Automatic cleaning device for silicon carbide products

Abstract

The present invention relates to the technical field of silicon carbide product production, specifically to an automatic cleaning device for silicon carbide products, including a bottom plate, a first cleaning mechanism and a second cleaning mechanism arranged front and back and an infusion mechanism located on the left side of the first cleaning mechanism are installed on the top of the bottom plate, the top of the bottom plate is fixedly connected to a top plate through a vertical plate, a transportation mechanism is installed on the top plate, and a storage mechanism is placed in the first cleaning mechanism. The present invention uses the first cleaning mechanism, the second cleaning mechanism and the transportation mechanism in coordination, the transportation mechanism first puts the storage mechanism with the wafer into the spray pool for the first spray scrubbing, and then the transportation mechanism puts the storage mechanism into the soaking pool for multi-directional soaking scrubbing, and then the transportation mechanism puts the storage mechanism into the spray pool for spray washing, and the wafer is efficiently cleaned by combining spray scrubbing, soaking scrubbing, and finally spray washing.

Description

Technical Field

[0001] The invention relates to the technical field of silicon carbide product production, and in particular to an automatic cleaning device for silicon carbide products. Background Art

[0002] Silicon carbide diodes have the characteristics of low reverse leakage current, good stability at high temperature, and fast response speed. The core of silicon carbide diodes is their wafers, which are the basic materials for manufacturing silicon carbide diodes. The quality of the wafer directly affects the performance and reliability of the diode. Silicon carbide wafers need to be etched on one side during the production process. After etching, the etching liquid needs to be cleaned to remove various dirt on the surface of the wafer during etching, ensuring that subsequent processes can be carried out on a clean surface.

[0003] The existing cleaning method of silicon carbide wafers is to put the silicon carbide wafers into a cleaning tank, and then remove the dirt on the surface of the wafers by washing while the silicon carbide wafers are in a static state. However, the above cleaning process still has the following shortcomings: 1. The existing cleaning method is relatively simple. For the dirt adhering to the surface of the wafer, the single washing method is difficult to completely remove the adhering dirt, and the cleaning effect needs to be further improved; 2. The dirt after washing will float in the cleaning liquid. When the wafer is taken out of the cleaning liquid or the cleaning liquid is emptied, the dirt will be attached to the surface of the wafer for a second time, affecting the cleaning effect of the wafer. Summary of the invention

[0004] In order to solve the above problems, the present invention provides an automatic cleaning device for silicon carbide products, including a base plate, a first cleaning mechanism and a second cleaning mechanism arranged in front and back and an infusion mechanism located on the left side of the first cleaning mechanism are installed on the top of the base plate, the top of the base plate is fixedly connected to a top plate through a vertical plate, a transport mechanism is installed on the top plate, a storage mechanism is placed in the first cleaning mechanism, and the top plate is located above the first cleaning mechanism, the second cleaning mechanism, and the infusion mechanism.

[0005] The first cleaning mechanism includes a spray pool installed on a bottom plate, a first fixed component is symmetrically installed on the inner wall of the spray pool, a first brush component is movably installed inside the spray pool, a first lifting mechanism for driving the first brush component to move up and down is installed at the bottom of the spray pool, and a plurality of first racks are installed on the inner bottom wall of the spray pool at equal intervals.

[0006] The second cleaning mechanism includes a soaking pool installed on a bottom plate, a turntable is rotatably installed inside the soaking pool, a second lifting mechanism is installed on the turntable, a second fixing assembly is symmetrically installed on the top of the second lifting mechanism, a second brushing assembly is commonly connected between the left and right second fixing assemblies, a reciprocating rotating assembly for driving the turntable to rotate is installed at the bottom of the soaking pool, and a driving assembly for driving the second brushing assembly is installed on the top of the turntable.

[0007] In one possible implementation, the first fixing component includes a limit frame with a U-shaped structure fixedly connected to the inner wall of the spray pool, first blocks are slidably installed on the front and rear sides of the opposite sides of the two vertical sections of the limit frame, a return spring is fixedly connected between the opposite ends of the two first blocks and the inner walls of the corresponding limit frames, a wedge block is slidably installed on the side of the limit frame close to the center of the spray pool, a push plate is fixedly connected to the bottom of the first block, the wedge block cooperates with the push plate, a protruding ball is fixedly connected to the end of the wedge block close to the center of the spray pool, and the structure of the second fixing component is the same as that of the first fixing component.

[0008] In one possible implementation, the first brush cleaning assembly includes a horizontal plate movably mounted up and down inside the spray pool, a plurality of support rods are fixedly connected to the top of the horizontal plate at equal intervals on the left and right, a first C-shaped frame is fixedly mounted on the top of the support rod, a cleaning brush is slidably mounted left and right between the middle parts of the two vertical sections of the first C-shaped frame, a spray pipe is fixedly connected between the tops of the two vertical sections of the first C-shaped frame, a mounting plate is integrally formed on the right side of the first C-shaped frame, a reciprocating structure for driving the cleaning brush to move left and right is mounted on the mounting plate, an elastic telescopic tube connected to the right side of the spray pipe is fixedly connected to the spray pipe, and the top end of the first rack slides through to the top of the horizontal plate.

[0009] In one possible implementation, the reciprocating structure includes a rotating shaft rotatably mounted inside a mounting plate, a crankshaft being fixedly connected to the rotating shaft, a pull rod being rotatably connected to the crankshaft, an end of the pull rod away from the crankshaft being rotatably connected to the right side of the cleaning brush, a gear plate being rotatably mounted outside the rotating shaft, a ratchet and pawl mechanism being installed between the rotating shaft and the gear plate, and the first rack being meshed with the gear plate.

[0010] In one possible implementation, the infusion mechanism includes a liquid storage tank installed on the top of the base plate, an infusion pump is fixedly connected to the right side of the liquid storage tank, an input port of the infusion pump is connected to the interior of the liquid storage tank, an output port of the infusion pump is fixedly connected to an infusion tube, the right end of the infusion tube passes through the interior of the spray pool, and the bottom end of the elastic telescopic tube is connected to the infusion tube.

