion of different deposition modes.
[0011] In some embodiments, a plurality of the injection holes are arranged in the middle of the injection plate and arranged on the same straight line to inject the precursor on the same straight line. The beneficial effect is that the plurality of injection holes are arranged in the middle of the injection plate and arranged on the same straight line, which can better locate the injection position of the injection plate.
[0012] In some embodiments, the diameter of the outlet portion of the injection hole increases gradually and is conical, so that the distribution area of the injection precursor is conical. The beneficial effect is that the precursor injected from the conical outlet portion of the injection hole is a conical area, which better controls the distribution range of the precursor and makes the gas distribution more uniform.
[0013] In some embodiments, the gas supply assembly includes a gas distribution plate, a first pipeline and a second pipeline; the gas distribution plate is mounted on the top surface of the substrate, and the gas distribution plate connects the first pipeline and the second pipeline to distribute the first precursor and the second precursor; the gas outlet end of the first pipeline is connected to the distribution rod of the first distribution assembly to transport the first precursor; the gas outlet end of the second pipeline is connected to the distribution rod of the second distribution assembly to transport the second precursor. The beneficial effect is that the first pipeline and the second pipeline respectively guide the first precursor and the second precursor to one end of the distribution rod, and distribute them through the hollow cavity inside the distribution rod to supply multiple injection parts.
[0014] In some embodiments, a top plate is installed on the top surface of the substrate, and the top plate covers the through-hole distribution area on the substrate and divides the top space of the substrate into a plurality of channels so that the precursors can flow in the channels. The beneficial effect is that a stronger negative pressure environment is formed through the multiple flow channels on the top plate, so that the first precursor and the second precursor can be quickly and centrally discharged through the through-holes on the substrate, thereby improving the discharge efficiency of the first precursor and the second precursor.
[0015] In a second aspect, an embodiment of the present invention provides a cell precursor supply method, which is applied to a cell precursor supply device, and the cell precursor supply method comprises: the gas supply component introduces the first precursor into a first distribution component, and introduces the second precursor into a second distribution component; partially opening the first distribution component and the second distribution component so that the first precursor and the second precursor distributed therein are not in contact, so as to form a passivation layer on the cell by atomic layer deposition; and then fully opening the first distribution component and the second distribution component so that the first precursor and the second precursor distributed therein are in contact, so as to form a passivation layer on the cell by chemical vapor deposition. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] Figure 1 A schematic diagram of the three-dimensional structure of a battery cell precursor supply device is provided for the present invention;
[0017] Figure 2 A bottom view of a cell precursor supply device is provided for the present invention;
[0018] Figure 3 A schematic diagram of the explosion structure of a battery cell precursor supply device is provided for the present invention;
[0019] Figure 4 A schematic diagram of the explosion structure of the injection member of the battery cell precursor supply device is provided for the present invention;
[0020] Figure 5 A schematic diagram of a first use state of a cell precursor supply device is provided for the present invention;
[0021] Figure 6 A schematic diagram of a second use state of a cell precursor supply device is provided for the present invention;
[0022] Figure 7 A schematic diagram of the injection state of the injection hole of the battery cell precursor supply device is provided for the present invention;
[0023] Figure 8 Schematic diagram of the infinite space submerged turbulent jet model. DETAILED DESCRIPTION
[0024] In order to make the purpose, technical scheme and advantages of the present invention clearer, the technical scheme in the embodiment of the present application will be clearly and completely described below in conjunction with the drawings in the embodiment of the present invention. Obviously, the described embodiment is only a part of the embodiment of the present application, not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.
[0025] It should be noted that all directional indications (such as up, down, left, right, front, back, etc.) in the embodiments of the present application are only used to explain the relative position relationship, movement status, etc. between the components under a certain specific posture (as shown in the accompanying drawings). If the specific posture changes, the directional indication will also change accordingly.
