Manufacturing method of dimming glass

Through chemical etching method, the ITO film layer is etched using a strong acid solution in dimming glass, which solves the problems of large etch line width and poor visual effect caused by traditional laser etching methods, and achieves better visual effects and mass production advantages.

CN119126416AInactive Publication Date: 2024-12-13GUANGZHOU HUICHI IND DEV CO LTD
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Patent Information

Application Number
CN202410858445.7
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-06-28
Publication Date
2024-12-13
Estimated Expiration
Not applicable · inactive patent

AI Technical Summary

Technical Problem

Traditional laser etching methods have a large etch line width in dimming glass, resulting in poor visual effects and are not suitable for mass production.

Method used

The ITO film layer is etched using a strong acid solution by chemical etching method. The depth and thickness of the etching line are equal. The film layer is divided into independent areas through the etching line, and fixed by the liquid crystal mixed layer to form a dimming film, and then a composite sheet is stacked with the glass. .

Benefits of technology

The etching line is smooth and free of solution residue, and the width of the etching line can be less than 0.03mm, which improves visual effect and mass production efficiency and reduces costs.

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Abstract

The invention relates to a manufacturing method of dimming glass, which comprises the following steps: S1, plating a first ITO (Indium Tin Oxide) film layer on one side of a first substrate layer to form a first composite layer, and plating a second ITO film layer on one side of a second substrate layer to form a second composite layer; s2, etching an etching line on the first ITO film layer and / or the second ITO film layer through a chemical etching method, and dividing the first ITO film layer and / or the second ITO film layer into an etching area and a non-etching area through the etching line; s3, the etching areas and the non-etching areas of the first ITO film layer and the second ITO film layer are connected with electrodes respectively; s4, fixing the first ITO film layer and the second ITO film layer through a liquid crystal mixing layer to form a dimming film; s5, a first glass layer, the dimming film and a second glass layer are sequentially stacked for sheet combination, and the dimming glass is obtained. Compared with traditional laser etching, the method has the advantage of batch production of standard products.
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Description

Technical Field

[0001] The invention belongs to the technical field of dimming glass production and relates to a method for manufacturing dimming glass. Background Art

[0002] Smart glass is a type of glass that is atomized when not powered on and transparent when powered on. The main principle is that after power is turned on, the light transmittance of the conductive layer inside the smart glass changes from low transmittance to high transmittance. The smart glass can be quickly switched between transparent (on) and atomized (off) by turning power on and off. It is widely used in doors and windows, furniture, electrical appliances and other fields.

[0003] The demand for dimming glass is becoming more and more diversified. Many application scenarios require dimming glass to not only block some privacy, but also present certain visual effects. In order to present different visual effects, laser etching is usually used to etch different areas on the ITO film layer. After etching, adjacent areas are not conductive, and different areas are connected to different electrodes to achieve separate control of the on and off states of different areas. Traditional laser etching has the problems of wide etching lines, poor visual presentation, and inconvenience for mass production. Summary of the invention

[0004] In order to overcome the deficiencies of the prior art, the present invention provides a method for manufacturing dimming glass.

[0005] A method for manufacturing dimming glass comprises the following steps:

[0006] S1: coating a first ITO film layer on one side of a first substrate layer to form a first composite layer, and coating a second ITO film layer on one side of a second substrate layer to form a second composite layer;

[0007] S2: etching an etching line on the first ITO film layer and / or the second ITO film layer by a chemical etching method, dividing the first ITO film layer and / or the second ITO film layer into an etching area and a non-etching area by the etching line, wherein the etching area and the non-etching area are independent of each other, and the depth of the etching line is the thickness of the first ITO film layer and / or the second ITO film layer;

[0008] S3: connecting the etching area and the non-etching area of ​​the first ITO film layer and the second ITO film layer to electrodes respectively;

[0009] S4: fixing the first ITO film layer and the second ITO film layer via a liquid crystal mixing layer to form a dimming film;

[0010] S5: stacking the first glass layer, the dimming film and the second glass layer in sequence to obtain dimming glass.

[0011] As a preferred technical solution of the present invention, S2 includes: importing the pattern or number to be etched into the mathematical model of the chemical etcher to obtain a preset etching trajectory, placing the first composite layer and the second composite layer into the chemical etcher respectively, and driving the strong acid solution along the preset etching trajectory through the motion module in the chemical etcher. During the movement, the strong acid solution evenly drips onto the first ITO film layer and the second ITO film layer to etch an etching line.