[0011] In one possible implementation, the first lifting mechanism includes a vertical guide rail that is symmetrically fixed on the bottom wall of the spray pool, a first lead screw is rotatably installed inside the vertical guide rail, an external thread of the first lead screw is connected to a first slider, the first slider is slidably installed inside the vertical guide rail, the cross plate is fixedly connected between the left and right first sliders, the bottom end of the first lead screw rotates to penetrate to the bottom of the spray pool, a first drive motor is installed on the top of the bottom plate, and the output shaft of the first drive motor is transmission-connected to the first lead screw via a pulley assembly.

[0012] In one possible implementation, the second lifting mechanism includes a fixed sleeve that is symmetrically fixed to the top of the turntable, a second screw is rotatably installed inside the fixed sleeve, a movable sleeve is threadedly connected to the top of the second screw, and the movable sleeve is slidably installed on the top of the fixed sleeve, the bottom of the second screw rotates and passes through the bottom of the turntable and is fixedly connected to the first gear, a first gear ring is fixedly installed inside the immersion pool, the first gear is meshed with the first gear ring, and the second fixed component is fixedly installed on the top of the movable sleeve.

[0013] In one possible implementation, the second brushing assembly includes a second U-shaped frame fixedly connected between two left and right second fixed assemblies and symmetrically distributed front to back, a plurality of roller brush structures are evenly spaced between the tops of the horizontal sections of the second U-shaped frame, the roller brush structure includes two fixed plates arranged in parallel up and down, the bottom fixed plate is fixedly connected between the tops of the two second U-shaped frames, the front and rear ends of the two corresponding upper and lower fixed plates are fixedly connected by a guide rod, a second slider is installed between the outside of the guide rod for upward and downward sliding, a cleaning roller is rotatably installed on the left side of the second slider, a third lead screw is rotatably installed between the middle parts of the upper and lower fixed plates, the third lead screw is threadedly connected to the second slider, and adjacent third lead screws are connected by a pulley assembly.

[0014] In one possible implementation, the reciprocating rotation assembly includes a shaft rod rotatably mounted on the bottom wall of the soaking tank, the top end of the shaft rod is coaxially fixedly connected to the bottom of the turntable, the bottom end of the shaft rod passes through the bottom of the soaking tank and is fixedly connected to a second gear, a second rack is slidably mounted on the bottom of the soaking tank, a front end of the second rack is fixedly connected to a slot frame, a second drive motor is mounted on the top of the base plate, a rocker arm is fixedly connected to the output shaft at the top of the second drive motor, a push rod is rotatably connected to the top of the rocker arm away from one end of the output shaft of the second drive motor, and the push rod is slidably mounted inside the slot frame.

[0015] In one possible implementation, the drive assembly includes a third rack fixedly connected to the top of the turntable, a transmission rod is rotatably mounted on the bottom of the rightmost fixed plate, the right end of the transmission rod is fixedly connected to a third gear, the third gear is meshed with the third rack, and the left end of the transmission rod is meshed with the bottom end of the third lead screw at the rightmost end through a bevel gear set.

[0016] Beneficial effects of the present invention: 1. The present invention cooperates with the first cleaning mechanism, the second cleaning mechanism and the transportation mechanism. The transportation mechanism first places the storage mechanism containing the wafers into the spray pool for the first spray and brushing, and then the transportation mechanism places the storage mechanism into the immersion pool for multi-directional immersion and brushing. Thereafter, the transportation mechanism places the storage mechanism into the spray pool for spray washing. The wafers are efficiently cleaned by combining spray and brushing, immersion and brushing, and finally spray and rinse, thereby improving the effect of wafer cleaning. During the second spraying, the reciprocating moving structure can drive the cleaning brush away from the wafer under the drive of the first rack, thereby preventing the cleaning brush from adhering dirt to the wafer for the second time, thereby improving the effect of wafer cleaning.

[0017] 2. The present invention drives the turntable and the storage mechanism to reciprocate through the reciprocating rotating component, so that the cleaning liquid can continuously rinse the surface of the wafer, thereby improving the cleaning effect. While the turntable rotates, the second lifting mechanism drives the storage mechanism and the second brushing component to move up and down together, so that the cleaning liquid can flush the surface of the wafer up and down, which is beneficial to the removal of dirt. In addition, during the up and down movement of the storage mechanism, the driving component can drive the cleaning roller to move up and down in the opposite direction, so that the cleaning roller can brush the wafer, further improving the cleaning effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a three-dimensional structural schematic diagram of the present invention.

[0019] Figure 2 It is a front cross-sectional view of the first cleaning mechanism of the present invention.

[0020] Figure 3 It is a three-dimensional structural schematic diagram when the storage mechanism of the present invention is placed in a spray pool.

[0021] Figure 4 It is a three-dimensional structural schematic diagram of the cleaning brush of the present invention.

[0022] Figure 5 It is a partial cross-sectional view of the reciprocating structure of the present invention.

[0023] Figure 6 It is a front cross-sectional view of the second cleaning mechanism of the present invention.

[0024] Figure 7 It is a schematic diagram of the three-dimensional structure of the second brushing component of the present invention.

[0025] Figure 8 It is a three-dimensional structural schematic diagram of the roller brush structure of the present invention.

[0026] Fig. 9 It is a three-dimensional structural schematic diagram of the reciprocating rotating assembly of the present invention.

[0027] Fig.10 It is a partial cross-sectional view of the first fixing component of the present invention.

[0028] Fig.11 It is a three-dimensional structural schematic diagram of the transportation mechanism of the present invention.

[0029] Fig.12 It is a three-dimensional structural schematic diagram of the storage mechanism of the present invention.

[0030] Fig.13 It is a schematic diagram of the three-dimensional structure of the third fixing component of the present invention.

[0031] Fig.14 The present invention Figure 7 Magnified view of area A.