[0026] In this application, unless otherwise clearly specified and limited, the terms "connection", "fixation", etc. should be understood in a broad sense. For example, "fixation" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
[0027] In addition, if there are descriptions involving "first", "second", etc. in the embodiments of the present application, the descriptions of "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In addition, the meaning of "and / or" appearing in the full text includes three parallel schemes. Taking "A and / or B" as an example, it includes scheme A, or scheme B, or a scheme that satisfies both A and B. In addition, the technical solutions between the various embodiments can be combined with each other, but it must be based on the ability of ordinary technicians in the field to implement. When the combination of technical solutions is contradictory or cannot be implemented, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection required by this application.
[0028] At present, when supplying precursors, the cell deposition device can only satisfy one of the atomic layer deposition method or the chemical vapor deposition method. Among them, a single deposition method cannot simultaneously satisfy the high-precision deposition of the cell passivation layer and the rapid deposition of the cell passivation layer to the required thickness, that is, it cannot guarantee the short deposition time while ensuring high-precision deposition on the cell, and the production efficiency is low.
[0029] In view of the above problems, the embodiments of the present invention provide the following technical solutions to overcome the above problems.
[0030] Figure 1 A three-dimensional structural schematic diagram of a battery cell precursor supply device is provided for the present invention. Figure 2 A bottom view of a cell precursor supply device is provided for the present invention. Figure 3 A schematic diagram of the explosion structure of a battery cell precursor supply device is provided for the present invention. Figure 4 A schematic diagram of the explosion structure of the injection component of the battery cell precursor supply device is provided for the present invention. Figure 5 A schematic diagram of a first use state of a cell precursor supply device is provided for the present invention (the first use state is deposition by atomic layer deposition). Figure 6 A schematic diagram of a second use state of a cell precursor supply device is provided for the present invention (the second use state is deposition by chemical vapor deposition). Figure 7 A schematic diagram of the injection state of the injection hole of the battery cell precursor supply device is provided for the present invention. Figure 8 Schematic diagram of the infinite space submerged turbulent jet model.
[0031] like Figure 1-Figure 7As shown, in a specific embodiment of the present invention, a precursor supply device for a cell comprises: a base component 1, comprising a substrate 101, wherein the substrate 101 is provided with a through hole 102 for circulating gas; a gas supply component 2, mounted on the substrate 101, wherein the gas supply component 2 is used to supply a precursor, wherein the precursor comprises a first precursor and a second precursor; a first distribution component 3, which is mounted on the bottom end surface of the substrate 101, wherein the first distribution component 3 is connected to the gas outlet end of the gas supply component 2, wherein the first distribution component 3 is used to spray the first precursor; a second distribution component 4, which is mounted on the substrate 101, wherein the first distribution component 3 is connected to the gas outlet end of the gas supply component 2, wherein the first distribution component 3 is used to spray the first precursor; and The bottom surface of the plate 101, the second distribution component 4 is connected to the gas outlet end of the gas supply component 2, and the second distribution component 4 is used to spray the second precursor; in the working state, the first distribution component 3 and the second distribution component 4 are partially opened so that the first precursor and the second precursor sprayed therefrom are not in contact, and are used to form a passivation layer on the battery cell by atomic layer deposition, and then the first distribution component 3 and the second distribution component 4 are fully opened so that the first precursor and the second precursor sprayed therefrom are in contact, and are used to form a passivation layer on the battery cell by chemical vapor deposition.
