Manufacturing process of low-reflection vehicle-mounted display screen

Abstract

The invention provides a low-reflection vehicle-mounted display screen manufacturing process which is different from traditional vehicle-mounted screen low-reflection manufacturing, and the traditional process mainly reduces the reflectivity of a vehicle-mounted screen through cooperation of a polaroid, an adhesive layer, a transparent conductive layer and a light filter plate so as to improve the display effect. Adjustment is carried out through special optical film layer superposition design and individual process exchange according to the magnetron sputtering principle, the sample piece finally completes matching with a client to provide the FOG screen and the AR cover plate with the reflectivity of 2.17 after the FOG screen and the AR cover plate are attached, the standard Re is smaller than 2.5, the main protection point is provided with each film layer structure of the low-reflection technology of the vehicle-mounted display screen, and the vehicle-mounted display screen can be used for the vehicle-mounted display screen. According to the technical characteristics such as the FOG / LCM screen and the AR cover plate, the FOG / LCM screen and the AR cover plate are attached to a client side, the reflectivity is obviously reduced, bridge points are slightly visible, interference of ambient light is effectively reduced, the definition of images is improved, screen reflection is reduced, images are clearer and more vivid, and a driver can enjoy a better visual effect.

Description

Technical Field

[0001] The invention mainly relates to the field of display screen manufacturing, and in particular to a low-reflection vehicle-mounted display screen manufacturing process. Background Art

[0002] With the accelerated development of automobile intelligence, in-vehicle displays are developing towards large size, multi-screen, high-definition, interactive, and multi-format, and higher requirements are also placed on display performance, including high contrast, low reflectivity, wide viewing angle, high brightness, touch, and fast response, etc. Since vehicles are often used in high-brightness environments, the strength of the display's anti-reflection properties directly affects the customer's experience. For displays with good anti-reflection performance, people see clearer images and more vivid colors, while for displays with poor anti-reflection performance, the images become unclear and the colors are not bright. Through special optical design, our company can effectively reduce the interference of ambient light, improve the clarity of the picture, reduce screen reflections, make the image clearer and more realistic, and let the driver enjoy better visual effects.

[0003] At present, we debugged according to the existing conventional conditions, and then laminated the FOG screen and AR cover provided by the customer. According to the industry standard Re (reflectivity) ≤3, the actual result is about 3.17, which cannot meet the customer's requirement Re<2.5. Under the current pressure, we made the following adjustments: If the original process remains unchanged, ITO will choose high resistance, so that the reflectivity of the process is the lowest. However, after the SINX film is plated, the reflectivity will increase, so this solution is not feasible. Increase the IM2 film thickness and adjust the IM2 film layer from the original SINX to SIO2. The IM2 film thickness is increased from 800 angstroms to 1000 angstroms. The reflectivity of the single sensor is reduced, but the etching marks are obvious and the image elimination effect is poor. This solution is not feasible. While the process of the graphic surface remains unchanged, an SIO2 process is added to the non-graphic surface. The film thickness is 1000A. The reflectivity of the single sensor decreases, but the film color turns blue after bonding, and the reflectivity increases. This solution is not feasible. The graphic surface uses full-surface OC instead of partial OC. The reflectivity of the single sensor and after bonding is reduced, but the film color is blue, so this solution is not feasible.

[0004] The inventor proposed a low-reflection vehicle display manufacturing process, which reduces the reflectivity of a single sensor by adopting special film layer stacking and optical design. The reflectivity of the finished product is significantly reduced after the FOG / LCM screen + AR cover is bonded together, and the bridge point is slightly visible, which effectively reduces the interference of ambient light, improves the clarity of the picture, reduces screen reflection, makes the image clearer and more realistic, and allows the driver to enjoy better visual effects. Summary of the invention

[0005] 1. Problems to be solved by the invention: The present invention provides a low-reflection vehicle-mounted display screen manufacturing process, which is used to solve the technical problem of high reflectivity of the existing vehicle-mounted display screen mentioned in the above background technology.

[0006] 2. Technical solution: To achieve the above object, the technical solution provided by the present invention is: a low-reflection vehicle display screen manufacturing process, comprising the following steps: The bottom layer of shadow-eliminating IM1+ITO1 film is sputtered on the cleaned original glass substrate.

[0007] The entire surface of ITO1 is coated with photoresist, and then pre-cleaning, pre-baking, exposure, development, post-baking, etching, and stripping are performed in sequence to complete the production of ITO bridge points.