[0012] As a preferred technical solution of the present invention, the strong acid solution is a hydrofluoric acid solution.

[0013] As a preferred technical solution of the present invention, the width of the etching line is 0.02 mm to 0.04 mm.

[0014] As a preferred technical solution of the present invention, in S2, when the first ITO film layer and the second ITO film layer are respectively etched with patterns or numbers, the patterns or numbers located on the first ITO film layer and the second ITO film layer are mirror-symmetrical.

[0015] As a preferred technical solution of the present invention, when the etching area of ​​the first ITO film layer and / or the second ITO film layer includes at least two independent sub-areas, two or more sub-areas located in the same film layer are respectively connected to the same electrode.

[0016] As a preferred technical solution of the present invention, S5 includes:

[0017] S51: bonding the first glass layer and the dimming film, and the dimming film and the second glass layer respectively by using films to form a glass composite layer;

[0018] S52: further fixing the glass composite layer by a silicone ring, and heat pumping at 60-70° C. until the vacuum pressure inside the glass reaches 9.0-10.0 MPa, maintaining for 40-50 minutes, and then removing the silicone ring;

[0019] S53: Raise the temperature to 65-75°C and keep warm for 40-50 minutes;

[0020] S54: Raise the temperature to 90-100°C and keep warm for 20-30 minutes;

[0021] S55: Heat to 110-120°C, keep warm for 50-60 minutes;

[0022] S56: Naturally cool to 40-45°C.

[0023] As a preferred technical solution of the present invention, the film is PVB film, EVA film, SGP film or TPU film.

[0024] As a preferred technical solution of the present invention, the edges of the first glass layer, the dimming film and the second glass layer overlap, and a receiving space is formed between the first glass layer and the dimming film and between the dimming film and the second glass layer, respectively, and the edge of the film is placed in the receiving space.

[0025] As a preferred technical solution of the present invention, the method further includes the following steps: taking out the processed dimming glass and performing an electrical inspection on the processed dimming glass.

[0026] Compared with the prior art, the present invention has the following beneficial effects:

[0027] The present invention adopts strong acid solution etching when etching the first ITO film layer and the second ITO film layer. The etching line is flat and smooth without solution residue. The width of the etching line can be less than 0.03 mm. Compared with traditional laser etching, it has better visual presentation effect and has the advantage of mass production of standard products, higher efficiency and lower cost. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 It is a diagram of the implementation steps of the present invention. DETAILED DESCRIPTION

[0029] In order to facilitate the understanding of the present invention, the present invention will be described more fully below with reference to the relevant drawings. Preferred embodiments of the present invention are provided in the drawings. However, the present invention can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the understanding of the disclosure of the present invention more thorough and comprehensive.

[0030] It should be noted that when an element is referred to as being "fixed to" another element, it may be directly on the other element or there may be a central element. When an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are for illustrative purposes only.

[0031] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art of the present invention. The terms used herein in the specification of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention. The term "and / or" used herein includes any and all combinations of one or more related listed items.

[0032] Embodiment 1: A method for manufacturing dimming glass, comprising the following steps:

[0033] S1: coating a first ITO film layer on one side of a first substrate layer to form a first composite layer, and coating a second ITO film layer on one side of a second substrate layer to form a second composite layer;

[0034] S2: Importing the pattern or number to be etched into the mathematical model of the chemical etcher to obtain a preset etching track, placing the first composite layer and the second composite layer into the chemical etcher respectively, and driving the strong acid solution to move along the preset etching track through the motion module in the chemical etcher, wherein the strong acid solution evenly drips onto the first ITO film layer and the second ITO film layer during the movement, and etches an etching line in the first ITO film layer and / or the second ITO film layer, and the first ITO film layer and / or the second ITO film layer are divided into an etching area and a non-etching area through the etching line, wherein the etching area is embedded in the non-etching area, the etching area and the non-etching area are independent of each other, the depth of the etching line is the thickness of the first ITO film layer and / or the second ITO film layer, and the width of the etching line is 0.02 mm;

[0035] S3: connecting electrodes to the etched areas and non-etched areas of the first ITO film layer and the second ITO film layer, respectively;

