Precise micropore polishing equipment

Abstract

The invention relates to the technical field of polishing equipment, in particular to micropore precise polishing equipment which comprises a polishing device, the polishing device comprises a polishing disc and a cooling assembly, a polishing pad is detachably connected to the polishing disc, and a liquid flow groove is formed in the side, close to the polishing pad, of the polishing disc. The cooling assembly communicates with the liquid flow groove and is used for conveying polishing liquid into the liquid flow groove, and the polishing pad can make the polishing liquid permeate. The polishing device has the effect of improving the polishing quality.

Description

Technical Field

[0001] The present application relates to the technical field of polishing equipment, and in particular to a micro-pore precision polishing equipment. Background Art

[0002] At present, with the rapid development of modern industry, the requirements for the processing accuracy of parts are getting higher and higher. Especially in the fields of optics, semiconductors, aerospace, etc., precision polishing technology has become a key link in the manufacture of high-precision products. The design and manufacture of precision polishing equipment directly affect the surface quality and accuracy of the polished parts, so there are extremely high requirements for the accuracy and stability of the equipment. During the precision polishing process, a large amount of heat will be generated due to the friction and grinding between the polishing disc and the polishing part. If this heat cannot be dissipated in time, it will cause the surface temperature of the polishing part to rise, thereby affecting the polishing accuracy and surface quality. In the related art, polishing liquid is usually sprayed between the polishing disc and the polishing part to achieve effective cooling and material removal, thereby effectively ensuring the temperature control of the polishing part during the polishing process.

[0003] Regarding the related technologies mentioned above: during the polishing process, the polishing disc is in a rotating state and the polishing liquid is fluid, which makes it difficult for the sprayed polishing liquid to evenly cover the polishing surface of the polishing part, resulting in difficulty in the polishing liquid to evenly cool the polishing part, which can easily lead to a decrease in polishing quality. Summary of the invention

[0004] In order to improve the polishing quality, the present application provides a micro-pore precision polishing device.

[0005] The present application provides a micro-pore precision polishing device, which adopts the following technical solution: A micropore precision polishing device includes a polishing device, which includes a polishing disc and a cooling component. The polishing disc is detachably connected to a polishing pad. A liquid flow groove is provided on a side of the polishing disc close to the polishing pad. The cooling component is connected to the liquid flow groove. The cooling component is used to transport polishing liquid into the liquid flow groove. The polishing pad can allow the polishing liquid to permeate through.

[0006] By adopting the above technical solution, the liquid flow groove on the polishing disc is connected to the cooling assembly, and the cooling assembly can transport the polishing liquid into the liquid flow groove, so that the polishing liquid is evenly distributed on the polishing pad through the liquid flow groove, and the polishing pad can allow the polishing liquid to penetrate and contact the polishing piece. In this way, during the polishing process, the polishing liquid can not only effectively take away the heat generated during the polishing process, but also evenly wet the polishing piece, thereby helping to ensure that the surface temperature of the polishing piece is effectively controlled, so as to improve the polishing accuracy, and then help to improve the polishing quality.

[0007] Optionally, the liquid flow channel is designed in a spiral shape.

[0008] By adopting the above technical solution, the liquid flow groove is designed in a spiral shape, which can ensure that the polishing liquid is distributed more evenly on the polishing pad, so that the polishing liquid can evenly penetrate into any position of the polishing pad.

[0009] Optionally, the polishing pad is made of microporous polishing material.

[0010] By adopting the above technical solution, the polishing pad is made of microporous polishing material, so that there will be a microporous structure with good permeability and uniform distribution on the polishing pad, so that on the basis of ensuring effective polishing of the polishing part, the polishing liquid can more evenly penetrate the polishing pad and reach the surface of the polishing part.

[0011] Optionally, it includes a frame and a clamping device, wherein the clamping device is arranged on the frame and is used to clamp the polishing piece; A driving assembly is connected to the side of the polishing disc away from the polishing pad. The driving assembly and the cooling assembly are respectively arranged on the frame. The clamping device is located on the side of the polishing disc away from the driving assembly. The driving assembly is used to drive the polishing disc to rotate.