[0032] Specifically, the substrate 101 in the base component 1 provides a connection base for each component of the device, and a connection hole is opened at the edge of the substrate 101. The connection hole on the substrate 101 is connected to the cell passivation device with bolts. When the passivation layer is formed by atomic layer deposition, the through hole 102 on the substrate 101 is used to timely guide out the first precursor and the second precursor, wherein the first precursor is an inert gas carrying trimethylaluminum (TMA), and the second precursor is an inert gas carrying water vapor, so as to avoid the first precursor and the second precursor from combining to form aluminum oxide, which affects the quality of the atomic layer deposition aluminum oxide layer on the cell, and in the later stage of the formation of the aluminum oxide passivation layer on the cell by chemical vapor deposition, the through hole 102 is used to guide out the remaining gas. The gas supply component 2 introduces the first precursor and the second precursor into the first distribution component 3 and the second distribution component 4 respectively, wherein the first distribution component 3 sprays the first precursor, and the second distribution component 4 sprays the second precursor, and the first precursor and the second precursor both diffuse rapidly. In the working state, as Figure 5As shown, the first distribution component 3 and the second distribution component 4 are partially opened, and the spatial distance between the injection area of the first precursor and the injection area of the second precursor becomes larger, so that the first precursor and the second precursor injected by them do not contact each other, and the first precursor atomic layer is formed on the battery cell located below the first precursor. The battery cell moves back and forth, and the battery cell moves below the second precursor. The first precursor of the atomic layer is combined with the second precursor to form a multi-layer atomic layer of aluminum oxide layer, that is, a passivation layer is formed on the battery cell by atomic layer deposition. Figure 6 As shown, the first distribution component 3 and the second distribution component 4 are fully opened to allow the first precursor and the second precursor sprayed therefrom to contact each other, and the first precursor and the second precursor form aluminum oxide in the space on the upper end surface of the battery cell, and the aluminum oxide particles are deposited on the battery cell, that is, a passivation layer is formed on the battery cell by chemical vapor deposition.
[0033] In the present invention, the first distribution component 3 and the second distribution component 4 are partially opened, and there is a spatial gap between the distribution area of the first precursor and the distribution area of the second precursor. The first precursor and the second precursor are partitioned and covered on the battery cell. When the battery cell moves, the first precursor and the second precursor are combined to form a multi-layer high-precision and dense atomic layer deposited aluminum oxide layer. Then, the first distribution component 3 and the second distribution component 4 are fully opened, and the first precursor and the second precursor are in contact in the air and are quickly deposited to form a chemical vapor deposition aluminum oxide layer, and the aluminum oxide layer reaches the required thickness, realizing the conversion between the atomic layer deposition method and the chemical vapor deposition method, so that the aluminum oxide layer on the battery cell can meet both high-precision and fast deposition, thereby improving production efficiency.
[0034] In a specific embodiment of the present invention, Figure 1-Figure 3As shown, the first distribution component 3 and the second distribution component 4 both include distribution parts and a plurality of injection parts, wherein the distribution parts and injection parts in the first distribution component 3 and the second distribution component 4 have the same structure and function and are described as the same component; the distribution parts of the first distribution component 3 and the distribution parts of the second distribution component 4 are both connected to the air supply component 2 for conveying the precursor; the injection parts connect the distribution parts of the first distribution component 3 and the distribution parts of the second distribution component 4 for injecting the precursor; the plurality of injection parts of the first distribution component 3 and the plurality of injection parts of the second distribution component 4 are arranged at intervals and on the same horizontal plane. The distribution parts included in the first distribution component 3 and the second distribution component 4 distribute the first precursor and the second precursor, and then distribute the first precursor and the second precursor in the corresponding several injection parts through the distribution component, and inject the first precursor and the second precursor through the several injection parts to form the injection distribution area of the first precursor and the second precursor. The several injection parts in the first distribution component 3 and the several injection parts in the second distribution component 4 are arranged at intervals, so that the first precursor and the second precursor distribution area are distributed at intervals, and the contact and non-contact states of the first precursor and the second precursor are controlled by controlling the opening number of the several injection parts, and then the first precursor and the second precursor are injected by the injection parts. The feeding mode of the first precursor and the second precursor in the atomic layer deposition method and the chemical vapor deposition method is converted to realize atomic layer deposition or chemical vapor deposition. The several injection parts are arranged on the same plane to ensure that the injection distance of the first precursor and the second precursor is the same as that of the battery cell at the bottom, and at the same time ensure that the injection distribution range of the first precursor and the second precursor is the same, so as to better control the distribution range of the first precursor and the second precursor.
