Femtosecond laser beam splitting parallel processing system

Abstract

The present application relates to a femtosecond laser spectroscopic parallel processing system, mainly to the field of femtosecond laser processing technology. The femtosecond laser spectroscopic parallel processing system includes: a base, a laser processing unit arranged on the base, and a confocal imaging monitoring unit. The above-mentioned femtosecond laser spectroscopic parallel processing system realizes the joint operation of multiple processing beams, thereby improving the processing efficiency. The confocal imaging module is used to confocally and image with one of the processing beams to monitor the processing surface during the processing process, and can assist in the modulation of the processing beam before processing. The optical path switching module is used to control the confocal imaging module to switch between the processing beams of multiple channels, thereby reducing the system assembly cost and processing cost. The above-mentioned femtosecond laser spectroscopic parallel processing system can meet the processing requirements of high stability, low cost, and low optical path complexity. During the processing, it can ensure that the beam is uniform and stable, and the spectroscopic setting realizes the discrete regulation of the parameters of the multi-channel processing beam of a single laser.

Description

Technical Field

[0001] The present application relates to the technical field of femtosecond laser processing, and in particular to a femtosecond laser beam splitting parallel processing system. Background Art

[0002] With the development of advanced manufacturing and precision machining, surface functional devices have gradually become a hot demand in the industry. Surface functional devices usually refer to surface structures with certain characteristic micro-nanoscale morphology on the surface of materials. Different functional surface characteristics can be achieved by designing the size, arrangement and morphology of micro-nano structures, including but not limited to black bodies, surface anti-reflection devices, surface hydrophobic devices, surface drag reduction devices, etc., which are widely used in aerospace, environmental engineering, energy engineering, biological detection, optical storage, power communication, building construction and other fields.

[0003] Compared with other existing processing methods, laser processing has obvious advantages, such as high precision, non-contact, no need for masks, and wide material adaptability. Femtosecond laser processing has the advantages of non-thermal processing, true three-dimensional processing, processing accuracy that can exceed the diffraction limit, processing of a variety of materials, and simple processing flow. It plays an irreplaceable role in the preparation of large-area surface functional devices and has extremely obvious advantages. The use of multi-beam parallel processing technology can effectively improve processing efficiency. Existing parallel processing technologies mainly include intra-mirror beam splitting parallel processing solutions based on microlens arrays (MLA), diffraction elements (DOE), spatial light modulators (SLM), digital micromirrors (DMD), etc., that is, a single beam of femtosecond laser is divided into multiple beams of femtosecond laser with small spacing through the above-mentioned beam splitting devices, and the same objective lens is introduced to achieve multi-focus parallel processing.

[0004] Existing femtosecond laser parallel processing technologies mainly include three multi-beam parallel processing schemes based on microlens array (MLA), diffraction element (DOE), and spatial light modulator (SLM).

[0005] The microlens array (MLA) is an array-type optical parallel processing device with a clear aperture and relief depth at the micron level. Like traditional lenses, it can achieve focusing, imaging and other functions, and can use a single laser beam to generate multiple focal points, so it can be applied to femtosecond laser parallel processing. However, the uniformity of its multi-focal beam is difficult to control, the optical path is highly complex, and the optical path parameters of each channel are difficult to control. Diffraction elements (DOE) such as Dammann gratings can achieve approximately equal-intensity beam splitting of femtosecond lasers, but their optical path complexity is high and the system stability is poor. The spatial light modulator (SLM) is a diffraction device that uses the birefringence properties of liquid crystal molecules to phase modulate the incident light field. In theory, it can realize the control of any light field and can be used for modulation of multi-beam parallel processing light fields, but it has high cost, general stability, high optical path complexity, and limited application scenarios.

[0006] In summary, although the existing femtosecond laser parallel processing technology has improved processing efficiency, its main application scenarios are still in laboratory scientific research applications. It does not take into account the strong demand for high stability, low cost, and low optical path complexity required for industrialization. The beam uniformity is poor and the optical path parameters of each channel are not discretely controlled. Summary of the invention

[0007] Based on this, it is necessary to provide a femtosecond laser beam splitting parallel processing system to address the problems of poor beam uniformity and lack of discrete control of optical path parameters of each channel in the existing femtosecond laser parallel processing technology.

