Semiconductor quartz sand high-temperature and high-pressure purification equipment

Abstract

The invention discloses semiconductor quartz sand high-temperature and high-pressure purification equipment, and relates to the technical field of material processing, the semiconductor quartz sand high-temperature and high-pressure purification equipment comprises a fixed bottom plate and supporting frames fixedly mounted on the two sides of the top of the fixed bottom plate, and rotating seats are fixedly mounted on the tops of the supporting frames; an air injection mechanism and a feeding sealing mechanism are installed at the two ends of the purification barrel body respectively, a sand adding mechanism, an acid outlet and a discharging port are fixedly installed on the outer surface of the purification barrel body respectively, the sand adding mechanism is opposite to the acid outlet and the discharging port, and a gear ring is fixedly connected to the end of the purification barrel body. According to the semiconductor quartz sand high-temperature and high-pressure purification equipment, the steam injection mechanism is used for adding steam into the reaction kettle, the purpose of steam heating is achieved, the spirally-arranged heating pieces can stir internal materials while heating the internal materials, the using effect of the equipment is improved, and the heating efficiency of the equipment is improved.

Description

Technical Field

[0001] The invention relates to the technical field of material processing, in particular to a semiconductor quartz sand high-temperature and high-pressure purification device. Background Art

[0002] In the semiconductor industry, quartz sand is an important raw material, and its purity plays a vital role in the performance of semiconductor products. With the continuous development of semiconductor technology, the purity requirements of quartz sand are getting higher and higher. Traditional quartz sand purification methods often have problems such as low efficiency and unsatisfactory purification effect.

[0003] At present, although there are some quartz sand purification equipment on the market, there are still some shortcomings in practical application. For example, the heating method is single and the heating efficiency is low, which affects the speed and effect of purification; the feeding mechanism is not designed reasonably, which is prone to leakage and affects the sealing and stability of the equipment; at the same time, the use of steam is not sufficient, and efficient steam heating cannot be achieved.

[0004] In order to meet the semiconductor industry's demand for high-purity quartz sand and overcome the shortcomings of existing quartz sand purification equipment, it is imperative to develop a new type of semiconductor quartz sand high-temperature and high-pressure purification equipment. Summary of the invention

[0005] To achieve the above objectives, the present invention is implemented through the following technical solutions: A semiconductor quartz sand high temperature and high pressure purification device, comprising:

[0006] A fixed bottom plate, and support frames fixedly mounted on both sides of the top of the fixed bottom plate, wherein a rotating seat is fixedly mounted on the top of the support frame;

[0007] A purification barrel body, wherein both ends of the purification barrel body are respectively equipped with an air jet mechanism and a material inlet sealing mechanism, and the outer surface of the purification barrel body is respectively fixedly equipped with a sand adding mechanism, an acid outlet and a material outlet, and the sand adding mechanism is arranged opposite to the acid outlet and the material outlet, and the end of the purification barrel body is fixedly connected with a gear ring;

[0008] The jet mechanism is used to add steam into the reactor to achieve the purpose of steam heating;

[0009] The number of the heating elements is several, and the several heating elements are fixedly installed inside the purification barrel and arranged in a spiral shape, and the ends of the heating elements are connected with connecting wires; the spirally arranged heating elements can heat the internal materials while stirring the internal materials, thereby improving the use effect of the device and the heating efficiency of the device.

[0010] The heating element and the jet mechanism are started at the same time, which can improve the heating efficiency to a greater extent;

[0011] The motor is fixedly connected to the middle of the rotating seat, and the output end of the motor is meshed with the gear ring; when the motor is started, the purification barrel body can achieve a rotation effect through the meshing of the gear ring and the output end of the motor.

[0012] Among them, the two rotating seats are rotatably connected with a feed pipe and an air inlet respectively, the purification barrel body is fixedly connected to the air inlet through an injection mechanism, and the purification barrel body is fixedly connected to the feed pipe through a feed sealing mechanism.