[0035] In a specific embodiment of the present invention, Figure 3 As shown, the distribution member includes a distribution rod 301; a plurality of connection holes are arranged on the distribution rod 301, the air inlet end of the distribution rod 301 is connected to the air supply component 2, and the connection hole is connected to the injection member, and the distribution rod 301 is used to transport the precursor and introduce a plurality of injection members. The hollow distribution rod 301 distributes the first precursor and the second precursor introduced by the air supply component 2, and enables the plurality of injection members connected to the distribution rod 301 of the first distribution component 3 to inject the first precursor, and the plurality of injection members connected to the distribution rod 301 of the second distribution component 4 to inject the second precursor, so that the plurality of injection members quickly introduce the corresponding first precursor and the second precursor through the distribution rod 301, and the plurality of injection members synchronously inject the first precursor and the second precursor in multiple stages.
[0036] In a specific embodiment of the present invention, Figure 3As shown, the cross section of the distribution rod 301 is square, and the plurality of connection holes on the distribution rod 301 are arranged at equal intervals, and the connection holes are used to connect the injection member accordingly. The distribution rod 301 with a square cross section is convenient for matching and fitting to be connected to the bottom end surface of the substrate 101, so that the distribution rod 301 is stably connected to the bottom end surface of the substrate 101, and at the same time, the plurality of connection holes at equal intervals on the distribution rod 301 connect the injection member, so that the plurality of injection members are installed at equal intervals on the distribution rod 301, so that the first precursor distribution area and the second precursor distribution area injected by the injection member are distributed at equal intervals, and the spatial spacing distance between the first precursor distribution area and the second precursor distribution area is better controlled.
[0037] In a specific embodiment of the present invention, Figure 3 and Figure 4 As shown, the injection component includes a cross bar 302, a valve body 303, a bottom plate 304 and an injection plate 305; the cross bar 302 is used to transport the precursor; one end of the valve body 303 is connected to the air inlet end of the cross bar 302, and the other end is connected to the connecting hole to cut off or flow the precursor; the bottom plate 304 is connected to the air outlet end of the cross bar 302, and a groove is provided on the bottom plate 304 for circulating gas; the injection plate 305 is arranged between the air outlet end of the cross bar 302 and the bottom plate 304, and a plurality of injection holes 306 are arranged on the injection plate 305, and the injection holes 306 correspond to the grooves to inject the precursor. The gas outlet end of the crossbar 302 is connected to the bottom plate 304, and the bottom plate 304 is used to limit the installation of the injection plate 305. The injection holes 306 on the injection plate 305 are arranged corresponding to the grooves on the bottom plate 304 to avoid obstructing the injection of the injection holes, and the bottom plate 304 is bolted to the crossbar 302 to facilitate the installation and disassembly of the bottom plate 304 and the injection plate 305. Several injection holes 306 on the injection plate 305 are used to spray the first precursor and the second precursor, and form several adjacent injection areas for covering the battery cell with spray treatment, wherein the first precursor and the second precursor are passed into the crossbar 302, and the valve body 303 is used to control the cutoff or circulation to control the current injection state of the crossbar 302, thereby realizing the conversion of different deposition modes. The valve body 303 is one or more of a solenoid valve, an electric valve, etc., which can automatically control the opening and closing.
[0038] Further, such as Figure 4 As shown, an annular sealing groove is provided on the gas outlet end of the cross bar 302 and the bottom plate 304, and a sealing ring is embedded and installed in the sealing groove of the cross bar 302 and the sealing groove of the bottom plate 304. The cross bar 302 and the bottom plate 304 are both embedded and installed with the sealing ring through the annular sealing groove. After the injection plate 305 is limitedly installed, the cross bar 302, the injection plate 305 and the bottom plate 304 are all sealed and connected to avoid gas leakage, and the overall sealing performance is good.