[0008] The entire surface is coated with OC photoresist, and then pre-cleaning, pre-baking, exposure, development, and post-baking are performed in sequence to form an OC1 film.

[0009] Then a layer of ITO film, namely ITO2, is sputtered on the entire surface.

[0010] The entire surface of the ITO film is coated with photoresist, and then the ITO Pattern is produced after cleaning, pre-baking, exposure, development, post-baking, etching, and stripping. The ITO pattern covers the entire window area.

[0011] The entire surface is sputtered with MOALMO film layers in sequence to form a metal layer.

[0012] The entire surface of the metal is coated with photoresist and then cleaned, pre-baked, exposed, developed, post-baked, etched, and stripped to complete the production of metal wires and gold fingers.

[0013] The entire surface is sputtered with a layer of Sionx anti-shadow film.

[0014] Then the entire surface of ITO, namely the Shieldito film layer, is sputtered from the other side of the substrate.

[0015] After coating the ShieldITO film layer, a layer of Sionx film is coated immediately, and then OC material is coated on the graphic surface, that is, local OC, the purpose is to protect the metal wires and gold fingers from oxidation. The OC film thickness is 1.8~2.2μm.

[0016] Furthermore, the shadow-eliminating IM1+ITO1 film layer is composed of Sinx+Sio2, wherein SINX is 200~400 angstroms, the SIO2 film thickness is 200~500 angstroms, the ITO1 film layer has a resistance of 15Ω, a film thickness of 1100~1600 angstroms, and a coating temperature of 200~300°C; when Sinx is coated, 300~450sccm argon and 250~350sccm nitrogen are introduced, and the power is 10~16kw; when Sio2 is coated, 100~200sccm argon and 100~200sccm oxygen are introduced, and the power is 18~25kw; when ITO1 is coated, 350~500sccm argon and 6.0~10.0sccm oxygen are introduced, and the power is 18~22kw.

[0017] Furthermore, the OC1 film only covers the ITO bridge points, and the OC1 film thickness is 1.4-1.8 μm.

[0018] Furthermore, the resistance of the ITO2 film layer is 30Ω. When the ITO2 film layer is sputtered, the coating temperature is 200-250°C, 350-500sccm argon gas and 6.0-10.0sccm oxygen gas are introduced, and the power is 15-20kw.

[0019] Furthermore, the metal layer has a resistance of 0.18-0.35Ω and a film thickness of 2600-3800 angstroms. When the metal is sputtered, the coating temperature is 75-175°C, and 200-350 sccm of argon and 20-100 sccm of oxygen are introduced.

[0020] Furthermore, the Sionx shadow elimination film layer has a film thickness of 600 to 900 angstroms, a coating temperature of 180 to 230° C., and is fed with 150 to 300 sccm argon, 40 to 100 sccm oxygen, and 200 to 300 sccm nitrogen, with a power of 30 to 35 kW.

[0021] Furthermore, the Shieldito film layer plays a shielding and heating role, the coating temperature is 150-250°C, the ITO resistance is 90-120Ω, 350-500sccm argon, 1.0-3.0sccm oxygen, and the power is 1.5-3.5kw.

[0022] Furthermore, the Sionx film layer mainly further reduces the reflectivity, has a film thickness of 900 to 1300 angstroms, a coating temperature of 180 to 230° C., introduces 100 to 150 sccm argon, 40 to 60 sccm oxygen, 240 to 300 sccm nitrogen, and a power of 40 to 55 kW.

[0023] Furthermore, the production process of a single sensor is as follows: Glass→IMITO1 coating (A side)→IMITO1 development and etching→OC1 development→ITO2 coating→ITO2 development and etching→Metal coating→Metal development and etching→Sionx coating (A side)→ShieldITO coating (B side)→Sionx coating (B side)→Passivation development (A side); in: The resistance value of ITO1 is adjusted from 30~75Ω to 15Ω, and the bridge point is less obvious. After bonding, the bridge point is obviously reduced visually; The ITO2 resistance value is adjusted from the original 75~100Ω to 30Ω. The reflectivity is the lowest after the Sionx film is superimposed. The non-graphic surface is changed from SIO2 process to Sionx process, in order to further reduce the reflectivity after bonding; The partial OC of the graphic surface will replace the whole surface OC in the subsequent process, in order to improve the b value of the VA area and avoid the blue color of the film after bonding; The original non-graphic surface Sionx process was changed to first local OC and then non-graphic surface Sionx. The purpose is to avoid the change of product reflectivity b value during local OC hard baking.

