Remote plasma source cavity

Abstract

The invention belongs to the technical field of plasma production equipment, and discloses a remote plasma source cavity which comprises an annular vacuum cavity, an air inlet, an air outlet, a magnetic core assembly and an ignition coil. The annular vacuum cavity comprises a plurality of linear cavity channels which are sequentially connected end to end to form a closed-loop flow channel, the magnetic core assembly is wound on at least one linear cavity channel, and the air inlet and the air outlet are connected to the two different linear cavity channels respectively; an adjusting electrode pair is arranged at the joint of any two adjacent linear cavity channels, and the adjusting electrode pair is used for generating a deflection electric field to drive charged particles in airflow to turn so as to prevent the charged particles from being in contact with the circumferential side wall of the annular vacuum cavity; the service life of the cavity can be prolonged, the plasma purity is improved, and the plasma uniformity and stability are improved.

Description

Technical Field

[0001] The present application relates to the technical field of plasma generation equipment, and in particular to a remote plasma source chamber. Background Art

[0002] The remote plasma source chamber is an important device for generating plasma, and is widely used in chamber cleaning, surface modification, thin film etching, plasma-assisted deposition and other process links in the fields of semiconductor manufacturing and display panel production. Existing remote plasma source chambers usually use alternating magnetic fields to ionize fluorine-containing compounds to generate active fluoride ion gas. Its basic structure includes an annular vacuum chamber, an air inlet, an air outlet, a magnetic core assembly and an ignition coil.

[0003] An oxide protective film is usually provided on the inner wall surface of the annular vacuum chamber, and the magnetic core assembly is wound around the outside of the annular vacuum chamber. The air inlet and the air outlet are connected to the annular vacuum chamber, and the ignition coil is provided at the air inlet. During operation, the air inlet inputs working gas, including excitation gas (such as argon) and process gas (such as nitrogen trifluoride). The ignition coil excites and ignites the excitation gas, and the magnetic core assembly generates an alternating magnetic field to ionize the process gas, forming a plasma gas flow (such as an active fluoride ion gas flow), which is finally output from the air outlet.

[0004] However, the existing remote plasma source chamber has some technical defects. First, the common annular vacuum chamber is mostly rectangular, with a large turning angle at the corner. When the airflow turns, it is easy to rub and collide with the inner wall of the chamber due to inertia. This causes the active fluoride ion gas to directly contact and corrode the oxide protective film on the inner wall, seriously affecting the service life of the chamber. Secondly, the reaction of the active fluoride ion gas with the oxide protective film will produce particulate dust, which reduces the purity of the plasma.

[0005] These problems not only reduce the efficiency and service life of the remote plasma source chamber, but also affect the quality and consistency of the plasma processing process. Especially in the field of semiconductor manufacturing with high process requirements, these defects may lead to reduced product yield and increased costs.

[0006] In view of the above problems, the existing technology needs to be improved urgently. Summary of the invention

[0007] The purpose of the present application is to provide a remote plasma source chamber, which can extend the service life of the chamber, increase the purity of plasma, and improve the uniformity and stability of plasma.

[0008] The present application provides a remote plasma source cavity, comprising an annular vacuum cavity, an air inlet, an air outlet, a magnetic core assembly and an ignition coil; the annular vacuum cavity comprises a plurality of straight cavities which are sequentially connected end to end to form a closed-loop flow channel, the magnetic core assembly is wound around at least one of the straight cavities, the air inlet and the air outlet are respectively connected to two different straight cavities; an adjustment electrode pair is provided at the connection between any two adjacent straight cavities, the adjustment electrode pair is used to generate a deflection electric field to drive the charged particles in the airflow to turn so as to avoid the charged particles from contacting the circumferential side wall of the annular vacuum cavity.

[0009] By adjusting the deflection electric field generated by the electrode pair, the charged particles are driven to turn and avoid contact with the inner wall of the annular vacuum chamber, thereby solving the problem of friction and collision between the plasma and the inner wall of the annular vacuum chamber in the prior art, and having the advantages of extending the service life of the cavity, improving the purity of the plasma, and improving the uniformity and stability of the plasma.