[0039] In a specific embodiment of the present invention, Figure 4 As shown, a plurality of the injection holes 306 are arranged in the middle of the injection plate 305 and are arranged in the same straight line to inject the precursor in the same straight line. A plurality of injection holes 306 are arranged in the middle of the injection plate 305 and are arranged in the same straight line, which can better locate the injection position of the injection plate 305 and allow the precursor to be injected in the same straight line to better control the injection distribution range.
[0040] In a specific embodiment of the present invention, Figure 7 As shown, the diameter of the outlet portion of the injection hole 306 increases gradually, and it is conical, so that the distribution area of the injection precursor is conical. The diameter of the outlet portion of the injection hole 306 increases gradually along the gas ejection direction, and a conical injection space is formed at the outlet end of the injection hole 306. The precursor ejected from the conical outlet portion of the injection hole 306 is a conical area, which better controls the distribution range of the precursor. The specific principle is as follows;
[0041] The precursor in the injection hole 306 has a certain pressure and is injected into the lower end space, that is, the gas is injected into a limited space, such as Figure 7 As shown, the injection stage is divided into a jet section, a vortex section and a free expansion section, wherein the jet section is to contact the first precursor and the second precursor with the solar panel, and the gas in the vortex section and the free expansion section is absorbed, which does not affect the injection state of the gas. The jet section is similar to the infinite space submerged turbulent jet model. The infinite space submerged turbulent jet model is now used to analyze the jet section of the gas injection in a finite space, and an infinite space submerged turbulent jet model is established. With the injection hole 306 vertical section and the injection pole of the gas in the injection hole 306 as point O, the following can be established: Figure 8 The coordinate system shown; the jet core velocity is , half of the angle between the outer boundary of the jet is , the radius of the jet section is R, and the distance from the radius of the jet section to the extreme point is X, the relationship between the jet radius:
[0042] The radius R of the jet cross section is proportional to the distance X from the cross section to the extreme point O;
[0043] ;
[0044] For circular cross section: K=3.4
[0045] According to the geometric relationship ; is the turbulence coefficient;
[0046]
[0047]
[0048] When the turbulence coefficient remains unchanged, the jet cross-sectional radius R is proportional to the distance Related, that is, the jet area and distance Related;
[0049] Where s is the distance from the outlet to the cross section;
[0050] is the exit radius;
[0051] is the distance from the pole to the cross section;
[0052] By analogy with the jet section in a finite space and using the infinite space submerged turbulent jet model, it can be obtained that, when the outlet velocity in the injection hole 306 is constant, the range of the injection during the injection stage is related to the distance between the injection hole 306 and the battery cell. By controlling the distance between the injection hole 306 and the battery cell, the distribution range of the first precursor and the distribution range of the second precursor can be controlled.
[0053] In a specific embodiment of the present invention, Figure 3 As shown, the gas supply component 2 includes a gas distribution plate 201, a first pipeline 203 and a second pipeline 202; the gas distribution plate 201 is installed on the top surface of the substrate 101, and the gas distribution plate 201 connects the first pipeline 203 and the second pipeline 202 to distribute the first precursor and the second precursor; the gas outlet end of the first pipeline 203 is connected to the distribution rod 301 of the first distribution component 3 to transport the first precursor; the gas outlet end of the second pipeline 202 is connected to the distribution rod 301 of the second distribution component 4 to transport the second precursor. Specifically, the gas distribution plate 201 is connected to the first precursor and the second precursor input pipeline, and the gas distribution plate 201 distributes the first precursor and the second precursor to the corresponding first pipeline 203 and the second pipeline 202. The first pipeline 203 and the second pipeline 202 are connected to one end of the distribution rod 301 (not shown in the figure). The first pipeline 203 and the second pipeline 202 respectively introduce the first precursor and the second precursor into one end of the distribution rod 301, and distribute them through the hollow cavity inside the distribution rod 301 to supply the first precursor and the second precursor to multiple injection parts.