[0032] In the figure: 1, bottom plate; 2, first cleaning mechanism; 21, spray pool; 22, first fixing assembly; 221, limit frame; 222, first stopper; 223, return spring 1; 224, wedge block; 225, raised ball; 23, first brush assembly; 231, cross plate; 232, support rod; 233, first U-shaped frame; 234, cleaning brush; 235, spray pipe; 236, mounting plate; 237, reciprocating structure; 2371, rotating shaft; 2372, crankshaft; 2373, pull rod; 2374, gear plate; 2375, ratchet and pawl mechanism; 238, elastic telescopic tube; 24, first lifting mechanism; 241, vertical guide rail; 242, first lead screw; 243, first slider; 244, first drive motor; 25, first rack; 3, second cleaning mechanism; 31, soaking tank; 32, second lifting mechanism; 321, fixed sleeve; 322, second lead screw; 323, movable sleeve; 324, first gear; 325, first gear ring; 33, second fixed assembly; 3 4. Second brushing assembly; 341. Second U-shaped frame; 342. Roller brush structure; 3421. Fixed plate; 3422. Guide rod; 3423. Second slider; 3424. Cleaning roller; 3425. Third lead screw; 35. Reciprocating assembly; 351. Shaft; 352. Second gear; 353. Second rack; 354. Slot frame; 355. Second drive motor; 356. Rocker arm; 357. Push rod; 36. Drive assembly; 361. Third rack; 362. Transmission rod; 36 3. The third gear; 37. The turntable; 4. The infusion mechanism; 41. The liquid storage tank; 42. The infusion pump; 43. The infusion tube; 5. The top plate; 6. The transportation mechanism; 61. The transmission chain plate; 62. The conveyor chain; 63. The electric telescopic rod; 64. The hook; 65. The servo motor; 7. The storage mechanism; 71. The storage frame; 72. The slot; 73. The third fixed component; 731. The movable frame; 732. The movable rod; 733. The second reset spring; 734. The second stop block; 735. The push block; 74. The fixed block. DETAILED DESCRIPTION

[0033] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the specific embodiments of the present invention are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the present invention. However, the present invention can be implemented in many other ways different from those described below, and those skilled in the art can make similar improvements without violating the connotation of the present invention, so the present invention is not limited by the specific embodiments disclosed below.

[0034] See also Figure 1 , Figure 2 and Figure 3, an automatic cleaning device for silicon carbide products, including a base plate 1, a first cleaning mechanism 2 and a second cleaning mechanism 3 arranged in front and back and an infusion mechanism 4 located on the left side of the first cleaning mechanism 2 are installed on the top of the base plate 1, a top plate 5 is fixedly connected to the top of the base plate 1 through a vertical plate, a transportation mechanism 6 is installed on the top plate 5, a storage mechanism 7 is placed in the first cleaning mechanism 2, and the top plate 5 is located above the first cleaning mechanism 2, the second cleaning mechanism 3, and the infusion mechanism 4.

[0035] See also Figure 2 and Figure 3 The first cleaning mechanism 2 includes a spray pool 21 installed on the bottom plate 1, a first fixing component 22 is symmetrically installed on the inner wall of the spray pool 21, a first brush component 23 is movably installed inside the spray pool 21, a first lifting mechanism 24 for driving the first brush component 23 to move up and down is installed at the bottom of the spray pool 21, and a plurality of first racks 25 are installed on the inner bottom wall of the spray pool 21 at equal intervals.

[0036] See also Figure 1 , Figure 3 , Figure 6 and Figure 7 The second cleaning mechanism 3 includes a soaking tank 31 installed on the bottom plate 1, a turntable 37 is rotatably installed inside the soaking tank 31, a second lifting mechanism 32 is installed on the turntable 37, a second fixing assembly 33 is symmetrically installed on the top of the second lifting mechanism 32, and a second brushing assembly 34 is commonly connected between the left and right second fixing assemblies 33, a reciprocating rotating assembly 35 for driving the turntable 37 to rotate is installed at the bottom of the soaking tank 31, and a driving assembly 36 for driving the second brushing assembly 34 is installed on the top of the turntable 37.

[0037] See also Figure 2 , Figure 3 and Figure 4 The first brushing assembly 23 includes a horizontal plate 231 movably installed up and down inside the spray pool 21, a plurality of support rods 232 are fixedly connected to the top of the horizontal plate 231 at equal intervals on the left and right, a first U-shaped frame 233 is fixedly installed on the top of the support rod 232, a cleaning brush 234 is slidably installed between the middle parts of the two vertical sections of the first U-shaped frame 233, a spray pipe 235 is fixedly connected between the tops of the two vertical sections of the first U-shaped frame 233, a mounting plate 236 is integrally formed on the right side of the first U-shaped frame 233, a reciprocating structure 237 for driving the cleaning brush 234 to move left and right is installed on the mounting plate 236, an elastic telescopic tube 238 connected thereto is fixedly connected to the right side of the spray pipe 235, and the top end of the first rack 25 slides through to the top of the horizontal plate 231.

[0038] The first lifting mechanism 24 pushes the horizontal plate 231 upward, and then the horizontal plate 231 drives the support rod 232 and the first U-shaped frame 233 to move upward, so that the spray pipe 235 can spray and rinse the wafer, and the cleaning brush 234 can brush the wafer to remove dirt on the wafer surface.

[0039] See also Figure 3 , Figure 4 and Figure 5 The reciprocating structure 237 includes a rotating shaft 2371 rotatably mounted inside the mounting plate 236, a crankshaft 2372 is fixedly connected to the rotating shaft 2371, a pull rod 2373 is rotatably connected to the crankshaft 2372, and the end of the pull rod 2373 away from the crankshaft 2372 is rotatably connected to the right side of the cleaning brush 234, a gear plate 2374 is rotatably mounted outside the rotating shaft 2371, a ratchet and pawl mechanism 2375 is installed between the rotating shaft 2371 and the gear plate 2374, and the first rack 25 is meshed with the gear plate 2374.

