Vapor deposition source and vapor deposition device

Abstract

A vapor deposition source and a vapor deposition apparatus, the vapor deposition source including: an evaporation tank, the evaporation tank including a sub-evaporation tank, the sub-evaporation tank including a bottom surface, the sub-evaporation tank configured to contain a vapor deposition material; the anti-shaking device is arranged in the sub-evaporation tank, the anti-shaking device comprises a supporting plate and a blocking structure, the plane where the supporting plate is located and the bottom surface are arranged in a crossed mode, the supporting plate comprises a plate surface exposed in the sub-evaporation tank, the blocking structure is arranged on the plate surface of the supporting plate, and the blocking structure is arranged on the plate surface of the supporting plate. The blocking structure is configured to block shaking of an evaporation material in the sub-evaporation tank in the moving process; and the shaking amplitude of the evaporation materials in the sub-evaporation tanks in the moving process is reduced.

Description

Technical Field

[0001] This article relates to but is not limited to the field of display manufacturing technology, and in particular to an evaporation source and an evaporation device. Background Art

[0002] Organic Light Emitting Diode (OLED) and Quantum-dot Light Emitting Diode (QLED) are active light-emitting display devices with the advantages of self-luminescence, wide viewing angle, high contrast, low power consumption, extremely high response speed, thinness, bendability and low cost. With the continuous development of display technology, flexible display devices (Flexible Display) using OLED or QLED as light-emitting devices and thin film transistors (TFT) for signal control have become the mainstream products in the current display field.

[0003] In the manufacturing process of display panels, organic layers are usually made by evaporation. Evaporation refers to the process of heating and evaporating or sublimating the film-forming material in a vacuum environment, and then condensing or depositing it on the surface of a low-temperature substrate to form a film layer. After the organic material is heated and sublimated inside the evaporation source, it is ejected from the evaporation source. After leaving the evaporation source, the temperature of the organic material gradually decreases, and finally it is deposited on the low-temperature substrate to form a continuous film layer. Summary of the invention

[0004] The embodiments of the present application provide an evaporation source and an evaporation device to reduce the shaking amplitude of the evaporation material in the sub-evaporation tank during the movement process.

[0005] The present application embodiment provides an evaporation source, including: an evaporation tank, the evaporation tank comprising a sub-evaporation tank, the sub-evaporation tank comprising a bottom surface, the sub-evaporation tank being configured to accommodate an evaporation material; An anti-sway device is arranged in the sub-evaporation tank, and the anti-sway device includes a support plate and a blocking structure. The plane where the support plate is located is arranged to intersect with the bottom surface. The support plate includes a plate surface exposed in the sub-evaporation tank. The blocking structure is arranged on the plate surface of the support plate, and the blocking structure is configured to prevent the evaporation material in the sub-evaporation tank from shaking during the movement process.

[0006] In an exemplary embodiment, the blocking structure includes a plurality of baffles, each of the plurality of baffles is disposed to cross the plate surface of the support plate, and the plurality of baffles are arranged at intervals along a direction perpendicular to the bottom surface.

[0007] In an exemplary embodiment, at least one of the plurality of baffles is disposed perpendicularly to the plate surface of the support plate; or, an angle formed between at least one of the plurality of baffles and the plate surface of the support plate is greater than or equal to 60 degrees and less than 90 degrees.

[0008] In an exemplary embodiment, at least one group of adjacent baffles among the plurality of baffles have different lengths, and the length of the baffle is the dimension from one end of the baffle close to the plate surface of the support plate to one end of the baffle away from the plate surface of the support plate.

[0009] In an exemplary embodiment, lengths of the plurality of baffles gradually increase in a direction away from the bottom surface.

[0010] In an exemplary embodiment, the blocking structure also includes a concave-convex surface, which is the plate surface of the support plate between at least one group of adjacent baffles among the multiple baffles, and the concave-convex surface includes a concave surface and a convex surface, and the concave surface and the convex surface are alternately arranged along a direction perpendicular to the bottom surface.

[0011] In an exemplary embodiment, the blocking structure includes at least one baffle, which is in contact with the board surface of the support plate, and the minimum distance from the surface of the at least one baffle away from one side of the board surface of the support plate to the board surface of the support plate gradually increases in a direction away from the bottom surface.

[0012] In an exemplary embodiment, the at least one baffle is in the shape of a right triangle in a cross section perpendicular to the bottom surface, one right-angled side of the right triangle is in contact with the plate surface of the support plate, the other right-angled side of the right triangle is located on a side away from the bottom surface, and the hypotenuse of the right triangle is located on a side away from the plate surface of the support plate.

[0013] In an exemplary embodiment, the surface of the at least one baffle away from the board surface of the support plate is a plane; or, the surface of the at least one baffle away from the support plate is a curved surface, and the curved surface is concave along the direction of the board surface close to the support plate.

[0014] In an exemplary embodiment, the blocking structure includes a concave-convex surface, which is the plate surface of the support plate, and the concave-convex surface includes a concave surface and a convex surface, and the concave surface and the convex surface are alternately arranged along a direction parallel to the bottom surface; or, the concave surface and the convex surface are alternately arranged along a direction perpendicular to the bottom surface.

[0015] In an exemplary embodiment, it also includes a plurality of partitions, which are arranged in the evaporation tank, and the plurality of partitions are arranged at intervals along a first direction to divide the evaporation tank into a plurality of sub-evaporation tanks, and the sub-evaporation tank also includes two first side surfaces arranged opposite to each other along the first direction, the two first side surfaces are vertically connected to the edge of the bottom surface, and at least one of the two first side surfaces is connected to the support plate of the anti-sway device; and / or, at least one anti-sway device is arranged between the two first side surfaces, and the at least one anti-sway device is spaced from the two first side surfaces, and a through hole is provided in the support plate of the at least one anti-sway device close to the bottom surface.

[0016] In an exemplary embodiment, a cover plate is further included, the cover plate is disposed on a side of the evaporation tank away from the bottom surface, a nozzle is disposed on the cover plate, and the sub-evaporation tank is disposed corresponding to at least one of the nozzles.