[0010] Preferably, the regulating electrode pair comprises a positive electrode plate and a negative electrode plate which are arranged opposite to each other, the positive electrode plate is arranged on the outer circumferential side wall of the annular vacuum chamber, and the negative electrode plate is arranged on the inner circumferential side wall of the annular vacuum chamber.

[0011] This arrangement can generate an electric field from the outside to the inside of the cavity, effectively driving the charged particles in the airflow to deflect inward. Through this electrode arrangement, an effective deflection electric field can be formed at the connection between adjacent linear cavities. When charged particles flow through this area, they will be affected by the electric field force and change the direction of movement, avoiding direct contact with the outer circumferential side wall of the annular vacuum cavity. This can not only reduce the collision between particles and the cavity wall and reduce particle loss, but also extend the service life of the cavity and improve the stability and uniformity of the plasma.

[0012] Preferably, any two adjacent linear cavities are connected via a connecting cavity, and the regulating electrode pair is arranged at the connecting cavity.

[0013] The connecting cavity not only serves to connect adjacent linear cavities, but also provides an installation location for the adjustment electrode. The adjustment electrode is arranged at the connecting cavity, which can generate a deflection electric field at the key position where the airflow turns. This arrangement can more accurately control the motion trajectory of charged particles and effectively prevent the charged particles from contacting the circumferential side wall of the annular vacuum chamber.

[0014] Optionally, the connecting cavity is a straight cavity.

[0015] Optionally, the connecting cavity is a curved cavity.

[0016] Preferably, a flow guide is provided on the inner surface of the outer circumferential side wall of the connection between the connecting cavity and the upstream adjacent straight cavity, and a flow guide surface is provided on the inner side of the flow guide, and the flow guide surface is used to guide the airflow to turn.

[0017] Preferably, the flow guide is partially or entirely made of non-conductive ceramic.

[0018] Preferably, the flow guide is detachable.

[0019] Preferably, the air inlet and the air outlet are connected on opposite sides of the annular vacuum chamber along a characteristic straight line, the annular vacuum chamber is symmetrical about the characteristic straight line, and the magnetic core components are symmetrically distributed about the characteristic straight line.

[0020] Preferably, the annular vacuum chamber includes four linear cavities, the four linear cavities include two mutually parallel first linear cavities and two mutually parallel second linear cavities, the first linear cavities are perpendicular to the second linear cavities, and the first linear cavities are shorter than the second linear cavities, the air inlet and the air outlet are respectively connected to the two first linear cavities, and the two second linear cavities are wound with the magnetic core assembly.

[0021] Beneficial effects: The remote plasma source cavity provided by the present application includes a plurality of straight cavities and an adjustment electrode pair arranged at the connection between the straight cavities. The deflection electric field generated by the adjustment electrode pair is used to drive the charged particles to turn to avoid contact with the inner wall of the annular vacuum cavity, thereby solving the problem of friction and collision between the plasma and the inner wall of the annular vacuum cavity in the prior art. It has the advantages of extending the service life of the cavity, improving the purity of the plasma, and improving the uniformity and stability of the plasma. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 A three-dimensional diagram of a remote plasma source chamber provided in an embodiment of the present application.

[0023] Figure 2 A cross-sectional view of a remote plasma source chamber provided in an embodiment of the present application.

[0024] Figure 3 This is a schematic diagram of the working principle of the adjusting electrode pair.

[0025] Figure 4 This is a diagram showing the working principle of the flow guide.

[0026] Explanation of reference numerals: 1. annular vacuum chamber; 101. linear cavity; 1011. first linear cavity; 1012. second linear cavity; 102. connecting cavity; 2. air inlet; 3. air outlet; 4. magnetic core assembly; 5. ignition coil; 6. regulating electrode pair; 601. positive plate; 602. negative plate; 7. flow guide; 701. flow guide surface. DETAILED DESCRIPTION

[0027] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all of the embodiments. The components of the embodiments of the present application described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the application claimed for protection, but merely represents the selected embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without making creative work belong to the scope of protection of the present application.

[0028] It should be noted that similar reference numerals and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings. At the same time, in the description of this application, the terms "first", "second", etc. are only used to distinguish the description and cannot be understood as indicating or implying relative importance.