[0012] By adopting the above technical solution, when the polishing workpiece needs to be polished, the clamping device is first used to clamp the polishing workpiece, and the clamping device drives the polishing workpiece to contact the polishing pad, and then the driving component is started, and the driving component drives the polishing pad to rotate through the polishing disk, so that the polishing pad polishes the polishing workpiece, which is conducive to improving the stability and controllability of the polishing process. At the same time, the cooling component can transport the polishing liquid into the liquid flow groove, so that the polishing liquid penetrates between the polishing workpiece and the polishing pad, which helps to achieve uniform cooling, thereby effectively reducing the influence of the heat generated during the polishing process on the polishing workpiece, and improving the polishing accuracy and surface quality.

[0013] Optionally, the driving assembly includes a driving member and a main shaft, the main shaft is rotatably connected to the frame and coaxially connected to the polishing disc, an infusion hole is coaxially opened in the main shaft, the infusion hole is communicated with the liquid flow groove, the driving member is arranged on the frame and connected to the main shaft, and the driving member is used to drive the main shaft to rotate; The cooling assembly includes a liquid storage tank, an infusion pump and a rotating joint. The liquid storage tank is arranged on the frame, one end of the infusion pump is connected to the liquid storage tank, the other end of the infusion pump is connected to the rotating joint, and the rotating joint is connected to the infusion hole.

[0014] By adopting the above technical solution, when it is necessary to deliver the polishing liquid to the liquid flow groove, the infusion pump works to deliver the polishing liquid stored in the liquid storage tank to the infusion hole through the rotary joint, so that the polishing liquid is delivered to the liquid flow groove through the infusion hole, thereby facilitating the uniform delivery of the polishing liquid between the polishing piece and the polishing pad. In addition, the setting of the rotary joint enables the infusion pump to stably deliver the polishing liquid to the infusion hole when the driving member drives the polishing disc to rotate through the main shaft, thereby facilitating the effective cooling of the polishing piece.

[0015] Optionally, a collecting device is included, which is arranged on the frame and is respectively sleeved outside the polishing disc and the driving assembly, and is used to collect the polishing liquid separated from the polishing disc.

[0016] By adopting the above technical solution, the collection device is arranged on the frame and is respectively sleeved on the outside of the polishing disc and the drive assembly, which can effectively collect the polishing liquid separated from the polishing disc. This structural design ensures that the polishing liquid will not splash around or remain on other parts of the equipment, avoiding secondary pollution and inconvenience during equipment maintenance. At the same time, the existence of the collection device is also conducive to the subsequent recycling of the polishing liquid, which not only improves the environmental protection performance, but also reduces the production cost, thereby effectively improving the cleanliness of the working environment and resource utilization rate of the entire polishing process.

[0017] Optionally, the collecting device includes a collecting box, an air suction assembly and a separation assembly. The collecting box is arranged on the frame, and the collecting box is respectively mounted outside the polishing disk and the driving assembly. The separation assembly is arranged inside the collecting box. The air suction assembly is respectively connected to the driving assembly and the separation assembly. The driving assembly is used to drive the air suction assembly to work so that the air suction assembly drives the gas in the collecting box to flow outside the collecting box, and the separation assembly is used to separate the gas and the polishing liquid.

[0018] By adopting the above technical solution, when the driving component drives the polishing disc to rotate, the polishing liquid on the polishing disc will be splashed around by the centrifugal force. At this time, the driving component can drive the air intake component to work, so that the air intake component drives the gas in the collection box to flow outside the collection box, so as to facilitate the use of gas to drive the splashed polishing liquid to move, so that the polishing liquid maintains a trend of moving outside the collection box, thereby helping to reduce the possibility of the polishing liquid splashing out of the collection box or hitting the inner wall of the collection box and then returning to the polishing disc, reducing interference with the polishing process to a certain extent. In this process, the separation component can separate the gas and the polishing liquid, so that the polishing liquid is not easy to leave the collection box with the gas, thereby helping to improve the recovery efficiency of the polishing liquid and the cleanliness of the working environment.