[0017] An embodiment of the present application further provides a display device, comprising the aforementioned evaporation source.

[0018] The evaporation source in the embodiment of the present application uses an anti-sway device to block the shaking of the evaporation material in the sub-evaporation tank during the movement process, thereby reducing the liquid level fluctuation of the evaporation material in the sub-evaporation tank during the movement, and further making the evaporation or vaporization rate of the evaporation material in the sub-evaporation tank remain consistent during the movement, thereby ensuring that the thickness of the film layer formed by evaporation is uniform.

[0019] The evaporation source in the embodiment of the present application uses multiple baffles to block the shaking of the evaporation material in the sub-evaporation tank during the movement process, thereby reducing the liquid level fluctuation of the evaporation material in the sub-evaporation tank during the movement process.

[0020] The evaporation source of the disclosed embodiment gradually increases its length L in the direction away from the bottom surface through multiple baffles, which can prevent the shaking of evaporation materials at different liquid level heights and reduce the liquid level fluctuation of the evaporation material in the sub-evaporation tank during movement.

[0021] The evaporation source of the disclosed embodiment has a concave-convex surface by using the support plate between adjacent baffles to alleviate the shaking impact of the evaporation materials at different liquid level heights and reduce the liquid level fluctuation of the evaporation material in the sub-evaporation tank during movement.

[0022] The evaporation source of the embodiment of the present disclosure forms an angle n between the baffle plate and the support plate that is greater than or equal to 60 degrees and less than 90 degrees, which can prevent the shaking of evaporation materials at different liquid level heights and reduce the liquid level fluctuation of the evaporation material in the sub-evaporation tank 20 during the movement. When the angle n formed between the baffle plate and the support plate is less than 60 degrees, or the angle n is greater than 90 degrees, it is difficult for the liquid level of the evaporation material to enter the angle n between the baffle plate and the support plate, and the liquid level fluctuation of the evaporation material during the movement cannot be effectively prevented.

[0023] The evaporation source of the disclosed embodiment has a triangular cross-section in a direction perpendicular to the bottom surface of the sub-evaporation tank through a baffle, which blocks the shaking of evaporation materials at different liquid level heights in the sub-evaporation tank during movement and reduces the liquid level fluctuation of the evaporation material in the sub-evaporation tank during movement.

[0024] The evaporation source of the disclosed embodiment has a curved surface on one side away from the support plate through the baffle, which can evenly resist the impact force of the shaking of the evaporation material and reduce the liquid level fluctuation of the evaporation material in the sub-evaporation tank during the movement.

[0025] The evaporation source of the disclosed embodiment uses the concave and convex surface of the support plate as a blocking structure to alleviate the shaking impact of the evaporation material and reduce the liquid level fluctuation of the evaporation material in the sub-evaporation tank during the movement.

[0026] Other features and advantages of the present application will be described in the following description, and partly become apparent from the description, or be understood by implementing the present application. Other advantages of the present application can be realized and obtained by the schemes described in the description and the drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] The accompanying drawings are used to provide an understanding of the technical solution of the present application and constitute a part of the specification. Together with the embodiments of the present application, they are used to explain the technical solution of the present application and do not constitute a limitation on the technical solution of the present application.

[0028] Figure 1 is a schematic diagram of the cross-sectional structure of a related evaporation source; Figure 2 is a schematic diagram of the cross-sectional structure of the relevant evaporation source during the movement process; Figure 3 It is a structural schematic diagram of an evaporation device according to an embodiment of the present disclosure; Figure 4 This is a schematic structural diagram of an evaporation source according to an embodiment of the present disclosure; Figure 5 A cross-sectional view of an evaporation source according to an embodiment of the present disclosure; Figure 6 This is a schematic structural diagram of a sub-evaporation tank of an evaporation source according to an embodiment of the present disclosure; Figure 7 It is a structural schematic diagram of an anti-shaking device of an evaporation source according to an embodiment of the present disclosure; Figure 8 A schematic diagram of an embodiment of the present disclosure in which one end of an anti-sway device of an evaporation source is connected to a side surface of a sub-evaporation tank; Fig. 9 A schematic diagram of the other end of an anti-sway device of an evaporation source according to an embodiment of the present disclosure being connected to a side surface of a sub-evaporation tank; Fig.10It is a schematic structural diagram of a sub-evaporation tank of another evaporation source according to an embodiment of the present disclosure; Fig.11 It is a schematic structural diagram of a sub-evaporation tank of another evaporation source according to an embodiment of the present disclosure; Fig.12 It is a schematic structural diagram of a sub-evaporation tank of another evaporation source according to an embodiment of the present disclosure; Fig.13 is a cross-sectional view of another evaporation source according to an embodiment of the present disclosure; Fig.14 A schematic diagram of another anti-shake device for an evaporation source according to an embodiment of the present disclosure. DETAILED DESCRIPTION

[0029] The present application describes multiple embodiments, but the description is exemplary rather than restrictive, and it is obvious to those skilled in the art that there may be more embodiments and implementations within the scope of the embodiments described in the present application. Although many possible feature combinations are shown in the drawings and discussed in the specific embodiments, many other combinations of the disclosed features are also possible. Unless specifically limited, any feature or element of any embodiment may be used in combination with any other feature or element in any other embodiment, or may replace any other feature or element in any other embodiment.

[0030] The present application includes and contemplates combinations of features and elements known to those of ordinary skill in the art. The embodiments, features and elements disclosed in the present application may also be combined with any conventional features or elements to form a unique invention scheme. Any features or elements of any embodiment may also be combined with features or elements from other invention schemes to form another unique invention scheme. Therefore, it should be understood that any feature shown and / or discussed in the present application may be implemented individually or in any appropriate combination. Therefore, except for the limitations made according to the attached claims and their equivalents, the embodiments are not subject to other restrictions. In addition, various modifications and changes may be made within the scope of protection of the attached claims.