[0054] Further, such as Figure 3As shown, two groups of first pipes 203 and second pipes 202 are connected to the gas distribution plate 201 and are connected to the two ends of the distribution rod 301. The two groups of first pipes 203 and second pipes 202 introduce the first precursor and the second precursor simultaneously through the two ends of the distribution rod 301, so that the first precursor and the second precursor can be distributed more quickly in the distribution rod 301, while reducing the loss of internal pressure of the rod-shaped distribution rod 301, thereby reducing the pressure difference between several injection parts on the distribution rod 301, and ensuring that the distribution area of the first precursor and the distribution area of the second precursor are sprayed uniformly.
[0055] In a specific embodiment of the present invention, a top plate is installed on the top surface of the substrate 101, and the top plate covers the distribution area of the through holes 102 on the substrate 101, and divides the top space of the substrate 101 into a plurality of channels, so that the precursors can flow in the channels. The top plate installed on the upper end of the substrate 101 divides its upper end area into a plurality of circulation channels, and when the excess first precursor and the second precursor are exported, a stronger negative pressure environment is formed through the plurality of circulation channels on the top plate, so that the first precursor and the second precursor can be quickly and centrally exported through the through holes 102 on the substrate 101, thereby improving the efficiency of exporting the first precursor and the second precursor.
[0056] A cell precursor supply method is applied to a cell precursor supply device, the cell precursor supply method comprising: the gas supply component 2 introduces the first precursor into the first distribution component 3, and introduces the second precursor into the second distribution component 4; partially opening the first distribution component 3 and the second distribution component 4 so that the first precursor and the second precursor distributed therein are not in contact, so as to form a passivation layer on the cell by atomic layer deposition; fully opening the first distribution component 3 and the second distribution component 4 so that the first precursor and the second precursor distributed therein are in contact, so as to form a passivation layer on the cell by chemical vapor deposition.
[0057] Specifically, a reciprocating battery cell is placed at the bottom of the base component 1, and an exhaust device is provided on the base component 1 to form a negative pressure on the top surface of the base component 1; the first precursor and the second precursor in the precursor are pressurized and introduced into the gas supply component 2; the gas supply component 2 introduces the first precursor into the first distribution component 3, and introduces the second precursor into the second distribution component 4;
[0058] The first distribution component 3 is partially opened to spray the first precursor, the second distribution component 4 is partially opened to spray the second precursor, the first precursor diffusion region is not in contact with the second precursor diffusion region, so that the cell is covered with the first precursor at the atomic layer level, and the cell moves back and forth so that the first precursor and the second precursor meet and form an atomic layer deposited aluminum oxide layer; the excess first and second precursors after spraying to the cell pass through the through hole 102 and are guided out by the exhaust device; a multi-layer atomic layer deposited aluminum oxide layer is formed on the reciprocating cell;
[0059] The first distribution components 3 are all opened to spray the first precursor, the second distribution components 4 are all opened to spray the second precursor, the first precursor diffusion area overlaps with the second precursor diffusion area, so that the first precursor and the second precursor meet and contact in the top area of the cell, the first precursor and the second precursor contact to form aluminum oxide particles and deposit on the atomic layer deposited aluminum oxide layer of the cell, and form an aluminum oxide layer by chemical vapor deposition, and a multi-layer aluminum oxide layer formed by chemical vapor deposition is formed on the reciprocating cell, and the required thickness is reached, the excess first precursor and the diffused second precursor pass through the through hole 102 on the substrate 101 and are discharged by the exhaust device, the cell passivation completes the cell back passivation operation, and the cell is removed for subsequent operations.
[0060] The above is only a specific implementation of the embodiment of the present application, but the protection scope of the embodiment of the present application is not limited thereto, and any changes or replacements within the technical scope disclosed in the embodiment of the present application should be included in the protection scope of the embodiment of the present application. Therefore, the protection scope of the embodiment of the present application should be based on the protection scope of the claims.