[0040] When the first lifting mechanism 24 drives the first C-shaped frame 233 to move downward to the first rack 25, the first rack 25 is used to drive the gear plate 2374 to rotate counterclockwise, and then the gear plate 2374 drives the rotating shaft 2371 to rotate through the ratchet and pawl mechanism 2375, and then the rotating shaft 2371 drives the crankshaft 2372 to rotate, so that the crankshaft 2372 drives the cleaning brush 234 to move to the right through the pull rod 2373, so that the cleaning brush 234 is separated from the wafer. When the first C-shaped frame 233 moves upward, the gear plate 2374 rotates clockwise, and the gear plate 2374 will not drive the rotating shaft 2371 to rotate. When the first rack 25 and the gear plate 2374 are meshed again next time, the first rack 25 can drive the gear plate 2374 to rotate again, so that the crankshaft 2372 pushes the cleaning brush 234 to move to the left through the pull rod 2373, so that the cleaning brush 234 is fitted with the wafer.

[0041] See also Figure 1 , Figure 2 and Figure 3 The infusion mechanism 4 includes a liquid storage tank 41 installed on the top of the base plate 1, and an infusion pump 42 is fixedly connected to the right side of the liquid storage tank 41. The input port of the infusion pump 42 is connected to the interior of the liquid storage tank 41, and an infusion tube 43 is fixedly connected to the output port of the infusion pump 42. The right end of the infusion tube 43 passes through the interior of the spray pool 21, and the bottom end of the elastic telescopic tube 238 is connected to the infusion tube 43.

[0042] The cleaning liquid in the liquid storage tank 41 is transported to the infusion tube 43 through the infusion pump 42, and then the infusion tube 43 transports the cleaning liquid to the elastic telescopic tube 238, and then the elastic telescopic tube 238 transports the cleaning liquid to the spray pipe 235 for spraying, so as to rinse the surface of the chip.

[0043] See also Figure 2 The first lifting mechanism 24 includes a vertical guide rail 241 which is symmetrically fixedly installed on the inner bottom wall of the spray pool 21. A first lead screw 242 is rotatably installed inside the vertical guide rail 241. The first lead screw 242 is externally threadedly connected to a first slider 243. The first slider 243 is slidably installed inside the vertical guide rail 241. The cross plate 231 is fixedly connected between the left and right first sliders 243. The bottom end of the first lead screw 242 rotates to penetrate the bottom of the spray pool 21. A first drive motor 244 is installed on the top of the bottom plate 1. The output shaft of the first drive motor 244 is transmission-connected to the first lead screw 242 through a pulley assembly.

[0044] The first drive motor 244 drives the first lead screw 242 to rotate through a belt, and then the first lead screw 242 drives the first slider 243 to move up and down along the vertical guide rail 241, so that the first slider 243 drives the cross plate 231 to move up and down, and the cleaning brush 234 brushes the wafer up and down.

[0045] See also Figure 6 and Figure 7 The second lifting mechanism 32 includes a fixed sleeve 321 which is symmetrically fixed to the top of the turntable 37, a second lead screw 322 is rotatably installed inside the fixed sleeve 321, a movable sleeve 323 is threadedly connected to the top of the second lead screw 322, and the movable sleeve 323 is slidably installed on the top of the fixed sleeve 321, the bottom of the second lead screw 322 rotates and passes through the bottom of the turntable 37 and is fixedly connected to the first gear 324, a first gear ring 325 is fixedly installed inside the immersion pool 31, and is located below the turntable 37 and coaxial with the turntable 37, the first gear 324 is meshed with the first gear ring 325, and the second fixed component 33 is fixedly installed on the top of the movable sleeve 323.

[0046] When the storage mechanism 7 is placed in the immersion tank 31, the reciprocating rotating component 35 drives the turntable 37 to rotate forward and backward, and the turntable 37 simultaneously drives the second lifting mechanism 32 to rotate, so that the storage mechanism 7 rotates continuously, so that the cleaning liquid in the immersion tank 31 can continuously rinse the surface of the wafer, thereby improving the cleaning effect of the wafer. When the second lifting mechanism 32 rotates, the first gear ring 325 can drive the first gear 324 to rotate, and then the first gear 324 drives the second screw 322 to rotate, so that the movable sleeve 323 can drive the storage mechanism 7 to move up and down, so that the cleaning liquid can rinse the surface of the wafer.

[0047] See also Figure 6 , Figure 7 , Figure 8 and Fig.14The second brushing assembly 34 includes a second U-shaped frame 341 fixedly connected between the two left and right second fixed assemblies 33 and symmetrically distributed front and back, a plurality of roller brush structures 342 are evenly spaced between the tops of the horizontal sections of the second U-shaped frame 341, the roller brush structure 342 includes two fixed plates 3421 arranged in parallel up and down, the bottom fixed plate 3421 is fixedly connected between the tops of the two second U-shaped frames 341, the front and rear ends of the two corresponding upper and lower fixed plates 3421 are fixedly connected by a guide rod 3422, a second slider 3423 is slidably installed between the outsides of the guide rod 3422, a cleaning roller 3424 is rotatably installed on the left side of the second slider 3423, a third lead screw 3425 is rotatably installed between the middle parts of the upper and lower fixed plates 3421, the third lead screw 3425 is threadedly connected to the second slider 3423, and adjacent third lead screws 3425 are connected by a pulley assembly.

[0048] When the second lifting mechanism 32 drives the second brushing assembly 34 to move up and down, the driving assembly 36 is used to drive the third screw 3425 on the far right to rotate, and then the third screw 3425 drives the cleaning roller 3424 to move up and down. When the chip moves downward, the cleaning roller 3424 moves upward, so that the cleaning roller 3424 can brush the surface of the chip, thereby improving the cleaning effect of the chip.