[0029] Remote plasma source chambers play a key role in semiconductor manufacturing and surface treatment processes. However, existing remote plasma source chambers face serious challenges during operation. Since the annular vacuum chambers are mostly rectangular in design, the turning angles at the corners are large, which makes it easy for the airflow to rub and collide with the inner wall of the chamber when turning. In this case, the active fluoride ion gas will contact and corrode the oxide protective film on the inner wall of the annular vacuum chamber. This not only significantly shortens the service life of the remote plasma source chamber, but also reduces the purity of the plasma due to the reaction of the active fluoride ion gas with the oxide protective film to generate particulate dust.

[0030] If this problem cannot be effectively solved, it will lead to a series of serious technical consequences. First, the continuous corrosion of the inner wall of the chamber will significantly shorten the life of the equipment. Secondly, as the concentration of pollutants increases, the purity of the plasma will continue to decline, directly affecting the quality and consistency of the etching and cleaning processes. In addition, corrosion products may be deposited on the surface of the wafer, causing an increase in defect density, further affecting device performance and reliability. In the long run, if this problem is not solved, it will become a bottleneck restricting the further miniaturization and precision improvement of the semiconductor manufacturing process, hindering the technological progress of the entire industry. Therefore, a new technical solution is urgently needed to overcome these challenges and improve the performance and life of the remote plasma source chamber.

[0031] To solve this problem, the present application proposes a new remote plasma source chamber design.

[0032] Please refer to Figure 1-Figure 4A remote plasma source chamber in some embodiments of the present application includes an annular vacuum chamber 1, an air inlet 2, an air outlet 3, a magnetic core assembly 4 and an ignition coil 5; the annular vacuum chamber 1 includes a plurality of straight cavities 101 connected end to end in sequence to form a closed-loop flow channel, at least one straight cavity 101 is wound with a magnetic core assembly 4, and the air inlet 2 and the air outlet 3 are respectively connected to two different straight cavities 101; an adjustment electrode pair 6 is provided at the connection between any two adjacent straight cavities 101, and the adjustment electrode pair 6 is used to generate a deflection electric field to drive the charged particles in the airflow to turn so as to avoid the charged particles from contacting the circumferential side wall of the annular vacuum chamber 1.

[0033] The remote plasma source cavity drives the charged particles to turn by adjusting the deflection electric field generated by the electrode pair 6 to avoid contact with the inner wall of the annular vacuum cavity 1, thereby solving the problem of friction and collision between the plasma and the inner wall of the annular vacuum cavity 1 in the prior art, and has the advantages of extending the service life of the cavity, improving the purity of the plasma, and improving the uniformity and stability of the plasma.

[0034] It should be noted that the annular vacuum chamber 1 has two mutually parallel normal side walls, and an inner circumferential side wall and an outer circumferential side wall located between the two normal side walls, and the two normal side walls, the inner circumferential side wall and the outer circumferential side wall together form a closed-loop flow channel; Figure 4 For example, a in the figure is the outer circumferential side wall, b is the inner circumferential side wall, and the two normal side walls are parallel to the paper surface.

[0035] The number and length of the linear channels 101 can be set according to actual needs. The number and connection positions of the magnetic core components 4 can be set according to actual needs. By adjusting the number and length of the linear channels 101 and the configuration of the magnetic core components 4, it is easy to adapt to the requirements of plasma sources of different scales and powers.

[0036] The annular vacuum chamber 1 may be made of aluminum alloy (but not limited thereto), and an inner wall surface thereof is provided with an oxidation protective layer (for example, an aluminum oxide protective layer obtained by anodizing the inner surface of the side wall of the annular vacuum chamber 1 ).

[0037] The air inlet 2 and the air outlet 3 may be made of high temperature resistant non-conductive materials such as aluminum oxide and pyrolytic boron nitride, but are not limited thereto.

[0038] Among them, the magnetic core assembly 4 and the ignition coil 5 are prior art, and their structures are not described in detail here.

[0039] Specifically, see Figure 2 The regulating electrode pair 6 includes a positive electrode plate 601 and a negative electrode plate 602 which are arranged opposite to each other. The positive electrode plate 601 is arranged on the outer circumferential side wall of the annular vacuum chamber 1 , and the negative electrode plate 602 is arranged on the inner circumferential side wall of the annular vacuum chamber 1 .

