Efficient cleaning equipment for regenerated wafer

By designing a hydraulic locking device and elastic elements, the regenerated wafer cleaning equipment achieves automated locking and disassembly, solving the problem of time-consuming wafer cassette installation and disassembly in traditional equipment and improving cleaning efficiency.

CN119275133AActive Publication Date: 2025-01-07ANHUI FULLERDE CHANGJIANG SEMICON MATERIALS CO LTD
View PDF 5 Cites 0 Cited by

Patent Information

Application Number
CN202411383118.7
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-09-30
Publication Date
2025-01-07
Estimated Expiration
2044-09-30

AI Technical Summary

Technical Problem

In traditional reclaimed wafer cleaning equipment, the installation and removal of wafer cassettes is time-consuming, which affects the efficiency of wafer cleaning.

Method used

The device employs a hydraulic locking mechanism and elastic elements. The elastic elements control the automatic extension of the hydraulic locking end to lock with the strip-shaped limiting protrusion. Combined with the automatic control of oil flow by the robotic arm, the device achieves automatic locking and unlocking of the disc cartridge.

Benefits of technology

It improves locking efficiency and avoids damage to electrical structures, enabling automated locking and disassembly without manual operation, and greatly improves the cleaning efficiency of regenerated wafers.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN119275133A_ABST
    Figure CN119275133A_ABST
Patent Text Reader

Abstract

The invention provides high-efficiency cleaning equipment for regenerated wafers, and relates to the technical field of wafer cleaning, the high-efficiency cleaning equipment comprises a first bearing main body, a second bearing main body is rotatably connected in the first bearing main body, and the second bearing main body is detachably connected with a plurality of wafer boxes for accommodating wafers; a locking device is installed between the wafer box and the second bearing body, two strip-shaped limiting protrusions are fixed to the upper end of the second bearing body, and strip-shaped limiting grooves are formed in the inner sides of the strip-shaped limiting protrusions. The wafer box comprises two symmetrically-arranged limiting bodies, two limiting openings matched with the two strip-shaped limiting protrusions are formed in the lower ends of the limiting bodies, a telescopic hydraulic locking device is installed between the two limiting openings, the hydraulic locking device comprises two hydraulic locking tail ends capable of stretching out, and the hydraulic locking tail ends are connected with the limiting openings. The tail end of the hydraulic locking tail end is matched with the strip-shaped limiting groove. According to the invention, the mounting and dismounting process of the wafer box is simplified, and the concentrated cleaning efficiency of wafers is improved.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The invention relates to the technical field of wafer cleaning, and in particular to a highly efficient cleaning device for regenerated wafers. Background Art

[0002] Placing the regenerated wafers in a wafer box for centralized cleaning can improve the efficiency of wafer cleaning. By setting a flip structure, the overall position of the wafer during the cleaning process can be adjusted, which can solve the problem of cleaning dead corners in centralized cleaning.

[0003] During the traditional centralized cleaning process, the wafer box containing the wafers needs to be locked and fixed to the predetermined mounting platform surface. The traditional wafer box and the corresponding locking structure are relatively simple. During the initial installation process, each wafer box needs to be firmly installed on the predetermined mounting platform surface, which is time-consuming. Similarly, during the disassembly process, the reverse steps need to be performed. A lot of time is consumed in the process of disassembling the wafer box, which affects the efficiency of centralized cleaning of the regenerated wafers. Summary of the invention

[0004] In view of the above problems, the present invention provides a highly efficient cleaning device for regenerated wafers, which simplifies the process of installing and disassembling the wafer box and improves the efficiency of centralized cleaning of wafers.