[0019] Optionally, the separation assembly includes a first baffle and a second baffle, the first baffle and the second baffle are respectively arranged in the collecting box, the first baffle and the second baffle are parallel to each other and arranged at intervals, the first baffle is provided with a plurality of liquid inlet holes, the second baffle is provided with a plurality of air inlet holes, the liquid inlet holes and the air inlet holes are staggered, an airflow cavity is formed between the side of the second baffle away from the first baffle and the inner wall of the collecting box, and the airflow cavity is respectively connected to the suction assembly and the air inlet hole.

[0020] By adopting the above technical solution, when the air suction component is working, the air suction component can draw the gas in the air flow chamber out of the collection box, so that the gas in the collection box passes through the liquid inlet hole, the air inlet hole and the air flow chamber in sequence and flows out of the collection box. In this process, due to the misalignment of the liquid inlet hole and the air inlet hole, the polishing liquid carried in the gas cannot directly enter the air flow chamber through the air inlet hole, but will impinge on the second baffle plate and the first baffle plate, and flow into the bottom of the collection box along the second baffle plate and the first baffle plate, thereby achieving the effect that the gas is discharged by the air suction component through the air flow chamber and the liquid is collected, and the gas and the polishing liquid can be effectively separated.

[0021] Optionally, the plurality of liquid inlet holes are evenly distributed on the first baffle plate, the plurality of air inlet holes are evenly distributed on the second baffle plate, the second baffle plate is evenly provided with a plurality of guide rails, and each guide rail is located between two columns of the air inlet holes and is provided corresponding to a column of the liquid inlet holes.

[0022] By adopting the above technical scheme, when the gas carrying the polishing liquid passes through the liquid inlet hole, the gas and the polishing liquid can collide with the guide rail, thereby facilitating the polishing liquid to flow along the guide rail into the bottom of the collection box, and helping to reduce the possibility of the polishing liquid being sucked into the air inlet hole by the gas, thereby further improving the separation effect and efficiency.

[0023] Optionally, the air intake component includes a shell, fan blades and a ventilation duct. The shell is arranged on the frame and is mounted outside the driving component. A ventilation groove is opened on the shell. The fan blades are located in the shell and connected to the driving component. The ventilation duct is respectively connected to the shell and the airflow chamber. The driving component is used to drive the fan blades to rotate.

[0024] By adopting the above technical solution, when the driving assembly drives the fan blades to rotate, the fan blades can generate airflow in the shell, so that the gas in the shell flows outward through the ventilation grooves, thereby facilitating the gas in the ventilation duct to be drawn into the shell and discharged from the shell, thereby facilitating the discharge of the gas in the collection box.

[0025] In summary, the present application includes at least one of the following beneficial technical effects: 1. By arranging a liquid flow groove on the polishing disc and connecting the liquid flow groove with the cooling assembly, the cooling assembly can transport the polishing liquid into the liquid flow groove, so that the polishing liquid can evenly penetrate the polishing pad, thereby facilitating the uniform cooling of the polishing workpiece, ensuring that the surface temperature of the polishing workpiece is effectively controlled, and thus facilitating the improvement of the polishing quality; 2. Through the cooperation of the driving member, the main shaft, the liquid storage tank, the infusion pump and the rotary joint, during the rotation of the polishing disc, the infusion pump can transport the polishing liquid in the liquid storage tank to the infusion hole through the rotary joint, and make the polishing liquid flow into the liquid flow groove through the infusion hole, so as to facilitate the uniform cooling of the polishing part; 3. Through the cooperation of the collection box, the suction component and the separation component, the polishing liquid thrown off by the polishing disc can flow steadily into the collection box, which is helpful to reduce the possibility of the polishing liquid splashing out of the collection box or hitting the inner wall of the collection box and then returning to the polishing disc, which reduces the interference with the polishing process to a certain extent, and is beneficial to improve the polishing quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 It is a schematic diagram of the overall structure of a micropore precision polishing device in Example 1 of the present application.