[0031] In addition, when describing representative embodiments, the specification may have presented the method and / or process as a specific sequence of steps. However, to the extent that the method or process does not rely on the specific order of the steps described herein, the method or process should not be limited to the steps of the specific order described. As will be understood by those of ordinary skill in the art, other sequences of steps are also possible. Therefore, the specific sequence of the steps set forth in the specification should not be interpreted as a limitation to the claims. In addition, the claims for the method and / or process should not be limited to the steps of performing them in the order written, and those skilled in the art can easily understand that these sequences can be changed and still remain within the spirit and scope of the embodiments of the present application.

[0032] Figure 1 Figure 1 is a schematic diagram of the cross-sectional structure of the relevant evaporation source. Figure 1As shown, the relevant evaporation source includes an evaporation tank 121', a partition 122', a cover plate 123' and a liner 124'. The evaporation tank 121' includes a bottom plate 121-1' and an annular side wall, and one end of the annular side wall is connected to the edge of the bottom plate 121-1' in the third direction D3. The shape of the positive projection of the annular side wall in the third direction D3 is a rectangle, and the annular side wall includes two first side panels 121-2' and two second side panels 121-3'. The two first side panels 121-2' are arranged opposite to each other in the first direction D1, and the two first side panels 121-2' are connected to the edge of the bottom plate 121-1' on the opposite side of the first direction D1 at one end of the third direction D3; the two second side panels 121-3' are arranged opposite to each other in the second direction D2, and the two second side panels 121-3' are connected to the edge of the bottom plate 121-1' on the opposite side of the second direction D2 at one end of the third direction D3, and the edges of adjacent first side panels 121-2' and second side panels 121-3' are connected to each other. The partition 122' is arranged in the evaporation tank 121', and the partition 122' is arranged opposite to the two first side plates 121-2'. The partition 122' is connected to the bottom plate 121-1' of the evaporation tank 121' at one end in the third direction D3, and is respectively connected to the two second side plates 121-3' on the opposite sides of the second direction D2. The partition 122' divides the evaporation tank 121' into a plurality of sub-evaporation tanks 20', and the sub-evaporation tanks 20' are configured to accommodate the evaporation material, and evaporate or vaporize the evaporation material after heating and melting. The cover plate 123' is connected to the end of the annular side wall of the evaporation tank 121' away from the bottom plate 121-1', and the cover plate 123' and the evaporation tank 121' are combined to enclose a closed space, and a gap is set between the cover plate 123' and the end of the partition 122' away from the bottom plate 121-1', and the gap connects the adjacent sub-evaporation tanks 20'. A plurality of nozzles 125' are disposed in the cover plate 123', and each sub-evaporation slot 20' is disposed corresponding to at least one nozzle 125', so that the evaporation material in each sub-evaporation slot 20' can be ejected through the corresponding nozzle 125' after evaporation or vaporization. The liner 124' is disposed between the cover plate 123' and the evaporation slot 121', and a through hole corresponding to the nozzle 125' is disposed in the liner 124', and the through hole connects the corresponding nozzle 125' and the sub-evaporation slot 20'.

[0033] Figure 2 The cross-sectional structure diagram of the relevant evaporation source during the moving process. Figure 2 As shown, when the relevant evaporation source moves in multiple sub-evaporation chambers, the evaporation material 21' in each sub-evaporation tank 20' will shake violently along the moving direction of the evaporation source, causing the evaporation or vaporization rate of the evaporation material 21' in each sub-evaporation tank 20' to change and fluctuate violently, resulting in uneven thickness of the film layer formed on the display panel to be evaporated, causing color deviation differences on the display panel and other undesirable conditions.

[0034] The present application embodiment provides an evaporation source, including: an evaporation tank, comprising a sub-evaporation tank, the sub-evaporation tank comprising a bottom surface, the sub-evaporation tank being configured to accommodate an evaporation material; An anti-sway device is arranged in the sub-evaporation tank, and the anti-sway device includes a support plate and a blocking structure. The plane where the support plate is located is arranged to intersect with the bottom surface. The support plate includes a plate surface exposed in the sub-evaporation tank. The blocking structure is arranged on the plate surface of the support plate, and the blocking structure is configured to prevent the evaporation material in the sub-evaporation tank from shaking during the movement process.

[0035] Figure 3 FIG. 1 is a schematic diagram of a structure of an evaporation device according to an embodiment of the present disclosure. In an exemplary embodiment, Figure 3As shown, the evaporation device of the embodiment of the present disclosure includes an evaporation chamber 10, a partition plate 11 and an evaporation source 12. The evaporation chamber 10 includes a bottom wall, an annular side wall and a top wall. The bottom wall and the top wall of the evaporation chamber 10 are arranged relative to each other in the third direction D3. The annular side wall of the evaporation chamber 10 is arranged between the bottom wall and the top wall of the evaporation chamber 10. One end of the annular side wall of the evaporation chamber 10 is connected to the edge of the bottom wall of the evaporation chamber 10 in the third direction D3. The other end of the annular side wall of the evaporation chamber 10 is connected to the edge of the top wall of the evaporation chamber 10 in the third direction D3. The bottom wall, the annular side wall and the top wall of the evaporation chamber 10 are combined to form a closed chamber. The partition plate 11 is disposed in the evaporation chamber 10, and one end of the partition plate 11 in the third direction D3 is connected to the bottom wall of the evaporation chamber 10. The partition plate 11 divides the evaporation chamber 10 into a first sub-evaporation chamber 10-1 and a second sub-evaporation chamber 10-2. The display panel 13 to be evaporated can be placed in both the first sub-evaporation chamber 10-1 and the second sub-evaporation chamber 10-2. The evaporation source 12 is disposed in the evaporation chamber 10, and the evaporation source 12 can reciprocate along the first direction D1, so that the evaporation source 12 can be switched between the first sub-evaporation chamber 10-1 and the second sub-evaporation chamber 10-2, and the display panel 13 to be evaporated in the first sub-evaporation chamber 10-1 and the second sub-evaporation chamber 10-2 is evaporated. When the evaporation source 12 moves to the top of the display panel 13 to be evaporated in the first sub-evaporation chamber 10-1, the evaporation source 12 can evaporate the display panel 13 to be evaporated in the first sub-evaporation chamber 10-1; when the evaporation source 12 moves to the top of the display panel 13 to be evaporated in the second sub-evaporation chamber 10-2, the evaporation source 12 can evaporate the display panel 13 to be evaporated in the second sub-evaporation chamber 10-2. The evaporation source 12 switches between the first sub-evaporation chamber 10-1 and the second sub-evaporation chamber 10-2, so that the evaporation source 12 does not need to wait and can directly evaporate the display panel 13 to be evaporated, thereby improving the evaporation efficiency. Among them, the first direction D1 is the moving direction of the evaporation source 12, and the third direction D3 is a direction perpendicular to the bottom wall of the evaporation chamber 10. The first direction D1 and the third direction D3 intersect each other. For example, the first direction D1 and the third direction D3 are perpendicular to each other.