[0005] To solve the above problems, the technical solution adopted by the present invention is: A highly efficient cleaning device for regenerated wafers, comprising a first carrying body, wherein a second carrying body is rotatably connected inside the first carrying body, and a plurality of wafer boxes for accommodating wafers are detachably connected to the second carrying body, wherein a locking device is installed between the wafer box and the second carrying body, and two strip-shaped limiting protrusions are fixed to the upper end of the second carrying body, and a strip-shaped limiting groove is opened inside the strip-shaped limiting protrusion; the wafer box comprises two symmetrically arranged limiting bodies, and two limiting openings adapted to the two strip-shaped limiting protrusions are opened at the lower end of the limiting body, and the two limiting openings are A retractable hydraulic locking device is installed between the two hydraulic locking ends, and the hydraulic locking device includes two extendable hydraulic locking ends, the ends of the hydraulic locking ends are adapted to the strip-shaped limiting grooves, and an elastic element is installed between the two hydraulic locking ends, and the two hydraulic locking ends are controlled by the elastic element to be in an extended state normally; a hydraulic touch device connected to the hydraulic locking device is installed on the outside of the limiting body, and when the limiting body is grasped, the hydraulic touch device is squeezed to squeeze the control oil in the hydraulic touch device into the hydraulic locking device to control the contraction of the two hydraulic locking ends.

[0006] Preferably, the hydraulic locking device includes a hydraulic locking base, an installation chamber is formed inside the hydraulic locking base, the inner wall of the installation chamber is sealingly and slidably connected to two installation pistons, the hydraulic locking end is installed on the outer side of the corresponding installation piston, the installation piston end passes through the hydraulic locking base and is sealingly and slidably connected thereto, a control chamber is formed outside the installation piston, and the hydraulic touch device is connected to the control chamber.

[0007] Preferably, the elastic element is installed between two mounting pistons, and a limit block is also installed on the inner wall of the mounting chamber. The limit block is located on the moving path of the mounting piston, and the limit contraction position of the mounting piston is controlled by the limit block.

[0008] Preferably, the hydraulic touch device comprises a hydraulic touch base and a hydraulic touch terminal, a containing chamber for containing control oil is formed between the hydraulic touch base and the hydraulic touch terminal, and the containing chamber is communicated with the control chamber.

[0009] Preferably, a pumping pipe set for conveying control oil is installed between the control chamber and the hydraulic touch device, and the pumping pipe set includes a first pumping pipe with a built-in one-way valve and a second pumping pipe with a built-in control valve.

[0010] Preferably, the control valve is a touch valve, and the control valve is installed on a side of the outer wall of the limiting body close to the hydraulic touch device.

[0011] Preferably, the two limiting bodies slide relative to each other, and a guide rod is installed between the two limiting bodies.

[0012] Preferably, a retractable limiting plate is fixed to the inner wall of the strip-shaped limiting groove, and the limiting plate is staggered with the hydraulic locking end, wherein after the hydraulic locking end is extended, the limiting plate is controlled to extend to tighten the hydraulic locking end.

[0013] Preferably, a limiting assembly is installed on the upper end of the second bearing body, the limiting assembly includes a first hydraulic telescopic rod, and a second hydraulic telescopic rod is also installed on the inner wall of the strip-shaped limiting groove, and the second hydraulic telescopic rod is connected to the first hydraulic telescopic rod.

[0014] The beneficial effects of the present invention are: Compared with the prior art, through the above-mentioned structural design, during the locking process, the elastic element can control the hydraulic locking ends on both sides to automatically extend and lock with the strip-shaped limit protrusions, without the need for manual locking operations, thereby improving the locking effect and efficiency; at the same time, during the clamping and feeding process, the robot can automatically clamp the hydraulic touch device to adjust and control the flow of oil, realize automatic control during the clamping process, and can cooperate with the hydraulic locking device to complete the automatic locking control; the present invention does not require a built-in electrical locking element, thereby avoiding damage to the electrical structure caused by being in the cleaning liquid for a long time, and does not require manual locking, thereby greatly improving the efficiency of regenerated wafer cleaning. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a schematic diagram of the three-dimensional structure of the present invention.

[0016] Figure 2 It is a three-dimensional structural schematic diagram of the film box of the present invention.

[0017] Figure 3 For the present invention Figure 2 Schematic diagram of the main structure.

[0018] Figure 4 For the present invention Figure 2 Schematic diagram of the side structure.

[0019] Figure 5 For the present invention Figure 2 Schematic diagram of the structure viewed from above.

[0020] Figure 6 For the present invention Figure 5 A is an enlarged structural diagram of FIG.