[0027] Figure 2 It is a front view of a micro-pore precision polishing device in Example 1 of the present application.

[0028] Figure 3 is along Figure 2 Partial structural cross-sectional view along line AA.

[0029] Figure 4 It is a schematic diagram of the overall structure of a micropore precision polishing device without a polishing pad.

[0030] Figure 5 It is a schematic diagram of the overall structure of a micropore precision polishing device in Example 2 of the present application.

[0031] Figure 6 This is a partial structural cross-sectional view of a micropore precision polishing device in Example 2 of the present application.

[0032] Figure 7 It is a partial structural schematic diagram of the polishing disc and the collecting device in Example 2 of the present application.

[0033] Description of reference numerals: 1. Polishing device; 11. Polishing disc; 111. Liquid flow trough; 112. Polishing pad; 12. Cooling assembly; 121. Liquid storage tank; 122. Infusion pump; 123. Rotary joint; 13. Driving assembly; 131. Driving member; 132. Main shaft; 1321. Infusion hole; 2. Clamping device; 3. Rack; 4. Collecting device; 41. Collecting box; 411. Air flow chamber; 42. Air suction assembly; 421. Shell; 4211. Ventilation slot; 422. Fan blade; 423. Ventilation duct; 43. Separation assembly; 431. First baffle; 4311. Liquid inlet; 432. Second baffle; 4321. Air inlet; 4322. Guide rail. DETAILED DESCRIPTION

[0034] The following is combined with Figure 1-7 This application is described in further detail.

[0035] The embodiment of the present application discloses a micro-hole precision polishing device.

[0036] It should be noted that, in the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicating orientations or positional relationships are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0037] Example 1 Reference Figure 1 The micro-pore precision polishing equipment includes a polishing device 1, a clamping device 2 and a frame 3. The polishing device 1 and the clamping device 2 are respectively installed on the frame 3, and the polishing device 1 is arranged opposite to the clamping device 2. The clamping device 2 is used to clamp the polishing workpiece and drive the polishing workpiece to move to contact with the polishing device 1. The polishing device 1 is used to polish the polishing workpiece.

[0038] It should be noted that the specific structure of the clamping device 2 is a conventional technical means for those skilled in the art, and therefore will not be described in detail in the embodiments of the present application.

[0039] Reference Figure 2 and Figure 3The polishing device 1 includes a polishing disc 11, a cooling assembly 12 and a driving assembly 13. The driving assembly 13 and the cooling assembly 12 are respectively mounted on the frame 3. The driving assembly 13 includes a driving member 131 and a spindle 132. The spindle 132 is rotatably connected to the frame 3 and coaxially fixedly connected to the polishing disc 11. The driving member 131 is mounted on the frame 3 and fixedly connected to the spindle 132. In this embodiment, the driving member 131 is a motor, and the driving member 131 and the spindle 132 are connected by a belt transmission, so that the driving member 131 is used to drive the spindle 132 to rotate, and then the spindle 132 is used to drive the polishing disc 11 to rotate.

[0040] Reference Figure 3 , a liquid infusion hole 1321 is coaxially provided in the main shaft 132, and the cooling assembly 12 includes a liquid storage tank 121, a liquid infusion pump 122 and a rotary joint 123. The liquid storage tank 121 is installed on the frame 3 and is used to store polishing liquid. One end of the liquid infusion pump 122 is connected to the liquid storage tank 121, and the other end of the liquid infusion pump 122 is connected to the rotary joint 123, and the rotary joint 123 is connected to the liquid infusion hole 1321, so that the liquid infusion pump 122 can transport the polishing liquid in the liquid storage tank 121 to the liquid infusion hole 1321 through the rotary joint 123.