[0036] In an exemplary embodiment, the display panel 13 to be evaporated may be a large-size display panel. The display panel 13 to be evaporated may be an organic light emitting diode (OLED) display panel and a quantum dot light emitting diode (QLED) display panel, but is not limited thereto and may also be other display panels requiring an evaporated film layer.

[0037] Figure 4 This is a schematic structural diagram of an evaporation source according to an embodiment of the present disclosure; Figure 5This is a cross-sectional view of an evaporation source according to an embodiment of the present disclosure. Figure 5 Can be Figure 4 The evaporation source in the evaporation device shown, Figure 5 Can be Figure 4 2 is a cross-sectional view of the evaporation source in the direction a-a'. Figure 4 and Figure 5 As shown, the evaporation source 12 of the embodiment of the present disclosure includes an evaporation tank 121, a partition 122, a cover plate 123 and an inner liner 124. The evaporation tank 121 has a bottom plate 121-1 and an opening arranged on a side away from the bottom wall. The cover plate 123 is arranged on the opening of the evaporation tank 121, and is combined with the evaporation tank 121 to form a closed space; a nozzle 125 is arranged on the cover plate 123; the inner liner 124 is arranged between the cover plate 123 and the opening of the evaporation tank 121; the partition 122 is arranged in the evaporation tank 121, and the evaporation tank 121 is divided into a plurality of sub-evaporation tanks 20, each of which is configured to accommodate an evaporation material, and evaporate or vaporize the evaporation material after heating and melting. Each sub-evaporation tank 20 is correspondingly arranged with at least one nozzle 125, so that after the evaporation material in each sub-evaporation tank 20 evaporates or vaporizes, it is emitted to the display panel to be evaporated through the corresponding at least one nozzle 125, and a film layer is formed after deposition.

[0038] In an exemplary embodiment, the shape of the orthographic projection of the evaporation tank 121 in the third direction D3 may be a rectangle. In some embodiments, the shape of the orthographic projection of the evaporation tank in the third direction D3 may include other polygons such as a circle, an ellipse, a pentagon, a hexagon, etc. The third direction D3 is a direction perpendicular to the bottom plate 121-1 of the evaporation tank 121.

[0039] In an exemplary embodiment, the evaporation tank 121 includes a bottom plate 121-1 and an annular side plate. The shape of the orthographic projection of the bottom plate 121-1 in the third direction D3 may be a rectangle. One end of the annular side plate in the third direction D3 is connected to the edge of the bottom plate 121-1, and the other end of the annular side plate in the third direction D3 forms an opening of the evaporation tank 121. The shape of the orthographic projection of the annular side plate in the third direction D3 is a rectangle, which is the same as the shape of the orthographic projection of the bottom plate 121-1 in the third direction D3. The annular side plate includes two first side plates 121-2 and two second side plates 121-3, the two first side plates 121-2 are arranged opposite to each other in the first direction D1, and one end of the two first side plates 121-2 in the third direction D3 is connected to the edge of the bottom plate 121-1 on the opposite side of the first direction D1; the two second side plates 121-3 are arranged opposite to each other in the second direction D2, and one end of the two second side plates 121-3 in the third direction D3 is connected to the edge of the bottom plate 121-1 on the opposite side of the second direction D2, and the edges of the adjacent first side plates 121-2 and second side plates 121-3 are connected to each other to form an annular side plate. Among them, the first direction D1, the second direction D2 and the third direction D3 are all intersecting with each other, the first direction D1 is the moving direction of the evaporation source, and the third direction D3 is the direction of the bottom plate 121-1 perpendicular to the evaporation tank 121. For example, the first direction D1 is perpendicular to the second direction D2, and the first direction D1 and the second direction D2 are both perpendicular to the third direction D3.

[0040] In an exemplary embodiment, the cover plate 123 is disposed on a side of the evaporation tank 121 away from the bottom plate 121-1, and the shape of the orthographic projection of the cover plate 123 in the third direction D3 is a rectangle, which is the same as the shape of the orthographic projection of the annular side plate of the evaporation tank 121 in the third direction D3. The cover plate 123 is connected to one end of the annular side plate of the evaporation tank 121 away from the bottom plate 121-1 of the evaporation tank 121, and the cover plate 123 and the evaporation tank 121 are combined to form a closed space, which is used to accommodate the evaporation material. The cover plate 123 is provided with a nozzle 125.

[0041] In an exemplary embodiment, the evaporation source 12 of the disclosed embodiment may include a plurality of partitions 122, and the plurality of partitions 122 are all arranged in the evaporation tank 121, and the plurality of partitions 122 are arranged at intervals along the first direction D1, and each partition 122 is arranged opposite to the first side plate 121-2, and each partition 122 is connected to the bottom plate 121-1 of the evaporation tank 121 at one end of the third direction D3, and each partition 122 is respectively connected to the two second side plates 121-3 of the evaporation tank 121 on opposite sides of the second direction D2, and the plurality of partitions 122 divide the evaporation tank 121 into a plurality of sub-evaporation tanks 20.