[0013] Preferably, a spiral paddle is fixedly connected to the inner wall of the purification barrel, and there are two groups of spiral paddles, each group has two spiral paddles, and the spiral paddles are arranged at the connection between the heating element and the purification barrel. The arrangement of the spiral paddles can prevent the internal material from excessively impacting the heating element, thereby protecting the heating element, and at the same time, the spiral paddles can improve the stirring effect of the internal material.

[0014] Preferably, the sand adding mechanism comprises a feed shell, the feed shell penetrates the purification barrel body and extends to the inner cavity, the feed shell and the purification barrel body are sealed and connected, and a first leakage hole is opened at the bottom of the feed shell.

[0015] Preferably, the top of the feed shell is fixedly connected to a limiting plate, the interior of the feed shell is slidably connected to a built-in leakage shell, the outer surface of the built-in leakage shell is fixedly connected to an external slip ring, a slide groove is provided at the inner wall of the feed shell, and the external slip ring is slidably connected inside the slide groove, and the external slip ring is seal-fitted with the slide groove, a second leakage hole is provided at the bottom of the built-in leakage shell, a sealing plug is fixedly connected to the bottom surface of the built-in leakage shell, the sealing plug is arranged at the interval of the second leakage hole, and the sealing plug is plugged and fitted with the first leakage hole, and the first leakage hole and the second leakage hole are alternately arranged.

[0016] When the staff needs to feed materials, they lift the pulling handle to separate the elastic sealing plug from the feeding shell, and use the air between the second leakage hole and the first leakage hole to achieve the material feeding function; when feeding is not needed, the staff presses down the pulling handle to insert the elastic sealing plug into the feeding shell, wherein the sealing plug can block the first leakage hole to achieve the effect of closing the feeding.

[0017] Preferably, an elastic sealing plug is fixedly connected to the middle of the bottom of the built-in leakage shell, the bottom sealing sleeve of the elastic sealing plug is arranged in the middle of the first leakage hole, the top of the elastic sealing plug is fixedly connected to a pulling handle, the inner diameter of the limit plate is the same as the inner diameter of the built-in leakage shell, the top of the external slip ring is fixedly connected to a first spring, and the end of the first spring away from the external slip ring is fixedly connected to the inner wall of the feed shell.

[0018] When the first spring is set, it is in a stretched state;

[0019] When the staff needs to feed materials and pulls the pull handle, when the elastic sealing plug is pulled out from the feed shell, the first spring is in a stretched state, and will lift the built-in leakage shell faster, causing it to be squeezed with the limit plate, thereby ensuring that when the staff feeds materials, the material will not leak into the gap between the feed shell and the built-in leakage shell, thereby increasing the service life of the device and improving the feeding effect of the device.

[0020] Preferably, the feed sealing mechanism includes a built-in tube sleeve, which is fixedly installed on the inner wall of the feed pipe, and the end of the built-in tube sleeve is fixedly connected to a second spring, and the end of the second spring away from the built-in tube sleeve is fixedly connected to an adapter block, and the outer surface of the adapter block is fixedly connected to an external elastic plug, and the external elastic plug seals and slides on the inner wall of the feed pipe mouth.

[0021] When feeding into the feed pipe, the gas or liquid passes through the built-in pipe sleeve and the second spring, and the gas is squeezed against the adapter block and the external elastic plug, thereby entering the interior of the purification barrel.

[0022] Preferably, a sliding cover plate is fixedly connected to the side of the adapter block away from the second spring, the sliding cover plate is arranged in the inner cavity of the purification barrel body, and a limiting slide block is fixedly connected to the inner wall of the purification barrel body. The edge of the sliding cover plate is slidably adapted to the slide groove of the limiting slide block, and a third leakage hole is opened inside the limiting slide block.

[0023] When gas or liquid enters the purification barrel, the gas or liquid squeezes the sliding cover plate, causing the sliding cover plate to slide. When the sliding cover plate slides to the position of the third leakage hole, the gas or liquid enters the purification barrel through the third leakage hole, thereby achieving the feeding effect.