[0049] See also Figure 6 and Fig. 9 The reciprocating rotating assembly 35 includes a shaft rod 351 rotatably mounted on the inner bottom wall of the immersion tank 31, the top of the shaft rod 351 is coaxially fixedly connected to the bottom of the turntable 37, the bottom end of the shaft rod 351 passes through the bottom of the immersion tank 31 and is fixedly connected to a second gear 352, a second rack 353 is slidably mounted on the bottom of the immersion tank 31, a groove frame 354 is fixedly connected to the front end of the second rack 353, a second driving motor 355 is mounted on the top of the bottom plate 1, a rocker arm 356 is fixedly connected to the output shaft at the top of the second driving motor 355, the rocker arm 356 is rotatably connected to the top of one end of the output shaft of the second driving motor 355 with a push rod 357, the push rod 357 is slidably mounted left and right inside the groove frame 354, an ultrasonic transducer is also mounted at the bottom of the immersion tank 31, it should be noted that the ultrasonic transducer belongs to the prior art.

[0050] The second driving motor 355 drives the rocker arm 356 and the push rod 357 to rotate, and then the push rod 357 drives the slot frame 354 to move back and forth, and then the slot frame 354 drives the second rack 353 to move back and forth, and the second rack 353 drives the second gear 352 and the shaft 351 to rotate back and forth, and then the shaft 351 drives the turntable 37 to rotate back and forth, which can reciprocate and clean the chip. At the same time, the ultrasonic transducer can generate ultrasonic waves, so that the cleaning liquid can perform ultrasonic cleaning on the chip.

[0051] See also Figure 6 , Figure 7 and Fig.14 The driving assembly 36 includes a third rack 361 fixedly connected to the top of the turntable 37, a transmission rod 362 is rotatably installed at the bottom of a fixed plate 3421 at the rightmost end, the right end of the transmission rod 362 is fixedly connected to a third gear 363, the third gear 363 is meshed with the third rack 361, and the left end of the transmission rod 362 is meshed with the bottom end of the third lead screw 3425 at the rightmost end through a bevel gear set.

[0052] When the second brushing assembly 34 moves up and down, the fixed plate 3421 on the far right can drive the transmission rod 362 and the third gear 363 to move up and down, and then the third rack 361 is used to drive the third gear 363 and the transmission rod 362 to rotate back and forth, and the transmission rod 362 then drives the third lead screw 3425 on the far right to rotate forward and reverse through the bevel gear set, and then the adjacent third lead screws 3425 are transmitted through the belt, so that several third lead screws 3425 can drive their corresponding second sliders 3423 to move up and down.

[0053] See also Figure 1 and Fig.11 The transport mechanism 6 includes a transmission chain plate 61 which is rotatably mounted on the bottom of the top plate 5 and is symmetrically distributed front to back. A conveying chain 62 is commonly connected to the outside of the two transmission chain plates 61. Electric telescopic rods 63 are evenly installed on the outer circumference of the conveying chain 62. A hook 64 is fixedly connected to the bottom of the electric telescopic rod 63. A curved hook is provided at the bottom of the vertical section of the hook 64. A servo motor 65 for driving the front transmission chain plate 61 is fixedly mounted on the top of the top plate 5.

[0054] The servo motor 65 drives the transmission chain plate 61 to rotate, and then the transmission chain plate 61 drives the conveying chain 62 to rotate, and then the conveying chain 62 drives the electric telescopic rod 63 and the hook 64 to move forward and backward, so that the hook 64 suspends the storage mechanism 7 and transports it forward and backward. The storage mechanism 7 with the wafer is placed on the hook 64 at the front end of the top plate 5, and then the hook 64 takes the storage mechanism 7 and places it in the first cleaning mechanism 2 and the second cleaning mechanism 3 in turn for cleaning. After cleaning, the hook 64 transports the storage mechanism 7 to the rear end of the top plate 5, and then the storage mechanism 7 is taken off the hook 64. At the same time, the loading operation can also be performed to improve the cleaning efficiency.

[0055] See also Figure 2 , Figure 3 and Fig.10The first fixed component 22 includes a limit frame 221 with a U-shaped structure fixedly connected to the inner wall of the spray pool 21, and first blocks 222 are slidably installed on the front and rear opposite sides of the two vertical sections of the limit frame 221. A return spring 223 is fixedly connected between the opposite ends of the two first blocks 222 and the inner wall of the corresponding limit frame 221. A wedge block 224 is slidably installed on the side of the limit frame 221 close to the center of the spray pool 21. A push plate is fixedly connected to the bottom of the first block 222, and the wedge block 224 cooperates with the push plate. A protruding ball 225 is fixedly connected to one end of the wedge block 224 close to the center of the spray pool 21. The second fixed component 33 has the same structure as the first fixed component 22.

[0056] See also Figure 3 , Fig.10 , Fig.12 and Fig.13 The storage mechanism 7 includes a storage frame 71 placed in the spray pool 21, and a plurality of slots 72 equidistantly distributed on the left and right are installed on the front and rear inner walls of the storage frame 71. The front and rear sides of the storage frame 71 are both installed with a third fixing component 73 for limiting the slots 72 on the corresponding side. The left and right sides of the storage frame 71 are symmetrically fixedly connected with fixing blocks 74, which match the bent hook at the bottom of the hook 64. The fixing block 74 is movably installed in the corresponding limiting frame 221, and the first stopper 222 is located at the top of the corresponding fixing block 74.

[0057] When the storage mechanism 7 is to be placed in the spray pool 21, the conveyor chain 62 drives the electric telescopic rod 63 and the hook 64 to move to the top of the spray pool 21, and then the electric telescopic rod 63 pushes the hook 64 to move downward, so that the hook 64 puts the storage mechanism 7 into the spray pool 21. At this time, the hook 64 will first contact the protruding ball 225, and use the hook 64 to push the protruding ball 225 and the wedge block 224 to move away from the center of the spray pool 21, and then the wedge block 224 pushes the first stopper 225 to move away from the center of the spray pool 21. 22 moves in the direction away from the center of the limit frame 221, and then the hook 64 puts the fixed block 74 into the limit frame 221, and then the hook 64 continues to move downward to separate from the fixed block 74, and then the hook 64 moves forward and leaves from under the fixed block 74. When the hook 64 is separated from the limit frame 221, the first stopper 222 is pushed to reset by the rebound force of the reset spring 223, so that the first stopper 222 is blocked at the top of the fixed block 74, and finally the hook 64 moves upward to leave the spray pool 21.