Claims
1. A method for supplying a precursor to a battery cell, characterized in that: Applicable to a battery cell precursor supply device, the battery cell precursor supply device comprises: The base assembly includes a substrate, wherein the substrate is provided with through holes for circulating gas; A gas supply component is installed on the substrate, and the gas supply component is used to supply precursors, and the precursors include a first precursor and a second precursor; A first distribution component is installed on the bottom end surface of the substrate, the first distribution component is connected to the gas outlet end of the gas supply component, and the first distribution component is used to spray the first precursor; A second distribution component is installed on the bottom end surface of the substrate, the second distribution component is connected to the gas outlet end of the gas supply component, and the second distribution component is used to spray the second precursor; The first distribution assembly and the second distribution assembly each include a distribution member and a plurality of injection members; The distribution member of the first distribution assembly and the distribution member of the second distribution assembly are both connected to the gas supply assembly for conveying the precursor; The injection member connects the distribution member of the first distribution assembly and the distribution member of the second distribution assembly, and is used to inject the precursor; The plurality of injection members of the first distribution assembly and the plurality of injection members of the second distribution assembly are arranged at intervals and on the same horizontal plane; The cell precursor supply method comprises: The gas supply assembly introduces the first precursor into the first distribution assembly, and introduces the second precursor into the second distribution assembly; The first distribution component and the second distribution component are opened, and the space distance between the injection area of the first precursor and the injection area of the second precursor becomes larger, so that the first precursor and the second precursor injected by them do not contact each other, and the first precursor atomic layer is formed on the battery cell located below the first precursor, and the battery cell moves back and forth, and the battery cell moves below the second precursor, and the first precursor of the atomic layer is combined with the second precursor to form a passivation layer on the battery cell by atomic layer deposition; The first distribution component and the second distribution component are then fully opened to allow the first precursor and the second precursor sprayed therefrom to contact each other, so as to form a passivation layer on the cell by chemical vapor deposition.
2. The cell precursor supply method according to claim 1, characterized in that: The distribution member includes a distribution rod; The distribution rod is provided with a plurality of connection holes, the air inlet end of the distribution rod is connected to the air supply assembly, the connection holes are connected to the injection components, and the distribution rod is used to transport the precursor and introduce the plurality of injection components.
3. The method for supplying precursor to a cell according to claim 2, characterized in that: The cross section of the distribution rod is square, and a plurality of connection holes on the distribution rod are arranged at equal intervals, and the connection holes are used for correspondingly connecting to the injection members.
4. The cell precursor supply method according to claim 2 or 3, characterized in that: The injection member includes a crossbar, a valve body, a bottom plate and an injection plate; The crossbar is used to transport the precursor; One end of the valve body is connected to the air inlet end of the crossbar, and the other end is connected to the connecting hole, so as to cut off or flow the precursor; The bottom plate is connected to the gas outlet end of the cross bar, and a groove is provided on the bottom plate for gas circulation; The injection plate is arranged between the gas outlet end of the cross bar and the bottom plate, and a plurality of injection holes are arranged on the injection plate. The injection holes correspond to the grooves and are used for injecting the precursor.
5. The cell precursor supply method according to claim 4, characterized in that: A plurality of the injection holes are arranged in the middle of the injection plate and on the same straight line, so as to inject the precursor on the same straight line.
6. The cell precursor supply method according to claim 5, characterized in that: The diameter of the gas outlet portion of the injection hole increases gradually and is in a cone shape, so that the distribution area of the precursor injected therefrom is in a cone shape.
7. The cell precursor supply method according to claim 6, characterized in that: The gas supply assembly includes a gas distribution plate, a first pipeline and a second pipeline; The gas distributor is installed on the top surface of the substrate, and the gas distributor connects the first pipeline and the second pipeline to distribute the first precursor and the second precursor; The gas outlet end of the first pipeline is connected to the distribution rod of the first distribution assembly to transport the first precursor; The gas outlet end of the second pipeline is connected to the distribution rod of the second distribution assembly for conveying the second precursor.
8. The cell precursor supply method according to claim 1, characterized in that: A top plate is installed on the top surface of the substrate, and the top plate covers the through-hole distribution area on the substrate and divides the top space of the substrate into a plurality of channels so that the precursor can flow in the channels.
Citation Information
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