[0024] The double-layer sealing adapter structure of the sliding cover plate, the limiting slide block, the external elastic plug and the feed pipe can achieve a better tank sealing effect, and no leakage will occur during the working process.

[0025] Preferably, the jet mechanism comprises an air chamber cover, the air chamber cover is fixedly mounted on the inner wall of the purification barrel, a partition cover plate is fixedly connected to the inner wall of the air chamber cover, and jet holes are provided on the surfaces of the partition cover plate and the air chamber cover. The jet holes on the surfaces of the partition cover plate and the air chamber cover are arranged in an annular manner, so that steam can be sprayed into the purification barrel in a more dispersed manner.

[0026] Preferably, an inner convex plug is fixedly connected to the axis of the separation cover plate, and the inner convex plug is extruded and adapted to the air inlet.

[0027] When feeding materials from one side of the air inlet and the feeding pipe, the internal air pressure of the purification barrel is increased;

[0028] Therefore, during the air intake process at the air inlet, the sliding cover plate will slide inside the limiting slide block due to air pressure, thereby achieving a sealing effect. During the air or liquid intake through the feed pipe, the inner convex plug block will block the air inlet due to air pressure, thereby achieving a better sealing effect and improving the sealing of the device.

[0029] Preferably, the heating element comprises a heat transfer tube, both ends of which are fixedly connected with sealing sleeves, the heat transfer tube passes through the purification barrel through the sealing sleeve, the end of the sealing sleeve away from the heat transfer tube is fixedly connected with an adapter disk, the outer surface of the heat transfer tube is provided with a spiral groove, a heating rod is arranged in the space formed by the adapter disk, the heat transfer tube and the sealing sleeve, and the heating rod is electrically connected to the connecting wire.

[0030] The spiral grooves can increase the contact area between the surface of the heat transfer tube and the inner cavity of the purification barrel, thereby achieving a better heat exchange effect.

[0031] The present invention provides a semiconductor quartz sand high temperature and high pressure purification device. It has the following beneficial effects:

[0032] 1. The semiconductor quartz sand high-temperature and high-pressure purification equipment can heat up the internal materials through the spirally arranged heating elements while stirring the internal materials, thereby improving the use effect of the device and the heating efficiency of the device.

[0033] 2. The semiconductor quartz sand high temperature and high pressure purification equipment can achieve a rotation effect by starting the motor, through the meshing effect of the gear ring and the motor output end.

[0034] 3. The semiconductor quartz sand high temperature and high pressure purification equipment can prevent the internal material from excessively impacting the heating element through the setting of the spiral plate, thereby protecting the heating element. At the same time, the spiral plate can improve the stirring effect of the internal material.

[0035] 4. In the semiconductor quartz sand high-temperature and high-pressure purification equipment, when the staff needs to feed materials, they lift the pulling handle to separate the elastic sealing plug from the feeding shell, and use the air between the second leakage hole and the first leakage hole to achieve the material feeding function; when feeding is not needed, the staff presses down the pulling handle to insert the elastic sealing plug into the feeding shell, and the sealing plug can block the first leakage hole to achieve the effect of closing the feeding.

[0036] 5. The semiconductor quartz sand high-temperature and high-pressure purification equipment, when the staff needs to feed materials, pulls the pulling handle and the elastic sealing plug is pulled out from the feed shell. Because the first spring is in a stretched state, it will lift the built-in leakage shell more quickly, so that it is squeezed with the limit plate to ensure that when the staff feeds materials, the material will not leak into the gap between the feed shell and the built-in leakage shell, thereby increasing the service life of the device and improving the feeding effect of the device.

[0037] 6. The semiconductor quartz sand high-temperature and high-pressure purification equipment, when feeding into the feeding pipe, the gas or liquid fed into the feeding pipe passes through the built-in pipe sleeve and the second spring, and the gas is squeezed against the adapter block and the external elastic plug, thereby entering the interior of the purification barrel.