[0042] In an exemplary embodiment, a plurality of sub-evaporation slots 20 are distributed along a first direction D1, and adjacent sub-evaporation slots 20 are separated by partitions 122. Each sub-evaporation slot 20 is configured to contain evaporation materials, and evaporate or vaporize the evaporation materials after heating and melting. A gap is provided between the other end of each partition 122 in the third direction D3 and the liner 124, that is, the end of each partition 122 away from the bottom plate 121-1 of the evaporation slot 121 does not contact the liner 124, forming a gap, which connects the adjacent sub-evaporation slots 20, so that the evaporation materials in the adjacent sub-evaporation slots 20 can flow to each other, ensuring that the evaporation materials are evenly distributed in each sub-evaporation slot 20. Each sub-evaporation slot 20 is arranged corresponding to at least one nozzle 125, so that the evaporation materials in each sub-evaporation slot 20 can be ejected through the corresponding nozzle 125 after evaporation or vaporization. A through hole corresponding to the nozzle 125 is provided in the liner 124, and the through hole connects the corresponding nozzles 125 and the sub-evaporation slot 20.

[0043] In an exemplary embodiment, the evaporation source 12 of the embodiment of the present disclosure may reciprocate along the first direction D1, so that the evaporation source 12 may be switched in different sub-evaporation chambers.

[0044] Figure 6 This is a schematic diagram of the structure of a sub-evaporation tank of an evaporation source according to an embodiment of the present disclosure. Figure 6 The structure of a sub-evaporation tank is shown in the figure. Figure 6 Can be Figure 5 An enlarged view of the evaporation source at a is shown. In an exemplary embodiment, Figure 5 and Figure 6 As shown, the sub-evaporation tank 20 includes a bottom surface 20-1, two first side surfaces 20-2 and two second side surfaces. The shape of the orthographic projection of the bottom surface 20-1 in the third direction D3 can be a rectangle, and different areas of the inner surface of the bottom plate 121-1 of the evaporation tank 121 distributed along the first direction D1 serve as the bottom surface 20-1 of different sub-evaporation tanks 20. One end of the two first side surfaces 20-2 in the third direction D3 is vertically connected to the edge of the bottom surface 20-1 on the opposite side of the first direction D1, and one end of the two second side surfaces in the third direction D3 is vertically connected to the edge of the bottom surface 20-1 on the opposite side of the second direction D2, and the edges of adjacent first side surfaces 20-2 and second side surfaces are vertically connected to each other. Among them, the first direction D1 and the second direction D1 are both parallel to the bottom surface 20-1, and the first direction D1 is perpendicular to the second direction D1.

[0045] In an exemplary embodiment, the plurality of sub-evaporation slots 20 in the evaporation slot 121 include a first edge sub-evaporation slot 201 and a second edge sub-evaporation slot 202 located at opposite sides of the first direction D1, and an intermediate sub-evaporation slot 203 located between the first edge sub-evaporation slot 201 and the second edge sub-evaporation slot 202. The first side surface 20-2 of the first edge sub-evaporation slot 201 on the opposite side of the first direction D1 is the side surface of the first side plate 121-2 of the evaporation slot 121 on the opposite side of the first direction D1, and the first side surface 20-2 of the first edge sub-evaporation slot 201 on the side of the first direction D1 is the side surface of the partition 122; the first side surface 20-2 of the second edge sub-evaporation slot 202 on the side of the first direction D1 is the side surface of the first side plate 121-2 of the evaporation slot 121 on the side of the first direction D1, and the first side surface 20-2 of the second edge sub-evaporation slot 202 on the opposite side of the first direction D1 is the side surface of the partition 122. The two first side surfaces 20 - 2 of the middle sub-evaporation tank 203 are respectively side surfaces of two adjacent partitions 122 in the first direction D1 .

[0046] In an exemplary embodiment, anti-sway devices 30 are provided on the two first side surfaces 20-2 of the sub-evaporation tank 20. The anti-sway devices 30 are configured to prevent the shaking of the evaporation material in the sub-evaporation tank 20 during the movement process. The anti-sway devices 30 can reduce the liquid level fluctuation of the evaporation material in the sub-evaporation tank 20 during the movement process, thereby making the evaporation or vaporization rate of the evaporation material in the sub-evaporation tank 20 during the movement consistent, thereby ensuring that the thickness of the film layer formed by evaporation is uniform.

[0047] In an exemplary embodiment, the anti-sway device 30 includes a support plate 30-1 and a plurality of baffles 30-2, the support plate 30-1 is in a flat plate shape, the support plate 30-1 extends along the third direction D3, and the plane where the support plate 30-1 is located is perpendicular to the bottom surface 20-1 of the sub-evaporation tank 20. The support plate 30-1 contacts the first side surface 20-2 of the sub-evaporation tank 20 on one side of the first direction D1 and is connected to each other, and the other side surface of the support plate 30-1 in the first direction D1 serves as a plate surface of the support plate 30-1, and the plate surface of the support plate 30-1 is exposed in the sub-evaporation tank 20 and can contact the evaporation material in the sub-evaporation tank 20. The multiple baffles 30-2 are all in plate shape, and one end of the multiple baffles 30-2 in the first direction D1 is connected to the plate surface of the support plate 30-1, and the other end of the multiple baffles 30-2 in the first direction D1 extends along the plate surface direction away from the support plate 30-1, and the multiple baffles 30-2 are arranged opposite to the bottom surface 20-1 of the sub-evaporation tank 20, and the planes where the multiple baffles 30-2 are located are parallel to the bottom surface 20-1 of the sub-evaporation tank 20, and the multiple baffles 30-2 are arranged perpendicular to the plate surface of the support plate 30-1, and the multiple baffles 30-2 are spaced apart in a direction perpendicular to the bottom surface 20-1 of the sub-evaporation tank 20. Among them, the multiple baffles 30-2 serve as a blocking structure of the anti-sway device 30, and the multiple baffles 30-2 are configured to block the shaking of the evaporation material in the sub-evaporation tank 20 during the movement process, and reduce the liquid level fluctuation of the evaporation material in the sub-evaporation tank 20 during the movement process.

[0048] In an exemplary embodiment, the orthographic projections of the plurality of baffles 30-2 on the plane where the bottom surface 20-1 of the sub-evaporation groove 20 is located are located within the area where the bottom surface 20-1 of the sub-evaporation groove 20 is located, that is, a gap is provided between one end of the plate surface of the plurality of baffles 30-2 away from the support plate 30-1 and the first side surface 20-2 on the opposite side, and the plurality of baffles 30-2 do not close the opening of the sub-evaporation groove 20.