[0024] 3. Beneficial effects: Compared with the prior art, the technical solution provided by the present invention has the following beneficial effects: The present invention provides a low-reflection vehicle-mounted display manufacturing process. After the client uses FOG / LCM screen + AR cover plate for bonding, the reflectivity is significantly reduced, and the bridge point is slightly visible, which effectively reduces the interference of ambient light, improves the clarity of the picture, reduces screen reflection, makes the image clearer and more realistic, and allows the driver to enjoy a better visual effect.

[0025] The parts not involved in the device are the same as those in the prior art or can be implemented by using the prior art. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 The non-graphic surface of the present invention is replaced by the Sionx process SIO2 process parameter diagram; Figure 2 The parameter diagram of the graphic surface of the present invention is that the whole OC is replaced by the local OC; Figure 3 It is a parameter diagram of the non-graphic surface Sionx process and the graphic surface local OC process swapping of the present invention; Figure 4 It is a schematic diagram of the product structure of the present invention; Figure 5 It is a schematic diagram of the module structure of the present invention; Figure 6is a process flow chart of the present invention; Figure 7 The figure is a schematic diagram of the production process of a monomer sensor with a novel structure according to the present invention. DETAILED DESCRIPTION

[0027] To facilitate understanding of the present invention, the present invention will be described more comprehensively below with reference to the relevant drawings. Several embodiments of the present invention are shown in the drawings. However, the present invention can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present invention more thorough and comprehensive.

[0028] It should be noted that when an element is referred to as being "fixed on" another element, it may be directly on the other element or there may also be a central element; when an element is considered to be "connected to" another element, it may be directly connected to the other element or there may also be a central element; the terms "vertical", "horizontal", "left", "right" and similar expressions used in this article are for illustrative purposes only.

[0029] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by technicians in the technical field to which the present invention belongs; the terms used in the specification of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention; the term "and / or" used herein includes any and all combinations of one or more related listed items. Example

[0030] Reference Figure 1-7 , a low-reflection vehicle display manufacturing process, comprising the following steps: The bottom layer of shadow-eliminating IM1+ITO1 film is sputtered on the cleaned original glass substrate.

[0031] The entire surface of ITO1 is coated with photoresist, and then pre-cleaning, pre-baking, exposure, development, post-baking, etching, and stripping are performed in sequence to complete the production of ITO bridge points.

[0032] The entire surface is coated with OC photoresist, and then pre-cleaning, pre-baking, exposure, development, and post-baking are performed in sequence to form an OC1 film.

[0033] Then a layer of ITO film, namely ITO2, is sputtered on the entire surface.

[0034] The entire surface of the ITO film is coated with photoresist, and then the ITO Pattern is produced after cleaning, pre-baking, exposure, development, post-baking, etching, and stripping. The ITO pattern covers the entire window area.

[0035] The entire surface is sputtered with MOALMO film layers in sequence to form a metal layer.

[0036] The entire surface of the metal is coated with photoresist and then cleaned, pre-baked, exposed, developed, post-baked, etched, and stripped to complete the production of metal wires and gold fingers.

[0037] The entire surface is sputtered with a layer of Sionx anti-shadow film.

[0038] Then the entire surface of ITO, namely the Shieldito film layer, is sputtered from the other side of the substrate.

[0039] After coating the ShieldITO film layer, a layer of Sionx film is coated immediately, and then OC material is coated on the graphic surface, that is, local OC, the purpose is to protect the metal wires and gold fingers from oxidation. The OC film thickness is 1.8~2.2μm.

[0040] In this embodiment, the shadow elimination IM1+ITO1 film layer is composed of Sinx+Sio2, wherein the SINX film thickness is 200~280 angstroms, the SIO2 film thickness is 200~300 angstroms, the ITO1 film layer has a resistance of 15Ω, a film thickness of 1200~1600 angstroms, and a coating temperature of 200~250°C; when Sinx is coated, 340~370sccm argon and 270~320sccm nitrogen are introduced, and the power is 10~16kw; when Sio2 is coated, 100~140sccm argon and 150~180sccm oxygen are introduced, and the power is 18~25kw; when ITO1 is coated, 400~440sccm argon and 7.0~10.0sccm oxygen are introduced, and the power is 18~22kw.

[0041] In this embodiment, the OC1 film only covers the ITO bridge points, and the OC1 film thickness is 1.4-1.8 μm.

[0042] In this embodiment, the resistance of the ITO2 film layer is 30Ω. When the ITO2 film layer is sputtered, the coating temperature is 220-250°C, 400-440sccm argon gas and 6.0-8.0sccm oxygen gas are introduced, and the power is 15-18kw.