[0038] 7. The semiconductor quartz sand high-temperature and high-pressure purification equipment, when feeding materials at the air inlet and the feed pipe on one side, due to the air pressure inside the purification barrel; therefore, during the air intake process at the air inlet, the sliding cover plate will slide inside the limiting slide block due to the air pressure, thereby achieving a sealing effect. During the air or liquid intake process of the feed pipe, the inner convex plug will block the air inlet due to the air pressure, thereby achieving a better sealing effect and improving the sealing of the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] Figure 1 This is a schematic diagram of the external structure of a semiconductor quartz sand high temperature and high pressure purification device of the present invention;

[0040] Figure 2 It is a schematic side view of the structure of the present invention;

[0041] Figure 3 It is a schematic diagram of the cross section of the structure of the present invention;

[0042] Figure 4 It is a schematic diagram of the structural anatomy of the present invention;

[0043] Figure 5 It is a structural schematic diagram of the sand adding mechanism of the present invention;

[0044] Figure 6 It is a schematic cross-sectional view of the sand adding mechanism structure of the present invention;

[0045] Figure 7 It is a schematic cross-sectional view of the structure of the feed sealing mechanism of the present invention;

[0046] Figure 8 It is a schematic cross-sectional view of the structure of the jet mechanism of the present invention;

[0047] Fig. 9 It is a schematic diagram of the structure of the heating element of the present invention;

[0048] Fig.10 It is a schematic cross-sectional view of the heating element structure of the present invention.

[0049] In the figure: 1, purification barrel; 2, fixed bottom plate; 3, support frame; 4, sand adding mechanism; 41, feed shell; 42, limit plate; 43, first leakage hole; 44, elastic sealing plug; 45, pull handle; 46, sealing plug; 47, external slip ring; 48, first spring; 49, internal leakage shell; 410, second leakage hole; 5, gear ring; 6, rotating seat; 7, feed pipe; 8, motor; 9, air inlet; 10, acid outlet; 11, outlet; 12, spiral plate; 13, connecting guide line; 14, jet mechanism; 141, jet hole; 142, air chamber cover; 143, inner convex plug block; 144, partition cover plate; 15, feed sealing mechanism; 152, built-in pipe sleeve; 153, second spring; 154, adapter block; 155, external elastic plug; 156, sliding cover plate; 157, third leak hole; 158, limit slide block; 16, heating element; 161, sealing sleeve; 162, heat transfer tube; 163, spiral groove; 164, heating rod; 165, adapter disk. DETAILED DESCRIPTION

[0050] The present invention is further described in detail below in conjunction with the accompanying drawings and specific embodiments. The embodiments of the present invention are provided for the purpose of illustration and description, and are not intended to be exhaustive or to limit the present invention to the disclosed forms. Many modifications and variations will be apparent to those of ordinary skill in the art. The embodiments are selected and described in order to better illustrate the principles and practical applications of the present invention, and to enable those of ordinary skill in the art to understand the present invention and thereby design various embodiments with various modifications suitable for specific uses.

[0051] The first embodiment, as Figures 1 to 6 As shown, the present invention provides a technical solution: a semiconductor quartz sand high temperature and high pressure purification device, comprising:

[0052] A fixed base plate 2, and support frames 3 fixedly mounted on both sides of the top of the fixed base plate 2, and a rotating seat 6 fixedly mounted on the top of the support frame 3;

[0053] A purification barrel body 1, with an air jet mechanism 14 and a material inlet sealing mechanism 15 respectively installed at both ends of the purification barrel body 1, a sand adding mechanism 4, an acid outlet 10 and a material outlet 11 respectively fixedly installed on the outer surface of the purification barrel body 1, and the sand adding mechanism 4 is arranged opposite to the acid outlet 10 and the material outlet 11, and a gear ring 5 is fixedly connected to the end of the purification barrel body 1;

[0054] The jet mechanism 14 is used to add steam into the reactor to achieve the purpose of steam heating;

[0055] The heating element 16 is provided in a plurality of pieces and is fixedly mounted inside the purification barrel 1 and arranged in a spiral shape. The ends of the heating elements 16 are connected with connecting wires 13. The spirally arranged heating elements 16 can heat the internal material while stirring the internal material, thereby improving the use effect of the device and the heating efficiency of the device.