[0040] The positive plate 601 and the negative plate 602 of the regulating electrode pair 6 are respectively arranged on the outer circumferential side wall and the inner circumferential side wall of the annular vacuum chamber 1, forming a transverse electric field (such as Figure 3 As shown). This arrangement can generate an electric field from the outside to the inside inside the cavity, effectively driving the charged particles in the airflow to deflect inward. Through this electrode arrangement, an effective deflection electric field can be formed at the connection between adjacent straight cavities 101. When the charged particles flow through this area, they will be affected by the electric field force and change the direction of movement, avoiding direct contact with the outer circumferential side wall of the annular vacuum chamber 1. This can not only reduce the collision between particles and the cavity wall and reduce particle loss, but also extend the service life of the cavity and improve the stability and uniformity of the plasma. In addition, since the positive plate 601 is arranged on the outside and the negative plate 602 is arranged on the inside, this arrangement can also prevent positively charged ions from directly hitting the inner wall of the cavity, further reducing the loss and pollution of the cavity. At the same time, this electrode arrangement method is also easy to install and maintain, and the position of the electrode can be adjusted or the electrode can be replaced as needed, which improves the maintainability and flexibility of the equipment.

[0041] The regulating electrode pair 6 in the present application can be implemented in various forms. For example, the positive plate 601 and the negative plate 602 can be flat, arc-shaped or other suitable shapes. The electrode material can be selected from metals with good conductivity and corrosion resistance, such as stainless steel, titanium alloy, etc. In order to further improve the corrosion resistance of the electrode, a protective layer can be coated on the surface of the electrode, such as ceramic materials such as aluminum oxide and silicon nitride.

[0042] The installation method of the positive plate 601 and the negative plate 602 can also be flexibly designed. For example, bolt fixing, snap-on installation or embedded installation can be adopted. This can facilitate the replacement and maintenance of the electrodes and improve the reliability and service life of the equipment.

[0043] In practical applications, the electric field strength can be controlled by adjusting the voltage between the positive and negative plates. For example, an adjustable DC power supply can be set to adjust the voltage between the positive and negative plates. By changing the voltage, the electric field strength can be flexibly adjusted to adapt to different process requirements and gas flow conditions.

[0044] In some preferred embodiments, see Figure 2 , Figure 3 Any two adjacent straight cavities 101 are connected via a connecting cavity 102 , and the regulating electrode pair 6 is arranged at the connecting cavity 102 .

[0045] By setting the connecting cavity 102 between adjacent straight cavities 101, the closed-loop structure of the annular vacuum chamber 1 is realized. The connecting cavity 102 not only serves to connect the adjacent straight cavities 101, but also provides an installation position for the adjusting electrode pair 6. The adjusting electrode pair 6 is arranged at the connecting cavity 102, and a deflection electric field can be generated at a key position where the airflow turns. This arrangement can more accurately control the motion trajectory of charged particles and effectively prevent the charged particles from contacting the circumferential side wall of the annular vacuum chamber 1. By setting the adjusting electrode pair 6 at the connecting cavity 102, the technical solution cleverly uses the position of the airflow turning to control the motion of the charged particles. This design not only simplifies the structure, but also improves the accuracy and efficiency of the control of the motion of the charged particles. At the same time, since the adjusting electrode pair 6 is located at the connecting cavity 102, it will not interfere with the plasma generation and transmission process in the straight cavity 101, thereby ensuring the stability of the plasma. In addition, this design also has good flexibility and adjustability. By adjusting the shape of the connecting cavity 102 (such as a straight cavity or a curved cavity) and adjusting the parameters of the electrode pair 6, the motion trajectory of the charged particles can be further optimized to meet different application requirements.

[0046] There are many ways to arrange the adjustment electrode pair 6 in the connection channel 102. A common arrangement is to arrange a pair of electrodes in the middle of the connection channel 102 (the pair of electrodes includes a positive electrode plate 601 and a negative electrode plate 602, such as Figure 2 As shown). Another arrangement is to set a pair of electrodes at the entrance and exit of the connecting channel 102 to form two independent deflection electric fields. The third arrangement is to set continuous electrode strips on the inner and outer circumferential side walls of the connecting channel 102 (that is, the positive plate 601 and the negative plate 602 are both strip electrodes extending along the extension direction of the circumferential side wall of the connecting channel 102) to form a continuous deflection electric field.