[0036] S4: fixing the first ITO film layer and the second ITO film layer through a liquid crystal mixing layer to form a dimming film;

[0037] S5: stacking the first glass layer, the dimming film and the second glass layer in sequence, and putting them into an autoclave to obtain the dimming glass; comprising:

[0038] S51: bonding the first glass layer and the dimming film, and the dimming film and the second glass layer respectively by using films to form a glass composite layer;

[0039] S52: The glass composite layer is further fixed by a silicone ring, and the vacuum pressure inside the glass is vacuumed at 70° C. until it reaches 10.0 MPa, and the silicone ring is removed after maintaining the pressure for 40 minutes;

[0040] S53: Raise the temperature to 75°C and keep warm for 50 minutes;

[0041] S54: Raise the temperature to 100°C and keep warm for 20 minutes;

[0042] S55: Heat to 120°C and keep warm for 50 minutes;

[0043] S56: Natural cooling to 40°C;

[0044] S6: When the pressure of the autoclave exhaust gauge is 0, the dimming glass in the autoclave is taken out, and the processed dimming glass is powered on for inspection.

[0045] Embodiment 2:

[0046] S1: coating a first ITO film layer on one side of a first substrate layer to form a first composite layer, and coating a second ITO film layer on one side of a second substrate layer to form a second composite layer;

[0047] S2: Importing the pattern or number to be etched into the mathematical model of the chemical etcher to obtain a preset etching track, placing the first composite layer and the second composite layer into the chemical etcher respectively, and driving the strong acid solution to move along the preset etching track through the motion module in the chemical etcher. The strong acid solution may be a hydrofluoric acid solution, and the hydrofluoric acid solution evenly drips onto the first ITO film layer and the second ITO film layer during the movement, and etches an etching line in the first ITO film layer and / or the second ITO film layer. The first ITO film layer and / or the second ITO film layer are divided into an etching area and a non-etching area through the etching line, and the etching area is embedded in the non-etching area. The etching area and the non-etching area are independent of each other, and the depth of the etching line is the thickness of the first ITO film layer and / or the second ITO film layer, and the width of the etching line is 0.04 mm;

[0048] S3: connecting electrodes to the etched areas and non-etched areas of the first ITO film layer and the second ITO film layer, respectively;

[0049] S4: fixing the first ITO film layer and the second ITO film layer through a liquid crystal mixing layer to form a dimming film;

[0050] S5: stacking the first glass layer, the dimming film and the second glass layer in sequence, and putting them into an autoclave to obtain the dimming glass; comprising:

[0051] S51: bonding the first glass layer and the dimming film, and the dimming film and the second glass layer respectively by using films to form a glass composite layer;

[0052] S52: The glass composite layer is further fixed by a silicone ring, and the vacuum pressure inside the glass is vacuumed at 60° C. until it reaches 9.0 MPa, and the silicone ring is removed after maintaining it for 50 minutes;

[0053] S53: Raise the temperature to 65°C and keep warm for 40 minutes;

[0054] S54: Raise the temperature to 90°C and keep warm for 30 minutes;

[0055] S55: Heat to 110°C and keep warm for 60 minutes;

[0056] S56: Natural cooling to 45°C;

[0057] S6: When the pressure of the autoclave exhaust gauge is 0, the dimming glass in the autoclave is taken out, and the processed dimming glass is powered on for inspection.

[0058] The dimming glasses prepared in Example 1 and Example 2 were subjected to etching line and other related tests, and the results are shown in Table 1: Table 1

[0059] The present invention adopts strong acid solution etching when etching the first ITO film layer and the second ITO film layer. The etching line is flat and smooth without solution residue. The width of the etching line can be less than 0.03 mm. Compared with traditional laser etching, it has better visual presentation effect and has the advantage of mass production of standard products, higher efficiency and lower cost.

[0060] In a preferred embodiment, in S2, when the first ITO film layer and the second ITO film layer are respectively etched with patterns or numbers, the patterns or numbers located on the first ITO film layer and the second ITO film layer are mirror-symmetrical.

[0061] In a preferred embodiment, when the etching area of ​​the first ITO film layer and / or the second ITO film layer contains at least two independent sub-areas, two or more sub-areas located in the same film layer are respectively connected to the same electrode, and the non-etching area is connected to another electrode, so that the dimming glass is controlled by the two electrodes.