[0056] The heating element 16 and the jet mechanism 14 are started simultaneously, which can improve the heating efficiency to a greater extent;

[0057] The motor 8 is fixedly connected to the middle of the rotating seat 6, and the output end of the motor 8 is meshed with the gear ring 5; when the motor 8 is started, the purification barrel body 1 can achieve a rotation effect through the meshing of the gear ring 5 and the output end of the motor 8.

[0058] Among them, the two rotating seats 6 are rotatably connected with the feed pipe 7 and the air inlet 9 respectively, the purification barrel body 1 is fixedly connected to the air inlet 9 through the jet mechanism 14, and the purification barrel body 1 is fixedly connected to the feed pipe 7 through the feed sealing mechanism 15.

[0059] The inner wall of the purification barrel 1 is fixedly connected with a spiral paddle 12, and there are two groups of spiral paddles 12, each group has two spiral paddles, and the spiral paddles 12 are arranged at the connection between the heating element 16 and the purification barrel 1. The arrangement of the spiral paddles 12 can prevent the internal material from excessively hitting the heating element 16, thereby protecting the heating element 16, and at the same time, the spiral paddles 12 can improve the stirring effect of the internal material.

[0060] The sand adding mechanism 4 comprises a feed shell 41 , which penetrates the purification barrel body 1 and extends to the inner cavity, and the feed shell 41 and the purification barrel body 1 are sealed and connected, and a first leakage hole 43 is opened at the bottom of the feed shell 41 .

[0061] The top of the feed shell 41 is fixedly connected to a limiting plate 42, the interior of the feed shell 41 is slidably connected to a built-in leakage shell 49, the outer surface of the built-in leakage shell 49 is fixedly connected to an external slip ring 47, a slide groove is provided at the inner wall of the feed shell 41, and the external slip ring 47 is slidably connected inside the slide groove, and the external slip ring 47 is sealed and adapted to the slide groove, a second leakage hole 410 is provided at the bottom of the built-in leakage shell 49, a sealing plug 46 is fixedly connected to the bottom surface of the built-in leakage shell 49, the sealing plug 46 is arranged at the interval of the second leakage hole 410, and the sealing plug 46 is plugged and adapted to the first leakage hole 43, and the first leakage hole 43 and the second leakage hole 410 are alternately arranged.

[0062] When the staff needs to feed materials, they lift up the pulling handle 45 to separate the elastic sealing plug 44 from the feed shell 41, and use the air between the second leakage hole 410 and the first leakage hole 43 to achieve the material feeding function; when feeding is not needed, the staff presses down the pulling handle 45 to insert the elastic sealing plug 44 into the feed shell 41, wherein the sealing plug 46 can block the first leakage hole 43 to achieve the effect of closing the material feeding.

[0063] An elastic sealing plug 44 is fixedly connected to the middle of the bottom of the built-in leakage shell 49, the bottom sealing sleeve of the elastic sealing plug 44 is arranged in the middle of the first leakage hole 43, the top of the elastic sealing plug 44 is fixedly connected to the pulling handle 45, the inner diameter of the limiting plate 42 is the same as the inner diameter of the built-in leakage shell 49, and the top of the external slip ring 47 is fixedly connected to the first spring 48, and the end of the first spring 48 away from the external slip ring 47 is fixedly connected to the inner wall of the feed shell 41.

[0064] The first spring 48 is in a stretched state when it is set;

[0065] When the staff needs to feed materials and pulls the pull handle 45, when the elastic sealing plug 44 is pulled out from the feed shell 41, the first spring 48 is in a stretched state, and thus will lift the built-in leakage shell 49 faster, causing it to be squeezed with the limiting plate 42 to ensure that when the staff feeds materials, the material will not leak into the gap between the feed shell 41 and the built-in leakage shell 49, thereby increasing the service life of the device and improving the feeding effect of the device.