[0049] In an exemplary embodiment, the plurality of baffles 30-2 each have a length L, and the length L of the plurality of baffles 30-2 gradually increases along a direction away from the bottom surface 20-1, that is, the length L of the baffle 30-2 on the side close to the bottom surface 20-1 is smaller than the length L of the baffle 30-2 on the side away from the bottom surface 20-1. The length L is the dimension from one end of the baffle 30-2 close to the board surface of the support plate 30-1 to one end of the board surface away from the support plate 30-1. For example, the length L is the dimension of the baffle 30-2 in the first direction D1.

[0050] The evaporation source 12 of the disclosed embodiment gradually increases its length L in the direction away from the bottom surface 20-1 through multiple baffles 30-2, which can prevent the shaking of evaporation materials at different liquid level heights and reduce the liquid level fluctuation of the evaporation material in the sub-evaporation tank 20 during movement.

[0051] In some embodiments, the length L of at least one group of adjacent baffles among the multiple baffles may be substantially the same; or, the length L of at least one group of adjacent baffles among the multiple baffles decreases in a direction away from the bottom surface; or, the length L of the multiple baffles first gradually increases and then gradually decreases in a direction away from the bottom surface; or, the length L of the multiple baffles first gradually decreases and then gradually increases in a direction away from the bottom surface; the present disclosure will not be repeated here.

[0052] In some embodiments, one of the two first side surfaces of the sub-evaporation tank is provided with an anti-sway device, and the other of the two side surfaces is not provided with an anti-sway device, which will not be described in detail in this disclosure.

[0053] Figure 7 This is a schematic diagram of the structure of an anti-shake device for an evaporation source according to an embodiment of the present disclosure. Figure 7 The structure of an anti-sway device is shown. Figure 7 Can be Figure 6 In an exemplary embodiment, as Figure 7 As shown, four baffles 30-2 are arranged on the support plate 30-1, one end of the four baffles 30-2 is connected to the plate surface of the support plate 30-1 exposed in the sub-evaporation tank 20, the four baffles 30-2 are arranged at intervals along the third direction D3, and the length of the four baffles 30-2 in the first direction D1 gradually increases along the direction perpendicular to the bottom surface 20-1 of the sub-evaporation tank 20.

[0054] In an exemplary embodiment, the plate surface of the support plate 30-1 between adjacent baffles 30-2 is a concave-convex surface, which includes a concave surface 30-1-1 and a convex surface 30-1-2, and the concave surface 30-1-1 and the convex surface 30-1-2 are alternately arranged along a direction perpendicular to the bottom surface 20-1 of the sub-evaporation tank 20, and the adjacent concave surfaces 30-1-1 and convex surfaces 30-1-2 are connected to each other. The concave-convex surface serves as a blocking structure of the anti-sway device 30, and is configured to alleviate the shaking impact of the evaporation materials at different liquid level heights, and reduce the liquid level fluctuation of the evaporation materials in the sub-evaporation tank 20 during the movement process.

[0055] In an exemplary embodiment, both the concave surface 30 - 1 - 1 and the convex surface 30 - 1 - 2 of the plate surface of the support plate 30 - 1 between adjacent baffles 30 - 2 are arc-shaped.

[0056] In some embodiments, the concave surface and the convex surface of the concave-convex surface are alternately arranged along the second direction D2, and adjacent concave surfaces and convex surfaces are connected to each other, which will not be described in detail in the present disclosure.

[0057] In an exemplary embodiment, a mounting hole 31 and an L-shaped slot 32 are provided on the support plate 30-1, and the mounting hole 31 and the L-shaped slot 32 are arranged at opposite ends of the four baffles 30-2 in the third direction D3. The mounting hole 31 is configured to connect one end of the support plate 30-1 to the first side surface 20-2 of the sub-evaporation tank 20, and the L-shaped slot 32 is configured to connect the other end of the support plate 30-1 to the first side surface 20-2 of the sub-evaporation tank 20.

[0058] Figure 8 This is a schematic diagram of an embodiment of the present disclosure in which one end of an anti-shake device of an evaporation source is connected to the side surface of a sub-evaporation tank. Figure 8 Can be Figure 7 In an exemplary embodiment, as shown in FIG. Figure 8 As shown, one end of the support plate 30-1 is connected to the first side surface 20-2 of the sub-evaporation tank by a screw 33. The screw 33 passes through the mounting hole of the support plate 30-1 and the threaded hole on the first side surface 20-2 of the sub-evaporation tank in sequence to fix one end of the support plate 30-1 on the first side surface 20-2 of the sub-evaporation tank.

[0059] Fig. 9 This is a schematic diagram of the other end of an anti-shake device of an evaporation source according to an embodiment of the present disclosure being connected to the side surface of a sub-evaporation tank. Fig. 9 Can be Figure 7 In an exemplary embodiment, as shown in FIG. Fig. 9 As shown, the other end of the support plate 30-1 is connected to the U-shaped slot 34 on the first side surface 20-2 of the sub-evaporation tank through the L-shaped slot 32, and one end of the L-shaped slot 32 of the support plate 30-1 is inserted into the U-shaped slot 34 on the first side surface 20-2 of the sub-evaporation tank, so that the other end of the support plate 30-1 is fixed on the first side surface 20-2 of the sub-evaporation tank.

[0060] Fig.10 This is a schematic diagram of the structure of another sub-evaporation tank of an evaporation source according to an embodiment of the present disclosure. Fig.10 In the exemplary embodiment, the structure of the sub-evaporation tank of the evaporation source of the exemplary embodiment is similar to Figure 6 The structures of the sub-evaporation tanks of the evaporation source shown are basically the same, except that Fig.10 As shown, the plurality of baffles 30-2 of the anti-shaking device 30 of the evaporation source 12 of the exemplary embodiment form an angle n with the plate surface of the support plate 30-1, and the angle n is greater than 0 degrees and less than 90 degrees. For example, the angle n is greater than or equal to 60 degrees and less than 90 degrees. The lengths of the plurality of baffles 30-2 gradually increase in a direction away from the bottom surface 20-1.