[0008] A femtosecond laser spectroscopic parallel processing system, comprising: a base, a laser processing unit arranged on the base, and a confocal imaging monitoring unit arranged on the base;

[0009] The laser processing unit includes: a laser, a modulation module, a laser beam splitting module, and a plurality of dimming components;

[0010] The laser, the modulation module, and the laser beam splitting module are arranged in sequence; the modulation module is used to receive the light beam from the laser and modulate it to output a first basic light beam; the laser beam splitting module is used to receive the first basic light beam and split it to output a plurality of second basic light beams; a plurality of dimming components correspond to a plurality of second basic light beams one by one; the dimming component is used to adjust the power, polarization direction, and focus of the corresponding second basic light beam to form a processing light beam and output it;

[0011] The confocal imaging monitoring unit includes a confocal imaging module and an optical path switching module; the plurality of processing light beams respectively have irradiation positions on the workpiece; by switching the optical path switching module, the reflected light of any irradiation position can be selectively propagated to the confocal imaging module.

[0012] In one embodiment, the confocal imaging module includes: an illumination light source, an imaging unit, and a plurality of beam combining modules;

[0013] The plurality of beam combining modules correspond one-to-one to the plurality of the second basic light beams; the beam combining modules are located on the propagation paths of the corresponding second basic light beams;

[0014] By switching the optical path switching module, any of the beam combining modules can be selectively enabled to receive the light beam emitted from the illumination light source, so that the selected beam combining module combines the corresponding second basic light beam with the light beam emitted from the illumination light source, and the light beam emitted from the illumination light source is irradiated to the irradiation position of the processing light beam corresponding to the corresponding second basic light beam on the workpiece;

[0015] The plurality of processing light beams respectively have irradiation positions on the workpiece; by switching the optical path switching module, the reflected light of the irradiation position corresponding to the selected beam combining module can be propagated to the imaging unit.

[0016] In one embodiment, the dimming component includes a power control module, a polarization control module, a focus adjustment module and an objective lens limit module which are sequentially arranged along a propagation direction corresponding to the second basic light beam.

[0017] The power control module is used to adjust the power of the corresponding second basic light beam, the polarization control module is used to adjust the polarization direction of the corresponding second basic light beam, and the focusing module is used to adjust the position of the focus of the corresponding second basic light beam along the first direction; the objective lens limiting module is used to adjust the position of the focus of the corresponding second basic light beam along the second direction and the third direction, so as to output the processing light beam; any two of the objective lens limiting modules are staggered in the second direction and the third direction;

[0018] The first direction is the direction of any point on the light propagation path of the second basic light beam, and the first direction, the second direction and the third direction are perpendicular to each other.

[0019] In one embodiment, the femtosecond laser spectroscopic parallel processing system further comprises a mounting member, wherein the mounting member is provided with a plurality of mounting holes;

[0020] The objective lens limiting module comprises a limiting member and an objective lens body, wherein the objective lens body is arranged on the limiting member, and the limiting member has a matching portion, and the matching portion is detachably matched with the mounting hole.

[0021] In one embodiment, the femtosecond laser spectroscopic parallel processing system further includes a motion control module, and the motion control module includes a first motion unit, a second motion unit, and a third motion unit;

[0022] The second motion unit is arranged on the third motion unit so that the third motion unit drives the second motion unit to move along the third motion direction, the second motion unit is used to drive the workpiece to move along the second motion direction, and the first motion unit is used to drive the objective lens limiting module to move along the first motion direction; the processing light beam is emitted to the processing surface of the workpiece, the first motion direction is the propagation direction of the second basic light beam at the processing location, and the first motion direction, the second motion direction and the third motion direction are perpendicular to each other.

[0023] In one of the embodiments, the modulation module includes a beam expansion system and a wave plate, and the light beam emitted by the laser passes through the beam expansion system and the wave plate in sequence to obtain the first basic light beam.

[0024] In one embodiment, the laser beam splitting module comprises: a wave plate and a beam splitting device, and the first basic light beam passes through the wave plate and the beam splitting device in sequence to be split into at least two second basic light beams.