[0047] When using the technical solution of the present application to solve the connection between adjacent straight cavities 101 and the control problem of charged particles, firstly, the smooth connection of adjacent straight cavities 101 is achieved through the connecting cavity 102, avoiding the sudden change at the corner in the traditional design. This smooth transition significantly reduces the turbulence and eddy current of the airflow when turning, and reduces the risk of charged particles colliding with the cavity wall. Secondly, the deflection electric field generated by the adjustment electrode pair 6 set at the connecting cavity 102 can accurately control the movement trajectory of the charged particles. When the charged particles enter the connecting cavity 102 with the airflow, the deflection electric field will exert a force on them that is adapted to the direction of the airflow, guiding the charged particles to move along the ideal path, and effectively preventing them from contacting the cavity wall.

[0048] In some possible implementations, see Figure 1-Figure 4 , the connecting cavity 102 is a straight cavity.

[0049] The connecting cavity 102 adopts a straight cavity design, which can simplify the cavity structure and reduce the difficulty of processing. The shape of the straight cavity is conducive to the smooth flow of airflow, reduces the generation of turbulence and eddy currents, and thus reduces energy loss. By designing the connecting cavity 102 as a straight cavity, a simple and efficient connection between adjacent straight cavities 101 can be achieved. The straight cavity structure is simple, easy to manufacture and maintain, and is also convenient for installing and adjusting the electrode pair 6. This design helps to optimize the airflow path of the entire annular vacuum chamber 1 and improve the uniformity and stability of the plasma. The straight cavity design can also reduce the resistance of the airflow at the bend, which is conducive to maintaining the airflow speed and pressure, thereby improving the generation efficiency of the plasma. In addition, the straight cavity structure is also conducive to reducing the collision between charged particles and the cavity wall, further improving the quality of the plasma.

[0050] The connection between the connecting cavity 102 and the adjacent straight cavity 101 can be designed with a smooth transition to reduce disturbance of the airflow at the bend. For example, a rounded transition can be used at the connection. This design can further reduce airflow resistance and improve the flow efficiency of the plasma.

[0051] The length of the straight channel can be set according to actual needs.

[0052] In some other possible implementations, the connecting cavity 102 is a curved cavity.

[0053] The use of a curved cavity as the connecting cavity 102 can make the airflow smoother when turning and reduce the generation of turbulence and eddy currents. This design helps to maintain the stability of the airflow and reduce the probability of charged particles contacting the cavity wall. The design of the curved cavity and the use of the adjustment electrode pair 6 can more effectively control the motion trajectory of the charged particles in the airflow. The curved cavity provides a gradual turning path, and the deflection electric field generated by the adjustment electrode pair 6 further guides the charged particles to move along the expected path. This combined design can not only reduce the collision between particles and the cavity wall, but also improve the density and uniformity of the plasma. In addition, the design of the curved cavity may also help to prolong the residence time of the gas in the cavity, thereby increasing the chance of gas molecules being ionized and improving the efficiency of plasma generation. At the same time, the curved design may also help to evenly distribute the magnetic field, further improving the stability and uniformity of the plasma.

[0054] The curved cavity can be in various shapes and designs. For example, the curved cavity can be arc-shaped or elliptical, etc. The arc-shaped curved cavity can provide a smooth turning path, and the elliptical curved cavity can achieve a larger turning angle in a limited space.

[0055] Furthermore, the annular vacuum chamber 1 may be an integrally formed structure, or may be formed by connecting independent chambers (linear chamber 101 and connecting chamber 102) in a detachable connection manner (for example, adjacent chambers are fixedly sealed and connected by flange surfaces and sealing rings, but not limited thereto). The integrally formed structure may improve structural stability and sealing performance, and the independent detachable connection manner may facilitate the installation of components in the annular vacuum chamber 1 and the individual replacement of each component (to reduce maintenance costs).

[0056] In some preferred embodiments, see Figure 2 A guide member 7 is provided on the inner surface of the outer circumferential side wall of the connection between the connecting cavity 102 and the upstream adjacent straight cavity 101, and a guide surface 701 is provided on the inner side of the guide member 7, and the guide surface 701 is used to guide the airflow to turn.