[0021] In the figure: 100, first bearing body; 110, rotation control motor; 200, second bearing body; 210, strip-shaped limiting protrusion; 211, strip-shaped limiting groove; 300, film box; 310, containing body; 320, limiting body; 321, limiting opening; 330, guide rod; 400, hydraulic touch device; 410, hydraulic touch base; 420, hydraulic touch end; 500, hydraulic locking device; 510, hydraulic locking base; 520, mounting piston; 5201, control chamber; 530, hydraulic locking end; 540, elastic element; 600, control valve; 700, limiting assembly; 710, first hydraulic telescopic rod; 720, bearing rod; 800, wafer. DETAILED DESCRIPTION

[0022] The present invention is further described below in conjunction with the accompanying drawings and embodiments.

[0023] There are a lot of metal impurities on the surface of the regenerated wafer, and the large amount of metal impurities on the surface of the regenerated wafer need to be cleaned before processing.

[0024] Placing the regenerated wafers in a wafer box for centralized cleaning can improve the efficiency of wafer cleaning. By setting a flip structure, the overall position of the wafer during the cleaning process can be adjusted, which can solve the problem of cleaning dead corners in centralized cleaning.

[0025] During the traditional centralized cleaning process, the wafer box containing the wafers needs to be locked and fixed to the predetermined mounting platform surface. The traditional wafer box and the corresponding locking structure are relatively simple. During the initial installation process, each wafer box needs to be firmly installed on the predetermined mounting platform surface, which is time-consuming. Similarly, during the disassembly process, the reverse steps need to be performed. A lot of time is consumed in the process of disassembling the wafer box, which affects the efficiency of centralized cleaning of the regenerated wafers.

[0026] In order to solve the above problems, refer to the attached Figure 1 -Attached Figure 6 A highly efficient cleaning device for regenerated wafers includes a first carrier body 100, a second carrier body 200 is rotatably connected inside the first carrier body 100, and a plurality of wafer boxes 300 for accommodating wafers 800 are detachably connected to the second carrier body 200. A locking device is installed between the wafer boxes 300 and the second carrier body 200, and a plurality of wafer boxes 300 can be fixed to the upper end of the second carrier body 200 through the locking device, thereby ensuring the stability of the wafer boxes 300 and the wafers 800 during the cleaning process.

[0027] Specifically, two strip-shaped limiting protrusions 210 are fixed on the upper end of the second bearing body 200, and a strip-shaped limiting groove 211 is opened on the inner side of the strip-shaped limiting protrusion 210; the film box 300 includes two symmetrically arranged limiting bodies 320, and two limiting openings 321 adapted to the two strip-shaped limiting protrusions 210 are opened at the lower end of the limiting body 320, and a retractable hydraulic locking device 500 is installed between the two limiting openings 321, and the hydraulic locking device 500 includes two extendable hydraulic locking ends 530, and the hydraulic lock The end of the tight end 530 is adapted to the strip limit groove 211, and an elastic element 540 is installed between the two hydraulic locking ends 530, and the two hydraulic locking ends 530 are controlled by the elastic element 540 to be in an extended state normally; by pumping control oil into the hydraulic locking device 500, the hydraulic locking ends 530 on both sides can be controlled to be in a retracted state, so that the strip limit protrusion 210 can pass through the limit opening 321 normally, and the hydraulic locking end 530 is controlled to be opposite to the strip limit groove 211.

[0028] During the process of discharging the control oil, the hydraulic locking ends 530 on both sides can be controlled to extend themselves under the action of the elastic element 540, and the hydraulic locking ends 530 extended on both sides can enter the corresponding strip limiting grooves 211 for limiting, which can ensure the stability of the overall structure.

[0029] A hydraulic touch device 400 connected to the hydraulic locking device 500 is installed on the outside of the limiting body 320. When the limiting body 320 is grasped, the hydraulic touch device 400 is squeezed to squeeze the control oil in the hydraulic touch device 400 into the hydraulic locking device 500 to control the two hydraulic locking ends 530 to contract. The hydraulic touch device 400 can be clamped from both sides by a manipulator to finally clamp the film box 300 as a whole; in the process of clamping the hydraulic touch device 400 by the manipulator, the control oil in the hydraulic touch device 400 can be squeezed into the hydraulic locking device 500 to control the hydraulic locking ends 530 on both sides to contract; after the manipulator places the film box 300 at a predetermined position on the upper end of the second carrying body 200, the manipulators on both sides are controlled to loosen, and the oil is controlled to be squeezed into the hydraulic touch device 400 under the action of the elastic element 540. In this process, the hydraulic locking ends 530 are automatically extended to complete the locking and limiting.