[0061] The evaporation source 12 of the embodiment of the present disclosure can prevent the shaking of evaporation materials at different liquid level heights by forming an angle n between the baffle 30-2 and the support plate 30-1 that is greater than or equal to 60 degrees and less than 90 degrees, thereby reducing the liquid level fluctuation of the evaporation material in the sub-evaporation tank 20 during the movement. When the angle n formed between the baffle 30-2 and the support plate 30-1 is less than 60 degrees, or the angle n is greater than 90 degrees, it is difficult for the liquid level of the evaporation material to enter the angle n between the baffle 30-2 and the support plate 30-1, and the liquid level fluctuation of the evaporation material during the movement cannot be effectively prevented.

[0062] Fig.11 This is a schematic diagram of the structure of another sub-evaporation tank of an evaporation source according to an embodiment of the present disclosure. Fig.11 In the exemplary embodiment, the structure of the sub-evaporation tank of the evaporation source of the exemplary embodiment is similar to Figure 6 The structures of the sub-evaporation tanks of the evaporation source shown are basically the same, except that Fig.11 As shown, in this exemplary embodiment, a baffle 30-2 is provided on the support plate 30-1 of the anti-shake device 30 of the evaporation source 12, and the baffle 30-2 is in the shape of a plate. The baffle 30-2 extends in a direction perpendicular to the bottom surface 20-1 of the sub-evaporation groove 20, and the plate surface of the baffle 30-2 on one side of the first direction D1 is connected to the support plate 30-1, and the plate surface of the baffle 30-2 on the other side of the first direction D1 exposes the sub-evaporation groove, and the minimum distance h from the plate surface of the baffle 30-2 on the other side of the first direction D1 to the plate surface of the support plate gradually increases in the direction away from the bottom surface, that is, the thickness of the baffle 30-2 gradually increases in the direction away from the bottom surface 20-1.

[0063] In an exemplary embodiment, the cross-section of the baffle 30-2 in a direction perpendicular to the bottom surface 20-1 of the sub-evaporation tank is a right triangle, one of the right-angled sides of the right triangle is in contact with the plate surface of the support plate, the other right-angled side of the right triangle is located on the side away from the bottom surface, and the hypotenuse of the right triangle is located on the side away from the plate surface of the support plate.

[0064] In an exemplary embodiment, a surface 30-2-1 of the baffle 30-2 away from the support plate 30-1 is a plane. The baffle 30-2 is a blocking structure disposed on the support plate 30-1, and the baffle 30-2 is configured to block the shaking of the evaporation materials at different liquid levels in the sub-evaporation tank 20 during the movement process, thereby reducing the liquid level fluctuation of the evaporation materials in the sub-evaporation tank 20 during the movement process.

[0065] Fig.12 This is a schematic diagram of the structure of another sub-evaporation tank of an evaporation source according to an embodiment of the present disclosure. Fig.12In the exemplary embodiment, the structure of the sub-evaporation tank of the evaporation source of the exemplary embodiment is similar to Fig.11 The structures of the sub-evaporation tanks of the evaporation source shown are basically the same, except that Fig.12 As shown, in this exemplary embodiment, a side surface 30-2-1 of the baffle 30-2 of the anti-shake device 30 of the evaporation source 12 away from the support plate 30-1 is a curved surface, and the curved surface is concave in a direction close to the support plate 30-1.

[0066] The evaporation source 12 of the disclosed embodiment has a curved surface 30-2-1 on one side away from the support plate 30-1 through the baffle 30-2, which can evenly resist the impact force of the shaking of the evaporation material and reduce the liquid level fluctuation of the evaporation material in the sub-evaporation tank 20 during movement.

[0067] Fig.13 FIG. 1 is a cross-sectional view of another evaporation source of the embodiment of the present disclosure. In an exemplary embodiment, the structure of the evaporation source of the exemplary embodiment is similar to Figure 5 The structures of the evaporation sources shown are basically the same, except that Fig.13 As shown, a plurality of anti-sway devices 30 are arranged in the sub-evaporation tank 20, and the plurality of anti-sway devices 30 are arranged at intervals along the first direction D1, and the planes where the support plates 30-1 of the plurality of anti-sway devices 30 are located are perpendicular to the bottom surface 20-1, and the two first side surfaces are spaced apart from the support plates of adjacent anti-sway devices, and the blocking structures are arranged on the plate surfaces on opposite sides of the support plates 30-1 of the plurality of anti-sway devices 30.

[0068] Fig.14 Schematic diagram of another anti-shake device for an evaporation source according to an embodiment of the present disclosure. Fig.14 The anti-sway device can be Fig.13 In an exemplary embodiment, as shown in FIG. Fig.13 and Fig.14 As shown, the two plate surfaces of the support plate 30-1 on opposite sides of the first direction D1 are both exposed in the sub-evaporation tank 20, and the two plate surfaces of the support plate 30-1 are both concave-convex surfaces, which include a concave surface 30-1-1 and a convex surface 30-1-2, and the concave surface 30-1-1 and the convex surface 30-1-2 are alternately arranged along the second direction D2, and the adjacent concave surfaces 30-1-1 and convex surfaces 30-1-2 are connected to each other. The concave-convex surface serves as a blocking structure of the anti-sway device 30, and the concave-convex surface is configured to alleviate the shaking impact of the evaporation material and reduce the liquid level fluctuation of the evaporation material in the sub-evaporation tank 20 during the movement process.

[0069] In an exemplary embodiment, both the concave surface 30 - 1 - 1 and the convex surface 30 - 1 - 2 are arc-shaped.

[0070] In an exemplary embodiment, a region of the support plate 30 - 1 close to the bottom surface 20 - 1 of the sub-evaporation tank 20 is provided with a via hole 37 , and the via hole 37 is configured to communicate two cavities adjacent to the support plate 30 - 1 .