[0025] In one embodiment, the power control module includes a wave plate and a polarization beam splitter. The power control module includes a wave plate and a polarization beam splitter, the wave plate is used to control the polarization state of the second basic light beam, and the polarization beam splitter is used to adjust the corresponding power of the second basic light beam.

[0026] In one embodiment, the polarization control module includes a polarization control device and a moving component, and the polarization control device includes: a half-wave plate and / or a quarter-wave plate arranged on the moving component, and the half-wave plate and / or the quarter-wave plate are driven by the moving component to move to control the polarization of the second basic light beam.

[0027] In one embodiment, the focusing module includes a fine-tuning component and a fine-tuning lens, and the fine-tuning lens is arranged on the fine-tuning component. The fine-tuning component drives the fine-tuning lens to move along the first direction to adjust the position of the focus of the corresponding second basic light beam along the first direction.

[0028] When the above-mentioned femtosecond laser beam splitting parallel processing system is actually used, the laser, modulation module, laser beam splitting module and multiple dimming components are first arranged on the base in sequence according to the direction of the laser beam emission. The power, polarization direction and focus of the corresponding second basic beam are adjusted by the dimming component to obtain a processing beam and emit it to the workpiece. Then, the confocal imaging module and the optical path switching module are set according to the direction of the processing beam, and the beam emitted by the laser is modulated by debugging the modulation module to obtain a first basic beam, and the first basic beam is split by the laser beam splitting module to obtain multiple second basic beams. At the same time, the confocal imaging module is used to achieve confocal and imaging with one of the processing light beams to monitor the processing surface during the processing, and can assist in the modulation of the processing light beam before processing. The optical path switching module is used to control the confocal imaging module to switch between the processing light beams of multiple channels, so that there is no need to configure a set of confocal imaging modules for the processing light beam irradiated on each processing position of the surface to be processed, thereby reducing the system assembly cost and further reducing the processing cost. The above-mentioned femtosecond laser spectroscopic parallel processing system can meet the processing requirements of high stability, low cost, and low optical path complexity. During the processing, it can ensure that the light beam is uniform and stable, and the spectroscopic setting realizes the discrete control of the parameters of the single-laser multi-channel processing beam. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] FIG. 1 is a schematic diagram of a femtosecond laser beam splitting parallel processing system according to an embodiment of the present invention.

[0030] FIG. 2 is a schematic diagram of a femtosecond laser beam splitting parallel processing system installed on a control module.

[0031] FIG. 3 is an enlarged view of the objective lens limiting module in FIG. 2 .

[0032] FIG. 4 is a position diagram of the objective lens limiting module in FIG. 2 .

[0033] FIG. 5 is a position diagram of another embodiment of the objective lens limiting module in FIG. 2 .

[0034] FIG6 is a schematic diagram of a processing step.

[0035] Description of Figure Numbers:

[0036] 100-Femtosecond laser beam splitting parallel processing system;

[0037] 110-laser processing unit; 111-laser; 112-modulation module; 113-laser beam splitting module; 114-power control module; 115-polarization control module; 116-focusing module; 117-objective lens limit module;

[0038] 120-base;

[0039] 130-confocal imaging monitoring unit; 131-confocal imaging module; 132-optical path switching module; 133-illumination light source; 134-imaging unit; 135-optical path switching module; 136-beam combining module; 137-terminal; 138-depolarization beam splitter;

[0040] 140 - first basic beam; 141 - second basic beam; 142 - processing beam;

[0041] 150-mounting member; 151-mounting hole; 152-limiting member; 153-objective lens body; 154-matching part;

[0042] 160-motion control module; 161-first motion unit; 162-second motion unit; 163-third motion unit;

[0043] 170-reflector assembly; 171-reflector; 172-dichroic mirror; 173-stepping distance;

[0044] 210-Artifact. DETAILED DESCRIPTION

[0045] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without violating the connotation of the present application, so the present application is not limited by the specific embodiments disclosed below.

[0046] In the description of the present application, it should be understood that if the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. appear, the orientation or position relationship indicated by these terms is based on the orientation or position relationship shown in the accompanying drawings, which is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application.