[0043] In this embodiment, the resistance of the metal layer is 0.25-0.35Ω, the film thickness is 2600-3200 angstroms, and when the metal is sputtered, the coating temperature is 75-175°C, and 240-300 sccm argon and 20-50 sccm oxygen are introduced.

[0044] In this embodiment, the Sionx shadow elimination film layer has a thickness of 600 to 900 angstroms, a coating temperature of 180 to 230°C, 100 to 150 sccm of argon, 40 to 60 sccm of oxygen, and 240 to 300 sccm of nitrogen, and a power of 30 to 35 kW.

[0045] In this embodiment, the Shieldito film layer plays a shielding and heating role, the coating temperature is 220-250° C., the ITO resistance is 90-120Ω, 400-440 sccm argon and 1.0-3.0 sccm oxygen are introduced, and the power is 2-3 kW.

[0046] In this embodiment, the Sionx film layer is mainly used to further reduce the reflectivity. The film thickness is 900-1300 angstroms, the coating temperature is 180-230°C, 150-300 sccm argon, 40-100 sccm oxygen, 200-300 sccm nitrogen are introduced, and the power is 40-55 kw.

[0047] In this embodiment, the production process of a single sensor is also as follows: Glass→IMITO1 coating (A side)→IMITO1 development and etching→OC1 development→ITO2 coating→ITO2 development and etching→Metal coating→Metal development and etching→Sionx coating (A side)→ShieldITO coating (B side)→Sionx coating (B side)→Passivation development (A side); in: The resistance value of ITO1 is adjusted from 30~75Ω to 15Ω, and the bridge point is less obvious. After bonding, the bridge point is obviously reduced visually; The ITO2 resistance value is adjusted from the original 75~100Ω to 30Ω. The reflectivity is the lowest after the Sionx film is superimposed. The non-graphic surface is changed from SIO2 process to Sionx process, in order to further reduce the reflectivity after bonding; The partial OC of the graphic surface will replace the whole surface OC in the subsequent process, in order to improve the b value of the VA area and avoid the blue color of the film after bonding; The original non-graphic surface Sionx process was changed to first local OC and then non-graphic surface Sionx. The purpose is to avoid the change of product reflectivity b value during local OC hard baking.

[0048] In this embodiment: The main key point of this invention is that it is different from the traditional low-reflection production of vehicle-mounted screens. The traditional process mainly reduces the reflectivity of the vehicle-mounted screen to improve the display effect through the combination of polarizers, adhesive layers, transparent conductive layers and filter plates. The magnetron sputtering principle is adjusted through special optical film layer superposition design and individual process replacement. The sample is finally completed with the customer-provided FOG screen and AR cover plate. The reflectivity is 2.17 after bonding, reaching the standard Re <2.5. Its main protection points include the low-reflection technology of the vehicle display screen and the film layer structure, as well as the low-reflection process adjustment method, each process parameter, size, angle and other technical features.

[0049] For the convenience of explanation, this specification provides a detailed description and combination of the various technical features of the low-reflection vehicle display screen of the present invention in combination with the embodiments. It can also be used for glass surface microstructure processing for other purposes. As long as the processing of various products is carried out using the method concept and technical solution of the present invention, it is within the protection scope of the present invention.

[0050] At the same time, the above-mentioned embodiments only express a certain implementation method of the present invention, and the description thereof is relatively specific and detailed, but it cannot be understood as limiting the scope of the patent of the present invention; it should be pointed out that for ordinary technicians in this field, several modifications and improvements can be made without departing from the concept of the present invention, which all belong to the protection scope of the present invention; therefore, the protection scope of the patent of the present invention shall be based on the attached claims.

Claims

1. A low-reflection vehicle display manufacturing process, characterized in that: The steps include: The bottom layer of shadow-eliminating IM1+ITO1 film is sputtered on the cleaned original glass substrate; Complete the photoresist coating on the entire surface of ITO1, and then go through pre-cleaning, pre-baking, exposure, development, post-baking, etching, and stripping in sequence to complete the ITO bridge point production; The entire surface is coated with OC photoresist, and then pre-cleaning, pre-baking, exposure, development, and post-baking are performed in sequence to form an OC1 film; Then a layer of ITO film, i.e. ITO2, is sputtered on the entire surface; Complete the photoresist coating on the surface of ITO film, and then go through cleaning, pre-baking, exposure, development, post-baking, etching, and film stripping to complete the ITO Pattern production. The ITO pattern covers the entire window area. The entire surface is sputtered with MOALMO film layers in sequence to form a metal layer; The entire surface of the metal is coated with photoresist, and then cleaned, pre-baked, exposed, developed, post-baked, etched, and stripped to complete the production of metal wires and gold fingers; The entire surface is sputtered with a layer of Sionx anti-shadow film; Then, the entire surface of ITO, i.e., Shieldito film layer, is sputtered from the other side of the substrate; After coating the ShieldITO film layer, a layer of Sionx film is coated immediately, and then OC material is coated on the graphic surface, that is, local OC, the purpose is to protect the metal wires and gold fingers from oxidation. The OC film thickness is 1.8~2.2μm.