[0030] Through the above-mentioned structural design, during the locking process, the elastic element 540 can control the hydraulic locking ends 530 on both sides to automatically extend and lock with the strip limit protrusion 210, without manual locking operation, thereby improving the locking effect and efficiency; at the same time, during the clamping and feeding process, the robot can automatically clamp the hydraulic touch device 400 to adjust and control the flow of oil, realize automatic control during the clamping process, and can cooperate with the hydraulic locking device 500 to complete the automatic locking control; the present invention does not require a built-in electrical locking element, thereby avoiding damage to the electrical structure caused by being in the cleaning liquid for a long time, and does not require manual locking, thereby greatly improving the efficiency of regenerated wafer cleaning.

[0031] Specifically, the hydraulic locking device 500 includes a hydraulic locking base 510, an installation chamber is formed inside the hydraulic locking base 510, and two installation pistons 520 are sealingly and slidably connected to the inner wall of the installation chamber. The hydraulic locking end 530 is installed on the outer side of the corresponding installation piston 520, and the end of the installation piston 520 passes through the hydraulic locking base 510 and is sealingly and slidably connected thereto. A control chamber 5201 is formed on the outer side of the installation piston 520, and the hydraulic touch device 400 is connected to the control chamber 5201.

[0032] The two control chambers 5201 are located on the outside. Pumping the control oil in from the outside can push the installation pistons 520 on both sides to overcome the elastic effect of the elastic element 540 to achieve automatic contraction; the hydraulic locking ends 530 on both sides can extend into the corresponding strip limit grooves 211 to complete the locking positioning.

[0033] The hydraulic locking ends 530 are arranged in four groups, which can ensure the stability of the overall limit of the wafer box 300 from four positions, avoid shaking of the overall structure during the flipping and cleaning process, ensure damage to the regenerated wafer during the cleaning process, and ensure the quality of the wafer.

[0034] The elastic element 540 here is installed between the two mounting pistons 520. A limit block is also installed on the inner wall of the mounting chamber. The limit block is located on the moving path of the mounting piston 520. The limit contraction position of the mounting piston 520 is controlled by the limit block.

[0035] By setting a limit block, the extreme contraction position of the installation piston 520 can be limited, thereby preventing the control chamber 5201 on one side from contracting to the limit under the action of hydraulic pressure, and preventing the hydraulic locking end 530 on one side from completely contracting to the inside, thereby ensuring the normal operation of the overall structure.

[0036] Specifically, the hydraulic touch device 400 includes a hydraulic touch base 410 and a hydraulic touch terminal 420. A containing chamber for containing control oil is formed between the hydraulic touch base 410 and the hydraulic touch terminal 420. The containing chamber is connected to the control chamber 5201. The hydraulic touch base 410 and the hydraulic touch terminal 420 here can be set with reference to the structure of the elastic telescopic rod. The hydraulic touch base 410 and the hydraulic touch terminal 420 are in a state of sealed sliding connection. In the process of squeezing the hydraulic touch terminal 420, the internal oil can be squeezed into the control chamber 5201.

[0037] The hydraulic touch base 410 and the hydraulic touch terminal 420 here need to be designed to be flat to avoid the two sides being too long and occupying too much volume. At the same time, during the extension and retraction process, the volume of the accommodating chamber here needs to be adaptively selected according to the volume of the two control chambers 5201 to ensure that the control oil can flow normally between the two to avoid accidents.

[0038] A pumping pipe set for conveying control oil is installed between the control chamber 5201 and the hydraulic touch control device 400 . The pumping pipe set includes a first pumping pipe with a built-in check valve and a second pumping pipe with a built-in control valve 600 .

[0039] It should be noted here that the one-way valve in the first pumping pipeline can only control the one-way flow of the oil in the hydraulic touch device 400 into the hydraulic locking device 500. After the film box 300 is limited and stabilized, the control valve 600 is adjusted to be in a closed state. In this process, the oil can be prevented from flowing back into the hydraulic touch device 400, and the hydraulic locking ends 530 on both sides can be prevented from shrinking, thereby further ensuring the stability of the film box 300 in the limited state.