[0047] In addition, if the terms "first" or "second" appear, these terms are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of the features. In the description of this application, if the term "plurality" appears, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0048] In this application, unless otherwise clearly specified and limited, if the terms "installed", "connected", "connected", "fixed" and the like appear, these terms should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integrated connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to the specific circumstances.

[0049] In the present application, unless otherwise clearly specified and limited, if there is a description that a first feature is "above" or "below" a second feature, etc., or similar descriptions appear, it may mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Moreover, the first feature being "above", "above" and "above" the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. The first feature being "below", "below" and "below" the second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0050] It should be noted that if an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may be a central element. If an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. If any, the terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used in this application are for illustrative purposes only and do not represent the only implementation method.

[0051] Refer to Figure 1, which shows a structural schematic diagram of a femtosecond laser spectrometry parallel processing system 100 in an embodiment of the present application. The femtosecond laser spectrometry parallel processing system 100 provided in an embodiment of the present application includes: a base 120, a laser processing unit 110 disposed on the base 120, and a confocal imaging monitoring unit 130 disposed on the base 120.

[0052] In the above-mentioned femtosecond laser spectrometry parallel processing system 100, the femtosecond laser processing unit 110 includes: a laser 111, a modulation module 112, a laser beam splitting module 113 and a plurality of dimming components arranged on a base 120. The laser 111, the modulation module 112 and the laser beam splitting module 113 are arranged in sequence. The modulation module 112 is used to receive the light beam emitted from the laser 111 and modulate it to output a first basic light beam 140. The laser beam splitting module 113 is used to receive the first basic light beam 140 and split it to output a plurality of second basic light beams 141, and the plurality of dimming components correspond to the plurality of second basic light beams 141 one by one; the dimming component is used to adjust the power, polarization direction and focus of the corresponding second basic light beam 141 to form a processing light beam 142 and output it;

[0053] The confocal imaging monitoring unit 130 includes a confocal imaging module 131 and an optical path switching module 135; multiple processing light beams 142 respectively have irradiation positions on the workpiece 210; by switching the optical path switching module 135, the reflected light at any irradiation position can be selectively transmitted to the confocal imaging module 131.

[0054] When the femtosecond laser spectroscopic parallel processing system 100 is actually used, the laser 111, the modulation module 112, the laser beam splitting module 113 and a plurality of dimming components are first arranged on the base 120 in sequence according to the direction of the light beam emitted by the laser 111. The power, polarization direction and focus of the corresponding second basic light beam 141 are adjusted by the dimming component to obtain a processing light beam 142 and emit it to the workpiece 210. Then, the confocal imaging module 131 and the optical path switching module 135 are arranged according to the direction of the processing light beam 142. The light beam emitted by the laser 111 is modulated by debugging the modulation module 112 to obtain a first basic light beam 140. The first basic light beam 140 is split by the laser beam splitting module 113 to obtain a plurality of second basic light beams 141. At the same time, the confocal imaging module 131 is used to confuse and image with one of the processing light beams 142 to monitor the processing surface during the processing process, and can assist in the modulation of the processing light beam 142 before processing. The optical path switching module 135 is used to control the confocal imaging module 131 to switch between the processing light beams 142 of multiple channels, so that there is no need to configure a set of confocal imaging modules 131 for each processing position of the processing light beam 142 irradiated on the surface to be processed, thereby reducing the system assembly cost and further reducing the processing cost. The above-mentioned femtosecond laser spectroscopic parallel processing system 100 can meet the processing requirements of high stability, low cost, and low optical path complexity. During the processing, it can ensure that the light beam is uniform and stable, and the spectroscopic setting realizes the discrete regulation of the parameters of the multi-channel processing light beam 142 of a single laser 111.

[0055] Referring to FIG. 1 , in one embodiment, the confocal imaging module 131 includes: an illumination light source 133, an imaging unit 134, and a beam combining module 136 disposed on a base 120. The optical path switching module 135 switches the light beam of the illumination light source 133, the beam combining module 136 is used to combine the light beam of the illumination light source 133 with the second basic light beam 141 before passing through the objective lens limiting module 117, and the imaging unit 134 is used to receive the light beam reflected from the surface of the workpiece 210 by the light beam of the illumination light source 133, and the light corresponding to the image of the processing light beam 142 corresponding to the selected second basic light beam 141 on the workpiece 210 is also received by the imaging unit, so that the imaging unit can clearly monitor the processing process of the processing light beam 142 on the workpiece 210, and at the same time ensure the accuracy of the debugging of the processing light beam 142. The beam combining module 136 is a dichroic mirror 172, which can not only reflect the second basic light beam 141, but also allow the light of the illumination light source 133 and the reflected light of the workpiece 210 to pass through the dichroic mirror 172.