[0057] By providing a guide member 7 at the connection between the connecting cavity 102 and the upstream adjacent straight cavity 101, the guide surface 701 inside the guide member 7 is used to guide the airflow to turn (such as Figure 4 As shown). This design helps to control the flow direction of the airflow and reduce the contact between the charged particles in the airflow and the circumferential side wall of the annular vacuum chamber 1. The location of the guide 7 is carefully considered. It is located on the inner surface of the outer circumferential side wall at the connection between the connecting channel 102 and the upstream adjacent straight channel 101, and this position is exactly where the airflow needs to turn. The guide surface 701 faces the inside of the cavity and can directly act on the flowing gas to effectively guide the airflow to change direction. By guiding the airflow to turn, the technical solution can reduce the collision probability between the charged particles and the wall of the annular vacuum chamber 1, thereby reducing particle loss and cavity pollution. This not only helps to maintain the stability and density of the plasma, but also prolongs the service life of the cavity and improves the working efficiency and reliability of the entire remote plasma source. In addition, the design is complementary to the function of the adjusting electrode pair 6. The adjusting electrode pair 6 generates a deflection electric field to drive the charged particles to turn, while the guide 7 guides the entire airflow to turn through a physical structure. This dual protection mechanism can more effectively control the motion trajectory of the airflow and the charged particles, further improving the performance and reliability of the system.

[0058] The guide member 7 can be made of a variety of shapes and materials to achieve its function. For example, the guide surface 701 can be in an arc or inclined shape to smoothly guide the airflow to turn, and can also be designed as a smooth surface or a microstructure surface to optimize the airflow guiding effect. The material of the guide member 7 can be a high temperature resistant and corrosion resistant material, such as ceramics, quartz or special alloys.

[0059] In some embodiments, the guide member 7 is partially or entirely made of non-conductive ceramic. The guide member 7 is made of non-conductive ceramic and has the following advantages: improved durability, enhanced insulation, reduced pollution, and improved diversion effect. Non-conductive ceramic has excellent high temperature resistance and corrosion resistance, can remain stable in a harsh plasma environment for a long time, and extend the service life of the guide member 7. Non-conductive ceramic is a good electrical insulating material, which can avoid unnecessary current between the guide member 7 and the plasma and ensure the stability of the plasma. Non-conductive ceramic is not easy to react with plasma, which can reduce the pollution of plasma and ensure the purity of plasma. Ceramic materials can be accurately processed into the required diversion shape to achieve better airflow guiding effect. By using non-conductive ceramic to make the guide member 7, the problem that the guide member 7 is easily corroded and reacts with plasma in a plasma environment can be effectively solved. This design not only extends the service life of the guide member 7, but also improves the overall performance and stability of the plasma source. At the same time, due to the insulating properties of the ceramic material, it can also avoid the adverse effects of the guide member 7 on the electric field distribution of the plasma, further ensuring the uniformity and stability of the plasma.

[0060] The guide member 7 may be made entirely of non-conductive ceramics or partially of non-conductive ceramics. When made entirely of non-conductive ceramics, the entire guide member 7 has excellent corrosion resistance and insulation. When made partially of non-conductive ceramics, non-conductive ceramics may be used only on the surface in direct contact with the plasma, while other materials, such as metal materials, may be used inside to improve the strength and thermal conductivity of the guide member 7.

[0061] The choice of non-conductive ceramics can be determined according to the specific application environment. Commonly used non-conductive ceramic materials include alumina (Al 2 O 3 )、aluminum nitride (AlN), zirconium oxide (ZrO 2 ), etc. For example, alumina has excellent high temperature resistance and can be used in high temperature environments above 1500°C; aluminum nitride has good thermal conductivity and can help dissipate heat; and zirconium oxide has excellent thermal shock resistance.

[0062] The size and angle of the flow guide 7 can be optimized according to the size of the annular vacuum chamber 1 and the airflow characteristics. The optimal values ​​of these parameters can be determined by computational fluid dynamics simulation and experimental testing.