[0041] Reference Figure 3 and Figure 4 A liquid flow groove 111 is provided on the side of the polishing disc 11 away from the main shaft 132, and the liquid flow groove 111 is connected to the liquid infusion hole 1321. In this embodiment, the liquid flow groove 111 is designed in a spiral shape, so that the polishing liquid in the liquid infusion hole 1321 can flow into the liquid flow groove 111 and flow in the liquid flow groove 111 to be evenly distributed on the polishing disc 11. In other embodiments, the liquid flow groove 111 can also be designed in a mesh shape.

[0042] A polishing pad 112 is detachably connected to one side of the polishing disc 11 near the liquid flow groove 111, so that the polishing pad 112 can be replaced. In this embodiment, the polishing pad 112 is connected to the polishing disc 11 by bolts. In other embodiments, the polishing pad 112 can also be fixed to the polishing disc 11 by magnetic bonding or special glue bonding.

[0043] The polishing pad 112 is made of microporous polishing material, so that the polishing pad 112 has a microporous structure with good permeability and uniform distribution, thereby ensuring effective polishing of the polishing workpiece while allowing the polishing liquid to more evenly penetrate the polishing pad 112 and reach the surface of the polishing workpiece.

[0044] The implementation principle of a micro-pore precision polishing device in the embodiment of the present application is as follows: when the polishing piece needs to be polished, the clamping device 2 is first used to clamp the polishing piece, and the clamping device 2 drives the polishing piece to contact the polishing pad 112. Then the driving member 131 is started, and the driving member 131 drives the polishing disc 11 to rotate through the main shaft 132, and the polishing disc 11 drives the polishing pad 112 to rotate, so that the polishing pad 112 polishes the polishing piece. At the same time, the infusion pump 122 works to transport the polishing liquid in the liquid storage tank 121 to the infusion hole 1321, and the polishing liquid flows into the liquid flow groove 111, so that the polishing liquid penetrates the polishing pad 112 and contacts the polishing piece, so as to effectively take away the heat generated during the polishing process, thereby facilitating the completion of the polishing of the polishing piece.

[0045] Example 2 Reference Figure 5 The difference between this embodiment and embodiment 1 is that the micropore precision polishing equipment includes a collecting device 4.

[0046] Reference Figure 6 The collecting device 4 includes a collecting box 41, an air suction component 42 and a separating component 43. The collecting box 41 is mounted on the frame 3, and the collecting box 41 is respectively sleeved on the polishing disc 11 and the spindle 132, so that the collecting box 41 and the spindle 132 are not easy to interfere with each other, and the polishing liquid can fall into the collecting box 41 after leaving the polishing disc 11, so as to facilitate the recovery of the polishing liquid.

[0047] Reference Figure 6 The air suction assembly 42 includes a shell 421, a fan blade 422 and a ventilation duct 423. The shell 421 is mounted on the frame 3 and sleeved on the main shaft 132. The shell 421 is provided with a ventilation slot 4211. The fan blade 422 is located in the shell 421 and is fixedly connected to the main shaft 132. When the main shaft 132 rotates, the main shaft 132 can drive the fan blade 422 to rotate, so that the gas in the shell 421 flows outward through the ventilation slot 4211.

[0048] The separation assembly 43 includes a first baffle 431 and a second baffle 432. The first baffle 431 and the second baffle 432 are respectively installed in the collection box 41, and the first baffle 431 and the second baffle 432 are parallel to each other and spaced apart. The first baffle 431 is spaced apart from the bottom of the collection box 41, so that after the polishing liquid hits the first baffle 431, the polishing liquid can flow along the first baffle 431 to the bottom of the collection box 41.

[0049] The first baffle plate 431 is provided with a plurality of liquid inlet holes 4311, and the plurality of liquid inlet holes 4311 are evenly distributed on the first baffle plate 431. The second baffle plate 432 is provided with a plurality of air inlet holes 4321, and the plurality of air inlet holes 4321 are evenly distributed on the second baffle plate 432, and the liquid inlet holes 4311 and the air inlet holes 4321 are staggered. In this embodiment, an airflow cavity 411 is formed between the side of the second baffle plate 432 away from the first baffle plate 431 and the inner wall of the collection box 41, and the airflow cavity 411 is connected to the air inlet holes 4321, and the end of the ventilation duct 423 away from the shell 421 is connected to the airflow cavity 411.