[0056] Specifically, a depolarizing beam splitter prism 138 is disposed between the optical path switching module 135 and the illumination light source 133 to reduce wavefront distortion.

[0057] Specifically, the illumination light source 133 is a visible continuous light source, and the imaging unit 134 is a camera or other equipment with imaging functions such as video and photographing, so as to monitor the processing process in real time.

[0058] Specifically, the optical path switching module 135 includes but is not limited to folding mirrors, magnetic bases for switching the top plates equipped with different reflectors 171, and other optical path switching solutions, thereby using a single confocal imaging system to achieve switching monitoring of the processing beams 142 of each channel.

[0059] Preferably, the confocal imaging monitoring unit 130 further includes a terminal 137 , which is connected to the imaging unit 134 and is used to receive the image monitored by the imaging unit 134 .

[0060] In one embodiment, the dimming component includes: a plurality of power control modules 114, a plurality of polarization control modules 115, a plurality of focus modules 116, and a plurality of objective lens limit modules 117, which are arranged in sequence along the propagation direction of the corresponding second basic light beam 141. The above components are all arranged on the base 120. The power control module 114 is used to adjust the power of the corresponding second basic light beam 141, the polarization control module 115 is used to adjust the polarization of the corresponding second basic light beam 141, and the focus module 116 is used to adjust the focus of the corresponding second basic light beam 141 along the first direction. The objective lens limit module 117 is used to adjust the position of the focus of the corresponding second basic light beam 141 along the second direction and the third direction, so that the second basic light beam 141 forms a processing light beam 142. Any two objective lens limit modules 117 are staggered in the second direction and the third direction. The confocal imaging module 131 is used to confocally and image with one of the processing light beams 142, and the optical path switching module 135 is used to control the confocal imaging module 131 to switch between the processing light beams 142 of multiple channels. The first direction is the direction of any point on the light propagation path of the second basic light beam 141, and the first direction, the second direction and the third direction are perpendicular to each other. The power of the corresponding second basic light beam 141 is adjusted by the power control module 114, so that the power of multiple second basic light beams 141 is equal, and the processing light beams 142 at all locations can be processed evenly during processing. The polarization of the corresponding second basic light beam 141 is adjusted by the polarization control module 115 to make the second basic light beam 141 more stable. The focus of the corresponding second basic light beam 141 is adjusted along the first direction by the focusing module 116, and the position of the focus of the corresponding second basic light beam 141 is adjusted along the second direction and the third direction by the objective lens limit module 117, so that the second basic light beam 141 forms a processing light beam 142, which is then irradiated to the surface to be processed of the workpiece 210 to process the workpiece 210, wherein any two objective lens limit modules 117 are staggered in the second direction and the third direction, so that multiple processing light beams 142 will not be collinear, thereby realizing that multiple processing light beams 142 work together, thereby improving processing efficiency.

[0061] 2-3, in one embodiment, the femtosecond laser beam splitting parallel processing system 100 further includes a mounting member 150, and the mounting member 150 is provided with a plurality of mounting holes 151. The objective lens limiting module 117 includes a limiting member 152 and an objective lens body 153, and the objective lens body 153 is disposed on the limiting member 152, and the limiting member 152 has a matching portion 154, and the matching portion 154 is detachably adapted to the mounting hole 151.

[0062] In this embodiment, the mating portion 154 of the limit member 152 can be detachably adapted to the mounting hole 151, so that the objective lens body 153 can be moved by moving the limit member 152, so that the objective lens limit module 117 can be moved relative to the workpiece 210 to a certain extent, thereby being suitable for workpieces 210 of different areas, sizes, and shapes, thereby improving the adaptability of the femtosecond laser spectroscopic parallel processing system 100.