[0062] In a preferred embodiment, the film is a PVB film, an EVA film, an SGP film or a TPU film.

[0063] In a preferred embodiment, the edges of the first glass layer, the dimming film, and the second glass layer overlap, and a storage space is formed between the first glass layer and the dimming film, and between the dimming film and the second glass layer, respectively, and the edge of the film is placed in the storage space. The edge of the film is at least 3 mm away from the edge of the first glass layer to prevent the softened film from overflowing from the storage space during the hot extraction and heating process.

[0064] The above descriptions are merely embodiments of the present invention and are not intended to limit the patent scope of the present invention. Any equivalent structure or equivalent process transformation made using the contents of the present invention specification and drawings, or directly or indirectly applied in other related technical fields, are also included in the patent protection scope of the present invention.

Claims

1. A method for manufacturing dimming glass, characterized in that: The following steps are involved: S1: coating a first ITO film layer on one side of a first substrate layer to form a first composite layer, and coating a second ITO film layer on one side of a second substrate layer to form a second composite layer; S2: etching an etching line on the first ITO film layer and / or the second ITO film layer by a chemical etching method, dividing the first ITO film layer and / or the second ITO film layer into an etching area and a non-etching area by the etching line, wherein the etching area and the non-etching area are independent of each other, and the depth of the etching line is the thickness of the first ITO film layer and / or the second ITO film layer; S3: connecting the etching area and the non-etching area of ​​the first ITO film layer and the second ITO film layer to electrodes respectively; S4: fixing the first ITO film layer and the second ITO film layer via a liquid crystal mixing layer to form a dimming film; S5: stacking the first glass layer, the dimming film and the second glass layer in sequence to obtain dimming glass.

2. The method for manufacturing dimming glass according to claim 1, characterized in that: S2 includes: The pattern or number to be etched is introduced into the mathematical model of the chemical etcher to obtain a preset etching track, the first composite layer and the second composite layer are respectively placed in the chemical etcher, and the strong acid solution is driven to move along the preset etching track by the motion module in the chemical etcher. During the movement, the strong acid solution evenly drips onto the first ITO film layer and the second ITO film layer to etch an etching line.

3. The method for manufacturing dimming glass according to claim 2, characterized in that: The strong acid solution is a hydrofluoric acid solution.

4. The method for manufacturing dimming glass according to claim 1, characterized in that: The width of the etching line is 0.02 mm to 0.04 mm.

5. The method for manufacturing dimming glass according to claim 1, characterized in that: In S2, when patterns or numbers are etched on the first ITO film layer and the second ITO film layer respectively, the patterns or numbers on the first ITO film layer and the second ITO film layer are mirror-symmetrical.

6. The method for manufacturing dimming glass according to claim 1, characterized in that: When the etching region of the first ITO film layer and / or the second ITO film layer includes at least two independent sub-regions, two or more sub-regions located in the same film layer are respectively connected to the same electrode.

7. The method for manufacturing dimming glass according to claim 1, characterized in that S5 include: S51: bonding the first glass layer and the dimming film, and the dimming film and the second glass layer respectively by using films to form a glass composite layer; S52: further fixing the glass composite layer by a silicone ring, and heat pumping at 60-70° C. until the vacuum pressure inside the glass reaches 9.0-10.0 MPa, maintaining for 40-50 minutes, and then removing the silicone ring; S53: Raise the temperature to 65-75°C and keep warm for 40-50 minutes; S54: Raise the temperature to 90-100°C and keep warm for 20-30 minutes; S55: Heat to 110-120°C, keep warm for 50-60 minutes; S56: Naturally cool to 40-45°C.

8. The method for manufacturing dimming glass according to claim 7, characterized in that: The film is a PVB film, an EVA film, an SGP film or a TPU film.

9. The method for manufacturing dimming glass according to claim 7, characterized in that: The edges of the first glass layer, the dimming film and the second glass layer overlap, and accommodation spaces are formed between the first glass layer and the dimming film, and between the dimming film and the second glass layer, respectively, and the edges of the film are placed in the accommodation spaces.

10. A method for manufacturing dimming glass according to any one of claims 1 to 9, characterized in that: The following steps are also included: The processed dimming glass is taken out, and an electrical inspection is performed on the processed dimming glass.