[0050] When the main shaft 132 drives the fan blades 422 to rotate, so that airflow is generated in the shell 421, the gas in the airflow chamber 411 can be drawn out of the collection box 41 through the ventilation duct 423, so that the gas in the collection box 41 flows out of the collection box 41 through the liquid inlet hole 4311, the air inlet hole 4321 and the airflow chamber 411 in sequence. In this process, since the liquid inlet hole 4311 and the air inlet hole 4321 are misaligned, the polishing liquid carried in the gas cannot directly enter the airflow chamber 411 through the air inlet hole 4321, but will hit the second baffle plate 432 and the first baffle plate 431, and flow into the bottom of the collection box 41 along the second baffle plate 432 and the first baffle plate 431, thereby achieving the effect that the gas is discharged from the collection box 41 and the polishing liquid is collected in the collection box 41, and the gas and the polishing liquid can be effectively separated.

[0051] Reference Figure 6 and Figure 7 A plurality of guide rails 4322 are fixedly connected to the second baffle plate 432 . The plurality of guide rails 4322 are parallel to each other and evenly distributed on the second baffle plate 432 . A guide rail 4322 is located between two rows of air inlet holes 4321 and is arranged corresponding to a row of liquid inlet holes 4311 .

[0052] When the gas carrying the polishing liquid passes through the liquid inlet 4311, the gas and the polishing liquid can collide with the guide rail 4322, thereby facilitating the polishing liquid to flow along the guide rail 4322 into the bottom of the collection box 41, and helping to reduce the possibility of the polishing liquid being sucked into the air inlet 4321 by the gas, further improving the separation effect and efficiency.

[0053] The implementation principle of Example 2 is as follows: when the main shaft 132 drives the polishing disc 11 to rotate to polish the polishing piece, the polishing liquid on the polishing disc 11 will be splashed around by the centrifugal force. At this time, the main shaft 132 drives the fan blade 422 to rotate, so that the gas in the collection box 41 flows out of the collection box 41 through the liquid inlet hole 4311, the air inlet hole 4321, the air flow cavity 411 and the ventilation duct 423 in sequence. In this process, the gas will drive the splashing polishing liquid to move, so that the polishing liquid hits the guide rail 4322 and flows into the bottom of the collection box 41 along the guide rail 4322 to achieve gas-liquid separation, thereby reducing the possibility of the polishing liquid splashing out of the collection box 41 or hitting the inner wall of the collection box 41 and then returning to the polishing disc 11, reducing the interference with the polishing process to a certain extent, thereby helping to improve the recovery efficiency of the polishing liquid and improve the polishing quality.

[0054] The above are all preferred embodiments of the present application, and the protection scope of the present application is not limited thereto. Therefore, any equivalent changes made according to the structure, shape, and principle of the present application should be included in the protection scope of the present application.

Claims

1. A micropore precision polishing device, characterized in that: The polishing device (1) comprises a polishing disc (11) and a cooling assembly (12); the polishing disc (11) is detachably connected to a polishing pad (112); a liquid flow groove (111) is provided on a side of the polishing disc (11) close to the polishing pad (112); the cooling assembly (12) is connected to the liquid flow groove (111); the cooling assembly (12) is used to transport polishing liquid into the liquid flow groove (111); and the polishing pad (112) can allow the polishing liquid to permeate through.

2. The micropore precision polishing equipment according to claim 1, characterized in that: The liquid flow channel (111) is designed in a spiral shape.

3. The micropore precision polishing equipment according to claim 1, characterized in that: The polishing pad (112) is made of microporous polishing material.