[0063] Specifically, as shown in Figures 4-5, the four objective lens limit modules 117 are respectively arranged along straight lines and inclined to the second direction and the third direction; or they are arranged at the four corners of a parallelogram, and any two of them are inclined to the second direction and the third direction; or two of them are connected to form a line, and the other two are connected to form a line, and the above two lines intersect and are inclined to the second direction and the third direction. Other settings are also possible, which will not be elaborated here.

[0064] Specifically, the inner diameter of the objective lens body 153 is 25.4 mm, and the distance between the centers of two adjacent objective lens bodies 153 along the second direction and the third direction is 30 mm.

[0065] Specifically, in the process of the second moving unit 162 or the third moving unit 163 driving the workpiece 210 to move, for example, the workpiece 210 moves along the second direction and steps along the third direction. Therefore, after the four processing beams 142 are processed, they step forward as a whole by a distance 173 until one of the processing beams 142 reaches one of the paths initially processed, and then directly skips the processing path and continues to step nine step distances 173, as shown in S in Figure 6, to perform the next round of processing.

[0066] Specifically, the limiting portion is provided with a micro-motion mounting bracket to change the position of the objective lens body 153, thereby fine-tuning the positioning and processing position of the objective lens body 153 of each channel. Combined with the large-stroke motion control module 160, different objective lenses can process different areas and the processing times are consistent to meet the processing requirements of functional devices.

[0067] 2-3 , in one embodiment, the femtosecond laser beam splitting parallel processing system 100 further includes a motion control module 160 , and the motion control module 160 includes a first motion unit 161 , a second motion unit 162 , and a third motion unit 163 .

[0068] In one embodiment, the second motion unit 162 is arranged on the third motion unit 163, so that the third motion unit 163 drives the second motion unit 162 to move along the third motion direction, the second motion unit 162 is used to drive the workpiece 210 to move along the second motion direction, and the first motion unit 161 is used to drive the objective lens limit module to move along the first motion direction, and the objective lens limit module and the workpiece can also be adjusted along the first motion direction, the second motion direction and the third motion direction, so as to realize the overall processing of the surface to be processed, so that the femtosecond laser can realize automated processing. In this embodiment, the mounting member is arranged on the first motion unit. The base is equivalent to keeping the third motion unit in a fixed position, and can be in the form of a bracket.

[0069] In another embodiment, the second motion unit 162 is arranged on the third motion unit 163, so that the third motion unit 163 drives the second motion unit 162 to move along the third motion direction, the first motion unit 161 is arranged on the second motion unit 162, so that the second motion unit 162 drives the first motion unit 161 to move along the second motion direction, the first motion unit 161 is used to drive the workpiece 210 to move along the first motion direction, and the processing beam 142 is projected onto the processing surface of the workpiece 210. In this embodiment, the workpiece 210 is driven to move along the first motion direction, the second motion direction and the third motion direction through the relative movement of the first motion, the second motion unit 162 and the third motion unit 163, so that the overall processing of the surface to be processed is achieved by moving the processing workpiece 210 when the processing beam 142 is fixed, so that the femtosecond laser can achieve automated processing.

[0070] The side length of the first motion unit 161 is 0.1 m-1.5 m.

[0071] Specifically, the motion control module 160 as a whole adopts a marble structure and is provided with an air flotation device to achieve a shock-absorbing effect. The displacement accuracy of the first motion unit 161 , the second motion unit 162 and the third motion unit 163 are all 1 um.

[0072] The mounting member 150 may be disposed on the motion control module 160 or may be disposed separately from the motion control module 160 .

[0073] Specifically, the motion control module 160 , the laser processing unit 110 , and the confocal imaging monitoring unit 130 are all disposed on the base 120 , or the motion control module 160 may be disposed alone, and it is only necessary to ensure that the processing beam 142 can be projected to the surface to be processed.

[0074] Specifically, the workpiece 210 includes but is not limited to a black body, a surface anti-reflection device, a surface hydrophobic device, a surface drag reduction device, etc.; the material of the workpiece 210 includes but is not limited to various metals, semiconductors, organic materials, inorganic materials, etc.; the shape of the workpiece 210 includes but is not limited to a cube, a circle, a rectangle, and an irregular shape.