[0066] The second embodiment is based on the first embodiment. Figures 7 and 8 As shown, the feed sealing mechanism 15 includes an internal tube sleeve 152, which is fixedly installed on the inner wall of the feed pipe 7, and the end of the internal tube sleeve 152 is fixedly connected to a second spring 153, and the end of the second spring 153 away from the internal tube sleeve 152 is fixedly connected to an adapter block 154, and the outer surface of the adapter block 154 is fixedly connected to an external elastic plug 155, and the external elastic plug 155 seals and slides on the inner wall of the mouth of the feed pipe 7.

[0067] When feeding into the feed pipe 7 , the gas or liquid passes through the internal pipe sleeve 152 and the second spring 153 , and the gas is squeezed against the adapter block 154 and the external elastic plug 155 , thereby entering the interior of the purification barrel 1 .

[0068] A sliding cover plate 156 is fixedly connected to the side of the adapter block 154 away from the second spring 153. The sliding cover plate 156 is arranged in the inner cavity of the purification barrel body 1. A limiting slide block 158 is fixedly connected to the inner wall of the purification barrel body 1. The edge of the sliding cover plate 156 is slidably adapted to the slide groove of the limiting slide block 158, and a third leakage hole 157 is opened inside the limiting slide block 158.

[0069] When gas or liquid enters the purification barrel body 1, the gas or liquid squeezes the sliding cover plate 156, causing the sliding cover plate 156 to slide. When the sliding cover plate 156 slides to the position of the third leakage hole 157, the gas or liquid enters the purification barrel body 1 through the third leakage hole 157, thereby achieving the feeding effect.

[0070] The double-layer sealing adaptation structure of the sliding cover plate 156 and the limiting slide block 158, the external elastic plug 155 and the feed pipe 7 can achieve a better tank sealing effect, and there will be no leakage during the working process.

[0071] The jet mechanism 14 includes an air chamber cover 142, which is fixedly mounted on the inner wall of the purification barrel 1, and a partition cover plate 144 is fixedly connected to the inner wall of the air chamber cover 142. The surfaces of the partition cover plate 144 and the air chamber cover 142 are both provided with jet holes 141. The jet holes 141 on the surfaces of the partition cover plate 144 and the air chamber cover 142 are arranged in an annular manner, so that steam can be sprayed into the purification barrel 1 in a more dispersed manner.

[0072] An inner convex plug block 143 is fixedly connected to the axis of the partition cover plate 144 , and the inner convex plug block 143 is pressed and adapted to the air inlet 9 .

[0073] When feeding materials from one side of the air inlet 9 and the feeding pipe 7, the internal air pressure of the barrel 1 is purified;

[0074] Therefore, during the air intake process at the air inlet 9, the sliding cover plate 156 will slide inside the limiting slide block 158 due to air pressure, thereby achieving a sealing effect. During the air or liquid intake process at the feed pipe 7, the inner convex plug block 143 will block the air inlet 9 due to air pressure, thereby achieving a better sealing effect and improving the sealing of the device.

[0075] The third embodiment is based on the first and second embodiments. Figures 9 and 10 As shown, the heating element 16 includes a heat transfer tube 162, both ends of the heat transfer tube 162 are fixedly connected with sealing sleeves 161, the heat transfer tube 162 passes through the purification barrel body 1 through the sealing sleeve 161, and the end of the sealing sleeve 161 away from the heat transfer tube 162 is fixedly connected with an adapter disk 165, and the outer surface of the heat transfer tube 162 is provided with a spiral groove 163, and a heating rod 164 is arranged in the space formed by the adapter disk 165, the heat transfer tube 162 and the sealing sleeve 161, and the heating rod 164 is electrically connected to the connecting wire 13.