4. The micropore precision polishing equipment according to claim 1, characterized in that: It comprises a frame (3) and a clamping device (2), wherein the clamping device (2) is arranged on the frame (3), and the clamping device (2) is used to clamp a polishing piece; A drive assembly (13) is connected to a side of the polishing disc (11) away from the polishing pad (112); the drive assembly (13) and the cooling assembly (12) are respectively arranged on the frame (3); the clamping device (2) is located on a side of the polishing disc (11) away from the drive assembly (13); and the drive assembly (13) is used to drive the polishing disc (11) to rotate.

5. The micropore precision polishing equipment according to claim 4, characterized in that: The driving assembly (13) comprises a driving member (131) and a main shaft (132); the main shaft (132) is rotatably connected to the frame (3) and is coaxially connected to the polishing disc (11); a liquid infusion hole (1321) is coaxially provided in the main shaft (132); the liquid infusion hole (1321) is communicated with the liquid flow groove (111); the driving member (131) is arranged on the frame (3) and is connected to the main shaft (132); the driving member (131) is used to drive the main shaft (132) to rotate; The cooling assembly (12) comprises a liquid storage tank (121), an infusion pump (122) and a rotating joint (123); the liquid storage tank (121) is arranged on the frame (3); one end of the infusion pump (122) is connected to the liquid storage tank (121); the other end of the infusion pump (122) is connected to the rotating joint (123); and the rotating joint (123) is connected to the infusion hole (1321).

6. The micropore precision polishing equipment according to claim 4, characterized in that: It comprises a collecting device (4), the collecting device (4) being arranged on the frame (3), the collecting device (4) being respectively sleeved outside the polishing disc (11) and the driving assembly (13), and the collecting device (4) being used to collect the polishing liquid separated from the polishing disc (11).

7. The micropore precision polishing equipment according to claim 6, characterized in that: The collecting device (4) comprises a collecting box (41), an air suction component (42) and a separation component (43); the collecting box (41) is arranged on the frame (3); the collecting box (41) is respectively sleeved outside the polishing disc (11) and the driving component (13); the separation component (43) is arranged inside the collecting box (41); the air suction component (42) is respectively connected to the driving component (13) and the separation component (43); the driving component (13) is used to drive the air suction component (42) to work so that the air suction component (42) drives the gas in the collecting box (41) to flow outside the collecting box (41); and the separation component (43) is used to separate the gas and the polishing liquid.

8. The micropore precision polishing equipment according to claim 7, characterized in that: The separation component (43) comprises a first baffle (431) and a second baffle (432); the first baffle (431) and the second baffle (432) are respectively arranged in the collection box (41); the first baffle (431) and the second baffle (432) are parallel to each other and arranged at intervals; the first baffle (431) is provided with a plurality of liquid inlet holes (4311); the second baffle (432) is provided with a plurality of air inlet holes (4321); the liquid inlet holes (4311) and the air inlet holes (4321) are arranged in a staggered manner; an airflow cavity (411) is formed between a side of the second baffle (432) facing away from the first baffle (431) and an inner wall of the collection box (41); the airflow cavity (411) is respectively connected to the air suction component (42) and the air inlet holes (4321).

9. The micropore precision polishing equipment according to claim 8, characterized in that: The plurality of liquid inlet holes (4311) are evenly distributed on the first baffle plate (431), the plurality of air inlet holes (4321) are evenly distributed on the second baffle plate (432), and the second baffle plate (432) is evenly provided with a plurality of guide rails (4322), and each guide rail (4322) is located between two columns of air inlet holes (4321) and is provided corresponding to a column of liquid inlet holes (4311).

10. The micro-hole precision polishing equipment according to claim 8, characterized in that: The air intake assembly (42) comprises a shell (421), a fan blade (422) and a ventilation duct (423); the shell (421) is arranged on the frame (3) and sleeved outside the driving assembly (13); a ventilation slot (4211) is provided on the shell (421); the fan blade (422) is located in the shell (421) and connected to the driving assembly (13); the ventilation duct (423) is respectively connected to the shell (421) and the airflow chamber (411); and the driving assembly (13) is used to drive the fan blade (422) to rotate.

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