[0071] In an exemplary embodiment, a first fixing groove 35 and a second fixing groove 36 are respectively provided on the two second side surfaces of the sub-evaporation groove 20, and the first fixing groove 35 and the second fixing groove 36 both extend in a direction perpendicular to the bottom surface 20-1 of the sub-evaporation groove 20, and the first fixing groove 35 and the second fixing groove 36 are correspondingly arranged, and the support plate 30-1 of the anti-shake device 30 is respectively inserted into the first fixing groove 35 and the second fixing groove 36 at the opposite ends in the second direction D2, and the displacement of the anti-shake device 30 in the first direction D1 is limited by the first fixing groove 35 and the second fixing groove 36.

[0072] In some embodiments, the concave-convex surface includes a concave surface and a convex surface, and the concave surface and the convex surface are alternately arranged along a direction perpendicular to the bottom surface of the sub-evaporation tank, and adjacent concave surfaces and convex surfaces are connected to each other, which will not be described in detail in this disclosure.

[0073] The present disclosure also provides an evaporation device, the evaporation device includes the aforementioned evaporation source. The evaporation device can be configured to perform evaporation on a display panel, and the display panel can be an organic light emitting diode (OLED) display panel or a quantum dot light emitting diode (QLED) display panel, but is not limited thereto, and can also be other display panels that require an evaporation film layer.

[0074] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0075] In addition, the terms "first", "second", etc. are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first", "second", etc. may explicitly or implicitly include at least one of the features.

[0076] In the description of the present application, “plurality” means at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0077] In this application, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed", etc. should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0078] In the present application, unless otherwise clearly specified and limited, a first feature being “above” or “below” a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being “above”, “above”, and “above” a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being “below”, “below”, and “below” a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0079] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example" or "some examples" etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.

[0080] Although the embodiments of the present application have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limitations on the present application. Ordinary technicians in this field can change, modify, replace and modify the above embodiments within the scope of the present application.

Claims

1. A vapor deposition source, characterized in that: include: an evaporation tank, the evaporation tank comprising a sub-evaporation tank, the sub-evaporation tank comprising a bottom surface, the sub-evaporation tank being configured to accommodate an evaporation material; An anti-sway device is arranged in the sub-evaporation tank, and the anti-sway device includes a support plate and a blocking structure. The plane where the support plate is located is arranged to intersect with the bottom surface. The support plate includes a plate surface exposed in the sub-evaporation tank. The blocking structure is arranged on the plate surface of the support plate, and the blocking structure is configured to prevent the evaporation material in the sub-evaporation tank from shaking during the movement process.

2. The evaporation source according to claim 1, characterized in that: The blocking structure includes a plurality of baffles, each of which is arranged to cross the plate surface of the support plate, and the plurality of baffles are arranged at intervals along a direction perpendicular to the bottom surface.

3. The evaporation source according to claim 2, characterized in that: At least one of the plurality of baffles is disposed perpendicularly to the plate surface of the support plate; or, an angle formed between at least one of the plurality of baffles and the plate surface of the support plate is greater than or equal to 60 degrees and less than 90 degrees.

4. The evaporation source according to claim 2, characterized in that: At least one group of adjacent baffles among the plurality of baffles has different lengths, and the length of the baffle is the dimension from one end of the baffle close to the plate surface of the support plate to one end of the baffle away from the plate surface of the support plate.

5. The evaporation source according to claim 4, characterized in that: The lengths of the plurality of baffles gradually increase along a direction away from the bottom surface.

6. The evaporation source according to claim 2, characterized in that: The blocking structure also includes a concave-convex surface, which is the plate surface of the support plate between at least one group of adjacent baffles among the multiple baffles, and the concave-convex surface includes a concave surface and a convex surface, and the concave surface and the convex surface are alternately arranged along a direction perpendicular to the bottom surface.

7. The evaporation source according to claim 1, characterized in that: The blocking structure includes at least one baffle, which is in contact with the board surface of the support plate, and the minimum distance from the surface of the at least one baffle away from the board surface of the support plate to the board surface of the support plate gradually increases in the direction away from the bottom surface.

8. The evaporation source according to claim 7, characterized in that: The at least one baffle is in the shape of a right triangle in a cross section perpendicular to the bottom surface, one of the right-angled sides of the right triangle is in contact with the plate surface of the support plate, the other right-angled side of the right triangle is located away from the bottom surface, and the hypotenuse of the right triangle is located away from the plate surface of the support plate.

9. The evaporation source according to claim 7, characterized in that: The surface of the at least one baffle away from the board surface of the support plate is a plane; or, the surface of the at least one baffle away from the support plate is a curved surface, and the curved surface is concave along the direction of the board surface close to the support plate.

10. The evaporation source according to claim 1, characterized in that The blocking structure includes a concave-convex surface, which is the plate surface of the support plate. The concave-convex surface includes a concave surface and a convex surface, and the concave surface and the convex surface are alternately arranged along a direction parallel to the bottom surface; or, the concave surface and the convex surface are alternately arranged along a direction perpendicular to the bottom surface.

11. The evaporation source according to any one of claims 1 to 10, characterized in that: The evaporation tank further comprises a plurality of partitions, wherein the plurality of partitions are arranged in the evaporation tank, and the plurality of partitions are arranged at intervals along a first direction to divide the evaporation tank into a plurality of sub-evaporation tanks, and the sub-evaporation tank further comprises two first side surfaces arranged opposite to each other along the first direction, the two first side surfaces are vertically connected to the edge of the bottom surface, and at least one of the two first side surfaces is connected to the support plate of the anti-sway device; and / or at least one anti-sway device is arranged between the two first side surfaces, and the at least one anti-sway device is arranged at intervals from the two first side surfaces, and a through hole is provided in the support plate of the at least one anti-sway device close to the bottom surface.

12. The evaporation source according to any one of claims 1 to 10, characterized in that: It also includes a cover plate, which is arranged on a side of the evaporation tank away from the bottom surface, and a nozzle is arranged on the cover plate, and the sub-evaporation tank is arranged corresponding to at least one of the nozzles.

13. A vapor deposition device, characterized in that: Comprising the evaporation source according to any one of claims 1 to 12.

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