[0058] See also Fig.12 and Fig.13The third fixed component 73 includes a movable frame 731 fixedly connected to the outer wall of the storage frame 71 and symmetrically distributed on the left and right. A movable rod 732 is installed inside the movable frame 731 for sliding back and forth. A second return spring 733 is fixedly connected between the side of the movable rod 732 away from the center of the storage frame 71 and the inner wall of the movable frame 731. A plurality of second stoppers 734 that slide through the side wall of the storage frame 71 are installed at equal intervals on the left and right sides of the movable rod 732 close to the center of the storage frame 71. The lower end of the second stopper 734 is plugged into the top of the slot 72.

[0059] When the chip is to be placed in the storage frame 71, the push block 735 is pushed to move away from the center of the storage frame 71, and then the push block 735 drives the movable rod 732 and the second stop block 734 to move away from the center of the storage frame 71, so as to open the top of the slot 72, and then the chip is inserted into the slot 72, and then the push block 735 is released, and the rebound force of the return spring 733 is used to push the movable rod 732 and the return spring 733 to move toward the center of the storage frame 71, so that the second stop block 734 is blocked at the top of the slot 72 again, and the second stop block 734 and the slot 72 cooperate to limit and fix the chip, thereby improving the stability of chip placement.

[0060] See also Figure 1-Figure 14 When in use, step 1 is to push the push block 735 to move away from the center of the storage frame 71, and then the push block 735 drives the movable rod 732 and the second stop block 734 to move away from the center of the storage frame 71, open the top of the slot 72, and then insert the wafer into the corresponding two slots 72, and then release the push block 735, and use the rebound force of the return spring 2 733 to push the movable rod 732 and the return spring 2 733 to move toward the center of the storage frame 71, so that the second stop block 734 is blocked at the top of the slot 72 again to prevent the wafer from falling out of the slot 72.

[0061] Step 2, place the storage mechanism 7 with the wafers on the hook 64 at the front end of the top plate 5. When placing it, make the hook 64 hook the fixed blocks 74 on both sides of the storage frame 71, and then drive the transmission chain plate 61 to rotate through the servo motor 65, and then the transmission chain plate 61 drives the conveyor chain 62 to rotate, and then the conveyor chain 62 drives the electric telescopic rod 63 and the hook 64 to move, so that the hook 64 hoists the storage mechanism 7 to be transported to the top of the spray pool 21, and then the electric telescopic rod 63 pushes the hook 64 to move downward, and the storage frame 71 is placed in the spray pool 21, and the fixed block 74 is placed in the limit frame 221. When the storage frame 71 is placed in the spray pool 21, the support rod 232 and the wafer are placed alternately.

[0062] Step three, when the hook 64 contacts the protruding ball 225, the hook 64 is used to push the protruding ball 225 and the wedge block 224 to move away from the center of the spray pool 21, and then the wedge block 224 pushes the first stop block 222 to move away from the center of the limiting frame 221, and then the hook 64 completely puts the fixing block 74 into the limiting frame 221, and then the hook 64 continues to move downward to separate the bent hook from the fixing block 74, and then the hook 64 moves forward to make the bent hook leave from under the fixing block 74, when the hook 64 no longer pushes the protruding ball 225, the first stop block 222 is reset by the rebound force of the reset spring 223, so that the first stop block 222 is blocked on the top of the fixing block 74, and finally the electric telescopic rod 63 drives the hook 64 to move upward to leave the spray pool 21.

[0063] Step 4, in the initial state, the cleaning brush 234 is in a position where it can fit the surface of the wafer, and the first drive motor 244 drives the first lead screw 242 to rotate, and then the first lead screw 242 drives the first slider 243 to move upward along the vertical guide rail 241, and at the same time, the cleaning liquid in the liquid storage tank 41 is transported to the infusion pipe 43 through the infusion pump 42, and then the infusion pipe 43 transports the cleaning liquid to the elastic telescopic tube 238, and then the elastic telescopic tube 238 transports the cleaning liquid to the spray pipe 235 for spraying, so that the spray pipe 235 first rinses the wafer, and then the cleaning brush 234 can brush the wafer, when the cleaning brush 234 moves to the top of the wafer, the first drive motor 244 drives the first lead screw 242 to rotate in the opposite direction, and then the first lead screw 242 drives the first slider 243 to move downward along the vertical guide rail 241, and moves the first U-shaped frame 233 downward to the initial position.

[0064] Step 5, when the gear plate 2374 moves downward to engage with the first rack 25, the first rack 25 drives the gear plate 2374 to rotate counterclockwise, and then the gear plate 2374 drives the shaft 2371 to rotate through the ratchet pawl mechanism 2375, and then the shaft 2371 drives the crankshaft 2372 to rotate, so that the crankshaft 2372 drives the cleaning brush 234 to move rightward through the pull rod 2373, so that the cleaning brush 234 is in a position separated from the wafer surface, and then the electric telescopic rod 63 drives the hook 64 to move downward, so that the bottom of the hook 64 The height of the hook is lower than that of the fixed block 74, and then the conveyor chain 62 drives the hook 64 to move forward, so that the hook moves to just below the fixed block 74, and then the electric telescopic rod 63 drives the hook 64 to move upward, so that the hook hooks the fixed block 74, and then the hook 64 is used to push the protruding ball 225 and the wedge block 224 to move away from the center of the spray pool 21, so that the first stopper 222 no longer blocks the fixed block 74, and then the electric telescopic rod 63 drives the hook 64 to continue to move upward, and the storage frame 71 is moved upward out of the spray pool 21.

[0065] Step six, the conveyor chain 62 then drives the electric telescopic rod 63 and the hook 64 to move to the top of the immersion pool 31, and then the electric telescopic rod 63 pushes the hook 64 to move downward, and the storage mechanism 7 is placed into the immersion pool 31, and the fixing block 74 is placed into the second fixing assembly 33 for fixing, and then the hook 64 is moved upward to leave the immersion pool 31 in the same way as step three.