[0040] During the process of removing the film box 300, the control valve 600 is adjusted to be in an open state. During this process, the control oil in the hydraulic touch device 400 can be squeezed into the hydraulic locking device 500, and the hydraulic locking ends 530 on both sides are controlled to contract, so that the film box 300 can be quickly removed as a whole.

[0041] Preferably, the control valve 600 is a touch valve, which is installed on the outer wall of the limiting body 320 close to the hydraulic touch device 400. When the manipulator clamps the hydraulic touch device 400, the control valve 600 can be squeezed by the manipulator's own telescopic structure to control it to be in a conductive state.

[0042] During the installation of the film box 300, the control oil can be pumped unidirectionally into the hydraulic locking device 500 by squeezing the hydraulic touch device 400 to control the extension and retraction of the hydraulic locking end 530; after the film box 300 is installed and positioned, the control valve 600 is still controlled to be in an open state, and the hydraulic locking end 530 can be controlled to extend into the strip limit groove 211 to complete the locking; after the hydraulic locking end 530 is extended, the control valve 600 is controlled to be in a closed state, and at this time, the control oil can only flow from the hydraulic touch device 400 into the hydraulic locking device 500 in a unidirectional manner to avoid accidents caused by backflow.

[0043] During the process of disassembling the film box 300, the control valve 600 is first squeezed to be in an open state, and then the hydraulic touch devices 400 on both sides are squeezed to control the hydraulic locking end 530 at the bottom to contract. After the hydraulic locking end 530 is staggered with the strip-shaped limiting protrusion 210, the control film box 300 is lifted as a whole and separated from the second supporting body 200, so as to achieve rapid disassembly and removal.

[0044] Preferably, the two limiting bodies 320 slide relative to each other, and a guide rod 330 is installed between the two limiting bodies 320. The limiting bodies 320 on both sides can be limited by the guide rod 330 to ensure the stability of the limiting bodies 320; a traditional bolt fixing structure can be selected between the accommodating body 310 and the limiting body 320 to ensure stability; by setting two relatively sliding limiting bodies 320, film boxes 300 of different lengths can be accommodated, and the manufacturing accuracy of the film box 300 is also reduced, avoiding the phenomenon of being unable to lock and install.

[0045] A retractable limiting plate is fixed on the inner wall of the strip limiting groove 211 , and the limiting plate and the hydraulic locking end 530 are staggered. After the hydraulic locking end 530 is extended, the limiting plate is controlled to extend to press against the hydraulic locking end 530 .

[0046] By controlling the extension of the limit plate, the hydraulic locking end 530 can be tightened, and friction can be applied to the hydraulic locking end 530 to further ensure the stability of the hydraulic locking end 530; the cross-section of the limit plate and the hydraulic locking end 530 here can be set to be a wedge shape that bites into each other, and after the limit plate is extended, the friction of mutual contact can be increased to ensure the stability of the overall structure.

[0047] A limiting assembly 700 is installed at the upper end of the second carrying body 200, and the limiting assembly 700 includes a first hydraulic telescopic rod 710. A second hydraulic telescopic rod is also installed on the inner wall of the strip limiting groove 211, and the second hydraulic telescopic rod is connected to the first hydraulic telescopic rod 710. Through the above structural design, the existing limiting assembly 700 structure can be used to control the extension of the limiting plate, which simplifies the adjustment arrangement of the internal structure.

[0048] In the process of controlling the contraction of the load-bearing rod 720 by the first hydraulic telescopic rod 710, the oil at the bottom of the first hydraulic telescopic rod 710 can be squeezed into the second hydraulic telescopic rod to control the second hydraulic telescopic rod to drive the limit plate to extend, and finally the stability of the limit of the hydraulic locking end 530 on both sides is improved by the limit plates on both sides.