[0076] The spiral groove 163 can increase the contact area between the surface of the heat transfer tube 162 and the inner cavity of the purification barrel 1, thereby achieving a better heat exchange effect.

[0077] When in use, the staff first opens the sand adding mechanism 4, adds quartz sand powder into the purification barrel 1, then closes the sand adding mechanism 4, and sequentially adds hydrochloric acid, hydrofluoric acid, pure water and ammonia from the feed pipe 7, starts the motor 8 to rotate the purification barrel 1, and energizes the connecting wire 13 to heat the heating rod 164. During the continuous rotation, heating steam is added to the purification barrel 1 from the air inlet 9, and finally the acid outlet 10 and the material outlet 11 are opened to discharge the material;

[0078] The staff lifts the pull handle 45 to let the quartz sand powder enter the purification barrel 1 through the second leakage hole 410 and the first leakage hole 43;

[0079] After the addition is completed, the pull handle 45 is pressed down so that the elastic sealing plug 44 and the sealing plug 46 are sealed and inserted into the first leakage hole 43, thereby achieving the function of sealing the purification barrel body 1.

[0080] When gas or liquid enters the feed pipe 7, the gas or liquid pushes the adapter block 154 and the external elastic plug 155 into the purification barrel body 1, and the sliding cover plate 156 slides due to the thrust of the adapter block 154. When the sliding cover plate 156 slides, the gas or liquid enters the middle cavity of the purification barrel body 1 through the third leakage hole 157.

[0081] Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field and related fields without creative work should fall within the scope of protection of the present invention. The structures, devices and operating methods not specifically described and explained in the present invention are implemented according to the conventional means in the field unless otherwise specified and limited.

Claims

1. A semiconductor quartz sand high temperature and high pressure purification equipment, characterized in that: include: A fixed base plate (2), and support frames (3) fixedly mounted on both sides of the top of the fixed base plate (2), wherein a rotating seat (6) is fixedly mounted on the top of the support frame (3); A purification barrel (1), wherein both ends of the purification barrel (1) are respectively provided with an air injection mechanism (14) and a material inlet sealing mechanism (15); a sand adding mechanism (4), an acid outlet (10) and a material outlet (11) are respectively fixedly installed on the outer surface of the purification barrel (1), and the sand adding mechanism (4) is arranged opposite to the acid outlet (10) and the material outlet (11); and a gear ring (5) is fixedly connected to the end of the purification barrel (1); A heating element (16), wherein the number of the heating elements (16) is plural, and the plurality of the heating elements (16) are fixedly installed inside the purification barrel (1) and arranged in a spiral shape, and the ends of the heating elements (16) are all connected to connecting wires (13); A motor (8), wherein the motor (8) is fixedly connected to the middle of the rotating seat (6), and an output end of the motor (8) is meshed with the gear ring (5); The two rotating seats (6) are rotatably connected with a feed pipe (7) and an air inlet (9) respectively, the purification barrel body (1) is fixedly connected to the air inlet (9) via an injection mechanism (14), and the purification barrel body (1) is fixedly connected to the feed pipe (7) via a feed sealing mechanism (15).

2. The semiconductor quartz sand high temperature and high pressure purification equipment according to claim 1, characterized in that: A spiral paddle (12) is fixedly connected to the inner wall of the purification barrel (1), and the spiral paddles (12) are provided in two groups, each group having two spiral paddles. The spiral paddles (12) are provided at the connection between the heating element (16) and the purification barrel (1).

3. The semiconductor quartz sand high temperature and high pressure purification equipment according to claim 1, characterized in that: The sand adding mechanism (4) comprises a feed shell (41), the feed shell (41) penetrates the purification barrel body (1) and extends to the inner cavity, and the feed shell (41) and the purification barrel body (1) are sealed and connected, and a first leakage hole (43) is opened at the bottom of the feed shell (41).