2. The low-reflection vehicle display manufacturing process according to claim 1, characterized in that: The shadow-eliminating IM1+ITO1 film layer is composed of Sinx+Sio2, wherein the SINX film thickness is 200-400 angstroms, the SIO2 film thickness is 200-500 angstroms, the ITO1 film layer has a resistance of 15Ω, a film thickness of 1100-1600 angstroms, and a coating temperature of 200-300°C; when Sinx is coated, 300-450sccm argon and 250-350sccm nitrogen are introduced, with a power of 10-16kw; when Sio2 is coated, 100-200sccm argon and 100-200sccm oxygen are introduced, with a power of 18-25kw; when ITO1 is coated, 350-500sccm argon and 6.0-10.0sccm oxygen are introduced, with a power of 18-22kw.

3. The low-reflection vehicle display manufacturing process according to claim 1, characterized in that: The OC1 film only covers the ITO bridge points, and the thickness of the OC1 film is 1.4-1.8 μm.

4. The low-reflection vehicle display manufacturing process according to claim 1, characterized in that: The resistance value of the ITO2 film layer is 30Ω. When the ITO2 film layer is sputtered, the coating temperature is 200-250°C, 350-500sccm argon gas and 6.0-10.0sccm oxygen gas are introduced, and the power is 15-20kw.

5. The low-reflection vehicle display manufacturing process according to claim 1, characterized in that: The resistance of the metal layer is 0.18-0.35Ω, and the film thickness is 2600-3800 angstroms. When the metal is sputtered, the coating temperature is 75-175°C, and 200-350sccm argon and 20-100sccm oxygen are introduced.

6. The low-reflection vehicle display manufacturing process according to claim 1, characterized in that: The Sionx shadow elimination film layer has a film thickness of 600 to 900 angstroms, a coating temperature of 180 to 230°C, and is fed with 150 to 300 sccm argon, 40 to 100 sccm oxygen, and 200 to 300 sccm nitrogen, with a power of 30 to 35 kW.

7. The low-reflection vehicle display manufacturing process according to claim 1, characterized in that: The Shieldito film layer plays a shielding and heating role. The coating temperature is 150-250° C., the ITO resistance is 90-120Ω, 350-500sccm argon gas and 1.0-3.0sccm oxygen gas are introduced, and the power is 1.5-3.5kw.

8. The low-reflection vehicle display manufacturing process according to claim 1, characterized in that: The Sionx film layer mainly further reduces the reflectivity, with a film thickness of 900 to 1300 angstroms, a coating temperature of 180 to 230°C, 150 to 300 sccm argon, 40 to 100 sccm oxygen, and 200 to 300 sccm nitrogen, and a power of 47 to 52 kW.

9. The low-reflection vehicle display manufacturing process according to claim 1, characterized in that: The production process of the single sensor is as follows: Glass→IMITO1 coating (A side)→IMITO1 development and etching→OC1 development→ITO2 coating→ITO2 development and etching→Metal coating→Metal development and etching→Sionx coating (A side)→ShieldITO coating (B side)→Sionx coating (B side)→Passivation development (A side); in: The resistance value of ITO1 is adjusted from 30~75Ω to 15Ω, and the bridge point is less obvious. After bonding, the bridge point is obviously reduced visually; The ITO2 resistance value is adjusted from the original 75~100Ω to 30Ω. The reflectivity is the lowest after the Sionx film is superimposed. The non-graphic surface is changed from SIO2 process to Sionx process, in order to further reduce the reflectivity after bonding; The partial OC of the graphic surface will replace the whole OC in the subsequent process, in order to improve the b value of the VA area and avoid the blue color of the film after bonding; The original non-graphic surface Sionx process was changed to first local OC and then non-graphic surface Sionx. The purpose is to avoid the change of product reflectivity b value during local OC hard baking.

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