[0049] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A regenerated wafer high-efficiency cleaning device, comprising a first carrier body (100), wherein a second carrier body (200) is rotatably connected inside the first carrier body (100), and a plurality of wafer boxes (300) for accommodating wafers (800) are detachably connected to the second carrier body (200), wherein a locking device is installed between the wafer box (300) and the second carrier body (200), and characterized in that: Two strip-shaped limiting protrusions (210) are fixed on the upper end of the second bearing body (200), and a strip-shaped limiting groove (211) is formed inside the strip-shaped limiting protrusion (210); the film box (300) comprises two symmetrically arranged limiting bodies (320), and two limiting openings (321) are formed at the lower end of the limiting body (320) and are matched with the two strip-shaped limiting protrusions (210); a retractable hydraulic locking device (500) is installed between the two limiting openings (321), and the hydraulic locking device (500) comprises two extendable hydraulic locking ends (530), and the ends of the hydraulic locking ends (530) are matched with the strip-shaped limiting groove (211); an elastic element (540) is installed between the two hydraulic locking ends (530), and the two hydraulic locking ends (530) are controlled by the elastic element (540) to be in a normally extended state; A hydraulic touch device (400) connected to the hydraulic locking device (500) is installed outside the limiting body (320); when the limiting body (320) is grasped, the hydraulic touch device (400) is squeezed to squeeze the control oil in the hydraulic touch device (400) into the hydraulic locking device (500) to control the two hydraulic locking ends (530) to retract.

2. The high-efficiency cleaning device for regenerated wafers according to claim 1, characterized in that: The hydraulic locking device (500) comprises a hydraulic locking base (510), an installation chamber is formed inside the hydraulic locking base (510), two installation pistons (520) are sealingly and slidably connected to the inner wall of the installation chamber, the hydraulic locking end (530) is installed on the outer side of the corresponding installation piston (520), the end of the installation piston (520) passes through the hydraulic locking base (510) and is sealingly and slidably connected thereto, a control chamber (5201) is formed outside the installation piston (520), and the hydraulic touch device (400) is connected to the control chamber (5201).

3. The high-efficiency cleaning device for regenerated wafers according to claim 2, characterized in that: The elastic element (540) is installed between the two installation pistons (520), and a limit block is also installed on the inner wall of the installation chamber. The limit block is located on the moving path of the installation piston (520), and the limit contraction position of the installation piston (520) is controlled by the limit block.

4. The high-efficiency cleaning device for regenerated wafers according to claim 2, characterized in that: The hydraulic touch device (400) comprises a hydraulic touch base (410) and a hydraulic touch terminal (420), a receiving chamber for receiving control oil is formed between the hydraulic touch base (410) and the hydraulic touch terminal (420), and the receiving chamber is communicated with the control chamber (5201).

5. The high-efficiency cleaning device for regenerated wafers according to claim 2, characterized in that: A pumping pipe set for conveying control oil is installed between the control chamber (5201) and the hydraulic touch control device (400), and the pumping pipe set includes a first pumping pipe with a built-in one-way valve and a second pumping pipe with a built-in control valve (600).

6. The high-efficiency cleaning device for regenerated wafers according to claim 5, characterized in that: The control valve (600) is a touch valve, and the control valve (600) is installed on a side of the outer wall of the limiting body (320) close to the hydraulic touch device (400).

7. The high-efficiency cleaning device for regenerated wafers according to claim 1, characterized in that: The two limiting bodies (320) slide relative to each other, and a guide rod (330) is installed between the two limiting bodies (320).

8. The highly efficient regenerated wafer cleaning device according to claim 1, characterized in that: A retractable limiting plate is fixed to the inner wall of the strip-shaped limiting groove (211), and the limiting plate and the hydraulic locking end (530) are arranged in a staggered manner, wherein after the hydraulic locking end (530) is extended, the limiting plate is controlled to extend to press against the hydraulic locking end (530).

9. The high-efficiency cleaning device for regenerated wafers according to claim 8, characterized in that: A limiting assembly (700) is installed at the upper end of the second bearing body (200), the limiting assembly (700) comprising a first hydraulic telescopic rod (710), a second hydraulic telescopic rod is also installed on the inner wall of the strip-shaped limiting groove (211), and the second hydraulic telescopic rod is connected to the first hydraulic telescopic rod (710).

Citation Information

Patent Citations

  • Cassette positioning device and semiconductor processing device

    CN105448790A

  • Multi-way valve body casting machining equipment with positioning and punching functions

    CN116493946A

  • Containing box for wafer cleaning

    CN218215233U

  • System for treatmenting substrate

    KR1020100005777A

  • Automatically loadable multifaceted electrode with load lock mechanism

    US4526670A