[0066] Step 7: The second driving motor 355 drives the rocker arm 356 and the push rod 357 to rotate, and then the push rod 357 drives the groove frame 354 and the second rack 353 to move back and forth, and the second rack 353 drives the second gear 352 and the shaft rod 351 to rotate back and forth, and then the shaft rod 351 drives the turntable 37 to rotate back and forth, so that the cleaning liquid in the immersion tank 31 can continuously rinse the surface of the wafer, thereby improving the cleaning effect of the wafer. When the second lifting mechanism 32 rotates, the first gear ring 325 can drive the first gear 324 to rotate, and then the first gear 324 drives the second lead screw 322 to rotate, so that the movable sleeve 323 can drive the second fixed component 33, The second brushing assembly 34 and the storage mechanism 7 move up and down, so that the cleaning liquid can rinse the surface of the chip. When the second brushing assembly 34 moves up and down, the third rack 361 is used to drive the third gear 363 and the transmission rod 362 to rotate back and forth. The transmission rod 362 then drives the third lead screw 3425 on the far right to rotate forward and reversely through the bevel gear set. Then, the adjacent third lead screws 3425 are driven by a belt, so that the third lead screw 3425 can drive the second slider 3423 to move up and down. When the chip moves downward, the cleaning roller 3424 moves upward. The cleaning roller 3424 can be used to brush the surface of the chip to improve the cleaning effect of the chip.

[0067] Step eight, after cleaning, the second drive motor 355 stops rotating, and the storage mechanism 7 stops in the initial state. Then, the same method as in step five is used to make the hook 64 carry the storage mechanism 7 upward away from the immersion tank 31, and then the conveyor chain 62 drives the electric telescopic rod 63 and the hook 64 to move forward to the top of the spray tank 21, and then the storage mechanism 7 is placed in the spray tank 21 for rinsing in the same manner as in steps two, three and four. The difference is that, since the cleaning brush 234 has been adjusted to a position separated from the wafer surface in step five, when the first U-shaped frame 233 moves up again, the cleaning brush 234 no longer contacts the wafer surface for scrubbing, and only the spray pipe 235 sprays and rinses the wafer surface.

[0068] Step nine, after the flushing is completed, when the gear plate 2374 moves downward to engage with the first rack 25, the first rack 25 is used to drive the gear plate 2374 to rotate counterclockwise, and then the gear plate 2374 drives the rotating shaft 2371 to rotate through the ratchet pawl mechanism 2375, and then the rotating shaft 2371 drives the crankshaft 2372 to rotate, so that the crankshaft 2372 drives the cleaning brush 234 to move to the right through the pull rod 2373, so that the cleaning brush 234 is separated from the wafer surface and switched back to a position where it fits the wafer surface, and then the storage mechanism 7 is moved upward out of the spray pool 21 in the same manner as step five, and then the conveying chain 62 drives the electric telescopic rod 63 and the hook 64 to move backward, and the storage mechanism 7 is moved to the rear end of the top plate 5, and then the storage mechanism 7 is removed from the hook 64 to complete the unloading.

[0069] In the description of the present invention, it is also necessary to explain that, unless otherwise clearly specified and limited, the terms "set", "connect", "install", and "connect" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, an integral connection, or a sliding connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be the internal communication of two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0070] The embodiments of this specific implementation method are all preferred embodiments of the present invention, and are not intended to limit the protection scope of the present invention. Therefore, all equivalent changes made based on the structure, shape, and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. An automatic cleaning device for silicon carbide products, comprising a bottom plate (1), characterized in that: The top of the bottom plate (1) is provided with a first cleaning mechanism (2) and a second cleaning mechanism (3) arranged in a front-to-rear manner, and an infusion mechanism (4) located on the left side of the first cleaning mechanism (2); the top of the bottom plate (1) is fixedly connected to a top plate (5) via a vertical plate; a transport mechanism (6) is installed on the top plate (5); a storage mechanism (7) is placed in the first cleaning mechanism (2); and the top plate (5) is located above the first cleaning mechanism (2), the second cleaning mechanism (3), and the infusion mechanism (4); The first cleaning mechanism (2) comprises a spray pool (21) mounted on a bottom plate (1), a first fixing assembly (22) being symmetrically mounted on the inner wall of the spray pool (21), a first brush assembly (23) being movably mounted in the interior of the spray pool (21) so as to move up and down, a first lifting mechanism (24) for driving the first brush assembly (23) to move up and down being mounted at the bottom of the spray pool (21), and a plurality of first racks (25) being equidistantly mounted on the inner bottom wall of the spray pool (21); The second cleaning mechanism (3) comprises a soaking tank (31) mounted on a bottom plate (1); a rotating disk (37) is rotatably mounted inside the soaking tank (31); a second lifting mechanism (32) is mounted on the rotating disk (37); second fixing assemblies (33) are symmetrically mounted on the top of the second lifting mechanism (32); a second scrubbing assembly (34) is commonly connected between the left and right second fixing assemblies (33); a reciprocating rotating assembly (35) for driving the rotating disk (37) to rotate is mounted at the bottom of the soaking tank (31); and a driving assembly (36) for driving the second scrubbing assembly (34) is mounted on the top of the rotating disk (37); The first brushing assembly (23) comprises a horizontal plate (231) movably mounted in the spray pool (21) up and down, a plurality of support rods (232) are fixedly connected to the top of the horizontal plate (231) at equal intervals, a first U-shaped frame (233) is fixedly mounted on the top of the support rod (232), a cleaning brush (234) is slidably mounted between the middle parts of the two vertical sections of the first U-shaped frame (233), a spray pipe (235) is fixedly connected between the tops of the two vertical sections of the first U-shaped frame (233), a mounting plate (236) is integrally formed on the right side of the first U-shaped frame (233), a reciprocating structure (237) for driving the cleaning brush (234) to move left and right is mounted on the mounting plate (236), an elastic telescopic tube (238) in communication with the spray pipe (235) is fixedly connected to the right side of the spray pipe (235), and the top end of the first rack (25) slides through to the top of the horizontal plate (231); The reciprocating structure (237) includes a rotating shaft (2371) rotatably mounted inside the mounting plate (236); a crankshaft (2372) is fixedly connected to the rotating shaft (2371); a pull rod (2373) is rotatably connected to the crankshaft (2372); an end of the pull rod (2373) away from the crankshaft (2372) is rotatably connected to the right side of the cleaning brush (234); a gear plate (2374) is rotatably mounted outside the rotating shaft (2371); a ratchet and pawl mechanism (2375) is installed between the rotating shaft (2371) and the gear plate (2374); and the first rack (25) is meshed with the gear plate (2374).