[0063] The synergistic effect of the guide 7 and the regulating electrode pair 6 is reflected in the following aspects: the guide 7 mainly affects the overall airflow direction, while the regulating electrode pair 6 performs fine control on the charged particles. After the airflow passes through the guide 7 and changes direction initially, the regulating electrode pair 6 can further fine-tune the trajectory of the charged particles so that they can better avoid the cavity wall. This dual effect not only improves the control accuracy of the charged particles, but also enhances the adaptability of the system to different working conditions.

[0064] Preferably, the guide member 7 is detachable. The design of the detachable guide member 7 enables the guide member 7 to be easily removed from the connecting cavity 102. This design improves the maintainability and flexibility of the guide member 7. By adopting a detachable design, the guide member 7 can be easily removed and replaced as needed. In this way, the guide member 7 can be easily cleaned, repaired or replaced without disassembling the entire cavity structure. At the same time, the guide member 7 of different shapes or materials can also be replaced according to different process requirements, thereby improving the adaptability and flexibility of the system. The detachable design also facilitates fine adjustment of the guide member 7. The operator can remove the guide member 7 for fine adjustment to optimize the airflow guiding effect. This helps to improve the uniformity and stability of the plasma. In general, the design of the detachable guide member 7 improves the maintainability, flexibility and performance adjustability of the remote plasma source cavity, which is conducive to extending the service life of the equipment and meeting different process requirements.

[0065] The detachable guide member 7 can be implemented in a variety of ways. A common implementation method is to fix it with bolts, reserve screw holes on the outer wall of the connecting cavity 102, and set bolt holes on the guide member 7 accordingly, and fix the guide member 7 to the connecting cavity 102 by bolts. This method is simple to operate and convenient for assembly and disassembly. Another implementation method is to use a snap-on structure, set a groove on the inner wall of the connecting cavity 102, set a corresponding protrusion on the edge of the guide member 7, and achieve quick installation and disassembly by snapping. Magnetic adsorption can also be used, in which a magnet is embedded in the inner wall of the connecting cavity 102, and the guide member 7 is made of magnetic material and fixed by magnetic adsorption.

[0066] In some embodiments, see Figure 4 , the air inlet 2 and the air outlet 3 are along a characteristic straight line (such as Figure 4 The straight line c) in FIG. 1 connects two opposite sides of the annular vacuum chamber 1 . The annular vacuum chamber 1 is symmetrical about the characteristic straight line, and the magnetic core components 4 are symmetrically distributed about the characteristic straight line.

[0067] The performance of the remote plasma source cavity can be optimized through this structural layout. The layout of the air inlet 2 and the air outlet 3 are connected on opposite sides of the annular vacuum chamber 1 along a characteristic straight line. This layout can ensure that the flow of gas in the cavity is more uniform and stable, which is conducive to the generation and maintenance of plasma. The annular vacuum chamber 1 is symmetrical about the characteristic straight line. This design can make the distribution of gas in the cavity more uniform, reduce the generation of dead corners and eddy currents, and thus improve the uniformity of plasma. The magnetic core assembly 4 is symmetrically distributed about the characteristic straight line. This layout can produce a more uniform magnetic field, which is conducive to the stability and uniformity of the plasma, and can also improve the energy utilization efficiency.

[0068] The characteristic straight line may be a virtual reference line, which usually coincides with the symmetry axis of the annular vacuum chamber 1. The gas inlet 2 and the gas outlet 3 may be located on two opposite straight channels 101 of the annular vacuum chamber 1, respectively, and their center lines coincide with the characteristic straight line. This layout can ensure that the path of the gas from the gas inlet 2 to the gas outlet 3 is the shortest, reduce the residence time of the gas in the chamber, and improve the generation efficiency of the plasma.

[0069] For example, in one embodiment, see Figure 1-Figure 4 The annular vacuum chamber 1 includes four straight cavities 101, and the four straight cavities 101 include two mutually parallel first straight cavities 1011 and two mutually parallel second straight cavities 1012. The first straight cavities 1011 are perpendicular to the second straight cavities 1012, and the first straight cavities 1011 are shorter than the second straight cavities 1012. The air inlet 2 and the air outlet 3 are respectively connected to the two first straight cavities 1011, and the two second straight cavities 1012 are wound with magnetic core components 4.