[0075] In one embodiment, the modulation module 112 includes a beam expansion system and a wave plate disposed on the base 120 , and the light beam emitted by the laser 111 passes through the beam expansion system and the wave plate in sequence, thereby obtaining a first basic light beam 140 .

[0076] In one embodiment, the laser beam splitting module 113 includes: a wave plate and a beam splitting device, and the first basic light beam passes through the wave plate and the beam splitting device in sequence to be split into at least two second basic light beams 141 .

[0077] Specifically, the wave plate is a half-wave plate or a quarter-wave plate, the beam splitting device is a polarization beam splitting cube, a polarization beam splitting plate, a non-polarization beam splitting cube or a non-polarization beam splitting plate, and the laser beam splitting module is any combination of the above wave plates and beam splitting devices, all of which are within the protection scope of the present application; the first basic light beam passes through the laser beam splitting module or its subsequent cascade in sequence, thereby being split into at least two second basic light beams.

[0078] Specifically, the number of beam splitting includes but is not limited to 2, 4, 16, etc.

[0079] In one embodiment, the power control module 114 includes a wave plate and a polarization beam splitter disposed on the base 120, the wave plate is used to adjust the polarization state of the second basic light beam 141, and the polarization beam splitter is used to adjust the power of the corresponding second basic light beam 141, so as to make the power of the multi-channel second basic light beam 141 uniform.

[0080] In one embodiment, the polarization control module 115 includes a polarization control device and a movable component disposed on the base 120, and the polarization control device includes: a half-wave plate and / or a quarter-wave plate disposed on the movable component, and the half-wave plate and / or the quarter-wave plate are driven by the movable component to move to control the polarization of the second basic light beam 141.

[0081] In one embodiment, the focusing module 116 includes a fine-tuning component and a fine-tuning lens disposed on the base 120. The fine-tuning lens is disposed on the fine-tuning component. The fine-tuning component drives the fine-tuning lens to move along a first direction to adjust the focus of the corresponding second basic light beam 141 along the first direction.

[0082] Specifically, the fine-tuning lens is the first lens, the objective lens body is the second lens, and the first lens is located on a side of the second lens that is relatively far away from the processing position along the light propagation direction.

[0083] In one embodiment, the femtosecond laser beam splitting parallel processing system 100 further includes a reflector assembly 170 .

[0084] The reflector assembly 170 includes a plurality of reflectors 171, which are arranged on the base 120 and used to change the paths of the light beams of the laser processing unit 110 and the confocal imaging monitoring unit 130, thereby realizing the construction of a three-dimensional optical path. The optical axis direction is fine-tuned through a two-axis optical adjustment frame to realize the construction of a three-dimensional optical path.

[0085] The wavelength of the processing light beam 142 is in the ultraviolet-visible-infrared wide band range, the laser pulse width range is 30fs-900fs, and the laser repetition rate range is 1kHz-10MHz.

[0086] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0087] The above-described embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be construed as limiting the scope of the patent application. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent application shall be subject to the attached claims.

Claims

1. A femtosecond laser beam splitting parallel processing system, characterized in that: The femtosecond laser spectroscopic parallel processing system comprises: a base, a laser processing unit arranged on the base, a confocal imaging monitoring unit arranged on the base, and a reflector assembly arranged on the base; The laser processing unit includes: a laser, a modulation module, a laser beam splitting module, and a plurality of dimming components; The laser, the modulation module, and the laser beam splitting module are arranged in sequence; the modulation module is used to receive the light beam from the laser and modulate it to output a first basic light beam; the laser beam splitting module is used to receive the first basic light beam and split it to output a plurality of second basic light beams; a plurality of dimming components correspond to a plurality of second basic light beams one by one; the dimming component is used to adjust the power, polarization direction, and focus of the corresponding second basic light beam to form a processing light beam and output it; The confocal imaging monitoring unit includes a confocal imaging module and an optical path switching module; the confocal imaging module includes: an illumination light source, an imaging unit and a plurality of beam combining modules; the plurality of beam combining modules correspond one to one with the plurality of second basic light beams; the beam combining module is located on the propagation path of the corresponding second basic light beam; by switching the optical path switching module, any of the beam combining modules can be selectively enabled to receive the light beam emitted from the illumination light source, so that the selected beam combining module combines the corresponding second basic light beam with the light beam emitted by the illumination light source, and the light beam emitted by the illumination light source is irradiated to the irradiation position of the processing light beam corresponding to the corresponding second basic light beam on the workpiece; The multiple processing light beams respectively have irradiation positions on the workpiece; by switching the optical path switching module, the reflected light at the irradiation position corresponding to the selected beam combining module can be propagated to the imaging unit; the reflector assembly includes multiple reflectors, which are arranged on the base and are used to change the paths of the light beams of the laser processing unit and the confocal imaging monitoring unit.