2. The automatic cleaning device for silicon carbide products according to claim 1, characterized in that: The first fixing component (22) comprises a limit frame (221) in a U-shaped structure fixedly connected to the inner wall of the spray pool (21); first stoppers (222) are slidably mounted on the front and rear sides of the opposite sides of the two vertical sections of the limit frame (221); a return spring (223) is fixedly connected between the opposite ends of the two first stoppers (222) and the inner wall of the corresponding limit frame (221); a wedge block (224) is slidably mounted on the side of the limit frame (221) close to the center of the spray pool (21); a push plate is fixedly connected to the bottom of the first stopper (222); the wedge block (224) cooperates with the push plate; a protruding ball (225) is fixedly connected to one end of the wedge block (224) close to the center of the spray pool (21); and the structure of the second fixing component (33) is the same as that of the first fixing component (22).

3. The automatic cleaning device for silicon carbide products according to claim 1 is characterized in that: The infusion mechanism (4) comprises a liquid storage tank (41) mounted on the top of the base plate (1); an infusion pump (42) is fixedly connected to the right side of the liquid storage tank (41); an infusion pump (42) is connected to the interior of the liquid storage tank (41); an infusion tube (43) is fixedly connected to the outlet of the infusion pump (42); the right end of the infusion tube (43) passes through the interior of the spray pool (21); and the bottom end of the elastic telescopic tube (238) is connected to the infusion tube (43).

4. The automatic cleaning device for silicon carbide products according to claim 1, characterized in that: The first lifting mechanism (24) comprises a vertical guide rail (241) symmetrically fixedly mounted on the inner bottom wall of the spray pool (21); a first lead screw (242) is rotatably mounted inside the vertical guide rail (241); a first slider (243) is externally threadedly connected to the first lead screw (242); the first slider (243) is slidably mounted inside the vertical guide rail (241); the transverse plate (231) is fixedly connected between the left and right first sliders (243); the bottom end of the first lead screw (242) is rotatably penetrated to the bottom of the spray pool (21); a first drive motor (244) is mounted on the top of the bottom plate (1); and an output shaft of the first drive motor (244) is transmission-connected to the first lead screw (242) via a pulley assembly.

5. The automatic cleaning device for silicon carbide products according to claim 1, characterized in that: The second lifting mechanism (32) comprises a fixed sleeve (321) symmetrically fixedly connected to the top of the rotating disk (37); a second lead screw (322) is rotatably installed inside the fixed sleeve (321); a movable sleeve (323) is threadedly connected to the top of the second lead screw (322); the movable sleeve (323) is slidably installed on the top of the fixed sleeve (321); the bottom of the second lead screw (322) rotates to penetrate the bottom of the rotating disk (37) and is fixedly connected to a first gear (324); a first gear ring (325) located below the rotating disk (37) and coaxial with the rotating disk (37) is fixedly installed inside the immersion tank (31); the first gear (324) is meshed with the first gear ring (325); and the second fixed component (33) is fixedly installed on the top of the movable sleeve (323).

6. The automatic cleaning device for silicon carbide products according to claim 1, characterized in that: The second brushing assembly (34) comprises a second U-shaped frame (341) fixedly connected between the two left and right second fixed assemblies (33) and symmetrically distributed front and back, a plurality of roller brush structures (342) are evenly distributed between the tops of the horizontal sections of the second U-shaped frame (341), the roller brush structure (342) comprising two fixed plates (3421) arranged in parallel up and down, the bottom fixed plate (3421) being fixedly connected between the tops of the two second U-shaped frames (341), and the two corresponding fixed plates (3421) up and down ) are fixedly connected at both ends by a guide rod (3422); a second slider (3423) is slidably mounted on the outside of the guide rod (3422) so as to slide up and down; a cleaning roller (3424) is rotatably mounted on the left side of the second slider (3423); a third lead screw (3425) is rotatably mounted between the middle parts of the upper and lower fixed plates (3421); the third lead screw (3425) is threadedly connected to the second slider (3423); and adjacent third lead screws (3425) are connected by a pulley assembly.

7. The automatic cleaning device for silicon carbide products according to claim 1, characterized in that: The reciprocating rotating assembly (35) comprises a shaft (351) rotatably mounted on the inner bottom wall of the soaking tank (31); the top end of the shaft (351) is coaxially fixedly connected to the bottom of the rotating disk (37); the bottom end of the shaft (351) passes through the bottom of the soaking tank (31) and is fixedly connected to a second gear (352); a second rack (353) is slidably mounted on the bottom of the soaking tank (31) in a forward and backward manner; the front end of the second rack (353) is fixedly connected to a groove frame (354); a second driving motor (355) is mounted on the top of the bottom plate (1); a rocker arm (356) is fixedly connected to the output shaft at the top of the second driving motor (355); a push rod (357) is rotatably connected to the top of the rocker arm (356) away from one end of the output shaft of the second driving motor (355); and the push rod (357) is slidably mounted inside the groove frame (354) in a left-right manner.

8. The automatic cleaning device for silicon carbide products according to claim 6, characterized in that: The driving assembly (36) comprises a third rack (361) fixedly connected to the top of the rotating disk (37); a transmission rod (362) is rotatably mounted on the bottom of the rightmost fixed plate (3421); a third gear (363) is fixedly connected to the right end of the transmission rod (362); the third gear (363) is meshed with the third rack (361); and the left end of the transmission rod (362) is meshed with the bottom end of the third lead screw (3425) at the rightmost end via a bevel gear set.

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