[0070] The layout of the four straight channels 101 forms a closed-loop flow channel, in which two shorter first straight channels 1011 are used for gas inlet and outlet, and two longer second straight channels 1012 are used for plasma generation. The air inlet 2 and the air outlet 3 are respectively connected to the two first straight channels 1011. This design can ensure that the gas is evenly distributed and flows in the cavity. The two second straight channels 1012 are wound with magnetic core components 4, which can generate magnetic fields and help generate and confine plasma. The first straight channel 1011 is arranged vertically with the second straight channel 1012. This layout can reduce the resistance of gas flow and is also beneficial to the distribution of the magnetic field. The first straight channel 1011 is shorter than the second straight channel 1012. This design can provide more installation space for the magnetic core component 4 while ensuring the efficiency of gas inlet and outlet, which is conducive to extending the length of the magnetic core component 4, providing a longer path for plasma generation, and improving the efficiency of plasma generation.

[0071] In this document, relational terms such as first and second, etc. are used merely to distinguish one entity or operation from another entity or operation, but do not necessarily require or imply any such actual relationship or order between these entities or operations.

[0072] The above description is only an embodiment of the present application and is not intended to limit the protection scope of the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A remote plasma source chamber, comprising an annular vacuum chamber (1), an air inlet (2), an air outlet (3), a magnetic core assembly (4) and an ignition coil (5); characterized in that: The annular vacuum chamber (1) comprises a plurality of linear cavities (101) which are connected end to end in sequence to form a closed-loop flow channel, the magnetic core assembly (4) being wound around at least one of the linear cavities (101), the air inlet (2) and the air outlet (3) being respectively connected to two different linear cavities (101); and an adjustment electrode pair (6) is provided at the connection between any two adjacent linear cavities (101), the adjustment electrode pair (6) being used to generate a deflection electric field to drive charged particles in the airflow to turn so as to avoid contact between the charged particles and the circumferential side wall of the annular vacuum chamber (1).

2. The remote plasma source chamber according to claim 1, characterized in that: The regulating electrode pair (6) comprises a positive electrode plate (601) and a negative electrode plate (602) which are arranged opposite to each other, the positive electrode plate (601) being arranged on the outer circumferential side wall of the annular vacuum chamber (1), and the negative electrode plate (602) being arranged on the inner circumferential side wall of the annular vacuum chamber (1).

3. The remote plasma source chamber according to claim 1, characterized in that: Any two adjacent straight cavities (101) are connected via a connecting cavity (102), and the regulating electrode pair (6) is arranged at the connecting cavity (102).

4. The remote plasma source chamber according to claim 3, characterized in that: The connecting cavity (102) is a straight cavity.

5. The remote plasma source chamber according to claim 3, characterized in that: The connecting cavity (102) is a curved cavity.

6. The remote plasma source chamber according to claim 3, characterized in that: A flow guide (7) is provided on the inner surface of the outer circumferential side wall of the connection between the connecting cavity (102) and the upstream adjacent straight cavity (101), and a flow guide surface (701) is provided on the inward side of the flow guide (7), and the flow guide surface (701) is used to guide the airflow to turn.

7. The remote plasma source chamber according to claim 6, characterized in that: The flow guide (7) is partially or entirely made of non-conductive ceramic.

8. The remote plasma source chamber according to claim 6, characterized in that: The flow guide (7) is detachable.

9. The remote plasma source chamber according to claim 1, characterized in that: The air inlet (2) and the air outlet (3) are connected along a characteristic straight line at two opposite sides of the annular vacuum chamber (1); the annular vacuum chamber (1) is symmetrical about the characteristic straight line; and the magnetic core components (4) are symmetrically distributed about the characteristic straight line.

10. The remote plasma source chamber according to any one of claims 1 to 9, characterized in that: The annular vacuum chamber (1) comprises four linear cavities (101), the four linear cavities (101) comprising two mutually parallel first linear cavities (1011) and two mutually parallel second linear cavities (1012), the first linear cavities (1011) being perpendicular to the second linear cavities (1012), and the first linear cavities (1011) being shorter than the second linear cavities (1012), the air inlet (2) and the air outlet (3) being respectively connected to the two first linear cavities (1011), and the two second linear cavities (1012) being wound with the magnetic core components (4).

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