2. The femtosecond laser spectroscopic parallel processing system according to claim 1, characterized in that: The dimming component includes a power control module, a polarization control module, a focus adjustment module and an objective lens limit module which are sequentially arranged along a propagation direction corresponding to the second basic light beam. The power control module is used to adjust the power of the corresponding second basic light beam, the polarization control module is used to adjust the polarization direction of the corresponding second basic light beam, and the focusing module is used to adjust the position of the focus of the corresponding second basic light beam along the first direction; the objective lens limiting module is used to adjust the position of the focus of the corresponding second basic light beam along the second direction and the third direction, so as to output the processing light beam; any two of the objective lens limiting modules are staggered in the second direction and the third direction; The first direction is the direction of any point on the light propagation path of the second basic light beam, and the first direction, the second direction and the third direction are perpendicular to each other.

3. The femtosecond laser spectroscopic parallel processing system according to claim 2, characterized in that: The femtosecond laser beam splitting parallel processing system further comprises a mounting member, wherein the mounting member is provided with a plurality of mounting holes; The objective lens limiting module comprises a limiting member and an objective lens body, wherein the objective lens body is arranged on the limiting member, and the limiting member has a matching portion, and the matching portion is detachably matched with the mounting hole.

4. The femtosecond laser spectroscopic parallel processing system according to claim 3, characterized in that: The femtosecond laser beam splitting parallel processing system further includes a motion control module, and the motion control module includes a first motion unit, a second motion unit and a third motion unit; The second motion unit is arranged on the third motion unit so that the third motion unit drives the second motion unit to move along the third motion direction, the second motion unit is used to drive the workpiece to move along the second motion direction, and the first motion unit is used to drive the objective lens limiting module to move along the first motion direction; the processing light beam is emitted to the processing surface of the workpiece, the first motion direction is the propagation direction of the second basic light beam at the processing location, and the first motion direction, the second motion direction and the third motion direction are perpendicular to each other.

5. The femtosecond laser spectroscopic parallel processing system according to claim 1, characterized in that: The modulation module includes a beam expansion system and a wave plate. The light beam emitted by the laser passes through the beam expansion system and the wave plate in sequence, thereby obtaining the first basic light beam.

6. The femtosecond laser spectroscopic parallel processing system according to claim 1, characterized in that: The laser beam splitting module comprises: a wave plate and a beam splitting device, and the first basic light beam passes through the wave plate and the beam splitting device in sequence to be split into at least two second basic light beams.

7. The femtosecond laser spectroscopic parallel processing system according to claim 2, characterized in that: The power control module includes a wave plate and a polarization beam splitter, the wave plate is used to control the polarization state of the second basic light beam, and the polarization beam splitter is used to adjust the power of the corresponding second basic light beam.

8. The femtosecond laser spectroscopic parallel processing system according to claim 2, characterized in that: The polarization control module includes a polarization control device and a moving component, and the polarization control device includes: a half-wave plate and / or a quarter-wave plate arranged on the moving component, and the half-wave plate and / or the quarter-wave plate are driven by the moving component to move to control the polarization of the second basic light beam.

9. The femtosecond laser spectroscopic parallel processing system according to claim 2, characterized in that: The focusing module includes a fine-tuning component and a fine-tuning lens. The fine-tuning lens is arranged on the fine-tuning component. The fine-tuning component drives the fine-tuning lens to move along the first direction to adjust the position of the focus of the corresponding second basic light beam along the first direction.

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