4. The semiconductor quartz sand high temperature and high pressure purification equipment according to claim 3, characterized in that: The top of the feed shell (41) is fixedly connected to a limiting plate (42), the interior of the feed shell (41) is slidably connected to a built-in leakage shell (49), the outer surface of the built-in leakage shell (49) is fixedly connected to an external slip ring (47), a sliding groove is provided at the inner wall of the feed shell (41), and the external slip ring (47) is slidably connected inside the sliding groove, and the external slip ring (47) is sealed and matched with the sliding groove, a second leakage hole (410) is provided at the bottom of the built-in leakage shell (49), and a sealing plug (46) is fixedly connected to the bottom surface of the built-in leakage shell (49), the sealing plug (46) is arranged at the interval of the second leakage hole (410), and the sealing plug (46) is plugged and matched with the first leakage hole (43).

5. The semiconductor quartz sand high temperature and high pressure purification equipment according to claim 4, characterized in that: An elastic sealing plug (44) is fixedly connected to the middle of the bottom of the built-in leakage shell (49), the bottom sealing sleeve of the elastic sealing plug (44) is arranged in the middle of the first leakage hole (43), the top of the elastic sealing plug (44) is fixedly connected to a pulling handle (45), the inner diameter of the limit plate (42) is the same as the inner diameter of the built-in leakage shell (49), the top of the external slip ring (47) is fixedly connected to a first spring (48), and one end of the first spring (48) away from the external slip ring (47) is fixedly connected to the inner wall of the feed shell (41).

6. The semiconductor quartz sand high temperature and high pressure purification equipment according to claim 1, characterized in that: The feed sealing mechanism (15) comprises an internal pipe sleeve (152), the internal pipe sleeve (152) being fixedly mounted on the inner wall of the feed pipe (7), the end of the internal pipe sleeve (152) being fixedly connected to a second spring (153), the end of the second spring (153) away from the internal pipe sleeve (152) being fixedly connected to an adapter block (154), the outer surface of the adapter block (154) being fixedly connected to an external elastic plug (155), the external elastic plug (155) sealingly sliding on the inner wall of the pipe opening of the feed pipe (7).

7. The semiconductor quartz sand high temperature and high pressure purification equipment according to claim 6, characterized in that: A sliding cover plate (156) is fixedly connected to the side of the adapter block (154) away from the second spring (153), and the sliding cover plate (156) is arranged in the inner cavity of the purification barrel body (1). A limiting slide block (158) is fixedly connected to the inner wall of the purification barrel body (1), and the edge of the sliding cover plate (156) is slidably adapted to the slide groove of the limiting slide block (158), and a third leakage hole (157) is opened inside the limiting slide block (158).

8. The semiconductor quartz sand high temperature and high pressure purification equipment according to claim 1, characterized in that: The jet mechanism (14) comprises an air chamber cover (142), wherein the air chamber cover (142) is fixedly mounted on the inner wall of the purification barrel (1), a partition cover plate (144) is fixedly connected to the inner wall of the air chamber cover (142), and jet holes (141) are provided on the surfaces of the partition cover plate (144) and the air chamber cover (142).

9. The semiconductor quartz sand high temperature and high pressure purification equipment according to claim 8, characterized in that: An inner convex plug block (143) is fixedly connected to the axis of the partition cover plate (144), and the inner convex plug block (143) is pressed and matched with the air inlet (9).

10. The semiconductor quartz sand high temperature and high pressure purification equipment according to claim 1, characterized in that: The heating element (16) comprises a heat transfer tube (162), both ends of which are fixedly connected to sealing sleeves (161), the heat transfer tube (162) passes through the purification barrel (1) through the sealing sleeve (161), one end of the sealing sleeve (161) away from the heat transfer tube (162) is fixedly connected to an adapter disk (165), the outer surface of the heat transfer tube (162) is provided with a spiral groove (163), a heating rod (164) is arranged in the space formed by the adapter disk (165), the heat transfer tube (162) and the sealing sleeve (161), and the heating rod (164) is electrically connected to the connecting wire (13).

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